FI20105906A0 - Anordning - Google Patents
AnordningInfo
- Publication number
- FI20105906A0 FI20105906A0 FI20105906A FI20105906A FI20105906A0 FI 20105906 A0 FI20105906 A0 FI 20105906A0 FI 20105906 A FI20105906 A FI 20105906A FI 20105906 A FI20105906 A FI 20105906A FI 20105906 A0 FI20105906 A0 FI 20105906A0
- Authority
- FI
- Finland
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
- C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
- C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20105906A FI20105906A0 (sv) | 2010-08-30 | 2010-08-30 | Anordning |
PCT/FI2011/050743 WO2012028776A1 (en) | 2010-08-30 | 2011-08-25 | Apparatus |
CN201180041755.0A CN103108985B (zh) | 2010-08-30 | 2011-08-25 | 用于处理柔性基底的表面的装置 |
TW100130644A TW201219596A (en) | 2010-08-30 | 2011-08-26 | Apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20105906A FI20105906A0 (sv) | 2010-08-30 | 2010-08-30 | Anordning |
Publications (1)
Publication Number | Publication Date |
---|---|
FI20105906A0 true FI20105906A0 (sv) | 2010-08-30 |
Family
ID=42669410
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20105906A FI20105906A0 (sv) | 2010-08-30 | 2010-08-30 | Anordning |
Country Status (4)
Country | Link |
---|---|
CN (1) | CN103108985B (sv) |
FI (1) | FI20105906A0 (sv) |
TW (1) | TW201219596A (sv) |
WO (1) | WO2012028776A1 (sv) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8470718B2 (en) | 2008-08-13 | 2013-06-25 | Synos Technology, Inc. | Vapor deposition reactor for forming thin film |
US8758512B2 (en) | 2009-06-08 | 2014-06-24 | Veeco Ald Inc. | Vapor deposition reactor and method for forming thin film |
US20110076421A1 (en) * | 2009-09-30 | 2011-03-31 | Synos Technology, Inc. | Vapor deposition reactor for forming thin film on curved surface |
US8840958B2 (en) | 2011-02-14 | 2014-09-23 | Veeco Ald Inc. | Combined injection module for sequentially injecting source precursor and reactant precursor |
WO2013140021A1 (en) * | 2012-03-23 | 2013-09-26 | Picosun Oy | Atomic layer deposition method and apparatuses |
FI125341B (sv) * | 2012-07-09 | 2015-08-31 | Beneq Oy | Apparatur och metod för processing av substrat |
DE102012111484A1 (de) * | 2012-11-27 | 2014-05-28 | Aixtron Se | Vorrichtung und Verfahren zum Bearbeiten streifenförmiger Substrate |
NL2027074B1 (en) | 2020-12-08 | 2022-07-07 | Kalpana Tech B V | Roll-to-roll processing |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005133165A (ja) * | 2003-10-31 | 2005-05-26 | Masahito Yonezawa | 帯状基板の処理装置及び処理方法 |
US20050172897A1 (en) * | 2004-02-09 | 2005-08-11 | Frank Jansen | Barrier layer process and arrangement |
US20090304924A1 (en) * | 2006-03-03 | 2009-12-10 | Prasad Gadgil | Apparatus and method for large area multi-layer atomic layer chemical vapor processing of thin films |
JP5092624B2 (ja) * | 2007-08-24 | 2012-12-05 | 大日本印刷株式会社 | ガスバリア膜の作製方法及び作製装置 |
US20110023775A1 (en) * | 2009-07-31 | 2011-02-03 | E.I. Du Pont De Nemours And Company | Apparatus for atomic layer deposition |
US20110076421A1 (en) * | 2009-09-30 | 2011-03-31 | Synos Technology, Inc. | Vapor deposition reactor for forming thin film on curved surface |
EP2360293A1 (en) * | 2010-02-11 | 2011-08-24 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Method and apparatus for depositing atomic layers on a substrate |
-
2010
- 2010-08-30 FI FI20105906A patent/FI20105906A0/sv not_active Application Discontinuation
-
2011
- 2011-08-25 CN CN201180041755.0A patent/CN103108985B/zh active Active
- 2011-08-25 WO PCT/FI2011/050743 patent/WO2012028776A1/en active Application Filing
- 2011-08-26 TW TW100130644A patent/TW201219596A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2012028776A1 (en) | 2012-03-08 |
CN103108985B (zh) | 2015-02-11 |
TW201219596A (en) | 2012-05-16 |
CN103108985A (zh) | 2013-05-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD | Application lapsed |