EP4312085A1 - Method for manufacturing a clock component - Google Patents

Method for manufacturing a clock component Download PDF

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Publication number
EP4312085A1
EP4312085A1 EP22187582.6A EP22187582A EP4312085A1 EP 4312085 A1 EP4312085 A1 EP 4312085A1 EP 22187582 A EP22187582 A EP 22187582A EP 4312085 A1 EP4312085 A1 EP 4312085A1
Authority
EP
European Patent Office
Prior art keywords
cavity
layer
metallic
metal
watch component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP22187582.6A
Other languages
German (de)
French (fr)
Inventor
Florian Calame
Valentin GÄUMANN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rolex SA
Original Assignee
Rolex SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rolex SA filed Critical Rolex SA
Priority to EP22187582.6A priority Critical patent/EP4312085A1/en
Priority to US18/357,096 priority patent/US20240036522A1/en
Priority to JP2023121499A priority patent/JP2024019087A/en
Priority to CN202310939105.2A priority patent/CN117471891A/en
Publication of EP4312085A1 publication Critical patent/EP4312085A1/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B45/00—Time pieces of which the indicating means or cases provoke special effects, e.g. aesthetic effects
    • G04B45/0038—Figures or parts thereof moved by the clockwork
    • G04B45/0061—Moving parts of the clockwork, e.g. pendulum, hands in special form, mostly constructed as a figure
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/04—Hands; Discs with a single mark or the like
    • G04B19/042—Construction and manufacture of the hands; arrangements for increasing reading accuracy
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/06—Dials
    • G04B19/18—Graduations on the crystal or glass, on the bezel, or on the rim
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/28—Adjustable guide marks or pointers for indicating determined points of time
    • G04B19/283—Adjustable guide marks or pointers for indicating determined points of time on rotatable rings, i.e. bezel
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B45/00—Time pieces of which the indicating means or cases provoke special effects, e.g. aesthetic effects
    • G04B45/0076—Decoration of the case and of parts thereof, e.g. as a method of manufacture thereof
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G04D3/0089—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the regulating mechanism, e.g. coil springs
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B13/00—Gearwork
    • G04B13/02—Wheels; Pinions; Spindles; Pivots
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G04D3/0079—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for gearwork components
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G04D3/0087—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the escapement mechanism, e.g. lever escapement, escape wheel

Definitions

  • the present invention relates to a method of manufacturing a watch component. It also relates to a watch component as such obtained by such a manufacturing process.
  • a watch movement component is often smaller in size, and includes functional parts of very precise geometry, which must not be altered. Thus, it is very difficult to make a marking on such a watch movement component, for example for the purpose of identification or decoration.
  • the present invention particularly aims to find a solution for marking and/or decorating a watch component, in particular a watch movement component, which makes it possible to achieve a particularly attractive visual effect without deteriorating the functionality of the component. .
  • the invention implements a method of manufacturing a watch component which advantageously combines at least one engraving step and a coloring step of said engraving obtained, so as to obtain a visible engraving which does not impact the functional performance of 'a component of movement.
  • the manufacturing process according to one embodiment of the invention will be illustrated in the context of the manufacturing of a watch movement component, which can for example be a spiral spring.
  • THE figures 1a to 1g illustrate more particularly sectional views of a watch component 1, in particular a watch movement component, or of a blank 1a of the watch component 1, during the different stages of its manufacture according to one embodiment of a manufacturing process of the watch component.
  • the manufacturing process of the invention focuses more particularly on a specific phase of manufacturing, relating to a process for engraving a surface.
  • this is a process for engraving a visible surface or an upper surface of the watch component 1, in particular for decorative purposes.
  • it could also be a process of engraving a non-visible surface or a lower surface, in particular for identification or marking purposes.
  • the method comprises a first step consisting of making available E1 at least one portion of a watch component 1 or of a blank 1a of the watch component 1, specifically shown in section on the figure 1a .
  • a first step consisting of making available E1 at least one portion of a watch component 1 or of a blank 1a of the watch component 1, specifically shown in section on the figure 1a .
  • several blanks 1a can be linked to the same support or substrate 10a, and simultaneously be subject to the process which will be described below and the steps of which are summarized by the flowchart of the figure 2 .
  • the watch component blanks 1a can therefore be manufactured by micro-manufacturing operations from a substrate 10a, which is preferably made of micro-machinable material or based on micro-machinable material.
  • a substrate 10a which is preferably made of micro-machinable material or based on micro-machinable material.
  • the term blank in the broad sense, to designate any intermediate element in the manufacturing process of the watch component.
  • the blank can be a simple substrate made available and not yet engraved, or a substrate already partially engraved, for example to define all or part of the outline of the future watch component.
  • the terms blank 1a or watch component 1 will be alternately used to designate the same component, even if watch component 1 is still being manufactured.
  • the portion of the blank 1a on which the invention is implemented comprises a surface 11 which will be specifically treated by the method according to the invention, with the aim of creating visible patterns or indications on this surface 11, as follows will be detailed later.
  • the substrate 10a may be made of a micro-machinable material or based on a micro-machinable material.
  • the substrate may comprise all or part of the silicon, in any form. It can thus include monocrystalline silicon whatever its orientation, polycrystalline silicon, amorphous silicon, amorphous silicon dioxide, doped silicon whatever the type and level of doping. It can in particular be in the form of an SOI (silicon on insulator) substrate. Alternatively, it may include quartz, diamond, glass, ceramic, ruby, sapphire, or silicon carbide. Alternatively, it may be made of metal or a metal alloy, in particular an at least partially amorphous metal alloy. For example, it may comprise nickel or nickel-phosphorus, or even steel, titanium, a gold alloy, or a platinum alloy.
  • FIG. 1b illustrates a second step of the process consisting of engraving E3 said surface 11 of the watch component 1 or of a blank 1a of the watch component 1 to form at least one cavity 7.
  • the engraving is carried out by the technology of deep ionic reactive engraving (DRIE acronym in English).
  • DRIE deep ionic reactive engraving
  • This technique makes it possible to form cavities 7 with vertical or substantially vertical sides 18 to the right of the openings of a layer of resin forming a mask, without impacting the areas of the surface 11 covered with the layer of resin.
  • the etching step etches the silicon, so as to form at least one cavity 7.
  • Each cavity 7 has a section of substantially rectangular shape, delimited by a surface forming a bottom 17, substantially parallel to the surface 11 of the component .
  • the depth of a cavity is measured perpendicular to the surface 11, and corresponds to the respective distance between the planes of the surface 11 and the bottom 17 of the cavity. More generally, the at least one cavity 7 has sides 18 forming advantageously a discontinuity relative to the rest of the surface 11 of the blank 1a.
  • the depth of at least one or all of the cavities 7 is less than 10 ⁇ m.
  • this depth is preferably equal to or greater than the thickness of a layer of silicon dioxide 13, which is optional.
  • such a step consisting of etching E3 by deep ionic reactive etching also makes it possible to obtain a bottom 17 whose surface state is in particular characterized by a particularly low roughness, with in particular a bottom 17 having a roughness Ra less than 50 nm, preferably of the order of 20 nm, or less than 20 nm, and/or a roughness Sa less than 100 nm, preferably of the order of 80 nm, or less than 80 nm, which allows the brightness of the layer of material subsequently deposited on such a background 17 to be revealed, as will be explained.
  • this step consisting of engraving E3 the surface 11 of the watch component 1 is advantageously carried out in the same operation as a step consisting of engraving a contour of said watch component 1.
  • this step consisting of engraving E3 said surface of the portion of said watch component 1 can be carried out before a step consisting of engraving a contour of said watch component 1.
  • the method can comprise a step of positioning a first mask, not shown, on the substrate 10a, in particular on said surface 11 of said substrate 10a, so as to carry out the step consisting of etching E3 at least one cavity 7 from this first mask, in particular blind etching, by deep ion reactive etching (DRIE) technology, and a step of positioning a second mask, not shown, on said substrate 10a, in particular on another surface of said substrate 10a, so as to engrave an outline of the blank 1a of watch component 1 from this second mask.
  • DRIE deep ion reactive etching
  • the engraving serving to cut the component from the substrate and the engraving forming at least one cavity according to the invention can be carried out in the same operation, or partially in the same operation. These two engravings are made from different masks.
  • DRIE deep reactive ion etching
  • the engraving may include the implementation of laser engraving, in particular by a femtosecond laser.
  • the method then comprises, in one embodiment of use of a substrate 10a comprising all or part of the silicon, an optional step consisting of oxidizing E8 the surface of the blank 1a.
  • the surface 11 of the blank 1a then comprises a layer of silicon dioxide (SiO 2 ) 13.
  • This layer of silicon dioxide 13 is in particular formed on the upper surface 11, including at least one bottom 17 of a cavity 7
  • this layer of silicon dioxide 13 is notably formed on the upper surface 11 and on at least one bottom 17 of a cavity.
  • the method then comprises a step consisting of depositing E7 a metallic or metallic alloy layer 22 on said surface 11 of the blank 1a, both in the at least one cavity 7, more precisely on the bottom 17 of the at least one cavity 7, and outside of at least one cavity 7.
  • this metallic layer or metal alloy 22 is a layer of chromium.
  • the metal or metal alloy may be aluminum, or titanium, or an alloy of aluminum, chromium, or titanium.
  • This step consisting of depositing E7 the metal or metal alloy layer 22 can be carried out by a directional deposition, in particular a physical vapor deposition (PVD), in particular by a deposition by thermal evaporation by electron beam (EBE).
  • PVD physical vapor deposition
  • EBE thermal evaporation by electron beam
  • the metal or metal alloy layer 22 could only extend over a negligible part of the sides 18, in particular a lower part extending from the bottom 17, for example a lower part extending from the bottom 17 on a distance less than 1 ⁇ m, and not going as far as the border with the surface 11 outside the cavity 7.
  • the sacrificial layer function of this metal or metal alloy layer 22, which will be detailed later, is optimal for small thicknesses of this layer, in particular a thickness less than or equal to 100 nm .
  • the method then implements a fourth step consisting of depositing a material E4 on the surface of the component, more precisely on the metal or metal alloy layer 22, at least at the level of the at least one cavity 7 and possibly on the surface 11 outside the cavity 7.
  • the material is a metal or a metallic alloy
  • this deposition step forms at least one layer of metallic or metallic alloy material 8, as represented by the figure 1e . It is more particularly a single and same layer of gold 8 on the figure 1e .
  • the material is a metal forming part of the group Au, Ag, Cr, CrN, Ni, Pt, TiN, ZrN, Pd or their alloys, unless incompatibility with the metallic layer or metallic alloy 22.
  • this material could not be metallic, as will be clarified later.
  • the thickness of this at least one layer of material 8 can be of the order of a few nanometers. It is preferably at least 5 nm, or even at least 10 nm, or even at least 50 nm, or even at least 100 nm. More particularly, it is preferably between 5 nm and 1000 nm, or even between 100 nm and 1000 nm. A thickness between 100 nm and 200 nm forms a good solution, as will be described below.
  • the step of deposition of a material E4 may include the deposition of a single layer. Alternatively, this deposition step may comprise the successive deposition of two or more distinct layers.
  • the material deposition step E4 is carried out by a directional deposition, in particular a physical vapor deposition (PVD acronym in English), in particular by thermal evaporation by electron beam (Electron Beam Evaporation or EBE) . More generally, this deposition can be a vapor phase deposition, such as the aforementioned physical deposition (PVD) or a chemical deposition (CVD) or an atomic deposition (ALD).
  • PVD physical vapor deposition
  • EBE electron beam
  • this deposition can be a vapor phase deposition, such as the aforementioned physical deposition (PVD) or a chemical deposition (CVD) or an atomic deposition (ALD).
  • the material deposition step E4 may comprise a first prior sub-step of affixing a mask 24, for example a rigid mask or a template, such as a silicon mask 24, to reduce the extent of the surface 11 concerned by the deposition of the layer of material 8 on the metallic or metallic alloy layer 22 around the cavities 7, in order to promote the subsequent step E5 of removal of the metallic or metallic alloy layer 22, which will be described below.
  • a mask 24 for example a rigid mask or a template, such as a silicon mask 24, to reduce the extent of the surface 11 concerned by the deposition of the layer of material 8 on the metallic or metallic alloy layer 22 around the cavities 7, in order to promote the subsequent step E5 of removal of the metallic or metallic alloy layer 22, which will be described below.
  • the pattern of the mask 24 can correspond exactly to the patterns of the cavities 7 to deposit the material only in the cavities 7.
  • the pattern of the mask 24 does not need to correspond exactly to the pattern formed by the cavities 7 on the surface 11, and can reveal a narrow surface of the surface of the component around the cavities, as represented by the figure 1e .
  • a layer of material 8 is also deposited outside the cavities 7, on the surface of the component.
  • the mask 24 comprises at least one opening superimposed on the at least one cavity 7, of surface greater than or equal to the surface of the cavity, so as not to cover the at least one cavity.
  • the mask 24 delimits therefore a reduced surface relative to the total surface 11 of the component portion considered, on which the deposition of material is carried out.
  • the material deposition step E4 also includes a second final sub-step of removing the mask 24, after the end of the deposition of the material, to achieve the result represented by the figure 1f .
  • the metallic or metallic alloy layer 22 deposited on the surface of the component separates this surface from the layer of material 8.
  • This metallic or metallic alloy layer 22 thus fulfills a first separation function with respect to the deposit of material.
  • the method then comprises a step consisting of removing E5 the metal or metal alloy layer 22 deposited outside said at least one cavity, in particular by selective chemical attack.
  • this step can implement a lifting (known by its English name “lift-off") of the chromium layer by means of a selective chemical attack, in particular by means of a bath of acid.
  • This attack is such that it removes the metal or metal alloy layer 22 without damaging the surface 11 of the watch component, in particular without damaging the silicon dioxide layer according to this embodiment.
  • the dissolution of the metal or metal alloy layer 22 induces at the same time the removal of the layer of material 8 located outside the cavities 7.
  • the final result is illustrated by the figure 1g .
  • the metal or metal alloy layer 22 thus fulfills the function of sacrificial layer, which allows easy removal of the layer of material deposited outside the cavities, the final desire being to only retain this material in the cavities.
  • the perfect covering of the material layer 8 on the metal or metal alloy layer 22 present in the cavities 7 allows these layers not to be impacted by the removal step E5.
  • these two layers 22, 8 remain present in the cavities 7.
  • the metal or metal alloy layer 22 advantageously fulfills a second function of bonding layer of the material layer 8 within the cavities, by improving the adhesion of the layer of material 8 on component 1.
  • the metal or metal alloy layer 22 at the level of the at least one cavity 7.
  • the metallic or alloy layer metal 22 only extends over the bottom 17 of the cavity 7 or does not extend over the sides 18, or extends over a negligible height of the sides 18, in particular not in the upper part of the sides.
  • the at least one cavity 7 itself to have a discontinuity at the border between the surface 11 and the sides 18 of the cavity 7.
  • the thickness of the layer of material 8 is sufficiently thick so that it can completely cover the metal or metal alloy layer 22 in the cavities 7, in particular at least on the bottom 17 of the cavities 7, and not present holes likely to allow acid to pass through during a chemical attack carried out in this removal step.
  • the thickness of the layer of material 8 is at least 100 nm, in particular is between 100 nm to 200 nm.
  • the thickness of the material layer 8 is preferentially greater than that of the metallic or metallic alloy layer 22.
  • any configuration bringing together all or part of the characteristics proposed above, making it possible to make the metallic layer or metal alloy 22 not accessible inside the at least one cavity 7, is very advantageous for guaranteeing the non-removal of the two superimposed layers 22, 8 at the level of the at least one cavity.
  • the method can include an optional step consisting of detaching E6 the blanks 1a from the substrate 10a.
  • the component blank 1a may include a partially engraved break zone, in particular as described in the document EP3632839A1 .
  • the composition of the metal or metal alloy layer 22 will be adapted on a case-by-case basis to that of the layer of material 8 chosen, for example as a function of the material chosen and/or its thickness.
  • the metallic or metallic alloy layer 22 will have a composition different from that of the material layer 8 in the case where the latter is metallic.
  • the step consisting of depositing E4 a material consists of a step of applying to the bottom 17 of the cavities 7 a layer of material 8 which is a layer of paint, applied by any technique known to those skilled in the art, such as a spraying technique or using a brush.
  • a layer of a lacquer, varnish or composite, in particular a luminescent composite can be applied.
  • the thickness of said layer of material 8 can correspond substantially to the depth of the cavity 7 in which it is deposited. In this scenario, the thickness of said layer of material 8 can preferably be very slightly less than the depth of the cavity 7.
  • all the steps could be implemented on a component blank 1a alone, not linked to a substrate. They can also be implemented at different stages of manufacturing. of a watch component, that is to say on a blank of such a watch component, during manufacture, or even directly on a finalized or almost finalized watch component.
  • Such a process is particularly suitable for the manufacture of a spiral spring, using the variant consisting of making the cavities of the invention before engraving the turns, otherwise it would be difficult in practice to position a liquid resin on turns to etch the cavities of the invention since resin would flow between these turns, in the case where step E3 is a deep reactive ion etching step.
  • the depth of at least one cavity, and preferably of all the cavities is advantageously less than 10 ⁇ m, or even less than 6 ⁇ m. This depth is also optionally greater than 3 ⁇ m. Thus, this depth can be between 3 ⁇ m and 10 ⁇ m, or even between 3 ⁇ m and 6 ⁇ m.
  • the contrast between at least one cavity 7 and the surface 11 is all the more marked as the depth of said at least one cavity 7 is low for a small format watch component such as than a watch movement component such as a spiral spring. This is all the more notable when the layer of material 8 is metallic or a metallic alloy and that the component comprises in particular all or part of the silicon.
  • the depth of at least one cavity, and preferably of all the cavities can also be greater than or equal to the thickness of a possible coating of silicon dioxide 13 present on said surface when the component comprises all or part of silicon.
  • a silicon dioxide coating may comprise a thickness of between 0.1 ⁇ m and 5 ⁇ m.
  • the depth of at least one cavity, and preferably of all the cavities is between 10 ⁇ m and 100 ⁇ m, or even between 15 ⁇ m and 80 ⁇ m, or even between 20 ⁇ m and 50 ⁇ m.
  • At least one cavity may also have a length of at least 100 ⁇ m, or even at least 150 ⁇ m, or even at least 200 ⁇ m, or even at least 250 ⁇ m, in at least one direction. This length may be less than or equal to 800 ⁇ m, or even less than or equal to 600 ⁇ m, or even less than or equal to 500 ⁇ m, or even less than or equal to 400 ⁇ m.
  • the material deposited in the at least one cavity may be a metal or a metal alloy. Alternatively, it can be a paint, a lacquer, a varnish, a composite, in particular in particular a luminescent composite, with optionally an intermediate metallic bonding layer.
  • the material deposited in the at least one cavity advantageously has a thickness strictly less than the depth of the cavity.
  • the deposit thickness can be greater than or equal to 100 nm. It can be between 100 nm and 1000 nm, advantageously between 100 nm and 200 nm. Alternatively, it may have a thickness equal to or substantially equal to the depth of the cavity. Furthermore, the sum of the thickness of the material layer 8 and the thickness of the metal or metal alloy layer 22 may be strictly less than the depth of the cavity, or substantially equal to the depth of the cavity.
  • the invention applies particularly well to any watch movement component made of micro-machinable material, that is to say obtained from micro-manufacturing techniques, in particular those involving photolithography or those involving use of a laser.
  • a watch movement component in particular its general shape, can for example be obtained, at least partially, by a deep reactive ionic engraving step (DRIE acronym in English).
  • DRIE deep reactive ionic engraving step
  • such a watch movement component, in particular its general shape can for example be obtained, at least partially, by UV-Liga technology (Lithography Galvanik Abformung).
  • the watch component according to the invention may comprise all or part of the silicon, in any form. It can thus include monocrystalline silicon whatever its orientation, polycrystalline silicon, amorphous silicon, amorphous silicon dioxide, doped silicon whatever the type and level of doping. It can in particular be manufactured from an SOI (silicon on insulator) substrate.
  • SOI silicon on insulator
  • the watch component according to the invention may also comprise silicon carbide, glass, ceramic, quartz, ruby or even sapphire.
  • it may be made of metal or a metal alloy, in particular a metal alloy that is at least partially amorphous.
  • a component may comprise nickel or nickel-phosphorus, or even steel, titanium, a gold alloy, or a platinum alloy.
  • the invention is not limited to the embodiments described, and it is possible to imagine other embodiments, for example by combining the embodiments and/or their variants.
  • the etching step E3 can combine the implementation of deep reactive ion etching using a mask obtained by photolithography and laser etching, in particular by a femtosecond laser.
  • the invention achieves the desired objects by advantageously combining engraving on a surface of a component and its partial, or even total, filling with a material, via a sacrificial metallic or metallic alloy layer. .
  • This combination makes it possible to form a readable marking, in particular a visible and attractive marking, even on a small surface, without impacting the functionality of a watch movement component.
  • this surface is an upper surface or a visible surface, in particular a visible surface when the component is assembled within a timepiece, in particular within a watch movement.
  • this surface is a lower surface or a non-visible surface.
  • the marking may be intended for decorative purposes. Alternatively or additionally, it may be provided for identification purposes.
  • the variants of the method according to the invention which involve a laser, in particular a femtosecond laser, are particularly advantageous in order to individualize the marking on a watch component, in particular a watch movement component, in particular on a particular spiral spring.
  • the marking can, for example, form a serial number or a measurement result.
  • the invention also relates to a watch component obtained by the manufacturing process described above.
  • the component may be a watch movement component such as a rocker, a wheel, for example a wheel of an escapement device, an anchor, a balance wheel or a spiral spring, in particular an oscillator spiral spring.
  • the watch component may be a trim component such as a bezel or a bezel disc, or a flange.
  • the component can be a watch movement component such as a spiral spring made of micro-machinable material comprising a first portion forming a connecting member comprising a surface, in particular an upper surface or a visible surface , and a second portion less rigid than the first portion comprising at least one blade wound in the shape of a spiral forming a spring, the surface of the first portion comprising at least one cavity in which a material according to the invention is deposited.
  • the watch component, or at least the portion comprising the surface considered by the invention is advantageously based on a micro-machinable material, in particular based on silicon, that is to say comprising by weight at least 50% micro-machinable material.
  • FIG. 3 thus illustrates a spiral spring obtained by a manufacturing process according to one of the embodiments described above. It comprises at least one blade 2 whose upper surface 12 is located in a plane P1, and whose external end is manufactured with a connecting member 3 whose rigidity is significantly greater than that of the at least one blade 2.
  • the spiral spring 1 further comprises a ferrule 4 with axis A1, which comes from manufacturing with the internal end of the at least one blade 2.
  • the connecting member 3 comprises a first central portion 31 in the form of a ring portion arranged around the blade 2, the angular extent of which is of the order of 100 degrees with respect to the axis A1.
  • This connecting member 3 also comprises two bent portions 32 arranged on either side of the first central portion 31, which each comprise a positioning element 5 and/or fixing said spiral spring, which is here in the form of an opening.
  • the connecting member 3 has the particularity of comprising patterns (or indications) 6 affixed to its upper surface 11, positioned in the plane P1, in particular at the level of its central portion 31.
  • the upper surface 11 is here formed in continuity with the upper surface 12 of the at least one leaf 2 of the spiral spring.
  • the patterns 6 result from the process described above, and include cavities 7 formed from the upper surface 11, in which a layer of material 8 is deposited.
  • the extent e of the patterns can be greater than 100 ⁇ m, or even greater than 150 ⁇ m, or even greater than 200 ⁇ m, or even greater than 250 ⁇ m. Such patterns or indications 6 can thus be visible or readable once the spiral spring 1 is mounted within an assembled balance wheel, itself assembled within a watch movement.
  • This hairspring can be a hairspring for a hairspring balance. It can be one-piece. It can be made of silicon, and it can be made from a silicon substrate or from an SOI (silicon on insulator) substrate. The surface considered by the invention can be covered with a coating of silicon dioxide.
  • the invention also relates to a timepiece comprising such a timepiece component. It relates in particular to a watch movement comprising such a watch movement component.

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Abstract

Procédé de fabrication d'un composant horloger (1) comprenant au moins une portion comprenant une surface (11), en particulier une surface supérieure, caractérisé en ce qu'il comprend au moins les étapes suivantes:- Graver (E3) ladite surface (11) du composant horloger (1) ou d'une ébauche (1a) du composant horloger (1) pour former au moins une cavité (7) ;- Déposer (E7) une couche métallique ou en alliage métallique (22) sur ladite surface (11), à la fois dans la au moins une cavité (7) et hors de la au moins une cavité (7) ;- Déposer une matière (E4) sur ladite couche métallique ou en alliage métallique (22), au moins au sein de la au moins une cavité (7), pour former une couche de matière (8), cette matière étant différente du métal ou de l'alliage métallique de ladite couche métallique ou en alliage métallique (22), cette couche métallique ou en alliage métallique (22) formant une couche d'accroché de ladite couche de matière (8).Method for manufacturing a watch component (1) comprising at least one portion comprising a surface (11), in particular an upper surface, characterized in that it comprises at least the following steps: - Engraving (E3) said surface ( 11) of the watch component (1) or a blank (1a) of the watch component (1) to form at least one cavity (7);- Deposit (E7) a metallic or metal alloy layer (22) on said surface (11), both in the at least one cavity (7) and outside the at least one cavity (7);- Deposit a material (E4) on said metal or metal alloy layer (22), at least at within the at least one cavity (7), to form a layer of material (8), this material being different from the metal or metal alloy of said metal layer or metal alloy (22), this metal layer or in metal alloy (22) forming an attached layer of said layer of material (8).

Description

La présente invention concerne un procédé de fabrication d'un composant horloger. Elle concerne aussi un composant horloger en tant que tel obtenu par un tel procédé de fabrication.The present invention relates to a method of manufacturing a watch component. It also relates to a watch component as such obtained by such a manufacturing process.

Différents procédés de décoration et/ou de marquages sont mis en œuvre sur des composants d'habillage d'une pièce d'horlogerie. En regard de ces composants d'habillage, un composant de mouvement horloger est souvent de plus petite dimension, et comprend des parties fonctionnelles de géométrie très précise, qu'il ne faut surtout pas altérer. Ainsi, il est très délicat de réaliser un marquage sur un tel composant de mouvement horloger, par exemple dans un but d'identification ou de décoration.Different decoration and/or marking processes are implemented on the trim components of a timepiece. Compared to these exterior components, a watch movement component is often smaller in size, and includes functional parts of very precise geometry, which must not be altered. Thus, it is very difficult to make a marking on such a watch movement component, for example for the purpose of identification or decoration.

Ainsi, la présente invention a notamment pour objet de trouver une solution de marquage et/ou de décoration d'un composant horloger, en particulier un composant de mouvement horloger, qui permet d'atteindre un effet visuel particulièrement attrayant sans détériorer la fonctionnalité du composant.Thus, the present invention particularly aims to find a solution for marking and/or decorating a watch component, in particular a watch movement component, which makes it possible to achieve a particularly attractive visual effect without deteriorating the functionality of the component. .

A cet effet, l'invention repose sur un procédé de fabrication d'un composant horloger comprenant au moins une portion comprenant une surface, en particulier une surface supérieure, caractérisé en ce qu'il comprend au moins les étapes suivantes:

  • Graver ladite surface du composant horloger ou d'une ébauche du composant horloger pour former au moins une cavité ;
  • Déposer une couche métallique ou en alliage métallique sur ladite surface, à la fois dans la au moins une cavité et hors de la au moins une cavité ;
  • Déposer une matière sur ladite couche métallique ou en alliage métallique, au moins au sein de la au moins une cavité, pour former une couche de matière, cette matière étant différente du métal ou de l'alliage métallique de ladite couche métallique ou en alliage métallique, cette couche métallique ou en alliage métallique formant une couche d'accroche de ladite couche de matière.
To this end, the invention is based on a method of manufacturing a watch component comprising at least one portion comprising a surface, in particular an upper surface, characterized in that it comprises at least the following steps:
  • Etch said surface of the watch component or a blank of the watch component to form at least one cavity;
  • Deposit a metallic or metallic alloy layer on said surface, both in the at least one cavity and outside the at least one cavity;
  • Deposit a material on said metal or metal alloy layer, at least within the at least one cavity, to form a layer of material, this material being different from the metal or metal alloy of said layer metallic or metallic alloy, this metallic or metallic alloy layer forming an adhesion layer of said layer of material.

L'invention est plus particulièrement définie par les revendications.The invention is more particularly defined by the claims.

Ces objets, caractéristiques et avantages de la présente invention seront exposés en détail dans la description suivante de modes de réalisation particuliers faits à titre non-limitatif en relation avec les figures jointes parmi lesquelles :

  • Les figures 1a à 1g illustrent les étapes successives d'un procédé de fabrication d'un ressort spiral de mouvement horloger selon un mode de réalisation de l'invention.
  • La figure 2 illustre un logigramme représentant schématiquement les étapes et sous-étapes d'un procédé de fabrication d'un composant horloger selon un mode de réalisation de l'invention.
  • La figure 3 représente une vue de dessus d'un ressort spiral réalisé par un procédé de fabrication selon un mode de réalisation de l'invention.
These objects, characteristics and advantages of the present invention will be explained in detail in the following description of particular embodiments made on a non-limiting basis in relation to the attached figures among which:
  • THE figures 1a to 1g illustrate the successive stages of a process for manufacturing a watch movement spiral spring according to one embodiment of the invention.
  • There figure 2 illustrates a flowchart schematically representing the steps and sub-steps of a process for manufacturing a watch component according to one embodiment of the invention.
  • There Figure 3 represents a top view of a spiral spring produced by a manufacturing process according to one embodiment of the invention.

L'invention met en œuvre un procédé de fabrication d'un composant horloger qui combine avantageusement au moins une étape de gravage et une étape de coloration de ladite gravure obtenue, de sorte à obtenir une gravure visible et n'impactant pas la performance fonctionnelle d'un composant de mouvement.The invention implements a method of manufacturing a watch component which advantageously combines at least one engraving step and a coloring step of said engraving obtained, so as to obtain a visible engraving which does not impact the functional performance of 'a component of movement.

Pour faciliter la lecture de la demande de brevet, les mêmes références seront utilisées sur les différents modes de réalisation et leurs variantes afin de désigner les mêmes caractéristiques. Le procédé de fabrication selon un mode de réalisation de l'invention va être illustré dans le cadre de la fabrication d'un composant de mouvement horloger, qui peut par exemple être un ressort spiral. Les figures 1a à 1g illustrent plus particulièrement des vues en coupe d'un composant horloger 1, notamment un composant de mouvement horloger, ou d'une ébauche 1a du composant horloger 1, durant les différentes étapes de sa fabrication selon un mode de réalisation d'un procédé de fabrication du composant horloger. Le procédé de fabrication de l'invention s'intéresse plus particulièrement à une phase spécifique de la fabrication, portant sur un procédé de gravage d'une surface. Avantageusement, il s'agit d'un procédé de gravage d'une surface visible ou d'une surface supérieure du composant horloger 1, notamment à des fins décoratives. Alternativement, il pourrait également s'agir d'un procédé de gravage d'une surface non visible ou d'une surface inférieure, notamment à des fins d'identification ou de marquage.To facilitate reading of the patent application, the same references will be used on the different embodiments and their variants in order to designate the same characteristics. The manufacturing process according to one embodiment of the invention will be illustrated in the context of the manufacturing of a watch movement component, which can for example be a spiral spring. THE figures 1a to 1g illustrate more particularly sectional views of a watch component 1, in particular a watch movement component, or of a blank 1a of the watch component 1, during the different stages of its manufacture according to one embodiment of a manufacturing process of the watch component. The manufacturing process of the invention focuses more particularly on a specific phase of manufacturing, relating to a process for engraving a surface. Advantageously, this is a process for engraving a visible surface or an upper surface of the watch component 1, in particular for decorative purposes. Alternatively, it could also be a process of engraving a non-visible surface or a lower surface, in particular for identification or marking purposes.

Selon ce mode de réalisation illustré par les figures 1a à 1g, le procédé comprend une première étape consistant à mettre à disposition E1 au moins une portion d'un composant horloger 1 ou d'une ébauche 1a du composant horloger 1, spécifiquement représentée en coupe sur la figure 1a. En remarque, selon ce mode de réalisation avantageux, plusieurs ébauches 1a peuvent être liées à un même support ou substrat 10a, et faire simultanément l'objet du procédé qui va être décrit ci-après et dont les étapes sont résumées par le logigramme de la figure 2.According to this embodiment illustrated by the figures 1a to 1g , the method comprises a first step consisting of making available E1 at least one portion of a watch component 1 or of a blank 1a of the watch component 1, specifically shown in section on the figure 1a . As a note, according to this advantageous embodiment, several blanks 1a can be linked to the same support or substrate 10a, and simultaneously be subject to the process which will be described below and the steps of which are summarized by the flowchart of the figure 2 .

Les ébauches 1a de composant horloger peuvent donc être fabriquées par des opérations de micro-fabrication à partir d'un substrat 10a, qui se présente de préférence en matériau micro-usinable ou à base de matériau micro-usinable. En remarque, nous utiliserons le terme d'ébauche au sens large, pour désigner tout élément intermédiaire dans le procédé de fabrication du composant horloger. Ainsi, l'ébauche peut être un simple substrat mis à disposition et pas encore gravé, ou un substrat déjà partiellement gravé, par exemple pour définir tout ou partie du contour du futur composant horloger. Pour simplifier la description, les termes d'ébauche 1a ou de composant horloger 1 seront alternativement utilisés pour désigner le même composant, même si le composant horloger 1 est encore en cours de fabrication.The watch component blanks 1a can therefore be manufactured by micro-manufacturing operations from a substrate 10a, which is preferably made of micro-machinable material or based on micro-machinable material. As a note, we will use the term blank in the broad sense, to designate any intermediate element in the manufacturing process of the watch component. Thus, the blank can be a simple substrate made available and not yet engraved, or a substrate already partially engraved, for example to define all or part of the outline of the future watch component. To simplify the description, the terms blank 1a or watch component 1 will be alternately used to designate the same component, even if watch component 1 is still being manufactured.

La portion de l'ébauche 1a sur laquelle l'invention est mise en œuvre comprend une surface 11 qui va être spécifiquement traitée par le procédé selon l'invention, dans le but de créer des motifs ou indications visibles sur cette surface 11, comme cela sera détaillé par la suite.The portion of the blank 1a on which the invention is implemented comprises a surface 11 which will be specifically treated by the method according to the invention, with the aim of creating visible patterns or indications on this surface 11, as follows will be detailed later.

Le substrat 10a peut être en un matériau micro-usinable ou à base d'un matériau micro-usinable. Le substrat peut comprendre tout ou partie du silicium, sous toute forme. Il peut ainsi comprendre du silicium monocristallin quelle que soit son orientation, du silicium polycristallin, du silicium amorphe, du dioxyde de silicium amorphe, du silicium dopé quels que soient le type et le niveau de dopage. Il peut notamment se présenter sous la forme d'un substrat SOI (silicium sur isolant). En alternative, il peut comprendre du quartz, du diamant, du verre, de la céramique, du rubis, du saphir, ou du carbure de silicium. En alternative, il peut être en métal ou en un alliage métallique, notamment un alliage métallique au moins partiellement amorphe. Par exemple, il peut comprendre du nickel ou du nickel-phosphore, ou encore de l'acier, du titane, un alliage d'or, ou un alliage platinoïde.The substrate 10a may be made of a micro-machinable material or based on a micro-machinable material. The substrate may comprise all or part of the silicon, in any form. It can thus include monocrystalline silicon whatever its orientation, polycrystalline silicon, amorphous silicon, amorphous silicon dioxide, doped silicon whatever the type and level of doping. It can in particular be in the form of an SOI (silicon on insulator) substrate. Alternatively, it may include quartz, diamond, glass, ceramic, ruby, sapphire, or silicon carbide. Alternatively, it may be made of metal or a metal alloy, in particular an at least partially amorphous metal alloy. For example, it may comprise nickel or nickel-phosphorus, or even steel, titanium, a gold alloy, or a platinum alloy.

La figure 1b illustre une deuxième étape du procédé consistant à graver E3 ladite surface 11 du composant horloger 1 ou d'une ébauche 1a du composant horloger 1 pour former au moins une cavité 7. Selon un mode de réalisation privilégié, le gravage est réalisé par la technologie de gravure réactive ionique profonde (sigle DRIE en anglais). Cette technique permet de former des cavités 7 à flancs 18 verticaux ou sensiblement verticaux au droit des ouvertures d'une couche de résine formant un masque, sans impacter les zones de la surface 11 recouvertes de la couche de résine. Plus précisément, l'étape de gravage grave le silicium, de sorte à former au moins une cavité 7. Chaque cavité 7 présente une section de forme sensiblement rectangulaire, délimitée par une surface formant un fond 17, sensiblement parallèle à la surface 11 du composant. La profondeur d'une cavité est mesurée perpendiculairement à la surface 11, et correspond à la distance respective entre les plans de la surface 11 et du fond 17 de la cavité. Plus généralement, la au moins une cavité 7 présente des flancs 18 formant avantageusement une discontinuité relativement au reste de la surface 11 de l'ébauche 1a.There figure 1b illustrates a second step of the process consisting of engraving E3 said surface 11 of the watch component 1 or of a blank 1a of the watch component 1 to form at least one cavity 7. According to a preferred embodiment, the engraving is carried out by the technology of deep ionic reactive engraving (DRIE acronym in English). This technique makes it possible to form cavities 7 with vertical or substantially vertical sides 18 to the right of the openings of a layer of resin forming a mask, without impacting the areas of the surface 11 covered with the layer of resin. More precisely, the etching step etches the silicon, so as to form at least one cavity 7. Each cavity 7 has a section of substantially rectangular shape, delimited by a surface forming a bottom 17, substantially parallel to the surface 11 of the component . The depth of a cavity is measured perpendicular to the surface 11, and corresponds to the respective distance between the planes of the surface 11 and the bottom 17 of the cavity. More generally, the at least one cavity 7 has sides 18 forming advantageously a discontinuity relative to the rest of the surface 11 of the blank 1a.

Avantageusement, la profondeur d'au moins une ou de toutes les cavités 7 est inférieure à 10 µm. Avantageusement encore, cette profondeur est préférentiellement égale ou supérieure à l'épaisseur d'une couche de dioxyde de silicium 13, qui est optionnelle.Advantageously, the depth of at least one or all of the cavities 7 is less than 10 μm. Advantageously again, this depth is preferably equal to or greater than the thickness of a layer of silicon dioxide 13, which is optional.

Selon ce mode de réalisation privilégié, une telle étape consistant à graver E3 par gravure réactive ionique profonde permet par ailleurs d'obtenir un fond 17 dont l'état de surface est notamment caractérisé par une rugosité particulièrement faible, avec notamment un fond 17 présentant une rugosité Ra inférieure à 50 nm, préférentiellement de l'ordre de 20 nm, ou inférieure à 20 nm, et/ou une rugosité Sa inférieure à 100 nm, préférentiellement de l'ordre de 80 nm, ou inférieure à 80 nm, ce qui permet de révéler l'éclat de la couche de matière déposée ultérieurement sur un tel fond 17, comme cela va être expliqué.According to this preferred embodiment, such a step consisting of etching E3 by deep ionic reactive etching also makes it possible to obtain a bottom 17 whose surface state is in particular characterized by a particularly low roughness, with in particular a bottom 17 having a roughness Ra less than 50 nm, preferably of the order of 20 nm, or less than 20 nm, and/or a roughness Sa less than 100 nm, preferably of the order of 80 nm, or less than 80 nm, which allows the brightness of the layer of material subsequently deposited on such a background 17 to be revealed, as will be explained.

D'autre part, cette étape consistant à graver E3 la surface 11 du composant horloger 1 est avantageusement réalisée dans une même opération qu'une étape consistant à graver un contour dudit composant horloger 1. En variante, cette étape consistant à graver E3 ladite surface de la portion dudit composant horloger 1 peut être réalisée avant une étape consistant à graver un contour dudit composant horloger 1. Dans ces cas, le procédé peut comprendre une étape de positionnement d'un premier masque, non représenté, sur le substrat 10a, notamment sur ladite surface 11 dudit substrat 10a, de sorte à réaliser l'étape consistant à graver E3 au moins une cavité 7 à partir de ce premier masque, notamment un gravage borgne, par la technologie de gravure réactive ionique profonde (DRIE), et une étape de positionnement d'un deuxième masque, non représenté, sur ledit substrat 10a, notamment sur une autre surface dudit substrat 10a, de sorte à graver un contour de l'ébauche 1a de composant horloger 1 à partir de ce deuxième masque. Autrement dit, la gravure servant à découper le composant du substrat et la gravure formant au moins une cavité selon l'invention peuvent être réalisées dans une même opération, ou partiellement dans une même opération. Ces deux gravures sont réalisées à partir de masques différents.On the other hand, this step consisting of engraving E3 the surface 11 of the watch component 1 is advantageously carried out in the same operation as a step consisting of engraving a contour of said watch component 1. Alternatively, this step consisting of engraving E3 said surface of the portion of said watch component 1 can be carried out before a step consisting of engraving a contour of said watch component 1. In these cases, the method can comprise a step of positioning a first mask, not shown, on the substrate 10a, in particular on said surface 11 of said substrate 10a, so as to carry out the step consisting of etching E3 at least one cavity 7 from this first mask, in particular blind etching, by deep ion reactive etching (DRIE) technology, and a step of positioning a second mask, not shown, on said substrate 10a, in particular on another surface of said substrate 10a, so as to engrave an outline of the blank 1a of watch component 1 from this second mask. In other words, the engraving serving to cut the component from the substrate and the engraving forming at least one cavity according to the invention can be carried out in the same operation, or partially in the same operation. These two engravings are made from different masks.

Il peut être ainsi avantageux d'utiliser une gravure ionique réactive profonde (DRIE) pour un composant comprenant notamment du silicium, du quartz, du verre, ou du diamant.It may thus be advantageous to use deep reactive ion etching (DRIE) for a component comprising in particular silicon, quartz, glass, or diamond.

En variante, le gravage peut comprendre la mise en œuvre d'un gravage par laser, notamment par un laser femtoseconde.Alternatively, the engraving may include the implementation of laser engraving, in particular by a femtosecond laser.

Le procédé comprend ensuite, dans un mode de réalisation d'utilisation d'un substrat 10a comprenant tout ou partie du silicium, une étape optionnelle consistant à oxyder E8 la surface de l'ébauche 1a. Comme illustré par la figure 1c, la surface 11 de l'ébauche 1a comprend alors une couche de dioxyde de silicium (SiO2) 13. Cette couche de dioxyde de silicium 13 est notamment formée sur la surface supérieure 11, incluant au moins un fond 17 d'une cavité 7. Autrement dit, cette couche de dioxyde de silicium 13 est notamment formée sur la surface supérieure 11 et sur au moins un fond 17 d'une cavité.The method then comprises, in one embodiment of use of a substrate 10a comprising all or part of the silicon, an optional step consisting of oxidizing E8 the surface of the blank 1a. As illustrated by the figure 1c , the surface 11 of the blank 1a then comprises a layer of silicon dioxide (SiO 2 ) 13. This layer of silicon dioxide 13 is in particular formed on the upper surface 11, including at least one bottom 17 of a cavity 7 In other words, this layer of silicon dioxide 13 is notably formed on the upper surface 11 and on at least one bottom 17 of a cavity.

Le procédé comprend ensuite une étape consistant à déposer E7 une couche métallique ou en alliage métallique 22 sur ladite surface 11 de l'ébauche 1a, à la fois dans la au moins une cavité 7, plus précisément sur le fond 17 de la au moins une cavité 7, et hors de la au moins une cavité 7.The method then comprises a step consisting of depositing E7 a metallic or metallic alloy layer 22 on said surface 11 of the blank 1a, both in the at least one cavity 7, more precisely on the bottom 17 of the at least one cavity 7, and outside of at least one cavity 7.

Selon ce mode de réalisation illustré par les figures 1a à 1g, cette couche métallique ou en alliage métallique 22 est une couche de chrome. En variante, le métal ou l'alliage métallique peut être de l'aluminium, ou du titane, ou un alliage d'aluminium, de chrome, ou de titane.According to this embodiment illustrated by the figures 1a to 1g , this metallic layer or metal alloy 22 is a layer of chromium. Alternatively, the metal or metal alloy may be aluminum, or titanium, or an alloy of aluminum, chromium, or titanium.

Cette étape consistant à déposer E7 la couche métallique ou en alliage métallique 22 peut être réalisée par un dépôt directionnel, notamment un dépôt physique en phase vapeur (PVD), notamment par un dépôt par évaporation thermique par faisceau à électron (EBE). Ainsi, avantageusement, la couche métallique ou en alliage métallique 22 est déposée de sorte à éviter tout dépôt de matière sur les flancs 18 des cavités 7, qui sont ici perpendiculaires ou sensiblement perpendiculaires au fond 17. Le résultat de cette étape est illustré par la figure 1d. En variante, la couche métallique ou en alliage métallique 22 pourrait ne s'étendre que sur une partie négligeable des flancs 18, notamment une partie inférieure s'étendant depuis le fond 17, par exemple une partie inférieure s'étendant depuis le fond 17 sur une distance inférieure à 1 µm, et n'allant pas jusqu'à la frontière avec la surface 11 hors de la cavité 7.This step consisting of depositing E7 the metal or metal alloy layer 22 can be carried out by a directional deposition, in particular a physical vapor deposition (PVD), in particular by a deposition by thermal evaporation by electron beam (EBE). Thus, advantageously, the metal or metal alloy layer 22 is deposited so as to avoid any deposit of material on the sides 18 of the cavities 7, which are here perpendicular or substantially perpendicular to the bottom 17. The result of this step is illustrated by the figure 1d . Alternatively, the metal or metal alloy layer 22 could only extend over a negligible part of the sides 18, in particular a lower part extending from the bottom 17, for example a lower part extending from the bottom 17 on a distance less than 1 µm, and not going as far as the border with the surface 11 outside the cavity 7.

D'autre part, il est constaté que la fonction de couche sacrificielle de cette couche métallique ou en alliage métallique 22, qui sera détaillée par la suite, est optimale pour des faibles épaisseurs de cette couche, notamment une épaisseur inférieure ou égale à 100 nm.On the other hand, it is found that the sacrificial layer function of this metal or metal alloy layer 22, which will be detailed later, is optimal for small thicknesses of this layer, in particular a thickness less than or equal to 100 nm .

Le procédé met ensuite en œuvre une quatrième étape consistant à déposer une matière E4 sur la surface du composant, plus précisément sur la couche métallique ou en alliage métallique 22, au moins au niveau de la au moins une cavité 7 et éventuellement sur la surface 11 hors de la cavité 7. Selon le mode de réalisation illustré par les figures 1a à 1g, la matière est un métal ou un alliage métallique, et cette étape de dépôt forme au moins une couche de matière 8 métallique ou en alliage métallique, comme représenté par la figure 1e. Il s'agit plus particulièrement d'une seule et même couche d'or 8 sur la figure 1e.The method then implements a fourth step consisting of depositing a material E4 on the surface of the component, more precisely on the metal or metal alloy layer 22, at least at the level of the at least one cavity 7 and possibly on the surface 11 outside the cavity 7. According to the embodiment illustrated by the figures 1a to 1g , the material is a metal or a metallic alloy, and this deposition step forms at least one layer of metallic or metallic alloy material 8, as represented by the figure 1e . It is more particularly a single and same layer of gold 8 on the figure 1e .

Préférentiellement, la matière est un métal faisant partie du groupe Au, Ag, Cr, CrN, Ni, Pt, TiN, ZrN, Pd ou leurs alliages, sauf incompatibilité avec la couche métallique ou en alliage métallique 22. En variante encore, cette matière pourrait ne pas être métallique, comme cela sera précisé par la suite.Preferably, the material is a metal forming part of the group Au, Ag, Cr, CrN, Ni, Pt, TiN, ZrN, Pd or their alloys, unless incompatibility with the metallic layer or metallic alloy 22. As another variant, this material could not be metallic, as will be clarified later.

L'épaisseur de cette au moins une couche de matière 8 peut être de l'ordre de quelques nanomètres. Elle est de préférence d'au moins 5 nm, voire d'au moins 10 nm, voire d'au moins 50 nm, voire d'au moins 100 nm. Plus particulièrement, elle est de préférence comprise entre 5 nm et 1000 nm, voire entre 100 nm et 1000 nm. Une épaisseur comprise entre 100 nm et 200 nm forme une bonne solution, comme cela sera décrit ci-après.The thickness of this at least one layer of material 8 can be of the order of a few nanometers. It is preferably at least 5 nm, or even at least 10 nm, or even at least 50 nm, or even at least 100 nm. More particularly, it is preferably between 5 nm and 1000 nm, or even between 100 nm and 1000 nm. A thickness between 100 nm and 200 nm forms a good solution, as will be described below.

L'étape de dépôt d'une matière E4 peut comprendre le dépôt d'une seule et unique couche. Alternativement, cette étape de dépôt peut comprendre le dépôt successif de deux ou plusieurs couches distinctes.The step of deposition of a material E4 may include the deposition of a single layer. Alternatively, this deposition step may comprise the successive deposition of two or more distinct layers.

Selon un mode de réalisation, l'étape de dépôt de matière E4 est réalisée par un dépôt directionnel, notamment un dépôt physique en phase vapeur (sigle PVD en anglais), notamment par évaporation thermique par faisceau à électron (Electron Beam Evaporation ou EBE). Plus généralement, ce dépôt peut être un dépôt en phase vapeur, comme le dépôt physique (PVD) susmentionné ou un dépôt chimique (CVD) ou un dépôt atomique (ALD).According to one embodiment, the material deposition step E4 is carried out by a directional deposition, in particular a physical vapor deposition (PVD acronym in English), in particular by thermal evaporation by electron beam (Electron Beam Evaporation or EBE) . More generally, this deposition can be a vapor phase deposition, such as the aforementioned physical deposition (PVD) or a chemical deposition (CVD) or an atomic deposition (ALD).

Optionnellement, l'étape de dépôt de matière E4 peut comprendre une première sous-étape préalable d'apposition d'un masque 24, par exemple un masque rigide ou un chablon, comme un masque 24 en silicium, pour réduire l'étendue de la surface 11 concernée par le dépôt de la couche de matière 8 sur la couche métallique ou en alliage métallique 22 autour de la ou des cavités 7, afin de favoriser l'étape ultérieure de retrait E5 de la couche métallique ou en alliage métallique 22, qui va être décrite ci-après. Selon une première variante, le motif du masque 24 peut correspondre exactement aux motifs des cavités 7 pour ne déposer la matière que dans les cavités 7. Toutefois, selon une deuxième variante plus simple, le motif du masque 24 n'a pas besoin de correspondre exactement au motif formé par les cavités 7 sur la surface 11, et peut laisser apparaître une surface étroite de la surface du composant autour des cavités, comme représenté par la figure 1e. Dans ce dernier cas, une couche de matière 8 est aussi déposée hors des cavités 7, sur la surface du composant. Autrement dit, dans tous les cas, le masque 24 comprend au moins une ouverture superposée à la au moins une cavité 7, de surface supérieure ou égale à la surface de la cavité, de sorte à ne pas recouvrir la au moins une cavité. Dans cette réalisation, le masque 24 délimite donc une surface réduite relativement à la surface 11 totale de la portion de composant considérée, sur laquelle le dépôt de matière est réalisé. L'étape de dépôt de matière E4 comprend aussi une deuxième sous-étape finale de retrait du masque 24, après la fin du dépôt de la matière, pour atteindre le résultat représenté par la figure 1f.Optionally, the material deposition step E4 may comprise a first prior sub-step of affixing a mask 24, for example a rigid mask or a template, such as a silicon mask 24, to reduce the extent of the surface 11 concerned by the deposition of the layer of material 8 on the metallic or metallic alloy layer 22 around the cavities 7, in order to promote the subsequent step E5 of removal of the metallic or metallic alloy layer 22, which will be described below. According to a first variant, the pattern of the mask 24 can correspond exactly to the patterns of the cavities 7 to deposit the material only in the cavities 7. However, according to a second, simpler variant, the pattern of the mask 24 does not need to correspond exactly to the pattern formed by the cavities 7 on the surface 11, and can reveal a narrow surface of the surface of the component around the cavities, as represented by the figure 1e . In the latter case, a layer of material 8 is also deposited outside the cavities 7, on the surface of the component. In other words, in all cases, the mask 24 comprises at least one opening superimposed on the at least one cavity 7, of surface greater than or equal to the surface of the cavity, so as not to cover the at least one cavity. In this embodiment, the mask 24 delimits therefore a reduced surface relative to the total surface 11 of the component portion considered, on which the deposition of material is carried out. The material deposition step E4 also includes a second final sub-step of removing the mask 24, after the end of the deposition of the material, to achieve the result represented by the figure 1f .

On note sur cette figure 1f que la couche métallique ou en alliage métallique 22 déposée sur la surface du composant sépare cette surface de la couche de matière 8. Cette couche métallique ou en alliage métallique 22 remplit ainsi une première fonction de séparation vis-à-vis du dépôt de matière.We note on this figure 1f that the metallic or metallic alloy layer 22 deposited on the surface of the component separates this surface from the layer of material 8. This metallic or metallic alloy layer 22 thus fulfills a first separation function with respect to the deposit of material.

Le procédé comprend ensuite une étape consistant à retirer E5 la couche métallique ou en alliage métallique 22 déposée en dehors de ladite au moins une cavité, notamment par attaque chimique sélective. En effet, cette étape peut mettre en œuvre un soulèvement (connu par sa dénomination anglaise de « lift-off ») de la couche de chrome par le biais d'une attaque chimique sélective, en particulier par le biais d'un bain d'acide. Cette attaque est telle qu'elle supprime la couche métallique ou en alliage métallique 22 sans endommager la surface 11 du composant horloger, notamment sans endommager la couche de dioxyde de silicium selon ce mode de réalisation. La dissolution de la couche métallique ou en alliage métallique 22 induit dans le même temps le retrait de la couche de matière 8 située en dehors de la ou des cavités 7. Dans cette étape, le fait notamment que la couche de matière 8 ne recouvre pas totalement la couche métallique ou en alliage métallique 22 sur l'entier de la surface 11 du composant permet de minimiser le temps nécessaire à la réalisation de cette étape. Le résultat final est illustré par la figure 1g. La couche métallique ou en alliage métallique 22 remplit ainsi la fonction de couche sacrificielle, qui permet le retrait facile de la couche de matière déposée en dehors des cavités, le souhait final étant de ne conserver cette matière que dans les cavités.The method then comprises a step consisting of removing E5 the metal or metal alloy layer 22 deposited outside said at least one cavity, in particular by selective chemical attack. Indeed, this step can implement a lifting (known by its English name "lift-off") of the chromium layer by means of a selective chemical attack, in particular by means of a bath of acid. This attack is such that it removes the metal or metal alloy layer 22 without damaging the surface 11 of the watch component, in particular without damaging the silicon dioxide layer according to this embodiment. The dissolution of the metal or metal alloy layer 22 induces at the same time the removal of the layer of material 8 located outside the cavities 7. In this step, the fact in particular that the layer of material 8 does not cover the metal or metal alloy layer 22 completely over the entire surface 11 of the component makes it possible to minimize the time necessary to carry out this step. The final result is illustrated by the figure 1g . The metal or metal alloy layer 22 thus fulfills the function of sacrificial layer, which allows easy removal of the layer of material deposited outside the cavities, the final desire being to only retain this material in the cavities.

Avantageusement, le recouvrement parfait de la couche de matière 8 sur la couche métallique ou en alliage métallique 22 présente dans les cavités 7 permet à ces couches de ne pas être impactées par l'étape de retrait E5. Ainsi, ces deux couches 22, 8 restent présentes dans les cavités 7. En remarque, la couche métallique ou en alliage métallique 22 remplit avantageusement une deuxième fonction de couche d'accroche de la couche de matière 8 au sein des cavités, en améliorant l'adhérence de la couche de matière 8 sur le composant 1.Advantageously, the perfect covering of the material layer 8 on the metal or metal alloy layer 22 present in the cavities 7 allows these layers not to be impacted by the removal step E5. Thus, these two layers 22, 8 remain present in the cavities 7. As a note, the metal or metal alloy layer 22 advantageously fulfills a second function of bonding layer of the material layer 8 within the cavities, by improving the adhesion of the layer of material 8 on component 1.

Par ailleurs, pour optimiser l'étape de retrait décrite ci-dessus, il est très avantageux qu'il y ait une discontinuité de la couche métallique ou en alliage métallique 22 au niveau de la au moins une cavité 7. Ainsi, il est avantageux qu'il n'y ait pas de couche métallique ou en alliage métallique 22 déposée sur tout ou partie des flancs 18 de la au moins une cavité, notamment pas en partie haute de ces flancs 18. Autrement dit, la couche métallique ou en alliage métallique 22 ne s'étend que sur le fond 17 de la cavité 7 ou ne s'étend pas sur les flancs 18, ou s'étend sur une hauteur négligeable des flancs 18, notamment pas en partie haute des flancs. Pour faciliter ce résultat, il est aussi avantageux que la au moins une cavité 7 présente elle-même une discontinuité au niveau de la frontière entre la surface 11 et les flancs 18 de la cavité 7. C'est notamment le cas lorsque les flancs 18 sont verticaux ou sensiblement verticaux. En complément, l'épaisseur de la couche de matière 8 est suffisamment épaisse pour qu'elle puisse complètement recouvrir la couche métallique ou en alliage métallique 22 dans les cavités 7, notamment au moins sur le fond 17 des cavités 7, et ne pas présenter de trous susceptibles de laisser passer l'acide à travers lors d'une attaque chimique réalisée dans cette étape de retrait. Ainsi, selon un mode de réalisation privilégié, l'épaisseur de la couche de matière 8 est d'au moins 100 nm, notamment est comprise entre 100 nm à 200 nm. En remarque, l'épaisseur de la couche de matière 8 est préférentiellement supérieure à celle de la couche métallique ou en alliage métallique 22. Plus généralement, toute configuration, regroupant tout ou partie des caractéristiques proposées ci-dessus, permettant de rendre la couche métallique ou en alliage métallique 22 non accessible à l'intérieur de la au moins une cavité 7, est très avantageuse pour garantir le non retrait des deux couches superposées 22, 8 au niveau de la au moins une cavité.Furthermore, to optimize the removal step described above, it is very advantageous for there to be a discontinuity of the metal or metal alloy layer 22 at the level of the at least one cavity 7. Thus, it is advantageous that there is no metallic or metallic alloy layer 22 deposited on all or part of the flanks 18 of the at least one cavity, in particular not in the upper part of these flanks 18. In other words, the metallic or alloy layer metal 22 only extends over the bottom 17 of the cavity 7 or does not extend over the sides 18, or extends over a negligible height of the sides 18, in particular not in the upper part of the sides. To facilitate this result, it is also advantageous for the at least one cavity 7 itself to have a discontinuity at the border between the surface 11 and the sides 18 of the cavity 7. This is particularly the case when the sides 18 are vertical or substantially vertical. In addition, the thickness of the layer of material 8 is sufficiently thick so that it can completely cover the metal or metal alloy layer 22 in the cavities 7, in particular at least on the bottom 17 of the cavities 7, and not present holes likely to allow acid to pass through during a chemical attack carried out in this removal step. Thus, according to a preferred embodiment, the thickness of the layer of material 8 is at least 100 nm, in particular is between 100 nm to 200 nm. As a note, the thickness of the material layer 8 is preferentially greater than that of the metallic or metallic alloy layer 22. More generally, any configuration, bringing together all or part of the characteristics proposed above, making it possible to make the metallic layer or metal alloy 22 not accessible inside the at least one cavity 7, is very advantageous for guaranteeing the non-removal of the two superimposed layers 22, 8 at the level of the at least one cavity.

Enfin, le procédé peut comprendre une étape, optionnelle, consistant à détacher E6 les ébauches 1a du substrat 10a. Pour faciliter la mise en œuvre cette étape, l'ébauche 1a de composant peut comporter une zone de rupture partiellement gravée, notamment telle que décrite dans le document EP3632839A1 .Finally, the method can include an optional step consisting of detaching E6 the blanks 1a from the substrate 10a. To facilitate the implementation of this step, the component blank 1a may include a partially engraved break zone, in particular as described in the document EP3632839A1 .

Naturellement, la composition de la couche métallique ou en alliage métallique 22 sera adaptée au cas par cas à celle de la couche de matière 8 choisie, par exemple en fonction de la matière choisie et/ou de son épaisseur. La couche métallique ou en alliage métallique 22 présentera une composition différente de celle de la couche de matière 8 dans le cas où cette dernière est métallique.Naturally, the composition of the metal or metal alloy layer 22 will be adapted on a case-by-case basis to that of the layer of material 8 chosen, for example as a function of the material chosen and/or its thickness. The metallic or metallic alloy layer 22 will have a composition different from that of the material layer 8 in the case where the latter is metallic.

Selon des variantes de réalisation, l'étape consistant à déposer E4 une matière consiste en une étape d'application sur le fond 17 de la ou des cavités 7 d'une couche de matière 8 qui est une couche d'une peinture, appliquée par toute technique connue de l'homme de métier, comme une technique de pulvérisation ou par le biais d'un pinceau. En alternative, une couche d'une laque, d'un vernis ou d'un composite, en particulier d'un composite luminescent, peut être appliquée.According to alternative embodiments, the step consisting of depositing E4 a material consists of a step of applying to the bottom 17 of the cavities 7 a layer of material 8 which is a layer of paint, applied by any technique known to those skilled in the art, such as a spraying technique or using a brush. Alternatively, a layer of a lacquer, varnish or composite, in particular a luminescent composite, can be applied.

L'épaisseur de ladite couche de matière 8 peut correspondre sensiblement à la profondeur de la cavité 7 dans laquelle elle est déposée. Dans ce cas de figure, l'épaisseur de ladite couche de matière 8 peut être préférentiellement très légèrement inférieure à la profondeur de la cavité 7.The thickness of said layer of material 8 can correspond substantially to the depth of the cavity 7 in which it is deposited. In this scenario, the thickness of said layer of material 8 can preferably be very slightly less than the depth of the cavity 7.

En remarque, dans tous les modes de réalisation et leurs variantes, il est possible de réaliser l'étape de dépôt de matière E4 après la mise en œuvre de l'étape consistant à détacher E6 l'ébauche 1a du substrat 10a, notamment dans le cadre d'une application manuelle de la couche de matière 8 selon la réalisation décrite ci-dessus.As a note, in all the embodiments and their variants, it is possible to carry out the material deposition step E4 after the implementation of the step consisting of detaching E6 the blank 1a from the substrate 10a, in particular in the framework of a manual application of the layer of material 8 according to the embodiment described above.

De plus, dans tous les modes de réalisation, toutes les étapes pourraient être mises en œuvre sur une ébauche 1a de composant seule, non liée à un substrat. Elles peuvent de plus être mises en œuvre à différentes étapes de la fabrication d'un composant horloger, c'est-à-dire sur une ébauche d'un tel composant horloger, en cours de fabrication, voire directement sur un composant horloger finalisé ou quasi-finalisé.Furthermore, in all embodiments, all the steps could be implemented on a component blank 1a alone, not linked to a substrate. They can also be implemented at different stages of manufacturing. of a watch component, that is to say on a blank of such a watch component, during manufacture, or even directly on a finalized or almost finalized watch component.

Un tel procédé est tout particulièrement adapté à la fabrication d'un ressort-spiral, en utilisant la variante consistant à réaliser la ou les cavités de l'invention avant de graver les spires, sinon il serait en pratique délicat de positionner une résine liquide sur des spires pour graver les cavités de l'invention puisque de la résine coulerait entre ces spires, dans le cas de figure où l'étape E3 est une étape de gravure ionique réactive profonde.Such a process is particularly suitable for the manufacture of a spiral spring, using the variant consisting of making the cavities of the invention before engraving the turns, otherwise it would be difficult in practice to position a liquid resin on turns to etch the cavities of the invention since resin would flow between these turns, in the case where step E3 is a deep reactive ion etching step.

Finalement, il apparaît que l'invention atteint les objets recherchés par la combinaison des deux étapes essentielles suivantes appliquées sur au moins une portion comprenant une surface, en particulier une surface supérieure, d'une ébauche de composant horloger ou d'un composant horloger :

  • graver E3 ladite surface de l'ébauche ou du composant horloger pour former au moins une cavité ;
  • déposer une matière E4 dans ladite au moins une cavité pour former une couche de matière 8,
Finally, it appears that the invention achieves the desired objects by the combination of the following two essential steps applied to at least one portion comprising a surface, in particular an upper surface, of a watch component blank or of a watch component:
  • etch E3 said surface of the blank or the watch component to form at least one cavity;
  • deposit a material E4 in said at least one cavity to form a layer of material 8,

Une couche métallique ou en alliage métallique 22 intermédiaire, servant de couche sacrificielle et/ou d'accroche, étant intercalée entre la surface 11 du composant et la couche de matière 8.An intermediate metal or metal alloy layer 22, serving as a sacrificial and/or adhesion layer, being interposed between the surface 11 of the component and the layer of material 8.

Dans tous les modes de réalisation et leurs variantes, la profondeur d'au moins une cavité, et de préférence de toutes les cavités, est avantageusement inférieure à 10 µm, voire inférieure à 6 µm. Cette profondeur est de plus optionnellement supérieure à 3 µm. Ainsi, cette profondeur peut être comprise entre 3 µm et 10 µm, voire entre 3 µm et 6 µm. De manière surprenante, il apparaît à l'œil nu que le contraste entre au moins une cavité 7 et la surface 11 est d'autant plus marqué que la profondeur de ladite au moins une cavité 7 est faible pour un composant horloger de petit format tel qu'un composant de mouvement horloger comme un ressort spiral. Cela est d'autant plus notable lorsque la couche de matière 8 est métallique ou en un alliage métallique et que le composant comprend notamment tout ou partie du silicium.In all embodiments and their variants, the depth of at least one cavity, and preferably of all the cavities, is advantageously less than 10 µm, or even less than 6 µm. This depth is also optionally greater than 3 µm. Thus, this depth can be between 3 µm and 10 µm, or even between 3 µm and 6 µm. Surprisingly, it appears to the naked eye that the contrast between at least one cavity 7 and the surface 11 is all the more marked as the depth of said at least one cavity 7 is low for a small format watch component such as than a watch movement component such as a spiral spring. This is all the more notable when the layer of material 8 is metallic or a metallic alloy and that the component comprises in particular all or part of the silicon.

De plus, la profondeur d'au moins une cavité, et de préférence de toutes les cavités, peut de plus être supérieure ou égale à l'épaisseur d'un éventuel revêtement de dioxyde de silicium 13 présent sur ladite surface lorsque le composant comprend tout ou partie du silicium. Un tel revêtement de dioxyde de silicium peut comprendre une épaisseur comprise entre 0.1 µm et 5 µm.In addition, the depth of at least one cavity, and preferably of all the cavities, can also be greater than or equal to the thickness of a possible coating of silicon dioxide 13 present on said surface when the component comprises all or part of silicon. Such a silicon dioxide coating may comprise a thickness of between 0.1 µm and 5 µm.

En variante, particulièrement adaptée si le composant 1 est un composant d'habillage comme par exemple un disque de lunette, en particulier en céramique, la profondeur d'au moins une cavité, et de préférence de toutes les cavités, est comprise entre 10 µm et 100 µm, voire comprise entre 15 µm et 80 µm, voire comprise entre 20 µm et 50 µm.As a variant, particularly suitable if component 1 is a covering component such as for example a bezel disc, in particular made of ceramic, the depth of at least one cavity, and preferably of all the cavities, is between 10 µm and 100 µm, or even between 15 µm and 80 µm, or even between 20 µm and 50 µm.

Dans le cas notamment d'un composant de mouvement horloger, au moins une cavité, de préférence toutes les cavités, peut de plus présenter une longueur d'au moins 100 µm, voire d'au moins 150 µm, voire d'au moins 200 µm, voire d'au moins 250 µm, dans au moins une direction. Cette longueur peut être inférieure ou égale à 800 µm, voire inférieure ou égale à 600 µm, voire inférieure ou égale à 500 µm, voire inférieure ou égale à 400 µm.In the particular case of a watch movement component, at least one cavity, preferably all the cavities, may also have a length of at least 100 µm, or even at least 150 µm, or even at least 200 µm, or even at least 250 µm, in at least one direction. This length may be less than or equal to 800 µm, or even less than or equal to 600 µm, or even less than or equal to 500 µm, or even less than or equal to 400 µm.

La matière déposée dans la au moins une cavité peut être un métal ou un alliage métallique. En variante, elle peut être une peinture, une laque, un vernis, un composite, notamment en particulier un composite luminescent, avec optionnellement une couche métallique d'accroche intermédiaire.The material deposited in the at least one cavity may be a metal or a metal alloy. Alternatively, it can be a paint, a lacquer, a varnish, a composite, in particular in particular a luminescent composite, with optionally an intermediate metallic bonding layer.

Dans les modes de réalisation et leurs variantes, la matière déposée dans la au moins une cavité présente avantageusement une épaisseur strictement inférieure à la profondeur de la cavité. L'épaisseur de dépôt peut être supérieure ou égale à 100 nm. Elle peut être comprise entre 100 nm et 1000 nm, avantageusement entre 100 nm et 200 nm. En variante, elle peut présenter une épaisseur égale ou sensiblement égale à la profondeur de la cavité. De plus, la somme de l'épaisseur de la couche de matière 8 et de l'épaisseur de la couche métallique ou en alliage métallique 22 peut être strictement inférieure à la profondeur de la cavité, ou sensiblement égale à la profondeur de la cavité.In the embodiments and their variants, the material deposited in the at least one cavity advantageously has a thickness strictly less than the depth of the cavity. The deposit thickness can be greater than or equal to 100 nm. It can be between 100 nm and 1000 nm, advantageously between 100 nm and 200 nm. Alternatively, it may have a thickness equal to or substantially equal to the depth of the cavity. Furthermore, the sum of the thickness of the material layer 8 and the thickness of the metal or metal alloy layer 22 may be strictly less than the depth of the cavity, or substantially equal to the depth of the cavity.

L'invention s'applique particulièrement bien à tout composant de mouvement horloger en matériau micro-usinable, c'est-à-dire obtenu à partir de techniques de micro-fabrication, en particulier celles faisant intervenir la photolithographie ou celles faisant intervenir l'usage d'un laser. Ainsi, un tel composant de mouvement horloger, en particulier sa forme générale, peut par exemple être obtenu, au moins partiellement, par une étape de gravure ionique réactive profonde (sigle DRIE en anglais). En alternative, un tel composant de mouvement horloger, en particulier sa forme générale, peut par exemple être obtenu, au moins partiellement, par technologie UV-Liga (Lithographie Galvanik Abformung).The invention applies particularly well to any watch movement component made of micro-machinable material, that is to say obtained from micro-manufacturing techniques, in particular those involving photolithography or those involving use of a laser. Thus, such a watch movement component, in particular its general shape, can for example be obtained, at least partially, by a deep reactive ionic engraving step (DRIE acronym in English). Alternatively, such a watch movement component, in particular its general shape, can for example be obtained, at least partially, by UV-Liga technology (Lithography Galvanik Abformung).

Le composant horloger selon l'invention peut comprendre tout ou partie du silicium, sous toute forme. Il peut ainsi comprendre du silicium monocristallin quelle que soit son orientation, du silicium polycristallin, du silicium amorphe, du dioxyde de silicium amorphe, du silicium dopé quels que soient le type et le niveau de dopage. Il peut notamment être fabriqué à partir d'un substrat SOI (silicium sur isolant).The watch component according to the invention may comprise all or part of the silicon, in any form. It can thus include monocrystalline silicon whatever its orientation, polycrystalline silicon, amorphous silicon, amorphous silicon dioxide, doped silicon whatever the type and level of doping. It can in particular be manufactured from an SOI (silicon on insulator) substrate.

Le composant horloger selon l'invention peut également comprendre du carbure de silicium, du verre, de la céramique, du quartz, du rubis ou encore du saphir. En alternative, il peut être en métal ou en un alliage métallique, notamment un alliage métallique au moins partiellement amorphe. Par exemple, un tel composant peut comprendre du nickel ou du nickel-phosphore, ou encore de l'acier, du titane, un alliage d'or, ou un alliage platinoïde.The watch component according to the invention may also comprise silicon carbide, glass, ceramic, quartz, ruby or even sapphire. Alternatively, it may be made of metal or a metal alloy, in particular a metal alloy that is at least partially amorphous. For example, such a component may comprise nickel or nickel-phosphorus, or even steel, titanium, a gold alloy, or a platinum alloy.

Naturellement, l'invention ne se limite pas aux modes de réalisation décrits, et il est possible d'imaginer d'autres réalisations, par exemple par combinaison des modes de réalisation et/ou de leurs variantes. En particulier, l'étape de gravage E3 peut combiner la mise en œuvre d'une gravure ionique réactive profonde en utilisant un masque obtenu par photolithographie et un gravage par laser, notamment par un laser femtoseconde.Naturally, the invention is not limited to the embodiments described, and it is possible to imagine other embodiments, for example by combining the embodiments and/or their variants. In particular, the etching step E3 can combine the implementation of deep reactive ion etching using a mask obtained by photolithography and laser etching, in particular by a femtosecond laser.

Il apparaît donc que l'invention atteint les objets recherchés en combinant avantageusement une gravure sur une surface d'un composant et son remplissage partiel, voire total, d'une matière, par l'intermédiaire d'une couche métallique ou en alliage métallique sacrificielle. Cette combinaison permet de former un marquage lisible, en particulier un marquage visible et attractif, même sur une petite surface, sans impacter la fonctionnalité d'un composant de mouvement horloger. Avantageusement, cette surface est une surface supérieure ou une surface visible, notamment une surface visible lorsque le composant est assemblé au sein d'une pièce d'horlogerie, en particulier au sein d'un mouvement horloger. Alternativement, cette surface est une surface inférieure ou une surface non visible.It therefore appears that the invention achieves the desired objects by advantageously combining engraving on a surface of a component and its partial, or even total, filling with a material, via a sacrificial metallic or metallic alloy layer. . This combination makes it possible to form a readable marking, in particular a visible and attractive marking, even on a small surface, without impacting the functionality of a watch movement component. Advantageously, this surface is an upper surface or a visible surface, in particular a visible surface when the component is assembled within a timepiece, in particular within a watch movement. Alternatively, this surface is a lower surface or a non-visible surface.

Le marquage peut être prévu à des fins décoratives. Alternativement ou complémentairement, il peut être prévu à des fins d'identification. Les variantes du procédé selon l'invention, qui font intervenir un laser, en particulier un laser femtoseconde, sont particulièrement avantageuses afin d'individualiser le marquage sur un composant horloger, en particulier un composant de mouvement horloger, notamment sur un ressort-spiral particulier. Le marquage peut par exemple former un numéro de série ou un résultat de mesure.The marking may be intended for decorative purposes. Alternatively or additionally, it may be provided for identification purposes. The variants of the method according to the invention, which involve a laser, in particular a femtosecond laser, are particularly advantageous in order to individualize the marking on a watch component, in particular a watch movement component, in particular on a particular spiral spring. . The marking can, for example, form a serial number or a measurement result.

L'invention porte aussi sur un composant horloger obtenu par le procédé de fabrication décrit précédemment. Le composant peut être un composant de mouvement horloger comme une bascule, une roue, par exemple une roue d'un dispositif d'échappement, une ancre, un balancier ou un ressort-spiral, notamment un ressort-spiral d'oscillateur. En variante, le composant horloger peut être un composant d'habillage comme une lunette ou un disque de lunette, ou un rehaut. Notamment, selon un mode de réalisation particulier, le composant peut être un composant de mouvement horloger comme un ressort-spiral en matériau micro-usinable comprenant une première portion formant un organe de liaison comprenant une surface, en particulier une surface supérieure ou une surface visible, et une deuxième portion moins rigide que la première portion comprenant au moins une lame enroulée en forme de spiral formant un ressort, la surface de la première portion comprenant au moins une cavité dans laquelle est déposée une matière selon l'invention. Plus généralement, le composant horloger, ou au moins la portion comprenant la surface considérée par l'invention, se présente avantageusement à base d'un matériau micro-usinable, notamment à base de silicium, c'est-à-dire comprenant en poids au moins 50% de matériau micro-usinable.The invention also relates to a watch component obtained by the manufacturing process described above. The component may be a watch movement component such as a rocker, a wheel, for example a wheel of an escapement device, an anchor, a balance wheel or a spiral spring, in particular an oscillator spiral spring. Alternatively, the watch component may be a trim component such as a bezel or a bezel disc, or a flange. In particular, according to a particular embodiment, the component can be a watch movement component such as a spiral spring made of micro-machinable material comprising a first portion forming a connecting member comprising a surface, in particular an upper surface or a visible surface , and a second portion less rigid than the first portion comprising at least one blade wound in the shape of a spiral forming a spring, the surface of the first portion comprising at least one cavity in which a material according to the invention is deposited. More generally, the watch component, or at least the portion comprising the surface considered by the invention, is advantageously based on a micro-machinable material, in particular based on silicon, that is to say comprising by weight at least 50% micro-machinable material.

La figure 3 illustre ainsi un ressort-spiral obtenu par un procédé de fabrication selon l'un des modes de réalisation décrits précédemment. Il comprend au moins une lame 2 dont la surface supérieure 12 est située dans un plan P1, et dont l'extrémité externe est venue de fabrication avec un organe de liaison 3 dont la rigidité est sensiblement supérieure à celle de l'au moins une lame 2. Le ressort spiral 1 comprend en outre une virole 4 d'axe A1, qui est venue de fabrication avec l'extrémité interne de l'au moins une lame 2.There Figure 3 thus illustrates a spiral spring obtained by a manufacturing process according to one of the embodiments described above. It comprises at least one blade 2 whose upper surface 12 is located in a plane P1, and whose external end is manufactured with a connecting member 3 whose rigidity is significantly greater than that of the at least one blade 2. The spiral spring 1 further comprises a ferrule 4 with axis A1, which comes from manufacturing with the internal end of the at least one blade 2.

L'organe de liaison 3 comprend une première portion centrale 31 en forme de portion d'anneau agencée autour de la lame 2, dont l'étendue angulaire est de l'ordre de 100 degrés en regard de l'axe A1. Cet organe de liaison 3 comprend également deux portions coudées 32 disposées de part et d'autre de la première portion centrale 31, qui comprennent chacune un élément de positionnement 5 et/ou de fixation dudit ressort-spiral, qui se présente ici sous la forme d'une ouverture.The connecting member 3 comprises a first central portion 31 in the form of a ring portion arranged around the blade 2, the angular extent of which is of the order of 100 degrees with respect to the axis A1. This connecting member 3 also comprises two bent portions 32 arranged on either side of the first central portion 31, which each comprise a positioning element 5 and/or fixing said spiral spring, which is here in the form of an opening.

L'organe de liaison 3 présente la particularité de comprendre des motifs (ou indications) 6 apposés sur sa surface 11 supérieure, positionnée dans le plan P1, notamment au niveau de sa portion centrale 31. La surface 11 supérieure est ici formée dans la continuité de la surface supérieure 12 de l'au moins une lame 2 du ressort-spiral.The connecting member 3 has the particularity of comprising patterns (or indications) 6 affixed to its upper surface 11, positioned in the plane P1, in particular at the level of its central portion 31. The upper surface 11 is here formed in continuity with the upper surface 12 of the at least one leaf 2 of the spiral spring.

Les motifs 6 résultent du procédé décrit précédemment, et comprennent des cavités 7 formées depuis la surface 11 supérieure, dans laquelle une couche de matière 8 est déposée.The patterns 6 result from the process described above, and include cavities 7 formed from the upper surface 11, in which a layer of material 8 is deposited.

L'étendue e des motifs, c'est-à-dire aussi l'étendue des cavités, mesurée radialement relativement à l'axe A1, peut être supérieure à 100 µm, voire supérieure à 150 µm, voire supérieure à 200 µm, voire supérieure à 250 µm. De tels motifs ou indications 6 peuvent ainsi être visibles ou lisibles une fois le ressort-spiral 1 monté au sein d'un balancier assemblé, lui-même assemblé au sein d'un mouvement horloger.The extent e of the patterns, that is to say also the extent of the cavities, measured radially relative to the axis A1, can be greater than 100 µm, or even greater than 150 µm, or even greater than 200 µm, or even greater than 250 µm. Such patterns or indications 6 can thus be visible or readable once the spiral spring 1 is mounted within an assembled balance wheel, itself assembled within a watch movement.

Ce ressort-spiral peut être un ressort-spiral pour balancier-spiral. Il peut être monobloc. Il peut se présenter en silicium, et il peut être fabriqué à partir d'un substrat en silicium ou à partir d'un substrat SOI (silicium sur isolant). La surface considérée par l'invention peut être recouverte d'un revêtement de dioxyde de silicium.This hairspring can be a hairspring for a hairspring balance. It can be one-piece. It can be made of silicon, and it can be made from a silicon substrate or from an SOI (silicon on insulator) substrate. The surface considered by the invention can be covered with a coating of silicon dioxide.

L'invention porte aussi sur une pièce d'horlogerie comprenant un tel composant horloger. Elle porte en particulier sur un mouvement horloger comprenant un tel composant de mouvement horloger.The invention also relates to a timepiece comprising such a timepiece component. It relates in particular to a watch movement comprising such a watch movement component.

Claims (16)

Procédé de fabrication d'un composant horloger (1) comprenant au moins une portion comprenant une surface (11), en particulier une surface supérieure, caractérisé en ce qu'il comprend au moins les étapes suivantes: - Graver (E3) ladite surface (11) du composant horloger (1) ou d'une ébauche (1a) du composant horloger (1) pour former au moins une cavité (7) ; - Déposer (E7) une couche métallique ou en alliage métallique (22) sur ladite surface (11), à la fois dans la au moins une cavité (7) et hors de la au moins une cavité (7) ; - Déposer une matière (E4) sur ladite couche métallique ou en alliage métallique (22), au moins au sein de la au moins une cavité (7), pour former une couche de matière (8), cette matière étant différente du métal ou de l'alliage métallique de ladite couche métallique ou en alliage métallique (22), cette couche métallique ou en alliage métallique (22) formant une couche d'accroche de ladite couche de matière (8). Method for manufacturing a watch component (1) comprising at least one portion comprising a surface (11), in particular an upper surface, characterized in that it comprises at least the following steps: - Engrave (E3) said surface (11) of the watch component (1) or of a blank (1a) of the watch component (1) to form at least one cavity (7); - Deposit (E7) a metallic or metallic alloy layer (22) on said surface (11), both in the at least one cavity (7) and outside the at least one cavity (7); - Deposit a material (E4) on said metal or metal alloy layer (22), at least within the at least one cavity (7), to form a layer of material (8), this material being different from the metal or of the metal alloy of said metal or metal alloy layer (22), this metal or metal alloy layer (22) forming an adhesion layer of said layer of material (8). Procédé de fabrication d'un composant horloger (1) selon la revendication précédente, caractérisé en ce que la profondeur de ladite au moins une cavité (7) est inférieure à 10 µm, voire inférieure à 6 µm et optionnellement supérieure à 3 µm.Method of manufacturing a watch component (1) according to the preceding claim, characterized in that the depth of said at least one cavity (7) is less than 10 µm, or even less than 6 µm and optionally greater than 3 µm. Procédé de fabrication d'un composant horloger (1) selon la revendication 1, caractérisé en ce que la profondeur de ladite au moins une cavité (7) est comprise entre 10 µm et 100 µm, voire comprise entre 15 µm et 80 µm, voire comprise entre 20 µm et 50 µm.Method of manufacturing a watch component (1) according to claim 1, characterized in that the depth of said at least one cavity (7) is between 10 µm and 100 µm, or even between 15 µm and 80 µm, or even between 20 µm and 50 µm. Procédé de fabrication d'un composant horloger (1) selon l'une des revendications précédentes, caractérisé en ce que ledit métal ou alliage métallique de la couche métallique ou en alliage métallique (22) est de l'aluminium, du chrome, ou du titane, ou un alliage d'aluminium, de chrome, ou de titane.Method of manufacturing a watch component (1) according to one of the preceding claims, characterized in that said metal or metal alloy of the metal or metal alloy layer (22) is of aluminum, chromium, or titanium, or an alloy of aluminum, chromium, or titanium. Procédé de fabrication d'un composant horloger (1) selon l'une des revendications précédentes, caractérisé en ce que l'étape consistant à déposer une matière (E4) dans ladite au moins une cavité (7) comprend le dépôt d'un métal ou d'un alliage métallique, ou le dépôt d'une peinture, d'une laque, d'un vernis, d'un composite, en particulier d'un composite luminescent.Method of manufacturing a watch component (1) according to one of the preceding claims, characterized in that the step consisting of depositing a material (E4) in said at least one cavity (7) comprises the deposit of a metal or a metal alloy, or the deposition of a paint, a lacquer, a varnish, a composite, in particular a luminescent composite. Procédé de fabrication d'un composant horloger (1) selon l'une des revendications précédentes, caractérisé en ce que l'étape consistant à graver (E3) ladite surface (11) forme au moins une cavité comprenant un fond (17) et des flancs (18) perpendiculaires audit fond (17), et/ou en ce que l'étape consistant à déposer (E7) une couche métallique ou en alliage métallique (22) est telle que la couche métallique ou en alliage métallique (22) ne s'étend pas sur toute la hauteur des flancs (18), notamment pas en partie haute des flancs, voire ne s'étend que sur le fond (17) de la au moins une cavité.Method of manufacturing a watch component (1) according to one of the preceding claims, characterized in that the step consisting of engraving (E3) said surface (11) forms at least one cavity comprising a bottom (17) and flanks (18) perpendicular to said bottom (17), and/or in that the step consisting of depositing (E7) a metallic or metallic alloy layer (22) is such that the metallic or metallic alloy layer (22) does not does not extend over the entire height of the sides (18), in particular not in the upper part of the sides, or even only extends over the bottom (17) of the at least one cavity. Procédé de fabrication d'un composant horloger (1) selon l'une des revendications précédentes, caractérisé en ce que l'étape consistant à déposer (E7) une couche métallique ou en alliage métallique (22) et/ou en ce que l'étape consistant à déposer une matière (E4) dans ladite au moins une cavité (7), en particulier sur le fond (17), est réalisée par un dépôt directionnel, notamment un dépôt physique en phase vapeur (PVD), notamment par un dépôt par évaporation thermique par faisceau à électron (EBE).Method of manufacturing a watch component (1) according to one of the preceding claims, characterized in that the step consisting of depositing (E7) a metallic or metallic alloy layer (22) and/or in that the step consisting of depositing a material (E4) in said at least one cavity (7), in particular on the bottom (17), is carried out by a directional deposition, in particular a physical vapor deposition (PVD), in particular by a deposition by thermal electron beam evaporation (EBE). Procédé de fabrication d'un composant horloger (1) selon l'une des revendications précédentes, caractérisé en ce que ladite portion comprenant ladite surface (11) comprend un matériau micro-usinable, notamment en tout ou partie du silicium, comme du silicium monocristallin, du silicium polycristallin, du silicium amorphe, du dioxyde de silicium amorphe, du silicium dopé, du carbure de silicium, ou du verre, de la céramique, du quartz, du rubis, du diamant, ou comprend un métal ou un alliage métallique, notamment un alliage métallique au moins partiellement amorphe, comme du nickel ou du nickel-phosphore, ou encore de l'acier, du titane, un alliage d'or, ou un alliage platinoïde.Method of manufacturing a watch component (1) according to one of the preceding claims, characterized in that said portion comprising said surface (11) comprises a micro-machinable material, in particular in all or part of silicon, such as monocrystalline silicon, polycrystalline silicon, amorphous silicon, amorphous silicon dioxide, doped silicon, silicon carbide, or glass, ceramic, quartz, ruby, diamond, or comprises a metal or a metal alloy, in particular an at least partially amorphous metal alloy, such as nickel or nickel-phosphorus, or even steel, titanium, a gold alloy, or a platinum alloy. Procédé de fabrication d'un composant horloger (1) selon l'une des revendications 1 à 7, caractérisé en ce que ladite portion comprenant ladite surface (11) se présente en silicium et en ce qu'il comprend une étape d'oxydation (E8) du silicium, formant une couche de dioxyde de silicium (13) sur ladite surface (11), à la fois dans la au moins une cavité (7) et hors de la au moins une cavité (7), réalisée après la mise en œuvre de l'étape consistant à graver (E3) ladite surface (11), et/ou en ce qu'il comprend une étape d'oxydation (E8) du silicium, formant une couche de dioxyde de silicium (13) sur ladite surface (11), à la fois dans la au moins une cavité (7) et hors de la au moins une cavité (7), réalisée avant la mise en œuvre de l'étape consistant à déposer (E7) une couche métallique ou en alliage métallique (22) sur ladite surface (11).Method of manufacturing a watch component (1) according to one of claims 1 to 7, characterized in that said portion comprising said surface (11) is made of silicon and in that it comprises an oxidation step ( E8) silicon, forming a layer of silicon dioxide (13) on said surface (11), both in the at least one cavity (7) and outside the at least one cavity (7), produced after placing implementing the step consisting of etching (E3) said surface (11), and/or in that it comprises a step of oxidation (E8) of silicon, forming a layer of silicon dioxide (13) on said surface (11), both in the at least one cavity (7) and outside the at least one cavity (7), carried out before the implementation of the step consisting of depositing (E7) a metallic layer or in metal alloy (22) on said surface (11). Procédé de fabrication d'un composant horloger (1) selon l'une des revendications précédentes, caractérisé en ce que l'étape consistant à graver (E3) ladite surface de la portion dudit composant horloger (1) ou d'une ébauche (1a) dudit composant horloger (1) comprend la mise en œuvre d'une gravure ionique réactive profonde au travers d'un masque obtenu par photolithographie et/ou comprend la mise en œuvre d'un gravage par laser, notamment par un laser femtoseconde.Method of manufacturing a watch component (1) according to one of the preceding claims, characterized in that the step consisting of engraving (E3) said surface of the portion of said watch component (1) or of a blank (1a ) of said watch component (1) comprises the implementation of deep reactive ion engraving through a mask obtained by photolithography and/or comprises the implementation of laser engraving, in particular by a femtosecond laser. Procédé de fabrication d'un composant horloger (1) selon l'une des revendications précédentes, caractérisé en ce que l'étape consistant à graver (E3) ladite surface de la portion est réalisée dans une même opération qu'une étape consistant à graver un contour dudit composant horloger (1), et/ou en ce que l'étape consistant à graver (E3) ladite surface de la portion est réalisée avant une étape consistant à graver un contour dudit composant horloger (1), et/ou en ce que l'étape consistant à graver (E3) ladite surface de la portion comprend une étape de positionnement d'un premier masque sur un substrat (10a), notamment sur ladite surface (11) dudit substrat (10a), de sorte à réaliser l'étape consistant à graver (E3) au moins une cavité (7) à partir de ce premier masque, et une étape de positionnement d'un deuxième masque distinct du premier masque sur ledit substrat (10a), notamment sur une autre surface dudit substrat (10a), de sorte à graver un contour de l'ébauche (1a) de composant horloger (1) à partir de ce deuxième masque.Method of manufacturing a watch component (1) according to one of the preceding claims, characterized in that the step consisting of engraving (E3) said surface of the portion is carried out in the same operation that a step consisting of engraving an outline of said watch component (1), and/or in that the step consisting of engraving (E3) said surface of the portion is carried out before a step consisting of engraving an outline of said watch component ( 1), and/or in that the step consisting of etching (E3) said surface of the portion comprises a step of positioning a first mask on a substrate (10a), in particular on said surface (11) of said substrate ( 10a), so as to carry out the step consisting of etching (E3) at least one cavity (7) from this first mask, and a step of positioning a second mask distinct from the first mask on said substrate (10a) , in particular on another surface of said substrate (10a), so as to engrave an outline of the blank (1a) of the watch component (1) from this second mask. Procédé de fabrication d'un composant horloger (1) selon l'une des revendications précédentes, caractérisé en ce qu'il comprend une étape intermédiaire entre les étapes consistant d'une part à déposer (E7) une couche métallique ou en alliage métallique (22) et d'autre part à déposer une matière (E4) sur ladite couche métallique ou en alliage métallique (22), cette étape intermédiaire comprenant le dépôt d'un masque (24) sur la couche métallique ou en alliage métallique (22), ce masque (24) comprenant au moins une ouverture superposée à la au moins une cavité (7), de surface supérieure ou égale à la surface de la cavité, de sorte à ne pas recouvrir la au moins une cavité.Method of manufacturing a watch component (1) according to one of the preceding claims, characterized in that it comprises an intermediate step between the steps consisting on the one hand of depositing (E7) a metallic or metallic alloy layer ( 22) and on the other hand to deposit a material (E4) on said metallic or metallic alloy layer (22), this intermediate step comprising the deposition of a mask (24) on the metallic or metallic alloy layer (22) , this mask (24) comprising at least one opening superimposed on the at least one cavity (7), of surface greater than or equal to the surface of the cavity, so as not to cover the at least one cavity. Procédé de fabrication d'un composant horloger (1) selon l'une des revendications précédentes, caractérisé en ce qu'il comprend une étape consistant à retirer (E5) la couche métallique ou en alliage métallique (22) déposée en dehors de ladite au moins une cavité (7), notamment par attaque chimique sélective, ultérieure à l'étape consistant à déposer une matière (E4) dans ladite au moins une cavité (7).Method of manufacturing a watch component (1) according to one of the preceding claims, characterized in that it comprises a step consisting of removing (E5) the metallic or metallic alloy layer (22) deposited outside said au at least one cavity (7), in particular by selective chemical attack, subsequent to the step consisting of depositing a material (E4) in said at least one cavity (7). Procédé de fabrication d'un composant horloger (1) selon l'une des revendications précédentes, caractérisé en ce que le composant horloger est un composant de mouvement comme une bascule, une roue, en particulier une roue d'un dispositif d'échappement, un ressort, en particulier un ressort-spiral, une ancre, un balancier, ou un composant d'habillage comme une lunette, en particulier une lunette ou un disque de lunette ou un rehaut.Method of manufacturing a watch component (1) according to one of the preceding claims, characterized in that the watch component is a movement component such as a rocker, a wheel, in particular a wheel of an escapement device, a spring, in particular a spiral spring, an anchor, a balance wheel, or a covering component such as a bezel, in particularly a bezel or a bezel disc or a flange. Composant horloger comprenant au moins une première portion comprenant une surface (11), en particulier une surface supérieure, caractérisé en ce qu'il comprend au moins une cavité (7) comprenant des flancs (18) et un fond (17), agencée dans ladite surface (11), et en ce qu'il comprend une couche métallique ou en alliage métallique (22) agencée sur le fond (17) de ladite cavité et ne s'étendant pas sur les flancs (18) ou ne s'étendant pas sur toute la hauteur des flancs (18), et une couche de matière (8) agencée sur la couche métallique ou en alliage métallique (22) au moins dans ladite au moins une cavité (7), la couche métallique ou en alliage métallique (22) remplissant la fonction d'accroche de ladite couche de matière (8), et caractérisé en ce que l'épaisseur de la couche de matière (8) est supérieure à l'épaisseur de la couche métallique ou en alliage métallique (22).Watch component comprising at least a first portion comprising a surface (11), in particular an upper surface, characterized in that it comprises at least one cavity (7) comprising sides (18) and a bottom (17), arranged in said surface (11), and in that it comprises a metallic or metallic alloy layer (22) arranged on the bottom (17) of said cavity and not extending on the sides (18) or not extending not over the entire height of the sides (18), and a layer of material (8) arranged on the metallic or metallic alloy layer (22) at least in said at least one cavity (7), the metallic or metallic alloy layer (22) fulfilling the function of holding said layer of material (8), and characterized in that the thickness of the layer of material (8) is greater than the thickness of the metal or metal alloy layer (22). ). Composant horloger selon la revendication précédente, caractérisé en ce que l'épaisseur de la couche métallique ou en alliage métallique (22) est inférieure ou égale à 100 nm, et/ou en ce que l'épaisseur de la couche de matière (8) est comprise entre 100 nm et 200 nm, et/ou en ce que la profondeur de ladite au moins une cavité (7) est inférieure à 10 µm, voire inférieure à 6 µm et optionnellement supérieure à 3 µm et/ou en ce que la somme de l'épaisseur de la couche de matière (8) et de l'épaisseur de la couche métallique ou en alliage métallique (22) est strictement inférieure à la profondeur de la cavité et/ou en ce que l'étendue de la au moins une cavité est supérieure à 100 µm, voire supérieure à 150 µm, voire supérieure à 200 µm, voire supérieure à 250 µm.Watch component according to the preceding claim, characterized in that the thickness of the metal or metal alloy layer (22) is less than or equal to 100 nm, and/or in that the thickness of the material layer (8) is between 100 nm and 200 nm, and/or in that the depth of said at least one cavity (7) is less than 10 µm, or even less than 6 µm and optionally greater than 3 µm and/or in that the sum of the thickness of the material layer (8) and the thickness of the metal or metal alloy layer (22) is strictly less than the depth of the cavity and/or in that the extent of the at least one cavity is greater than 100 µm, or even greater than 150 µm, or even greater than 200 µm, or even greater than 250 µm.
EP22187582.6A 2022-07-28 2022-07-28 Method for manufacturing a clock component Pending EP4312085A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP22187582.6A EP4312085A1 (en) 2022-07-28 2022-07-28 Method for manufacturing a clock component
US18/357,096 US20240036522A1 (en) 2022-07-28 2023-07-21 Method for manufacturing a horological component
JP2023121499A JP2024019087A (en) 2022-07-28 2023-07-26 Method for manufacturing horological component
CN202310939105.2A CN117471891A (en) 2022-07-28 2023-07-28 Method for manufacturing timepiece component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP22187582.6A EP4312085A1 (en) 2022-07-28 2022-07-28 Method for manufacturing a clock component

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EP4312085A1 true EP4312085A1 (en) 2024-01-31

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US (1) US20240036522A1 (en)
EP (1) EP4312085A1 (en)
JP (1) JP2024019087A (en)
CN (1) CN117471891A (en)

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EP1548524A1 (en) * 2003-12-23 2005-06-29 Rolex S.A. Ceramic element for watch case and method of manufacturing the same
EP2237698B1 (en) * 2008-01-25 2015-04-22 Commissariat à l'Énergie Atomique et aux Énergies Alternatives Object provided with a graphics element transferred onto a support wafer and method of producing such an object
EP2855400B1 (en) * 2012-05-30 2016-06-01 The Swatch Group Research and Development Ltd. Ceramic element inlaid with at least one composite ceramic decoration
JP2016113653A (en) * 2014-12-12 2016-06-23 シチズンホールディングス株式会社 Electroforming component production method and electroforming component
CH710716A2 (en) * 2015-02-12 2016-08-15 Swatch Group Res & Dev Ltd Method of manufacturing a part with at least one decoration
EP3339980A1 (en) * 2016-12-22 2018-06-27 The Swatch Group Research and Development Ltd Method for producing a pattern on a timepiece and timepiece
EP2902177B1 (en) * 2014-01-30 2019-03-13 Mestel SA Method for applying a filling material to a substrate having a free surface in a finished state
CH714234A1 (en) * 2017-10-13 2019-04-15 Horlaser S A A method of manufacturing a coin and a watch or jewelery coin, with a surface comprising oxidation-colored titanium.
EP3632839A1 (en) 2013-12-20 2020-04-08 Rolex Sa Clock component

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1548524A1 (en) * 2003-12-23 2005-06-29 Rolex S.A. Ceramic element for watch case and method of manufacturing the same
EP2237698B1 (en) * 2008-01-25 2015-04-22 Commissariat à l'Énergie Atomique et aux Énergies Alternatives Object provided with a graphics element transferred onto a support wafer and method of producing such an object
EP2855400B1 (en) * 2012-05-30 2016-06-01 The Swatch Group Research and Development Ltd. Ceramic element inlaid with at least one composite ceramic decoration
EP3632839A1 (en) 2013-12-20 2020-04-08 Rolex Sa Clock component
EP2902177B1 (en) * 2014-01-30 2019-03-13 Mestel SA Method for applying a filling material to a substrate having a free surface in a finished state
JP2016113653A (en) * 2014-12-12 2016-06-23 シチズンホールディングス株式会社 Electroforming component production method and electroforming component
CH710716A2 (en) * 2015-02-12 2016-08-15 Swatch Group Res & Dev Ltd Method of manufacturing a part with at least one decoration
EP3339980A1 (en) * 2016-12-22 2018-06-27 The Swatch Group Research and Development Ltd Method for producing a pattern on a timepiece and timepiece
CH714234A1 (en) * 2017-10-13 2019-04-15 Horlaser S A A method of manufacturing a coin and a watch or jewelery coin, with a surface comprising oxidation-colored titanium.

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US20240036522A1 (en) 2024-02-01
CN117471891A (en) 2024-01-30

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