ES510904A0 - Un procedimiento para fabricar una plancha de impresion litografica revestida de un material fotosensible derivado de una resina diazoica. - Google Patents

Un procedimiento para fabricar una plancha de impresion litografica revestida de un material fotosensible derivado de una resina diazoica.

Info

Publication number
ES510904A0
ES510904A0 ES510904A ES510904A ES510904A0 ES 510904 A0 ES510904 A0 ES 510904A0 ES 510904 A ES510904 A ES 510904A ES 510904 A ES510904 A ES 510904A ES 510904 A0 ES510904 A0 ES 510904A0
Authority
ES
Spain
Prior art keywords
diazoic
procedure
resin
manufacturing
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES510904A
Other languages
English (en)
Other versions
ES8308094A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of ES510904A0 publication Critical patent/ES510904A0/es
Publication of ES8308094A1 publication Critical patent/ES8308094A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08—Processes
    • C08G18/0804—Manufacture of polymers containing ionic or ionogenic groups
    • C08G18/0819—Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups
    • C08G18/0828—Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups containing sulfonate groups or groups forming them
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/18—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material comprising a plurality of layers stacked between terminals
ES510904A 1980-04-30 1982-03-29 Un procedimiento para fabricar una plancha de impresion litografica revestida de un material fotosensible derivado de una resina diazoica. Expired ES8308094A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14502580A 1980-04-30 1980-04-30

Publications (2)

Publication Number Publication Date
ES510904A0 true ES510904A0 (es) 1983-08-01
ES8308094A1 ES8308094A1 (es) 1983-08-01

Family

ID=22511265

Family Applications (2)

Application Number Title Priority Date Filing Date
ES501688A Granted ES501688A0 (es) 1980-04-30 1981-04-28 Un procedimiento para preparar un aducto fotosensible.
ES510904A Expired ES8308094A1 (es) 1980-04-30 1982-03-29 Un procedimiento para fabricar una plancha de impresion litografica revestida de un material fotosensible derivado de una resina diazoica.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
ES501688A Granted ES501688A0 (es) 1980-04-30 1981-04-28 Un procedimiento para preparar un aducto fotosensible.

Country Status (8)

Country Link
EP (1) EP0040470B1 (es)
JP (1) JPS575042A (es)
BR (1) BR8102630A (es)
CA (1) CA1153611A (es)
DE (1) DE3169226D1 (es)
ES (2) ES501688A0 (es)
MX (1) MX159143A (es)
ZA (1) ZA812847B (es)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222842A (ja) * 1983-06-01 1984-12-14 Fuji Photo Film Co Ltd 平版印刷版用感光性組成物
JPS603632A (ja) * 1983-06-21 1985-01-10 Fuji Photo Film Co Ltd 感光性平版印刷版
US4543315A (en) * 1983-09-30 1985-09-24 Minnesota Mining And Manufacturing Company Storage-stable photosensitive composition and article with adduct of diazo resin and amorphous sulfopolyester
US4521503A (en) * 1984-05-11 1985-06-04 Minnesota Mining And Manufacturing Company Highly photosensitive aqueous solvent-developable printing assembly
JPS6120939A (ja) * 1984-07-10 1986-01-29 Fuji Photo Film Co Ltd 平版印刷版用感光性組成物
JPH0820729B2 (ja) * 1986-07-25 1996-03-04 三菱化学株式会社 染色可能な感光性組成物
US5527655A (en) * 1994-09-28 1996-06-18 Minnesota Mining And Manufacturing Company Radiation-sensitive adducts comprising diazonium cations, quaternary cations, and sulfonated polyester anions
US5846685A (en) * 1997-01-31 1998-12-08 Kodak Polychrome Graphics, Llc Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate
JP4317330B2 (ja) 2001-02-07 2009-08-19 富士フイルム株式会社 感光性平版印刷版の製版方法
JP2004133125A (ja) 2002-10-09 2004-04-30 Fuji Photo Film Co Ltd 感光性平版印刷版

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
UST876010I4 (en) * 1970-02-02 1970-07-28 Defensive publication
CH557107A (de) * 1972-07-28 1974-12-13 Siemens Ag Schaltungsanordnung fuer eine drehfeldmaschine, die ueber einen umrichter an ein drehstromnetz angeschlossen ist.
JPS5534929B2 (es) * 1974-02-28 1980-09-10
US4123276A (en) * 1974-02-28 1978-10-31 Fuji Photo Film Co., Ltd. Photosensitive composition

Also Published As

Publication number Publication date
MX159143A (es) 1989-04-26
ZA812847B (en) 1982-05-26
CA1153611A (en) 1983-09-13
ES8207357A1 (es) 1982-09-01
ES501688A0 (es) 1982-09-01
EP0040470A2 (en) 1981-11-25
DE3169226D1 (en) 1985-04-18
ES8308094A1 (es) 1983-08-01
JPH0366662B2 (es) 1991-10-18
BR8102630A (pt) 1982-01-26
JPS575042A (en) 1982-01-11
EP0040470A3 (en) 1982-02-10
EP0040470B1 (en) 1985-03-13

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19980401