ES8402621A1 - Procedimiento para la precipitacion de metales sobre polvos semiconductores. - Google Patents

Procedimiento para la precipitacion de metales sobre polvos semiconductores.

Info

Publication number
ES8402621A1
ES8402621A1 ES519001A ES519001A ES8402621A1 ES 8402621 A1 ES8402621 A1 ES 8402621A1 ES 519001 A ES519001 A ES 519001A ES 519001 A ES519001 A ES 519001A ES 8402621 A1 ES8402621 A1 ES 8402621A1
Authority
ES
Spain
Prior art keywords
semi
conductive powders
depositing metals
palladium
gold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES519001A
Other languages
English (en)
Spanish (es)
Other versions
ES519001A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES519001A0 publication Critical patent/ES519001A0/es
Publication of ES8402621A1 publication Critical patent/ES8402621A1/es
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B13/00—Obtaining lead
    • C22B13/04—Obtaining lead by wet processes
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B11/00—Obtaining noble metals
    • C22B11/04—Obtaining noble metals by wet processes
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B15/00—Obtaining copper
    • C22B15/0063—Hydrometallurgy
    • C22B15/0084—Treating solutions
    • C22B15/0086—Treating solutions by physical methods
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B17/00—Obtaining cadmium
    • C22B17/04—Obtaining cadmium by wet processes
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B25/00—Obtaining tin
    • C22B25/06—Obtaining tin from scrap, especially tin scrap
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B43/00—Obtaining mercury
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C22B9/16—Remelting metals
    • C22B9/22—Remelting metals with heating by wave energy or particle radiation
    • C22B9/221—Remelting metals with heating by wave energy or particle radiation by electromagnetic waves, e.g. by gas discharge lamps
    • C22B9/225—Remelting metals with heating by wave energy or particle radiation by electromagnetic waves, e.g. by gas discharge lamps by microwaves
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Catalysts (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
ES519001A 1982-01-15 1983-01-14 Procedimiento para la precipitacion de metales sobre polvos semiconductores. Expired ES8402621A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH24182 1982-01-15

Publications (2)

Publication Number Publication Date
ES519001A0 ES519001A0 (es) 1984-03-01
ES8402621A1 true ES8402621A1 (es) 1984-03-01

Family

ID=4182503

Family Applications (1)

Application Number Title Priority Date Filing Date
ES519001A Expired ES8402621A1 (es) 1982-01-15 1983-01-14 Procedimiento para la precipitacion de metales sobre polvos semiconductores.

Country Status (8)

Country Link
US (2) US4559237A (cg-RX-API-DMAC7.html)
EP (2) EP0163876B1 (cg-RX-API-DMAC7.html)
JP (1) JPS58123888A (cg-RX-API-DMAC7.html)
CA (1) CA1243272A (cg-RX-API-DMAC7.html)
DE (1) DE3365362D1 (cg-RX-API-DMAC7.html)
ES (1) ES8402621A1 (cg-RX-API-DMAC7.html)
IN (1) IN159370B (cg-RX-API-DMAC7.html)
ZA (1) ZA83253B (cg-RX-API-DMAC7.html)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120302A (ja) * 1984-07-06 1986-01-29 Hitachi Maxell Ltd 強磁性粉末とその製造方法
US4612208A (en) * 1985-04-22 1986-09-16 Westinghouse Electric Corp. Coupling aid for laser fusion of metal powders
DE3772220D1 (de) * 1986-01-22 1991-09-26 Hitachi Ltd Verfahren und vorrichtung zur photoelektrokatalytischen reduktion von edelmetallen in salpetersaurer loesung.
AT389099B (de) * 1987-09-08 1989-10-10 Simmering Graz Pauker Ag Verfahren und vorrichtung zur reinigung einer mit organischen und/oder anorganischen fremdstoffen belasteten fluessigkeit, sowie verwendung einer halbleiterschicht
US4888204A (en) * 1988-09-12 1989-12-19 Hughes Aircraft Company Photochemical deposition of high purity gold films
US5137607A (en) * 1990-04-27 1992-08-11 Wisconsin Alumni Research Foundation Reactor vessel using metal oxide ceramic membranes
US5616532A (en) * 1990-12-14 1997-04-01 E. Heller & Company Photocatalyst-binder compositions
JP2538851Y2 (ja) * 1991-02-08 1997-06-18 矢崎総業株式会社 自動車用計器の照明装置
US5849200A (en) * 1993-10-26 1998-12-15 E. Heller & Company Photocatalyst-binder compositions
FR2763260A1 (fr) * 1997-05-14 1998-11-20 Rhodia Chimie Sa Procede de traitement de gaz pour la reduction des emissions des oxydes d'azote utilisant un catalyseur a phase catalytique obtenue par reduction radiolytique ou photolytique et compositions catalytiques specifiques
US6342249B1 (en) 1998-12-23 2002-01-29 Alza Corporation Controlled release liquid active agent formulation dosage forms
US6635281B2 (en) 1998-12-23 2003-10-21 Alza Corporation Gastric retaining oral liquid dosage form
US20050232995A1 (en) 2002-07-29 2005-10-20 Yam Nyomi V Methods and dosage forms for controlled delivery of paliperidone and risperidone
US20050152967A1 (en) * 2003-03-28 2005-07-14 Pfab, Lp Dynamic variable release
ES2221802B1 (es) * 2003-06-17 2006-04-16 Universidad Rey Juan Carlos Procedimiento para la recuperacion de oro y/o plata a partir de una disolucion de complejos cianuro de oro y/o plata.
EP1684713A1 (en) * 2003-11-14 2006-08-02 ALZA Corporation Controlled release of topirimate in liquid dosage forms
WO2006023286A2 (en) * 2004-08-19 2006-03-02 Alza Corporation Controlled release nanoparticle active agent formulation dosage forms and methods
DE602006003639D1 (de) * 2005-01-27 2008-12-24 Alza Corp Orale osmotische darreichungsform mit membran mit hoher flussdichte
CN101232868A (zh) * 2005-04-19 2008-07-30 阿尔扎公司 曲马多和加巴喷丁的控释递药剂型
AR055099A1 (es) * 2005-07-28 2007-08-08 Alza Corp Formulaciones liquidas para la administracion controlada de derivados de bencisoxazol
WO2007041079A2 (en) * 2005-09-30 2007-04-12 Alza Corporation Banded controlled release nanoparticle active agent formulation dosage forms and methods
PL116330U1 (en) 2005-10-31 2007-04-02 Alza Corp Method for the reduction of alcohol provoked rapid increase in the released dose of the orally administered opioide with prolonged liberation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3907566A (en) * 1971-07-23 1975-09-23 Canon Kk Photosensitive material containing inorganic compound coated metal particles and the use thereof in photographic development processes
US3993802A (en) * 1971-07-29 1976-11-23 Photocircuits Division Of Kollmorgen Corporation Processes and products for making articles for electroless plating
US4239789A (en) * 1979-05-08 1980-12-16 International Business Machines Corporation Maskless method for electroless plating patterns
US4264421A (en) * 1979-05-30 1981-04-28 Board Of Regents, University Of Texas System Photocatalytic methods for preparing metallized powders
DD157989A3 (de) * 1980-10-10 1982-12-22 Lothar Gierth Verfahren zur strukturierten chemisch-reduktiven metallabscheidung

Also Published As

Publication number Publication date
US4619838A (en) 1986-10-28
EP0163876A1 (de) 1985-12-11
EP0163876B1 (de) 1987-09-30
CA1243272A (en) 1988-10-18
EP0084517B1 (de) 1986-08-20
EP0084517A1 (de) 1983-07-27
US4559237A (en) 1985-12-17
ZA83253B (en) 1983-10-26
ES519001A0 (es) 1984-03-01
DE3365362D1 (en) 1986-09-25
IN159370B (cg-RX-API-DMAC7.html) 1987-05-09
JPS58123888A (ja) 1983-07-23

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