EP4312085A1 - Verfahren zur herstellung einer uhrenkomponente - Google Patents

Verfahren zur herstellung einer uhrenkomponente Download PDF

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Publication number
EP4312085A1
EP4312085A1 EP22187582.6A EP22187582A EP4312085A1 EP 4312085 A1 EP4312085 A1 EP 4312085A1 EP 22187582 A EP22187582 A EP 22187582A EP 4312085 A1 EP4312085 A1 EP 4312085A1
Authority
EP
European Patent Office
Prior art keywords
cavity
layer
metallic
metal
watch component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP22187582.6A
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English (en)
French (fr)
Inventor
Florian Calame
Valentin GÄUMANN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rolex SA
Original Assignee
Rolex SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rolex SA filed Critical Rolex SA
Priority to EP22187582.6A priority Critical patent/EP4312085A1/de
Priority to US18/357,096 priority patent/US20240036522A1/en
Priority to JP2023121499A priority patent/JP2024019087A/ja
Priority to CN202310939105.2A priority patent/CN117471891A/zh
Publication of EP4312085A1 publication Critical patent/EP4312085A1/de
Pending legal-status Critical Current

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    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B45/00—Time pieces of which the indicating means or cases provoke special effects, e.g. aesthetic effects
    • G04B45/0038—Figures or parts thereof moved by the clockwork
    • G04B45/0061—Moving parts of the clockwork, e.g. pendulum, hands in special form, mostly constructed as a figure
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/04—Hands; Discs with a single mark or the like
    • G04B19/042—Construction and manufacture of the hands; arrangements for increasing reading accuracy
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/06—Dials
    • G04B19/18—Graduations on the crystal or glass, on the bezel, or on the rim
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/28—Adjustable guide marks or pointers for indicating determined points of time
    • G04B19/283—Adjustable guide marks or pointers for indicating determined points of time on rotatable rings, i.e. bezel
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B45/00—Time pieces of which the indicating means or cases provoke special effects, e.g. aesthetic effects
    • G04B45/0076—Decoration of the case and of parts thereof, e.g. as a method of manufacture thereof
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G04D3/0089—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the regulating mechanism, e.g. coil springs
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B13/00—Gearwork
    • G04B13/02—Wheels; Pinions; Spindles; Pivots
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G04D3/0079—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for gearwork components
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G04D3/0087—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the escapement mechanism, e.g. lever escapement, escape wheel

Definitions

  • the present invention relates to a method of manufacturing a watch component. It also relates to a watch component as such obtained by such a manufacturing process.
  • a watch movement component is often smaller in size, and includes functional parts of very precise geometry, which must not be altered. Thus, it is very difficult to make a marking on such a watch movement component, for example for the purpose of identification or decoration.
  • the present invention particularly aims to find a solution for marking and/or decorating a watch component, in particular a watch movement component, which makes it possible to achieve a particularly attractive visual effect without deteriorating the functionality of the component. .
  • the invention implements a method of manufacturing a watch component which advantageously combines at least one engraving step and a coloring step of said engraving obtained, so as to obtain a visible engraving which does not impact the functional performance of 'a component of movement.
  • the manufacturing process according to one embodiment of the invention will be illustrated in the context of the manufacturing of a watch movement component, which can for example be a spiral spring.
  • THE figures 1a to 1g illustrate more particularly sectional views of a watch component 1, in particular a watch movement component, or of a blank 1a of the watch component 1, during the different stages of its manufacture according to one embodiment of a manufacturing process of the watch component.
  • the manufacturing process of the invention focuses more particularly on a specific phase of manufacturing, relating to a process for engraving a surface.
  • this is a process for engraving a visible surface or an upper surface of the watch component 1, in particular for decorative purposes.
  • it could also be a process of engraving a non-visible surface or a lower surface, in particular for identification or marking purposes.
  • the method comprises a first step consisting of making available E1 at least one portion of a watch component 1 or of a blank 1a of the watch component 1, specifically shown in section on the figure 1a .
  • a first step consisting of making available E1 at least one portion of a watch component 1 or of a blank 1a of the watch component 1, specifically shown in section on the figure 1a .
  • several blanks 1a can be linked to the same support or substrate 10a, and simultaneously be subject to the process which will be described below and the steps of which are summarized by the flowchart of the figure 2 .
  • the watch component blanks 1a can therefore be manufactured by micro-manufacturing operations from a substrate 10a, which is preferably made of micro-machinable material or based on micro-machinable material.
  • a substrate 10a which is preferably made of micro-machinable material or based on micro-machinable material.
  • the term blank in the broad sense, to designate any intermediate element in the manufacturing process of the watch component.
  • the blank can be a simple substrate made available and not yet engraved, or a substrate already partially engraved, for example to define all or part of the outline of the future watch component.
  • the terms blank 1a or watch component 1 will be alternately used to designate the same component, even if watch component 1 is still being manufactured.
  • the portion of the blank 1a on which the invention is implemented comprises a surface 11 which will be specifically treated by the method according to the invention, with the aim of creating visible patterns or indications on this surface 11, as follows will be detailed later.
  • the substrate 10a may be made of a micro-machinable material or based on a micro-machinable material.
  • the substrate may comprise all or part of the silicon, in any form. It can thus include monocrystalline silicon whatever its orientation, polycrystalline silicon, amorphous silicon, amorphous silicon dioxide, doped silicon whatever the type and level of doping. It can in particular be in the form of an SOI (silicon on insulator) substrate. Alternatively, it may include quartz, diamond, glass, ceramic, ruby, sapphire, or silicon carbide. Alternatively, it may be made of metal or a metal alloy, in particular an at least partially amorphous metal alloy. For example, it may comprise nickel or nickel-phosphorus, or even steel, titanium, a gold alloy, or a platinum alloy.
  • FIG. 1b illustrates a second step of the process consisting of engraving E3 said surface 11 of the watch component 1 or of a blank 1a of the watch component 1 to form at least one cavity 7.
  • the engraving is carried out by the technology of deep ionic reactive engraving (DRIE acronym in English).
  • DRIE deep ionic reactive engraving
  • This technique makes it possible to form cavities 7 with vertical or substantially vertical sides 18 to the right of the openings of a layer of resin forming a mask, without impacting the areas of the surface 11 covered with the layer of resin.
  • the etching step etches the silicon, so as to form at least one cavity 7.
  • Each cavity 7 has a section of substantially rectangular shape, delimited by a surface forming a bottom 17, substantially parallel to the surface 11 of the component .
  • the depth of a cavity is measured perpendicular to the surface 11, and corresponds to the respective distance between the planes of the surface 11 and the bottom 17 of the cavity. More generally, the at least one cavity 7 has sides 18 forming advantageously a discontinuity relative to the rest of the surface 11 of the blank 1a.
  • the depth of at least one or all of the cavities 7 is less than 10 ⁇ m.
  • this depth is preferably equal to or greater than the thickness of a layer of silicon dioxide 13, which is optional.
  • such a step consisting of etching E3 by deep ionic reactive etching also makes it possible to obtain a bottom 17 whose surface state is in particular characterized by a particularly low roughness, with in particular a bottom 17 having a roughness Ra less than 50 nm, preferably of the order of 20 nm, or less than 20 nm, and/or a roughness Sa less than 100 nm, preferably of the order of 80 nm, or less than 80 nm, which allows the brightness of the layer of material subsequently deposited on such a background 17 to be revealed, as will be explained.
  • this step consisting of engraving E3 the surface 11 of the watch component 1 is advantageously carried out in the same operation as a step consisting of engraving a contour of said watch component 1.
  • this step consisting of engraving E3 said surface of the portion of said watch component 1 can be carried out before a step consisting of engraving a contour of said watch component 1.
  • the method can comprise a step of positioning a first mask, not shown, on the substrate 10a, in particular on said surface 11 of said substrate 10a, so as to carry out the step consisting of etching E3 at least one cavity 7 from this first mask, in particular blind etching, by deep ion reactive etching (DRIE) technology, and a step of positioning a second mask, not shown, on said substrate 10a, in particular on another surface of said substrate 10a, so as to engrave an outline of the blank 1a of watch component 1 from this second mask.
  • DRIE deep ion reactive etching
  • the engraving serving to cut the component from the substrate and the engraving forming at least one cavity according to the invention can be carried out in the same operation, or partially in the same operation. These two engravings are made from different masks.
  • DRIE deep reactive ion etching
  • the engraving may include the implementation of laser engraving, in particular by a femtosecond laser.
  • the method then comprises, in one embodiment of use of a substrate 10a comprising all or part of the silicon, an optional step consisting of oxidizing E8 the surface of the blank 1a.
  • the surface 11 of the blank 1a then comprises a layer of silicon dioxide (SiO 2 ) 13.
  • This layer of silicon dioxide 13 is in particular formed on the upper surface 11, including at least one bottom 17 of a cavity 7
  • this layer of silicon dioxide 13 is notably formed on the upper surface 11 and on at least one bottom 17 of a cavity.
  • the method then comprises a step consisting of depositing E7 a metallic or metallic alloy layer 22 on said surface 11 of the blank 1a, both in the at least one cavity 7, more precisely on the bottom 17 of the at least one cavity 7, and outside of at least one cavity 7.
  • this metallic layer or metal alloy 22 is a layer of chromium.
  • the metal or metal alloy may be aluminum, or titanium, or an alloy of aluminum, chromium, or titanium.
  • This step consisting of depositing E7 the metal or metal alloy layer 22 can be carried out by a directional deposition, in particular a physical vapor deposition (PVD), in particular by a deposition by thermal evaporation by electron beam (EBE).
  • PVD physical vapor deposition
  • EBE thermal evaporation by electron beam
  • the metal or metal alloy layer 22 could only extend over a negligible part of the sides 18, in particular a lower part extending from the bottom 17, for example a lower part extending from the bottom 17 on a distance less than 1 ⁇ m, and not going as far as the border with the surface 11 outside the cavity 7.
  • the sacrificial layer function of this metal or metal alloy layer 22, which will be detailed later, is optimal for small thicknesses of this layer, in particular a thickness less than or equal to 100 nm .
  • the method then implements a fourth step consisting of depositing a material E4 on the surface of the component, more precisely on the metal or metal alloy layer 22, at least at the level of the at least one cavity 7 and possibly on the surface 11 outside the cavity 7.
  • the material is a metal or a metallic alloy
  • this deposition step forms at least one layer of metallic or metallic alloy material 8, as represented by the figure 1e . It is more particularly a single and same layer of gold 8 on the figure 1e .
  • the material is a metal forming part of the group Au, Ag, Cr, CrN, Ni, Pt, TiN, ZrN, Pd or their alloys, unless incompatibility with the metallic layer or metallic alloy 22.
  • this material could not be metallic, as will be clarified later.
  • the thickness of this at least one layer of material 8 can be of the order of a few nanometers. It is preferably at least 5 nm, or even at least 10 nm, or even at least 50 nm, or even at least 100 nm. More particularly, it is preferably between 5 nm and 1000 nm, or even between 100 nm and 1000 nm. A thickness between 100 nm and 200 nm forms a good solution, as will be described below.
  • the step of deposition of a material E4 may include the deposition of a single layer. Alternatively, this deposition step may comprise the successive deposition of two or more distinct layers.
  • the material deposition step E4 is carried out by a directional deposition, in particular a physical vapor deposition (PVD acronym in English), in particular by thermal evaporation by electron beam (Electron Beam Evaporation or EBE) . More generally, this deposition can be a vapor phase deposition, such as the aforementioned physical deposition (PVD) or a chemical deposition (CVD) or an atomic deposition (ALD).
  • PVD physical vapor deposition
  • EBE electron beam
  • this deposition can be a vapor phase deposition, such as the aforementioned physical deposition (PVD) or a chemical deposition (CVD) or an atomic deposition (ALD).
  • the material deposition step E4 may comprise a first prior sub-step of affixing a mask 24, for example a rigid mask or a template, such as a silicon mask 24, to reduce the extent of the surface 11 concerned by the deposition of the layer of material 8 on the metallic or metallic alloy layer 22 around the cavities 7, in order to promote the subsequent step E5 of removal of the metallic or metallic alloy layer 22, which will be described below.
  • a mask 24 for example a rigid mask or a template, such as a silicon mask 24, to reduce the extent of the surface 11 concerned by the deposition of the layer of material 8 on the metallic or metallic alloy layer 22 around the cavities 7, in order to promote the subsequent step E5 of removal of the metallic or metallic alloy layer 22, which will be described below.
  • the pattern of the mask 24 can correspond exactly to the patterns of the cavities 7 to deposit the material only in the cavities 7.
  • the pattern of the mask 24 does not need to correspond exactly to the pattern formed by the cavities 7 on the surface 11, and can reveal a narrow surface of the surface of the component around the cavities, as represented by the figure 1e .
  • a layer of material 8 is also deposited outside the cavities 7, on the surface of the component.
  • the mask 24 comprises at least one opening superimposed on the at least one cavity 7, of surface greater than or equal to the surface of the cavity, so as not to cover the at least one cavity.
  • the mask 24 delimits therefore a reduced surface relative to the total surface 11 of the component portion considered, on which the deposition of material is carried out.
  • the material deposition step E4 also includes a second final sub-step of removing the mask 24, after the end of the deposition of the material, to achieve the result represented by the figure 1f .
  • the metallic or metallic alloy layer 22 deposited on the surface of the component separates this surface from the layer of material 8.
  • This metallic or metallic alloy layer 22 thus fulfills a first separation function with respect to the deposit of material.
  • the method then comprises a step consisting of removing E5 the metal or metal alloy layer 22 deposited outside said at least one cavity, in particular by selective chemical attack.
  • this step can implement a lifting (known by its English name “lift-off") of the chromium layer by means of a selective chemical attack, in particular by means of a bath of acid.
  • This attack is such that it removes the metal or metal alloy layer 22 without damaging the surface 11 of the watch component, in particular without damaging the silicon dioxide layer according to this embodiment.
  • the dissolution of the metal or metal alloy layer 22 induces at the same time the removal of the layer of material 8 located outside the cavities 7.
  • the final result is illustrated by the figure 1g .
  • the metal or metal alloy layer 22 thus fulfills the function of sacrificial layer, which allows easy removal of the layer of material deposited outside the cavities, the final desire being to only retain this material in the cavities.
  • the perfect covering of the material layer 8 on the metal or metal alloy layer 22 present in the cavities 7 allows these layers not to be impacted by the removal step E5.
  • these two layers 22, 8 remain present in the cavities 7.
  • the metal or metal alloy layer 22 advantageously fulfills a second function of bonding layer of the material layer 8 within the cavities, by improving the adhesion of the layer of material 8 on component 1.
  • the metal or metal alloy layer 22 at the level of the at least one cavity 7.
  • the metallic or alloy layer metal 22 only extends over the bottom 17 of the cavity 7 or does not extend over the sides 18, or extends over a negligible height of the sides 18, in particular not in the upper part of the sides.
  • the at least one cavity 7 itself to have a discontinuity at the border between the surface 11 and the sides 18 of the cavity 7.
  • the thickness of the layer of material 8 is sufficiently thick so that it can completely cover the metal or metal alloy layer 22 in the cavities 7, in particular at least on the bottom 17 of the cavities 7, and not present holes likely to allow acid to pass through during a chemical attack carried out in this removal step.
  • the thickness of the layer of material 8 is at least 100 nm, in particular is between 100 nm to 200 nm.
  • the thickness of the material layer 8 is preferentially greater than that of the metallic or metallic alloy layer 22.
  • any configuration bringing together all or part of the characteristics proposed above, making it possible to make the metallic layer or metal alloy 22 not accessible inside the at least one cavity 7, is very advantageous for guaranteeing the non-removal of the two superimposed layers 22, 8 at the level of the at least one cavity.
  • the method can include an optional step consisting of detaching E6 the blanks 1a from the substrate 10a.
  • the component blank 1a may include a partially engraved break zone, in particular as described in the document EP3632839A1 .
  • the composition of the metal or metal alloy layer 22 will be adapted on a case-by-case basis to that of the layer of material 8 chosen, for example as a function of the material chosen and/or its thickness.
  • the metallic or metallic alloy layer 22 will have a composition different from that of the material layer 8 in the case where the latter is metallic.
  • the step consisting of depositing E4 a material consists of a step of applying to the bottom 17 of the cavities 7 a layer of material 8 which is a layer of paint, applied by any technique known to those skilled in the art, such as a spraying technique or using a brush.
  • a layer of a lacquer, varnish or composite, in particular a luminescent composite can be applied.
  • the thickness of said layer of material 8 can correspond substantially to the depth of the cavity 7 in which it is deposited. In this scenario, the thickness of said layer of material 8 can preferably be very slightly less than the depth of the cavity 7.
  • all the steps could be implemented on a component blank 1a alone, not linked to a substrate. They can also be implemented at different stages of manufacturing. of a watch component, that is to say on a blank of such a watch component, during manufacture, or even directly on a finalized or almost finalized watch component.
  • Such a process is particularly suitable for the manufacture of a spiral spring, using the variant consisting of making the cavities of the invention before engraving the turns, otherwise it would be difficult in practice to position a liquid resin on turns to etch the cavities of the invention since resin would flow between these turns, in the case where step E3 is a deep reactive ion etching step.
  • the depth of at least one cavity, and preferably of all the cavities is advantageously less than 10 ⁇ m, or even less than 6 ⁇ m. This depth is also optionally greater than 3 ⁇ m. Thus, this depth can be between 3 ⁇ m and 10 ⁇ m, or even between 3 ⁇ m and 6 ⁇ m.
  • the contrast between at least one cavity 7 and the surface 11 is all the more marked as the depth of said at least one cavity 7 is low for a small format watch component such as than a watch movement component such as a spiral spring. This is all the more notable when the layer of material 8 is metallic or a metallic alloy and that the component comprises in particular all or part of the silicon.
  • the depth of at least one cavity, and preferably of all the cavities can also be greater than or equal to the thickness of a possible coating of silicon dioxide 13 present on said surface when the component comprises all or part of silicon.
  • a silicon dioxide coating may comprise a thickness of between 0.1 ⁇ m and 5 ⁇ m.
  • the depth of at least one cavity, and preferably of all the cavities is between 10 ⁇ m and 100 ⁇ m, or even between 15 ⁇ m and 80 ⁇ m, or even between 20 ⁇ m and 50 ⁇ m.
  • At least one cavity may also have a length of at least 100 ⁇ m, or even at least 150 ⁇ m, or even at least 200 ⁇ m, or even at least 250 ⁇ m, in at least one direction. This length may be less than or equal to 800 ⁇ m, or even less than or equal to 600 ⁇ m, or even less than or equal to 500 ⁇ m, or even less than or equal to 400 ⁇ m.
  • the material deposited in the at least one cavity may be a metal or a metal alloy. Alternatively, it can be a paint, a lacquer, a varnish, a composite, in particular in particular a luminescent composite, with optionally an intermediate metallic bonding layer.
  • the material deposited in the at least one cavity advantageously has a thickness strictly less than the depth of the cavity.
  • the deposit thickness can be greater than or equal to 100 nm. It can be between 100 nm and 1000 nm, advantageously between 100 nm and 200 nm. Alternatively, it may have a thickness equal to or substantially equal to the depth of the cavity. Furthermore, the sum of the thickness of the material layer 8 and the thickness of the metal or metal alloy layer 22 may be strictly less than the depth of the cavity, or substantially equal to the depth of the cavity.
  • the invention applies particularly well to any watch movement component made of micro-machinable material, that is to say obtained from micro-manufacturing techniques, in particular those involving photolithography or those involving use of a laser.
  • a watch movement component in particular its general shape, can for example be obtained, at least partially, by a deep reactive ionic engraving step (DRIE acronym in English).
  • DRIE deep reactive ionic engraving step
  • such a watch movement component, in particular its general shape can for example be obtained, at least partially, by UV-Liga technology (Lithography Galvanik Abformung).
  • the watch component according to the invention may comprise all or part of the silicon, in any form. It can thus include monocrystalline silicon whatever its orientation, polycrystalline silicon, amorphous silicon, amorphous silicon dioxide, doped silicon whatever the type and level of doping. It can in particular be manufactured from an SOI (silicon on insulator) substrate.
  • SOI silicon on insulator
  • the watch component according to the invention may also comprise silicon carbide, glass, ceramic, quartz, ruby or even sapphire.
  • it may be made of metal or a metal alloy, in particular a metal alloy that is at least partially amorphous.
  • a component may comprise nickel or nickel-phosphorus, or even steel, titanium, a gold alloy, or a platinum alloy.
  • the invention is not limited to the embodiments described, and it is possible to imagine other embodiments, for example by combining the embodiments and/or their variants.
  • the etching step E3 can combine the implementation of deep reactive ion etching using a mask obtained by photolithography and laser etching, in particular by a femtosecond laser.
  • the invention achieves the desired objects by advantageously combining engraving on a surface of a component and its partial, or even total, filling with a material, via a sacrificial metallic or metallic alloy layer. .
  • This combination makes it possible to form a readable marking, in particular a visible and attractive marking, even on a small surface, without impacting the functionality of a watch movement component.
  • this surface is an upper surface or a visible surface, in particular a visible surface when the component is assembled within a timepiece, in particular within a watch movement.
  • this surface is a lower surface or a non-visible surface.
  • the marking may be intended for decorative purposes. Alternatively or additionally, it may be provided for identification purposes.
  • the variants of the method according to the invention which involve a laser, in particular a femtosecond laser, are particularly advantageous in order to individualize the marking on a watch component, in particular a watch movement component, in particular on a particular spiral spring.
  • the marking can, for example, form a serial number or a measurement result.
  • the invention also relates to a watch component obtained by the manufacturing process described above.
  • the component may be a watch movement component such as a rocker, a wheel, for example a wheel of an escapement device, an anchor, a balance wheel or a spiral spring, in particular an oscillator spiral spring.
  • the watch component may be a trim component such as a bezel or a bezel disc, or a flange.
  • the component can be a watch movement component such as a spiral spring made of micro-machinable material comprising a first portion forming a connecting member comprising a surface, in particular an upper surface or a visible surface , and a second portion less rigid than the first portion comprising at least one blade wound in the shape of a spiral forming a spring, the surface of the first portion comprising at least one cavity in which a material according to the invention is deposited.
  • the watch component, or at least the portion comprising the surface considered by the invention is advantageously based on a micro-machinable material, in particular based on silicon, that is to say comprising by weight at least 50% micro-machinable material.
  • FIG. 3 thus illustrates a spiral spring obtained by a manufacturing process according to one of the embodiments described above. It comprises at least one blade 2 whose upper surface 12 is located in a plane P1, and whose external end is manufactured with a connecting member 3 whose rigidity is significantly greater than that of the at least one blade 2.
  • the spiral spring 1 further comprises a ferrule 4 with axis A1, which comes from manufacturing with the internal end of the at least one blade 2.
  • the connecting member 3 comprises a first central portion 31 in the form of a ring portion arranged around the blade 2, the angular extent of which is of the order of 100 degrees with respect to the axis A1.
  • This connecting member 3 also comprises two bent portions 32 arranged on either side of the first central portion 31, which each comprise a positioning element 5 and/or fixing said spiral spring, which is here in the form of an opening.
  • the connecting member 3 has the particularity of comprising patterns (or indications) 6 affixed to its upper surface 11, positioned in the plane P1, in particular at the level of its central portion 31.
  • the upper surface 11 is here formed in continuity with the upper surface 12 of the at least one leaf 2 of the spiral spring.
  • the patterns 6 result from the process described above, and include cavities 7 formed from the upper surface 11, in which a layer of material 8 is deposited.
  • the extent e of the patterns can be greater than 100 ⁇ m, or even greater than 150 ⁇ m, or even greater than 200 ⁇ m, or even greater than 250 ⁇ m. Such patterns or indications 6 can thus be visible or readable once the spiral spring 1 is mounted within an assembled balance wheel, itself assembled within a watch movement.
  • This hairspring can be a hairspring for a hairspring balance. It can be one-piece. It can be made of silicon, and it can be made from a silicon substrate or from an SOI (silicon on insulator) substrate. The surface considered by the invention can be covered with a coating of silicon dioxide.
  • the invention also relates to a timepiece comprising such a timepiece component. It relates in particular to a watch movement comprising such a watch movement component.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Micromachines (AREA)
EP22187582.6A 2022-07-28 2022-07-28 Verfahren zur herstellung einer uhrenkomponente Pending EP4312085A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP22187582.6A EP4312085A1 (de) 2022-07-28 2022-07-28 Verfahren zur herstellung einer uhrenkomponente
US18/357,096 US20240036522A1 (en) 2022-07-28 2023-07-21 Method for manufacturing a horological component
JP2023121499A JP2024019087A (ja) 2022-07-28 2023-07-26 時計部品の製造方法
CN202310939105.2A CN117471891A (zh) 2022-07-28 2023-07-28 制造钟表部件的方法

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EP22187582.6A EP4312085A1 (de) 2022-07-28 2022-07-28 Verfahren zur herstellung einer uhrenkomponente

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Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1548524A1 (de) * 2003-12-23 2005-06-29 Rolex S.A. Keramisches Element für Uhrengehäuse und Verfahren zu seiner Herstellung
EP2237698B1 (de) * 2008-01-25 2015-04-22 Commissariat à l'Énergie Atomique et aux Énergies Alternatives Mit einem graphischen element auf einem träger versehenes objekt und verfahren zur herstellung des objekts
EP2855400B1 (de) * 2012-05-30 2016-06-01 The Swatch Group Research and Development Ltd. Keramikelement mit mindestens einem verbundkeramikdekoreinsatz
JP2016113653A (ja) * 2014-12-12 2016-06-23 シチズンホールディングス株式会社 電鋳部品の製造方法とその電鋳部品
CH710716A2 (fr) * 2015-02-12 2016-08-15 Swatch Group Res & Dev Ltd Procédé de fabrication d'une pièce avec au moins un décor.
EP3339980A1 (de) * 2016-12-22 2018-06-27 The Swatch Group Research and Development Ltd Verfahren zur erzeugung eines dekormotivs auf einer uhr, und entsprechende uhr
EP2902177B1 (de) * 2014-01-30 2019-03-13 Mestel SA Verfahren zur Aufbringung eines Füllmaterials auf ein Substrat, das eine freie Oberfläche in fertigem Zustand darstellt
CH714234A1 (fr) * 2017-10-13 2019-04-15 Horlaser S A Procédé de fabrication d'une pièce et une pièce pour l'horlogerie ou la joaillerie, avec une surface comprenant du titane coloré par oxydation.
EP3632839A1 (de) 2013-12-20 2020-04-08 Rolex Sa Uhrkomponente

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1548524A1 (de) * 2003-12-23 2005-06-29 Rolex S.A. Keramisches Element für Uhrengehäuse und Verfahren zu seiner Herstellung
EP2237698B1 (de) * 2008-01-25 2015-04-22 Commissariat à l'Énergie Atomique et aux Énergies Alternatives Mit einem graphischen element auf einem träger versehenes objekt und verfahren zur herstellung des objekts
EP2855400B1 (de) * 2012-05-30 2016-06-01 The Swatch Group Research and Development Ltd. Keramikelement mit mindestens einem verbundkeramikdekoreinsatz
EP3632839A1 (de) 2013-12-20 2020-04-08 Rolex Sa Uhrkomponente
EP2902177B1 (de) * 2014-01-30 2019-03-13 Mestel SA Verfahren zur Aufbringung eines Füllmaterials auf ein Substrat, das eine freie Oberfläche in fertigem Zustand darstellt
JP2016113653A (ja) * 2014-12-12 2016-06-23 シチズンホールディングス株式会社 電鋳部品の製造方法とその電鋳部品
CH710716A2 (fr) * 2015-02-12 2016-08-15 Swatch Group Res & Dev Ltd Procédé de fabrication d'une pièce avec au moins un décor.
EP3339980A1 (de) * 2016-12-22 2018-06-27 The Swatch Group Research and Development Ltd Verfahren zur erzeugung eines dekormotivs auf einer uhr, und entsprechende uhr
CH714234A1 (fr) * 2017-10-13 2019-04-15 Horlaser S A Procédé de fabrication d'une pièce et une pièce pour l'horlogerie ou la joaillerie, avec une surface comprenant du titane coloré par oxydation.

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JP2024019087A (ja) 2024-02-08
US20240036522A1 (en) 2024-02-01

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