EP4301905A1 - Galvanisches wachsen von nanodrähten auf einem substrat - Google Patents

Galvanisches wachsen von nanodrähten auf einem substrat

Info

Publication number
EP4301905A1
EP4301905A1 EP22708886.1A EP22708886A EP4301905A1 EP 4301905 A1 EP4301905 A1 EP 4301905A1 EP 22708886 A EP22708886 A EP 22708886A EP 4301905 A1 EP4301905 A1 EP 4301905A1
Authority
EP
European Patent Office
Prior art keywords
substrate
substrate holder
nanowires
growth
electronics
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP22708886.1A
Other languages
German (de)
English (en)
French (fr)
Inventor
Olav Birlem
Florian DASSINGER
Sebastian Quednau
Farough ROUSTAIE
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanowired GmbH
Original Assignee
Nanowired GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanowired GmbH filed Critical Nanowired GmbH
Publication of EP4301905A1 publication Critical patent/EP4301905A1/de
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/006Nanostructures, e.g. using aluminium anodic oxidation templates [AAO]
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/04Wires; Strips; Foils
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures

Definitions

  • the invention relates to a device and a method for the galvanic growth of a large number of nanowires on a substrate.
  • Nanowires can be obtained via galvanic processes or using methods that are known from thin-film technology. What many known methods have in common is that they require complex machines and therefore usually only (can) be used in laboratories and clean rooms. In particular, most of the known methods are not suitable for industry.
  • nanowires obtained vary greatly in their properties and in particular in terms of their quality.
  • the nanowires from different growth processes regularly differ, sometimes significantly, even if the same or the same machines, starting materials and/or recipes are used.
  • the quality of nanowires often depends in particular on the ability of the user of a corresponding device or the user of a corresponding method, on environmental influences and/or simply on chance. All of this is made more difficult by the fact that nanowires are structures that sometimes cannot be visualized even with a light microscope. Extensive investigations may therefore be necessary in order to be able to determine the properties described (and in particular the fluctuations in them) at all.
  • a device for the galvanic growth of a large number of nanowires on a substrate comprises a substrate holder and a receptacle for the substrate holder, the device being configured to grow the plurality of nanowires on the substrate when the substrate holder is received with the substrate in the receptacle, the substrate holder having electronics which designed to influence the growth of the nanowires.
  • Nanowires can be produced with the device described.
  • a nanowire is understood here to mean any material body that has a wire-like shape and a size in the range from a few nanometers to a few micrometers.
  • a nanowire can, for example, have a circular, oval or polygonal base. In particular, a nanowire have a hexagonal base.
  • the nanowires preferably have a length in the range from 100 nm [nanometers] to 100 m ⁇ ti [micrometers], in particular in the range from 500 nm to 60 m ⁇ ti. Furthermore, the nanowires preferably have a diameter in the range from 10 nm to 10 m ⁇ ti, in particular in the range from 30 nm to 2 m ⁇ ti.
  • the term diameter refers to a circular base area, with a base area deviating from this, a comparable definition of a diameter is to be used. It is particularly preferred that all nanowires used have the same length and the same diameter.
  • the device described can be used for a wide variety of nanowire materials. Electrically conductive materials, in particular metals such as copper, silver, gold, nickel, tin and platinum, are preferred as the material for the nanowires. However, non-conductive materials such as metal oxides are also preferred. Preferably, all nanowires are formed from the same material.
  • the nanowires can be grown on the surface of the substrate with the device.
  • the surface of the substrate is preferably designed to be electrically conductive. If the surface is part of an otherwise non-electrically conductive sub strate, the electrical conductivity z. B. achieved by metallization who the. So e.g. B. a non-electrically conductive substrate with a thin layer Me tall are coated.
  • an electrode layer can be produced by the metallization.
  • the substrate can be a silicon substrate.
  • the substrate can be a body that is provided with electrically conductive structures.
  • this can be a silicon chip or a so-called printed circuit board (PCB).
  • the nanowires can be grown galvanically in pores of a film on the surface of the substrate.
  • An electrolyte is used for this.
  • the nanowires can be provided with a particularly uniform quality if the foil lies tightly against the surface of the substrate during growth and the electrolyte is evenly distributed over the foil. This can be achieved in that an elastic element that is permeable to the electrolyte rests against the film like a sponge.
  • An electrolyte can be supplied to the foil by the elastic element and the foil can be held on the surface of the substrate.
  • the film is preferably placed on the surface of the substrate to be grown over before the beginning of the growth of the nanowires.
  • the film is preferably formed with egg nem plastic material, in particular with a polymer material.
  • it is preferred that the film is connected to the surface in such a way that the film does not slip. This could reduce the quality of the grown nanowires.
  • the film has a large number of continuous pores in which the nanowires can be grown.
  • the fact that the pores of the film are continuous is preferably realized in such a way that the pores form continuous channels from an upper side of the film to an underside of the film.
  • the pores are cylindrical.
  • the pores it is also possible for the pores to be in the form of channels with a curved course.
  • a pore can have a circular, oval or polygonal base area, for example.
  • a pore can have a hexagonal base area.
  • the pores are preferably uniform (ie the pores preferably do not differ in terms of size, shape, arrangement and/or distance from adjacent pores). Will the If no wires are grown, the pores are preferably (in particular completely) filled with the electrodeposited material.
  • nanowires the size, shape and arrangement of the pores.
  • the properties of the nanowires to be grown can thus be defined or influenced by the choice of the foil or the pores in it.
  • the film can therefore also be referred to as a "template”, “template film” or “stencil”.
  • the device comprises a substrate holder and a receptacle for the substrate holder.
  • the substrate can be held by the substrate holder and can be accommodated with the substrate holder in the receptacle.
  • the nanowires can be grown on the substrate.
  • the substrate holder is preferably designed in such a way that the electrolyte can be brought into contact with the surface of the substrate to be grown.
  • the substrate holder can have a depression, for example, into which the substrate can be placed. The electrolyte can be introduced into the depression so that the surface of the substrate to be covered with growth is completely covered by the electrolyte.
  • the device preferably has a housing in which the receptacle is formed.
  • the device can be regarded as a compact machine.
  • the housing preferably comprises a chamber in which the receptacle is arranged.
  • the substrate holder can be introduced into the chamber by inserting the substrate holder into the receptacle.
  • the chamber is preferably ver closable.
  • the chamber can be accessible via an opening in a housing wall, so that the substrate holder can be inserted through the opening into the chamber and into the receptacle.
  • the opening can be closed with a flap, for example.
  • the chamber is preferably liquid and gas tight. In this way, a desired atmosphere for the growth of the nanowires can be created inside the chamber.
  • the chamber can preferably be locked.
  • the opening can be closed with a flap and the flap can be held in its position by a lock. This can prevent the chamber from being accidentally opened during a growth process.
  • the chamber is preferably formed between a limita tion of a material which is opposite to the growth of Nanowires used is resistant to chemicals, such as steel or plastic.
  • the chamber preferably has a respective supply for at least one chemical.
  • the electrolyte used to grow the nanowires can be provided.
  • the electrolyte can be fed into a depression of the substrate holder, for example, via the corresponding supply, so that the electrolyte comes into contact with the substrate arranged in the depression.
  • a supply for water can be provided, in particular for deionized water (DI water). This can be used to rinse the substrate after the nanowire growth is complete. It is thus possible to prevent residues of the electrolyte from escaping the device with the substrate.
  • the chamber preferably has at least one outlet.
  • an outlet can be provided through which the electrolyte can be let out of the chamber once the growth of the nanowires is complete.
  • An outlet for the water used for rinsing can also be provided. The electrolyte and water can be discharged from the chamber through the same outlet or through different outlets.
  • the chamber preferably has a ventilation opening. Gases in the chamber can be let out of the chamber via this. In this way, a user can be protected from harmful gases escaping from the chamber when it is opened. The gases can be sucked out of the chamber via the ventilation opening and replaced, for example, by fresh air or an inert atmosphere. The extracted gases can be cleaned, for example.
  • an electrode is preferably arranged in the chamber, which is set up for the growth of the nanowires. An electrical voltage can thus be applied between the electrode and the surface of the substrate to be grown in order to grow the nanowires.
  • the electrode is preferably held on a stamp. The stamp can preferably be moved automatically. Thus, the electrode can be brought into contact with the electrolyte via the stamp to grow the nanowires.
  • An elastic element placed on the foil can be pressed onto the foil with a stamp.
  • the stamp can also have an electrolyte distributor.
  • the electrolyte distributor can be side have a multiplicity of outlets, so that the electrolyte can be supplied uniformly via the electrolyte distributor to the surface of the substrate to be grown.
  • the electrode may be formed on the outlet side of the electrolyte manifold. The outlets can thus be connected to corresponding through-openings in the electrode, so that the electrolyte can pass through the electrode via the through-openings.
  • the substrate holder is preferably designed as a drawer. This means that the substrate holder can be pushed into the receptacle, for example via guide rails arranged laterally in the receptacle. It is preferred that the drawer can be completely separated from the rest of the device. Alternatively, a maximum extension of the drawer can be limited such that the drawer cannot be moved beyond the maximum extension.
  • the device preferably has a drive for moving the substrate holder.
  • the substrate holder can be brought manually into an insertion position, from where it can be automatically drawn into the receptacle with the drive. After the end of the growth of the nanowires, the substrate holder can be moved out of the receptacle in an automated manner, in particular into a removal position, which is preferably identical to the insertion position. The substrate holder can be removed manually from the removal position.
  • the device can be set up to move the substrate holder into and out of the receptacle completely manually. It is also conceivable for a device with a drive for the substrate holder to be operated either with an automatically moved substrate holder or with a manually moved substrate holder.
  • the device preferably has a locking device for locking the substrate holder in the receptacle.
  • the detent is preferably designed such that the detent has an active and a deactivated state.
  • the lock can therefore be switched on and off.
  • an electromagnet can be provided, which holds the substrate holder in the receptacle when switched on. In this way, the substrate holder can be secured with the locking device during the growth of the nanowires in the receptacle.
  • the lock can be deactivated and the substrate holder can be removed from the holder.
  • the device is preferably designed to conform to a clean room. If the device is used in a clean room, the nanowires grown with the device can be protected even after the substrate holder has been removed from the holder.
  • the substrate holder has electronics that are set up to influence the growth of the nanowires. For example, the following parameters can be monitored with the electronics: temperature of the surface of the substrate to be grown, distribution of this temperature, fill level of the electrolyte, amperage of the electrical current used for the growth of the nanowires. Furthermore, the electronics can be set up to identify the electrolyte. For example, a response can be made if an electrolyte other than the intended electrolyte is detected. The composition of the electrolyte can also be determined with the electronics. The electronics can also be set up to contribute to the monitoring and/or control of process sequences.
  • the device is preferably set up in such a way that the growth of the nanowires only begins when the electronics have recognized that one or more specified requirements are met.
  • the electronics can have an identifier that can be used to check whether the correct substrate holder has been inserted into the receptacle.
  • the electronics can also store information about when maintenance work is required. One of the specified prerequisites may be that no maintenance work is currently due.
  • the substrate holder preferably has a heater.
  • a temperature present during the growth of the nanowires can be influenced via this.
  • the heater can be set up to heat the electrolyte and/or the surface of the substrate to be covered with growth.
  • the heater is preferably electrically out forms. The heating can be controlled via the electronics of the substrate holder and/or externally.
  • the substrate holder has an interface via which the electronics are connected to a control unit of the device when the substrate holder is accommodated in the receptacle.
  • the interface can, for example, include one or more plug connections.
  • the plug-in connections are preferably designed in such a way that the electronics of the substrate holder are connected to the control unit when the substrate holder is inserted into the receptacle. A separate action by an operator, for example connecting cables, is not required in this case.
  • the control unit is preferably set up to process signals output by the electronics of the substrate holder and/or to output control signals to the electronics of the substrate holder.
  • the control unit preferably has a database. In this case, parameters that have been transmitted to the control unit by the electronics of the substrate holder can be compared with corresponding expected values. In the event of discrepancies, for example, a warning signal can be output, the process can be interrupted and/or a correction can be made automatically via a corresponding control signal. The heating of the substrate holder can be controlled with the control unit via a corresponding control signal.
  • the control unit is preferably arranged in the housing.
  • the device preferably has a display means and/or an operating means, which are connected in particular to the control unit.
  • the display means and/or the operating means are preferably held in or on the housing in such a way that they are accessible to a user. Information about the growth process can be displayed to the user via the display means, and the user can control the process via the operating means.
  • the display means and the operating means can also be embodied as a display and operating means, for example as a touchscreen.
  • the control unit is preferably set up to monitor and/or control the lock. If the device has a drive for moving the substrate holder, the control unit is preferably set up to monitor and/or control the drive. If the device has a chamber which can be closed by a flap that can be locked with a lock, the control unit is preferably set up to monitor and/or control the lock. For example, the control unit can recognize that the substrate holder has been placed in the insertion position and is in reaction one then uses appropriate control signals to cause the substrate holder to be automatically drawn into the receptacle, locked in place with the catch, and the opening of the chamber to be closed with the flap and the flap locked.
  • control unit can monitor that the detent and the lock remain unchanged. After completion of the growth of the nanowires, the control unit can use appropriate control signals to cause the flap to be unlocked and the flap to be opened and the lock to be released and the substrate holder to be automatically moved into the removal position.
  • the electronics of the substrate holder includes a digitization unit which is connected to the control unit for digital communication.
  • the signals output by the electronics to the control unit are digital signals.
  • particularly low-interference communication between the electronics and the control unit can be achieved.
  • the electronics of the substrate holder includes a sensor system.
  • the sensor system is preferably set up to record at least one growth parameter.
  • a temperature of the surface of the substrate to be grown, a distribution of this temperature, a filling level of the electrolyte, a current intensity of the electrical current used for the growth of the nanowires are particularly suitable as growth parameters.
  • the sensor system preferably includes a respective sensor for the parameters to be measured.
  • the sensor system can also include a sensor that is set up to identify the electrolyte.
  • the sensor system can also include a sensor that is set up to determine a composition of the electrolyte.
  • the device further comprises a reference electrode which is connected to the substrate when the substrate holder is accommodated with the substrate in the receptacle.
  • the growth of the nanowires can be monitored with the reference electrode.
  • the voltage can be measured with the reference electrode, which see the electrode and the reference electrode.
  • the arrangement can include one or more reference electrodes.
  • the electrode is preferably connected to the voltage source via a first cable.
  • the surface of the substrate to be grown is preferably connected to the voltage source via a second cable.
  • the reference electrode is preferably connected to a voltmeter via a third cable.
  • the surface of the substrate is preferably connected to the strain gauge by a fourth cable.
  • the second cable and the fourth cable are preferably each connected directly to the surface.
  • the surface of the substrate can have a respective contact pad, via which the second cable and the fourth cable are connected to the surface of the substrate, for example by means of a respective conductive tape.
  • the reference electrode is therefore not only connected to the surface of the substrate in that the reference electrode is connected to a branch of the second cable. It has been found that, on the other hand, direct connection of the reference electrode to the surface of the substrate delivers more accurate results.
  • the first cable, the second cable, the third cable and the fourth cable can each be divided into several sections which are connected to one another, for example via plug connections.
  • the second cable, the third cable and/or the fourth cable can each be divided into sections in such a way that a respective transition between two adjacent sections of the corresponding cable is arranged on one edge of the drawer.
  • the drawer can have a corresponding plug for each of these three cables.
  • the strain gauge and voltage source are preferably located within the housing and outside of the drawer receptacle.
  • an electrode of the device set up for galvanic growth of the nanowires has a plurality of independently controllable segments and/or the substrate holder has a heater with a plurality of independently controllable segments.
  • the "and" case is preferred.
  • an electrical voltage is applied between the surface of the substrate to be grown and the electrode.
  • the device is particularly well suited for covering substrates of different sizes with nanowires.
  • different segments of the electrode can be used.
  • the electrical voltage can be applied to the electrode in a locally limited manner where the substrate is opposite the electrode. It is also conceivable that different electrical voltages are applied to the different segments of the electrode. In this way, the growth of the nanowires can be selectively controlled locally.
  • the electrode is divided into the segments in such a way that each of the segments faces a respective part of the surface of the substrate to be grown when the substrate holder is accommodated with the substrate in the receptacle.
  • the substrate holder has a heater with a plurality of independently controllable segments, a temperature of the substrate can be selectively controlled locally. If the substrate is smaller than a maximum substrate that can be accommodated by the substrate holder, energy can be saved by the heating being active only where the substrate is present.
  • the heater is divided into the segments such that each of the segments faces a respective portion of the substrate when the substrate holder is received with the substrate in the receptacle.
  • the segments of the electrode and/or heating are preferably controlled by the control unit.
  • the sensor system of the substrate holder can detect the size and shape of the inserted substrate and transmit a corresponding signal to the control unit, which then controls the electrode and/or the heater via appropriate control signals.
  • the electronics of the substrate holder are set up to regulate an electrical voltage or an electrical current for the growth of the nanowires.
  • control unit can specify a voltage to be set or a current to be set and, for example, transmit it to the electronics of the substrate holder via a corresponding control signal.
  • the electronics of the substrate holder are set up to set the desired voltage or the desired current.
  • the electronics can do this Measure voltage or current and regulate to the desired setpoint.
  • This configuration is more flexible than regulation via the control unit.
  • the device can thus be used particularly easily with different substrate holders, each of which has its own control characteristics.
  • the control unit does not need to know the control characteristics. Instead, this can be taken into account individually in each substrate holder.
  • a method for galvanically growing a multiplicity of nanowires on a substrate includes: a) placing the substrate in a substrate holder, b) inserting the substrate holder into a receptacle for the substrate holder, c) galvanic growth of the nanowires on the substrate, the substrate holder having electronics which influence the growth of the nanowires.
  • the described advantages and features of the device can be applied and transferred to the method, and vice versa.
  • the device is preferably set up to operate in accordance with the method.
  • the method is preferably carried out using the device.
  • Steps a) to c) are preferably carried out in the order given.
  • the substrate is placed in the substrate holder.
  • a film is preferably placed on the substrate when the substrate is placed in the substrate holder.
  • the film can also be placed on the substrate after the substrate has been placed in the substrate holder.
  • an elastic element permeable to the electrolyte is placed on the film when the substrate is placed in the substrate holder.
  • the elastic element can also be placed on the substrate after the substrate has been placed in the substrate holder.
  • information about the substrate is preferably recorded with the electronics of the substrate holder, for example the size, the shape and the material of the surface of the substrate to be grown over.
  • step b) the substrate holder with the substrate is inserted into the receptacle for the substrate holder. This can be done by turning the substrate holder manually in an insertion position is brought and from there it is automatically drawn into the receptacle, in particular by means of a drive for moving the substrate holder.
  • step c) the nanowires are grown galvanically.
  • an electrolyte can be brought into contact with the surface of the substrate to be grown and an electrode, and an electrical voltage can be applied between the surface of the substrate and the electrode.
  • the process is preferably controlled via the control unit.
  • the nanowires can be grown in the pores of a film placed on the substrate.
  • the method preferably also includes d) removing the substrate holder from the receptacle.
  • Step d) is preferably carried out after the growth of the nanowires according to step c) has ended.
  • the substrate holder can, for example, be moved automatically into a removal position, in particular by means of a drive for moving the substrate holder.
  • the substrate holder can be removed manually from the removal position.
  • the substrate can then be removed from the substrate holder.
  • the substrate holder can then be used for a new growth process.
  • step a growth parameters are stored in the electronics of the substrate holder, which are taken into account in step c).
  • the substrate holder can be prepared to such an extent that the growth of the nanowires is completely automated as soon as the substrate holder has been manually inserted into the insertion position.
  • the control unit can thus recognize that a substrate holder has been placed in the insertion position and cause the substrate holder to be automatically drawn into the receptacle.
  • the control unit can read from the electronics of the substrate holder, for example, which growth parameters are provided for the growth of the nanowires.
  • the growth of the nanowires can be carried out with these parameters.
  • the substrate holder can then be automatically moved to the removal position and removed from there. An operator does not have to make any settings on the device. It is sufficient. that the operator stores the growth parameters in the electronics of the substrate holder when preparing the substrate holder.
  • the substrate holder can have an input device or can be connected to an input device.
  • the following are particularly suitable as growth parameters: a growth time, an electrical voltage or an electrical current, a temperature to be set for the substrate.
  • the temperature of the substrate in step c) is between 15.degree. C. and 100.degree. C., preferably between 30.degree. C. and 90.degree.
  • the information relates in particular to the temperature of the surface of the substrate to be grown over.
  • Fig. 1 a device according to the invention for the galvanic waxing of a
  • Fig. 2 a schematic representation of a part of the device from Fig. 1,
  • Fig. 1 shows a device 1 for the galvanic growth of a multiplicity of nanowires 2 (shown in Fig. 2) on a surface 27 of a substrate 3.
  • the device 1 comprises a substrate holder 4 designed as a drawer and a receptacle 5 designed in a chamber 18 for the substrate holder 4.
  • the receptacle 5 has guide rails 25, via which the substrate holder 4 can be inserted into the receptacle 5 and pulled out of the receptacle 5.
  • the substrate holder 4 can be locked in the receptacle 5 with a locking device 26 .
  • the substrate holder 4 is accommodated by the receptacle 5 .
  • the device 1 is set up to combine the multiplicity of nanowires 2 to grow on the substrate 3 when the substrate holder 4 with the substrate 3 shows as ge in the recording 5 is included.
  • the substrate holder 4 has electronics 6 which are set up to influence the growth of the nanowires 2 .
  • the substrate holder 4 has an interface 7 designed as a plug connection, via which the electronics 6 are connected to a control unit 8 of the device 1 when the substrate holder 4 is accommodated in the receptacle 5 as shown.
  • the control unit 8 is also connected to a touchscreen as a display and operating device 23 .
  • the control unit 8 is set up in particular to determine a flow and/or a pressure of the electrolyte.
  • the device 1 can be used to carry out the following method for galvanically growing a multiplicity of nanowires 2 on the substrate 3: a) placing the substrate 3 in the substrate holder 4, b) inserting the substrate holder 4 into the receptacle 5 for the substrate holder 4, c ) galvanic growth of the nanowires 2 on the substrate 3, with a temperature of the substrate 3 being between 15° C. and 100° C.
  • a film 28 (which cannot be seen in detail in FIG. 1) with continuous pores 29 (which can be seen in FIG. 2) rests on the substrate 3 .
  • a sponge rests on the film 28 as an elastic element 19, via which an electrolyte can be delivered to the film 28.
  • FIG. An electrode 12 rests on the elastic element 19 .
  • the nanowires 2 can be grown by applying an electrical voltage between the surface 27 of the substrate 3 and the electrode 12 .
  • the elec rode 12 is held by a plunger 20 and can be moved about this by means of a drive 21 to.
  • the electronics 6 of the substrate holder 4 influence the growth of the nanowires 2 according to step c).
  • the electronics 6 of the substrate holder 4 includes a digitization unit 9, which is connected to the control unit 8 for digital communication.
  • the electronics 6 of the substrate holder 4 includes a sensor system 10, which is formed by two sensors in the embodiment shown.
  • the electronics 6 of the substrate holder 4 includes a memory 24. Growth parameters, for example, which are taken into account during the growth of the nanowires 2, can be stored in this memory.
  • the electronics 6 of the substrate holder 4 are set up to generate an electrical voltage or an electrical current for growth of the nanowires 2 to regulate.
  • the electronics 6 is also connected to a heater 14, with which the substrate 3 can be heated.
  • the device 1 has a housing 34 within which the chamber 18 is formed.
  • An interior 42 of chamber 18 is formed of an electrolyte resistant material.
  • the receptacle 5 for the substrate holder 4 is formed in the chamber 18 so that the substrate holder 4 can be accommodated by the chamber 18 .
  • the chamber 18 has an opening 17 through which the substrate holder 4 can be inserted into the chamber 18 and moved out of the chamber 18 .
  • the opening 17 can be closed via a flap 16.
  • the flap 16 can be locked with a lock 22 .
  • the device 1 is set up to grow the plurality of nanowires 2 from the electrolyte onto the substrate 3 when the substrate holder 4 is accommodated with the substrate 3 in the receptacle 5 .
  • the housing 34 there are also three reservoirs 35 for a respective electrolyte.
  • One of the reservoirs 35 is connected to an electrolyte line 37 via a connection 36 and a pump 38 .
  • the electrolyte can be introduced into the substrate holder 4 via the electrolyte line 37 and used for the growth of the nanowires 2 .
  • the pump 38 is designed to pump the electrolytic electrolyte from the reservoir 35 into the chamber 18 .
  • the pump 38 is damped by means of a damper 40 held on a carrier 39 which is held damped in the housing 34 via a wide damper 40 ren.
  • the connection 36 has a sensor (not shown) with which the storage container 35 can be identified via the control unit 8 and at least one parameter assigned to the storage container 35 can be determined.
  • a filter 41 for the electrolyte and an electrolyte conditioner 42 are further arranged.
  • the filter 41 and the electrolyte conditioner 42 are integrated into the electrolyte line 37 .
  • Details of the electrolyte conditioner 42 are not shown for the sake of clarity.
  • the electrolyte conditioner 42 can be connected via a line to a container, via which the electrolyte conditioner 42 is supplied with substances that can be used for the electrolyte condition.
  • FIG. 2 shows part of the device 1 from FIG. 1 in a schematic representation.
  • the substrate 3 is shown with the surface 27 on which the nanowires 2 are to be grown.
  • a film 28 is applied to the surface 27 of the substrate 3 sets, which has a plurality of continuous pores 29 in which the nanowires 2 can be grown from an electrolyte.
  • the surface 27 of the substrate 3 has a structuring layer 31 with omissions 32 .
  • the nanowires 2 can be grown in the gaps 32 only. The growth of the nanowires 2 can thus take place locally selectively.
  • an elastic element 19 permeable to the electrolyte is placed on the film 27 . The electrolyte can be brought into contact with the foil 28 via the elastic element 19 . Also shown in FIG.
  • a voltage source 30 (not shown in FIG. 1 for the sake of clarity), which is connected to an electrode 12 and the surface 27 of the substrate 3 to apply an electrical voltage for the growth of the nanowires 2 .
  • the electrode 12 can be pressed against the elastic element 19 with a stamp 20 .
  • Fig. 3 shows other elements of the device 1 of Figs. 1 and 2, which are not shown in Figs. 1 and 2 for the sake of clarity.
  • a reference electrode 11 is also shown in addition to the voltage source 30, the electrode 12 and the substrate 3 with the surface 27, a reference electrode 11 is also shown.
  • the reference electrode 11 is connected to the surface 27 of the substrate 3 via a voltmeter 33 .
  • the voltage source 30 and the reference electrode 11 are connected to the surface 27 of the sub strate 3 independently of one another.
  • FIG. 4 shows an embodiment of an electrode 12 for the device 1 from FIGS. 1 and 2.
  • the electrode 12 has a plurality of independently controllable segments 13 .
  • the electrode 12 is shown in a plan view.
  • the overgrown surface 27 of the substrate 3 would be parallel to the plane of the drawing.
  • FIG. 5 shows an embodiment of a heater 14 for the device 1 from FIGS. 1 and 2.
  • the heater 14 has a plurality of independently controllable segments 15 .
  • the heater 14 is shown in a plan view.
  • the overgrown surface 27 of the substrate 3 would be parallel to the plane of the drawing.
  • a heater 14 as shown in FIG. 5 may be used in place of the simple heater 14 shown in FIG. Reference List

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Manufacturing Of Printed Wiring (AREA)
EP22708886.1A 2021-03-03 2022-02-22 Galvanisches wachsen von nanodrähten auf einem substrat Pending EP4301905A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102021105126.6A DE102021105126A1 (de) 2021-03-03 2021-03-03 Galvanisches Wachsen von Nanodrähten auf einem Substrat
PCT/EP2022/054380 WO2022184502A1 (de) 2021-03-03 2022-02-22 Galvanisches wachsen von nanodrähten auf einem substrat

Publications (1)

Publication Number Publication Date
EP4301905A1 true EP4301905A1 (de) 2024-01-10

Family

ID=80683974

Family Applications (1)

Application Number Title Priority Date Filing Date
EP22708886.1A Pending EP4301905A1 (de) 2021-03-03 2022-02-22 Galvanisches wachsen von nanodrähten auf einem substrat

Country Status (8)

Country Link
US (1) US20240141531A1 (ko)
EP (1) EP4301905A1 (ko)
JP (1) JP2024508155A (ko)
KR (1) KR20230152108A (ko)
CN (1) CN116964250A (ko)
DE (1) DE102021105126A1 (ko)
TW (1) TW202300438A (ko)
WO (1) WO2022184502A1 (ko)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101215536B1 (ko) 2009-10-01 2012-12-26 한국전기연구원 고전계 양극산화장치
WO2016046642A2 (en) * 2014-09-26 2016-03-31 King Abdullah University Of Science And Technology Systems and methods for large-scale nanotemplate and nanowire fabrication
DE102017104906A1 (de) * 2017-03-08 2018-09-13 Olav Birlem Anordnung und Verfahren zum Bereitstellen einer Vielzahl von Nanodrähten
DE102017104905A1 (de) 2017-03-08 2018-09-13 Olav Birlem Anordnung und Verfahren zum Bereitstellen einer Vielzahl von Nanodrähten sowie Galvanikkapsel

Also Published As

Publication number Publication date
TW202300438A (zh) 2023-01-01
US20240141531A1 (en) 2024-05-02
CN116964250A (zh) 2023-10-27
JP2024508155A (ja) 2024-02-22
DE102021105126A1 (de) 2022-09-08
WO2022184502A1 (de) 2022-09-09
KR20230152108A (ko) 2023-11-02

Similar Documents

Publication Publication Date Title
DE60024973T2 (de) Doppelverteiler system und verfahren zur gleichzeitiger übertragung von fluiden
EP1577378B1 (de) Behältnis und Vorrichtung zur Erzeugung von elektrischen Feldern in einzelnen Reaktionsräumen
EP3592696B1 (de) Anordnung und verfahren zum bereitstellen einer vielzahl von nanodrähten
DE102005019968A1 (de) Biostabile Neuroelektrode
DE102017104905A1 (de) Anordnung und Verfahren zum Bereitstellen einer Vielzahl von Nanodrähten sowie Galvanikkapsel
WO2008131714A2 (de) Verfahren und anordnung zum elektrischen kontaktieren eines membranumhüllten objekts mit einer elektrode
EP2745803A1 (de) Aufbereitungskammer oder Aufbereitungsträger sowie Vorrichtung zur Aufbereitung von zumindest einem medizinischen, insbesondere zahnärztlichen, Instrument
EP3593102B1 (de) Messanordnung und verfahren zum messen von eigenschaften eines strömenden mediums
WO2022184502A1 (de) Galvanisches wachsen von nanodrähten auf einem substrat
EP3592697B1 (de) Vorrichtung und verfahren zum bereitstellen einer vielzahl von nanodrähten
EP4121582A1 (de) Galvanisches wachstum von nanodrähten
DE102021105128A1 (de) Galvanisches Wachsen einer Vielzahl von Nanodrähten
DE102021105125A1 (de) Wachstum von Nanodrähten
EP3581685A1 (de) Verfahren und vorrichtung zur automatisierten regelung der ströme in einem galvanikbad
DE19929542B4 (de) Flächige Anordnung von Stimulationselektroden auf einem Chip und Herstellungsverfahren dazu und Verwendung als Retina-Implantat
EP3694672A1 (de) Schweissvorrichtung und -verfahren
DE10108968B4 (de) Vorrichtung zum Durchführen elektrophysiologischer Messungen an Zellen
EP3942941A1 (de) Kompaktanlage für gepulste elektrische felder in behandlungszelle
DE102015221850A1 (de) Verfahren zur Präparation von Referenzmarkierungen auf einem Probenträger
DD256973A1 (de) Vorrichtung zum aufbringen von leiterzuegen auf elektrisch nichtleitendes traegermaterial
EP1233268A2 (de) Vorrichtung zum Durchführen elektrophysiologischer Messungen an Zellen
DE102014203660A1 (de) Elektrodenanordnung für eine Kühlvorrichtung einer Hochspannungs-Gleichstrom-Übertragungsanlage
DE102007022303A1 (de) Telemetrisch kontrolliertes Mikroelektrodenmanipulatorsystem

Legal Events

Date Code Title Description
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: UNKNOWN

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE

PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20230927

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR