ES2717934T3 - Método para filtrar macropartículas en una deposición física de vapor por arco catódico (PVD), en vacío - Google Patents

Método para filtrar macropartículas en una deposición física de vapor por arco catódico (PVD), en vacío Download PDF

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Publication number
ES2717934T3
ES2717934T3 ES14732390T ES14732390T ES2717934T3 ES 2717934 T3 ES2717934 T3 ES 2717934T3 ES 14732390 T ES14732390 T ES 14732390T ES 14732390 T ES14732390 T ES 14732390T ES 2717934 T3 ES2717934 T3 ES 2717934T3
Authority
ES
Spain
Prior art keywords
arc
substrate
source
particulates
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES14732390T
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English (en)
Spanish (es)
Inventor
Sergey Ukhanov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Argor Aljba SA
Original Assignee
Argor Aljba SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Argor Aljba SA filed Critical Argor Aljba SA
Application granted granted Critical
Publication of ES2717934T3 publication Critical patent/ES2717934T3/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H01J37/32064—Circuits specially adapted for controlling the arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32871—Means for trapping or directing unwanted particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
ES14732390T 2014-05-13 2014-05-13 Método para filtrar macropartículas en una deposición física de vapor por arco catódico (PVD), en vacío Active ES2717934T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/IB2014/061393 WO2015173607A1 (en) 2014-05-13 2014-05-13 Method to filter macro particles in a cathodic arc physical vapor deposition (pvd), in vacuum

Publications (1)

Publication Number Publication Date
ES2717934T3 true ES2717934T3 (es) 2019-06-26

Family

ID=50981594

Family Applications (1)

Application Number Title Priority Date Filing Date
ES14732390T Active ES2717934T3 (es) 2014-05-13 2014-05-13 Método para filtrar macropartículas en una deposición física de vapor por arco catódico (PVD), en vacío

Country Status (8)

Country Link
US (1) US10811235B2 (ko)
EP (1) EP3143177B1 (ko)
JP (1) JP6487943B2 (ko)
KR (1) KR102215808B1 (ko)
CN (1) CN106460157B (ko)
ES (1) ES2717934T3 (ko)
IL (1) IL248748B (ko)
WO (1) WO2015173607A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3263737B1 (en) * 2016-06-29 2019-06-12 Oerlikon Surface Solutions AG, Pfäffikon Vacuum coating chamber and method for filtering macroparticles during cathodic arc evaporation
DE102022213666A1 (de) 2022-12-14 2024-06-20 Wmf Gmbh Schneidklinge und Verfahren zu deren Herstellung

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4103981A1 (de) 1991-02-09 1992-08-13 Bernd Dr Rer Nat Rother Verfahren der vakuumhybridbeschichtung zur abscheidung haftfester und dichter schichten mit rauhen oberflaechen
JP3742462B2 (ja) 1996-07-09 2006-02-01 株式会社イオン工学研究所 コーティング方法およびコーティング装置
JP2001506319A (ja) * 1997-03-20 2001-05-15 モトローラ・インコーポレイテッド 炭素膜を形成する方法
RU2153782C1 (ru) * 1999-06-02 2000-07-27 Закрытое акционерное общество "Патинор Коутингс Лимитед" Импульсный источник углеродной плазмы
JP3860954B2 (ja) 2000-07-07 2006-12-20 株式会社日立グローバルストレージテクノロジーズ リアルタイムパーティクルフィルタを具備したプラズマ処理装置
CN2471791Y (zh) 2001-03-29 2002-01-16 阎鹏勋 一种沉积高质量薄膜低温等离子体装置
US8038858B1 (en) * 2004-04-28 2011-10-18 Alameda Applied Sciences Corp Coaxial plasma arc vapor deposition apparatus and method
US9997338B2 (en) * 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source
KR100701267B1 (ko) * 2005-11-18 2007-03-29 한국생산기술연구원 저전류 구동형 펄스 아크 발생장치
US9605338B2 (en) * 2006-10-11 2017-03-28 Oerlikon Surface Solutions Ag, Pfaffikon Method for depositing electrically insulating layers
US20120199070A1 (en) 2011-02-03 2012-08-09 Vapor Technologies, Inc. Filter for arc source

Also Published As

Publication number Publication date
JP6487943B2 (ja) 2019-03-20
EP3143177A1 (en) 2017-03-22
CN106460157B (zh) 2018-12-18
US20170076918A1 (en) 2017-03-16
IL248748A0 (en) 2017-01-31
KR20170007357A (ko) 2017-01-18
JP2017524803A (ja) 2017-08-31
EP3143177B1 (en) 2019-01-02
KR102215808B1 (ko) 2021-02-17
US10811235B2 (en) 2020-10-20
IL248748B (en) 2019-06-30
WO2015173607A1 (en) 2015-11-19
CN106460157A (zh) 2017-02-22

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