EP4127686A1

EP4127686A1 - New type of device(s) for automatically monitoring a coating and/or structure applied to a substrate with determination of reflection properties and/or geometric dimensions, and a corresponding method

Info

Publication number: EP4127686A1
Application number: EP21720998.0A
Authority: EP
Inventors: Bernhard Gruber
Original assignee: QUISS Qualitaets InspektionsSysteme und Service GmbH
Current assignee: QUISS Qualitaets InspektionsSysteme und Service GmbH
Priority date: 2020-03-25
Filing date: 2021-03-25
Publication date: 2023-02-08
Also published as: US20230349692A1; CN115867792A; WO2021191363A1; DE102020203850A1

Abstract

The present invention relates, for example, to a material application and analysis apparatus (8). The material application and analysis apparatus (8) according to the invention preferably has at least one analysis apparatus (1) according to one of claims 1 to 8. The material application and analysis apparatus (8) further has a material application element (10, 12) for applying the second material application (6) onto a substrate (2) on which the first material application (4) has been provided, at least in some sections, wherein: the material application apparatus (10, 12) is arranged between the first radiation source and detection apparatus assembly (41) and the second radiation source and detection apparatus assembly (42); the first material application (4) is detected by means of the first radiation source and detection apparatus assembly (41) and the second material application (6) is detected by means of the second radiation source and detection apparatus assembly (42); the first image data are processed and the second image data are processed; the first processed image data are evaluated with respect to the physical parameter and the second processed image data are evaluated with respect to the geometric parameter.

Description

Novel device (s) for automatically monitoring a coating and / or structure applied to a substrate with the determination of reflection properties and / or geometrical dimensions and a corresponding method

The present invention relates according to claim 1 to an analysis device for optical monitoring of at least two material applications which can be applied or generated or applied or generated on a substrate, according to claim 9 to a material application and analysis device, according to claim 11 to a system, wherein the system has a material application and analysis device according to claim 9 and according to claims 13 and 14 each to a method for generating and monitoring a substrate coating.

For the geometric determination of an applied structure or adhesive trace or to check the correct application of a coating, surface lighting or directional lighting forms have been used up to now. The reflection of the substrate surface as well as the area or directional lighting units with the applied structure or coating is recorded by a camera or several cameras and evaluated automatically by a computing unit.

A structure applied to a substrate is optically recorded according to the prior art mentioned below and evaluated with regard to a parameter: DE 10361 018 B4, DE 102006018558 A1, DE 102016007586 A1.

In the currently known systems, methods based on the reflective properties are used for surface coating. In addition to one or more cameras, these include area lighting (see DE 10361 018 B4). An applied structure that has a three-dimensional shape (e.g. an adhesive or sealant track or a triangular track such as is used in automobile construction for gluing windows) can be recorded with one or more cameras and area lighting as a 2D structure. However, the height and volume of the structure cannot be recorded at the same time. A stereo or triangulation unit is predominantly used for a three-dimensional evaluation of an applied structure. The 3D structure is recorded by deflecting the projected lighting (projector, LED or light lines) which is at a predefined angle to the camera (triangulation angle). However, this in turn does not allow a surface coating to be recorded at the same time, since it does not contain any height information. A projected line of light, for example, does not experience any deflection because the surface coating does not produce any change in height or changes in height that is too small. Different methods and systems are currently used for the respective task. Object of the present invention

It is the object of the present invention to provide a device and a method for the advantageous, in particular faster, detection or recognition of a surface coating applied to a substrate and a structure applied to a substrate.

Solution of the present invention

The aforementioned object is achieved according to the invention by an analysis device according to claim 1. The analysis device according to the invention is preferably an analysis device for the optical monitoring of at least two material applications which can be applied or can be generated or applied or generated on a substrate. A first material application preferably has a height of less than 0.5 mm and a second material application has a height which corresponds to a multiple of the height of the first material application, the height of the second material application being more than 0.5 mm , wherein the second material application is particularly preferably applied to the first material application. The first application of material can be a primer or coating, for example. Alternatively, however, it is also possible for a first material modification to be provided or effected instead of the first material application. A material modification is to be understood as a surface change of the substrate that is preferably effected in sections, in particular as a result of a mechanical or machining surface treatment. The material modification can thus be understood, for example, as roughening, in particular with respect to the unroughened or less roughened areas of the substrate, or as polishing, in particular with respect to the unpolished or less polished areas of the substrate.

The second material application can preferably be designed as a bead of adhesive, adhesive track, adhesive seam, smear track, in particular grease track, or seal seam or sealant track or a weld seam.

The substrate is preferably a component. The substrate, in particular the component, preferably has a polymer material, a metallic material, a vitreous material, a semiconductor material, an electrically non-conductive material, a fiber material, in particular GRP, a ceramic material or several of these materials and / or material combinations. The substrate, in particular the component, is preferably predominantly metallic in terms of mass. The substrate, in particular the component, a body part or frame part, in particular of a vehicle, in particular a car or truck, is preferred. The substrate is preferred, in particular the component, a window or a roof or a door of a vehicle, in particular a car or truck.

The analysis device according to the invention has a first radiation source and detection device assembly, the first radiation source and detection device assembly at least one first radiation source for projecting at least one first line of light onto the first material application and a first optical detection device assigned to the first radiation source for detecting the first line of light and for generating first image data, the first image data representing the detected first line of light, the first radiation source being fixedly aligned with respect to the first optical detection device. Furthermore, the analysis device has a second radiation source and detection device assembly, the second radiation source and detection device assembly having at least one second radiation source for projecting at least one further line of light onto the second material application and a second optical detection device assigned to the second radiation source for detecting the other Line of light and for generating second image data, the second image data representing the detected further line of light, the second radiation source being fixedly aligned with respect to the second optical detection device, the first image data representing a physical parameter of the first light line detected by the first optical detection device and wherein the second image data represents a geometric parameter of the further line of light detected by the second optical detection device. Furthermore, the analysis device has a processing device for processing the first image data generated by the first acquisition device and the second image data generated by the second acquisition device. The first radiation source and detection device assembly and the second radiation source and detection device assembly are particularly preferably designed to be identical. It is possible here for the first radiation source to generate one or more further lines of light at the same time in addition to the first line of light. This can also apply analogously to a second radiation source, third radiation source, fourth radiation source, fifth radiation source and / or sixth radiation source.

Additionally or alternatively, the analysis device can have an evaluation device for evaluating the first image data generated by the first acquisition device and the second image data generated by the second acquisition device, the evaluation device preferably with evaluation means for parameter-dependent evaluation of the first image data, in particular the 2D image data , and the second image data, in particular the 3D image data, wherein either the first image data or the second image data are evaluated with regard to a physical parameter and wherein the image data that are not evaluated with regard to the physical parameter are evaluated with regard to a geometric parameter Parameters are evaluated. The first image data or the second image data can thus be evaluated with regard to a first parameter and the first image data or the second image data being evaluated with regard to a second parameter, the first image data and the second image data only with regard to the first parameter or the second parameter are evaluated and wherein the first image data and the second image data are evaluated with regard to different parameters.

Furthermore, the analysis device preferably has a control device for controlling the first radiation source and detection device assembly and for controlling the second radiation source and detection device assembly, whereby by means of the control device preferably the first radiation source and detection device assembly and preferably the second radiation source and detection device assembly, respectively, in particular, time-shifted or alternately, are controllable.

The first detection device generates, in particular as a function of a first configuration of the substrate, the first image data and the second detection device generates, in particular as a function of a further configuration of the substrate, the second image data.

This solution is advantageous because, by means of a device, in particular the analysis device, a plurality of analysis tasks, in particular different material applications, can be brought about or carried out, preferably in one work step. A device is thus provided that represents only one sensor system and yet enables the simultaneous detection and / or analysis of several, in particular at least or exactly two, different material applications, in particular primer and structure applied thereon, that are applied to a substrate. Detections and / or analyzes with regard to the first material application and the second material application can thus be carried out in the same time interval. The image acquisition is preferably carried out alternately, in particular faster than 1 Hz or faster than 100 Hz or faster than 200 Hz or faster than 500 Hz, in particular up to 1000 Hz or 2000 Hz.

The solution is also advantageous because the substrate position, the reflection of the coating, the width of the second material application, in particular the applied structure, and / or the height of the second material application, in particular the applied structure, and / or the volume of the second material application , in particular the applied structure, in particular with regard to the applied length of the second material application, in particular the application structure, taking into account the height, the width and the profile or the shape of the second material application, in particular the applied structure, and / or the position the second material application, in particular the applied structure, can be determined on the substrate.

In the event that the material application does not produce a significant change in height, as is preferably brought about by the first material application, processing of the first image data with or with the processing device or image data processing device and / or analysis of the processed first image data with a or with the evaluation device or image data evaluation device, in particular the evaluation means, in particular the image evaluation algorithm, the processing device or image data processing device and / or the evaluation device or image data evaluation device, in particular the evaluation means, in particular the image evaluation algorithm, for evaluating a physical parameter, in particular the reflection behavior of the substrate surface, in particular the surface modification and / or the first material application, is configured. If the applied structure generates a change in height, as is preferably brought about by the second application of material, the second image data is processed or the processed first image data is analyzed, preferably with a processing device or image data processing device configured as a stereo or triangulation unit (3D) and / or evaluation device or image data evaluation device, in particular evaluation means, in particular image evaluation algorithm.

Further advantageous embodiments are the subject of the following description parts and / or the subclaims.

In the context of the present invention, lines of light are generated which can preferably be referred to as LED light lines or LED lines or laser light lines or laser lines. In the case of LED light line / s or LED line / s, the respective radiation source is an LED unit and in the case of light light line / s or light lines, the respective radiation source is a laser unit.

According to a preferred embodiment of the present invention, the physical parameter is the strength of reflected light from a single line of light. Additionally or alternatively, the physical parameter is the strength of reflected light from several light lines captured one behind the other, the first image data, which represent the individual light lines captured in a defined section of the substrate, being processed, in particular connected to one another, to generate 2D image data, will. This embodiment is advantageous because the individual recordings or the individual recordings of the light lines or the individual scans of the light lines or a selection of light lines provide an image data source for generating 2D image data. The 2D image data can have smoothing or interpolation or a connection between lines of light represented by the image data. Image data acquired one after the other and generated one after the other are preferred Represent lines of light, aligned with one another and / or connected to one another in order to generate the 2D image data.

A reference strength value or a reference strength value range is registered according to a further preferred embodiment of the present invention. The evaluation of the 2D image data with regard to the strength of the reflected light preferably includes a comparison with the reference strength value or the reference strength value range, whereby it is preferably determined whether the recorded strength of the reflected light corresponds to the reference strength value or lies in the reference strength value range or whether the recorded strength of the reflected light deviates from the reference strength value or is outside the reference strength value range. This embodiment is advantageous because the 2D image data can preferably be analyzed with spatial resolution and thus a defective, faulty or defective point or a defective, defective or defective area of the first material application can be identified quickly and clearly and preferably locally assigned.

According to a further preferred embodiment of the present invention, the geometric parameter is the shape of the light line. Additionally or alternatively, the geometric parameter is the shape of several light lines captured one after the other, the second image data, which represent the individual light lines captured in a defined section of the substrate, being processed, in particular connected to one another, to generate 3D image data . This embodiment is advantageous because the individual recordings or the individual recordings of the light lines or the individual scans of the light lines or a selection of light lines provide an image data source for generating 3D image data. The 3D image data can have a smoothing or interpolation or connection between lines of light represented by the image data. Preferably, the captured image data, which represent light lines generated one after the other, are aligned with one another and / or connected to one another in order to generate the 3D image data.

A reference shape value or a reference shape value range is registered according to a further preferred embodiment of the present invention. The evaluation of the 3D image data preferably includes a comparison with the reference shape value or the reference shape value range with regard to the shape of the light lines, whereby it is determined whether the captured shape of the light lines corresponds to the reference shape value or lies in the reference shape value range or whether the captured shape of the light lines from deviates from the reference shape value or lies outside the reference shape value range. This embodiment is advantageous because the 3D image data can preferably be analyzed in a spatially resolved manner and thus a defective, faulty or defective point or a defective, defective or defective area of the second material application can be identified and preferably locally assigned quickly and clearly. In addition to the first and second radiation source and detection device assembly, a third and / or fourth and / or fifth and / or sixth radiation source and detection device assembly can be provided according to a further preferred embodiment of the present invention. All, in particular all six, radiation source and detection device assemblies are preferably arranged on a circular path and thus around a center. This embodiment is advantageous because the first application of material and / or the second application of material can have a course deviating from a purely straight course and a very precise analysis is nevertheless possible.

According to a further preferred embodiment of the present invention, depending on the relative positions of the individual radiation source and detection device assemblies for the first and / or second material application, the control device effects a new registration of one of the radiation source and detection device assemblies as a first radiation source and detection device assembly and / or a new registration of one of the remaining ones Radiation source and detection device assembly as a second radiation source and detection device assembly. This embodiment is advantageous because, depending on the course of the first and / or second material application, a radiation source and detection device assembly aligned in a defined manner can effect the detection of the first or second material application. The defined aligned radiation source and detection device assembly is preferably aligned with respect to the longitudinal direction of the first and / or second material application at the point of the interface between the first and / or second material application and the light line of the radiation source and detection device assembly that the light line opposite the Longitudinal direction of extension of the first and / or second material application at an angle of more than 20 ° and / or less than 90 °, in particular more than 30 ° or more than 40 ° or more than 50 ° or more than 60 ° or by more than 70 ° or by more than 80 °, with respect to the line of light projected by the radiation source and detection device assembly onto the first and / or the second material deposition and preferably straight line of light. Thus, the first image data captured in different sections of the substrate are preferably always in areas of comparable orientation. This also applies to the second image data recorded in different sections of the substrate.

According to a further preferred embodiment of the present invention, each radiation source and detection device assembly can be controlled to generate image data. A sequence for controlling the radiation source and detection device assembly is preferably specified, with all radiation source and detection device assemblies being controlled for each sequence, in particular exactly once, for each generation of a light line and for each detection of the respective light line, with the generation of the 2D data only image data of the radiation source and acquisition device assembly registered as the first radiation sources and acquisition device assembly are used, and only image data of the radiation source and acquisition device assembly registered as the second radiation source and acquisition device assembly are used to generate the 3D data. This embodiment is advantageous because with a high frequency, in particular more than 50Hz or more than 100Hz or with 200Hz or more than 200Hz, in particular with or up to 1000Hz or with more than 1000Hz, in particular up to 2000Hz or up to 5000Hz, and / or complex courses of the first and / or second material application and / or a high relative speed, in particular more or up to 0.1 m / s or more or up to 0.5 m / s or more or up to 1 m / s or more or up to 1.5 m / s or more or up to 2 m / s, a precise analysis of the first and / or second material application is possible between the analysis device and the substrate.

The above-mentioned object is also achieved according to the invention by a material application and analysis device according to claim 9. The material application and analysis device according to the invention preferably has at least one previously described analysis device or an analysis device according to one of claims 1 to 8. Furthermore, the material application and analysis device has a material application element for applying the second material application to a substrate provided at least in sections with the first material application. The material application device is preferably arranged between the first radiation source and detection device assembly and the second radiation source and detection device assembly. The first material application is preferably detected by means of the first radiation source and detection device assembly and the second material application is preferably detected by means of the second radiation source and detection device assembly, the first image data being processed and the second image data being processed, the processed first Image data are evaluated with respect to the physical parameter and the processed second image data are evaluated with respect to the geometric parameter. According to a further preferred embodiment of the present invention, the material application element is designed to apply a bead of material, in particular a continuous material bead. Additionally or alternatively, however, it is possible for the material application element to be designed to apply or generate several, in particular punctiform or locally delimited, material applications.

The device according to the invention thus preferably has at least one application device for applying or generating the applied structure, a lighting device which is attached to the application device or a support structure of the application device, at least two optical detection devices designed as cameras for optical Detection of the applied surface coating or the applied structure, which are preferably offset with respect to the lighting device on the application device or the support structure of the application device opposite one another, and an image evaluation unit for recognizing the applied surface coating or structure, which is coupled to the cameras. The lighting device sends out one or more light paths, which is or are projected onto the substrate and the applied surface coating or structure, preferably immediately before and after the application, and the coating or structure applied to the substrate and the applied surface coating or structure projected one or more light paths, preferably immediately before and after the application of the applied structure in online mode is or are recorded by the cameras and the image evaluation unit in such a way that the image evaluation unit uses the change in the projected light path or light line or light paths or light lines Calculation method used to determine at least one of the following features of the applied structure: The substrate position, the reflection of the coating, the width of the applied structure and / or the height of the applied structure and / or the volume of the applied eighth structure, in particular with regard to the applied length of the application structure, taking into account the height, the width and the profile or the shape of the applied structure and / or the position of the applied structure on the substrate. The cameras can be designed as CCD or CMOS cameras.

According to the invention, the evaluation unit not only detects the deflection of the lighting unit by an applied structure (triangulation), but also the strength of the reflection of the lighting on the substrate surface or the applied surface coating or the applied structure. This solution is very advantageous because it allows both the 3D structure of an applied structure and an applied surface coating to be recorded and evaluated with one arrangement. No different arrangements and procedures are required for this.

The above object is achieved according to the invention by a system according to claim 11 ge. The system according to the invention is preferably a system for applying material to substrates and for analyzing the material application. The system preferably has at least: a material application and analysis device according to one of claims 9 or 10. Furthermore, an actuator device is preferably provided for generating a relative movement between the substrate and the material application and analysis device. The actuator device can here by one or more robot arms, in particular 6-axis robot arm or more than 6-axis robot arm or 9-axis robot arm or up to 9-axis robot arm, and / or by an assembly line or a continuously conveying transport device can be effected. The analysis device and the substrate are preferably arranged in a spatially fixed manner is fed to the analysis device, for example, by means of the robot arm or the transport device. Alternatively, it is possible that the substrate is held in a spatially fixed manner and the analysis device is moved relative to the substrate, for example by means of the robot arm or the transport device. Furthermore, it is possible that the substrate and the analysis device are moved in space, the substrate preferably being moved by means of the robot arm and / or the transport device and the substrate preferably being moved by means of a further robot arm and / or the or a further transport device .

As a result of the relative movement, according to another preferred embodiment of the present invention, portions of the first material application can initially be conveyed into the area of the first radiation source and detection device assembly and then conveyed into the area of the material application element. The second material application can preferably be applied directly to the substrate or to the first material application by means of the material application element. The second material application can preferably be conveyed into the region of the second radiation source and detection device assembly after it has been applied or produced. This embodiment is advantageous because the analysis of the first material application can be carried out in advance of the material application element by means of which the second material application is applied to the substrate. Furthermore, the analysis of the second material application can be carried out afterwards, i.e. after the material has been applied by the material application element. As a result, the material application and analysis device can perform at least or exactly or up to 3 tasks at the same time, namely analysis of a physical parameter of the first material application, application of the second material application and analysis of a geometric parameter of the second material application. It is highly advantageous that the material application and analysis device can be designed with a very compact design.

Furthermore, the above-mentioned object is achieved by a method according to claim 13.

The method according to the invention is preferably a method for producing and monitoring a substrate coating. The method preferably has at least the step of providing a substrate. A first material application is provided at least in sections on the substrate. The first material application can alternatively also be referred to as material modification or first material modification, in this case the second material application can be referred to as first material application.

Furthermore, the method has the step of providing a material application and analysis device, the material application and analysis device having at least: a material application element for applying a second material application io on the substrate at least partially provided with the first material application, a first radiation source and detection device assembly, wherein the first radiation source and detection device assembly has at least one first radiation source for projecting at least one line of light onto the first material application and a first optical detection device assigned to the first radiation source for Detecting the light line and generating first image data, the first image data representing the detected light line, wherein the first radiation source is preferably fixedly aligned with respect to the first optical detection device, and a second radiation source and detection device assembly, wherein the second radiation source and detection device assembly at least one second radiation source for projecting at least one wide line of light onto the second material application and one of the second beam The second optical detection device assigned to the source for detecting the further light line and generating second image data, the second image data representing the detected further light line, the second radiation source preferably being fixedly aligned with the second optical detection device, and a processing device for processing the first image data generated by the first acquisition device and the second image data generated by the second acquisition device.

Additionally or alternatively, the material application and analysis device can have an evaluation device for evaluating the first image data generated by the first acquisition device and the second image data generated by the second acquisition device. The evaluation device can preferably have evaluation means for parameter-dependent evaluation of the first image data, in particular the 2D image data, and the second image data, in particular the 3D image data, with either the first image data or the second image data being evaluated with regard to a physical parameter and with the image data which are not evaluated in terms of the physical parameter are evaluated in terms of a geometric parameter.

Furthermore, the material application and analysis device has a control device for controlling the first radiation source and detection device assembly and for controlling the second radiation source and detection device assembly, the material application device being arranged between the first radiation source and detection device assembly and the second radiation source and detection device assembly.

Furthermore, the method according to the invention has the step of applying the second material application to the first material application by means of the material application element. Furthermore, the method according to the invention has the step of projecting a line of light by means of the first radiation source onto the first material application and detecting the first Light line by means of the first detection device, the step of projecting the light line by means of the first radiation source onto the first material application and the detection of the first light line by means of the first detection device taking place in advance of the application of the second material application.

Furthermore, the method according to the invention has the step of projecting a further light line by means of the second radiation source onto the second material application and detecting the further light line by means of the second detection device, the step of projecting the light line by means of the second radiation source onto the second material application and the The second line of light is detected by means of the second detection device in the wake of the application of the second material application.

The control device controls the first radiation source and detection device assembly and the second radiation source and detection device assembly, preferably with a time delay, in particular alternately, the first detection device, in particular depending on the operation of the first radiation source or depending on the configuration of the substrate, the first Generates image data and wherein the second acquisition device, in particular as a function of the operation of the second radiation source or as a function of the configuration of the substrate, generates the second image data. Furthermore, the method has the step of processing the first image data and the step of processing the second image data, the first image data representing a physical parameter of the light line / s projected onto the first material application and the second image data having a geometric parameter the second application of material represent projected light lines. Furthermore, the method has the step of evaluating the processed first image data with regard to the physical parameter and evaluating the processed second image data with regard to the geometric parameter.

Thus, by means of the method according to the invention, a surface coating applied to the substrate can be recorded in advance (related to the application nozzle) and a structure applied to the substrate and / or to the surface coating or the first material application can be recorded in the wake (related to the application nozzle) will. Both acquisitions can be carried out in one process.

Additionally or alternatively, a surface coating applied to the substrate can be detected in advance (related to the application nozzle) with simultaneous detection of a reference substrate surface and a structure applied to the substrate and / or to the surface coating or the first material application can be detected afterwards (related to the application nozzle) can be recorded in one process with the formation of a difference calculation between the applied structure and the reference substrate surface. Alternatively, it is possible that instead of the first material application, the substrate surface is optically recorded and evaluated with regard to the physical parameter. For example, a reference reflection of the substrate surface can be recorded in advance (related to the application nozzle) and the surface coating applied to the substrate surface can be recorded afterwards (related to the application nozzle). This is preferably done in a sequence and with the formation of a difference calculation of the reflection of the applied coating to the reference reflection.

Alternatively, it is possible that instead of the first material application, the substrate surface is optically recorded and evaluated with regard to the physical parameter.

For example, a reference substrate surface can be recorded in advance (in relation to the application nozzle) and the structure applied to the substrate surface can be recorded in the aftermath (in relation to the application nozzle), both preferably in one process, forming a difference calculation between the applied structure and the reference -Substrate surface is done.

Furthermore, the above-mentioned object is achieved by a method according to claim 14.

The method according to the invention is preferably a method for producing and monitoring a substrate coating. The method preferably has at least the step of providing a substrate. A first material application is provided at least in sections on the substrate. The first material application can alternatively also be referred to as a material modification or first material modification, in this case the second material application can be referred to as the first material application. Furthermore, the method has the step of providing an analysis device, in particular a material application and analysis device according to claim 9 or claim 10, for the optical monitoring of at least two material applications applied or generated on a substrate, the analysis device having at least: one first radiation source and detection device assembly, wherein the first radiation source and detection device assembly includes at least one first radiation source for projecting at least one line of light onto the first material application and a first optical detection device associated with the first radiation source for detecting the light line and for generating first image data and for Generating second image data, wherein the first image data represent a physical parameter of the captured light line and where the second image data represent a geometric parameter of the captured light line never represent, the first radiation source preferably being fixedly aligned with respect to the first optical detection device, and a processing device for processing the generated first image data and the generated second image data. Additionally or alternatively, the analysis device can have an evaluation device for evaluating the first image data generated by the first acquisition device and the second image data generated by the second acquisition device. The evaluation device preferably has evaluation means for parameter-dependent evaluation of the first image data, in particular the 2D image data, and the second image data, in particular the 3D image data, with either the first image data or the second image data being evaluated with regard to a physical parameter and with the image data, which are not evaluated with regard to the physical parameter, are evaluated with regard to a geometric parameter. In other words, this means that the first image data or the second image data are evaluated with regard to a first parameter and the first image data or the second image data are evaluated with regard to a second parameter, the first image data and the second image data only with regard to the first parameter or the second parameter are evaluated and the first image data and the second image data are evaluated with regard to different parameters.

Furthermore, the analysis device has a control device for controlling the first radiation source and detection device assembly, wherein the first radiation source and detection device assembly is preferably an assembly that has exactly one radiation source and preferably exactly one detection device designed as a camera, the control device having the first Radiation source and detection device assembly controls, wherein the first detection device, in particular as a function of the configuration of the substrate, generates the first image data or the second image data.

The camera can be designed as a CCD or CMOS camera.

The configuration can be, for example, a first configuration according to which the substrate is provided with the first material application and not or not yet with the second material application. According to a second configuration, the substrate can be provided with a second material application which is different from the first material application or which is an alternative material application. According to a further or third configuration, the substrate can be provided with the first material application and the second material application is or is being applied to the first material application, in particular to parts of the first material application. It should be noted here that the designations “first”, “second”, “third” or “further” configuration do not specify any sequence. It is thus also possible for the substrate to have the “third” configuration without the first or second configuration being present.

Furthermore, the method has the step of projecting a line of light by means of the first

Radiation source on the first material deposition and detection of the light line by means of the first Detection device, wherein the first image data, in particular from the first detection device, are generated.

Furthermore, the method has the step of applying the second material application to the first material application by means of a material application element.

Furthermore, the method has the step of projecting a line of light by means of the first radiation source onto the second material application and detecting the line of light by means of the first detection device, the second image data being generated, in particular by means of the first detection device, with the step of projecting a line of light by means of the first radiation source on the first material application and the detection of the light line by means of the first detection device before the application of the second material application it follows and is carried out several times, whereby the light lines projected onto the substrate are projected onto one or more defined portions of the substrate This step is preferably effected completely before the application of the second material application to the first material application or before the application of the second material application to the first material application for the respective sub strat is completely ended, the step of projecting a line of light by means of the first radiation source onto the second material application and the detection of the light line by means of the first detection device after the application of the second material application or during the application of the second material application takes place and is carried out several times, wherein the lines of light projected onto the substrate are projected onto one or more defined portions of the substrate. Furthermore, the method has the step of processing the first image data and the step of processing the second image data. Furthermore, the method has the step of evaluating the processed first image data with regard to the physical parameter and evaluating the processed second image data with regard to the geometric parameter. Thus, by means of the described method, a surface coating applied to the substrate can be detected in the wake (related to the application nozzle) in a first sequence and a structure applied to the substrate and / or to the surface coating can be recorded in the wake (in relation to the application nozzle) in a second Process can be recorded.

This solution is advantageous because the first radiation source and detection device assembly for capturing the first and second image data can be a first radiation source and detection device assembly arranged downstream of the material application device. It should be noted here that it is also possible according to this solution that in addition to the first radiation source and detection device assembly, a second radiation source and detection device assembly and preferably also a third, fourth, fifth and sixth radiation source and detection device assembly is provided, all of which , especially all six, radiation sources and Detection device assemblies are arranged on a circular path around a center and are preferably structurally identical, an actuator device for generating a relative movement between the substrate and the material application and analysis device being provided, in particular for the case of the exclusive analysis of the first material application, the control device depending on the relative positions of the individual radiation source and detection device assembly for the first material application causes a new registration of one of the remaining radiation source and detection device assembly as a first radiation source and detection device assembly. Additionally or alternatively, in particular for the case of the exclusive analysis of the second material application, it is possible for the control device to re-register one of the radiation source and detection device assemblies as a function of the relative positions of the individual radiation source and detection device assemblies for the first and / or second material application first radiation source and detection device assembly caused.

Alternatively, it is possible that instead of the first material application, the substrate surface is optically recorded and evaluated with regard to the physical parameter. For example, a reference reflection of the substrate surface in the wake (related to the application nozzle) can be recorded in a first sequence. In particular in a second sequence, the surface coating applied to the substrate surface can be detected in the wake (in relation to the application nozzle). This is preferably done with the formation of a difference calculation between the reflection of the applied coating and the reference reflection from the first sequence.

Alternatively, a reference substrate surface can be recorded in the wake (related to the application nozzle) in a first sequence and the structure applied to the substrate surface can be recorded in the wake (in relation to the application nozzle) in a second sequence with the formation of a difference calculation of the applied structure to the reference substrate surface are recorded.

Furthermore, the above-mentioned object is achieved by a method according to claim 15.

The method according to the invention is preferably a method for producing and monitoring a substrate coating. The method preferably has at least the step of providing a substrate. A first material application is preferably provided at least in sections on the substrate. Furthermore, the method preferably has the step of providing a material application and analysis device. The material application and analysis device preferably has at least one material application element for applying a second material application to the substrate provided at least in sections with the first material application, a first radiation source and Detection device assembly, the first radiation source and detection device assembly having at least one first radiation source for projecting at least one first line of light, in particular a laser line, onto the first material application and a first optical detection device assigned to the first radiation source for detecting the first line of light and for generating first image data , wherein the first image data represent the detected first line of light, wherein the first radiation source is preferably fixedly aligned with the first optical detection device, and a second radiation source and detection device assembly, the second radiation source and detection device assembly at least one second radiation source for projecting of at least one further line of light, in particular a laser line, onto the second material application and a second optical detection element assigned to the second radiation source n device for capturing the further line of light and for generating second image data, the second image data representing the captured further line of light, the second radiation source preferably being fixedly aligned with the second optical capturing device, and a processing device for processing the data generated by the first capturing device first image data and the second image data generated by the second detection device, and a control device for controlling the first radiation source and detection device assembly and for controlling the second radiation source and detection device assembly, wherein the material application device between the first radiation source and detection device assembly and the second radiation source - And detection device assembly is arranged on.

Furthermore, the method preferably has the step of applying the second material application to the first material application by means of the material application element and the step of projecting a first line of light by means of the first radiation source onto the first material application and detecting the first line of light by means of the first detection device, the step of Projecting the light line by means of the first radiation source onto the first material application and the detection of the first light line by means of the first detection device takes place in advance of the application of the second material application, and the step of projecting a further light line by means of the second radiation source onto the second material is applied and detected the further light line by means of the second detection device, where in the step of projecting the further light line by means of the second radiation source onto the second material application and the Detection of the further line of light by means of the second detection device in the wake of the application of the second material application, where in the case of the control device the first radiation source and detection device assembly and the second radiation source and detection device assembly each, especially time-shifted or alternately, controls, the first detection device the generates first image data and wherein the second acquisition device generates the second image data and the step of processing the first image data and processing the second image data, the first image data representing a first geometric parameter of the light line / s projected onto the first material application and wherein the second image data represent a second geometric parameter of the light lines projected onto the second material application, and the step of evaluating the processed first image data with regard to the first geometric parameter and evaluating the processed second image data with regard to the second geometric parameter. A device for carrying out this method is preferably also provided; the device can be designed analogously to the device according to claim 1 or claim 9. Additionally or alternatively, the present invention can relate to a system for carrying out one or more of the methods according to the invention.

According to a preferred embodiment of the present invention, the physical parameter is the strength of reflected light from several light lines captured one after the other, the image data representing the individual light lines captured in a defined section of the substrate being processed to generate 2D image data, in particular which are connected to one another, and where the geometric parameter is the shape of several light lines captured one behind the other, the image data representing the individual light lines captured in a defined section of the substrate being processed, in particular connected to one another, to generate 3D image data. Particularly preferably, after the generation of the 2D image data, the 2D image data are analyzed with regard to the physical parameter, in particular the light intensity or the reflection intensity or the brightness in the image. Additionally or alternatively, after the generation of the 3D image data, the 3D image data are analyzed with regard to the geometric parameter, in particular the shape, of the second material application represented by the 3D image data. In the event that a first geometric parameter and a second geometric parameter are recorded, 2D image data or 3D image data can be generated from the image data relating to the first geometric parameter, and 2D image data or 3D can be generated from the image data relating to the second geometric parameter Image data are generated. The first geometric parameter can be a first shape, in particular the shape of the first material application or the shape of the substrate, in particular in a predetermined proportion. The second geometric parameter can be a second shape, in particular the shape of the second material application, in particular in a predetermined proportion.

Alternatively, the aforementioned task can be performed by a device for automatic application or generation and monitoring of a structure to be applied to a substrate, preferably in front of an adhesive bead, adhesive track, adhesive seam, sealing seam, a foam profile, Endless profile, geometric profile, in particular a cylinder-like profile or a triangular profile, or a weld seam, can be solved. This device preferably comprises at least one application device for applying or generating the applied structure, a lighting device which is attached to the application device or a support structure of the application device, at least two cameras for optical detection of the applied structure, which are offset from the lighting device on the application device or the support structure of the application device are placed opposite one another, and has an image evaluation unit for recognizing the applied structure, which is coupled to the cameras, wherein the lighting device emits one or more light paths, which in each case on the substrate and the applied structure immediately after the order is or are projected and wherein the one or more light paths projected onto the substrate and the applied structure immediately after the applied structure has been applied in online Be Drive is or are recorded by the cameras and the image evaluation unit in such a way that the image evaluation unit uses the change in the projected light path or light paths by means of calculation methods in order to determine at least one of the following features of the applied structure: the width of the applied structure and / or the height the applied structure and / or the volume of the applied structure, in particular with respect to the applied length of the applied structure including the height, width and profile or shape of the applied structure and / or the position of the applied structure on the substrate. According to the invention, the device has a control device, the control device being able to receive and evaluate movement data from a movement detection device, in particular a robotics and / or a 3D sensor system, the movement data describing a relative movement between the application device and the substrate, and using the control tion device based on the movement data, a treatment area of the substrate in which the structure is to be applied can be determined before the application of the structure and / or the lighting device comprises at least two illuminant units, each illuminant unit projecting light in a plane onto the substrate, with planar proportions in which the light of each adjacent illuminant unit extends, intersect, with a control device for time-shifted control of the adjacent illuminant unit being provided in order to provide a time-shifted illumination of the substrate and / or r to effect the structure to be applied by means of the lamp unit and / or at least one camera is assigned to each lamp unit, the camera being aligned at a triangulation angle of less than 30 ° and / or the lighting device has at least one and preferably at least two pairs of lamps, wherein the illuminants of the illuminant pair, in particular of the respective illuminant, project light onto the substrate in the same plane. The use of the words “essentially” preferably defines in all cases in which these words are used within the scope of the present invention a deviation in the range of 1% -30%, in particular 1% -20%, in particular 1% -10 %, especially from 1% -5%, especially from 1% -2%, of the definition that would be given without the use of these words. Individual or all representations of the figures described below are preferably to be viewed as construction drawings, ie the dimensions, proportions, functional relationships and / or arrangements resulting from the figure (s) preferably correspond exactly or preferably essentially to those of the device according to the invention or the inventive device Product. Further advantages, aims and properties of the present invention are explained with reference to the following description of the attached drawings, in which devices according to the invention are shown by way of example. Elements of the devices and methods according to the invention which at least essentially correspond in terms of their function in the figures can be identified with the same reference numerals, although these components or elements need not be numbered or explained in all figures.

Advantageous embodiments of the invention are shown purely by way of example with the aid of the following drawings.

1 shows an example of a device according to the invention during the application and monitoring of an adhesive track in a side view;

FIG. 2 shows a perspective view of the device according to the invention from FIG. 1;

Figure 3 is a bottom plan view of the apparatus of Figures 1 and 2 according to the present invention;

Fig. 4 is a schematic view of a further embodiment of the device according to the invention;

5a and 5b show different schematic views of the devices according to the invention,

6a and 6b show further exemplary representations of the devices according to the invention,

FIG. 7a shows a 3D representation which was generated from the captured image data for the individual light lines, and FIG FIG. 7b shows a further 3D illustration, this 3D illustration representing a smoothed illustration of the image data shown in FIG. 7a,

7c shows a schematic representation of a plurality of light lines detected one after the other with regard to a physical parameter, and FIG

7d shows a 2D representation, this 2D representation representing a smoothed representation of the image data shown in FIG. 7c.

According to Fig. 1, a device according to the invention for automatically applying and monitoring an adhesive track 6 is shown on a substrate or component. The device according to the invention comprises an application device 10, which has an application nozzle 12 at its lower end in order, for example, to apply adhesive to a component. When the adhesive is applied, a lighting device 20, which is composed, for example, of one or more LED diodes or a laser radiation source or several laser radiation sources, projects at least one light marking, in particular one light line or several light lines. The light line (s) can generate, for example, a straight and / or curved, in particular curved light line (s). The light line (s) can additionally or alternatively, for example, in the form of one or more preferably straight light paths, in particular in the form of one or more straight light lines. Whereby at least one light line is projected onto the substrate and / or where at least one light line is projected onto the applied adhesive track or the applied structure and / or where a light line is provided on the substrate, in particular at least one with a material application, in particular a primer Surface section is projected and / or wherein a line of light is projected onto the applied structure and the surface section provided with the material application, in particular the primer. The lighting device 20 is attached to the application device 10 and moves along with the application device 10 when the adhesive is applied if there is a relative movement between the substrate 2 and the application device 10. However, it is possible for the device according to the invention to be designed exclusively as an analysis device. At least one camera 31 for optical detection of the adhesive track is in turn attached to the lighting device 20. The camera 31 is preferably attached laterally offset to the lighting device and onto the projected light line, which is preferably projected onto the substrate close to the application nozzle 12. The cameras 31, 32 are connected to an image evaluation unit (not shown) which, in online operation, records and evaluates the images of the adhesive track determined by the cameras, the image evaluation unit using the change in the projected light line by means of corresponding calculation methods to convert either the width and / or the height and / or that Volume of the adhesive trace can be determined and thus checked.

In the embodiment of FIG. 1, the sensor head or the analysis device 1 with the lighting devices or radiation sources (see FIG. 4) and the cameras or detection device (31-36) is firmly connected to the application device 10, at least one of the cameras 31-36 captures the area of intersection between the light line and the material application, in particular the second material application, in particular the adhesive track.

In Fig. 2, the device according to the invention is shown in perspective. In this view it can now be seen that six cameras 31 to 36 are preferably arranged concentrically around the application device 10. With such an arrangement of several cameras, the area of intersection between a projected line of light and the second material application, in particular adhesive trace, is captured by at least one or by exactly one or by only one camera, which is preferably located in the segment of a circle where the material application, in particular the adhesive track, when applied, can be dimensionally stable or can run. If the adhesive track takes an arcuate course, a further camera can be activated for evaluation in order to monitor the course of the adhesive track. This applies to the entire circumference around the application device 10, depending on the course of the adhesive track.

In Fig. 3, the device according to the invention is now shown from below. In the center of the device there is the application nozzle 12, which is surrounded by the lighting devices 20-25 (see FIG. 4) in the form of LED light line projectors or laser line projectors as is attached to the application device 10. The cameras 31 to 36 are arranged at a uniform distance from one another and concentrically around the application nozzle 12 and are aligned with it. As an alternative to the large number of radiation sources, only one radiation source, which can preferably be designed as a ring projector and can preferably be arranged concentrically to the center of the analysis device 1, can be provided. In the case of a ring projector, it is possible that this emits, for example, a round line of light, which is preferably at least partially reflected by the substrate and / or the material applied to the substrate. The ring projector can be an LED light projector or a laser light projector. The ring projector can be operated with a defined frequency and the detection devices can be operated depending on the frequency of the ring projector. Alternatively, the ring projector can constantly emit light.

Fig. 4 shows a further embodiment of the device according to the invention. It can be seen from this illustration that the detection devices 31-36, in particular the cameras 31-36, are arranged laterally offset from a center. Radiation sources 20-25 are preferably arranged between the individual cameras 31-36 and the center. Each detection device preferably forms 31-36 together with a radiation source 20-25 a radiation source and detector assembly 41-46, respectively. It should be noted here that the components (detection device and radiation source) of one or more or all of the radiation source and detection device assemblies 41-46 are preferably to be understood as functionally interacting. For example, the radiation source 20 of the first radiation source and detection device assembly 41 emits radiation and the detection device 31 of the first radiation source and detection device assembly 41 detects this radiation (or the light components reflected from the substrate and / or the material application (s)).

5a shows an analysis device 1 according to the invention for the optical monitoring of at least two material applications 4, 6 which can be applied or generated on a substrate 2. It can be seen in this illustration that the analysis device 1 has a holding frame 87 on which at least one first radiation source and detection device assembly 41 and a second radiation source and detection device assembly 42 are arranged (see. Fig. 4). The first radiation source and detection device assembly 41 preferably has at least one first radiation source 20 for projecting at least one light line 50, in particular a preferably straight laser line, onto the first material application 4. Furthermore, the first radiation source and detection device assembly 41 has a first optical detection device 31 assigned to the first radiation source 20 for detecting the light line 50 and for generating first image data.

The first image data represent the captured light line 50, the captured light line or the captured light lines being or being represented by a physical parameter, the physical parameter preferably being the strength of the reflected light.

It can be seen that the detected line of light 50 in this illustration is formed by a highly reflective portion 56 and two less strongly reflective portions 57 and 58. The highly reflective portion preferably represents the first material application 4 or a material modification and the less strongly reflective portions 57, 58 or more scattering portions represent optically detected portions of the light line 50 which are not projected onto the first material application 4 or the material modification , but are adjacent to it and projected onto the adjacent substrate surface, for example. This solution is advantageous because the portions of the light line 50 that are reflected to different degrees can be determined in the image data generated by the detection device. A 2D representation can then be generated from several successively generated image data (e.g. for the previously generated light lines identified by the reference numeral 59) which, due to the differently strongly reflected light components of the individual light lines, determine an outer edge or both outer edges the first material application 4 or material modification allows. Additionally or alternatively, the determination of the presence of the first material application 4 or Material modification can be determined from these 2D image data. It can thus be determined whether the first material application 4 or material modification was generated continuously or whether the first material application 4 or material modification is not generated or present in sections or locally.

It is alternatively possible that the light line 50 is projected onto the adjacent substrate surface only on one side 57 or 58 of the first material application 4 or material modification.

Furthermore, it is alternatively possible for the line of light 50 to be projected completely onto it when the first material application 4 or material modification has been generated correctly and therefore does not protrude beyond it. This solution is advantageous because in the case of a very broad (relatively) generated first material application 4 or material modification, the target area, which can be defined by the width of the light line 50, can be wider than the length of the light line 50.

The reference numeral 59 denotes light lines previously generated and detected by means of the detection device 31, these light lines of course not remaining visually recognizable on the substrate or the first material application after the completion of their generation, but merely kept or made available by the generated image data . Thus, light lines captured by the capture device 31, in particular all or defined or the majority of the light lines captured by the first capture device 31, are generated to generate 2D image data, in particular spatially resolved or in relation to the respective component location. The 2D image data can be provided, saved or further processed in the form of one or more files, for example.

The first radiation source 20 is preferably fixedly aligned with respect to the first optical detection device 31, since both devices 20, 31 are preferably arranged fixedly on the holding frame 87.

The second radiation source and detection device assembly 42 preferably has at least one second radiation source 21 for projecting at least one further light line 51, in particular a laser line, onto the second material application 6 and a second optical detection device 32 assigned to the second radiation source 21 for detecting the further light line 51 and for generating second image data. The second radiation source and detection device assembly 42 is preferably fixedly arranged on the holding frame 87, so the second radiation source 21 is preferably fixedly aligned with respect to the second optical detection device 32.

The second image data represent the detected light line 51, the detected light line 51 or the detected light lines 67 preferably by means of a geometric parameter is or are represented, the geometric parameter preferably being the shape of the light line. The light lines 67 and 51 are therefore also shown completely homogeneously, since the image data that represent these light lines are preferably generated exclusively with regard to the shape of the light line or represent the shape of the light line and therefore physical parameters such as differences in the strength of the reflected Light, remain unnoticed or are not mapped or represented by the generated image data.

The reference numeral 67 denotes light lines previously generated and detected by means of the detection device 32, these light lines of course not remaining optically recognizable on the substrate 2 or the second material application 6 after the completion of their generation, but merely kept or made available by the generated image data will. Thus, light lines captured by the capture device 32, in particular all or defined or the majority of the light lines captured by the second capture device 32, are generated for generating 3D image data, in particular spatially resolved or in relation to the respective component location. The 3D image data can be provided, saved or further processed in the form of one or more files, for example.

Reference numeral 60 denotes a processing device 60 for processing the first image data generated by the first acquisition device 31 and the second image data generated by the second acquisition device 32. The processing device 60 is preferably at least indirectly and preferably directly connected to the individual detection devices by means of data connections.

The reference numeral 62 denotes a control device 62, which is preferably used to control the first radiation source and detection device assembly 41 and to control the second radiation source and detection device assembly 42, where in the control device 62, the first radiation source and detection device assembly 41 and the second radiation source and Detection device assembly 42 preferably drives with a time delay, in particular alternately. The control device 62 is preferably connected directly or indirectly to the individual radiation source and detection device assemblies 41-46 by means of data connection (s) and / or signal connection (s).

The first acquisition device 31 preferably generates first image data. The reference numeral 71 denotes an optical detection area of the detection device 31; it can be seen that the detection area 71 on the substrate 2 is preferably wider and / or longer than the width and / or length of a light line 50 emitted by the first radiation source 20 (on the Substrate) is. The reference numeral 73 denotes a radiation region of the radiation emitted by the first radiation source 20, through which the light line 50 is projected onto the substrate 2 and / or the first material application 4. The second acquisition device 32 preferably generates the second image data. The reference 72 denotes an optical detection area of the detection device 32; it can be seen that the detection area 72 on the substrate 2 is preferably wider and / or longer than the width and / or length of a light line 51 emitted by the second radiation source 21 (on the Substrate) is. The reference numeral 74 denotes a radiation region of the radiation emitted by the second radiation source 21, through which the light line 51 is projected onto the substrate 2 and / or the second material application 6.

Furthermore, the reference number 64 designates an actuator device purely schematically and purely by way of example, wherein a relative movement between the substrate 2 and the analysis device 1 can be brought about by the actuator device 64. The actuator device 64 can, for example, convey the substrate 2 in the direction 90 if the analysis device 64 is arranged in a spatially fixed manner. The first radiation source and detection device assembly 41 is arranged in this constellation as performing detection “in advance” and the radiation source and detection device assembly 42 is arranged in this constellation as performing detection “afterwards”.

Fig. 5b shows an alternative representation of the present invention. According to this illustration, the analysis device 1 shown has a material application device 10. Alternatively, this arrangement can be referred to as material application and analysis device 8.

Furthermore, the reference number 64 designates an actuator device purely schematically and purely by way of example, wherein a relative movement between the substrate 2 and the analysis device 1 can be brought about by the actuator device 64. The substrate 2 can, for example, be arranged in a spatially fixed manner and the material application and analysis device 8 can be moved or conveyed relative to the substrate 2, for example in the direction 90. The first radiation source and detection device assembly 41 is arranged in this constellation as performing detection “in advance” and the radiation source and detection device assembly 42 is arranged in this constellation as performing detection “afterwards”. “Pre-run” refers to the fact that the first radiation source and detection device assembly 41 analyzes portions of the substrate 2 that were applied to the substrate 2 and / or the substrate 2 and / or the prior to the application of material (second material application 6) using, for example, an application nozzle 12 of the application device 10 first material application 4, are guided past the first radiation source and detection device assembly 41 or are moved relative thereto. "After-run" refers to the fact that the second radiation source and detection device assembly 42 analyzes portions of the substrate 2, which after the material application (second material application 6) by means of an application nozzle 12 of the application device 10 on the substrate 2 and / or the first Material application 4, on the second radiation source and He detection device assembly 41 are passed or moved relative to it. the The point at which the second material application 6 from the application nozzle 12 or from the application device 10 hits the substrate 2 and / or the first material application 4 is identified by the reference numeral 66. According to this embodiment, the actuator device 64 is designed schematically as a robot arm. It is possible here for the actuator devices 64 according to FIGS. 5a and 5b to be exchanged or combined with one another. Furthermore, the actuator device 64 according to FIG. 5a or 5b supplies location data or position data, in particular 3D position data of the actuator device, in particular of a robot, and / or movement data, in particular acceleration data and / or speed data, these data preferably to the processing device 60 and / or the control device 62 are provided. The image data, in particular the 2D image data and / or the 3D image data, are preferably set or generated in relation to the location data or position data and / or movement data, in particular acceleration data and / or speed data.

The reference number 14 denotes a system which preferably has at least the actuator device 64 and the material application and analysis device 8.

FIG. 6a essentially corresponds to FIG. 5a, the light lines 50 and 51 shown in a detection interval being generated, the light lines preferably being generated one after the other and alternately. Radiation source and detection device assemblies 41, 42, 43, 44, 45, 46 (cf. FIG. 4) are preferably controlled one after the other or with a time delay in order to generate image data. A defined sequence for controlling the radiation source and detection device assembly 41, 42, 43, 44, 45, 46 is preferably specified. Before given to each sequence, all radiation source and detection device assemblies 41, 42, 43, 44, 45, 46, in particular exactly once, to generate a light line 50, 51, in particular a special laser line, and to detect the respective light line. To generate the 2D data, however, preferably only image data of the radiation source and acquisition device assembly 41 registered as the first radiation source and acquisition device assembly 41 are used, and for the generation of the 3D data, preferably only image data of the radiation sources registered as the second radiation source and acquisition device assembly 42 are used. and detector assembly 42 is used. Each detection device is preferably operated at a frequency of more than 1 Hz, in particular at a frequency of more than 100 Hz.

Furthermore, Fig. 6a shows six radiation sources 20-25, each radiation source 20-25 be preferably exactly or at least one optical detection device (only two shown) is assigned. 6b shows the material application and analysis device 8 during the application of the second material application 6 and during the optical detection of the first material application 4 or material modification and during the optical detection of the second material modification 6.

7a shows a graphic representation which was generated from a large number of image data, the image data corresponding to at least the second image data and representing the geometrical parameters. Thus, the representation shown represents at least one 3D image or a perspective view that was generated from the 3D image data. It can also be seen that the representation according to this example has a lighter portion 57, a darker portion 56 and a portion 58 which is again lighter than the darker portion 56. This can result from a combination of the 2D and 3D image data. Thus, from this one representation or the common image data representing this representation or combined image data or combined image data, it can be seen at which point the first material application 4 is incorrectly generated or applied and at which point the second material application 6 is incorrectly generated or applied is. This is advantageous since incorrect applications of one material application 4 or 6 can compensate for incorrect applications of another material application 4 or 6. Furthermore, for example, a certain number of incorrect applications of the first material application 4 in a section can be defined as problem-free and a certain number of incorrect applications of the second material application 6 in the same section can also be defined as problem-free, the total number of incorrect applications being defined as problematic can be. Furthermore, it is conceivable that even the total number of faulty applications can be defined as unproblematic as long as the faulty applications occur at the same locations or at different locations, in particular locations at a defined distance from one another.

The reference numerals 81 and 82 identify defective locations of the second material application 6. It can be seen that the shape of the second material application 6 differs from the shape of the remaining portions of the second material application 6 at these locations. At the points 81, 82, the second material application has been produced or applied, for example, with less material (per area) and / or the second material application 6 was, for example, "smeared" at these points. The reference symbol 83 denotes the pictorial representation of a line of light previously captured and held in the form of the image data. Reference numeral 84 identifies the second material application 6 represented by the image data.

It is generally possible for the 2D image data to be analyzed independently of the 3D image data. Alternatively, however, it is also possible for common image data or linked image data or combined image data to be generated from the 2D data and the 3D data. This common image data or linked image data or combined image data can then be analyzed in terms of the geometric parameter and the physical parameter.

7b shows a representation that results from representation 7a or from the 3D image data on which representation 7a is based. According to this representation, the image data representing the lines of light, in particular the second image data and preferably the second image data and the first image data, in particular after their accumulation or combination or combination, was effected.

7c schematically shows a plurality of light lines 50 optically captured one after the other. The individual light lines 50 are preferably generated and captured one after the other. In the illustration shown, all light lines 50 have a comparable or identical appearance. These lines of light 50 either represent a point at which the property to be examined, in particular the physical parameter, is realized to a sufficient extent or is not achieved to an adequate extent. It can be seen that a part 56 of the light line 50 is shown stronger and / or darker and / or thicker, whereby a greater presence of the physical parameter, in particular the strength of the reflected light, is presented than in the neighboring ones Shares 57 and 58.

FIG. 7d shows a 2D representation which is generated from the data shown in FIG. 7c. It can thus be seen that the first material application 4 is shown darker than the strength of the reflected light of the substrate 2 due to other physical properties, in particular due to a greater strength of the reflected light. If the first material application 4 should not be applied correctly or incorrectly, then, for example, bright spots would be recognizable in the area 56.

The present invention can thus be used to carry out a method for generating and monitoring a substrate coating. The method preferably has at least the following steps: providing a substrate 2, a first material application 4 being provided at least in sections on the substrate 2; Providing an analysis device 1, in particular a material application and analysis device 8, in particular according to claim 9 or claim 10, for the optical monitoring of at least two material applications 4, 6 applied or generated on the substrate 2, the analysis device 1 having at least: a first Radiation source and detection device assembly 41, the first radiation source and detection device assembly 41 at least one first radiation source 20 for projecting at least one light line 50, in particular laser line, onto the first material application 4 and one of the first optical detection device 31 assigned to the first radiation source 20 for detection of the light line 50 and for generating first image data and for generating second Having image data, wherein the first image data represent a physical parameter of the captured light line 50 and wherein the second image data represent a geometric parameter of the captured light line 50, wherein the first radiation source 20 is preferably fixed in relation to the first optical detection device 31, a processing device 60 for Processing of the generated first image data and the generated second image data, a control device 62 for controlling the first radiation source and detection device assembly 41, wherein the first radiation source and detection device assembly 41 is preferably an assembly that has exactly one radiation source 20 and preferably exactly one as a camera 31 designed detection device 31, wherein the control device 62 controls the first radiation source and detection device assembly 41, wherein the first detection device 31 the first image data or the z wide image data generated; Projecting a line of light 50 by means of the first radiation source 20 onto the first material application 4 and detecting the line of light 50 by means of the first detection device 31, the first image data being generated; Applying the second material application 6 to the first material application 4 by means of a material application element 10, 12; Projecting the light line 50 by means of the first radiation source 20 onto the second material application 6 and capturing the light line 50 by means of the first capturing device 31, the second image data being generated, the step of projecting a light line 50 by means of the first radiation source 20 onto the first material application 4 and the detection of the light line 50 by means of the first detection device 31 before the application of the second material application 6 takes place and is carried out several times, with the light lines 50 projected onto the substrate 2 being projected onto one or more defined portions of the substrate 2, whereby this step is preferably completely ended before the application of the second material application 6 to the first material application 4 for the respective substrate 2, wherein the step of projecting a line of light 50 by means of the first radiation source 20 onto the second material application 6 and detecting d The light line 50 by means of the first detection device 31 takes place after the application of the second material application 6 or during the application of the second material application 6 and is carried out several times, with the light lines 50 projected onto the substrate 2 on one or more defined parts of the substrate 2 be projected; Processing the first image data and processing the second image data; Evaluating the processed first image data with regard to the physical parameters and evaluating the processed second image data with regard to the geometric parameters. List of reference symbols

1 analysis device

2 substrate

4 first material application

6 second material application or applied or applied structure or adhesive material trace

8 Material Application and Analysis Equipment

10 Job Setup

12 application nozzle

14 Appendix

20 first lighting device or detection device or radiation source or laser unit or LED unit

21 second lighting device or detection device or radiation source or laser unit or LED unit

22 third lighting device or detection device or radiation source or laser unit or LED unit

23 fourth lighting device or detection device or radiation source or laser unit or LED unit

24 fifth lighting device or detection device or radiation source or laser unit or LED unit

25 sixth lighting device or detection device or radiation source or laser unit or LED unit

31 first camera

32 second camera

33 third camera

34 fourth camera

35 fifth camera

36 sixth camera

41 first radiation source and detector assembly

42 second radiation source and detector assembly

43 third radiation source and detector assembly

44 fourth radiation source and detector assembly

45 fifth radiation source and detector assembly sixth radiation source and detection device assembly first light line or laser line or LED line further or second light line or laser line or LED line highly reflective portion of the first light line first weakly reflective portion of the first light line second weakly reflective portion of the first light line previously generated and optically detected light lines ( shown for illustration only)

Processing facility

Control device

A ctuato re in dir ectio n

Location at which the second material application is applied to the substrate and / or the first material application Previously generated and optically detected light lines (shown only for illustration) schematically shown delimitation of the optical detection area of the first detection device 31 schematically shown limitation of the optical detection area of the second detection device Fitting device 32, schematically illustrated limitation of the radiation field of the laser radiation emitted by the first radiation source 20, schematically illustrated limitation of the radiation field of the laser radiation emitted by the second radiation source 21

3D image generates a smoothed 3D image from the 3D image data by smoothing the image data representing the 3D image 79 of the first defect or image data representing the second defect or image data representing the irregularity

Representation of the image data representing the shape of a second line of light

Representation of the image data representing the shape of the second material application, smoothed representation of the image data representing the shape of the second material application

Holding frame

Direction of movement

Claims

Expectations

Analysis device (1) for optically monitoring at least two material applications (4, 6) which can be applied or generated on a substrate (2), at least comprising: a first radiation source and detection device assembly (41), wherein the first radiation source and detection device assembly ( 41) at least one first radiation source (20) for projecting at least one light line (50), in particular a laser line, onto the first material application (4) and one of the first radiation source (20) assigned first optical detection device (31) for detecting the light line (50) and for generating first image data, the first image data representing the detected line of light (50), the first radiation source (20) preferably being fixedly aligned with respect to the first optical detection device (31), and a second radiation source and Detection device assembly (42), wherein the second radiation source and detection device At least one second radiation source (21) for projecting at least one further line of light (51), in particular a laser line, onto the second material application (6) and a second optical detection device (32) assigned to the second radiation source (21) for detection the further light line (51) and for generating second image data, the second image data representing the detected further light line (51), the second radiation source (21) being fixedly aligned with the second optical detection device (32), the first Image data represents a physical parameter of the light line (50) detected by the first optical detection device (31) and wherein the second image data represents a geometric parameter of the light line (51) detected by the second optical detection device (32), the first radiation source and Detection device assembly (41) and the second radiation q source and acquisition device assembly (42) are identical, a processing device (60) for processing the first image data generated by the first acquisition device (31) and the second image data generated by the second acquisition device (32), a control device (62) for controlling the first radiation source and acquisition device assembly (41) and for Controlling the second radiation source and detection device assembly (42), the control device (62) each controlling the first radiation source and detection device assembly (41) and the second radiation source and detection device assembly (42), in particular with a time delay or alternately, with the first acquisition device (31) generates the first image data and wherein the second acquisition device (32) generates the second image data.

2. Analysis device according to claim 1, characterized in that the physical parameter is the strength of reflected light from several successively captured light lines (50), the first image data representing the individual light lines captured in a defined section of the substrate (2) (50), processed, in particular connected to one another, to generate 2D image data.

3. Analysis device according to claim 2, characterized in that a reference strength value or a reference strength value range is registered, the evaluation of the 2D image data with regard to the strength of the reflected light comprising a comparison with the reference strength value or the reference strength value range, whereby it is determined whether the detected strength of the reflected light corresponds to the reference strength value or lies in the reference strength value range or whether the detected strength of the reflected light deviates from the reference strength value or lies outside the reference strength value range.

4. Analysis device according to one of the preceding claims, characterized in that the geometrical parameter is the shape of the light line (51) or the geometrical parameter is the shape of several light lines (51) detected one after the other, the second image data, which contains the individual light lines (51) detected in a defined section of the substrate (2) ) represent, processed to generate 3D image data, in particular connected to one another.

5. Analysis device according to claim 4, characterized in that a reference shape value or a reference shape value range is registered, the evaluation of the 3D image data with regard to the shape of the light line (51) comprising a comparison with the reference shape value or the reference shape value range, it being determined whether the detected shape of the light lines (51) corresponds to the reference shape value or lies in the reference shape value range or whether the detected shape of the light lines (51) deviates from the reference shape value or is outside the reference shape value range.

6. Analysis device according to one of the preceding claims, characterized in that in addition to the first and second radiation source and detection device assembly (41, 42), a third, fourth, fifth and sixth radiation source and detection device assembly (43, 44, 45, 46) are provided all six radiation source and detection device assemblies (41, 42, 43, 44, 45, 46) are arranged on a circular path around a center and are structurally identical.

7. Analysis device according to claim 6, characterized in that the control device (62) as a function of the relative positions of the individual radiation source and detection device assembly (41, 42, 43, 44, 45, 46) for the first and / or second material application (4, 6) a new registration of one of the radiation source and detection device assembly (42, 43, 44, 45, 46) as a first radiation source and detection device assembly (41) and a new registration of one of the remaining Radiation source and detection device assembly (42, 43, 44, 45, 46) as a second radiation source and detection device assembly (42) causes.

8. Analysis device according to claim 7, characterized in that each radiation source and detection device assembly (41, 42, 43, 44, 45, 46) can be controlled to generate image data, a sequence for controlling the radiation source and detection device assembly (41 , 42, 43, 44, 45, 46) is specified, with all radiation source and detection device assemblies (41, 42, 43, 44, 45, 46), in particular exactly once, for each generation of a light line (50, 51) , in particular laser line, and are controlled to detect the respective light line, with only image data from the radiation source and detection device assembly (41) registered as the first radiation source and detection device assembly (41) being used to generate the 2D data, and for generating the 3D data exclusively image data of the radiation sources and registered as the second radiation source and detection device assembly (42) nd detector assembly (42) can be used.

9. Material application and analysis device (8), at least having an analysis device (1) according to one of claims 1 to 8, a material application element (10, 12) for applying the second material application (6) to at least one with the first material application (4) substrate (2) provided in sections, the material application device (10, 12) being arranged between the first radiation source and detection device assembly (41) and the second radiation source and detection device assembly (42), wherein by means of the first radiation source and detection device assembly (41) the first material application (4) is detected and the second material application (6) is detected by means of the second radiation source and detection device assembly (42), the first image data being processed and the second image data being processed, the processed first image data relating to the physical parameters s are evaluated and the processed second image data are evaluated with regard to the geometric parameters.

10. Material application and analysis device according to claim 9, characterized in that

Material application element (10, 12) is designed for applying a bead of material, in particular an endless bead of material.

11. Plant (14) for applying material to substrates (2) and for analyzing the material application, at least having a material application and analysis device (8) according to one of claims 9 or 10, and an actuator device (64) for generating a relative movement between the Sub strate (2) and the material application and analysis device (8) is provided.

12. System for material application according to claim 11, characterized in that, as a result of the relative movement, portions of the first material application (4) can first be conveyed into the area of the first radiation source and detection device assembly (41) and then into the area of the material application element (10, 12) can be conveyed, with the material application element (10, 12) being able to apply the second material application (6) to the first material application (4) and the second material application (6) then being able to be conveyed into the area of the second radiation source and detection device assembly (42) .

13. A method for producing and monitoring a substrate coating, at least comprising the steps:

Providing a substrate (2), a first material application (4) being provided at least in sections on the substrate (2), Providing a material application and analysis device (8), the material application and analysis device (8) having at least: a material application element (10, 12) for applying a second material application (6) to the material application (4) with at least one partially provided substrate (2), a first radiation source and detection device assembly (41), wherein the first radiation source and detection device assembly (41) has at least one first radiation source (20) for projecting at least one first line of light (50), in particular a laser line comprises the first material application (4) and a first optical detection device (31) assigned to the first radiation source (20) for detecting the first line of light (50) and for generating first image data, the first image data representing the detected first line of light (50) , wherein the first radiation source (20) is preferably fixed to the first opt ical detection device

(31) is aligned, and a second radiation source and detection device assembly (42), wherein the second radiation source and detection device assembly (42) has at least one second radiation source (21) for projecting at least one further line of light (51), in particular a laser line, onto the second Material application (6) and a second optical detection device (32) assigned to the second radiation source (21) for detecting the further light line (51) and for generating second image data, the second image data representing the detected further light line (51), wherein the second radiation source (21) is preferably fixedly aligned with respect to the second optical detection device (32), a processing device (60) for processing the first image data generated by the first detection device (31) and that generated by the second detection device

(32) generated second image data, a control device (62) for controlling the first radiation source and detection device assembly (41) and for controlling the second radiation source and detection device assembly (42), the material application device (10, 12) between the first radiation sources - and detection device assembly (41) and the second radiation source and detection device assembly (42) is arranged, Applying the second material application (6) to the first material application (4) by means of the material application element (10, 12),

Projecting a first line of light (50) by means of the first radiation source (2) onto the first material application (4) and detecting the first line of light (50) by means of the first detection device (31), the step of projecting the line of light (50) by means of the first radiation source (20) on the first material application (4) and the detection of the first light line (50) by means of the first detection device (31) takes place in advance of the application of the second material application (6),

Projecting a further line of light (51) by means of the second radiation source (21) onto the second material application (6) and detecting the further line of light (51) by means of the second detection device (32), the step of projecting the further line of light (51) by means of the second radiation source (21) on the second material application (6) and the detection of the further light line (51) by means of the second detection device in the wake of the application of the second material application (6), the control device (62) the first radiation source and detection directional assembly (41) and the second radiation source and detection device assembly (42) each, in particular time-shifted or alternately, controls, wherein the first detection device (31) generates the first image data and where the second detection device (32) generates the second image data,

Processing of the first image data and processing of the second image data, the first image data representing a physical parameter of the light line (s) (50) projected onto the first material application (4) and the second image data representing a geometric parameter which is applied to the second material (6 ) represent the projected line of light (s) (51), Evaluating the processed first image data with regard to the physical parameter and evaluating the processed second image data with regard to the geometric parameter.

14. A method for producing and monitoring a substrate coating, at least comprising the steps:

Providing a substrate (2), a first material application (4) being provided at least in sections on the substrate (2),

Providing an analysis device (1), in particular a material application and analysis device (8) according to claim 9 or claim 10, for the optical monitoring of at least two material applications (4, 6) applied or generated on the substrate (2), wherein the analysis device (1) at least comprises: a first radiation source and detection device assembly (41), the first radiation source and detection device assembly (41) at least one first radiation source (20) for projecting at least one light line (50), in particular a special laser line, onto the first Material application (4) and a first optical detection device (31) assigned to the first radiation source (20) for detecting the light line (50) and for generating first image data and for generating second image data, the first image data having a physical parameter of the er summarized light line (50) represent and wherein the second image data a geometr i represent parameters of the detected light line (50), the first radiation source (20) preferably being fixedly aligned with respect to the first optical detection device (31), a processing device (60) for processing the generated first image data and the generated second image data, a Control device (62) for controlling the first radiation source and detection device assembly (41), wherein the first radiation source and detection device assembly (41) is preferably an assembly that has exactly one radiation source (20) and preferably exactly one as a camera (31) has trained Erfassungsein direction (31), wherein the control device (62) controls the first radiation source and detection device assembly (41), the first detection device (31) generating the first image data or the second image data,

Projecting a line of light (50) by means of the first radiation source (20) onto the first material application (4) and detecting the line of light (50) by means of the first detection device (31), the first image data being generated,

Applying the second material application (6) to the first material application (4) by means of a material application element (10, 12),

Projecting the light line (50) by means of the first radiation source (20) onto the second material application (6) and detecting the light line (50) by means of the first detection device (31), where the second image data are generated, the step of projecting a Line of light (50) by means of the first radiation source (20) on the first material application (4) and the detection of the light line (50) by means of the first detection device (31) takes place before the application of the second material application (6) and is carried out several times, wherein the light lines (50) projected onto the substrate (2) are projected onto one or more defined portions of the substrate (2), this step preferably before the application of the second material application (6) to the first material application (4) for the respective substrate (2) is completely terminated, the step of projecting a line of light (50) onto the second M by means of the first radiation source (20) material application (6) and the detection of the line of light (50) by means of the first detection device (31) after the application of the second material application (6) or during the application of the second material application (6) takes place and is carried out several times, whereby the thereby on the Substrate (2) projected Lichtli lines (50) are projected onto one or more defined parts of the substrate (2),

Processing the first image data and processing the second image data, Evaluating the processed first image data with regard to the physical parameter and evaluating the processed second image data with regard to the geometric parameter.

15. A method for producing and monitoring a substrate coating, at least comprising the steps:

Providing a substrate (2), a first material application (4) being seen at least in sections on the substrate (2),

Providing a material application and analysis device (8), the material application and analysis device (8) having at least: a material application element (10, 12) for applying a second material application (6) to the material application (4) at least in sections provided substrate (2), a first radiation source and detection device assembly (41), wherein the first radiation source and detection device assembly (41) has at least one first radiation source (20) for projecting at least one first line of light (50), in particular a laser line the first material application (4) and a first optical detection device (31) assigned to the first radiation source (20) for detecting the first line of light (50) and for generating first image data, the first image data representing the detected first line of light (50) , wherein the first radiation source (20) is preferably fixed with respect to the first opti cal detection device (31) is aligned, and a second radiation source and detection device assembly (42), wherein the second radiation source and detection device assembly (42) has at least one second radiation source (21) for projecting at least one further line of light (51), in particular La ser line, on the second material application (6) and a second optical detection device (32) assigned to the second radiation source (21) for detecting the further light line (51) and for generating second image data, the second image data comprising the detected further light line ( 51), wherein the second radiation source (21) is preferably fixedly aligned with respect to the second optical detection device (32), a processing device (60) for processing the first image data generated by the first acquisition device (31) and the second image data generated by the second acquisition device (32), a control device (62) for controlling the first radiation source and acquisition device assembly (41) and for Controlling the second radiation source and detection device assembly (42), the material application device (10, 12) being arranged between the first radiation source and detection device assembly (41) and the second radiation source and detection device assembly (42),

Applying the second material application (6) to the first material application (4) by means of the material application element (10, 12),

Projecting a further line of light (51) by means of the second radiation source (21) onto the second material application (6) and detecting the further line of light (51) by means of the second detection device (32), the step of projecting the further line of light (51) by means of the second radiation source (21) on the second material application (6) and the detection of the further light line (51) by means of the second detection device in the wake of the application of the second material application (6) takes place, wherein the control device (62) the first radiation source and Detection device assembly (41) and the second radiation source and detection device assembly (42) each, in particular time-shifted or alternately, controls, the first detection device (31) generating the first image data and the second detection device (32) generating the second image data Processing of the first image data and processing of the second image data, the first image data representing a first geometric parameter of the light line (s) (50) projected onto the first material application (4) and the second image data representing a second geometric parameter that is applied to the second material application (6) represent projected light line (s) (51),

Evaluating the processed first image data with regard to the first geometric parameter and evaluating the processed second image data with regard to the second geometric parameter.

16. The method according to claim 13 or claim 14, characterized in that the physical parameter is the strength of reflected light from several successively detected light lines (50), wherein the image data, which the individual in a defined section of the substrate (2) each captured light lines (50), processed to generate 2D image data, in particular connected to one another, and wherein the geometric parameter is the shape of several light lines (51) captured one after the other, wherein the image data, which the individual in a defined section of the The respective light lines (51) detected on the substrate (2) are processed, in particular connected to one another, to generate 3D image data.