EP3942090A1 - Apparatus and method for vacuum coating surfaces of objects - Google Patents
Apparatus and method for vacuum coating surfaces of objectsInfo
- Publication number
- EP3942090A1 EP3942090A1 EP20711162.6A EP20711162A EP3942090A1 EP 3942090 A1 EP3942090 A1 EP 3942090A1 EP 20711162 A EP20711162 A EP 20711162A EP 3942090 A1 EP3942090 A1 EP 3942090A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- measuring unit
- coating
- vacuum
- objects
- measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 57
- 238000001771 vacuum deposition Methods 0.000 title description 2
- 238000000576 coating method Methods 0.000 claims abstract description 72
- 239000011248 coating agent Substances 0.000 claims abstract description 65
- 239000007789 gas Substances 0.000 claims abstract description 32
- 238000011156 evaluation Methods 0.000 claims abstract description 14
- 238000005259 measurement Methods 0.000 claims abstract description 6
- 238000000926 separation method Methods 0.000 claims abstract description 6
- 238000012544 monitoring process Methods 0.000 claims abstract description 5
- 238000012423 maintenance Methods 0.000 claims description 13
- 238000001514 detection method Methods 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 3
- 230000006698 induction Effects 0.000 claims description 3
- 238000009795 derivation Methods 0.000 claims 1
- 238000007599 discharging Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229910052729 chemical element Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 235000013361 beverage Nutrition 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 ferrous metals Chemical class 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Definitions
- the present invention relates to an apparatus for coating
- the invention also relates to a corresponding method for monitoring
- PVD for example PVD, CVD, PCVD into consideration.
- Coating chamber and implemented on the surface to be coated of the objects intended for the coating. This activated
- Residual gas mixture unintentionally coats inside the vacuum system
- Components of the coating device such as pumps, pipes, flappers, etc.
- the degree of unwanted coating depends on the
- An object of the present invention is therefore to provide a
- the invention provides a device for coating surfaces of objects under a vacuum provided by a vacuum system by means of a gas separation process, having process rooms, including at least one treatment chamber for receiving the objects to be coated and at least one further process room connected to the at least one treatment chamber for passage
- a measuring unit for detecting the coating thickness is arranged on a surface or on sections of the surface of the process rooms, the measuring unit being connectable to a control and evaluation unit.
- the control and evaluation unit is preferably set up to determine the need and / or the point in time to clean the surfaces of the at least one further process space or the treatment chamber by removing unwanted coating.
- the control and evaluation unit is particularly preferably set up to evaluate an ACTUAL occupancy rate or course of an ACTUAL occupancy rate, in particular against a TARGET occupancy rate or TARGET course of an occupancy rate.
- any interior space of the device is to apply as a process space, which is at least temporarily with a vacuum during normal operation
- Treatment chamber in which at least one object can be coated, and the vacuum lines connected to it, which are connected to one or more Vacuum pumps are connected to set the necessary process pressure (vacuum) and / or to pass gases.
- the surfaces of objects to be coated are preferably inner surfaces of hollow bodies, such as, for example, containers, in particular bottles, preferably plastic bottles.
- the device is particularly preferably designed to coat the inner walls of bottles, in particular PET bottles.
- a gas deposition process is, for example, a PVD (Physical Vapor Deposition), a CVD (Chemical Vapor Deposition) or a PCVD (Plasma (assisted) Chemical Vapor Deposition) process. These procedures are carried out under vacuum.
- gases that can be provided in the connected process rooms can be gases or gas mixtures.
- gases are gases from a chemical
- Gas mixtures are gases made up of at least two different chemical elements or chemical compounds.
- a vapor phase is also used synonymously as gas
- the deposition rate is preferably measured while the process is running and thus allows predictions about the degree of contamination of individual components without opening the vacuum system.
- the present invention ensures long-term in-line measurement of unwanted coating. This enables a meaningful prediction of the maintenance intervals of process pumps, flutters (control flaps),
- Vacuum piping, etc. guaranteed.
- the remaining runtime (until maintenance) can be permanently compared with the planned runtime and, if necessary, even currently unnecessary maintenance activities can be identified and skipped or delayed.
- the inventive monitoring of the deposition rate of the undesired deposition increases the efficiency of the coating device, since the achievement of the maximum tolerable stress state can be predicted. This also ensures that there are unplanned outages
- the measuring unit can be arranged in an area of the further process rooms that is accessible without having to open the entire vacuum system of the coating device.
- a device is preferably provided in which the measuring unit is in a bypass, in a separable space or line section, in a
- Vacuum line of the vacuum system is arranged in a supply line to the treatment chamber or in a discharge line from the treatment chamber.
- This location at which the measuring unit is arranged can preferably be shut off so that the measuring unit or the sensor element can be exchanged during operation. This is preferably achieved by means of valves at both ends or both sides and suitable opening / removal measures, which ensure that the entire vacuum system does not have to be opened.
- Measuring unit is accessible there without the entire vacuum system of the
- the measuring unit used according to the invention preferably comprises a coating thickness detection element which has a sensor section and the sensor section has a strain gauge and / or
- sensors of different types are preferably suitable for this element, in particular if they are miniaturized to such an extent that they can be used at suitable locations or areas of the coating device without requiring a large amount of space.
- Coating thickness sensors or detection elements that can be implemented in strip form, such as, for example, are particularly suitable here
- the measuring unit is particularly preferred a gravimetric measuring unit, ie a measuring unit which takes into account the weight difference of the deposit, in particular on the sensor of the measuring unit.
- the measuring unit comprises a carrier and closure section and a sensor section, the sensor section being able to be combined and releasably connected to the carrier and closure section in a non-destructive manner.
- the sensor section is preferably designed to be pluggable. This makes it possible to remove the sensor section for evaluation alone and to replace it with a new one without having to exchange the entire measuring unit.
- the sensor section has a measuring tongue and an interface section via which the connection to the carrier and closure section can be established. So it is possible when removing the
- a device in which the measuring unit has a transponder with which data and / or signals from the control and evaluation unit can be transmitted wirelessly to a receiving station.
- a transponder can preferably be a radio transmitter or be based on RFID technology.
- a device in which the measuring unit projects into a pipeline of the vacuum system.
- the measurement in a pipe of the vacuum system becomes a critical part of the
- a measuring unit is particularly advantageous, which comprises a carrier for the preferably strip-shaped coating thickness detection element, which is attached to a vacuum feedthrough, wherein the vacuum feedthrough can be connected to a flange tube which opens into a bore in the wall of the at least one further process space, and wherein the coating thickness detection element comes to lie in the area of the bore.
- the object of the present invention is also achieved by a method for monitoring surfaces in conduction paths of an inventive
- the measuring unit is used as a measured value for actual data of the coating thickness on a surface of the at least one further process room and these ACTUAL data are passed on to an evaluation device in which these ACTUAL data are compared with TARGET data.
- the measuring unit records actual data as measured values depending on the sensor used. These measured values allow a conclusion about the
- the TARGET data are preferably specified and correspond to the measured values or the coating thicknesses derived from them.
- the TARGET data can preferably be specified and can preferably also be adapted.
- Measurement units either in the same device or in a device operated in parallel, take place.
- the evaluation unit preferably comprises a comparator with which the ACTUAL data and the TARGET data are compared with one another.
- the ACTUAL data preferably also include a time stamp, so that a gradient over time can be determined from the number of ACTUAL data determined. This can be used to forecast future coating scenarios.
- the comparison of the ACTUAL data with the TARGET data is preferably carried out continuously or sequentially. To measure the coating thickness in running systems, it may be sufficient to carry out a daily comparison.
- the interval in which the comparison takes place is preferably predetermined as a function of the gradient of the ACTUAL data determined in the past. It is thus possible to make a comparison in three days with a freshly cleaned device, while a narrower interval is specified for a gradient that makes it possible to reach the target data soon.
- the comparison of the ACTUAL data with the TARGET data is particularly preferably carried out continuously and is transferred wirelessly to an evaluation unit and continuously evaluated there.
- the development of the ACTUAL data over time in correlation with the data driven on the device is particularly preferred
- Forecast of the coating thickness can be used.
- a signal is preferably generated with which a message, in particular an error message or a warning message, is generated.
- This constellation can preferably be freely defined and selected for predetermined coating thicknesses such as 80% of the maximum achievable coating thickness before cleaning for a warning message or at 95% for an error message.
- Maintenance and / or shutdown times are preferably predicted and preferably also reported as a function of the gradient of the measured value over time.
- the measuring unit in particular the sensor section, is preferably removed from and outside the device for coating surfaces
- the old, loaded sensor element is then worked up so that it can be used again.
- FIG. 1 shows a double coating chamber for containers as well as the supply and discharge vacuum and gas lines
- FIG. 2 shows a sectional view of a pipe section of the coating device according to the invention, in which a measuring unit is arranged, and
- FIG. 3 shows a plan view of an embodiment of the measuring unit in the
- the coating device 1 shown in Fig. 1 shows a
- downstream line 7.1 is a
- Measuring unit 14 is arranged.
- the pipeline section 10 from FIG. 1 is shown again in greater detail in FIG.
- the pipeline section 10 of the device for coating surfaces of objects under a vacuum provided by a vacuum system by means of a gas separation process has a further process space 12 in the form of a pipeline with measuring stubs for receiving a measuring unit 14.
- a flap valve or flapper 9 shown to the left of the further process space 12.
- the vacuum pump 5 connects on the other side (to the right of the further process space 12 - not shown here).
- a measuring unit 14 communicating with its interior via a bore 13 is attached to a wall of the further process space 12 and is shown in greater detail in FIG. 3.
- This measuring unit 14 is preferably a gravimetric measuring unit.
- the measuring unit 14 is used for (preferably gravimetric) detection of the coating thickness on the surface of the process space 12 in the area of the bore 13. In a manner not shown in FIG To clean process rooms or parts thereof by removing unwanted coating.
- the measuring unit 14 comprises a strip-shaped one
- Strain gauge which has two sensor fields 16 and 17, the output signals of which are connected to the control and evaluation unit via two pairs of measuring lines 18 and 19.
- the strain gauge 15 is attached to a flat sheet metal element 20, which is held via a base plate 21 made of insulating material, which is fixed on an axially cut pipe end part 22 of a tubular support 23.
- the two pairs of measuring lines 16 and 17 pass through the tubular carrier 23 and are from this via a
- the measuring unit 14 is coupled to the further process room 12 via a flange tube 25 connected in a vacuum-tight manner to the wall of the further process room 12 so that its detection element 15 is in the area of the bore 13, but set back from the wall of the further process room 12 comes to rest, at this point the strength of a
- Vacuum components are monitored permanently or continuously (dynamically) during the ongoing maintenance interval. This means that the remaining runtime (until maintenance) can be permanently compared with the planned runtime and, if necessary, even currently unnecessary maintenance activities can be identified and skipped or delayed.
- the efficiency of the systems is increased by the present invention, since the achievement of the maximum tolerable load condition can be predicted and thus unplanned failures can be avoided.
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102019107237.9A DE102019107237A1 (en) | 2019-03-21 | 2019-03-21 | Device for vacuum coating of surfaces of objects |
PCT/EP2020/056748 WO2020187715A1 (en) | 2019-03-21 | 2020-03-13 | Apparatus and method for vacuum coating surfaces of objects |
Publications (1)
Publication Number | Publication Date |
---|---|
EP3942090A1 true EP3942090A1 (en) | 2022-01-26 |
Family
ID=69810874
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP20711162.6A Pending EP3942090A1 (en) | 2019-03-21 | 2020-03-13 | Apparatus and method for vacuum coating surfaces of objects |
Country Status (5)
Country | Link |
---|---|
US (1) | US20220154340A1 (en) |
EP (1) | EP3942090A1 (en) |
CN (1) | CN113966410A (en) |
DE (1) | DE102019107237A1 (en) |
WO (1) | WO2020187715A1 (en) |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3191076B2 (en) * | 1993-02-09 | 2001-07-23 | 松下電器産業株式会社 | Dry etching apparatus and dry etching method |
JPH10158842A (en) * | 1996-12-03 | 1998-06-16 | Toshiba Corp | Film forming system |
JPH11345778A (en) * | 1998-05-29 | 1999-12-14 | Tokyo Electron Ltd | Method for cleaning film preparing apparatus and mechanism for cleaning the apparatus |
DE19929615C1 (en) * | 1999-06-28 | 2001-04-19 | Fraunhofer Ges Forschung | Device and use of the device for monitoring deliberate or unavoidable layer deposits |
JP2002057149A (en) * | 2000-08-08 | 2002-02-22 | Tokyo Electron Ltd | Treatment device and its cleaning method |
JP2006066540A (en) * | 2004-08-25 | 2006-03-09 | Tokyo Electron Ltd | Thin film forming device and cleaning method thereof |
JP4878188B2 (en) * | 2006-03-20 | 2012-02-15 | 東京エレクトロン株式会社 | Substrate processing apparatus, deposit monitoring apparatus, and deposit monitoring method |
DE102006029039A1 (en) * | 2006-06-24 | 2007-12-27 | Carl Zeiss Smt Ag | Monitoring of processes for ion etching or material deposition in vacuum chamber, employs quartz resonator, excitation oscillator and sensor inside chamber |
CN104087908B (en) * | 2014-07-21 | 2017-05-03 | 郭爱玉 | Film thickness monitoring equipment convenient for online maintenance and maintenance process of film thickness monitoring equipment |
KR102410526B1 (en) * | 2015-01-22 | 2022-06-20 | 삼성디스플레이 주식회사 | equipment for measuring contamination of plasma generating device |
-
2019
- 2019-03-21 DE DE102019107237.9A patent/DE102019107237A1/en active Pending
-
2020
- 2020-03-13 CN CN202080021808.1A patent/CN113966410A/en active Pending
- 2020-03-13 US US17/441,147 patent/US20220154340A1/en active Pending
- 2020-03-13 EP EP20711162.6A patent/EP3942090A1/en active Pending
- 2020-03-13 WO PCT/EP2020/056748 patent/WO2020187715A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
DE102019107237A1 (en) | 2020-09-24 |
WO2020187715A1 (en) | 2020-09-24 |
US20220154340A1 (en) | 2022-05-19 |
CN113966410A (en) | 2022-01-21 |
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