EP4108471A1 - Élément de sécurité doté d'un substrat et d'au moins un agencement de micro-image - Google Patents

Élément de sécurité doté d'un substrat et d'au moins un agencement de micro-image Download PDF

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Publication number
EP4108471A1
EP4108471A1 EP21181145.0A EP21181145A EP4108471A1 EP 4108471 A1 EP4108471 A1 EP 4108471A1 EP 21181145 A EP21181145 A EP 21181145A EP 4108471 A1 EP4108471 A1 EP 4108471A1
Authority
EP
European Patent Office
Prior art keywords
layer
oxide
color
security element
focusing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21181145.0A
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German (de)
English (en)
Inventor
Stefan TRAßL
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hueck Folien GmbH
Original Assignee
Hueck Folien GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hueck Folien GmbH filed Critical Hueck Folien GmbH
Priority to EP21181145.0A priority Critical patent/EP4108471A1/fr
Priority to AU2022296846A priority patent/AU2022296846A1/en
Priority to CA3222939A priority patent/CA3222939A1/fr
Priority to PCT/EP2022/067190 priority patent/WO2022268962A1/fr
Publication of EP4108471A1 publication Critical patent/EP4108471A1/fr
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/364—Liquid crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials

Definitions

  • the invention relates to a security element with a substrate and at least one microimage arrangement and at least one focusing layer which interacts with the microimage arrangement and has an arrangement of focusing elements, the at least one microimage arrangement comprising at least one relief structure, the microimage arrangement producing a visible optical effect when viewed through the focusing layer.
  • Such security elements are usually used to increase the counterfeit security of securities or security papers, such as banknotes, identity cards, credit cards, ATM cards, tickets, etc.
  • Security elements of the type mentioned above are from the WO2011116425A1 and the WO2016016638A1 known.
  • a viewer looking through the focusing layer can view an image arrangement located in a focal length range of the focusing layer.
  • the object of the present invention is to increase the counterfeit security of the known security elements.
  • the at least one microimage arrangement comprises at least one color-shifting layer arranged on the at least one relief structure and having a color-shift effect recognizable through the focusing layer.
  • the solution according to the invention makes it possible for the microimage arrangement to only become recognizable in interaction with the focusing elements and without the focusing elements only the color-shifting layer would be perceptible as a uniform layer with a uniform color impression.
  • the invention makes it possible to create a security element that is very difficult to counterfeit.
  • the solution according to the invention also enables a high degree of customization, or a large variety of design options. This is accompanied by a significant increase in protection against counterfeiting.
  • a layer is applied to something
  • the phrase "a layer is applied to something" is to be understood in such a way that the layer can be applied directly, or that there is another or there may be several intermediate layers.
  • one or more intermediate layers can be arranged between the layers described in this document. It is therefore not absolutely necessary for the layers described to contact one another.
  • the term layer in this document is to be understood in such a way that a layer can be made up of only a single layer or also of a number of partial layers or partial layers.
  • the substrate preferably has a thickness of between 5-700 ⁇ m, preferably 5-200 ⁇ m, particularly preferably 5-125 ⁇ m, in particular 10-75 ⁇ m.
  • the focusing elements are designed as microlenses, in particular as microlenses embossed in an embossing lacquer layer.
  • the embossing lacquer layer, with the microlenses formed therein can have a thickness of, for example, 0.1 ⁇ m to 300 ⁇ m, in particular from 0.1 ⁇ m to 50 ⁇ m.
  • the focusing elements designed as microlenses can also be made of a thermoplastic material.
  • a so-called reflow method can be used here. This technique comprises the steps of: defining an insular structure in or with a thermoplastic material such as a resin, e.g. by photolithography in a photosensitive resin-like photoresist or applying the material to a substrate, e.g. by printing, and then heating the material. In doing so, surface tension pulls the island of material into a spherical cap with a volume equal to that of the original island before melting, forming a microlens.
  • the relief structure of the microimage arrangement is embossed in an embossing lacquer layer.
  • the embossing lacquer layer with the relief structures formed therein can have a thickness of, for example, 0.1 ⁇ m to 300 ⁇ m, in particular from 0.1 ⁇ m to 50 ⁇ m.
  • the structures of the microimage arrangement can also be produced by means of a so-called “microcontact printing” method. Micro contact printing is a transfer process in which an already cured and structured UV coating is transferred. A printing tool with indentations that are filled with UV varnish, similar to that used in gravure cylinders, can be used here.
  • the UV coating is hardened and the filled indentation is transferred to the foil.
  • the microimage arrangement is shown enlarged when viewed through the arrangement of focusing elements of the focusing layer.
  • a microimage it is not necessary for a microimage to lie under each lens, as can be the case with moiré lenses, for example. It is also possible for only parts of an image to lie under a lens or a focusing element and, due to the magnification and the interaction of the lenses then constructs a macroscopic image.
  • the focusing elements do not necessarily have to lead to an enlargement. It is also possible to use only the refraction of light from the focusing elements to display an image sequence by tilting, in which case an image sequence can be defined by nested microimages. In this case, the focusing elements and the microimage arrangement can produce a lenticular raster image ("lenticular raster image").
  • a very good, in particular color, contrast of the microimage arrangement and a significantly improved perceptibility of the same can be achieved in that the color-shifting layer, in particular its thickness, is influenced by the structures of the microimage arrangements, in particular the spacer layer in the case of thin-film structures, resulting in a color change in the color-shifting layer varies precisely with the structure.
  • the microimage arrangement can also be formed in a liquid crystal layer.
  • the liquid crystal layer can be applied to the substrate and the microimage arrangement can be embossed into the liquid crystal layer.
  • a layer that enhances a color shift effect can be applied to the liquid crystal layer.
  • the color effect-enhancing layer can be used to achieve an intensification of an effect caused by the color-shifting effect.
  • the layer that reinforces the color shift effect can be, for example, an opaque layer, in particular a layer of dark or black color, a metallic layer, etc.
  • a layer thickness of the at least one color-shifting layer varies, with the layer thickness of the at least one color-shifting layer being different from the layer thickness on at least a first surface section of the at least one relief structure that is closer to the substrate than a second surface section the color-shifting layer on the at least one second surface section of the relief.
  • the layer thickness of the color-shifting layer is greater on the first surface section than in the second surface section or vice versa.
  • an optical impression produced by the color-shifting layer and at least one first surface section is different from an optical impression produced by the color-shifting layer and the second surface section, with the optical impression preferably being a color impression is.
  • the at least one focusing layer is arranged on a first side of the substrate and the at least one microimage array is arranged on a side of the substrate opposite the first side, so that the substrate is located between the at least one microimage array and the at least one Focusing layer is arranged.
  • the at least one image arrangement and the at least one focusing layer are arranged on the same side of the substrate and the at least one microimage arrangement lies between the substrate and the focusing layer.
  • the at least one color-shifting layer has a color-shifting thin-layer structure or color-shifting pigments, in particular interference pigments or at least one liquid crystal layer, in particular a liquid crystal layer and at least one layer that enhances the color-shift effect.
  • the color-shifting effect can be intensified by the layer that intensifies the color effect, for example when using color-shifting pigments or a liquid crystal layer. From the user's line of sight, the layer that reinforces the color effect lies behind the color-changing pigments or the liquid crystal layer.
  • the layer that reinforces the color shift effect can be, for example, an opaque layer, in particular a layer of dark or black color, a metallic layer, etc.
  • An example of a color shift effect-enhancing layer is, for example, the black coating, as is the subject of EP1522606B1 is.
  • the color-shifting thin-film structure can have at least one absorber layer and at least one spacer layer made of a dielectric material, the absorber layer of the color-shifting thin-film structure preferably being closer to the focusing layer than the spacer layer.
  • the thin-layer structure advantageously has at least one reflection layer, with the spacer layer being arranged between the reflection layer and the absorber layer.
  • the at least one absorber layer can include at least one metallic material, in particular selected from the group consisting of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and/or alloys of these materials, or at least be made of one of these materials.
  • the at least one spacer layer can contain at least one dielectric material with a low refractive index with a refractive index of less than or equal to 1.65, in particular selected from the group consisting of aluminum oxide (Al 2 O 3 ), metal fluorides, for example magnesium fluoride (MgF 2 ), Aluminum fluoride (AlF 3 ), silicon oxide (SIO x ), silicon dioxide (SiO 2 ), cerium fluoride (CeF 3 ), sodium aluminum fluoride (e.g.
  • Na 3 AlF 6 or Na 5 Al 3 F 14 neodymium fluoride (NdF 3 ), Lanthanum fluoride (LaF 3 ), samarium fluoride (SmF 3 ), barium fluoride (BaF 2 ), calcium fluoride (CaF 2 ), lithium fluoride (LiF), low-index organic monomers and/or low-index organic polymers or at least one high-index dielectric material with a refractive index greater than 1, 65, in particular selected from the group zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO 2 ), carbon (C), indium oxide (In 2 O 3 ), indium tin oxide (ITO), tantalum pentoxide (Ta 2 O 5 ), cerium oxide (CeO 2 ), yttria (Y 2 O 3 ), europium oxide (Eu 2 O 3 ), iron oxides such as ferrous oxide (Fe 3 O 4 ) and ferric oxide (Fe
  • the relief structure of the microimage arrangement can be formed in the spacer layer, in particular embossed into the spacer layer. It is of particular advantage here if the spacer layer is formed from a polymeric material.
  • the at least one reflection layer can be at least one metallic material, in particular selected from the group consisting of silver, copper, aluminum, gold, platinum, niobium, tin, or nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt -Nickel alloys or at least one high-index dielectric material with a refractive index greater than 1.65, in particular selected from the group consisting of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO 2 ), carbon (C), indium oxide (In 2 O 3 ), indium tin oxide (ITO), tantalum pentoxide (Ta 2 O 5 ), cerium oxide (CeO 2 ), yttrium oxide (Y 2 O 3 ), europium oxide (Eu 2 O 3 ), iron oxides such as iron(II ,III) oxide (Fe 3 O 4 ) and iron(III) oxide (Fe 2 O 3 ), haf
  • the substrate is made of plastic, in particular of a translucent and/or thermoplastic material, the substrate (2) preferably being at least one of the materials from the group polyimide (PI), polypropylene (PP), monoaxial oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone (PEEK) polyetherketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryletherketone (PAEK), polyethylene naphthalate ( PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymers (COC), polyoxymethylene (POM), acrylonitrile butadiene styrene (ABS), Polyvinyl chloride (PVC), ethylene ethylene (PE), poly
  • a microimage represented by the microimage arrangement appears as a light-dark contrast in transmitted light viewed from the side on which the focusing layer lies.
  • the security element is equipped with machine-readable features, the machine-readable features being, in particular, magnetic codes, electrically conductive layers, and substances that absorb and/or re-emit electromagnetic waves.
  • the security element has additional layers, which additional layers include in particular protective lacquers, heat-sealing lacquers, adhesives, primers and/or foils.
  • All information on value ranges in the present description is to be understood in such a way that it also includes any and all sub-ranges, e.g. the information 1 to 10 is to be understood in such a way that all sub-ranges, starting from the lower limit 1 and the upper limit 10, are also included , i.e. all subranges start with a lower limit of 1 or greater and end with an upper limit of 10 or less, e.g. 1 to 1.7, or 3.2 to 8.1, or 5.5 to 10.
  • each of the layers described below can therefore also comprise a plurality of layers, preferably connected to one another or adhering to one another.
  • the Figures 1 to 3 at least partially comprehensively described.
  • a security element 1 has a substrate 2 .
  • the substrate 2 can be made of plastic, in particular a translucent and/or thermoplastic material.
  • the substrate 2 preferably comprises one of the materials from the group polyimide (PI), polypropylene (PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone, (PEEK) Polyetherketone (PEK), Polyethylenimide (PEI), Polysulfone (PSU), Polyaryletherketone (PAEK), Polyethylene naphthalate (PEN), Liquid Crystal Polymers (LCP), Polyester, Polybutylene terephthalate (PBT), Polyethylene terephthalate (PET), Polyamide (PA), Polycarbonate ( PC), cycloolefin copolymers (COC), polyoxymethylene (POM), acrylonitrile butadiene styrene (ABS), polyvinyl chloride (PVC) ethylene tetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE
  • a microimage arrangement 3 and at least one focusing layer 4 interacting with the microimage arrangement 3 are located on the substrate 2.
  • the focusing layer 4 comprises an arrangement of focusing elements 5.
  • the focusing elements 5 are preferably embodied as microlenses. Focusing elements 5 are preferably implemented as microlenses formed in an embossing lacquer layer located on substrate 2 .
  • the embossing lacquer layer with the microlenses of the focusing layer 5 formed therein can preferably have a thickness of 0.1 ⁇ m to 300 ⁇ m, in particular from 0.1 ⁇ m to 50 ⁇ m.
  • the focusing elements 5 designed as microlenses can also be made of a thermoplastic material.
  • a so-called reflow method can be used here. This technique comprises the steps of: defining an insular structure in or with a thermoplastic material such as a resin, e.g. by photolithography in a photosensitive resin-like photoresist or applying the material to a substrate, e.g. by printing, and then heating the material.
  • a thermoplastic material such as a resin
  • a substrate e.g. by printing
  • surface tension pulls the island of material into a spherical cap with a volume equal to that of the original island before melting, thereby forming a microlens.
  • a microimage it is not necessary for a microimage to be located under each lens, as can be the case with moiré lenses, for example, but it is also possible for only parts of an image to be located under a lens or a focusing element 5 and due to the magnification and the interaction of the lenses then constructs a macroscopic image.
  • the focusing elements do not necessarily have to lead to an enlargement. It is also possible to use only the refraction of light from the focusing elements to display an image sequence by tilting, in which case an image sequence can be defined by nested microimages. In this case, the focusing elements 5 and the microimage arrangement 3 can generate a lenticular raster image ("lenticular raster image").
  • the microimage arrangement 3 comprises a relief structure 6, which can also preferably be embossed in an embossing lacquer layer located on the substrate 2.
  • the embossing lacquer layer with the relief structure 6 of the microimage arrangement 3 formed therein can preferably have a thickness of 0.1 ⁇ m to 300 ⁇ m, in particular from 0.18 ⁇ m to 50 ⁇ m.
  • the relief structure 6 of the microimage arrangement 3 can also be produced by means of a so-called “microcontact printing” method.
  • Micro-contact printing is understood to mean, in particular, a transfer process in which an already cured and structured UV lacquer is transferred.
  • a printing tool with indentations that are filled with UV varnish, similar to the gravure cylinder, can be used here. When the cylinder comes into contact with a foil, for example the substrate, it hardens and the filled depression is transferred to the foil.
  • micro-image arrangement has a height profile.
  • the relief structures 6 of the microimage arrangement 3 can, for example
  • the relief structure 6 of the microimage arrangement 3 can also be formed in a liquid crystal layer.
  • the liquid crystal layer can be applied to the substrate 2 and the microimage arrangement 3 can be embossed into the liquid crystal layer.
  • the relief structure 6 of the microimage arrangement 3 can also be introduced, in particular embossed, into a spacer layer 12 of a thin-film element 10 .
  • the microimage arrangement 3 When producing the microimage arrangement 3, it is particularly important that the microimage arrangement 3 has a corresponding relief structure 6 and thus a height profile.
  • a layer that enhances a color shift effect can also be applied.
  • the color-shifting effect can be intensified by the layer that intensifies the color effect.
  • the layer that reinforces the color shift effect can be, for example, an opaque layer, in particular a layer of dark or black color, a metallic layer, etc.
  • the layer sequence focusing layer 4—substrate 2—liquid crystal layer—absorber or layer that reinforces the color shift effect can result.
  • the microimage arrangement 3 When viewed through the focusing layer 4, the microimage arrangement 3 produces a visible optical effect, for example in the form of an image with a color impression dependent on the viewing angle. Furthermore, the microimage arrangement 3 comprises a color-shifting layer 7 which is arranged on the at least one relief structure 6 and has a color-shifting effect which can be seen through the focusing layer 4 .
  • a distance between the focusing elements 5 and the microimage arrangement 3 can essentially correspond to the focal length of the focusing elements 5 or can be larger or smaller.
  • the microimage arrangement 3 is preferably shown enlarged when viewed through the arrangement of focusing elements 5 of the focusing layer 4 . If the relief structure 6 represents a pattern, character, motif, etc. that is periodically repeated in the microimage arrangement and if the focusing elements 5 have a similar repetition period, then a each of which is an enlargement of the pattern, character or motif.
  • a layer thickness of the color-shifting layer 7 can vary.
  • the layer thickness of the color-shifting layer on a first surface section 8 of the relief structure 6 is different from the layer thickness on a second surface section 9 of the relief structure 6.
  • a distance between the surface section 8 of the relief structure 6 and the substrate 2 is smaller than a distance between the surface section 9 of the relief structure 6 and the substrate 2.
  • the layer thickness of the color-shifting layer 7 can be greater, for example, on the first surface section 8 than in the second surface section 9, or vice versa.
  • known washing methods can be used, in addition to other methods, in which the application of washing colors and the application of material to build up layer 7 followed by washing steps are carried out in succession.
  • the application of material to build up the layer 7 can also take place, for example, by means of PVD methods, spraying, printing, etc.
  • a first optical impression produced by the color-shifting layer 7 and the first surface section 8 appears differently than a second optical impression produced by the color-shifting layer 7 and the second surface section 9.
  • the first and the second visual impression preferably represent a color or brightness impression.
  • a spacer layer 12 in particular can vary in thickness, as a result of which locally different color impressions can be achieved, for example.
  • the focusing layer 4 can be arranged on a first side of the substrate 2 and the microimage arrangement 3 can be arranged on a side of the substrate 2 opposite the first side.
  • the substrate 2 lies between the microimage arrangement 3 and the focusing layer 4.
  • the microimage arrangement 3 passes through the focusing layer and through the substrate 2, which in this case is transparent in appearance.
  • the at least one microimage arrangement 3 and the focusing layer 4 may be arranged on the same side of the substrate 2 and for the at least a microimage array 3 lies between the substrate and the focusing layer 4, as is shown in 3 is shown.
  • the substrate 2 it is not necessary for the substrate 2 to be transparent or to allow a view of a layer located behind it.
  • the color-shifting layer 7 can contain color-shifting pigments, in particular interference pigments, at least one liquid crystal layer, in particular a liquid crystal layer, and at least one layer that enhances the color-shift effect, or, as in 2 shown, have a color-shifting thin-layer structure 10 .
  • the color-shifting effect can be intensified by the layer that intensifies the color effect, for example when using color-shifting pigments or a liquid crystal layer. From the user's line of sight, the layer that reinforces the color effect lies behind the color-changing pigments or the liquid crystal layer.
  • the layer that reinforces the color shift effect can be, for example, an opaque layer, in particular a layer of dark or black color, a metallic layer, etc.
  • the following layer sequence can result: Focusing layer 4 - substrate 2 - relief structures 6 - liquid crystal layer - absorber or the color shift effect-enhancing layer.
  • the liquid crystal layer for example in the form of a liquid crystal lacquer, can be applied directly to the relief structures 6, for example embossed in an embossing lacquer or otherwise produced as described above.
  • the embossing or the relief structures 6 serve on the one hand to align the liquid crystals and on the other hand to achieve the desired effect here.
  • the absorber layer 11 of the color-shifting thin-layer structure 10 is preferably closer to the focusing layer 4 than the spacer layer 12 in order to be able to clearly recognize the color-shift effect when viewed through the focusing layer 4.
  • the absorber layer 11 can be a metallic material, in particular selected from the group consisting of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and/or alloys of these materials or be made from one or more of these materials.
  • the spacer layer 12 can be a low-index dielectric material with a refractive index of less than or equal to 1.65, in particular selected from the group consisting of aluminum oxide (Al 2 O 3 ), metal fluorides, for example magnesium fluoride (MgF 2 ), aluminum fluoride (AlF 3 ), silicon oxide (SIO x ), silicon dioxide (SiO 2 ), cerium fluoride (CeF 3 ), sodium aluminum fluoride (e.g.
  • Al 2 O 3 aluminum oxide
  • metal fluorides for example magnesium fluoride (MgF 2 ), aluminum fluoride (AlF 3 ), silicon oxide (SIO x ), silicon dioxide (SiO 2 ), cerium fluoride (CeF 3 ), sodium aluminum fluoride (e.g.
  • Na 3 AlF 6 or Na 5 Al 3 F 14 neodymium fluoride (NdF 3 ), lanthanum fluoride (LaF 3 ), samarium fluoride (SmF 3 )
  • Barium fluoride (BaF 2 ) calcium fluoride (CaF 2 ), lithium fluoride (LiF), low-index organic monomers and/or low-index organic polymers or at least one high-index dielectric material with a refractive index greater than 1.65, in particular selected from the group of zinc sulfide (ZnS ), zinc oxide (ZnO), titanium dioxide (TiO 2 ), carbon (C), indium oxide (In 2 O 3 ), indium tin oxide (ITO), tantalum pentoxide (Ta 2 O 5 ), cerium oxide (CeO 2 ), yttrium oxide (Y 2 O 3 ), europium oxide (Eu 2 O 3 ), iron oxides such as iron(II,III) oxide (Fe 3 O
  • the reflection layer 13 can be a metallic material, in particular selected from the group consisting of silver, copper, aluminum, gold, platinum, niobium, tin, or nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel Alloys or at least one high-index dielectric material with a refractive index greater than 1.65, in particular selected from the group consisting of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO 2 ), carbon (C), indium oxide (In 2 O 3 ) , indium tin oxide (ITO), tantalum pentoxide (Ta 2 O 5 ), cerium oxide (CeO 2 ), yttrium oxide (Y 2 O 3 ), europium oxide (Eu 2 O 3 ), iron oxides such as iron(II,III) oxide (Fe 3 O 4 ) and ferric oxide (Fe 2 O 3 ), hafnium nit
  • La 2 O 3 magnesium oxide (MgO), neodymium oxide (Nd 2 O 3 ), praseodymium oxide (Pr 6 O 11 ), samarium oxide (Sm 2 O 3 ), antimony trioxide (Sb 2 O 3 ), silicon carbide (SiC), silicon nitride (Si 3 N 4 ), silicon monoxide (SiO), selenium trioxide (Se 2 O 3 ), tin oxide (SnO 2 ), tungsten trioxide (WO 3 ), high-index organic monomers and/or high-index organic polymers or made from one or more of these materials be.
  • the relief structure 6 of the microimage arrangement 3 can also be formed in the spacer layer 12 , in particular embossed into the spacer layer 12 .
  • the spacer layer 12 is formed from a polymeric material.
  • focusing layer 4 substrate 2—absorber layer 11—spacer layer 12 with relief structures 6 formed therein—reflection layer 13.
  • the relief structure 6 can be embossed, for example, into the spacer layer 12 and then, if necessary. the reflection layer 13 can be applied to the spacer layer 12.
  • the layer structure shown can be achieved, for example, by applying the absorber layer 11 in a first step. Then the spacer layer 12 until it has a predetermined layer thickness in a region of the surface section 8 . Washing paint can then be applied to the spacer layer 12 in the area of the surface section 8 . In the area of the surface section 9, however, no wash color is applied. Additional material for the spacer layer 12 is then applied. By washing out the wash color, the additional applied spacer layer 12 remains only in the area of the surface section 9. In the area of the surface section 8, the additional material for the spacer layer is removed together with the wash color.
  • the method mentioned above in this paragraph is only to be understood as an example of a possibility of producing different layer thicknesses of the color-shifting layer 7 . Of course, other methods such as PVD methods, spraying methods, etc. can also be used as an alternative or in addition to producing different layer thicknesses of the color-shifting layer 7 .
  • the thin-layer structure 10 can appear color-shifting in incident light and appear more opaque in transmitted light.
  • the reflection layer 13 follows the embossed relief structure 6 and is locally of different thickness depending on the relief structure 6 . Therefore, the reflective layer 13 is made thinner in places than in other places corresponding to the embossing.
  • a contrast can then be seen from the side of the focusing layer 4 and/or from a side of the security element 1 opposite the focusing layer 4 between locations of the reflection layer 13 with a smaller layer thickness and locations of the reflection layer 13 with a comparatively larger layer thickness and thus a contrast produced by the microimage arrangement 2 micrograph. In transmitted light, however, this micrograph is not seen as a color shift, but as a light-dark contrast.
  • the reinforcing layer for example a black metallization, follows the embossed relief structure 6 and can have locally different layer thicknesses corresponding to the embossed relief structure 6, so that the same effect as described in the paragraph above in connection with the thin-layer structure 10 , could be generated.
  • the relief structures 6 of the microimage arrangement 3, for example embossing can be present in the form of a motif.
  • the security element can be equipped with machine-readable features, the machine-readable features being, in particular, magnetic codes, electrically conductive layers, substances that absorb and/or re-emit electromagnetic waves.
  • the security element has additional layers, which additional layers include in particular protective lacquers, heat-sealing lacquers, adhesives, primers and/or foils.
  • additional layers include in particular protective lacquers, heat-sealing lacquers, adhesives, primers and/or foils.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Credit Cards Or The Like (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
EP21181145.0A 2021-06-23 2021-06-23 Élément de sécurité doté d'un substrat et d'au moins un agencement de micro-image Pending EP4108471A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP21181145.0A EP4108471A1 (fr) 2021-06-23 2021-06-23 Élément de sécurité doté d'un substrat et d'au moins un agencement de micro-image
AU2022296846A AU2022296846A1 (en) 2021-06-23 2022-06-23 Securing element with a substrate and at least one micro-image assembly
CA3222939A CA3222939A1 (fr) 2021-06-23 2022-06-23 Element de securite comprenant un substrat et au moins un ensemble micro-image
PCT/EP2022/067190 WO2022268962A1 (fr) 2021-06-23 2022-06-23 Élément de sécurité comprenant un substrat et au moins un ensemble micro-image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP21181145.0A EP4108471A1 (fr) 2021-06-23 2021-06-23 Élément de sécurité doté d'un substrat et d'au moins un agencement de micro-image

Publications (1)

Publication Number Publication Date
EP4108471A1 true EP4108471A1 (fr) 2022-12-28

Family

ID=76600999

Family Applications (1)

Application Number Title Priority Date Filing Date
EP21181145.0A Pending EP4108471A1 (fr) 2021-06-23 2021-06-23 Élément de sécurité doté d'un substrat et d'au moins un agencement de micro-image

Country Status (4)

Country Link
EP (1) EP4108471A1 (fr)
AU (1) AU2022296846A1 (fr)
CA (1) CA3222939A1 (fr)
WO (1) WO2022268962A1 (fr)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1522606B1 (fr) 2003-10-10 2009-12-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Procédé pour revêter d'un materiau en forme de bande avec oxyde noir d'aluminium
WO2011116425A1 (fr) 2010-03-24 2011-09-29 Securency International Pty Ltd Document de sécurité à dispositif de sécurité intégré et procédé de fabrication
DE102012015900A1 (de) 2012-08-10 2014-03-06 Giesecke & Devrient Gmbh Sicherheitselement mit farbeffekterzeugendem Gitter
FR3002183A1 (fr) * 2013-02-19 2014-08-22 Innovia Security Pty Ltd Dispositifs de securite comprenant des zones hautement reflechissantes et procedes de fabrication
US20150198749A1 (en) * 2012-08-03 2015-07-16 Suzhou Svg Optronics Technology Co., Ltd Colored, dynamic, and amplified safety film
WO2016016638A1 (fr) 2014-07-30 2016-02-04 De La Rue International Limited Dispositif de sécurité et son procédé de fabrication
CN205416817U (zh) * 2015-12-01 2016-08-03 中钞特种防伪科技有限公司 一种光学防伪元件及使用该光学防伪元件的光学防伪产品

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1522606B1 (fr) 2003-10-10 2009-12-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Procédé pour revêter d'un materiau en forme de bande avec oxyde noir d'aluminium
WO2011116425A1 (fr) 2010-03-24 2011-09-29 Securency International Pty Ltd Document de sécurité à dispositif de sécurité intégré et procédé de fabrication
US20150198749A1 (en) * 2012-08-03 2015-07-16 Suzhou Svg Optronics Technology Co., Ltd Colored, dynamic, and amplified safety film
DE102012015900A1 (de) 2012-08-10 2014-03-06 Giesecke & Devrient Gmbh Sicherheitselement mit farbeffekterzeugendem Gitter
FR3002183A1 (fr) * 2013-02-19 2014-08-22 Innovia Security Pty Ltd Dispositifs de securite comprenant des zones hautement reflechissantes et procedes de fabrication
WO2016016638A1 (fr) 2014-07-30 2016-02-04 De La Rue International Limited Dispositif de sécurité et son procédé de fabrication
CN205416817U (zh) * 2015-12-01 2016-08-03 中钞特种防伪科技有限公司 一种光学防伪元件及使用该光学防伪元件的光学防伪产品

Also Published As

Publication number Publication date
WO2022268962A1 (fr) 2022-12-29
CA3222939A1 (fr) 2022-12-29
AU2022296846A1 (en) 2024-02-01

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