EP3880392A1 - Verbessertes kalibrierverfahren für eine anlage zum pulverbettbasierten generieren von dreidimensionalen bauteilen mittels elektromagnetischer strahlung - Google Patents
Verbessertes kalibrierverfahren für eine anlage zum pulverbettbasierten generieren von dreidimensionalen bauteilen mittels elektromagnetischer strahlungInfo
- Publication number
- EP3880392A1 EP3880392A1 EP19805190.6A EP19805190A EP3880392A1 EP 3880392 A1 EP3880392 A1 EP 3880392A1 EP 19805190 A EP19805190 A EP 19805190A EP 3880392 A1 EP3880392 A1 EP 3880392A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- beam source
- deflection unit
- reference mark
- source deflection
- calibration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/141—Processes of additive manufacturing using only solid materials
- B29C64/153—Processes of additive manufacturing using only solid materials using layers of powder being selectively joined, e.g. by selective laser sintering or melting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/20—Direct sintering or melting
- B22F10/28—Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/30—Process control
- B22F10/31—Calibration of process steps or apparatus settings, e.g. before or during manufacturing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
- B22F12/22—Driving means
- B22F12/222—Driving means for motion along a direction orthogonal to the plane of a layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
- B22F12/30—Platforms or substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
- B22F12/40—Radiation means
- B22F12/44—Radiation means characterised by the configuration of the radiation means
- B22F12/45—Two or more
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
- B22F12/90—Means for process control, e.g. cameras or sensors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/227—Driving means
- B29C64/232—Driving means for motion along the axis orthogonal to the plane of a layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/245—Platforms or substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/264—Arrangements for irradiation
- B29C64/268—Arrangements for irradiation using laser beams; using electron beams [EB]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/264—Arrangements for irradiation
- B29C64/286—Optical filters, e.g. masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/30—Auxiliary operations or equipment
- B29C64/386—Data acquisition or data processing for additive manufacturing
- B29C64/393—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y50/00—Data acquisition or data processing for additive manufacturing
- B33Y50/02—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/32—Fiducial marks and measuring scales within the optical system
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/401—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for measuring, e.g. calibration and initialisation, measuring workpiece for machining purposes
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/49—Nc machine tool, till multiple
- G05B2219/49018—Laser sintering of powder in layers, selective laser sintering SLS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Definitions
- the invention relates to a calibration method for a system for powder-bed-based generation of three-dimensional components by means of electromagnetic radiation according to the preamble of claim 1.
- Powder bed based laser beam melting is a form of
- PBLS for which the term selective laser melting is also used, belongs to the group of generative ones
- PBLS additive Manufacturing processes, which are also known as Additive Manufacturing (AM) processes.
- AM Additive Manufacturing
- PBLS is known for example from German patent DE 196 49 865 C1.
- three-dimensional components can be manufactured informally, i.e. without tools or molds, and almost without any restrictions with regard to the geometric component complexity.
- the aforementioned methods are to be distinguished in particular from selective laser sintering and from laser cladding.
- components are produced in layers from an initially powdery material, in particular in the form of plastics or metals, which - unlike in the case of
- Laser build-up welding - is provided in layers as a static powder bed and - unlike selective laser sintering - is completely melted and solidified without the addition of binders.
- the components produced by means of these methods have mechanical properties which largely correspond to those of the base material or to those which have components which are produced from the base material by means of conventional methods.
- Calibration methods are known, which are based on the burning of a test pattern into the powder. However, these methods are not suitable for performing a calibration within a construction job, since the scanned reference pattern coincides locally with the component in production and thus the quality of the component to be built can reduce.
- This task is accomplished through a calibration procedure for a plant
- an improved calibration method for a system for powder bed-based generation of three-dimensional components is achieved by means of
- electromagnetic radiation in particular a PBLS system, with a
- Beam source deflection unit which is designed in particular in a PBLS system as a laser scanner unit, and a liftable and lowerable carrier plate, above which a component is built, at least one virtual reference mark being used to calibrate the beam source deflection unit and a target-actual deviation between the virtual reference mark and a beam of the beam source deflection unit is determined by means of a detector, in that the at least one virtual reference mark is applied to a reference surface that can be moved vertically by means of the liftable and lowerable support plate and independently of whose vertical position is projected.
- the reference surface can be moved vertically by means of the lifting and lowering support plate and can be formed by the support plate itself, by a construction platform arranged thereon or by construction material arranged thereon and also referred to as substrate, which is in particular in powder form or in an already solidified state.
- the carrier plate forms the movable floor of a
- Component container which adjoins the working level with an upper opening opposite the floor and extends below the working level.
- the carrier plate is fitted and movable in the manner of a piston within the side wall of the container running at right angles to the floor, in order to be able to be lowered step by step in relation to the working plane.
- a drive for example in the form of an electromechanical lifting cylinder,
- the carrier plate can be raised or lowered within the component container and beyond. As soon as the construction platform is provided, this is carried by the carrier plate and is arranged thereon, for example placed on or releasably fastened, in particular screwed or braced.
- the construction platform can be formed, for example, by a substrate plate, from which the finished component has to be separated, or a preform, which becomes part of the component.
- the at least one virtual reference mark is advantageously projected onto the reference surface, regardless of the vertical position of the reference surface and thus in particular regardless of whether the reference surface is below, above or in a working plane of the system for generating powder bed-based
- the at least one virtual reference mark is projected onto the reference surface while it is located outside, that is to say below or above, the working level of the system for generating powder-bed-based three-dimensional components by means of electromagnetic radiation. Since the reference mark is virtual and therefore not physically present within the building chamber, its geometry can be adapted to the one to be calibrated
- Adapt the application for example, enlarge, reduce or distort, whereby a calibration of the beam source deflection units is no longer necessary exclusively with respect to the working plane. It is also conceivable to generate a virtual reference geometry which comprises several such reference marks, the reference marks being able to be generated and detected simultaneously or sequentially.
- the beam source deflection unit comprises a beam source for generating
- Emitting electromagnetic rays in particular a laser beam source in the case of a PBLS system, by means of which the beam, in particular the laser beam, is generated and emitted, and a deflection unit, by means of which the beam is propagated with respect to its direction of propagation, in particular by means of preferably movable deflecting mirrors ( n), and with regard to its lateral extent, in particular by means of preferably movable focusing lens (s).
- a laser beam source in the case of a PBLS system
- a deflection unit by means of which the beam is propagated with respect to its direction of propagation, in particular by means of preferably movable deflecting mirrors ( n), and with regard to its lateral extent, in particular by means of preferably movable focusing lens (s).
- Beam source deflection unit can be moved in the horizontal and / or vertical direction and thus enables the relative position and in particular the distance between the reference surface and the beam source deflection unit.
- the calibration can thus take place independently of the working plane or a beam of the beam source deflection unit can be generated which is deliberately not focused.
- the beam strikes the preferably flat reference surface, its lateral extent there can be detected by the detector as a cross-sectional surface.
- a beam that strikes a flat reference surface extending at right angles to the beam has a round one in this reference surface or projection surface
- Cross-sectional areas deviating cross-sectional area and a reference point representing this deviating area are used to determine the target / actual deviation and can be used, for example, by a control unit of the system for generating powder bed-based
- the deflection unit enables the beam, in particular the laser beam, also referred to as scanning or scanning, to be guided over a powder layer for thermal manipulation, preferably melting, of the same.
- the beam generated by the beam source can also be directed past the deflection unit directly onto the construction platform or powder there.
- Productivity can be increased by using several beam source deflection units, which then form a multi-deflection unit system, in a multi-scanner system.
- the beam source deflection units can be moved individually or together in the horizontal and / or vertical direction and thus make it possible to set the relative position and, in particular, the distance between the reference surface and the beam source deflection units.
- the calibration can thus take place independently of the working plane or a beam of a beam source deflection unit can be generated which is deliberately not focused.
- so-called 3D laser scanner units which are characterized by a very compact design, are used in PBLS systems.
- the respective 3D laser scanner unit has at least one movable focusing lens, which is followed by at least one deflection mirror in the beam path, and allows for each individual laser scanner unit a larger detection area with comparable focus sizes compared to a 2D laser scanner unit, in which one static focusing lens in the beam path after the last one
- Deflecting mirror is arranged.
- the combination of at least two 3D laser scanner units in a compact housing allows the beam outputs of the laser scanner units to be selected particularly close to one another. This spatial proximity of the beam outputs of the laser scanner units allows the overlap field with small focus sizes of ⁇ 80 pm and large scan dynamics
- the reference mark and / or reference geometry can be adapted particularly advantageously as a function of the material to be processed and in particular its reflectivity in the wavelength range and / or intensity range used to generate the reference mark and / or reference geometry in such a way that a
- the method can therefore be used regardless of the material which forms the reference surface and its nature, such as, for example, powder versus solidified material or glossy versus matted surfaces. For example, with a matt surface and thus low reflectivity of the material to be processed, a reference mark in a first wavelength range and / or intensity range, in a
- a reference mark is generated in a second wavelength range and / or intensity range that is different from the first.
- an absolute reference mark is used as the virtual reference mark, in particular by one from the beam source deflection unit various equipment of the system for powder bed-based generation of three-dimensional components by means of electromagnetic radiation.
- the device for generating the absolute reference mark can be arranged in a fixed or movable manner in or on the system for generating powder-bed-based three-dimensional components by means of electromagnetic radiation.
- the device comprises one or more radiation source (s), which is / are in particular designed such that electromagnetic radiation with a high
- the wavelength spectrum that can be generated by each of the beam sources of the device can range from ultraviolet to infrared.
- the absolute reference mark can therefore be, for example, a mark generated by an electromagnetic beam from the device on the reference surface with a round cross-sectional area or an elliptical cross-sectional area or a cross-sectional area that deviates from the aforementioned cross-sectional areas and has a reference point that represents the respective cross-sectional area. It is also conceivable to generate an absolute reference geometry comprising several reference marks, which is made possible, for example, by a template in the device or a projector of the device. If powder is applied to the construction platform, it melts when the absolute is projected
- the at least one absolute reference mark is used to carry out a focus calibration, that is to say to compensate for a target / actual deviation, of the beam source deflection unit, and for this purpose a target / actual deviation between the absolute values using the detector Reference mark and a beam of the beam source deflection unit is determined and an adjustment of the beam source deflection unit and / or the beam, for example by horizontal and / or vertical method and adjustment of the beam source deflection unit and / or focusing lens (s) and / or deflecting mirror, is corrected in order to minimize, eliminate or set the desired-actual deviation as determined.
- the focus calibration is the compensation of an existing deviation of the lateral actual extension of the beam of the beam source deflection unit from the lateral actual extension of the absolute reference mark in the reference surface and / or the compensation of an existing target-actual deviation of the actual intensity of the Beam of the beam source deflection unit designated by a desired and / or maximum generated by the beam source deflection unit target intensity. If the beam of the beam source deflection unit to be calibrated therefore has a larger or smaller lateral actual dimension than the absolute reference mark on the
- the lateral actual extent of the beam of the beam source deflection unit to be calibrated becomes the lateral actual extent of the absolute
- the reference mark is adjusted or the lateral actual extent of the beam of the beam source deflection unit is placed over the lateral actual extent of the absolute reference mark.
- the actual intensity of the beam of the beam source deflection unit is set to the desired, for example maximum, intensity.
- a combined calibration based on the lateral extent and the intensity is also conceivable.
- Focus calibration can be caused by thermal influences
- beam source deflection units on which no focus calibration or a correspondingly selected focus calibration has been carried out, can also be used for melting powder over a larger area.
- the beam source deflection unit is carried out and for this purpose a target-actual deviation between the absolute reference mark and a beam of the beam source deflection unit is determined and an adjustment of the beam source Deflection unit and / or the beam, for example by horizontal and / or vertical movement and adjustment of the beam source deflection unit and / or focusing lens (s) and / or deflection mirror, is corrected in order to determine the target / actual deviation determined minimize, eliminate or set to a desired value.
- the position calibration is the minimization, elimination or adjustment of an existing deviation of the beam generated by the beam source deflection unit and incident on the reference surface from the absolute reference mark projected there in the lateral direction with respect to the reference surface.
- the lateral deviation between the beams of the beam source deflection unit and the absolute reference mark is checked and, if a deviation is detected, a lateral alignment of the beam source deflection unit is carried out in order to minimize the determined target / actual deviation , eliminate or set to a desired value.
- an absolute reference mark with a corresponding cross-sectional area is thus generated on the reference area by means of the device.
- a beam is generated with the beam source deflection unit to be calibrated and with a corresponding one
- the target / actual deviation between the absolute reference mark and the beam of the beam source deflection unit to be calibrated, in particular between the respective reference points of the cross-sectional areas, is detected and by means of the detector, which can be one of the detectors described in more detail below a corresponding setting of the beam source deflection unit is made on the basis of the target / actual deviation.
- the at least one absolute reference mark is used to carry out a focus calibration of a second, preferably each further, beam source deflection unit of the system for generating powder-bed-based three-dimensional components by means of electromagnetic radiation.
- Reference mark performed a position calibration of a second, preferably each further, beam source deflection unit of the system for generating powder-bed-based three-dimensional components by means of electromagnetic radiation.
- Components by means of electromagnetic radiation thus has more than one beam source deflection unit and is accordingly designed as a multiscanner system
- one, more or each of the beam source deflection units can also be based on the one or more absolute reference mark (s) according to the previous one focus calibration and / or position calibration described. It is particularly advantageous that, in this sense, individual beam source deflection units can be focus-calibrated or position-calibrated without having to focus-calibrate or position-calibrate the entirety of all beam source deflection units.
- the aforementioned position calibrations can each be carried out after or before a focus calibration mentioned above or without such a focus calibration. It is therefore possible to choose whether one or more or each beam source deflection unit is position and focus calibrated or one or more or each beam source deflection unit is only position calibrated or only focus calibrated.
- a relative reference mark is generated as a virtual reference mark by the beam source deflection unit.
- the beam source deflection unit producing the relative reference mark (s) can be a, in particular three-dimensional, movable component of the system for generating powder-bed-based three-dimensional components by means of electromagnetic radiation.
- the beam source deflection unit has a smaller number of degrees of freedom. It is particularly advantageously provided that even if a beam source deflection unit is used to generate a relative reference mark, no penetration is generated in the powder by the relative reference mark being generated by a beam which has an intensity which does not cause the powder to melt.
- a target-actual deviation between a beam of the first beam source deflection unit, which generates the relative reference mark, and a beam of the second, preferably each further, beam source deflection unit in relation to the reference surface is determined and a setting of the second beam source deflection unit and / or the beam is corrected in order to minimize, eliminate, or set the desired-actual deviation as determined.
- the system for powder bed-based generation of three-dimensional components by means of electromagnetic radiation has more than one beam source deflection unit and accordingly as Multi-scanner system is formed, one, more or each of the beam source deflection units can also be aligned using a first beam source deflection unit according to the focus calibration described above.
- a position calibration of a second beam source deflection unit is carried out with respect to the relative reference mark and for this purpose a target-actual deviation between the relative reference mark and a beam of the second beam source deflection unit based on the detector
- a relative reference mark is thus generated by means of the one beam source deflection unit and projected onto the reference surface with a corresponding cross-sectional area.
- a beam is generated with the beam source deflection unit to be calibrated and with a corresponding one
- the lateral target / actual deviation between the relative reference mark and the beam of the beam source deflection unit to be calibrated, in particular between the respective reference points of the cross-sectional areas, is recorded by means of the detector, which can be one of the detectors described in more detail below and a corresponding setting of the second beam source deflection unit is carried out on the basis of the target / actual deviation.
- the detector which can be one of the detectors described in more detail below and a corresponding setting of the second beam source deflection unit is carried out on the basis of the target / actual deviation.
- Each additional beam source deflection unit can be position-calibrated according to the procedure described above.
- individual beam source deflection units can be calibrated without having to calibrate all of the beam source deflection units.
- At least one detector is used to determine the target / actual deviation within the scope of the position calibration and / or the focus calibration.
- this is a global detector, which is arranged, in particular in the center, above the reference surface and preferably comprises a camera, and is used to determine the target / actual deviation between each reference mark and the beam of each beam source deflection unit used.
- the detection area of the global detector is larger than or equal to the reference area.
- this is a local detector, which is assigned in particular to one of the beam source deflection units and preferably comprises a camera, and is used to determine the target / actual deviation between each reference mark and the beam of the beam source assigned to it. Deflection unit used.
- the detection range of the detector then coincides at least partially with the detection range of the associated beam source deflection unit.
- the orientation of the detection area of the detector becomes common and in particular uniform with the orientation of the
- Embodiments are conceivable in which several local or global detectors or a combination of one or more local and one or more global detectors are used.
- Beam source deflection unit carried out and for this purpose, by means of the local and / or global detector, a target / actual deviation between a, for example computationally determined, predetermined lateral target expansion and / or target for the beam generated by the beam source deflecting unit.
- Intensity and a lateral actual extent and / or actual intensity of a beam generated by the beam source deflection unit are determined and an adjustment of the beam source deflection unit and / or the beam is corrected by the to minimize, eliminate, or set the target-actual deviation on the reference surface to a desired value.
- the detector (s) enable focus calibration by changing the lateral actual extent of a beam of a beam source deflection unit on the
- the beam of the beam source deflection unit to be calibrated therefore has a larger or smaller lateral actual dimension than the target dimension on the reference surface, the actual dimension of the beam source deflection unit is adapted to that of the target dimension.
- the position calibration and / or the focus calibration is carried out before and / or during a construction job.
- a virtual reference geometry on a reference surface Can be raised and lowered over the carrier plate, allows the calibration of one or more beam source deflection units during a construction job. It is particularly advantageous that potential displacements of the beams of the respective beam source deflection unit, due to a thermal load or mechanical setting, can be compensated for during the construction job.
- Alignment of a beam source deflection unit can be used, thereby reducing the number of reference marks to be generated for calibration.
- the main advantage of this reduction is that a compensation of displacements of the beam of a beam source deflection unit due to thermal stress can be carried out on the basis of a timely evaluation, so that the optical system to be measured during the calibration under thermal
- Calibration should preferably be carried out within one minute, preferably within 30 seconds.
- the calibration method according to the invention can preferably be carried out with a
- control unit being set up and designed to control the system in such a way that the calibration method described above
- the control unit is used during a calibration to evaluate the data from the detector (s) and then, on the basis thereof, specifies the corresponding setting of the beam source deflection unit, including the beam generated and emitted, in the calibration.
- the control unit is connected via signal connections to each beam source deflection unit, each unit for generating absolute reference marks and each detector.
- the control unit is preferably the same control unit that is also used for the control during the powder bed-based generation of
- the calibration method according to the invention can advantageously be used for a system for powder-bed-based generation of three-dimensional components by means of electromagnetic radiation, in particular a PBLS system, with a support plate that can be raised and lowered and a beam source deflection unit, the system using the control device described above and has a global and / or local detector and is thus set up and designed to carry out the previously described calibration method by means of the relative reference mark, or the control unit described above, has a device for generating absolute reference marks and a global and / or local detector and is therefore set up and is designed to carry out the previously described calibration method by means of the absolute and / or relative reference mark.
- the system for powder-bed-based generation of three-dimensional components by means of electromagnetic radiation is a PBLS system, it also includes a process chamber which has a chamber floor and within which at least the application medium is usually arranged and movably mounted.
- PBLS is vacuum or in a
- Process chamber designed gas-tight and it creates and maintains a vacuum or a corresponding protective gas atmosphere, in particular an inert gas atmosphere with argon, nitrogen or helium. Also in that
- a powder container and a powder overflow of the PBLS system create a vacuum or protective gas atmosphere, which is why they are connected to the process chamber in a gas-tight manner.
- a first thin one is made by means of the movable application medium, which can be designed, for example, as a brush, blade or rubber lip
- Powder layer of the material to be processed with a uniform layer thickness of usually 10 to 100 pm applied to a construction platform.
- Application medium is usually attached to a slide, which is required Movement of the application medium correspondingly movable, in particular
- the building platform is initially arranged in a starting position in which the surface of the building platform extends by the amount of the desired layer thickness below a horizontally extending and usually from the chamber floor or in its vicinity, i.e. up to approx. 3 mm above the chamber floor , formed working level. That is above and parallel to the working level
- Application medium can be moved over the slide to push or apply the powder to the build platform.
- a powder container can be arranged next to the construction platform
- So-called bottom-up powder delivery mechanism especially when the PBLS system is in operation, provide powder.
- the powder When driving over the powder container, the powder from below the bottom up powder feed mechanism
- Chamber bottom promotes in the direction of the chamber bottom and there via an opening of the powder container this provides for the application medium
- Component container with the build platform the application medium completely spans the opening of the respective container to between the build platform and the
- Working plane to be able to produce a uniform powder layer with a surface that is as flat as possible.
- the powder of the applied layer is then selectively or locally melted, preferably completely, by means of a laser beam, that is to say only in regions selected according to a 3D CAD model of the component to be manufactured, it being also possible to produce porous structures.
- the construction platform is lowered by the amount of a further desired layer thickness, and another powder layer is applied to the respective previous layer, melted and thereby compacted and connected to the previous layer. At least one of the previous layers is at least partially melted again to form a material bond
- Powder layer is in the component container between the build platform and the Working level also built a powder bed from unmelted powder of all applied layers, which surrounds the component. To remove components from the powder bed, the bottom of the
- Component container in the direction of the working level and thus in the direction of an upper opening of the component container opposite the floor and the construction platform to which the component is integrally connected via the first layer is removed from the PBLS system. The component is then removed from the
- the separation can be omitted if the construction platform is a preform that has become part of the component.
- FIG. 1 shows a view of a PBLS system with a laser scanner unit and an open process chamber
- FIG. 2 shows a view of a multiscanner PBLS system with two laser scanner units and an open process chamber
- FIG. 3 shows a view of a component container
- FIG. 4 shows a schematic cross-sectional view of the component container from FIG. 3
- FIG. 5 shows a schematic representation of a position calibration of the laser scanner unit of the PBLS system using an absolute reference mark and a global detector
- Figure 5a is a schematic representation of that described for Figure 5
- FIG. 6 shows a schematic representation of a position calibration of the laser scanner unit of the PBLS system using an absolute reference mark and a local detector
- Figure 6a is a schematic representation of that described for Figure 6
- FIG. 7 shows a schematic illustration of a focus calibration of the laser scanner unit of the PBLS system using an absolute reference mark and a global detector
- Figure 7a is a schematic representation of that described for Figure 7
- FIG. 8 shows a schematic illustration of a focus calibration of the laser Scanner unit of the PBLS system using an absolute reference mark and a local detector
- Figure 8a is a schematic representation of that described for Figure 8.
- Figure 9 is a schematic representation of a position calibration of one of two laser scanner units of the multiscanner PBLS system by means of a relative
- Figure 9a is a schematic representation of that described for Figure 9
- Figure 10 is a schematic representation of a position calibration of one of two laser scanner units of the multiscanner PBLS system by means of a relative
- Figure 10a is a schematic representation of that described for Figure 10
- Figure 1 1 is a schematic representation of a focus calibration of the laser scanner unit of the PBLS system using a local detector
- Figure 1 1a is a schematic representation of that described for Figure 11
- FIG. 1 shows a view of a PBLS system 1 with a beam source deflection unit designed as a laser scanner unit 2.
- the PBLS system 1 has one
- Process chamber which comprises a process chamber upper part 3 and a process chamber lower part 4. Beams of the scanner unit 2 arranged outside the process chamber can be coupled into the process chamber via at least one opening provided in the upper part 3, which is sealed gas-tight for example by means of glass.
- the lower part 4 is closed at the bottom via a chamber bottom 5 of the process chamber.
- the process chamber is opened in the view shown and opened for this purpose, for which purpose the upper part 3 has been pivoted upwards and laterally away from the stationary lower part 4 and the chamber base 5.
- a slide 8 is mounted so as to be translationally movable parallel to a chamber bottom 5 of the process chamber.
- An application medium 7, which can be designed, for example, as a brush, blade or rubber lip, is fastened to the slide 8, so that when it is closed
- the application medium 7 are moved translationally and parallel to the chamber bottom 5 of the process chamber can.
- the application medium 7 is used to distribute powder on a construction platform 6 that can be raised and lowered vertically relative to the chamber floor 5
- the powder is conveyed from a powder container 10 in addition to the construction platform 6 via a so-called bottom-up powder conveying mechanism from below the chamber base 5 in the direction of the chamber base 5 and is made available there for the application medium 7 via an opening 10a of the powder container 10.
- the powder container 10 or its bottom-up powder conveying mechanism can be supplied with powder via a storage container 9 connected to the powder container 10, in particular while the PBLS system 1 is in operation.
- the component is produced on the construction platform 6 using the PBLS method described above.
- a powder overflow 10b is arranged on a side of the building platform 6 opposite to the powder container 10a in the direction of movement of the slide 8 or the application medium 7 and opposite the powder container 10b, which picks up excess powder which does not fall off when the building platform 6 is passed over
- the building platform 6 is
- FIG. 2 shows a view of a multiscanner PBLS system 11 with two laser scanner units 2, both of which are assigned to the construction platform 6.
- the multiscanner PBLS system 11 can also have more than two laser scanner units. Otherwise, the statements relating to FIG. 1 also apply to the PBLS system 1 shown in FIG. 2.
- FIG. 3 shows a view of a component container 12. This is delimited laterally by the component container side wall 13.
- the construction platform 6 is fitted in accordance with the base area of the component container 12 within its component container side wall 13.
- the construction platform 6 can be formed, for example, by a substrate plate, from which the finished component has to be separated, or a preform, which becomes part of the component.
- the construction platform 6 is supported by a carrier plate 16 (not shown here) (see FIG. 4), which in turn is carried out together with the
- Construction platform 6 can be raised and lowered vertically within the component container 12 via a lifting drive.
- the linear actuator can be, for example Electromechanical lifting cylinder, ball screw drive, belt drive, pneumatic or hydraulic drive include.
- the lifting drive has one or more drive carriages 15 connected to the carrier plate 16 (see FIG. 4), which can then be moved vertically along one or more drive rails 14.
- FIG. 4 shows a schematic cross-sectional view of the component container 12 described in FIG. 3.
- the carrier plate 16 forms the movable bottom of the component container 12, which adjoins the working level 17 with an upper opening opposite the bottom below the working level 17.
- the carrier plate 16 is fitted and movable in the manner of a piston within the component container side wall 13 of the component container 12, which wall extends at right angles to the floor, so that it can be gradually lowered or raised in relation to the working plane 17 by means of the lifting drive.
- the construction platform 6 is carried by the carrier plate 16 and is arranged thereon, for example placed on or releasably fastened, in particular screwed or braced.
- a reference surface 30 is formed by the construction platform 6 arranged on the carrier plate 16. Otherwise, the statements relating to FIG. 3 also apply to the component container 12 shown in FIG. 4.
- FIG. 5 shows a schematic representation of a position calibration of the laser scanner unit 2 of the PBLS system 1 by means of a virtual, absolute
- the structure required for this position calibration comprises, in addition to the laser scanner unit 2, the global detector 26 and a unit 24 that generates the virtual, absolute reference mark, a control unit 28 and a reference surface 30 on which the absolute reference mark and the Laser beam 20 of the laser scanner unit 2 are projected.
- the laser scanner unit 2 comprises a laser beam source 18 and a deflection unit 19.
- the deflection unit 19 comprises a deflection mirror 21, two focusing lenses 22, at least one of which is movable, and two deflection mirrors 23.
- the laser scanner unit 2 is horizontal and / or vertical Movable direction.
- the unit 24 and the reference surface 30, by raising / lowering the support plate 16, can be moved vertically.
- the global detector 26 has a detection area 34 which is larger than the reference surface 30.
- the laser scanner unit 2 is controlled by the control unit 28 via the signal connection 29, so that the latter generates a laser beam 20 which is projected onto the reference surface 30 with a corresponding cross-sectional area (not shown).
- the unit 24 is controlled by the control unit 28 via the signal connection 29, so that it generates an electromagnetic beam 25 which projects the absolute reference mark with a corresponding cross-sectional area (not shown) onto the reference surface 30.
- a corresponding signal is transmitted to the control unit 28 via the signal connection 29 between the global detector 26 and the control unit 28 for evaluation.
- Control unit 28 evaluates the signal from detector 26 in that control unit 28 calculates and / or defines reference point 38 of laser beam 20, in particular the cross-sectional area generated thereby, and reference point 31 of the absolute reference mark, in particular the cross-sectional area generated thereby.
- the reference points 31, 38 are each represented by means of a cross-shaped marking on the reference surface 30.
- the control unit 28 then evaluates a target / actual deviation 33 between the reference points 31, 38 by determining a distance between the reference points 31, 38 and sends a signal via the to correct the corresponding setting of the laser scanner unit 2
- the procedure is therefore a position calibration using an absolute
- FIG. 5a shows a schematic illustration according to the position calibration described for FIG. 5.
- the reference points 31 and 38 lie here through the
- FIG. 6 shows a schematic representation of a position calibration of the beam source deflection unit 2 of the PBLS system 1 by means of an absolute
- Reference mark and a local detector 27 In contrast to
- Position calibration according to FIG. 5 is therefore a local instead of a global one
- the local detector 27 has a detection area 35 which is smaller than the reference surface 30 and is assigned to the laser scanner unit 2.
- the deflecting mirror 21 is designed and set up in such a way that appropriate electromagnetic rays can penetrate through it, which are reflected by the reference surface 30. Otherwise, the statements relating to FIG. 5 also apply to the embodiment shown in FIG. 6.
- FIG. 6a shows a schematic illustration after the position calibration described for FIG. 6.
- the reference points 31 and 38 lie here through the
- FIG. 7 shows a schematic illustration of a focus calibration of the laser scanner unit 2 of the PBLS system 1 by means of an absolute reference mark projected by the device 24 onto the reference surface 30 and a global detector 26.
- the focus calibration instead of the target / actual deviation 33 between the reference points of the laser beam 20 and the electromagnetic beam 25, the target / actual deviation 33 between the lateral actual extent 37 of the laser beam 20 and the lateral actual extent 36 of the electromagnetic beam 25 is determined.
- the lateral actual extent 37 of the laser beam 20 and the lateral actual extent 36 of the electromagnetic beam 25 are shown by means of a round marking on the reference surface 30. In this example, the lateral actual extent 37 of the laser beam 20 is larger than the lateral actual extent 36 of the electromagnetic beam 25.
- Focusing lens (s) 22 are changed such that the lateral actual extent 37 of the laser beam 20 matches the lateral actual extent 36 of the electromagnetic one Beam 25 matches. Otherwise, the statements relating to FIG. 5 also apply to the embodiment shown in FIG. 7.
- FIG. 7a shows a schematic illustration after the focus calibration described for FIG. 7.
- the lateral actual dimensions 37 and 36 are congruent one above the other due to the focus calibration carried out.
- FIG. 8 shows a schematic illustration of a focus calibration of the laser scanner unit 2 of the PBLS system 1 by means of an absolute reference mark projected by the device 24 onto the reference surface 30 and a local detector 27.
- a local detector 27 is used. Otherwise, the apply
- FIGS. 5, 6 and 7 also for the one shown in FIG. 8
- FIG. 8a shows a schematic illustration after the focus calibration described for FIG. 8.
- the lateral actual dimensions 37 and 36 are congruent one above the other due to the focus calibration carried out.
- FIG. 9 shows a schematic representation of a position calibration of one of two laser scanner units 2 of the multiscanner PBLS system 11 using a virtual, relative reference mark and a global detector 26
- Multiscanner PBLS system 11 has two laser scanner units 2.
- One laser scanner unit 2 is calibrated using the other laser scanner unit 2.
- the one laser scanner unit 2 generates a laser beam 20 which is projected onto the reference surface 30 and serves as a virtual, relative reference mark.
- the reference point 32 of this relative reference mark is calculated and / or defined by the control unit 28 and is shown by means of a cross-shaped marking on the reference surface 30.
- the other laser scanner unit 2 generates a laser beam 20 and also projects it onto the reference surface 30.
- the reference point 38 of the laser beam 20 is calculated and / or defined by the control unit 28 and is also shown by means of a cross-shaped marking on the reference surface 30.
- Reference mark the relative reference mark of one laser scanner unit 2 is used.
- FIG. 9a shows a schematic illustration after the position calibration described for FIG. 9.
- the reference points 32 and 38 are due to the
- FIG. 10 shows a schematic representation of a position calibration of one of two laser scanner units 2 of the multiscanner PBLS system 11 using a relative reference mark and a local detector 27.
- two are used instead of the global detector 26 , local detectors 27 assigned to the laser scanner units 2 are used in order to determine the target / actual deviation 33.
- FIGS. 6 and 9 also apply to the embodiment shown in FIG.
- FIG. 10a shows a schematic illustration according to that of FIG. 10
- the reference points 32 and 38 lie here one above the other due to the position calibration.
- FIG. 11 shows a schematic illustration of a focus calibration of the laser scanner unit 2 of the PBLS system 1 by means of a local detector 27
- Reference surface 30 projected absolute reference mark and a local detector 27 no absolute reference mark is used in this embodiment.
- the lateral target extent 39 is predetermined and is used by the control unit 28 to evaluate the target-actual deviation 33. The default can
- FIG. 11 a shows a schematic illustration of the laser scanner unit 2 of the PBLS system 1 after the focus calibration described for FIG. 1 1.
- the lateral actual extent 37 and the lateral target extent 39 of the laser beam 20 lie here by the focus calibration carried out congruently one above the other.
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Abstract
Description
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE102018128279.6A DE102018128279A1 (de) | 2018-11-12 | 2018-11-12 | Verbessertes Kalibrierverfahren für eine Anlage zum pulverbettbasierten Generieren von dreidimensionalen Bauteilen mittels elektromagnetischer Strahlung |
PCT/EP2019/081020 WO2020099402A1 (de) | 2018-11-12 | 2019-11-12 | Verbessertes kalibrierverfahren für eine anlage zum pulverbettbasierten generieren von dreidimensionalen bauteilen mittels elektromagnetischer strahlung |
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EP3880392A1 true EP3880392A1 (de) | 2021-09-22 |
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EP19805190.6A Pending EP3880392A1 (de) | 2018-11-12 | 2019-11-12 | Verbessertes kalibrierverfahren für eine anlage zum pulverbettbasierten generieren von dreidimensionalen bauteilen mittels elektromagnetischer strahlung |
Country Status (4)
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US (1) | US20220024122A1 (de) |
EP (1) | EP3880392A1 (de) |
DE (1) | DE102018128279A1 (de) |
WO (1) | WO2020099402A1 (de) |
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DE102022110658A1 (de) | 2022-05-02 | 2023-11-02 | Trumpf Laser- Und Systemtechnik Gmbh | Verfahren zum Vermessen einer Bauplattform einer generativen Fertigungsvorrichtung, Steuervorrichtung zur Durchführung eines solchen Verfahrens, generative Fertigungsvorrichtung mit einer solchen Steuervorrichtung, Verfahren zum generativen Fertigen eines Bauteils und Computerprogrammprodukt |
DE102022112241A1 (de) | 2022-05-16 | 2023-11-16 | Dmg Mori Additive Gmbh | Additive Fertigungsvorrichtung mit entkoppelter Prozesskammer und additives Fertigungsverfahren |
NL2033096B1 (en) * | 2022-09-21 | 2024-03-26 | Additive Ind Bv | An apparatus for producing an object by means of additive manufacturing and a method of calibrating the apparatus |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
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DE19649865C1 (de) | 1996-12-02 | 1998-02-12 | Fraunhofer Ges Forschung | Verfahren zur Herstellung eines Formkörpers |
DE102013208651A1 (de) * | 2013-05-10 | 2014-11-13 | Eos Gmbh Electro Optical Systems | Verfahren zum automatischen Kalibrieren einer Vorrichtung zum generativen Herstellen eines dreidimensionalen Objekts |
DE102016106403A1 (de) * | 2016-04-07 | 2017-10-12 | Cl Schutzrechtsverwaltungs Gmbh | Verfahren zur Kalibrierung wenigstens eines Scannsystems, einer SLS- oder SLM-Anlage |
DE102016011801A1 (de) * | 2016-09-30 | 2018-04-05 | Eos Gmbh Electro Optical Systems | Verfahren zum Kalibrieren einer Vorrichtung zum Herstellen eines dreidimensionalen Objekts und zum Durchführen des Verfahrens ausgebildete Vorrichtung |
US11325207B2 (en) * | 2017-01-20 | 2022-05-10 | General Electric Company | Systems and methods for additive manufacturing |
DE102017202725B3 (de) | 2017-02-21 | 2018-07-19 | SLM Solutions Group AG | Vorrichtung und Verfahren zum Kalibrieren eines Bestrahlungssystems, das zum Herstellen eines dreidimensionalen Werkstücks verwendet wird |
EP3607389B1 (de) * | 2017-04-04 | 2023-06-07 | Nlight, Inc. | Optische referenzerzeugung für die kalibrierung von galvanometrischen scannern |
EP3527352B1 (de) * | 2018-02-15 | 2020-06-03 | SLM Solutions Group AG | Vorrichtung und verfahren zur kalibrierung eines bestrahlungssystems einer vorrichtung zur herstellung eines dreidimensionalen werkstücks |
-
2018
- 2018-11-12 DE DE102018128279.6A patent/DE102018128279A1/de not_active Withdrawn
-
2019
- 2019-11-12 WO PCT/EP2019/081020 patent/WO2020099402A1/de active Search and Examination
- 2019-11-12 EP EP19805190.6A patent/EP3880392A1/de active Pending
- 2019-11-12 US US17/292,976 patent/US20220024122A1/en active Pending
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US20220024122A1 (en) | 2022-01-27 |
DE102018128279A1 (de) | 2020-05-14 |
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