ES2037611B1 - Nuevos modelos, monomeros y polimeros fotosensibles y portadores del grupo-p-nitronaftil-aminocarbonilo. su procedimiento de preparacion. - Google Patents

Nuevos modelos, monomeros y polimeros fotosensibles y portadores del grupo-p-nitronaftil-aminocarbonilo. su procedimiento de preparacion.

Info

Publication number
ES2037611B1
ES2037611B1 ES9102725A ES9102725A ES2037611B1 ES 2037611 B1 ES2037611 B1 ES 2037611B1 ES 9102725 A ES9102725 A ES 9102725A ES 9102725 A ES9102725 A ES 9102725A ES 2037611 B1 ES2037611 B1 ES 2037611B1
Authority
ES
Spain
Prior art keywords
aminocarbonilo
polymers
group
new models
nitronaftil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
ES9102725A
Other languages
English (en)
Other versions
ES2037611A1 (es
Inventor
Munoz R Sastre
Lapuente F Catalina
Sarobe P Bosch
Lopez J L Mateo
Alzamora F Diaz
Dominguez F Tagle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Consejo Superior de Investigaciones Cientificas CSIC
Original Assignee
Consejo Superior de Investigaciones Cientificas CSIC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consejo Superior de Investigaciones Cientificas CSIC filed Critical Consejo Superior de Investigaciones Cientificas CSIC
Priority to ES9102725A priority Critical patent/ES2037611B1/es
Priority to PCT/ES1992/000078 priority patent/WO1993011096A1/es
Publication of ES2037611A1 publication Critical patent/ES2037611A1/es
Application granted granted Critical
Publication of ES2037611B1 publication Critical patent/ES2037611B1/es
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C233/00Carboxylic acid amides
    • C07C233/64Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings
    • C07C233/66Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C233/00Carboxylic acid amides
    • C07C233/01Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C233/12Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
    • C07C233/15Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/52Amides or imides
    • C08F20/54Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F20/60Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

NUEVOS MODELOS, MONOMEROS Y POLIMEROS FOTOSENSIBLES Y PORTADORES DEL GRUPO P-NITRONAFTIL-AMINOCARBONILO. SU PROCEDIMIENTO DE PREPARACION. LA PRESENTE PATENTE DE INVENCION SE REFIERE A LA PREPARACION DE NUEVOS MODELOS, MONOMEROS Y POLIMEROS QUE CONTIENEN EL GRUPO PARANITRO-NAFTIL-AMINOCARBONILO, ASI COMO SU APLICACION COMO FOTOSENSIBILIZADORES DE REACCIONES ORGANICA Y TAMBIEN COMO FOTOINDICADORES DE POLIMERIZACION CUANDO SE USAN EN COMBINACION COMO AMINAS TERCIARIAS CONVENCIONALES. SON DE USO EN EL FOTOCURADO DE RECUBRIMIENTOS, BARNICES, TINTAS Y PINTURAS, BAJO IRRADIACION CON LUZ ULTRAVIOLETA, NATURAL O ARTIFICIAL, PRESENTANDO UNA ELEVADA EFICACIA O RENDIMIENTO CUANTICO DE POLIMERIZACION.
ES9102725A 1991-12-04 1991-12-04 Nuevos modelos, monomeros y polimeros fotosensibles y portadores del grupo-p-nitronaftil-aminocarbonilo. su procedimiento de preparacion. Expired - Fee Related ES2037611B1 (es)

Priority Applications (2)

Application Number Priority Date Filing Date Title
ES9102725A ES2037611B1 (es) 1991-12-04 1991-12-04 Nuevos modelos, monomeros y polimeros fotosensibles y portadores del grupo-p-nitronaftil-aminocarbonilo. su procedimiento de preparacion.
PCT/ES1992/000078 WO1993011096A1 (es) 1991-12-04 1992-12-01 Nuevos modelos, monomeros y polymeros fotosensibles y portadores del grupo p-nitronaftil-aminocarbonilo, su procedimiento de preparacion

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ES9102725A ES2037611B1 (es) 1991-12-04 1991-12-04 Nuevos modelos, monomeros y polimeros fotosensibles y portadores del grupo-p-nitronaftil-aminocarbonilo. su procedimiento de preparacion.

Publications (2)

Publication Number Publication Date
ES2037611A1 ES2037611A1 (es) 1993-06-16
ES2037611B1 true ES2037611B1 (es) 1994-04-01

Family

ID=8274411

Family Applications (1)

Application Number Title Priority Date Filing Date
ES9102725A Expired - Fee Related ES2037611B1 (es) 1991-12-04 1991-12-04 Nuevos modelos, monomeros y polimeros fotosensibles y portadores del grupo-p-nitronaftil-aminocarbonilo. su procedimiento de preparacion.

Country Status (2)

Country Link
ES (1) ES2037611B1 (es)
WO (1) WO1993011096A1 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5809182B2 (ja) * 2013-03-26 2015-11-10 株式会社タムラ製作所 感光性樹脂組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4052280A (en) * 1975-11-06 1977-10-04 Scm Corporation Uv curing of polymerizable binders
DE3534645A1 (de) * 1985-09-28 1987-04-02 Merck Patent Gmbh Copolymerisierbare fotoinitiatoren
IT1240652B (it) * 1990-05-17 1993-12-17 Ministero Dell'universita' Fotoiniziatori n-aloammidici per polimerizzazioni radicaliche
IT1253699B (it) * 1990-06-07 1995-08-23 Mini Ricerca Scient Tecnolog Fotoiniziatori ossaziridinici per polimerizzazioni radicaliche

Also Published As

Publication number Publication date
ES2037611A1 (es) 1993-06-16
WO1993011096A1 (es) 1993-06-10

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20020425