EP3817509A1 - Verfahren zur regulierung eines resistiven elementes, das zum auftauen und/oder entfrosten einer halterung dient, und entsprechende vorrichtung - Google Patents

Verfahren zur regulierung eines resistiven elementes, das zum auftauen und/oder entfrosten einer halterung dient, und entsprechende vorrichtung Download PDF

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Publication number
EP3817509A1
EP3817509A1 EP20203056.5A EP20203056A EP3817509A1 EP 3817509 A1 EP3817509 A1 EP 3817509A1 EP 20203056 A EP20203056 A EP 20203056A EP 3817509 A1 EP3817509 A1 EP 3817509A1
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EP
European Patent Office
Prior art keywords
layer
support
resistive element
temperature
humidity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20203056.5A
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English (en)
French (fr)
Inventor
Thomas ALAVA
Zheng Han
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Publication date
Application filed by Commissariat a lEnergie Atomique CEA, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of EP3817509A1 publication Critical patent/EP3817509A1/de
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B1/00—Details of electric heating devices
    • H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227—Applications
    • H05B1/023—Industrial applications
    • H05B1/0236—Industrial applications for vehicles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60S—SERVICING, CLEANING, REPAIRING, SUPPORTING, LIFTING, OR MANOEUVRING OF VEHICLES, NOT OTHERWISE PROVIDED FOR
    • B60S1/00—Cleaning of vehicles
    • B60S1/02—Cleaning windscreens, windows or optical devices
    • B60S1/023—Cleaning windscreens, windows or optical devices including defroster or demisting means
    • B60S1/026—Cleaning windscreens, windows or optical devices including defroster or demisting means using electrical means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0221—Preprocessing measurements, e.g. data collection rate adjustment; Standardization of measurements; Time series or signal analysis, e.g. frequency analysis or wavelets; Trustworthiness of measurements; Indexes therefor; Measurements using easily measured parameters to estimate parameters difficult to measure; Virtual sensor creation; De-noising; Sensor fusion; Unconventional preprocessing inherently present in specific fault detection methods like PCA-based methods
    • A—HUMAN NECESSITIES
    • A42—HEADWEAR
    • A42B—HATS; HEAD COVERINGS
    • A42B3/00—Helmets; Helmet covers ; Other protective head coverings
    • A42B3/04—Parts, details or accessories of helmets
    • A42B3/18—Face protection devices
    • A42B3/22—Visors
    • A42B3/24—Visors with means for avoiding fogging or misting
    • A42B3/245—Visors with means for avoiding fogging or misting using means for heating, e.g. electric heating of the visor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
    • H01L29/1606—Graphene
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/24—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/685—Hi-Lo semiconductor devices, e.g. memory devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/013—Heaters using resistive films or coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/031—Heaters specially adapted for heating the windscreen wiper area

Definitions

  • the present invention relates to a method for regulating a resistive element intended to defrost and / or demist a support, in particular the surface of a support, and more particularly the surface of a support transparent in the visible range.
  • the present invention can be implemented for defrosting a car window, in particular its front windshield and / or the rear window, for defrosting a visor of a mask or a helmet.
  • the method according to the present invention provides in particular for optimizing the energy consumption of the resistive element.
  • the rear window of a motor vehicle is generally defrosted by a resistive element.
  • This resistive element may in particular comprise wires or metal strips (hereinafter “wires”) parallel in each other over the entire length or width of the rear window.
  • the wires when they are traversed by an electric current, dissipate a quantity of heat making it possible to melt frost which may be present on at least one of the inner face and the outer face of the bezel. back.
  • Motor vehicle de-icing systems are generally controlled by an on / off switch operated by the user (in particular the driver of the motor vehicle). In other words, starting up the defrosting system requires voluntary action by the user both for starting and stopping it.
  • a defrosting system using wires partially obstructs the driver's visibility so that the implementation of the latter for defrosting the windshield (front) of a motor vehicle, or a visor of a motor vehicle. 'a mask or helmet, can not be easily envisioned.
  • An aim of the present invention is therefore to provide a method for regulating a defrosting system, and the defrosting system, making it possible to better control the energy consumption of said defrosting system.
  • Another aim of the present invention is also to provide a method for regulating a defrosting system, and a defrosting system, making it possible to operate said system autonomously, and on objective criteria.
  • Another object of the present invention is also to provide a method for regulating a defrosting system.
  • the method according to the present invention makes it possible to control, according to objective criteria, and in a repeatable manner, the starting and stopping of the resistive element.
  • the monitoring loop a) is executed periodically, advantageously every two seconds.
  • the defrost sequence b) comprises: b1) a step of determining the thermal power P th on the basis of the temperature T and the humidity rate H monitored by the loop a) executed before step b2).
  • step b1) is executed by means of an abacus stored in a memory space of the computer, and making it possible to determine the thermal power P th as a function of the temperature T and the humidity rate H.
  • the resistive element comprises a stack of layers formed by a first layer and a second layer separated by an insulating layer, the first layer comprising a two-dimensional material with variable resistance under the effect of a field electric and is intended to dissipate the adjusted thermal power P th , while the second layer comprises a resistive material and is intended, when it is subjected to an electric potential V g , to impose an electric field on the first layer.
  • the thicknesses of the first and of the second layer are adjusted so that the transparency of the resistive element in the visible range is greater than 80%.
  • the regulation method as well as the resistive element, can be implemented on the front windshield of a motor vehicle without disturbing the visibility of the driver.
  • the resistive material is also a two-dimensional material with variable resistance under the effect of an electric field.
  • the defrosting sequence b) also comprises a step b3), executed before step b1), of determining the resistance R of the first layer as a function of a potential Vg applied to the second layer .
  • the adjustment of the thermal power P th comprises an adjustment of the electric potential V g .
  • the resistive element is formed on an exposed face of the support.
  • the support comprises a stack of two layers, called support layers, between which the resistive element is inserted.
  • the support is transparent in the visible range, in particular the support comprises either a window of a motor vehicle, or a visor of a helmet, or a visor of a mask.
  • the monitoring loop a) is also executed by means of a temperature and humidity sensor arranged on or in the support.
  • the invention also relates to a computer program comprising instructions which, when the program is executed by a computer, lead the latter to implement the regulation method according to the present invention.
  • the invention also relates to a resistive element arranged to defrost and / or demist a support, and controlled by a computer on which the computer program according to the present invention is stored.
  • the resistive element comprises a stack of layers formed by a first layer and a second layer separated by an insulating layer, the first layer comprising a two-dimensional material with variable resistance under the effect of a field electric and is intended to dissipate the adjusted thermal power P th , while the second layer comprises a resistive material and is intended, when it is subjected to an electric potential V g , to impose an electric field on the first layer.
  • the thicknesses of the first and of the second layer are adjusted so that the transparency of the resistive element in the visible range is greater than 80%.
  • the resistive material is also a two-dimensional material with variable resistance under the effect of an electric field.
  • the present invention relates to a method of regulating a resistive element intended to defrost and / or demist a support with which it is associated.
  • the regulation method is implemented by means of a computer which executes a monitoring loop of the temperature T and the humidity level of the support, and more particularly of a surface of said support.
  • the monitoring loop according to the present invention makes it possible in particular to detect, as a function of the temperature T and the humidity level H, the presence of frost and / or mist on the support.
  • the computer can also implement, as soon as the temperature T and the humidity level H indicate the presence of frost and / or humidity on the support, a defrosting and / or demisting loop.
  • the defrosting and / or demisting loop controls the resistive element so that the latter delivers a thermal power P th , adjusted as a function of the temperature T and the humidity rate H, and allowing defrosting or demisting of the support for a predetermined time D p , advantageously less than 2 seconds.
  • the figure 1 is a schematic representation of a resistive element 100 capable of being implemented within the framework of the present invention.
  • the resistive element 100 is an element which, when it is traversed by an electric current I, dissipates thermal power (therefore heat) intended to defrost and / or demist a support 200.
  • the resistive element 100 may comprise metal wires disposed on an exposed face of the support 200.
  • the resistive element 100 may comprise a layer or a stack of layers which is / are, according to a first variant, covering an exposed face of the support 200, and according to a second variant in the volume of the support 200. .
  • the support 200 comprises two layers, called support layers 201 and 202, between which the resistive element is inserted.
  • the support 200 is advantageously transparent in the visible range.
  • transparent in the visible range is understood to mean a transmission coefficient greater than 80%, advantageously 90%, even more advantageously 95%, in the visible range.
  • visible domain is understood to mean the range of wavelengths between 400 nm and 750 nm.
  • the support 200 can be rigid, and include for example glass, quartz.
  • the support 200 can be flexible and include a polyimide material, or polydimethylsiloxane, or polymethyl methacrylate (PMMA).
  • a polyimide material or polydimethylsiloxane, or polymethyl methacrylate (PMMA).
  • the support 200 can be a visor of a mask or a helmet, a window of a motor vehicle, for example a windshield or a rear window.
  • the resistive element 100 comprises a stack of layers 101 formed by a first layer 110 and a second layer 120 separated by an insulating layer 130.
  • insulating layer is meant a layer which is electrically insulating, and which, consequently, guarantees electrical insulation between the first layer 110 and the second layer 120.
  • the insulating layer 130 can in particular comprise a dielectric material, for example a glass or silicon dioxide or Hafnium oxide.
  • the thickness of the insulating layer can be between 100 nm and 100 ⁇ m.
  • the first layer 110 is advantageously a two-dimensional material.
  • two-dimensional material is meant a material which has a two-dimensional crystalline structure. Such materials generally comprise a stack of crystalline planes within which the atoms or molecules are linked by covalent bonds, while interactions of the Van der Walls type ensure cohesion between crystalline planes.
  • the two-dimensional material forming the first layer 110 also has an electrical resistance that varies as a function of an electric field to which it is likely to be subjected.
  • the materials capable of meeting the two aforementioned criteria are known to those skilled in the art, and can comprise at least one of the elements chosen from: graphene, MoS 2 , MOSe 2 , WS 2 , WSe 2 .
  • the thickness of the first layer 110 is adjusted by a person skilled in the art as a function of the transparency properties which he wishes to confer on the latter.
  • the first layer 110 can comprise between one and ten atomic layers of the two-dimensional variable resistance material.
  • the thicknesses of the first layer 110 and of the second layer 120 are adjusted so that the transparency of the resistive element 100 in the visible range is greater than 80%, advantageously greater than 90%, even more advantageously greater than 95%.
  • the second layer 120 comprises a resistive material, for example a conductive transparent oxide, or a two-dimensional material with variable resistance.
  • the second layer 120 is in particular designed so, when it is subjected to a given potential Vg (also called “gate potential”), to impose an electric field on the first layer 110.
  • Vg also called “gate potential”
  • the potential Vg imposed on the second layer makes it possible to vary the electrical resistance of the first layer 110.
  • figure 2 is a graphical representation of the electrical resistance R of a first layer 110 made of graphene as a function of the gate potential Vg imposed on a second layer also made of graphene.
  • the electrical resistance of the first layer describes a bell-shaped curve and exhibits a maximum.
  • This bell-shaped electrical resistance evolution curve also presents two inflection points revealed by the first derivative of the resistance as a function of the grid potential ( figure 3 ).
  • resistive element which comprises a first layer and a second layer made of graphene and between which is inserted a layer of dielectric material such as silicon dioxide.
  • the regulation process (illustrated in figure 4 ) of the resistive element 100 is executed by means of a computer 400 ( figure 6 ).
  • the term “computer” is understood to mean a device provided with a processor capable of executing commands, and in particular the commands of a computer program stored for example in a dedicated memory space of said computer 400.
  • the method of regulating the resistive element, illustrated in figure 4 comprises a monitoring loop a) of the temperature T and the humidity level H at the level of the support 200.
  • a “loop”, according to the terms of the present invention comprises one or more step (s) and is repeated, for example at regular time intervals.
  • the execution of a loop may be subject to conditions.
  • the monitoring loop a) can be executed at regular time intervals (or periodically), for example every minute or every thirty seconds, or every five seconds.
  • the monitoring loop a) can include a step a1) for measuring the temperature T and the humidity level H.
  • Step a1) can be carried out by means of one or more temperature and / or humidity sensors 300.
  • the figure 5 represents a sensor 300, in particular a temperature sensor.
  • This sensor 300 comprises in particular a single layer of graphene 310.
  • the temperature dependence of the electrical resistance of graphene makes it a material of choice for use in a temperature sensor.
  • the determination of the temperature with such a sensor 300 comprises a measurement of the electric voltage V between two terminals formed on the graphene when the latter is traversed by an electric current of a known intensity I.
  • the sensor 300 can be placed on or in the support 200, and thus allow a faithful estimation of the temperature T and / or of the humidity level H of said support 200.
  • the monitoring loop a) can also include a step a2) of determining the presence or absence of frost and / or mist on the support as a function of the temperature T and the humidity level H measured on the support 200 during step a1).
  • the regulation method also comprises a sequence b) of defrosting and / or demisting.
  • the sequence b) controls, during a step b2), the injection of an electric current I into the resistive element 100 so that the latter dissipates a thermal power P th , adjusted as a function of the temperature T and the humidity level H, and allowing the defrosting or demisting of the support for the predetermined time D p .
  • the predetermined duration is advantageously less than 20 seconds, even more advantageously less than 5 seconds, and preferably less than 2 seconds.
  • resistive element 100 is associated with a current source.
  • the latter can, for example, be integrated into the computer 400.
  • sequence b) leaves resistive element 100 inactive. In other words, no electric current flows through the resistive element 100.
  • the electric current I within the framework of the stack of layers considered, circulates in the first layer 110.
  • the adjustment of the thermal power P th (step b1), figure 4 ) advantageously comprises an adjustment of the gate potential Vg (step b1 '), figure 4 ) imposed on the second layer 120. More particularly, the gate potential Vg is adjusted so that the first layer 110 has an electrical resistance R th to the passage of the electric current I allowing the dissipation of the thermal power P th for the predetermined time D p .
  • a first layer comprising a two-dimensional variable resistance material makes it possible to consider a fixed source of electric current.
  • the determination of the thermal power P th can be carried out on the basis of a numerical simulation or of ab initio calculations which are within the reach of a person skilled in the art.
  • the determination of the thermal power P th can use a calibration curve or an abacus stored in a memory space of the computer 400.
  • the abacus considered makes it possible to determine, from the temperature T and the humidity rate H, the thermal power P th necessary for the melting of the frost or for the evaporation of the mist likely to have formed. on the support.
  • This abacus can in particular be constructed experimentally.
  • the construction of the abacus can include determining the thermal power P th necessary for the melting of the frost or for the evaporation of the mist likely to have formed on the support at a temperature T and a rate of humidity H given.
  • the determination of the thermal power P th can comprise the measurement of the time required to melt frost or evaporate mist when the first layer 110 is traversed by a current I.
  • This step can include a simple observation of the complete disappearance of the frost or the mist, and ends with a measurement of the temperature T and the humidity level of the support 200.
  • This protocol can be repeated as many times as necessary and for different couples of temperature T and humidity rate H.
  • the Mollier diagram shown in figure 7 can be considered.
  • This diagram is a graphical representation of the gaseous liquid state changes of water at a surface as a function of temperature (in “° C” along the horizontal axis) and absolute humidity (in “ g of water / kg of dry air ”along the vertical axis).
  • the temperature and humidity define a saturation of carbonated water in air of 50%.
  • the temperature decreases, for example at the temperature defined by point “A”, a phenomenon of water condensation occurs, and liquid water forms on the surface. considered (this is the dew point).
  • the time t c , the electrical resistance R th as well as the fixed current then make it possible to determine the power P th required to demist the surface under particular temperature and humidity conditions.
  • the regulation method according to the present invention therefore makes it possible to optimize the thermal power necessary for defrosting and demisting a support 200.
  • the starting and stopping of the resistive element according to a possible formation of frost or mist on the support is carried out in a manner automatic based on objective and repeatable criteria, and therefore no longer require the intervention of an operator.
  • first transparent layer 110 and a second transparent layer 120 make it possible to envisage the implementation of the resistive element according to the present invention also for defrosting a windshield of a motor vehicle, or a visor of a mask or helmet.
  • the defrosting sequence b) can also include a step b3) of determining the electrical resistance R of the first layer 110 as a function of the gate potential Vg capable of being applied to the second layer 120.
  • step b3) comprises an acquisition by the computer 400 of the voltage V at the level of two terminals of the first layer crossed by a known electric current I, and for different values of the gate potential Vg.
  • the present invention also relates to a computer program, which when it is executed by a computer 400, leads the latter to implement the method for regulating the resistive element 100.
  • the present invention also relates to the resistive element for defrosting and / or demisting a support, and controlled by the computer 400 on which the computer program is stored.
  • the resistive element comprises the stack of layers 101 formed by the first layer 110 and the second layer 120 separated by the insulating layer 130.
  • the first layer may comprise a two-dimensional material with variable resistance under the effect of an electric field and is intended to dissipate the adjusted thermal power P th
  • the second layer may comprise a resistive material and is intended, since it is subjected to an electric potential V g , to impose an electric field on the first layer.
  • the thicknesses of the first 110 and of the second layer 120 can be adjusted so that the transparency of the resistive element in the visible range is greater than 80%.
  • the resistive material can also comprise a two-dimensional material with variable resistance under the effect of an electric field.
  • the resistive element is formed on an exposed face of the support.
  • the support comprises two layers, called support layers, between which the resistive element is inserted.
  • the support can be transparent in the visible range, in particular the support can comprise either a window of a motor vehicle, or a visor of a helmet, or a visor of a mask.
  • the figures 7a to 7e show an example of a method of manufacturing the resistive element in a support 200 provided with two support layers 201 and 202.
  • the support 200 is in particular a windshield.
  • the method comprises a first step 1) of forming the second layer 120 on one of the support layers, for example the support layer 202.
  • the second layer can comprise graphene by dispersion (“spray coating” according to Anglo-Saxon terminology).
  • the first step 1) is followed by a second step 2) of forming the insulating layer 130.
  • the insulating layer 130 can comprise SiO 2 , HfO 2 and be formed by a vapor deposition technique (“CVD”). or “Chemical Vapor Deposition” according to Anglo-Saxon terminology).
  • a third step 3) of forming the first layer 110 covering the insulating layer 130 is then carried out in the same way as the first step.
  • Step 4) is then followed by a fifth step 5) of covering the first layer 110 with the support layer 201.
  • one or more temperature and / or humidity sensors can be formed on the support.
  • the resistive element 100, and optionally the sensor (s) 300 can be interfaced with the computer 400.
  • the computer 400 can in particular include an execution unit 401, intended to implement the sequence b), and a data processing unit 402 intended to collect the temperature and the humidity level measured by the sensor (s) 300, and determine the conditions for implementing the defrosting and / or demisting sequence.
  • an execution unit 401 intended to implement the sequence b
  • a data processing unit 402 intended to collect the temperature and the humidity level measured by the sensor (s) 300, and determine the conditions for implementing the defrosting and / or demisting sequence.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Mechanical Engineering (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Investigating Or Analyzing Materials Using Thermal Means (AREA)
EP20203056.5A 2019-10-28 2020-10-21 Verfahren zur regulierung eines resistiven elementes, das zum auftauen und/oder entfrosten einer halterung dient, und entsprechende vorrichtung Pending EP3817509A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1912031A FR3102636B1 (fr) 2019-10-28 2019-10-28 procédé de régulation d’un élément résistif destiné à dégivrer et/ou désembuer un support, et le dispositif associé

Publications (1)

Publication Number Publication Date
EP3817509A1 true EP3817509A1 (de) 2021-05-05

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EP20203056.5A Pending EP3817509A1 (de) 2019-10-28 2020-10-21 Verfahren zur regulierung eines resistiven elementes, das zum auftauen und/oder entfrosten einer halterung dient, und entsprechende vorrichtung

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US (1) US12082314B2 (de)
EP (1) EP3817509A1 (de)
FR (1) FR3102636B1 (de)

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