ES2131368T3 - Baño alcalino o neutro para la deposicion galvanica de paladio o aleaciones de paladio. - Google Patents
Baño alcalino o neutro para la deposicion galvanica de paladio o aleaciones de paladio.Info
- Publication number
- ES2131368T3 ES2131368T3 ES96112583T ES96112583T ES2131368T3 ES 2131368 T3 ES2131368 T3 ES 2131368T3 ES 96112583 T ES96112583 T ES 96112583T ES 96112583 T ES96112583 T ES 96112583T ES 2131368 T3 ES2131368 T3 ES 2131368T3
- Authority
- ES
- Spain
- Prior art keywords
- paladium
- alloys
- alkaline
- neutral
- bathroom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Conductive Materials (AREA)
Abstract
BAÑO ALCALINO O NEUTRO PARA LA DEPOSICION GALVANICA DE PALADIO O ALEACIONES DE PALADIO, QUE CONTIENE 2 A 25 G/L DE PALADIO COMO COMPLEJO DE DIAMINO-DICLORO-PALADIO, 0,01 MOL A 1 MOL DE NITRITO (-NO{SUB,2}) POR MOL DE PALADIO, AL MENOS UNA SAL CONDUCTORA, PREFERIBLEMENTE TAMBIEN UNA SUSTANCIA AMORTIGUADORA, UN ABRILLANTADOR Y UN HUMECTANTE, Y AGUA.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19528800A DE19528800C2 (de) | 1995-08-04 | 1995-08-04 | Alkalisches oder neutrales Bad zur galvanischen Abscheidung von Palladium oder Legierungen des Palladiums |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2131368T3 true ES2131368T3 (es) | 1999-07-16 |
Family
ID=7768770
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES96112583T Expired - Lifetime ES2131368T3 (es) | 1995-08-04 | 1996-08-03 | Baño alcalino o neutro para la deposicion galvanica de paladio o aleaciones de paladio. |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0757121B1 (es) |
AT (1) | ATE176935T1 (es) |
DE (2) | DE19528800C2 (es) |
ES (1) | ES2131368T3 (es) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19803818A1 (de) * | 1997-11-15 | 1999-05-27 | Doduco Gmbh | Elektrolytisches Bad zum Abscheiden von Palladium und von Legierungen des Palladiums |
EP1396559A4 (en) * | 1999-10-27 | 2006-10-11 | Kojima Chemicals Co Ltd | PALLADIUM GALVANOPLASTY SOLUTION |
EP2581470B1 (en) | 2011-10-12 | 2016-09-28 | ATOTECH Deutschland GmbH | Electroless palladium plating bath composition |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE8106867L (sv) * | 1980-12-11 | 1982-06-12 | Hooker Chemicals Plastics Corp | Elektrolytisk avsettning av palladium och palladiumlegeringar |
DD290546A7 (de) * | 1989-09-29 | 1991-06-06 | Saxonia Ag,De | Verfahren zur herstellung von diammindinitropalladium (ii) |
-
1995
- 1995-08-04 DE DE19528800A patent/DE19528800C2/de not_active Expired - Fee Related
-
1996
- 1996-08-03 ES ES96112583T patent/ES2131368T3/es not_active Expired - Lifetime
- 1996-08-03 DE DE59601331T patent/DE59601331D1/de not_active Expired - Lifetime
- 1996-08-03 EP EP96112583A patent/EP0757121B1/de not_active Expired - Lifetime
- 1996-08-03 AT AT96112583T patent/ATE176935T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0757121A1 (de) | 1997-02-05 |
ATE176935T1 (de) | 1999-03-15 |
EP0757121B1 (de) | 1999-02-24 |
DE19528800A1 (de) | 1997-05-15 |
DE19528800C2 (de) | 1999-05-06 |
DE59601331D1 (de) | 1999-04-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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