EP4111189A1 - Spectrométrie de masse d'échantillons comprenant une désorption/ablation coaxiale et une capture d'image - Google Patents

Spectrométrie de masse d'échantillons comprenant une désorption/ablation coaxiale et une capture d'image

Info

Publication number
EP4111189A1
EP4111189A1 EP21761749.7A EP21761749A EP4111189A1 EP 4111189 A1 EP4111189 A1 EP 4111189A1 EP 21761749 A EP21761749 A EP 21761749A EP 4111189 A1 EP4111189 A1 EP 4111189A1
Authority
EP
European Patent Office
Prior art keywords
sample
analysis
ionized
axis
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21761749.7A
Other languages
German (de)
English (en)
Other versions
EP4111189A4 (fr
Inventor
Jeffrey T. Williams
Oleg V. Maltsev
Gurpreet Singh
Stephen C. Strickland
Cole D. Naymark
Jonathan Putman
Jens COLE
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Exum Instruments
Original Assignee
Exum Instruments
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Exum Instruments filed Critical Exum Instruments
Publication of EP4111189A1 publication Critical patent/EP4111189A1/fr
Publication of EP4111189A4 publication Critical patent/EP4111189A4/fr
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/0004—Imaging particle spectrometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • H01J49/0459—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for solid samples
    • H01J49/0463—Desorption by laser or particle beam, followed by ionisation as a separate step
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/06—Electron- or ion-optical arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H01J49/161—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission using photoionisation, e.g. by laser
    • H01J49/162—Direct photo-ionisation, e.g. single photon or multi-photon ionisation

Definitions

  • aspects of the present disclosure involve systems and methods for chemical analysis of samples. More specifically, the present disclosure is directed to systems and methods for analyzing organic and inorganic components of a sample.
  • Mass spectrometry is a technique for analyzing chemical species of a sample material by sorting ions of the material based on their mass-to-charge ratio.
  • the process includes generating ions from a sample such as by bombarding the sample with an energy beam (e.g., a photon or electron beam) in the case of solid sample analysis.
  • the resulting ions are then accelerated and subjected to an electromagnetic field resulting in varying deflection of the ions based on their respective mass-to-charge ratios.
  • a detector e.g., electron multiplier
  • a detector e.g., electron multiplier
  • results of such analysis are generally presented as a spectrum indicating the relative amount of detected ions having the same mass-to-charge ratio.
  • a method of sample analysis includes capturing an image of an analysis location of a sample disposed within a sample chamber using an imaging device, the imaging device having a field of view into the sample chamber along an axis.
  • the method further includes, subsequent to capturing the image, applying a material removal beam to the sample along the same axis as the imagine device’s field of view.
  • the material removal beam is produced from a source beam originating from a laser source and desorbs or ablates sample material from the sample at the analysis location.
  • An ionization beam is then applied to the sample to generate ionized sample material, which is then delivered to a mass spectrometer for analysis.
  • the source beam is a first source beam
  • the material removal beam is a first material removal beam and desorbs organic material
  • the sample material is a first sample material
  • the ionized sample material is a first ionized sample material.
  • the method may further include, subsequent to delivering the first ionized sample material to the mass spectrometer for analysis, applying a second material removal beam to the sample along the axis.
  • the second material removal beam is produced from a second source beam originating from the same laser source as the first source beam and ablates a second sample material from the sample at the analysis location.
  • a second ionization beam is then applied to the second sample material to generate a second ionized sample material, which is delivered to a mass spectrometer for analysis.
  • the second material removal beam is applied to the sample to ablate the second sample material without repositioning the sample within the sample chamber after applying the first material removal beam to the sample.
  • the image is a first image and has a first field of view and the method further includes, prior to capturing the first image, capturing a second image of the sample.
  • the second image of the sample has a second field of view larger than the first field of view and encompassing the analysis location.
  • the axis is perpendicular to a top surface of the sample.
  • the source beam is delivered from the laser source into an optical assembly in a direction different than along the axis. The optical assembly then produces the material removal beam from the source beam and redirects the material removal beam into the sample chamber along the axis.
  • the field of view is directed from the imaging device into an optical assembly in a direction different than along the axis.
  • the optical assembly then redirects the field of view into the sample chamber along the axis.
  • the source beam is delivered from the laser source into an optical assembly in a first direction not along the axis and the field of view is directed from the imaging device into the optical assembly in a second direction not along the axis and different than the first direction.
  • the optical assembly then produces the material removal beam from the source beam.
  • the optical assembly may include an optical element that redirects each of the field of view and the material removal beam along the axis and through a port of the optical assembly in communication with the sample chamber.
  • delivering the ionized sample material to the mass spectrometer includes passing the ionized sample material through an ion extraction system.
  • the ionized sample material passed through an ion funnel in a first direction.
  • the ionized sample material may then be delivered to the mass spectrometer by passing the ionized sample material through a quadrupole ion deflector to redirect the ionized sample material in a second direction different than the first direction.
  • delivering the ionized sample material to the mass spectrometer may further include, subsequent to redirection by the quadrupole ion deflector, passing the ionized sample material through an Einzel lens.
  • the analysis location is a first analysis location
  • the material removal beam is a first material removal beam
  • the source beam is a first source beam
  • the sample material is a first sample material
  • the ionization beam is a first ionization beam
  • the ionized sample material is a first ionized sample material.
  • the method may further include, subsequent to delivering the first ionized sample material to the mass spectrometer, moving the sample within the sample chamber such that a second analysis location of the sample is aligned with the axis. An image of the second analysis location may then be captured using the imaging device with the field of view of the imaging device along the axis.
  • a second material removal beam may be applied to the sample along the axis to desorb or ablate second sample material from the sample at the second analysis location, the second material removal beam being produced from a second source beam originating from the laser source.
  • a second ionization beam may then be applied to the second sample material to generate second ionized sample material, which is then delivered to the mass spectrometer for analysis.
  • a system for performing sample analysis includes a sample chamber, an imaging device having a field of view, a first laser to produce a source beam, and an optical assembly. Each of the field of view and the source beam are directed into the optical assembly during operation.
  • the optical assembly produces either of a desorption beam or an ablation beam from the source beam and defines a port in communication with the sample chamber.
  • the system further includes an ionization assembly to produce an ionization beam, the ionization beam to generate an ionized sample material from a sample material, the sample material produced by applying the desorption beam or the ablation beam to a sample disposed within the sample chamber.
  • the system also includes a mass spectrometer in communication with the sample chamber to analyze the ionized sample material produced by the ionization assembly.
  • the optical assembly directs each of the desorption beam, the ablation beam, and a field of view of the imaging device along an axis extending through the port into the sample chamber.
  • the system further includes an illumination source to produce and direct light into the optical assembly.
  • the optical assembly further directs light produced by the illumination source into the sample chamber along the axis.
  • the imaging device is a first imaging device.
  • the system may further include a sample holder to retain the sample and to move the sample between a first position within the sample chamber and a second position outside the sample chamber.
  • the system may further include a second imaging device to capture a second image of the sample while the sample is in the second position.
  • the system further includes each of an ion funnel, a quadrupole ion deflector, and an Einzel lens collectively configured to capture and concentrate the ionized sample material and to redirect the ionized sample material to the mass spectrometer.
  • the ion funnel and the quadrupole ion deflector may also disposed along the axis.
  • the optical assembly includes a first set of optical elements to direct the desorption beam and the ablation beam to a common optical element and a second set of optical elements to direct the field of view of the imaging device to the common optical element.
  • the common optical element redirects each of the desorption beam, the ablation beam, and the field of view of the imaging device through the port along the axis.
  • a method of sample analysis includes capturing an image of an analysis location of a sample disposed within a sample chamber using an imaging device having a field of view along an axis and, subsequent to capturing the image, applying a desorption beam along the axis to the sample to desorb organic material from the sample at the analysis location, the desorption beam produced from a first source beam of a laser source.
  • the method further includes applying a first ionization beam to the desorbed organic material to generate ionized organic material and delivering the ionized organic material to a mass spectrometer for analysis.
  • the method further includes, without repositioning of the sample within the sample chamber, applying an ablation beam along the axis to the sample to ablate inorganic material from the sample at the analysis location, the ablation beam produced from a second source beam of the laser source.
  • the method also includes applying a second ionization beam to the ablated inorganic material to generate ionized inorganic material and delivering the ionized inorganic material to a mass spectrometer for analysis.
  • the desorption beam is an infrared beam having a wavelength of 1064nm and the ablation beam is an ultraviolet beam having a wavelength of 266nm or 213nm.
  • the laser source is a neodymium-doped yttrium aluminum garnet (Nd:YAG) laser.
  • FIG. 1A is a schematic illustration of an analysis system according to an implementation of the present disclosure.
  • FIG. 1B is a detailed schematic illustration of a mounting assembly of the analysis system of FIG. 1A.
  • FIG. 2 is a schematic illustration of an image capture system for use in conjunction with the analysis system of FIG. 1A.
  • FIGS. 3A and 3B are schematic illustrations of halves of a kinematic mounting system as may be incorporated into either of the analysis system of FIG. 1 A and the image capture system of FIG. 2.
  • FIG. 4 is a graphical representation of the relationship between images and results data obtained during analysis of a sample, such as by using the system of FIG. 1A.
  • FIGS. 5A-D are a flow diagram for a method of analyzing a sample in accordance with the present disclosure. More specifically, FIG. 5A illustrates initial preparation of the sample and analysis system, FIG. 5B illustrates general operation of the analysis system, FIG. 5C illustrates the steps involved in analyzing each of organic and inorganic components of a sample, and FIG. 5D illustrates quantification of the analysis and feedback to improve operation of the analysis system.
  • FIG. 6 is a flow chart illustrating a method for processing mass spectrometry data collected during analysis of organic or inorganic material obtained from a sample.
  • FIG. 7 is a schematic illustration of a second analysis system in accordance with the present disclosure in a closed configuration.
  • FIG. 8 is a schematic illustration of the analysis system of FIG. 7 in an open configuration.
  • FIG. 9 is a schematic illustration of a macro-level imaging device assembly of the analysis system of claim 7.
  • FIG. 10 is a schematic illustration of an optical assembly of the analysis system of claim 7.
  • FIG. 11 is a schematic illustration of an ion extraction system of the analysis system of claim 7.
  • FIG. 12 is a schematic illustration of a sample chamber of the analysis system of claim 7.
  • FIG. 13 is a block diagram illustrating a computer system as may be included in the analysis systems of FIG. 1A and 7. Detailed Description
  • aspects of the present disclosure involve systems and methods for analyzing a sample using mass spectrometry and, in particular, for efficiently analyzing both organic and inorganic components of the sample.
  • Analysis systems according to the present disclosure implement an extraction and ionization technique in which both organic and inorganic material may be extracted from a sample, ionized, and analyzed.
  • organic material may be desorbed from a location of a sample to form a vapor cloud.
  • the vapor cloud is then ionized and the resulting ions may be transported to a mass spectrometer for analysis.
  • non-organic material may be ablated from the sample, forming a particle cloud.
  • the particle cloud may then be ionized and the resulting ions transported to the mass spectrometer for analysis.
  • systems according to the present disclosure include a single laser source and various optical elements to produce beams suitable for each of desorption and ablation.
  • the system includes a neodymium-doped yttrium aluminum garnet (Nd:YAG) laser used to produce a source beam for producing each of a relatively low energy beam (e.g., in the infrared (IR) range) for heating and desorbing organic material from the sample and a relatively high energy beam (e.g., in the ultraviolet (UV) range) beam capable of ablating inorganic material from the sample.
  • a relatively low energy beam e.g., in the infrared (IR) range
  • a relatively high energy beam e.g., in the ultraviolet (UV) range
  • the laser source may be configured to have a fundamental wavelength and other characteristics that correspond to one of the desorption beam or the ablation beam.
  • production of the desorption/ablation beam from the source beam may include redirecting and/or passing the source beam without modifying other characteristics of the source beam.
  • a source beam generally refers to a beam as it exits a laser source while a beam produced from the source beam generally refers to a beam as it is delivered to perform its particular functionality (e.g., ablation, desorption, ionization), regardless of whether characteristics of the source beam have been modified to generate the final beam.
  • the terms “desorption/ablation (D/A) beam” and “material removal beam” are used to refer collectively to beams for removing material from a sample for analysis, regardless of whether the removed material is organic or inorganic and whether the beams remove material by desorption or ablation of the sample.
  • D/A desorption/ablation
  • material removal beam are used to refer collectively to beams for removing material from a sample for analysis, regardless of whether the removed material is organic or inorganic and whether the beams remove material by desorption or ablation of the sample.
  • Each of the desorbed organic material and the ablated inorganic material are subsequently ionized using a second laser system including a second laser source and corresponding optics.
  • the second laser system is configured to produce a relatively high energy beam (e.g., in the UV range) and is directed to intersect the vapor cloud and the particle cloud produced by the desorption and ablation processes, respectively.
  • the second laser source may also be a Nd:YAG laser and the second laser system may include optical elements to produce an ionization beam having a wavelength of 266nm.
  • the resulting ions are then extracted and transported (e.g., by applying an electrostatic potential using an electrostatic lens system such as an Einzel lens, quadrupole ion guide, or ion funnel) as an ion beam into a mass spectrometer. Mass spectrometry data is then collected and quantified.
  • an electrostatic lens system such as an Einzel lens, quadrupole ion guide, or ion funnel
  • LIBS laser-induced breakdown spectroscopy
  • LI MS laser ionization mass spectroscopy
  • the techniques described herein may have the advantage of ionizing from the neutral vapor cloud or particle cloud resulting from ablation. These clouds are significantly less variable across different matrices and more closely represents the sample constituents and their proportions within the sample. Accordingly, the techniques described herein have significant potential to quantify multi-matrix samples using uniform or algorithmically adjusted quantification schema.
  • Implementations of the present disclosure may further include imaging systems, such as camera systems, for capturing images of samples prior to, during, or subsequent to analysis.
  • the analysis system may include a first camera system to capture images of the sample at a large or “macro” scale.
  • the analysis system may further include a camera system configured to capture a detailed or “micro” image of a specific location of the sample being to be analyzed.
  • Such images may be associated with any captured data, allowing users to visually analyze a sample at a macro level, visually identify particular regions of interest of the sample, readily obtain detailed data for such regions, and perform various other functions.
  • implementations of the present disclosure may be static systems. Such systems may operate using a vacuum chamber within which no gases are required since ionization does not require an inductively coupled plasma source. Doing so eliminates molecular isobars that may hinder detection of elements such as, but not limited to, silicon, potassium, calcium, and iron. Moreover, the two-step multiphoton ionization source allows for an algorithmic approach to quantification. The absence of hot, inductively coupled plasma also eliminates the thermal emission of contaminant ions from the cones and injector that may hinder the analysis of sodium, lead, and many volatile metals. Rather, in implementations of the present disclosure, ions are sourced only from the sample spot under ablation.
  • Implementations of the present disclosure also may have considerable advantage regarding the transmission efficiency of the generated ion beam.
  • laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) has a high ionization efficiency (>90%) for elements with a first ionization potential of approximately 8 eV or less and has a relatively low transmission efficiency of about 0.01-0.001% (i.e. , approximately 1 in every 10 5 - 10 6 ions reach the detector).
  • This is largely due to the fact the ions are created in atmosphere (argon plasma) and are then transferred to the mass spectrometer in stages until reaching the ultimate high-vacuum mass filter. The transition through these stages is done through a system of cones and lenses that removes a significant portion of ions.
  • the techniques discussed herein do not suffer from transmission losses across atmosphere to vacuum systems as the entirety of the process is conducted under vacuum.
  • Another advantage of the presently disclosed system is its ability to efficiently analyze both organic and inorganic matter.
  • Organic analysis is performed in at least certain implementations of the present disclosure using an infrared component of the Nd:YAG laser (1064 nm).
  • a long-pass cut-on filter (or similar filtering element) may then be placed in the beam path allowing for the transmission of IR energy while blocking UV energy.
  • the IR pulse may then be used to flash heat the sample.
  • flash heating e.g., on the order of 10 8 K/s
  • the organic compounds are desorbed from the sample surface intact where lower heating rates may result in undesirable decomposition of the organic material.
  • implementations of the present disclosure relate to their overall size, efficiency, and cost-effectiveness as compared to conventional analysis systems. For example, by using laser sources for multiple purposes (e.g., desorption and ablation, multi energy level ionization) and making specific use of optics to redirect beams from such laser sources, the overall size and shape of the analysis system may be reduced. As a result, implementations of the present disclosure are generally suitable for benchtop and/or field applications that would otherwise be problematic or simply not possible for conventional systems.
  • FIG. 1A is a schematic illustration of an analysis system 100 in accordance with the present disclosure.
  • the analysis system 100 includes a sample chamber 104 within which a sample 10 is disposed for analysis by a mass spectrometer 102.
  • the analysis system 100 may be capable of operating in multiple modes to facilitate analysis of both organic and inorganic material of the sample 10.
  • the analysis system 100 includes a desorption/ablation (D/A) sub-system 120 to selectively apply energy to desorb organic material from the sample 10 or to ablate inorganic material from the sample 10.
  • the desorbed or ablated material is then ionized using an ionization sub-system 140.
  • the ionized material is then directed to a mass spectrometer 102 for analysis.
  • the mass spectrometer 102 is a time-of-f light (ToF) mass spectrometer.
  • ToF time-of-f light
  • the analysis system 100 further includes a computing device 192.
  • the computing device 192 may take various forms, however, the computing device 192 generally includes one or more processors and a memory including instructions executable by the one or more processors to perform various functions of the analysis system 100.
  • the computing device 192 may be physically integrated with the other components of the analysis system 100.
  • the computing device 192 may be a panel, tablet, or similar computing device integrated into a wall of the sample chamber 104.
  • the computing device 192 may be a separate device operably coupled to the other components of the analysis system 100.
  • Coupling between the computing device 192 and the components of the analysis system 100 may be wireless, wired, or any combination and may use any suitable connection and communication protocol for exchanging data, control signals, and the like.
  • the computing device 192 may include various input and output devices including, but not limited to, a display 194 (which may be a touchscreen); a microphone; speakers; a keyboard; a mouse, trackball, or other pointer- type device; or any other suitable device for receiving input from or providing output to a user of the analysis system 100.
  • the sample chamber 104 generally includes a vacuum chamber 106 accessible, e.g., by a chamber door 108 or similar sealable opening.
  • the sample 10 may be supported within the sample chamber 104 by a mount 110.
  • the mount 110 may be motorized or otherwise movable such that the sample 10 may be repositioned within the vacuum chamber 106. By doing so, analysis of the sample 10 may be conducted at multiple locations without removing the sample 10 from the vacuum chamber 106.
  • the mount 110 may be configured to move incrementally and with a high degree of precision to facilitate mapping and analysis of the sample 10.
  • FIG. 1 B provides a more detailed view of the mount 110 and associated components of the analysis system 100.
  • the D/A sub-system 120 is generally configured to provide beams of at least two distinct wavelengths to a surface 12 of the sample 10 for purposes of removing material from the sample 10. To do so, the D/A sub-system 120 includes a D/A laser source 122 for producing a source beam and optical elements configured to generate the different material removal beams from the source beam. In at least certain implementations, the D/A sub-system 120 may produce a first material removal beam having a first wavelength and that is generally used to heat the sample 10 and desorb organic material from the sample 10 without substantially decomposing the organic material or damaging the surface 12 of the sample 10.
  • the organic vapor cloud produced by the desorption process may then be energized by the ionization sub system 140 and the resulting ionized vapor cloud may be directed to the mass spectrometer 102 for analysis, such as by a quadrupole ion guide 112 (or similar guide device, such as, but not limited to an Einzel lens or a series of lenses).
  • the D/A sub-system 120 may also produce a second material removal beam having a second wavelength, the second material removal beam having a higher energy density than the first material removal beam such that the second material removal beam is suitable for ablation of inorganic material from the surface 12 of the sample 10. Similar to the organic vapor cloud produced by desorption, the particle cloud produced by ablation may be ionized by the ionization sub-system 140.
  • such ionization may occur after a delay to allow plasma generated during the ablation process to extinguish.
  • the resulting ionized particle cloud may then be directed to the mass spectrometer 102 for analysis by the quadrupole ion guide 112 (or similar guide device).
  • a gate valve 170 or similar mechanism may be disposed between the ion guide 112 and the mass spectrometer 102, for example and among other things, to reduce pump down time between samples, to keep the mass spectrometer 102 under high vacuum conditions, and to reduce exposure to air.
  • the optical elements of the D/A sub-system 120 are generally used to produce a material removal beam 16 from a source beam 17 of the D/A laser source 122 and to direct the produced material removal beam (which may be either a desorption or ablation beam) to a analysis location 14 of the sample 10.
  • the fundamental wavelength of the material removal beam 16 differs from that of the source beam 17
  • producing the material removal beam 16 from the source beam 17 may include modifying the fundamental wavelength of the source beam 17, e.g., by filtering the source beam 17.
  • the energy density of the material removal beam 16 at the analysis location 14 may also be controlled to facilitate desorption or ablation.
  • Direction of the removal beam 16 may be achieved, for example, by one or more mirrors disposed within the vacuum chamber 106, such as mirror 136, positioned to direct the beam 16 from an initial beam direction to an incident beam direction having a particular angle of incidence (0D/A, shown in FIG. 1B) relative to a normal 171 defined by a surface 12 of the sample 10.
  • the value of 0 D/A may vary based on the location of the optical elements of the D/A sub-system 120, the location of the D/A laser source 122 relative to the surface 12 of the sample 10, and the general size and shape of the vacuum chamber 106. However, in at least some implementations of the present disclosure, 0 D/A is from and including about 15 degrees to and including about 45 degrees.
  • 0 D/A is about 40 degrees.
  • such values for 0 D/A may allow for a relatively small form factor for the analysis system 100 (e.g., by avoiding interference of the mirror 136 and other optical components with the ion guide 112) while ensuring that sufficient energy is delivered to the surface 12 of the sample 10 to desorb/ablate.
  • optical elements of the D/A sub-system 120 may also be used to control or modify characteristics of the source beam 17 to produce the material removal beam
  • Such processing may include, among other things, modifying fundamental wavelengths, attenuating, focusing/diffusing, or splitting the source beam 17 or any intermediate beams produced during the process of producing the material removal beam 16 from the source beam
  • the D/A sub-system 120 may include at least one filter 130 to produce a beam having a fundamental wavelength that is a harmonic wavelength of the source beam 17.
  • the filter 130 may include multiple selectable filter elements configured to change the wavelength of a beam entering the filter element (e.g., the source beam 17) from a fundamental wavelength of the beam to one of several harmonic wavelengths of the beam.
  • the filter 130 may be in the form of an electronically controlled filter wheel that allows automatic or manual application or removal of one or more filters to facilitate production of the material removal beam 16.
  • the D/A laser source 122 may include various types of laser sources, however, to facilitate a relatively compact form factor, in at least certain implementations of the present disclosure the D/A laser source 122 includes a miniaturized, high-powered, solid-state laser.
  • the D/A laser source 122 may be a neodymium-doped yttrium aluminum garnet (Nd:YAG) laser.
  • the Nd:YAG laser may produce a source beam having a fundamental wavelength of 1064 nm, i.e. , within the infrared (IR) range.
  • the source beam may be passed through the D/A sub system 120 without altering its fundamental wavelength such that the resulting material removal beam also has a fundamental wavelength of 1064nm and may be used for desorbing organic matter from the sample 10.
  • a filter or other optical elements of the D/A sub-system 120 may be applied to the source beam such that the material removal beam produced from the source beam has a wavelength of 266 nm (e.g., the fourth harmonic wavelength of the original 1064 nm beam) or 213nm, falling in the ultraviolet (UV) range. This material removal beam may then be used to ablate the sample 10 at the analysis location 14 for analysis of inorganic matter.
  • a Nd:YAG lasers is provided merely as an illustrative example of a laser that may be implemented as the D/A laser source 122.
  • desorption of organic material in the context of the current disclosure refers to the process of supplying energy from a beam to the sample to produce a vapor cloud of organic material of the sample.
  • Ablation of inorganic material refers to the process of supplying energy from a beam to the sample to generate an ionized particle cloud from inorganic matter of the sample. Accordingly, any laser having a beam that may be used in the production of each a first beam for use in desorbing organic material from a sample and a second beam for use in ablating inorganic material from the same sample may be used.
  • Nd:YAG laser is used herein as a primary example of a laser suitable for use as the D/A laser source 122
  • implementations of this disclosure are not limited to Nd:YAG lasers. Rather, those of skill in the art, given the teachings herein, would understand and know how to identify and select other types of lasers suitable for use in implementations of this disclosure.
  • desorption of organic material and ablation of nonorganic material may be achieved using beams of various wavelengths. As discussed herein, whether a given beam results in desorption or ablation is generally a function of, among other things, the sample composition, the total energy delivered to the sample, and the rate at which that energy is delivered to the sample.
  • wavelength is one factor related to the energy delivered by the beam
  • other aspects of the beam e.g., width, duty cycle, etc.
  • width e.g. 1064nm
  • 266nm e.g. 1066nm
  • ablation beam e.g. 1066nm
  • implementations of the present disclosure are not limited to those wavelengths and those of skill in the art, given the teachings herein, would be able to determine other suitable wavelengths.
  • the material removal beam 16 or intermediate beams between the source beam 17 and the material removal beam 16 may also be attenuated, expanded, or focused to modify the power density at the sample 10.
  • the D/A sub-system 120 may further include one or more of a beam expander 128, one or more attenuators (e.g., UV attenuator 131 and IR attenuator 132), and a focusing lens 134.
  • the D/A sub-system 120 may also include multiple beam expanders, attenuators, focusing lenses, or similar optical elements, as required by the particular application.
  • Beam expanders used in implementations of the present disclosure may be fixed or variable and attenuators may be included for attenuating beams having specific wavelengths or ranges of wavelengths.
  • the D/A sub-system 120 may produce a material removal beam in either the IR or UV range for desorption and ablation, respectively.
  • one or both of an I R attenuator and a UV attenuator may be included in the D/A sub-system 120 to further tune the energy of beams within the D/A sub system 120.
  • the focusing lens 134 may be configured such that the material removal beam has a particular size and, as a result, particular energy density at the surface 12 of the sample 10.
  • the D/A laser source 122 is a Nd:YAG laser capable of producing a desorption beam with a fundamental wavelength of 1064 nm.
  • the optics of the D/A sub-system 120 may be configured such that the beam width and/or energy density of the desorption beam is sufficient and suitable for thermal desorption of organics of various molecular sizes without causing decomposition.
  • the D/A sub-system 120 may generate a desorption beam with a wavelength of 1064 nm and an energy density at the surface 12 of the sample 10 from and including about 10 MW/cm 2 to and including about 150 MW/cm 2 .
  • the optics of the D/A sub-system 120 may also be configured to focus the desorption beam to be no more than about 50pm in diameter at the surface 12 of the sample 10. As discussed below in further detail, doing so allows multiple samples to be taken from the sample 10 at a relatively high sample density to facilitate thorough analysis of the sample 10.
  • the 1064nm beam of the Nd:YAG laser may be filtered to produce an ablation beam having a wavelength of 266nm.
  • the optics of the D/A sub-system 120 may be configured such that the beam width and/or energy density of the ablation beam is sufficient and suitable for breaking bonds of non-organic matter of the sample.
  • the D/A sub system 120 when operating in an ablation mode, the D/A sub system 120 generates an ablation beam with a wavelength of 266 nm and an energy density at the surface 12 of the sample 10 from and including about 1 GW/cm 2 to and including about 100GW/cm 2 .
  • the optics of the D/A sub-system 120 may also be configured to focus the ablation beam to be no more than about 50pm in diameter at the surface 12 of the sample 10.
  • the diameter of the beam may vary between implementations of the present disclosure and may also be variable within a given implementation.
  • any suitable number of fixed or variable beam expanders and/or focusing lenses may be implemented in the D/A sub-system 120 to achieve various beam widths and, as a result various energy densities of the beam at the sample 10.
  • the D/A sub-system 120 may further include at least one beam splitter 124 configured to split a beam within the D/A sub-system 120 and direct a portion of the beam to an energy meter 126.
  • the energy meter 126 may be used to measure the energy of the beam.
  • Such energy values may be used as a feedback or similar mechanism to facilitate control of the analysis system 100, as inputs to one or more equations or algorithms used to analyze the sample 10, or any other use related to the operation of the analysis system 100 or processing of data obtained by the analysis system 100.
  • the analysis system 100 may include an ionization sub-system 140 configured to ionize the organic and inorganic material removed from the sample 10 as a result of desorption or ablation. Similar to the D/A sub-system 120, the ionization sub-system 140 generally includes an ionization laser source 142 and various optical elements for manipulating an ionization beam generated by the ionization laser source 142.
  • the ionization sub-system 140 produces an ionization beam for exciting, at least in part, one or both of the vapor cloud created by the desorption process and the particle cloud generated by the ablation process.
  • the beam generated by the ionization sub-system 140 excites the vapor/particle cloud using multiphoton ionization (MPI).
  • MPI provides a relatively efficient method of generating ions (as compared to argon plasma of inductively coupled plasma processes) across a wide range of ionization energies.
  • the ionization sub-system 140 may implement MPI such that it is capable of generating ions having ionization potential of approximately 9.3 eV or less.
  • MPI is further advantageous in that it is capable of ionizing a range of particles as compared to other techniques, such as resonant enhanced multiphoton ionization (REMPI), which generally require tuning of the ionization beam to a particular ionization frequency to excite particular molecules or particles.
  • REMPI resonant enhanced multiphoton ionization
  • the ionization laser source 142 may be a Nd:YAG laser and the ionization sub-system 140 may be configured to provide an ionization beam having a wavelength of 213nm or 266nm.
  • a Nd:YAG laser is provided merely as an illustrative example of a laser that may be implemented as the ionization laser source 142. More generally, any suitable laser source may be used in conjunction with the broader ionization sub-system 140 provided that the ionization sub-system 140 generates a beam for ionizing material that has been desorbed or ablated from the sample 10.
  • Nd:YAG laser is used herein as a primary example of a laser suitable for use as the ionization laser source 142
  • implementations of this disclosure are not limited to Nd:YAG lasers. Rather, those of skill in the art, given the teachings herein, would understand and know how to identify and select other types of lasers and similar energy sources that suitable for producing an ionization beam.
  • the ionization sub-system 140 may be configured to direct the ionization beam parallel to the surface 12 of the sample 10 and, as a result, through the vapor cloud or particle cloud produced from the sample 10.
  • the ionization sub-system 140 produces a beam having a wavelength of 266 nm.
  • the ionization sub-system 140 may also be configured such that the ionization beam produced has a particular beam width and/or energy density at an ionization location disposed above the surface 12 of the sample 10.
  • the ionization beam may be focused at a particular location 180 above the sample 10 such that the ionization beam has an energy density of at least about 1 GW/cm 2 at the location 180.
  • the ionization sub-system 140 may include various optical elements including, without limitation, an attenuator 148, and a focusing lens 150. In other implementations filters and/or other optical elements may also be included in the ionization sub-system 140 for further control of the ionization beam. Similar to the D/A sub-system 120, the ionization sub-system 140 may further include at least one beam splitter 144 configured to split a beam of the ionization sub system 140 and to direct a portion of the beam to an energy meter 146. The energy meter 146 may be used to measure the energy of the ionization beam 18 to facilitate control of the analysis system 100.
  • the ionization sub-system 140 may include optics to control the intensity of the ionization beam 18 depending on whether the analysis system 100 is performing analysis of organic or inorganic matter.
  • optical elements such as filters and attenuators, may be used to reduce the energy of the ionization beam from a first energy level suitable for ionizing ablated inorganic material to a second energy level suitable for ionizing desorbed organic material.
  • the second energy level may be chosen to decrease or eliminate the likelihood of fragmentation effects that may be caused if the desorbed organic material were to be ionized using the same energy level as required during the ablation process.
  • Application of the ionization beam to the vapor/particle cloud may occur after a particular delay following the completion of desorption or ablation, respectively.
  • a delay may be implemented to allow any plasma produced during the ablation process to extinguish. While the duration of the delay may vary between specific applications, in at least one implementation, the delay may be from an including about 10 ns up to and including about 1ps between the completion of ablation and the application of the ionization laser to the resulting particle cloud.
  • the analysis system 100 may also include an imaging system 160 for capturing images of the sample 10 and, in particular, for capturing detailed images of specific portions of the sample subject to desorption and/or ablation.
  • the imaging system 160 may include an imaging device 162 and may further include multiple optical elements for directing light reflected off the surface 12 of the sample 10 to the imaging device 162.
  • the imaging device 162 may be a camera adapted to capture images of the sample 10 in the visible light range or in a broader range, such as a range including one or both of UV or IR wavelengths.
  • the imaging device 162 may be or otherwise include an interferometer or other similar imaging device capable of capturing topographical information of the sample 10.
  • the internal volume of the vacuum chamber 106 and placement of the quadrupole ion guide 112 normal to the surface 12 of the sample 10 may require the imaging device 162 to be indirectly aligned with the surface 12 of the sample 10.
  • the optical elements of the imaging system 160 may be used to facilitate placement of the imaging device 162 at a suitable offset relative to the surface 12 while still enabling proper capture of a current analysis location of the surface 12.
  • the imaging system 160 may include an objective lens 164, one or more prisms (e.g., prism pair 166), and a mirror 168 in to achieve a relatively tight angle of incidence to the sample surface 12.
  • the angle of incidence associated with the imaging system 160 is at least approximately 24 degrees, which generally permits light to exit the vacuum chamber 106 to the imaging device 162 in a substantially parallel direction relative to the top surface of the sample 10 while still allowing capture of a high quality image by the imaging device 162.
  • the sample 10 may be retained within the vacuum chamber 106 on a mount 110.
  • the mount 110 may be movable such that an analysis location 14 of the sample 10 may be varied.
  • the mount 110 may be manually or automatically adjustable in multiple directions to ensure a predetermined size and location of the beam 16.
  • the mount 110 may be adjustable in along a first axis 20 (e.g., a z- or vertical axis) to ensure that the analysis location 14 is disposed at a particular height relative to the ion guide 112.
  • the mount 110 may also be movable along each of a second axis 22 and a third axis 24 (e.g., an x-axis and y-axis or similar axes of a horizontal plane) to change the location of the analysis location 14 relative to the surface 12 of the sample 10.
  • a third axis 24 e.g., an x-axis and y-axis or similar axes of a horizontal plane
  • the analysis system 100 may be configured to execute an analysis routine in which successive analyses are conducted at different locations of the sample 10.
  • the analysis system 100 may be configured to analyze a sample according to a grid pattern. For each element of the grid, the analysis system 100 may capture a detailed image using the imaging system 160 and perform either or both of an organic analysis and inorganic analysis at the location. Following analysis at a location, the analysis system 100 may be configured to move the mount 110 such that the analysis location 14 is changed relative to the surface 12 of the sample 10. By automating such a process, a sample may be thoroughly analyzed while requiring only minimal intervention from an operator.
  • the mount 110 may include a kinematic mount system.
  • a kinematic mount (or kinematic coupling) is a fixture designed to constrain a component in a particular location with high degrees of certainty, precision, and repeatability.
  • Kinematic mounts generally include six contact points between a first part and a second part such that ail degrees of freedom of the first part are constrained. Examples of kinematic mounts include, without limitation, Kelvin and Maxwell mounts.
  • a Maxwell mount for example, three substantially V-shaped grooves of a mounting surface are oriented to a center of the part to be mounted, while the part being mounted has three corresponding curved surfaces (e.g., hemispherical or spherical surfaces) configured to sit down into the three grooves.
  • the grooves may be cut into the mounting surface or formed by parallel rods (or similar structures) coupled to the mounting surface.
  • each of the grooves provides two contact points for the respective curved surface, resulting in a total of six points of contact that fully constrain the part.
  • the mount 110 may include a sample holder 182 including a sample stage 184 and a kinematic base 186, the sample holder 182 being removable from the vacuum chamber 106.
  • the sample 10 is placed and retained on the sample stage 184 while the sample holder 182 is outside of the vacuum chamber 106.
  • the sample holder 182 is disposed within the vacuum chamber 106.
  • the kinematic base 186 of the sample holder 182 is received by and kinematically coupled to a kinematic mounting surface 188 disposed within the vacuum chamber 106.
  • the mount 110 may further include a magnetic or other latch 190 to fix the kinematic base 186 to the kinematic mounting surface 188.
  • the latch 190 may be integrated into either the sample holder 182 of the kinematic mounting surface 188.
  • composite image stacking generally refers to the process of linking one or more low scale images of the sample 10 with multiple large scale images, each of which corresponds to a portion of the low scale image.
  • the small scale image may correspond to an overall image of the entire sample (or a relatively large portion of the sample 10, e.g., a quarter of the sample) while the large scale images may correspond to specific locations of the sample 10 at which organic/inorganic sampling and analysis is conducted.
  • FIG. 2 is a schematic illustration of an image capture system 200 that may be used in conjunction with the analysis system 100 of FIG. 1A to facilitate composite image stacking and, in particular, to capture small scale/macro images of the sample 10 prior to analysis.
  • the sample holder 182 is placed onto a kinematic mounting surface 206 of the image capture system 200.
  • a latch 190 may then be used to fix the sample holder 182 to the kinematic mounting surface 206.
  • An imaging device 202 e.g., a camera
  • the sample holder 182 including the sample 10 is moved into the vacuum chamber 106 of the analysis system 100 for subsequent analysis.
  • the imaging device 202 may be positioned at a known location relative to the sample holder 182 when the sample holder 182 is placed onto the kinematic mounting surface 206.
  • the imaging device 202 may be positioned directly above the center of the sample stage 184.
  • the mount 110 when placed within the vacuum chamber 106, the mount 110 may be “zeroed” such that the sample holder 182 is also disposed in a known position within the vacuum chamber 106. Due to the high repeatability of the kinematic mounting and the ability to place the sample holder 182 in a known position in both the analysis system 100 and image capture system 200, a common coordinate system (or mapping between different coordinate systems) may be readily ascertained between the image capture system 200 and analysis system 100. Based on the common coordinate system, large scale images captured during analysis (e.g., by the imaging system 160) may be readily mapped to corresponding locations of the macro image(s) previously captured by using the image capture system 200.
  • establishing the common coordinate system also facilitates control and operation of the analysis system 100.
  • the macro-scale image may be displayed on the display 194 of the computing device 192.
  • a user of the analysis system may then use an input (mouse, touchscreen, etc.) to identify one or more specific locations of interest, define or select a sampling pattern/path along which multiple samples are to be taken, or otherwise provide input as to where and how the sample should be analyzed.
  • the analysis system 100 may generally, for each location, capture one or more detailed images as well as analysis data for both organic and inorganic material at the location. The detailed images and analysis data may then be linked to the corresponding location of the macro image such that a user may select locations of the sample in the macro image and “drill-down” to view one or both of the detailed image and the analysis data for the selected location.
  • the macro-level image may be readily aligned with any detailed images of specific sample locations (e.g., obtained using the imaging system 160 of the analysis system 100). As discussed below, the detailed images may then be linked or otherwise associated with any data resulting from organic and/or inorganic analysis conducted at the location represented by the detailed image.
  • the various images captured during analysis of a given sample may be used to generate a stacked and zoomable image that is also tied to underlying analysis data. So, for example, a user may be able to view the macro-level image of a given sample and toggle display of one or more heat maps (or similar visualizations) indicating the presence or concentration of different chemical components identified during analysis. The user may also be able to select specific locations to obtain more detailed information about the chemical makeup and analysis results for that location.
  • FIGS. 3A and 3B are schematic illustrations of an example kinematic mounting system 300A, 300B (collectively) as may be used in implementations of the present disclosure.
  • FIG. 3A illustrates a first half of the kinematic mounting system 300A that may generally correspond to an underside of the sample holder 182.
  • FIG. 3B illustrates a second half of the kinematic mounting system 300B and may generally correspond to the kinematic mounting surface 188 of the analysis system 100. It should be appreciated, however, that the second half of the kinematic mounting system 300B may also correspond to the kinematic mounting surface 206 of the image capture system 200 of FIG. 2.
  • the first half of the kinematic mounting system 300A includes three spherical or hemi-spherical protrusions 302A-C distributed about the underside of the sample holder 182.
  • the sample holder 182 may also include a rotatable or otherwise movable latch mechanism 190.
  • the latch 190 includes a first set of magnets 304A-C such that rotation of the latch 190 results in rotation of the magnets 304A-C.
  • the second half of the kinematic mounting system 300B includes three channels 306A-C which, in the illustrated example, are defined by respective pairs of rods 308A-C.
  • the second half of the kinematic mounting system 300B further includes a second set of magnets 310A-C arranged in a pattern similar to that of the first set of magnets 304A-C of the latch 190.
  • the first half of the kinematic mounting system 300A and the second half of the kinematic mounting system 300B may be coupled by placing the first half 300A onto the second half 300B such that the protrusions 302A-C of the first half 300A are received in the corresponding channels 306A-C of the second half 300B.
  • the latch 190 may be manipulated (e.g., rotated) to align the first set of magnets 304A-C with the second set of magnets 310A-C, locking the two halves 300A, 300B together.
  • the latch 190 may be manipulated to misalign the first set of magnets 304A-C and the second set of magnets 310A-C, thereby unlocking the kinematic mount and allowing separation of the two halves of the kinematic mount.
  • the kinematic mount system illustrated in FIGS. 3A and 3B is merely one example of a kinematic mount suitable for use in applications of the present disclosure and other configurations are possible.
  • the components of the first half 300A such as the protrusions 302A-C and the latch 190, may instead be disposed on the second half 300B, and vice versa.
  • other styles of kinematic mechanisms may also be used. More generally, however, any suitable mounting system may be implemented in each of the analysis system 100 and the image capture system 200 that facilitates repeatable location of the sample 10 such that the detailed images captured by the analysis system 100 can be readily correlated and aligned with corresponding portions of the macro-level images captured by the image capture system 200.
  • FIG. 4 is a graphical representation of the foregoing concepts and data storage approach.
  • a macro image 402 of the sample 10 may be captured using an image capture system, such as the image capture system 200 of FIG. 2.
  • the macro image 402 may then be stored by the analysis system 100 (e.g., in a memory of the computing device 192).
  • the macro image 402 may be subdivided by the analysis system 100 into a grid 404 or similar pattern, with each location in the grid representing an analysis location of the sample.
  • the dimensions of each grid element may vary in different applications, however, in at least some implementations each element of the grid is on a similar order as the width of the material removal beam at the surface 12 of the sample 10.
  • the D/A sub-system 120 may be configured to generate a focused beam having a diameter of no more than about 50pm in diameter at the surface 12 of the sample 10.
  • the macro image 402 of the sample 10 may be sub-divided into a square grid in which each element is a square from and including about 50pm by 50pm to and including 100pm to and including 100pm.
  • FIG. 4 includes a path 406 that extends through each grid element in a given column before moving to the subsequent column. This pattern may continue such that the path reaches each grid element of the macro image 402. It should be appreciated that the column by column approach illustrated in FIG. 4 is only an example and other analysis routines are contemplated. More generally, a user may select one or more specific locations or areas of the sample 10 for analysis. To the extent the user selects an area (which may correspond to any area up to and including the entire sample), the user may also select an analysis density or pattern.
  • the user may want in-depth analysis of a particular area of a sample and, as a result, may desire that an analysis be conducted at each discrete location (e.g., each grid element) within the area.
  • each discrete location e.g., each grid element
  • only a subset of grid elements may be identified for analysis (e.g., every second (or any other number) grid element within the area, every other (or any other number) row of elements within the area, every other (or any other number) column within the area).
  • a random sampling mode may be available in which random locations of all or a subset of the grid 404 is selected for analysis.
  • the computing device 192 may be configured to automatically generate a path for analysis of the sample.
  • the analysis system may analyze the entire sample following a path similar to that of the path 406 of FIG. 4.
  • the computing device 192 may be configured to identify particular areas of the sample 10 (e.g., areas having particular colors, shapes, or other notable characteristics) and target such areas of interest for more in-depth analysis (e.g., by automatically increasing the analysis density within the areas of interest).
  • the analysis routine may be subsequently executed by the analysis system 100.
  • executing the analysis routine includes successively moving the sample 10 into locations to be analyzed and analyzing each location.
  • analyzing a given location may include capturing an image of the location and performing each of an organic material analysis and an inorganic material analysis.
  • the capture image e.g., image 410
  • analysis results e.g., result data 412
  • the grid element e.g., grid element 408
  • implementations of the present disclosure may include storage of sample data in an efficient and easily navigable format. More specifically, each sample analyzed using the analysis system 100 may be represented by a macro level image including a relatively large portion of the sample surface.
  • the macro-level image may be sub-divided into a grid or similar pattern and an underlying data structure (e.g., an array) may be linked to the macro-level image in which each element of the array represents a corresponding grid element.
  • an underlying data structure e.g., an array
  • the corresponding array element may be populated with the image/mass spectroscopy data, links/pointers to such data, or similar information for retrieving the analysis data.
  • the analysis data is stored in a manner that allows a user to easily view the sample as a whole (e.g., via the macro image) and select specific sample locations to obtain more detailed images and analysis data for the location.
  • linking the analysis data and macro-level image enables the generation and display of various useful visualizations that may be overlaid on top of the macro-level image, such as heat or color maps, to facilitate further analysis by a user of the analysis system 100.
  • FIGS. 5A-D illustrate a flow chart of an example method 500 of operating an analysis system in accordance with the present disclosure to analyze a sample containing organic and inorganic components.
  • the method 500 may be implemented, for example, using the analysis system 100 illustrated in FIG. 1A-B. Accordingly, reference in the following discussion is made to the analysis system 100 and its components; however, it should be understood that the analysis system 100 should be regarded as a non-limiting example of a system that may implement the method 500.
  • FIG. 5A generally illustrates the steps prior to actual analysis of the sample.
  • each of the sample 10 and the analysis system 100 may each be prepared for use.
  • the sample 10 is prepared and a macro-level image of the sample is capture and stored, respectively.
  • Preparation of the sample 10 may include, among other things, cleaning, chemically treating, cutting, polishing, or otherwise preparing the sample surface 12.
  • Preparation of the sample 10 may further include loading the sample onto a sample stage 184 or similar fixture for retaining the sample 10 during capture of the macro-level image and subsequent analysis.
  • capturing the macro-level image (operation 504) may include loading the sample 10 onto a kinematic or similar high-precision mount to facilitate later alignment of detailed images captured during analysis of the sample with the macro-level image.
  • Calibration of the analysis system 100 may include, among other things, performing various checks to confirm communication with and functionality of various sub systems of the analysis system 100. Calibration may also include testing various components (e.g., confirming a full range of motion for the motors used to move the sample 10 within the sample chamber 104, activation of the various lasers and associated optical sub-systems, etc.). Calibration may also include configuring the mass spectrometer 102, such as by loading various matrix standards or similar information into the mass spectrometer 102 to configure the mass spectrometer 102 for analyzing particular types of samples. This may also include independent system parameters for organic and inorganic analysis. As illustrated in FIG. 5A calibration of the analysis system 100 and preparation of the sample 10 are generally independent steps and may be conducted in any order, including simultaneously (in whole or in part).
  • the sample 10 may be loaded into the vacuum chamber 106 (operation 508) and the vacuum chamber 106 may be pumped to a low vacuum (operation 510).
  • a sensitivity analysis may then be performed and corresponding instrument conditional values may be stored (operation 512). This may include executing a pre-loaded internal standard of a known matrix or an external standard loaded alongside the sample. Such values may be used to update the internal tables used in quantification.
  • an analysis routine may be selected (operation 514). As previously discussed, doing so may include the user interacting with the computing device 192 to select one or more specific locations and/or areas for analysis (e.g., by clicking or otherwise identifying areas of interest on the macro-level image) and specifying to what extent each area is to be analyzed. Alternatively, the computing device 192 may be configured to automatically identify areas of interest of the sample and generate a corresponding analysis routine. With an analysis routine selected, analysis of the sample is initiated (operation 516).
  • Analysis of a given sample may generally include positioning the sample 10 such that the focal point of the D/A beam 16 and field of view of the imaging system 160 is at a first location specified in the analysis routine (operation 518). Analysis at that location may then commence by first capturing a micro-level image of the location (operation 520). As previously discussed, the captured micro-level image may then be stored in a manner that links the image with the corresponding location of the macro-level image captured during operation 504.
  • organic analysis may generally include the steps of desorbing organic material using a low energy beam (operation 524), ionizing the resulting desorbed organic material to form ionized organic sample material (operation 526), and analyzing the resulting ionized organic sample material (operation 528).
  • the desorption process may include modifying an operational mode of a desorption/ablation (D/A) sub-system to generate a material removal beam suitable for desorption of organic material from the sample 10.
  • D/A desorption/ablation
  • Generating a material removal beam having suitable characteristics for desorption may include, among other things, using one or more filters, attenuators, mirrors, lenses, or other similar optical elements to manipulate a size, energy density, and wavelength of a source beam generated by a D/A laser source 122 of the D/A sub-system 120 and directing the resulting material removal beam to the current analysis location of the sample 10.
  • the process of ionizing the desorbed organic sample material may include producing and directing an ionization beam 18 generated by an ionization sub-system 140 to a location normal to the sample surface 12.
  • the resulting ionized organic sample material may subsequently be analyzed by the mass spectrometer 102 of the analysis system (operation 528).
  • Doing so may include transporting the ionized organic sample material, such as by use of the quadrupole ion guide 112 or similar delivery system, including the opening of any valves (e.g., gate valve 170) to allow transportation of the ionized vapor from the vacuum chamber 106 to the mass spectrometer 102.
  • any valves e.g., gate valve 170
  • Analysis of the sample at operation 528 may further include storing the results of the analysis. Similar to the micro-level image, such storage may include storing the organic analysis result data in a manner that is linked with the corresponding location of the macro-level image captured during operation 504.
  • inorganic analysis may generally include the steps of ablating inorganic material using a high energy beam (operation 532), imposing a delay to allow for extinction of any plasma resulting from the ionization process (operation 534), ionizing the resulting particle cloud of inorganic sample material to form ionized inorganic sample material (operation 536), and analyzing the resulting ionized inorganic sample material (operation 538).
  • the ablation process may include modifying an operational mode of the desorption/ablation (D/A) sub-system to generate a material removal beam suitable for ablating inorganic material from the sample 10.
  • Generating such a material removal beam may include, among other things, using one or more filters, attenuators, mirrors, lenses, or other similar optical elements to manipulate a size, energy density, and wavelength of a source beam generated by the D/A laser source 122 of the D/A sub-system 120 and directing the resulting beam to the current analysis location of the sample 10.
  • Ablation generally results in a cloud of inorganic particles material rising normal to the surface 12 of the sample 10.
  • the energy used to ablate the inorganic material may generate charged plasma that may negatively impact subsequent ionization and analysis of the inorganic material.
  • the analysis system 100 may be configured to apply a delay between ablation and ionization (operation 534).
  • the duration of the delay may vary, however, in at least certain implementations, the delay may be from and including about 10ns to and including about 1ps.
  • the resulting particle cloud of inorganic matter may be ionized (operation 526). Similar to ionization of the vapor cloud in operation 526, ionization of the particle cloud may include producing and directing the ionization beam 18 generated by the ionization sub-system 140 to a location normal to the sample surface 12. The resulting ionized particles may then be directed to and analyzed by the mass spectrometer 102 of the analysis system (operation 538). Analysis of the sample at operation 538 may further include storing the results of the inorganic analysis. Similar to the micro-level image and the organic analysis data, such storage may include storing the inorganic analysis result data in a manner that is linked with the corresponding location of the macro-level image captured during operation 504.
  • the analysis system determines whether the current sample location is the final sample location as dictated by the analysis routine (operation 540). If not, the sample location is incremented (operation 542) to the next sample location of the analysis routine and the process of positioning the sample, capturing an image of the sample, and performing each of an organic and inorganic analysis (operations 518-538) are repeated at the new location.
  • analyzing the collected data may include each of identifying matrix elements (operation 544), choosing a suitable relative sensitivity factor (RSF) for the matrix type (operation 546), and applying each of the identified matrix and corresponding RSF to quantify the analysis (operation 548). This allows for quantification of a sample which may have many matrices within a small area. Each grid may be analyzed first for matrix compositions which then determines the factors used for ultimate quantification
  • the collected data may also be used to provide feedback to the analysis system 100 and/or to update or otherwise modify calibration data of the analysis system 100.
  • a matrix normalizing element may be identified (operation 550).
  • each of RSFs for all elements and matrix types may also be calculated and RSFs relative to a general standard RSF may also be calculated (operations 552, 554, respectively).
  • the foregoing information may be stored in a calibration table (operation 556) for later use in calibrating the analysis system 100 prior to analysis of subsequent samples.
  • the foregoing description of the method 500 includes analysis of both organic and inorganic material at each sample location, it should be appreciated that in other implementations the system may be configured to analyze only organic material or only inorganic material at any or all sample locations.
  • FIG. 6 is a flow chart illustrating a method 600 of analyzing ionized particles, such as may be used by the mass spectrometer 102 of the analysis system 100 in conjunction with the computing device 192.
  • the method 600 illustrated in FIG. 6 may generally be applied to analysis of either the ionized vapor cloud produced during analysis of organic material or the ionized particle cloud produced during analysis of inorganic material.
  • a baseline correction may be applied to the signals received during the analysis process.
  • the corrected signals may then be analyzed to identify peaks (operation 604) in the mass spectrum results.
  • peaks generally correspond to relatively high quantities of detected particles having particular mass-to-charge ratios.
  • the resulting peak data may then be integrated or otherwise processed to determine the mass of the particles associated with each peak (operation 606).
  • the masses and elements may then be verified using isotropic ratios (operation 608). Following verification, the peaks may be labelled or otherwise tagged with the particular element or compound represented by the peak (operation 610).
  • the unique configuration of the analysis system 100 enables a single standard to be used for multi-matrix quantification.
  • the strict sample-standard matching practices required for many conventional instruments and which are highly susceptible to matrix effects can be avoided.
  • the initial neutral particle cloud formed during ablation is not affected to a substantial degree by the ablation process and the effect of the changing chemical environment (i.e., the matrix) is orders of magnitude less than ions which are produced by the resultant plasma.
  • the matrix characterization may be used to determine the relative RSFs (MEM) as discussed below in further detail.
  • the quantification process may require an initial calibration stage in which standards of varying matrix types are analyzed (e.g., the calibration operation 506 of FIG. 5A).
  • Such calibration may include selecting one or more general standards (e.g., silicate glass), analyzing the selected standards, and calculating individual relative sensitivity factors (RSFs) for the standards.
  • RSFs relative sensitivity factors
  • a matrix-effect-multiplier (MEM) may then be computed for each matrix type based on the foregoing calculations.
  • the MEM generally functions as a scaling factor for each element’s effects in different matrices relative to the general standard matrix. Accordingly, by calculating an MEM for a given sample, the sample may be rapidly quantified despite the sample possibly including multiple matrices in a small area.
  • a relative sensitivity factors is generally used to scale measured peak areas obtained during spectrometry such that variations in the peak areas are representative of the amount of material in the sample.
  • the RSF is applied to convert the measured ion intensities obtained during spectrometry into atomic concentrations in the investigated matrix.
  • Each element within a sampled matrix may behave differently in a particular spectrometry system. As a result, a respective RSF is generally required for each element within a sample being quantified.
  • RSFs often depend on characteristics of the sample being analyzed but also on the conditions under which such analysis occurs. Accordingly, while libraries of RSFs may be available for certain spectrometry systems, the relative utility of such RSFs are highly dependent on subsequent analysis conditions being substantially the same as when the RSFs were determined. To the extent analysis is conducted under disparate conditions (e.g., different environmental conditions or different instrument conditions such as resulting from instrument drift), previously determined RSF values may be unreliable or otherwise inaccurate.
  • implementations of systems according to the present disclosure may calculate effective RSF (RSF eh) values that more readily take into account variability in the analysis system as compared to simply relying on libraries of stored RSF values.
  • effective RSFs are calculated for each element of interest based on each of a dynamically updated general standard RSF and a library of matrix standard RSFs.
  • the general standard RSF corresponds to a known material for which a test sample is available and for which the actual contents/quantification of molecular species within the test sample are known.
  • the general standard RSF may correspond to a standard form of glass (e.g., a standardized piece of borosilicate glass) with a known and certified composition.
  • the matrix standard RSFs are RSF values associated with particular matrices and characterize the relative sensitivity attributable to matrix effects for those matrices.
  • various matrix standard RSFs for commonly encountered minerals/matrices e.g., plagioclase, alkali feldspar, pyroxene, quartz, mica, etc.
  • each matrix standard RSF providing relative sensitivity values arising out of the matrix effects for the particular mineral/matrix.
  • initial general standard RSFs and the matrix standard RSFs may be combined to generate what are referred to herein as matrix effect multipliers (MEMs) for various elements of interest.
  • MEMs matrix effect multipliers
  • test sample corresponding to the general standard RSFs may be periodically analyzed to obtain updated general standard RSFs.
  • the updated general standard RSFs may then be scaled using the corresponding MEMs to determine the effective RSF.
  • the sample material may be reanalyzed by the system to obtain an updated general standard RSF which in turn may be used to calculate updated effective RSFs.
  • the foregoing process includes calculating an effective relative sensitivity factor for an element in question (e).
  • the effective relative sensitivity factor can be calculated according to the following equation (1):
  • RSF Eff MEM e (RSF Q )
  • RSF Eff the effective relative sensitivity factor
  • MEM is a matrix effect multiplier
  • RSF G is a relative sensitivity factor according to a general standard
  • e the element in question.
  • Equation (2) The matrix effect multiplier (MEM) for the element e may in turn be calculated according to equation (2):
  • RSF G The relative sensitivity factor according to the general standard (RSF G ) may in turn be calculated according to equation (3): where X G is concentration according to the general standard and P G is an integrated peak according to the general standard. Each of XG and P G are further included in terms of the element in question (e) and a normalizing element relative to the general standard (NG).
  • the relative sensitivity factors according to the matrix effect standard may in turn be calculated according to equation (4): where X M is concentration according to the matrix effect standard and P M is an integrated peak according to the matrix effect standard. Each of X M and P M are further included in terms of the element in question (e) and a normalizing element relative to the matrix effect standard (NM).
  • each of the absorption/desorption beam 16 and the micro-level imaging device 162 of the analysis system 100 may have an associated angle of incidence (0D/A and OCAM, each shown in FIG. 1B) corresponding to the angle at which the material removal beam 16 (e.g., either of a desorption beam or an ablation beam) is directed onto the sample 10 and the angle of view of the imaging device 162, respectively.
  • the material removal beam and the angle of view of the imaging device may instead be arranged to be coaxial and perpendicular to a top surface of the sample 10. Such implementations may provide improved alignment of the material removal beam and the imaging, easier system calibration, reduced system footprint, and other benefits.
  • FIGS. 7-12 are schematic illustrations of an alternative analysis system 700 in accordance with the present disclosure in which each of the material removal beam and micro level imaging device field of view are arranged coaxially and perpendicular to a top surface of a stage/sample holder 705.
  • each of the desorption beam, the ablation beam, and field of view of the micro-level imaging device may be directed along an axis 701.
  • the material removal beam and micro-level imaging device field of view would also be perpendicular to the top surface of the sample 10.
  • the analysis system 700 further incorporates additional features for improved capture of a macro image of the sample 10.
  • the analysis system 700 may generally include a sample chamber 702, a macro-level imaging assembly 720, an optical assembly 730, an ion extraction system 750, and a mass spectrometer 770 (e.g., a time-of-flight mass spectrometer).
  • the analysis system 700 may be contained within a suitable housing or case 790 (shown in dashed lines for purposes of illustrating internal components of the analysis system 700).
  • a computing system for controlling and operating the analysis system 700 is omitted for clarity; however, it should be understood that the analysis system 700 may be operated and controlled locally and/or remotely using a suitable computing device.
  • Such a computing system may generally contain similar components and perform functions similar to the computing device 192 of the analysis system 100, as described above.
  • a door 706 of the sample chamber 702 may be opened to insert a sample 10.
  • An example opened configuration is generally illustrated in FIG. 8.
  • the sample chamber 702 may be opened using a corresponding control element such as a button (physical or electronic) or interactive element of a user interface, such as a user interface of a computing device (not shown) communicatively coupled to the analysis system 700.
  • an actuator 708 e.g., an electropneumatic or similar actuator
  • the door 706 of the sample chamber 702 may be opened, at least in part, by a user of the analysis system 700.
  • the stage assembly 704 may generally include a stage or sample holder 705 for retaining the sample 10 and one or more actuators (e.g., actuator 707) for adjusting the position of the stage/sample holder 705.
  • the stage assembly 704 may include three or more actuators such that the stage/sample holder 705 may be translated in any of the x-, y-, or z-directions.
  • actuators of the stage assembly may further permit at least some rotation about at least one of the x-, y-, or z-axes.
  • the stage assembly 704 may also be coupled to an additional actuator (not shown) that automatically translates the stage assembly 704 out of the sample chamber 702 in response to opening of the door 706. In other implementations, the stage assembly 704 may be manually translated out of the sample chamber 702 when the door 706 is opened. Regardless of how the stage assembly 704 is translated from within the sample chamber 702, the stage assembly 704 may be coupled to or otherwise disposed on guides, rails or similar structural elements (not shown for clarity) to maintain alignment of the stage assembly 704.
  • a macro-level image of the sample 10 may be captured using the macro-level imaging assembly 720 (which is illustrated schematically in FIG. 9).
  • the macro-level imaging assembly 720 may automatically open and extend a macro-level imaging device 724 to align the field of view 723 of the imaging device 724 to capture an image of the sample 10 and/or the stage/sample holder 705 of the stage assembly 704.
  • the image capture by the macro-level imaging device 724 may include all or a substantial amount of a top surface of the sample 10.
  • the macro-level imaging assembly 720 may include a mirror 722 (or similar optical element) for directing the field of view of the macro-level imaging device 724 to be aligned with the stage assembly 704 when the stage assembly 704 is translated outside of the sample chamber 702.
  • the macro-level imaging assembly 720 may further include one or more actuators (e.g., actuator 721) for moving one or both of the macro-level imaging device 724 and the mirror 722 for purposes of aligning the field of view of the macro-level 724 with the stage assembly 704.
  • the system 700 may perform an auto-focusing procedure.
  • the auto-focusing procedure includes translating the stage/sample holder 705 of the stage assembly 704 to bring the sample 10 into focus with respect to the macro-level imaging device 724.
  • a macro-level image may be captured using the macro-level imaging device 724.
  • the captured image may be mapped onto a digital plane representing the moveable area of the stage/sample holder 705 in x- and y- directions. Further processing and use of the macro-level image is described above, e.g., in the context of FIGS. 4-5D.
  • the stage assembly 704 may be retracted back into the sample chamber 702 and the sample chamber door 706 may be closed (e.g., manually by the user or by one or more actuators of the analysis system 700).
  • the sample chamber door 706 may be closed (e.g., manually by the user or by one or more actuators of the analysis system 700).
  • components of the macro-level imaging assembly 720 are also extended/translated for purposes of capturing the macro-level image, such components may similarly be retracted and any doors (or similar openings) through which the components translate through to capture the macro-level image may be closed (either manually or automatically).
  • pressure within the sample chamber 702 may be reduced.
  • a port (not shown) of the sample chamber 702 is opened to a valve (e.g., a roughing valve, not shown) and pumped down to a first reduced pressure level using a corresponding pump (not shown) coupled to the sample chamber 702.
  • a valve e.g., a roughing valve, not shown
  • pressure may be reduced to approximately 0.3mbar during this process.
  • a second adjustment (e.g., an adjustment in the z- direction) of the stage assembly 704 may be performed (either automatically or in response to commands provided by the user, e.g., through a user interface of the computing device of the analysis system 700) such that the sample is brought into focus relative to a micro-level imaging device of the optical assembly 730.
  • a plan view of one implementation of the optical assembly 730 including a micro-level imaging device 738 is provided in FIG. 10. Other aspects of the optical assembly 730 are described below in further detail.
  • the second adjustment may be performed at multiple locations with the system in a raster mode, such as described above in the context of FIG. 4.
  • the initial vertical adjustment of the stage assembly 704 external the sample chamber 702 and based on the macro-level imaging device 724 may be considered a “coarse” adjustment having a first broader range of available positions and a first step-size between selectable positions.
  • this coarse adjustment is intended to achieve a level of focus sufficient to capture a macro-level image of the sample 10 and to bring the sample 10 into substantial focus relative to the micro-level imaging device 738.
  • subsequent adjustment of the stage assembly 704 may be considered a “fine” position adjustment within a range of stage assembly positions about the position set during coarse adjustment.
  • the step size may be significantly reduced as compared to the step size used during coarse adjustment.
  • a valve e.g., a gate valve 756 of the ion extraction system 750 (shown in detail in FIG. 11) may be opened such that the sample chamber 702 and the ion extraction system 750 are in communication.
  • the roughing valve or other similar low-pressure valve) previously opened during initial depressurization may also be closed at this time.
  • a pump in communication with the sample chamber 702 may then be used to begin to pull a vacuum in the sample chamber 702.
  • a vacuum may be pulled such that pressure within the sample chamber 702 reaches an ultimate pressure of less than 10 L -3 mbar, which, for purposes of the present discussion is considered to be full vacuum.
  • a gas such as a high purity Helium gas
  • Helium gas may be provided into the sample chamber 702 to a pressure of 0.01 to 0.3 mbar, depending on analysis conditions.
  • the user may begin selecting specific points, lines, rasters, etc. of the sample 10 for analysis.
  • the macro image may be presented to the user (e.g., on a display of the analysis system computing device).
  • the stage assembly 704 may automatically translate such that the selected location is within the field of view of the micro-level imaging device 738. The user may then “zoom into” the current location by switching to a live feed or otherwise viewing an image of the current location captured by the micro-level imaging device 738.
  • the user may select an area of the sample from the macro-level image captured by the macro-level imaging device 724 and then may be subsequently presented with a more detailed image or video feed corresponding to the selected location and captured using the micro-level imaging device 738.
  • the user may also be permitted to adjust the focus of the micro-level imaging device 738 by making fine adjustments to the z-position of the stage/sample holder of the stage assembly 704.
  • the user may select from one or more preset analysis routines stored in memory of the analysis system computing device (or otherwise accessible by the computing) via the selectable by the user.
  • Preset analysis routines may include, among other things, routines that follow preset scanning paths that test all or a particular portion of the sample, routines involving randomly or pseudo- randomly selected locations, or locations based on visual characteristics of the sample.
  • the system 700 may be configured to identify areas of the sample surface having certain visual characteristics (e.g., color, shape, boundaries, etc.) and may prioritize such areas for testing.
  • the user may also select whether the analysis procedure is to include inorganic analysis, organic analysis, or both inorganic and organic analysis.
  • the analysis system 700 sets the state of the optical assembly 730 to provide the corresponding beam. More specifically, if inorganic analysis is to be conducted, the analysis system 700 puts the optical assembly 730 in a state to deliver a high energy beam to ablate the sample. Similarly, if organic analysis is to be conducted, the analysis system 700 puts the optical assembly 730 in a state to deliver a lower energy to the sample 10 to desorb organic material from the sample 10.
  • organic analysis may be conducted using a beam in the IR range while inorganic analysis may be conducted using a beam in the UV range; however, implementations of the present disclosure are not limited to any specific laser types or wavelengths.
  • the system 700 may configure the optical assembly to first perform organic analysis for all locations of the sample 10 to be analyzed and then, after completing the organic analysis, may reconfigure the optical assembly 730 to perform the inorganic analysis.
  • the system 700 may alternate between performing organic and inorganic analysis for subsets (including individual locations) of the sample locations to be analyzed. For example, in an analysis of ten locations, the system may conduct organic analysis of a first pair of points followed by inorganic analysis of the first pair of points. This process may then be repeated for subsequent pairs of points until all ten locations have been analyzed.
  • FIG. 10 is a plan view of an example optical assembly 730 in accordance with the present disclosure.
  • the optical assembly 730 generally includes a desorption/ablation (D/A) laser 732, the micro-level imaging device 738, and an illumination source 740 (e.g., an illumination light emitting diode (LED)).
  • the optical assembly 730 is generally configured to selectively provide each of a low energy (e.g., IR) beam for desorption and a high energy (e.g., UV) beam for ablation and to capture micro-level images of the sample 10 disposed within the sample chamber 702.
  • the D/A laser 732 may be a Nd:YAG laser; however, implementations of the present disclosure are not specifically limited to Nd:YAG laser.
  • the optical assembly 730 further includes a single port 742 defined within a housing 731 and through which the beams generated by the D/A laser 732 may be delivered. More specifically, beams generated by the D/A laser 732 are directed in a substantially horizontal direction within the housing 731 but made to exit through the port 742 in a substantially vertical direction perpendicular to a top surface of the stage 705 and sample 10 within the sample chamber 702. Accordingly, the optical assembly 730 may further include various mirrors (e.g., mirrors, prisms, filters, or other optical elements to modify and direct beams generated by the D/A laser 732 within the optical assembly 730 and through the port 742.
  • various mirrors e.g., mirrors, prisms, filters, or other optical elements to modify and direct beams generated by the D/A laser 732 within the optical assembly 730 and through the port 742.
  • a filter element 734 may be used to separate the beam produced by the D/A laser into high and low energy components.
  • a low-energy/I R shutter 744 may then be used to selectively control delivery of the low-energy component to the port 742 via a first series of optical elements.
  • a high-energy/UV shutter 745 may be used to selectively control delivery of the high- energy component to the port 742 via a second series of optical elements.
  • Other optical elements for purposes of directing, splitting, and otherwise modifying beams provided by the D/A laser 732 are indicated in FIG. 10 as optical elements 750A-E.
  • the optical assembly 730 further includes the micro-level imaging device 738 and the illumination source 740.
  • the optical assembly 730 further includes optical elements (e.g., optical element 752) to direct light from the port 742 to the micro-level imaging device 738.
  • the optical assembly 730 also includes optical elements (e.g., optical element 754) to direct light from the illumination source 740 through the port 742.
  • the configuration of the optical assembly 730 is such that each of the desorption and ablation produced by use of the D/A laser 732 and light generated by the illumination source 740 exit through the port 742 of the optical assembly 730 when exit through the port 742 coaxially.
  • port 742 may include a mirror or similar optical element that directs the material removal beams and field of view into the sample chamber (e.g., downward into the image of FIG. 10).
  • light to be captured by the micro-level imaging device 748 enters the optical assembly 730 coaxially relative to beams generated by the D/A laser 732 and light produced by the illumination source 740.
  • the field of view of the micro-level imaging device 748 is coaxial with each of desorption beams, ablation beams, and illumination light produced by the optical assembly 730 as each exits or enters the port 742.
  • axial alignment of material removal beams and the field of view of the micro level imaging device 748 may be achieved using at least one common optical element that passes or directs the material removal beams and/or the field of view of the micro-level imaging device 748 through the port 742 along a common axis.
  • the paths of each of the material removal beams and the field of view of the micro-level imaging device 748 pass through, are reflected by, or are otherwise directed to optical element 750E.
  • each of the material removal beams and the field of view are directed to port 742 along substantially the same axis.
  • optical element 750E and any mirror that may be incorporated in port 742 may be considered common optical elements for purposes of facilitating coaxial direction of the material removal beams and field of view.
  • the optical assembly 730 may further include additional optical elements for attenuating, focusing, splitting, or otherwise manipulating light within the optical assembly 730.
  • a respective beam splitter may be disposed along each of the low-energy beam path and the high-energy beam path to direct a portion of the corresponding beam to an energy meter or similar sensor to provide feedback and facilitate control of the analysis system 700.
  • analysis generally includes moving the sample 10 (e.g., by actuating the stage assembly 704) through a series of positions corresponding to locations defined by the selected or generated analysis routine and performing an analysis step at each such location.
  • Analysis for a given location may generally include capturing a micro-level image of the location using the micro-level imaging device 738 and then performing one or both of organic or inorganic analysis.
  • Organic analysis generally involves applying a low energy beam to the location to desorb organic material from the sample while inorganic analysis generally involves applying a high energy beam to the location to ablate inorganic material from the sample.
  • the resulting vapor of desorbed material or particle cloud of ablated material is then ionized using an ionization beam generated by an ionization laser 780 (shown in FIGS. 7 and 8) and delivered to the ion extraction system 750 (illustrated in FIG. 11) for analysis.
  • the ionization beam is directed parallel to a top surface of the sample 10 after a delay (e.g., 100ns-10us) following delivery of the low energy beam (when conducting organic analysis) or high energy beam (when conducting inorganic analysis) to the sample 10.
  • a delay may be implemented to allow plasmas to extinguish prior to ionization of the desorbed/ablated sample material.
  • the ion extraction system 750 may be adapted to one or more of concentrate, direct, and extract particular ions produced by applying the ionization beam to material that has been desorbed or ablated from the sample 10.
  • the ion extraction system 750 may be configured to one or more of concentrate ions produced by the ionization beam, extract ions having particular kinetic energies, and direct extracted ions as a beam to the mass spectrometer 770 for analysis.
  • the operating principle of the ion extraction system 750 may vary in implementations of the present disclosure.
  • the ion extraction system 750 may be a radio frequency (RF)-based ion extraction system.
  • the ion extraction system 750 may instead be an electrostatic ion extraction system.
  • the ion processing assembly 750 may include an ion funnel 758 for capturing, concentrating, and directing the ions produced by the ionization beam and a gate valve 756 operable to open the processing assembly 750 to the sample chamber 702.
  • the ion funnel 758 may be operated at a predetermined frequency (e.g., 1-2MHz) and may be formed from a series of plates, with every other plate being 90 degrees out of phase. Further, a DC bias may be applied to the ion funnel 758 and equally divided down the plates to form a gradient.
  • the ion funnel 758 may direct the generated ions into a Quadrupole Ion Deflector (QID) 753 which turns the ions (e.g., by 90 degrees) and directs the ions to an Einzel stack 755.
  • the QID 753 may be tuned to reject the higher energy ions generated by the initial desorption/ablation and to direct only secondary post-desorption/ablation ions generated by the ionization beam into the Einzel stack 755.
  • the Einzel stack 755 may manipulate (e.g., shape) the ions and further direct the ions to one or more additional elements for further processing/shaping and ultimately to the mass spectrometer 770 for analysis.
  • each of the ion funnel 758 and the QID 753 may be arranged to lie along the axis 701 of the ablation beam, desorption beam, and micro-level imaging device field of view.
  • the foregoing implementation of the present disclosure generally illustrates the material removal beams and field of view being directed along axis 701 and that axis 701 is substantially vertical or otherwise perpendicular to a top surface of the sample 10, it should be understood that the concepts disclosed herein are not necessarily limited to such implementations.
  • the optical assembly 730 may be configured to direct material removal beams and the field of view of imaging device 738 along a common axis, that axis may be non-perpendicular to the top surface of the sample 10.
  • FIG. 13 a schematic illustration of an example computing system 1300 having one or more computing units that may implement various systems, processes, and methods discussed herein is provided.
  • the example computing system 1300 may correspond to, among other things, the computing device 192 of the analysis system 100 of FIG. 1 A. It will be appreciated that specific implementations of these devices may be of differing possible specific computing architectures not all of which are specifically discussed herein but will be understood by those of ordinary skill in the art.
  • the computer system 1300 may be a computing system capable of executing a computer program product to execute a computer process. Data and program files may be input to computer system 1300, which reads the files and executes the programs therein. Some of the elements of the computer system 1300 are shown in FIG. 13, including one or more hardware processors 1302, one or more data storage devices 1304, one or more memory devices 1306, and/or one or more ports 1308-1312. Additionally, other elements that will be recognized by those skilled in the art may be included in the computing system 1300 but are not explicitly depicted in FIG. 13 or discussed further herein. Various elements of the computer system 1300 may communicate with one another by way of one or more communication buses, point-to-point communication paths, or other communication means not explicitly depicted in FIG. 13.
  • the processor 1302 may include, for example, a central processing unit (CPU), a microprocessor, a microcontroller, a digital signal processor (DSP), and/or one or more internal levels of cache. There may be one or more processors 1302, such that the processor 1302 includes a single central-processing unit, or a plurality of processing units capable of executing instructions and performing operations in parallel with each other, commonly referred to as a parallel processing environment.
  • CPU central processing unit
  • DSP digital signal processor
  • the computer system 1300 may be a conventional computer, a distributed computer, or any other type of computer, such as one or more external computers made available via a cloud computing architecture.
  • the presently described technology is optionally implemented in software stored on data storage device(s) 1304, stored on memory device(s) 1306, and/or communicated via one or more of the ports 1308-1312, thereby transforming the computer system 1300 in FIG. 13 to a special purpose machine for implementing the operations described herein.
  • Examples of the computer system 1300 include personal computers, terminals, workstations, mobile phones, tablets, laptops, personal computers, multimedia consoles, gaming consoles, set top boxes, and the like.
  • One or more data storage devices 1304 may include any non-volatile data storage device capable of storing data generated or employed within the computing system 1300, such as computer executable instructions for performing a computer process, which may include instructions of both application programs and an operating system (OS) that manages the various components of the computing system 1300.
  • Data storage devices 1304 may include, without limitation, magnetic disk drives, optical disk drives, solid state drives (SSDs), flash drives, and the like.
  • Data storage devices 1304 may include removable data storage media, non-removable data storage media, and/or external storage devices made available via wired or wireless network architecture with such computer program products, including one or more database management products, web server products, application server products, and/or other additional software components.
  • One or more memory devices 1306 may include volatile memory (e.g., dynamic random access memory (DRAM), static random access memory (SRAM), etc.) and/or non-volatile memory (e.g., read-only memory (ROM), flash memory, etc.).
  • volatile memory e.g., dynamic random access memory (DRAM), static random access memory (SRAM), etc.
  • non-volatile memory e.g., read-only memory (ROM), flash memory, etc.
  • Machine-readable media may include any tangible non- transitory medium that is capable of storing or encoding instructions to perform any one or more of the operations of the present disclosure for execution by a machine or that is capable of storing or encoding data structures and/or modules utilized by or associated with such instructions.
  • Machine-readable media may include a single medium or multiple media (e.g., a centralized or distributed database, and/or associated caches and servers) that store the one or more executable instructions or data structures.
  • the computer system 1300 includes one or more ports, such as an input/output (I/O) port 1308, a communication port 1310, and a sub-systems port 1312, for communicating with other computing, network, or similar devices. It will be appreciated that the ports 1308-1312 may be combined or separate and that more or fewer ports may be included in the computer system 1300.
  • the I/O port 1308 may be connected to an I/O device, or other device, by which information is input to or output from the computing system 1300.
  • I/O devices may include, without limitation, one or more input devices, output devices, and/or environment transducer devices.
  • the input devices convert a human-generated signal, such as, human voice, physical movement, physical touch or pressure, and/or the like, into electrical signals as input data into the computing system 1300 via the I/O port 1308.
  • the output devices may convert electrical signals received from the computing system 1300 via the I/O port 1308 into signals that may be sensed as output by a human, such as sound, light, and/or touch.
  • the input device may be an alphanumeric input device, including alphanumeric and other keys for communicating information and/or command selections to the processor 1302 via the I/O port 1308.
  • the input device may be another type of user input device including, but not limited to: direction and selection control devices, such as a mouse, a trackball, cursor direction keys, a joystick, and/or a wheel; one or more sensors, such as an imaging device, a microphone, a positional sensor, an orientation sensor, a gravitational sensor, an inertial sensor, and/or an accelerometer; and/or a touch-sensitive display screen (“touchscreen”).
  • the output devices may include, without limitation, a display, a touchscreen, a speaker, a tactile and/or haptic output device, and/or the like. In some implementations, the input device and the output device may be the same device, for example, in the case of a touchscreen.
  • the environment transducer devices convert one form of energy or signal into another for input into or output from the computing system 1300 via the I/O port 1308. For example, an electrical signal generated within the computing system 1300 may be converted to another type of signal, and/or vice-versa.
  • the environment transducer devices sense characteristics or aspects of an environment local to or remote from the computing system 1300, such as, light, sound, temperature, pressure, magnetic field, electric field, chemical properties, physical movement, orientation, acceleration, gravity, and/or the like.
  • a communication port 1310 is connected to a network by way of which the computing system 1300 may receive network data useful in executing the methods and systems set out herein as well as transmitting information and network configuration changes determined thereby. Stated differently, the communication port 1310 connects the computing system 1300 to one or more communication interface devices configured to transmit and/or receive information between the computing system 1300 and other devices by way of one or more wired or wireless communication networks or connections.
  • Examples of such networks or connections include, without limitation, Universal Serial Bus (USB), Ethernet, WiFi, Bluetooth®, Near Field Communication (NFC), Long-Term Evolution (LTE), and so on.
  • USB Universal Serial Bus
  • NFC Near Field Communication
  • LTE Long-Term Evolution
  • One or more such communication interface devices may be utilized via communication port 1310 to communicate one or more other machines, either directly over a point-to-point communication path, over a wide area network (WAN) (e.g., the Internet), over a local area network (LAN), over a cellular (e.g., third generation (3G) or fourth generation (4G)) network, or over another communication means.
  • WAN wide area network
  • LAN local area network
  • cellular e.g., third generation (3G) or fourth generation (4G)
  • the communication port 1310 may communicate with an antenna for electromagnetic signal transmission and/or reception.
  • the computer system 1300 may include a sub-systems port 1312 for communicating with one or more sub-systems, to control an operation of the one or more sub-systems, and to exchange information between the computer system 1300 and the one or more sub-systems.
  • sub-systems include, without limitation, imaging systems, radar, LIDAR, motor controllers and systems, battery controllers, fuel cell or other energy storage systems or controls, light systems, navigation systems, environment controls, entertainment systems, and the like.
  • FIG. 13 The system set forth in FIG. 13 is but one possible example of a computer system that may employ or be configured in accordance with aspects of the present disclosure. It will be appreciated that other non-transitory tangible computer-readable storage media storing computer-executable instructions for implementing the presently disclosed technology on a computing system may be utilized.
  • joinder references are to be construed broadly and may include intermediate members between a connection of elements and relative movement between elements. As such, joinder references do not necessarily infer that two elements are directly connected and in fixed relation to each other.

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

La présente invention concerne une technique d'analyse d'échantillon qui consiste à capturer une image d'un emplacement d'analyse d'un échantillon disposé à l'intérieur d'une chambre d'échantillon à l'aide d'un dispositif d'imagerie ayant un champ de vision dans la chambre d'échantillon le long d'un axe. Suite à la capture de l'image, un faisceau d'élimination de matériau est dirigé le long de l'axe de l'échantillon pour désorber ou ablater un matériau échantillon de l'échantillon au niveau de l'emplacement d'analyse. Un faisceau d'ionisation est ensuite appliqué au matériau d'échantillon pour générer un matériau d'échantillon ionisé et le matériau d'échantillon ionisé est délivré à un spectromètre de masse pour analyse. Chacune des analyses organique et inorganique peut être conduite à un emplacement d'analyse donné par désorption et analyse d'un matériau organique et, par la suite, par ablation et analyse d'un matériau inorganique, les processus de désorption et d'ablation étant réalisés à l'aide de faisceaux délivrés le long du même axe que le champ de vision du dispositif d'imagerie.
EP21761749.7A 2020-02-27 2021-02-26 Spectrométrie de masse d'échantillons comprenant une désorption/ablation coaxiale et une capture d'image Pending EP4111189A4 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202062982473P 2020-02-27 2020-02-27
PCT/US2021/019823 WO2021173934A1 (fr) 2020-02-27 2021-02-26 Spectrométrie de masse d'échantillons comprenant une désorption/ablation coaxiale et une capture d'image

Publications (2)

Publication Number Publication Date
EP4111189A1 true EP4111189A1 (fr) 2023-01-04
EP4111189A4 EP4111189A4 (fr) 2024-06-19

Family

ID=77490517

Family Applications (1)

Application Number Title Priority Date Filing Date
EP21761749.7A Pending EP4111189A4 (fr) 2020-02-27 2021-02-26 Spectrométrie de masse d'échantillons comprenant une désorption/ablation coaxiale et une capture d'image

Country Status (2)

Country Link
EP (1) EP4111189A4 (fr)
WO (1) WO2021173934A1 (fr)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004051785B4 (de) * 2004-10-25 2008-04-24 Bruker Daltonik Gmbh Proteinprofile mit Luft-MALDI
US8207494B2 (en) * 2008-05-01 2012-06-26 Indiana University Research And Technology Corporation Laser ablation flowing atmospheric-pressure afterglow for ambient mass spectrometry
WO2010085897A1 (fr) * 2009-02-02 2010-08-05 Miller R J Dwayne Procédé et système de désorption ablative douce
CA2798182A1 (fr) * 2010-05-05 2011-11-10 George Washington University Procede de detection d'etats metaboliques par spectrometrie de masse par ionisation avec electro-vaporisation pour ablation laser
WO2018102467A1 (fr) * 2016-11-29 2018-06-07 Anasys Instruments Corporation Procédé et appareil d'imagerie et de spectroscopie photothermiques améliorées
US10262850B2 (en) * 2016-12-19 2019-04-16 Perkinelmer Health Sciences Canada, Inc. Inorganic and organic mass spectrometry systems and methods of using them
DE102016124889B4 (de) * 2016-12-20 2019-06-06 Bruker Daltonik Gmbh Massenspektrometer mit Lasersystem zur Erzeugung von Photonen verschiedener Energie
US11164734B2 (en) * 2019-04-11 2021-11-02 Exum Instruments Laser desorption, ablation, and ionization system for mass spectrometry analysis of samples including organic and inorganic materials

Also Published As

Publication number Publication date
EP4111189A4 (fr) 2024-06-19
WO2021173934A1 (fr) 2021-09-02

Similar Documents

Publication Publication Date Title
US11769656B2 (en) Laser desorption, ablation, and ionization system for mass spectrometry analysis of samples including organic and inorganic materials
WO2017183086A1 (fr) Spectromètre de masse
JP2010062152A5 (fr)
Cui et al. Depth profiling and imaging capabilities of an ultrashort pulse laser ablation time of flight mass spectrometer
Paardekooper et al. Laser desorption time-of-flight mass spectrometry of ultraviolet photo-processed ices
CN116329769B (zh) 一种激光剥蚀激光电离装置、方法及质谱仪
WO2009013481A2 (fr) Procédé et appareil d'analyse d'échantillons
WO2017196434A1 (fr) Système de spectroscopie électronique
CN107818904A (zh) 复合射束装置
Teschmit et al. Characterizing and optimizing a laser-desorption molecular beam source
Izzo et al. A laser ablation source for offline ion production at LEBIT
US20210183632A1 (en) Mass spectrometry of samples including coaxial desorption/ablation and image capture
Jiang et al. High mass resolution multireflection time-of-Flight secondary ion mass spectrometer
EP4111189A1 (fr) Spectrométrie de masse d'échantillons comprenant une désorption/ablation coaxiale et une capture d'image
Sangely et al. Secondary ion mass spectrometry
Williams et al. Advances in trace element solid sample analysis: laser ablation laser ionization TOF mass spectrometry (LALI-TOF-MS)
JP2015502645A (ja) 質量分析法における、又は質量分析法に関連する改良
US20240055247A1 (en) Off-axis ion extraction and shield glass assemblies for sample analysis systems
WO2017075470A1 (fr) Spectromètres de masse à électrodes segmentées et procédés associés
CN202454525U (zh) 复合离子源装置及质谱仪
Rohkamm et al. Characterization of an RF-excited broad beam ion source operated with a mixture of CHF3 and O2
De Haeck Mass spectrometric developments and a study of lithium doped silicon and germanium clusters
Cui et al. The application of ultrafast laser pulses to laser desorption mass spectrometry
Ashrafkhani et al. Optimizing Ion Optical Design for Laser Ablation Source in Mass Spectrometry
Franzmann A new tool for ultra-trace analysis of radionuclides: setup, optimization and characterization of the resonant laser-SNMS system for IRS Hannover

Legal Events

Date Code Title Description
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE

PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20220909

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DAV Request for validation of the european patent (deleted)
DAX Request for extension of the european patent (deleted)
REG Reference to a national code

Ref country code: DE

Ref legal event code: R079

Free format text: PREVIOUS MAIN CLASS: G01N0030720000

Ipc: H01J0049040000

RIC1 Information provided on ipc code assigned before grant

Ipc: H01J 49/06 20060101ALI20240220BHEP

Ipc: H01J 49/16 20060101ALI20240220BHEP

Ipc: H01J 49/04 20060101AFI20240220BHEP

A4 Supplementary search report drawn up and despatched

Effective date: 20240517

RIC1 Information provided on ipc code assigned before grant

Ipc: H01J 49/06 20060101ALI20240513BHEP

Ipc: H01J 49/16 20060101ALI20240513BHEP

Ipc: H01J 49/04 20060101AFI20240513BHEP