ES2186822T3 - DEVICE AND PROCEDURE FOR VAPORIZATION BY ELECTRONIC BEAM. - Google Patents

DEVICE AND PROCEDURE FOR VAPORIZATION BY ELECTRONIC BEAM.

Info

Publication number
ES2186822T3
ES2186822T3 ES97109082T ES97109082T ES2186822T3 ES 2186822 T3 ES2186822 T3 ES 2186822T3 ES 97109082 T ES97109082 T ES 97109082T ES 97109082 T ES97109082 T ES 97109082T ES 2186822 T3 ES2186822 T3 ES 2186822T3
Authority
ES
Spain
Prior art keywords
hollow body
hole
crisol
gases
modules
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES97109082T
Other languages
Spanish (es)
Inventor
Stefan Locher
Eckhard Wirth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Buehler Alzenau GmbH
Original Assignee
Leybold Optics GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Optics GmbH filed Critical Leybold Optics GmbH
Application granted granted Critical
Publication of ES2186822T3 publication Critical patent/ES2186822T3/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

LA INVENCION SE REFIERE A UN EVAPORADOR POR RADIACION ELECTRONICA FORMADO POR LOS MODULOS DE CAÑON ELECTRONICO (7), SISTEMA DE DESVIACION (6) Y CRISOL/CRISOL GIRATORIO CON REFRIGERACION POR AGUA (10) Y QUE SE ENCUENTRA FIJADO SOBRE LA PLACA DE CUBIERTA (3) DE UN CUERPO HUECO PLANO DE FORMA QUE IMPIDE EL PASO DE GASES. EL CUERPO HUECO ESTA, A SU VEZ, DISPUESTO DE FORMA IMPERMEABLE A LOS GASES SOBRE UN ORIFICIO (B) EN LA CALDERA, PUDIENDO OSCILAR ALREDEDOR DEL EJE PRINCIPAL (A) DEL ORIFICIO (B). EL ESPACIO INTERIOR DEL CUERPO HUECO ESTA EN CONTACTO CON LA ATMOSFERA POR ENCIMA DEL ORIFICIO. TODAS LAS LINEAS DE CONEXION DE AGUA, CORRIENTE DE BAJA TENSION, ALTA TENSION Y ACCIONAMIENTO DE GIRO LLEGAN EN EL CUERPO HUECO HASTA LOS MODULOS DISPUESTOS DE FORMA IMPERMEABLE A LOS GASES.THE INVENTION REFERS TO AN ELECTRONIC RADIATION EVAPORATOR FORMED BY THE ELECTRONIC CANNON MODULES (7), DEVIATION SYSTEM (6) AND ROTATING CRISOL / CRISOL WITH WATER COOLING (10) AND THAT IS FOUND FIXED ON THE COVER PLATE ( 3) OF A FLAT HOLLOW BODY THAT PREVENTS THE GAS PASS. THE HOLLOW BODY IS, IN turn, WATERPROOFLY PROVIDED TO GASES ON A HOLE (B) IN THE BOILER, BEING ABLE TO ROCK AROUND THE MAIN AXLE (A) OF THE HOLE (B). THE INTERIOR SPACE OF THE HOLLOW BODY IS IN CONTACT WITH THE ATMOSPHERE ABOVE THE HOLE. ALL WATER CONNECTION, LOW VOLTAGE, HIGH VOLTAGE AND TURN DRIVE LINES ARRIVE IN THE HOLLOW BODY UNTIL THE MODULES AVAILABLE TO GASES.

ES97109082T 1996-06-14 1997-06-05 DEVICE AND PROCEDURE FOR VAPORIZATION BY ELECTRONIC BEAM. Expired - Lifetime ES2186822T3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19623701A DE19623701A1 (en) 1996-06-14 1996-06-14 Device and method for electron beam evaporation

Publications (1)

Publication Number Publication Date
ES2186822T3 true ES2186822T3 (en) 2003-05-16

Family

ID=7796911

Family Applications (1)

Application Number Title Priority Date Filing Date
ES97109082T Expired - Lifetime ES2186822T3 (en) 1996-06-14 1997-06-05 DEVICE AND PROCEDURE FOR VAPORIZATION BY ELECTRONIC BEAM.

Country Status (5)

Country Link
US (1) US6495216B2 (en)
EP (1) EP0813226B1 (en)
JP (1) JP4142130B2 (en)
DE (2) DE19623701A1 (en)
ES (1) ES2186822T3 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4725975B2 (en) * 2006-12-06 2011-07-13 株式会社昭和真空 Vacuum deposition apparatus and operation method thereof
US20110229660A1 (en) * 2010-03-22 2011-09-22 Timothy Ray Reynolds Ion beam assisted deposition of ophthalmic lens coatings
CN108300981B (en) * 2017-12-20 2020-05-15 湖南红太阳光电科技有限公司 Preheating box for graphite boat
CN111663105A (en) * 2020-05-26 2020-09-15 南方科技大学 Ultrahigh vacuum electron beam evaporator and electron beam coating device

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE123979C (en)
US2482329A (en) * 1946-05-27 1949-09-20 Rca Corp Apparatus for selective vapor coating
US3389210A (en) * 1965-03-29 1968-06-18 Everette M. Whitson Multiple crucible for a permanent magnet transverse electron beam evaporation source
DE2528032C2 (en) * 1975-06-24 1983-06-09 Leybold-Heraeus GmbH, 5000 Köln Electron beam generators for heating, melting and evaporation purposes
DE2544725C3 (en) * 1975-10-07 1981-01-08 Leybold-Heraeus Gmbh, 5000 Koeln Electron beam evaporator
DE2656314A1 (en) 1976-12-11 1978-06-15 Leybold Heraeus Gmbh & Co Kg POWER SUPPLY DEVICE FOR ELECTRON BEAM CANNONS
CH631743A5 (en) * 1977-06-01 1982-08-31 Balzers Hochvakuum METHOD FOR EVAPORATING MATERIAL IN A VACUUM EVAPORATION SYSTEM.
US4561382A (en) * 1983-11-22 1985-12-31 The United States Of America As Represented By The United States Department Of Energy Vacuum vapor deposition gun assembly
CH663037A5 (en) * 1985-02-05 1987-11-13 Balzers Hochvakuum STEAM SOURCE FOR VACUUM COATING SYSTEMS.
JPS62247067A (en) * 1986-04-18 1987-10-28 Citizen Watch Co Ltd Ion plating device
US4776299A (en) * 1986-05-15 1988-10-11 The United States Of America As Represented By The United States Department Of Energy Source replenishment device for vacuum deposition
DE3704505A1 (en) * 1987-02-13 1988-08-25 Leybold Ag INSERT UNIT FOR VACUUM SYSTEMS
JP2913745B2 (en) * 1990-04-10 1999-06-28 松下電器産業株式会社 Vacuum deposition equipment
FR2687171B1 (en) * 1992-02-12 1994-03-25 Commissariat A Energie Atomique DEVICE FOR CONTROLLING A FLOW OF MATERIAL EMITTED BY A HEATED EVAPORATION SOURCE AND APPLICATION IN A VACUUM EVAPORATION COATING MACHINE.
US5216690A (en) * 1992-03-11 1993-06-01 Hanks Charles W Electron beam gun with grounded shield to prevent arc down
US5473627A (en) * 1992-11-05 1995-12-05 Mdc Vacuum Products Corporation UHV rotating fluid delivery system

Also Published As

Publication number Publication date
EP0813226A2 (en) 1997-12-17
US20010006708A1 (en) 2001-07-05
US6495216B2 (en) 2002-12-17
JP4142130B2 (en) 2008-08-27
EP0813226A3 (en) 1998-05-06
JPH1060630A (en) 1998-03-03
EP0813226B1 (en) 2002-08-28
DE59708040D1 (en) 2002-10-02
DE19623701A1 (en) 1997-12-18

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