ES530647A0 - Un procedimiento para la preparacion de una imagen - Google Patents
Un procedimiento para la preparacion de una imagenInfo
- Publication number
- ES530647A0 ES530647A0 ES530647A ES530647A ES530647A0 ES 530647 A0 ES530647 A0 ES 530647A0 ES 530647 A ES530647 A ES 530647A ES 530647 A ES530647 A ES 530647A ES 530647 A0 ES530647 A0 ES 530647A0
- Authority
- ES
- Spain
- Prior art keywords
- preparing
- procedure
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Polymerisation Methods In General (AREA)
- Fax Reproducing Arrangements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB838307220A GB8307220D0 (en) | 1983-03-16 | 1983-03-16 | Production of images |
Publications (2)
Publication Number | Publication Date |
---|---|
ES530647A0 true ES530647A0 (es) | 1984-12-01 |
ES8501131A1 ES8501131A1 (es) | 1984-12-01 |
Family
ID=10539670
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES530647A Expired ES8501131A1 (es) | 1983-03-16 | 1984-03-15 | Un procedimiento para la preparacion de una imagen |
Country Status (7)
Country | Link |
---|---|
US (1) | US4548895A (es) |
EP (1) | EP0119959B1 (es) |
JP (1) | JPS59177538A (es) |
CA (1) | CA1242919A (es) |
DE (1) | DE3461868D1 (es) |
ES (1) | ES8501131A1 (es) |
GB (1) | GB8307220D0 (es) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8332073D0 (en) * | 1983-12-01 | 1984-01-11 | Ciba Geigy Ag | Polymerisable compositions |
US4610941A (en) * | 1985-03-19 | 1986-09-09 | Sullivan Donald F | Method for photographically improving the resolution of screen printed photopolymer images |
US4786569A (en) * | 1985-09-04 | 1988-11-22 | Ciba-Geigy Corporation | Adhesively bonded photostructurable polyimide film |
US4975300A (en) * | 1987-12-31 | 1990-12-04 | Minnesota Mining And Manufacturing Company | Method for curing an organic coating using condensation heating and radiation energy |
US5178988A (en) * | 1988-09-13 | 1993-01-12 | Amp-Akzo Corporation | Photoimageable permanent resist |
US5070002A (en) * | 1988-09-13 | 1991-12-03 | Amp-Akzo Corporation | Photoimageable permanent resist |
GB8822145D0 (en) * | 1988-09-21 | 1988-10-26 | Ciba Geigy Ag | Method |
US6180317B1 (en) | 1988-12-30 | 2001-01-30 | International Business Machines Corporation | Composition for photoimaging |
US5026624A (en) * | 1989-03-03 | 1991-06-25 | International Business Machines Corporation | Composition for photo imaging |
US5747223A (en) * | 1988-12-30 | 1998-05-05 | International Business Machines Corporation | Composition for photoimaging |
US5439766A (en) * | 1988-12-30 | 1995-08-08 | International Business Machines Corporation | Composition for photo imaging |
US5264325A (en) * | 1988-12-30 | 1993-11-23 | International Business Machines Corporation | Composition for photo imaging |
US5304457A (en) * | 1989-03-03 | 1994-04-19 | International Business Machines Corporation | Composition for photo imaging |
IL94474A (en) * | 1989-06-09 | 1993-07-08 | Morton Int Inc | Photoimageable compositions |
JPH03191352A (ja) * | 1989-12-15 | 1991-08-21 | W R Grace & Co | 感光性樹脂組成物 |
US5439779A (en) * | 1993-02-22 | 1995-08-08 | International Business Machines Corporation | Aqueous soldermask |
US5631201A (en) * | 1996-07-29 | 1997-05-20 | Osram Sylvania Inc. | Translucent polycrystalline alumina and method of making same |
JP3969109B2 (ja) * | 2002-02-08 | 2007-09-05 | コニカミノルタホールディングス株式会社 | 感光性平版印刷版及びその記録方法 |
JP2008088167A (ja) * | 2006-09-07 | 2008-04-17 | Mitsui Chemicals Inc | (メタ)アクリロイル基およびグリシジル基を含有する化合物、当該化合物を含む重合性組成物、ならびに当該化合物の製造方法に関する。 |
KR100943421B1 (ko) * | 2007-12-24 | 2010-02-19 | 연세대학교 산학협력단 | 에폭시기와 불포화이중결합을 갖는 광중합성 단량체 및이를 함유한 광중합 조성물 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL283978A (es) * | 1961-10-05 | 1900-01-01 | ||
US3450613A (en) * | 1964-03-09 | 1969-06-17 | Bausch & Lomb | Epoxy adhesive containing acrylic acid-epoxy reaction products and photosensitizers |
GB1346768A (en) * | 1970-08-11 | 1974-02-13 | Ciba Geigy Uk Ltd | Curable epoxide resin compositions |
US3796578A (en) * | 1970-12-26 | 1974-03-12 | Asahi Chemical Ind | Photopolymerizable compositions and elements containing addition polymerizable polymeric compounds |
JPS51482B1 (es) * | 1971-06-16 | 1976-01-08 | ||
DE2406400B2 (de) * | 1973-02-14 | 1977-04-28 | Hitachi Chemical Co., Ltd., Tokio | Lichtempfindliche harzzusammensetzungen auf der basis von verbindungen mit epoxy- bzw. photopolymerisierbaren acrylgruppen |
US4025348A (en) * | 1974-05-10 | 1977-05-24 | Hitachi Chemical Company, Ltd. | Photosensitive resin compositions |
US4054451A (en) * | 1974-09-26 | 1977-10-18 | American Can Company | Method of polymerizing a copolymer of glycidyl methacrylate and allyl glycidyl ether |
GB1512814A (en) * | 1975-08-13 | 1978-06-01 | Ciba Geigy Ag | Epoxide resins |
US4047963A (en) * | 1976-06-17 | 1977-09-13 | Hercules Incorporated | Photopolymer compositions |
US4090936A (en) * | 1976-10-28 | 1978-05-23 | Minnesota Mining And Manufacturing Company | Photohardenable compositions |
US4192924A (en) * | 1977-12-16 | 1980-03-11 | General Electric Company | Method of foaming curable organic resin compositions |
US4171974A (en) * | 1978-02-15 | 1979-10-23 | Polychrome Corporation | Aqueous alkali developable negative working lithographic printing plates |
JPS5828571B2 (ja) * | 1978-07-20 | 1983-06-16 | 沖電気工業株式会社 | 微細加工用レジスト形成方法 |
US4358477A (en) * | 1978-09-07 | 1982-11-09 | Akzo N.V. | Process of curing unsaturated epoxy coating composition with radiation and epoxy curing agent, and coated substrate |
US4237216A (en) * | 1978-12-08 | 1980-12-02 | International Business Machines Corporation | Photosensitive patternable coating composition containing novolak type materials |
US4291118A (en) * | 1979-12-26 | 1981-09-22 | W. R. Grace & Co. | Relief imaging liquids |
US4317858A (en) * | 1980-06-27 | 1982-03-02 | Westinghouse Electric Corp. | Ultraviolet curable solvent-free wire enamel blends |
US4374751A (en) * | 1980-08-08 | 1983-02-22 | General Electric Company | Polymerization initiator compositions |
US4288527A (en) * | 1980-08-13 | 1981-09-08 | W. R. Grace & Co. | Dual UV/thermally curable acrylate compositions with pinacol |
US4352723A (en) * | 1980-08-13 | 1982-10-05 | W. R. Grace & Co. | Method of curing a dual UV/thermally curable acrylate composition |
-
1983
- 1983-03-16 GB GB838307220A patent/GB8307220D0/en active Pending
-
1984
- 1984-03-07 US US06/586,897 patent/US4548895A/en not_active Expired - Fee Related
- 1984-03-12 EP EP84810119A patent/EP0119959B1/de not_active Expired
- 1984-03-12 DE DE8484810119T patent/DE3461868D1/de not_active Expired
- 1984-03-14 CA CA000449593A patent/CA1242919A/en not_active Expired
- 1984-03-15 ES ES530647A patent/ES8501131A1/es not_active Expired
- 1984-03-16 JP JP59050823A patent/JPS59177538A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE3461868D1 (en) | 1987-02-05 |
GB8307220D0 (en) | 1983-04-20 |
EP0119959A1 (de) | 1984-09-26 |
US4548895A (en) | 1985-10-22 |
EP0119959B1 (de) | 1986-12-30 |
ES8501131A1 (es) | 1984-12-01 |
JPS59177538A (ja) | 1984-10-08 |
CA1242919A (en) | 1988-10-11 |
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