ES2153471T3 - Dispositivo semiconductor. - Google Patents

Dispositivo semiconductor.

Info

Publication number
ES2153471T3
ES2153471T3 ES95909047T ES95909047T ES2153471T3 ES 2153471 T3 ES2153471 T3 ES 2153471T3 ES 95909047 T ES95909047 T ES 95909047T ES 95909047 T ES95909047 T ES 95909047T ES 2153471 T3 ES2153471 T3 ES 2153471T3
Authority
ES
Spain
Prior art keywords
waveguide
optical
laser
composite
mode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES95909047T
Other languages
English (en)
Inventor
Ian Francis Lealman
Michael James Robertson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
British Telecommunications PLC
Original Assignee
British Telecommunications PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by British Telecommunications PLC filed Critical British Telecommunications PLC
Application granted granted Critical
Publication of ES2153471T3 publication Critical patent/ES2153471T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/26Optical coupling means
    • G02B6/30Optical coupling means for use between fibre and thin-film device
    • G02B6/305Optical coupling means for use between fibre and thin-film device and having an integrated mode-size expanding section, e.g. tapered waveguide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/42Coupling light guides with opto-electronic elements
    • G02B6/4201Packages, e.g. shape, construction, internal or external details
    • G02B6/4202Packages, e.g. shape, construction, internal or external details for coupling an active element with fibres without intermediate optical elements, e.g. fibres with plane ends, fibres with shaped ends, bundles
    • G02B6/4203Optical features
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083Constructional arrangements
    • G02B2006/12121Laser
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083Constructional arrangements
    • G02B2006/12128Multiple Quantum Well [MQW]
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166Manufacturing methods
    • G02B2006/12195Tapering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/0225Out-coupling of light
    • H01S5/02251Out-coupling of light using optical fibres
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1003Waveguide having a modified shape along the axis, e.g. branched, curved, tapered, voids
    • H01S5/1014Tapered waveguide, e.g. spotsize converter
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1028Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1039Details on the cavity length
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1053Comprising an active region having a varying composition or cross-section in a specific direction
    • H01S5/1064Comprising an active region having a varying composition or cross-section in a specific direction varying width along the optical axis
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/16Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/34Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34306Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biophysics (AREA)
  • Optical Integrated Circuits (AREA)
  • Semiconductor Lasers (AREA)
  • Bipolar Transistors (AREA)
  • Noodles (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Optical Couplings Of Light Guides (AREA)

Abstract

UN DISPOSITIVO OPTICO SEMICONDUCTOR, POR EJEMPLO UN LASER, TIENE UNA GUIA DE ONDAS OPTICA COMPUESTA, QUE COMPRENDE UNA GUIA DE ONDAS ACTIVA, CONICA, MQW (1), EN CONTACTO OPTICO CON UNA GUIA DE ONDAS PASIVA, SUBSTANCIALMENTE PLANA (2). EL MODO OPTICO FUNDAMENTAL SOPORTADO POR LA GUIA DE ONDAS COMPUESTA VARIA A LO LARGO DE LA LONGITUD DE LA GUIA DE ONDAS COMPUESTA DE MANERA QUE, EN UN LASER, EL MODO DEL LASER SE AGRANDA Y ENCAJA MEJOR CON UNA FIBRA OPTICA DE MODO SIMPLE. TAMBIEN SE PRESENTA UN METODO PARA HACER LOS DISPOSITIVOS OPTICOS SEMICONDUCTORES.
ES95909047T 1994-02-24 1995-02-24 Dispositivo semiconductor. Expired - Lifetime ES2153471T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP94301309 1994-02-24

Publications (1)

Publication Number Publication Date
ES2153471T3 true ES2153471T3 (es) 2001-03-01

Family

ID=8217579

Family Applications (1)

Application Number Title Priority Date Filing Date
ES95909047T Expired - Lifetime ES2153471T3 (es) 1994-02-24 1995-02-24 Dispositivo semiconductor.

Country Status (12)

Country Link
EP (1) EP0746887B1 (es)
JP (1) JPH09509533A (es)
KR (1) KR100321525B1 (es)
CN (1) CN1214499C (es)
AT (1) ATE197359T1 (es)
AU (1) AU692840B2 (es)
CA (1) CA2182591C (es)
DE (1) DE69519286T2 (es)
ES (1) ES2153471T3 (es)
NO (1) NO963535L (es)
NZ (1) NZ279888A (es)
WO (1) WO1995023445A1 (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19712620A1 (de) * 1997-03-26 1998-10-01 Univ Schiller Jena Laserdiode mit geringem Abstrahlwinkel in der Form eines Streifenwellenleiters und Verfahren zu ihrer Herstellung
GB2326020B (en) * 1997-06-06 2002-05-15 Ericsson Telefon Ab L M Waveguide
KR100928963B1 (ko) * 2003-01-10 2009-11-26 삼성전자주식회사 양자우물을 가지는 광소자
US8488923B2 (en) * 2010-03-29 2013-07-16 Intel Corporation Multimode optical coupler interfaces
CN102570310B (zh) * 2012-01-05 2014-04-23 中国电子科技集团公司第十三研究所 基于环形谐振腔的多波长半导体激光器
EP3145037B1 (en) 2015-09-21 2021-04-07 Huawei Technologies Co., Ltd. Semiconductor optical apparatus
CN106553355A (zh) * 2015-09-25 2017-04-05 北京百慕航材高科技股份有限公司 一种碳纤维复合材料假脚成型工艺
CN107402415B (zh) * 2016-05-20 2020-10-30 福州高意光学有限公司 一种复合光学楔角片及其制作方法
CN105826815B (zh) * 2016-05-30 2019-04-30 中国科学院半导体研究所 980nm半导体激光器结构及制备方法
WO2019090477A1 (zh) * 2017-11-07 2019-05-16 华为技术有限公司 光波导、单光子源及光波导的制作方法
JP2023176882A (ja) * 2022-06-01 2023-12-13 国立大学法人九州大学 光学素子および光学素子の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58114476A (ja) * 1981-12-28 1983-07-07 Kokusai Denshin Denwa Co Ltd <Kdd> 半導体レ−ザ
JPS6258692A (ja) * 1985-09-09 1987-03-14 Furukawa Electric Co Ltd:The 半導体発光装置の製造方法
GB2195822B (en) * 1986-09-30 1990-01-24 Stc Plc Injection lasers
FR2684823B1 (fr) * 1991-12-04 1994-01-21 Alcatel Alsthom Cie Gle Electric Composant optique semi-conducteur a mode de sortie elargi et son procede de fabrication.

Also Published As

Publication number Publication date
KR100321525B1 (ko) 2002-06-27
EP0746887B1 (en) 2000-11-02
AU1714995A (en) 1995-09-11
NZ279888A (en) 1997-01-29
CN1214499C (zh) 2005-08-10
NO963535L (no) 1996-08-23
CA2182591C (en) 2000-10-03
JPH09509533A (ja) 1997-09-22
DE69519286D1 (de) 2000-12-07
WO1995023445A1 (en) 1995-08-31
DE69519286T2 (de) 2001-05-23
CN1142284A (zh) 1997-02-05
EP0746887A1 (en) 1996-12-11
CA2182591A1 (en) 1995-08-31
AU692840B2 (en) 1998-06-18
ATE197359T1 (de) 2000-11-15

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