ES8700499A1 - Procedimiento para la fabricacion de dispositivos semicon- ductores - Google Patents

Procedimiento para la fabricacion de dispositivos semicon- ductores

Info

Publication number
ES8700499A1
ES8700499A1 ES546317A ES546317A ES8700499A1 ES 8700499 A1 ES8700499 A1 ES 8700499A1 ES 546317 A ES546317 A ES 546317A ES 546317 A ES546317 A ES 546317A ES 8700499 A1 ES8700499 A1 ES 8700499A1
Authority
ES
Spain
Prior art keywords
fabrication
monomer units
devices involving
lithographic procedures
entity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES546317A
Other languages
English (en)
Other versions
ES546317A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
American Telephone and Telegraph Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc
Publication of ES8700499A1 publication Critical patent/ES8700499A1/es
Publication of ES546317A0 publication Critical patent/ES546317A0/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

PROCEDIMIENTO LITOGRAFICO PARA LA FABRICACION DE DISPOSITIVOS SEMICONDUCTORES. CONSISTE EN FORMAR UNA REGION DE MATERIAL DELINEABLE SOBRE UN SUSTRATO QUE CONTIENE SILICIO, CUYO MATERIAL COMPRENDE UN POLIMERO QUE INCLUYE AL MENOS UN PRIMER SEGMENTO Y UN SEGUNDO SEGMENTO. CADA UNO DE ESTOS SEGMENTOS CONFIERE UNA PROPIEDAD QUIMICA DIFERENTE A DICHO POLIMERO E INCLUYE AL MENOS 10 UNIDADES MONOMERICAS. LAS SIGUIENTES ETAPAS DE LA FABRICACION SON: DELINEAR DICHO MATERIAL Y CONTINUAR LA REFERIDA FABRICACION MEDIANTE UN PROCEDIMIENTO ELEGIDO ENTRE MORDENTADO (EL MORDENTADO COMPRENDE UN PROCEDIMIENTO QUE UTILIZA UN PLASMA), METALIZACION E IMPLANTACION IONICA.
ES546317A 1984-08-22 1985-08-21 Procedimiento para la fabricacion de dispositivos semicon- ductores Expired ES8700499A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US64315684A 1984-08-22 1984-08-22

Publications (2)

Publication Number Publication Date
ES8700499A1 true ES8700499A1 (es) 1986-10-16
ES546317A0 ES546317A0 (es) 1986-10-16

Family

ID=24579592

Family Applications (1)

Application Number Title Priority Date Filing Date
ES546317A Expired ES8700499A1 (es) 1984-08-22 1985-08-21 Procedimiento para la fabricacion de dispositivos semicon- ductores

Country Status (7)

Country Link
EP (1) EP0191774B1 (es)
JP (1) JPS61503052A (es)
CA (1) CA1293146C (es)
DE (1) DE3580471D1 (es)
ES (1) ES8700499A1 (es)
IE (1) IE56849B1 (es)
WO (1) WO1986001616A1 (es)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2613603A1 (de) * 1975-04-17 1976-10-28 Xerox Corp Wasserfreie lithografische druckmatrize und verfahren zu deren herstellung
JPS6049647B2 (ja) * 1981-09-18 1985-11-02 株式会社日立製作所 光又は放射線硬化性ポリオルガノシロキサン組成物
US4507384A (en) * 1983-04-18 1985-03-26 Nippon Telegraph & Telephone Public Corporation Pattern forming material and method for forming pattern therewith

Also Published As

Publication number Publication date
CA1293146C (en) 1991-12-17
DE3580471D1 (de) 1990-12-13
EP0191774A1 (en) 1986-08-27
JPS61503052A (ja) 1986-12-25
IE56849B1 (en) 1992-01-01
ES546317A0 (es) 1986-10-16
IE852055L (en) 1986-02-22
EP0191774B1 (en) 1990-11-07
WO1986001616A1 (en) 1986-03-13

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