ES326362A1 - Un procedimiento para la confeccion de una plancha en offset. - Google Patents
Un procedimiento para la confeccion de una plancha en offset.Info
- Publication number
- ES326362A1 ES326362A1 ES0326362A ES326362A ES326362A1 ES 326362 A1 ES326362 A1 ES 326362A1 ES 0326362 A ES0326362 A ES 0326362A ES 326362 A ES326362 A ES 326362A ES 326362 A1 ES326362 A1 ES 326362A1
- Authority
- ES
- Spain
- Prior art keywords
- layer
- printing
- places
- translation
- legally binding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1965K0057722 DE1447963B2 (de) | 1965-11-24 | 1965-11-24 | Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial |
Publications (1)
Publication Number | Publication Date |
---|---|
ES326362A1 true ES326362A1 (es) | 1967-03-01 |
Family
ID=7228378
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES0326362A Expired ES326362A1 (es) | 1965-11-24 | 1966-05-05 | Un procedimiento para la confeccion de una plancha en offset. |
Country Status (8)
Country | Link |
---|---|
AT (1) | AT297757B (xx) |
BE (1) | BE680536A (xx) |
CH (1) | CH463279A (xx) |
DE (1) | DE1447963B2 (xx) |
ES (1) | ES326362A1 (xx) |
GB (1) | GB1154749A (xx) |
NL (1) | NL149298C (xx) |
SE (1) | SE340951B (xx) |
Families Citing this family (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1513368A (en) * | 1974-07-08 | 1978-06-07 | Vickers Ltd | Processing of radiation-sensitive members |
CH613059A5 (en) * | 1975-06-30 | 1979-08-31 | Hoechst Ag | Method for producing a flat-bed printing forme |
US4191570A (en) * | 1978-10-10 | 1980-03-04 | Polychrome Corporation | Process for heat treating lithographic printing plates |
DE2855393A1 (de) * | 1978-12-21 | 1980-07-03 | Hoechst Ag | Verfahren zum herstellen von flachdruckformen |
DE3110632A1 (de) * | 1981-03-19 | 1982-09-30 | Hoechst Ag, 6000 Frankfurt | Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen |
US4529682A (en) * | 1981-06-22 | 1985-07-16 | Philip A. Hunt Chemical Corporation | Positive photoresist composition with cresol-formaldehyde novolak resins |
US4377631A (en) * | 1981-06-22 | 1983-03-22 | Philip A. Hunt Chemical Corporation | Positive novolak photoresist compositions |
US4587196A (en) * | 1981-06-22 | 1986-05-06 | Philip A. Hunt Chemical Corporation | Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide |
DE3128951A1 (de) * | 1981-07-22 | 1983-02-10 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von fotopolymer-tiefdurckformen |
US4439516A (en) * | 1982-03-15 | 1984-03-27 | Shipley Company Inc. | High temperature positive diazo photoresist processing using polyvinyl phenol |
US5084372A (en) * | 1982-12-09 | 1992-01-28 | Hoechst Celanese Corporation | Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound |
DE3246037A1 (de) * | 1982-12-09 | 1984-06-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial |
DE3504658A1 (de) * | 1985-02-12 | 1986-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial |
EP0196031A3 (en) * | 1985-03-22 | 1987-12-23 | Fuji Photo Film Co., Ltd. | Light-sensitive compositions and light-sensitive materials |
DE3725741A1 (de) * | 1987-08-04 | 1989-02-16 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch |
DE3729035A1 (de) * | 1987-08-31 | 1989-03-09 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial |
DE3820699A1 (de) * | 1988-06-18 | 1989-12-21 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3827901A1 (de) * | 1988-08-17 | 1990-02-22 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
GB8822956D0 (en) * | 1988-09-30 | 1988-11-09 | Cookson Graphics Plc | Baking treatment of lithographic printing plate |
DE3940911A1 (de) * | 1989-12-12 | 1991-06-13 | Hoechst Ag | Verfahren zur herstellung negativer kopien |
DE4002397A1 (de) * | 1990-01-27 | 1991-08-01 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE4004511A1 (de) * | 1990-02-14 | 1991-08-22 | Hoechst Ag | Vorrichtung zum einbrennen von lichtempfindlichen schichten waehrend der herstellung von druckformen |
DE4004719A1 (de) * | 1990-02-15 | 1991-08-22 | Hoechst Ag | Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
DE4414897A1 (de) * | 1994-04-28 | 1995-11-02 | Hoechst Ag | Aromatische Diazoniumsalze und deren Verwendung in strahlungsempfindlichen Gemischen |
DE4444669A1 (de) | 1994-12-15 | 1996-06-20 | Hoechst Ag | Strahlungsempfindliches Gemisch |
DE19739299A1 (de) * | 1997-09-08 | 1999-03-11 | Agfa Gevaert Ag | Weißlicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck |
DE19834745A1 (de) | 1998-08-01 | 2000-02-03 | Agfa Gevaert Ag | Strahlungsempfindliches Gemisch mit IR-absorbierenden, anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial |
DE19834746A1 (de) | 1998-08-01 | 2000-02-03 | Agfa Gevaert Ag | Strahlungsempfindliches Gemisch mit IR-absorbierenden, betainischen oder betainisch-anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial |
JP4184813B2 (ja) | 2002-02-19 | 2008-11-19 | コダックグラフィックコミュニケーションズ株式会社 | 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法 |
US20060234161A1 (en) | 2002-10-04 | 2006-10-19 | Eric Verschueren | Method of making a lithographic printing plate precursor |
US7348126B2 (en) | 2004-04-27 | 2008-03-25 | Agfa Graphics N.V. | Negative working, heat-sensitive lithographic printing plate precursor |
US7195861B2 (en) | 2004-07-08 | 2007-03-27 | Agfa-Gevaert | Method for making a negative working, heat-sensitive lithographic printing plate precursor |
US7354696B2 (en) | 2004-07-08 | 2008-04-08 | Agfa Graphics Nv | Method for making a lithographic printing plate |
US7425405B2 (en) | 2004-07-08 | 2008-09-16 | Agfa Graphics, N.V. | Method for making a lithographic printing plate |
ATE552111T1 (de) | 2008-09-02 | 2012-04-15 | Agfa Graphics Nv | Wärmeempfindlicher, positiv arbeitender lithographiedruckformvorläufer |
EP2213690B1 (en) | 2009-01-30 | 2015-11-11 | Agfa Graphics N.V. | A new alkali soluble resin |
ES2381535T3 (es) | 2009-06-18 | 2012-05-29 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
EP2329951B1 (en) | 2009-12-04 | 2012-06-20 | AGFA Graphics NV | A lithographic printing plate precursor |
EP2366545B1 (en) | 2010-03-19 | 2012-12-05 | Agfa Graphics N.V. | A lithographic printing plate precursor |
WO2012101046A1 (en) | 2011-01-25 | 2012-08-02 | Agfa Graphics Nv | A lithographic printing plate precursor |
ES2427137T3 (es) | 2011-02-18 | 2013-10-29 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
US9562129B2 (en) | 2013-01-01 | 2017-02-07 | Agfa Graphics Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
ES2617557T3 (es) | 2014-05-15 | 2017-06-19 | Agfa Graphics Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
ES2660063T3 (es) | 2014-06-13 | 2018-03-20 | Agfa Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
EP3170662B1 (en) | 2015-11-20 | 2019-08-14 | Agfa Nv | A lithographic printing plate precursor |
-
1965
- 1965-11-24 DE DE1965K0057722 patent/DE1447963B2/de active Granted
-
1966
- 1966-04-28 AT AT404466A patent/AT297757B/de not_active IP Right Cessation
- 1966-05-04 CH CH644966A patent/CH463279A/de unknown
- 1966-05-04 BE BE680536D patent/BE680536A/xx not_active IP Right Cessation
- 1966-05-05 ES ES0326362A patent/ES326362A1/es not_active Expired
- 1966-05-05 NL NL6606131A patent/NL149298C/xx not_active IP Right Cessation
- 1966-05-05 SE SE621266A patent/SE340951B/xx unknown
- 1966-11-23 GB GB5247566A patent/GB1154749A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
NL149298C (nl) | 1982-09-16 |
NL149298B (nl) | 1976-04-15 |
NL6606131A (xx) | 1967-05-25 |
GB1154749A (en) | 1969-06-11 |
CH463279A (de) | 1968-09-30 |
AT297757B (de) | 1972-04-10 |
SE340951B (xx) | 1971-12-06 |
BE680536A (xx) | 1966-11-04 |
DE1447963A1 (de) | 1968-11-14 |
DE1447963B2 (de) | 1972-09-07 |
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