ES2034890A1 - Liquid photosensitive resin composition for flexigraphic printing plate - Google Patents

Liquid photosensitive resin composition for flexigraphic printing plate

Info

Publication number
ES2034890A1
ES2034890A1 ES919101857A ES9101857A ES2034890A1 ES 2034890 A1 ES2034890 A1 ES 2034890A1 ES 919101857 A ES919101857 A ES 919101857A ES 9101857 A ES9101857 A ES 9101857A ES 2034890 A1 ES2034890 A1 ES 2034890A1
Authority
ES
Spain
Prior art keywords
denotes
photosensitive resin
liquid photosensitive
compsn
handleability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES919101857A
Other languages
Spanish (es)
Other versions
ES2034890B1 (en
Inventor
Masahiko Takahashi
Kenji Fujioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Publication of ES2034890A1 publication Critical patent/ES2034890A1/en
Application granted granted Critical
Publication of ES2034890B1 publication Critical patent/ES2034890B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

PURPOSE:To improve printing workability and plate handleability by specifying the liquid photosensitive resin comps. for mechanical properties to attain a required level. CONSTITUTION:This compsn. is used by using 100 pts. wt. prepolymer which contains polyether diol and polyester diol respectively having >= 1.0 X 10<3> weight average mol. wt. as segments, has the molar ratio of both diodes in a 1/2 to 2/1 range and is (meth)acrylated at both terminals, 20 to 60 wt.% ethylenic addition polymerizable monomer contg. 45 to 95 wt.% monofunctional monomer expressed by formula I and 5 to 15 wt.% multifunctional monomer expressed by formula II, 0.1 to 5.0wt.% photopolymn. initiator, and 0.01 to 1.0 wt.% thermal polymn. inhibitor as essential components and is composed by specifying the notch cracking resistance of the cured matter of the compsn. to >= 20 seconds. In the formulas, R1 denotes H or CH3 R2 denotes a residual alcohol group X denotes a residual polyol group (n) denotes 2 to 6. The printing workability and the plate handleability are improved in this way.
ES09101857A 1990-08-08 1991-08-08 "LIQUID COMPOSITE OF PHOTOCURABLE RESIN FOR THE MANUFACTURE OF PLATES FOR FLEXOGRAPHIC PRINTING AND ITS MANUFACTURING PROCEDURE". Expired - Fee Related ES2034890B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2207975A JP2944164B2 (en) 1990-08-08 1990-08-08 Liquid photosensitive resin composition for flexographic printing plates

Publications (2)

Publication Number Publication Date
ES2034890A1 true ES2034890A1 (en) 1993-04-01
ES2034890B1 ES2034890B1 (en) 1995-11-01

Family

ID=16548607

Family Applications (1)

Application Number Title Priority Date Filing Date
ES09101857A Expired - Fee Related ES2034890B1 (en) 1990-08-08 1991-08-08 "LIQUID COMPOSITE OF PHOTOCURABLE RESIN FOR THE MANUFACTURE OF PLATES FOR FLEXOGRAPHIC PRINTING AND ITS MANUFACTURING PROCEDURE".

Country Status (5)

Country Link
JP (1) JP2944164B2 (en)
BE (1) BE1004496A5 (en)
ES (1) ES2034890B1 (en)
FR (1) FR2665774A1 (en)
IT (1) IT1251162B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2080027A1 (en) * 1993-06-18 1996-01-16 Asahi Chemical Ind Photosensitive resin composition for corrugated board printing plate

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995023998A1 (en) * 1994-03-04 1995-09-08 Asahi Kasei Kogyo Kabushiki Kaisha Liquid photosensitive resin composition for forming relief structures
JP5164982B2 (en) 2007-06-18 2013-03-21 旭化成イーマテリアルズ株式会社 Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate
JP5466689B2 (en) * 2011-11-30 2014-04-09 富士フイルム株式会社 Resin composition for flexographic printing plate, flexographic printing plate precursor and production method thereof, and flexographic printing plate and production method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0154512A2 (en) * 1984-03-06 1985-09-11 W.R. Grace & Co.-Conn. Tapered di-block copolymer photopolymerizable composition
GB2179360A (en) * 1985-08-12 1987-03-04 Uniroyal Plastics Aqueous developable photopolymer compositions
EP0348063A1 (en) * 1988-06-10 1989-12-27 Asahi Kasei Kogyo Kabushiki Kaisha Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition
EP0356954A2 (en) * 1988-08-30 1990-03-07 E.I. Du Pont De Nemours And Company A plasticized polyvinyl alcohol release layer for a flexographic printing plate
EP0468667A2 (en) * 1990-07-26 1992-01-29 Minnesota Mining And Manufacturing Company Flexographic printing plate compositions

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL129237C (en) * 1965-03-11
JPS53143669A (en) * 1977-05-23 1978-12-14 Asahi Chem Ind Co Ltd Elimination of surface tuckiness of radically-polymerizable resin cured product
JPH07113767B2 (en) * 1986-10-02 1995-12-06 旭化成工業株式会社 Photosensitive resin printing plate for step ball printing
JP2653458B2 (en) * 1988-03-26 1997-09-17 旭化成工業株式会社 Photosensitive resin composition for letterpress printing plates

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0154512A2 (en) * 1984-03-06 1985-09-11 W.R. Grace & Co.-Conn. Tapered di-block copolymer photopolymerizable composition
GB2179360A (en) * 1985-08-12 1987-03-04 Uniroyal Plastics Aqueous developable photopolymer compositions
EP0348063A1 (en) * 1988-06-10 1989-12-27 Asahi Kasei Kogyo Kabushiki Kaisha Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition
EP0356954A2 (en) * 1988-08-30 1990-03-07 E.I. Du Pont De Nemours And Company A plasticized polyvinyl alcohol release layer for a flexographic printing plate
EP0468667A2 (en) * 1990-07-26 1992-01-29 Minnesota Mining And Manufacturing Company Flexographic printing plate compositions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2080027A1 (en) * 1993-06-18 1996-01-16 Asahi Chemical Ind Photosensitive resin composition for corrugated board printing plate

Also Published As

Publication number Publication date
IT1251162B (en) 1995-05-04
JP2944164B2 (en) 1999-08-30
ITMI912228A1 (en) 1992-02-09
JPH0495959A (en) 1992-03-27
FR2665774B1 (en) 1997-02-14
BE1004496A5 (en) 1992-12-01
ITMI912228A0 (en) 1991-08-08
FR2665774A1 (en) 1992-02-14
ES2034890B1 (en) 1995-11-01

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Legal Events

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FD2A Announcement of lapse in spain

Effective date: 20111201