Classifications

• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
  • H05H1/00—Generating plasma; Handling plasma
  • H05H1/24—Generating plasma
  • H05H1/48—Generating plasma using an arc
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01D—SEPARATION
  • B01D21/00—Separation of suspended solid particles from liquids by sedimentation
  • B01D21/0015—Controlling the inclination of settling devices
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01D—SEPARATION
  • B01D21/00—Separation of suspended solid particles from liquids by sedimentation
  • B01D21/0018—Separation of suspended solid particles from liquids by sedimentation provided with a pump mounted in or on a settling tank
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01D—SEPARATION
  • B01D21/00—Separation of suspended solid particles from liquids by sedimentation
  • B01D21/10—Settling tanks with multiple outlets for the separated liquids
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01D—SEPARATION
  • B01D21/00—Separation of suspended solid particles from liquids by sedimentation
  • B01D21/24—Feed or discharge mechanisms for settling tanks
  • B01D21/2444—Discharge mechanisms for the classified liquid
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01D—SEPARATION
  • B01D21/00—Separation of suspended solid particles from liquids by sedimentation
  • B01D21/24—Feed or discharge mechanisms for settling tanks
  • B01D21/245—Discharge mechanisms for the sediments
  • B01D21/2461—Positive-displacement pumps; Screw feeders; Trough conveyors
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
  • H05H1/00—Generating plasma; Handling plasma
  • H05H1/24—Generating plasma
  • H05H1/26—Plasma torches
  • H05H1/32—Plasma torches using an arc
  • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
  • H05H1/00—Generating plasma; Handling plasma
  • H05H1/54—Plasma accelerators

Definitions

• the present invention consists of a device for the plasma-chemical treatment of fractionated material at a pressure close to or above atmospheric pressure by non-isothermal plasma flow and a process obtained by this device.
• Plasma technology is essential for its purpose of carrying out high energy density treatments. This is its essential purpose and it is unmatched in it. This allows it to create new qualities such as the welding of thermo-refractory metals, the activation of surfaces increasing adhesion to the bonding, the deposition of protective films on delicate surfaces, the stripping of thin layers, etc. (see “Atmospheric plasma technology in industry, 1980 - 2015” Wikipedia).
• the boiler can be started from room temperature, operating at intermediate loads up to 10%, for example, of the nominal load of the power station, to "burn” any kind of fuel ranging from anthracite, passing through all varieties of hard coal and lignite, to biomass.
• the invention WO 2011/138525 A1 describes the PIT generator to be used.
• the invention WO 2014 / 076-381 describes the PIT reactor.
• the conditions for producing the PIT generator as described in WO 2011/138525 A1 and those for producing the PIT reactor as described in WO 2014 / 076-381, are obviously necessary. But, nevertheless, if we refer only to these two inventions, the process will not be optimal, or even not feasible.
• the parameters of the PIT generator and of the reactor are chosen in such a way that the plasma is overheated because the characteristics of the electric pulses (in particular, their duration, the average intensity of the electric current, the average value of the voltage between the electrodes) are not optimal, or even that the plasmochemical process is not carried out or is carried out badly because, for example, the contact time of the reactive agents with the plasma flow is not sufficient or, on the contrary, is excessive. It can also happen that the particles generated in the PIT plasma do not reach the surface to be treated given the thickness of the boundary layer which surrounds the particle to be treated. In general, the conditions described in the cited inventions are not sufficient, sometimes even contradictory to those for the optimum performance of the targeted plasmochemical process.
• One of the aims of the present invention is to introduce a PIT-PTTM process and the corresponding PIT-PTTM reactor, capable of optimizing the target plasmochemical process, thanks to the intensification of the turbulent nature of the PIT plasma generated, d '' to determine the intrinsic properties thereof and to describe the conditions of production and operation thereof, in particular in the field of the treatment of fractionated materials, for example powders.
• the two inventions mentioned do not allow most of the plasmochemical treatments to be carried out because the parameters of the processes and devices mentioned are not in accordance with the characteristics of the materials to be treated and the intrinsic properties of the processes. technological targets. If we take as an example the particular case of the torrefaction of biomass particles moving in a flow of support gas and that the generating power of the plasma pulses is not matched with the flow rate of the material to be treated, its properties, the geometric characteristics of the reactor, the specific plasma generation times, the roasting process will not take place. To do this, it is not sufficient to generate only a plasma of highly excited molecules, in a large volume, so as to increase the contact of the plasma with the particles of material to be treated as much as possible. The expected effect will not be achieved if the impact energy of the plasma particles is less than the energy threshold of the targeted plasmochemical reaction, which is, in the example considered, of the order of 0.1 eV to 0.2 eV per impact.
• the targeted plasmochemical reaction will not take place if the active particles of the plasma and the high-energy electrons fail to cross the boundary layer surrounding the particle of material to be treated and access the surface of this particle.
• the present invention therefore consists, first of all, in organizing the claimed method so as to satisfy the stated conditions.
• Objects of the invention are achieved through the creation of a plasma flow reactor PIT generated by a source of controlled pulses of electric current at high voltage and at a pressure close to atmospheric pressure or greater than atmospheric pressure meeting the following plasmochemical, electrodynamic and energetic conditions:
• PIT particles ie electrons and particles excited by inelastic collisions with electrons
• the thickness of the boundary layer d must be substantially less than the mean electron scattering length, Xe, ie d.
• Qen is the mean scattering cross section of electrons with respect to neutrals (the PIT medium is always a weakly ionized medium, so the density of neutrals is equal to the density of the plasma particles P / kTg;
• Tg is the temperature of the environment
• k is Boltzmann's constant
• m * is the mn / me ratio
• mn is the mass of neutral particles
• me is the mass of electrons
• D is the mean characteristic diameter of the particles of material to be treated
• Re vD / v
• v is the speed of the particles of material to be treated
• v is the kinematic viscosity
• the time lapse between pulses, t2 are determined by the conditions of dissipation of the energy released during the passage of electric current through the plasma. This dissipation mainly depends on convective and radiative exchanges between the plasma and its environment. In practice, we have
• PIT pulse discharge is characterized by the development of a plasma channel formed by the carrier gas causing the discharge to the outside of the electrodes.
• I the average current of an electric pulse
• V the average voltage between the electrodes
• Tp the temperature of the gas in the channel where The discharge takes place is smaller than the temperature Tp above which an electric arc develops.
• the temperature Tp varies within the limits 2500 K ⁇ Tp ⁇ 3200 K.
• c is the thermal capacity of the carrier gas PIT (J / m3 K);
• Tg is the temperature of the support gas surrounding the channel of the PIT discharge (K);
• d is the mean diameter of the discharge channel (m);
• L is the mean length of the plasma channel PIT (m).
• n is the numerical density of the particles of material to be treated in the flow of carrier gas
• v is the speed of the flow of carrier gas and therefore of the particles of material to be treated, (m / s);
• E is the maximum activation energy on a particle of material to be treated (J);
• L is the length of the plasma jet considered to be substantially equal to the length of the reactor (m);
• K is a dimensionless empirical coefficient which takes into account the path non-linearity of the particles of material to be treated subjected to the hydrodynamic pulses of the turbulent plasma flow PIT and the competition between the hydrodynamic action of the plasma flow and that of the hydrodynamic pressure of the flow of particles of material to be treated, directed against the flow of plasma PIT.
• N is the number of impacts of activation of the particles of matter to be treated by the electrons of the plasma, per second (s-1).
• N S. ne.ve
• S is the area of the material particle to be treated (m 2 ), equal to p D 2 (D - characteristic diameter of the material particle to be treated in m);
• ne is the numerical density of electrons in the plasma channel at temperature Tp (see J. Aubreton, C. Bonfoi, JMMaxmain, Revue de Physique appliquéd 1986 21 (6) pp365 - 376, Calcul des properties thermodynamiques et des coefficients de transport in a plasma in thermodynamic non-equilibrium at atmospheric pressure);
• ve is the average speed of the electrons in the plasma (m / s).
• Te is the temperature of the electrons of the plasma PIT near the particles of material to be treated (K);
• me is the mass of electrons (kg).
• Equations (1), (2) and (5) determine the conditions, for the construction parameters of the PIT plasma and of the reactor, under which the present invention is applicable for the targeted plasma-chemical treatment of particles in a PIT reactor. .
• equations (1), (2) and (5) relate the parameters of the construction of the device, t, L, L, S, d, K, the parameters of the process, Tg, Tp , Te, P, v, I, V, tl, t2, the parameters of the particles of material to be treated, D, S, E, and the properties of the materials used, c, mn, Qen, v.
• the process for the plasma-chemical treatment of fractionated material in a plasma-chemical reactor using a pulse plasma generator of the type called PIT-PTTM according to the invention is characterized in that the turbulent nature of the PIT plasma is reinforced, that the average generating power of the plasma flux known as PIT, equal to the product of the average amplitude of the voltage applied to the electrodes, V, by the average intensity of the current, I, in a pulse, is subjected to the conditions following plasmochemical, dissipative, electrodynamic and energetic:
• Tg is the temperature of the support gas surrounding the channel of the PIT discharge (K);
• m * is the mn / me ratio
• me is the mass of electrons
• Qen is the mean scattering cross section of the plasma electrons among the gas particles of the reaction zone
• v is the speed of the particles of material to be treated
• v is the kinematic viscosity of the medium in which the particles of material to be treated move
• tl is the duration of an electrical pulse
• t2 is the time lapse between electrical pulses
• n is the concentration of particles of material treated (m -3 );
• v is the average speed of passage of the particles of material treated through the PIT reactor (m / s);
• S is the area of the plasma jet PIT inside the reactor (m 2 );
• E is the activation energy transferred to the particles of matter treated by the particles (molecules, free radicals, atoms) excited in the plasma jet PIT or by the electrons from the plasma jet PIT and which reach the surface of the particle of material treated (J)
• N is the number of activation impacts per second on a particle of material treated (s -1 );
• K is the activation factor (according to experience, 10 ⁇ K ⁇ 50 depending on the geometry of the reactor)
• t is the flight time ( ⁇ L / v) of a particle of material treated through the reactor ( s);
• L is the characteristic length of the reactor, (m);
• c is the specific heat of the gas carrying particles of treated material passing through the PIT reactor (J / K / m 3 );
• Tp is the characteristic temperature of the heavy particles (molecules, radicals, atoms) of the plasma PIT (K);
• Tg is the characteristic temperature of the gas surrounding the plasma channels PIT (K), in the reaction zone;
• d is the mean diameter of the plasma channels (m);
• L is the characteristic length of the plasma channels.
• the present invention also relates to a device in which the target plasmochemical reaction is carried out following the action of one or more plasmatrons called PIT 1 containing one or more electrodes forming plasma channels of length L and of diameter d, mounted in a reactor provided with a duct (s) introducing the particles of material to be treated, entrained by a support gas in the form of a flow inclined with respect to the axis of the reactor at an angle a, the construction of the device providing for an evacuation duct for the particles of material to be treated after their treatment, and an evacuation duct for residual gases with filter, recovery system and valves, the construction being carried out so that the flow of particles of material to be treated performs in the reaction zone a loop-shaped trajectory whose dimensions are determined by the choice of the length L of the reactor, the surface S of the section of the plasmatron (s), the angle a, of the speeds of the support gas and of the particles of material to be treated, v, of the speed of the gas flows coming from the plasmatron (s) (generally
• FIG. 1a shows an example according to the invention of the distribution over time of the amplitudes of the high-frequency electric current pulses such as modulated
• FIG. lb shows an example of
• FIG. 2 shows the construction diagram of a plasmochemical reactor allowing the implementation of the process claimed in the present invention.
• Fig.3 shows a particular case of the device for implementing the method as defined in the present invention.
• Fig.4 illustrates the construction of the reactor designed to operate, in particular, at high pressure.
• Fig. 5 illustrates the medical application of the present invention.
• the impact energy of the plasma particles is less than the energy threshold of the targeted plasmochemical reaction, which is, in the example considered, of the order of 0.1 eV to 0.2 eV per impact.
• the present invention therefore consists, first of all, in organizing the claimed method as follows.
• PIT-PTTM plasma is generated by one or more PIT generators as described in the invention WO 2011/138525 A1, METHOD AND DEVICE FOR GENERATING A NON-ISOTHERMAL PLASMA JET, Priority Date 05.05.2010 which create a non-thermal plasma jet in a so-called PIT reactor, as described in the invention WO 2014 / 076-381, METHOD AND DEVICE FOR TREATING TWO-PHASE FRAGMENTED OR PULVERIZED MATERIAL BY NON-ISOTHERMAL REACTIVE PLASMA FLUX. Priority date: 22.05.2014.
• the plasma jet known as PIT-PTTM used in the present invention is supplied by an electric current pulse generator.
• the character of the pulses and their parameters are shown in Fig. 1.
• the duration of a pulse t1 must be such that the temperature of the plasma channel does not exceed the value Tp.
• Tp ⁇ 2000 - 3500 K.
• the duration of the time lapse between pulses, t2 should be such that the thermal energy accumulated in the plasma channel is dissipated by convection and radiation to the surrounding area.
• a jet of particles of material to be treated with a flow rate G mnvp.S, supported by a flow of carrier gas, is introduced into the reactor at an angle a, adjustable, between the axis of the particle feed tube of material to be treated and the axis of the reactor, in the plasma jet, mainly against the turbulent flow of plasma known as PIT.
• the value of the speed of the particle flow, vp is close to the average speed of the plasma flow v and the section S of the inlet tube of the particles of material to be treated is close to the section of the plasma jet.
• the dynamic pressure coming from the jet of particles of material to be treated, on the one hand, and, on the other hand, the dynamic pressure exerted by the plasma jet, the particles of material to process are slowed down, the axial projection of their relative speed with respect to the reactor passes through zero and their trajectory makes a loop.
• the width of this loop depends on the angle a and the values of the speeds vp and v.
• the size of the loop is all the greater the larger the size of the particles to be treated. This makes it possible to automatically vary the contact time of the particles of material to be treated with the plasma jet PIT, and therefore to control the process.
• the process is also controlled by varying the angle ⁇ , the flow rate G, and the parameters of the electric current pulses.
• the particles of material to be treated which have not been sufficiently treated, because they pass through the periphery of the plasma jet, are projected onto the wall of the reactor and, under the action of gravity, fall into a receptacle and are returned to the distributor of particles of material to be treated.
• This mentioned control ensures that the plasma energy is transferred to the particles of material to be treated through the boundary layer surrounding the particles of material to be treated, according to the plasmochemical condition, that the minimum reaction energy is indeed transferred to the particles of material to be treated, according to equation 2, that the energy generated in the plasma channels is small enough that the temperature of the plasma remains below Tp, according to equation 3, and the energy of the plasma is properly discharged into the surrounding area in the time lapse t2 between current pulses electrical, according to equation 4, and, optionally to make the plasma flow turbulent, with a controlled turbulence scale and by the desired speed of the reactions, measured, for example, by the flow rate of the particles of treated material leaving the reactor.
• one of the peripheral gases is methane.
• methane On contact with plasma, methane decomposes into hydrogen H2 and carbon C.
• the latter at relatively low temperature, forms solid particles of soot which interfere with the process and can be deposited on building elements and create obstructions to various gas flow. It is therefore necessary to eliminate them by organizing hydrodynamic curtains whose functions are to separate the solid particles from the construction elements while preserving, and even reinforcing the effects of turbulence which contribute to accelerating the plasmochemical reactions, while organizing the reactions favoring the destruction particles formed, for example, in the case of soot particles, by oxidizing them in a flow of air or oxygen, separately from the structural elements of the device.
• the present invention claims a device whose power supply mode is illustrated in Fig.la and lb.
• the power supply of the PIT plasmatron (s) is provided by a pulse generator, for example of the “inverter” type. Electric current is generated by high frequency pulses.
• k is Boltzmann's constant
• Tg is the temperature of the support gas surrounding the channel of the PIT discharge (K); m * is the mn / me ratio;
• mn is the mass of neutral particles
• me is the mass of electrons
• Qen is the mean scattering cross section of the plasma electrons among the gas particles of the reaction zone
• D is the mean characteristic diameter of the particles of material to be treated
• v is the speed of the particles of material to be treated
• v is the kinematic viscosity of the medium in which the particles of material to be treated move
• tl is the duration of an electrical pulse
• t2 is the time lapse between electrical pulses
• n is the concentration of particles of material treated (m -3 );
• v is the average speed of passage of the particles of material treated through the PIT reactor (m / s);
• S is the area of the plasma jet PIT inside the reactor (m 2 );
• E is the activation energy transferred to the particles of matter treated by the particles (molecules, free radicals, atoms) excited in the plasma jet PIT or by the electrons from the plasma jet PIT and which reach the surface of the particle of processed material (J);
• N is the number of activation impacts per second on a particle of material treated (s 1 );
• K is the activation factor (according to experience, 10 ⁇ K ⁇ 50 depending on the geometry of the reactor);
• t is the time of flight ( ⁇ L / v) of a particle of material treated through the reactor (s);
• L is the characteristic length of the reactor (m);
• c is the specific heat of the gas carrying particles of treated material passing through the so-called PIT reactor (J / K / m 3 );
• Tp is the characteristic temperature of the heavy particles (molecules, radicals, atoms) of the plasma known as PIT (K);
• Tg is the characteristic temperature of the gas surrounding the plasma channels PIT (K), in the reaction zone;
• d is the mean diameter of the plasma channels (m);
• L is the characteristic length of the plasma channels
• FIG. 1a shows an example of the distribution over time of the amplitudes of high-frequency electric current pulses as modulated.
• Fig. lb. shows an example of the time distribution of the amplitudes of high frequency voltage pulses as modulated.
• modulated distributions are determined by the character of the medium surrounding the plasmatron (s), mainly, the geometry of the plasmatron (s), in particular the electrodes, the flow rate of the feed gases of the plasmatron (s) (s), the turbulent nature of the feed gases of the plasmatron (s) and its (their) periphery and their organization in the plasmatron (s) and at its (their) outlet.
• the duration of a modulated pulse is t1.
• the length of time between modulated pulses is t2.
• the values of t1 and t2 are conditioned above and in the method according to the invention of the present invention.
• FIG. 2 The device for implementing the method as defined in the present invention is illustrated by FIG. 2.
• the PIT - PTTI plasma is generated by one or more plasmatrons 1 installed in a reactor 2.
• the quantity of plasmatrons used is determined by the size of the reaction zone. It is not always optimal to increase the size and power of a plasmatron to optimize the size of the reaction zone 3. It is often advantageous to use several plasmatrons, especially when it is necessary to limit the level. temperature in the reaction zone and to increase the flow rate of the gases participating in the reaction.
• Each plasmatron is powered by one or more current sources, 5, with 5 'current and 5 "voltage sensors satisfying the conditions shown in Fig. 1.
• Each plasmatron is provided with at least one electrode (in this case the PIT PTTM discharge is organized between the electrode and the earth).
• the most recommended variant is that comprising two electrodes 4, as shown in FIG. 2. It is common to use 3, 4, 6, 8 and more electrodes, their number allowing to vary the distribution of the parameters of the plasma PIT PTTM in the reactor 2 of conical or cylindrical shape.
• the functions of the power supply system (5) (formally illustrated in Fig. 2 with current measurement sensors) will have to be adapted in time and space. I (5 ') and the voltage V (5 ") of the electrodes of the plasmatrons, so as to optimize the distribution of the energy parameters of the plasma zone 3.
• the electrodes emit plasma channels 6 which evolve chaotically in the reaction zone.
• the degree of turbulence of the plasma and gas channels present in the reaction zone depends on the character of the gas flow in the reaction zone.
• the degree of turbulence (Fig. 2.) is regulated by means of turbulence amplification. These can be hydrodynamic in nature (for example, prominences or sudden change of section in the gas access channels to the reactor, acute angles of change of direction of the gases entering the reactor) or other (for example sonic devices or vibration excitation infrasound in the gases entering the reactor or in the reactor itself.
• One (s) pipe (s) 8 bring (s) into the reactor 2 the support gas (s) for the particles of material to be treated by means of a flow of support gas 9 which can be provided with a movement helical to optimize the mixing conditions with the particles of material to be treated.
• the pipe 8 forms an angle ⁇ , measured by the sensor 19 ′, with the axis 18 of the reactor.
• the duct 8 can be moved relative to the axis 18 so as to create a torque creating a swirling movement of the particles of material to be treated.
• the angle a and the flow rates of the carrier gas and of the particles of material to be treated are adjustable, thanks to motion mechanisms 19 and flow regulators 20 so as to optimize the average trajectory 17 of the particles of material to be treated through the reaction zone.
• These, after treatment in the reaction zone 3, are evacuated 15 through the duct (s) 14 and the control and filtration devices 16.
• Valves 21 allow either to evacuate them or to reintroduce them into the supply system of the device via a piping system. 22 as shown in FIG. 2.
• the device operates as follows:
• the flow rates of particles of material to be treated and of carrier gas are adjustable thanks to the flow regulators 20. These parameters are controlled by angle sensors and flow regulators so that the equations given above in the process of the present invention are satisfied.
• One or more plasma jets are formed by a system of plasmatrons 1 provided with electrodes 4 and supplied by a system 5 of current sources of the "inverter" type. Following the chaotic movement of the 6 plasma channels, coming from the electrodes 4, forms a reaction zone 3 characterized by a low temperature (in practice ⁇ 300 - 500 ° C) and a high degree of excitation of the particles and a high degree of turbulence which characterizes the PIT-PTTM plasma. Since the degree of turbulence in the reaction zone is important for the target plasmochemical process, a special excitation mechanism, for example sonic 7, or mechanical 7 ', and the corresponding device for controlling the state of turbulence, is provided.
• the flow rate of particles of material to be treated mixed with the support gas, the angle a, variable, the parameters of the plasma mean that the trajectory of the particles of material to be treated is complex and forms in the reaction zone a loop, the shape and dimensions of which are subjected to the dynamic pressure forces of the incoming flow and the plasma as well as to the centrifugal forces acting on the particles as they pass through the reaction zone.
• the dimensions of this loop are determined by the parameters as defined in the method of the present invention, as well as by the choice of the angle of incidence a measured and controlled by the device 19 '.
• the device operates continuously.
• the residual gas flow is extracted from the reactor through line 13 and filtration system 12 and is either discharged or redirected through valves 21 and line 22 to the support gas inlet line 9.
• the treated particles 15 exit the reactor through line 14, and are evacuated to the outlet 16 of the reactor.
• the device as illustrated by FIG. 2 is used, in particular, for the manufacture of roasted powders, as well as for the manufacture of syngas (CO + H2) from biomass.
• FIG. 3 corresponds to the case where the claimed device is used with incompatible products, in particular chemically active products, introduced both in the form of support gas 9 and of particles of material to be treated 26.
• the reactor 2, the walls of the plasmatron 1 require a protection, for example hydrodynamic, in the form of gas flow.
• These protection fluxes are shown in the example of FIG. 3 in the form of a flow, coaxial with the axis 18, 23 and 24 and coaxial with the central flow 25 served in the plasmatron 1.
• the most usual gases for this application of the present invention would be, for example:
• N2 as neutral gas introduced through line 24 and carrying, optionally, the particles of material to be treated, according to the present invention, such as, for example pulverized droplets of hydrocarbons;
• reaction zone 3 the trajectories of the particles of material to be treated 17 and the active parts of the plasma known as PU PTTM, in particular the plasma channels 6 are located, according to the diagram of the claimed device, outside the initial zones of the flow, i.e. in the mixing zone of the various streams mentioned (according to definitions and terminology given in the monograph by H. Schlichting, K. Gersten cited on page 9 of the present invention).
• FIG. 4 Illustrates the device for implementing the present invention, in particular for the particular cases where:
• C ' is the case, for example, of the introduction of a gas such as methane (CH4) in a neutral atmosphere such as nitrogen (N2).
• a gas such as methane (CH4)
• N2 nitrogen
• the methane molecules decompose into C + H2.
• the device is operated at atmospheric pressure or at a pressure greater than atmospheric pressure. This is the case with the application, cited above, of the preparation of gases for actuating a gas turbine 31, for example.
• the reactor 2 is made in the form of a high pressure vessel, and all the conduits and electrical supply cables are introduced into the airlock 30 of the reactor 2 by means of gaskets 31 and hermetic dielectric insulators 3 .
• the plasmatron 1 is inside the reactor 2.
• the current source 5 and the elements ensuring the flow rates of the various components are outside the reactor 2 and the airlock 30.
• the particles of material to be treated are introduced into the reactor with a carrier gas through line 23, are treated in reaction zone 3 and are fully treated there 17 ”.
• the claimed device provides for operation under pressure as described in point a.
• the particles of material to be treated are only partially treated 17 '"in the zone 3.
• C This is the case, for example, with the production of chemicals and powders of plasmochemical origin.
• This is also the case with the use of the claimed device for the preparation of gases actuating a gas turbine. in this case to inject an additional oxidizing gas jet 29 into the closest and most accessible part 28, making it possible to exploit, for combustion, the residual excitation of the carrier gas particles and of the surface of the particles In this way, the gases leaving the claimed reactor will be fully treated and will perform their work, for example, of propelling the fins of a gas turbine 31, with maximum efficiency and optimized efficiency.
• the reactor 2 is designed so as to operate, in particular, at high pressure, a situation for which it is provided with a high pressure airlock 30 into which the gas conduits 22, 23, 24 are introduced by means of joints 31, electrical communications by means of hermetic insulating joints 31 ', the particles of material to be treated being injected through the duct (s) 23 with speeds such that they are completely transformed into gas in the zone reaction 17 ", or else, if any are created in the reaction zone 17 ', they are completely transformed into gas in this zone, or else, if the plasmochemical reaction is not complete 17'", being in a state of excitation following the activation undergone in the reaction zone 3 and thanks to the injection through the line 28 of an active gas at the outlet of the reactor 29, they are entirely transformed into gas in the line of outlet of the reactor 13,14, gases and products of the plasmochemical reactions i ssus of the reactor 2 opening directly onto the object to be actuated 32, for example the blades of a gas turbine 32
• FIG. 5 illustrates the medical application of the present invention. In that case :
• the feed gas supplying the plasmatron is preferably argon or nitrogen. It is possible to use air. It is introduced into the device through line 25.
• the particles of material to be treated are introduced with their carrier gas (for example nitrogen) through the pipe 24.
• a gas for hydrodynamic protection of the activation zone 3 is introduced through line 23.
• the speeds of the gases introduced through lines 23, 24 and 25 are chosen such that their mixture, within the meaning described in the monograph ( see H. Schlichting, K. Gersten, Boundary Layer Theory. Springer - Verlag Berlin, Heidleberg 2017 DOI 10- 1007/978 - 3 - 612 - 52919 5_1), is carried out outside or at the limit of the activation zone of the treated tissues (as shown in Fig. 5. From this Thus, the domain 2 'limited by gas walls, in this case, formally represents the limits of the reactor as referred to in the present invention.
• PIT PTTM 6 turbulized in domain 3 appearing as a cold gas of molecules (and radicals) strongly excited, comes into contact with the treated surface of the tissue and carries out treatments such as activation, sterilization, resuscitation of pseudo-necrotic cells, passivation (deposit of a thin, solid, neutral layer, preserving the treated area of the tissue from any action from the outside).
• the present invention is used, in particular, for the transformation of biomass into torrefied fuel and into hydrogen, the destruction of organic waste, the stimulation of combustion in gas turbines, the performance of surgical assistance operations. , such as, for example, resuscitation of pseudo-necrotic cells, and passivation of scars.
• PIT PTTM reactor for the production of roasted granules (pellets) following the transformation of biomass into roasted powders.
• Carrier gas nitrogen (N2)
• Reactor known as PIT PTTM for stimulating the activation of the intake gases in the combustion chamber of a gas turbine (tests in a pre-industrial environment).
• the so-called PIT PTTM reactor is located at the inlet upstream of the combustion chamber of the turbine.
• Device according to FIG. 5 for the treatment primarily and advantageously, the resuscitation of pseudo-necrotic cells which are the result of internal or external surgical interventions, and / or the passivation of the surfaces of organically treated surgically treated tissues, i.e. the deposition on the surfaces of tissues of a thin flexible layer (a few molecular layers) which protects the treated surface from any destructive action of the environment.
• atmospheric parameters are such as the main parameters, the dimensions of the reactor, the mean amplitude of the current and the voltage at the electrodes, the diameter, the speed and the concentration of the particles of material to be treated, the durations of the electrical pulses and the activation energy of the particles of material to be treated, are linked in such a way that the particles of material to be treated carry out in the reactor trajectories in the form of loops with an angle of incidence in the reactor, a, variable, conditioned by the access and the reaction of the particles of the plasma to the surface of the particles of matter to be treated, the dissipation of the energy of the current pulses, the transfer of energy sufficient to carry out the reaction but limited by the condition of no heating of the plasma.
• the invention is used for:

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• 2020
  • 2020-03-20 EP EP20719712.0A patent/EP3981226A1/de active Pending
  • 2020-03-20 WO PCT/IB2020/000105 patent/WO2020188344A1/fr unknown

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