FI20090476A0 - Menetelmä ja laite lasialustan valmistamiseksi - Google Patents

Menetelmä ja laite lasialustan valmistamiseksi

Info

Publication number
FI20090476A0
FI20090476A0 FI20090476A FI20090476A FI20090476A0 FI 20090476 A0 FI20090476 A0 FI 20090476A0 FI 20090476 A FI20090476 A FI 20090476A FI 20090476 A FI20090476 A FI 20090476A FI 20090476 A0 FI20090476 A0 FI 20090476A0
Authority
FI
Finland
Prior art keywords
making
glass substrate
glass
substrate
Prior art date
Application number
FI20090476A
Other languages
English (en)
Swedish (sv)
Other versions
FI20090476A (fi
FI122881B (fi
Inventor
Tommi Vainio
Jarmo Skarp
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20090476A priority Critical patent/FI122881B/fi
Publication of FI20090476A0 publication Critical patent/FI20090476A0/fi
Priority to PCT/FI2010/051016 priority patent/WO2011073508A1/en
Priority to US13/511,905 priority patent/US20120315709A1/en
Priority to EP10803259A priority patent/EP2513353A1/en
Priority to EA201290493A priority patent/EA201290493A1/ru
Priority to CN2010800566160A priority patent/CN102666905A/zh
Publication of FI20090476A publication Critical patent/FI20090476A/fi
Application granted granted Critical
Publication of FI122881B publication Critical patent/FI122881B/fi

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/02Processes for applying liquids or other fluent materials performed by spraying
    • B05D1/08Flame spraying
    • B05D1/10Applying particulate materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/20Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed by flame or combustion
    • B05B7/201Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed by flame or combustion downstream of the nozzle
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/129Flame spraying
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/008Surface plasmon devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/054Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/52PV systems with concentrators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Biophysics (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Combustion & Propulsion (AREA)
  • Photovoltaic Devices (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Surface Treatment Of Glass (AREA)
FI20090476A 2009-12-15 2009-12-15 Menetelmä lasialustan valmistamiseksi FI122881B (fi)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FI20090476A FI122881B (fi) 2009-12-15 2009-12-15 Menetelmä lasialustan valmistamiseksi
PCT/FI2010/051016 WO2011073508A1 (en) 2009-12-15 2010-12-13 Process and apparatus for producing a substrate
US13/511,905 US20120315709A1 (en) 2009-12-15 2010-12-13 Process and apparatus for producing a substrate
EP10803259A EP2513353A1 (en) 2009-12-15 2010-12-13 Process and apparatus for producing a substrate
EA201290493A EA201290493A1 (ru) 2009-12-15 2010-12-13 Способ и устройство для изготовления подложки
CN2010800566160A CN102666905A (zh) 2009-12-15 2010-12-13 制造衬底的方法和设备

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20090476A FI122881B (fi) 2009-12-15 2009-12-15 Menetelmä lasialustan valmistamiseksi
FI20090476 2009-12-15

Publications (3)

Publication Number Publication Date
FI20090476A0 true FI20090476A0 (fi) 2009-12-15
FI20090476A FI20090476A (fi) 2011-06-16
FI122881B FI122881B (fi) 2012-08-15

Family

ID=41462698

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20090476A FI122881B (fi) 2009-12-15 2009-12-15 Menetelmä lasialustan valmistamiseksi

Country Status (6)

Country Link
US (1) US20120315709A1 (fi)
EP (1) EP2513353A1 (fi)
CN (1) CN102666905A (fi)
EA (1) EA201290493A1 (fi)
FI (1) FI122881B (fi)
WO (1) WO2011073508A1 (fi)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110290316A1 (en) * 2010-05-28 2011-12-01 Daniel Warren Hawtof Light scattering inorganic substrates by soot deposition
FI20115683A0 (fi) * 2011-06-30 2011-06-30 Beneq Oy Pinnankäsittelylaite
US10112208B2 (en) 2015-12-11 2018-10-30 VITRO S.A.B. de C.V. Glass articles with nanoparticle regions
CN111168080B (zh) * 2020-01-17 2023-03-24 陕西瑞科新材料股份有限公司 一种纳米铂金属的制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI98832C (fi) 1995-09-15 1997-08-25 Juha Tikkanen Menetelmä ja laite materiaalin ruiskuttamiseksi
US20090032097A1 (en) * 2007-07-31 2009-02-05 Bigioni Terry P Enhancement of dye-sensitized solar cells using colloidal metal nanoparticles
FI20085085A0 (fi) * 2008-01-31 2008-01-31 Jyrki Maekelae Rullalta rullalle -menetelmä ja pinnoituslaite

Also Published As

Publication number Publication date
FI20090476A (fi) 2011-06-16
US20120315709A1 (en) 2012-12-13
WO2011073508A1 (en) 2011-06-23
CN102666905A (zh) 2012-09-12
EP2513353A1 (en) 2012-10-24
FI122881B (fi) 2012-08-15
EA201290493A1 (ru) 2013-01-30

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