EP3697727B1 - Method for manufacturing a microstructured device - Google Patents

Method for manufacturing a microstructured device Download PDF

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Publication number
EP3697727B1
EP3697727B1 EP18786360.0A EP18786360A EP3697727B1 EP 3697727 B1 EP3697727 B1 EP 3697727B1 EP 18786360 A EP18786360 A EP 18786360A EP 3697727 B1 EP3697727 B1 EP 3697727B1
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Prior art keywords
ink
substrate
pattern
polymer
printing
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EP18786360.0A
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German (de)
French (fr)
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EP3697727A1 (en
Inventor
Florent MALLOGGI
Rémy BROSSARD
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Universite de Versailles Saint Quentin en Yvelines
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
Universite de Versailles Saint Quentin en Yvelines
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00Subject matter not provided for in other groups of this subclass
    • B81C99/0075Manufacture of substrate-free structures
    • B81C99/009Manufacturing the stamps or the moulds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/05Microfluidics
    • B81B2201/058Microfluidics not provided for in B81B2201/051 - B81B2201/054
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0174Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
    • B81C2201/0183Selective deposition
    • B81C2201/0184Digital lithography, e.g. using an inkjet print-head
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/03Processes for manufacturing substrate-free structures
    • B81C2201/034Moulding

Definitions

  • the invention relates to the field of microstructured devices.
  • the invention proposes a method for manufacturing a microstructured device, in particular a microfluidic device.
  • Micromachining consists of directly machining a microstructure (for example a channel for microfluidic applications, or a cavity for other applications) in a plastic material. The plastic material is then bonded to a substrate to form the channels.
  • Photolithography uses the classic techniques of microelectronics. For example, one can refer to C. Iliescu, Microfluidics in Glass: Technologies and Applications. Informacije MIDEM 36(2006), vol. 4 or at Y. Xia & al., Soft lithography, Angew. Chem. Int. Ed. 1998, vol. 37, p. 550-575 , depending on the nature of the substrate.
  • the critical step lies in the elimination of the pattern, necessary to achieve the microstructure.
  • a classic approach to removing the pattern is to apply a jet of fluid (especially water) under high pressure.
  • the problem with this approach is that it involves mechanical stresses on the substrate and on the envelope, and in particular at the level of the interface between the envelope and the substrate. It is therefore possible to unseal the microstructured device and, if this is not the case, to deform it.
  • this approach can only work for microfluidic applications (presence of a channel and consequently of openings allowing the evacuation of the pattern by the jet of fluid. In other words, this approach is not applicable when the pattern serves to form a cavity, as may be the case for other applications (optics, for example).
  • Another approach is to use a particular pattern.
  • US2014/183044 And US 2005/151285 disclose methods of fabricating a microstructured device on a substrate using a solidified ink layer as the sacrificial material which is used to form the particular shape of a polymeric structure deposited on the ink layer.
  • an object of the invention is to propose an improved method of manufacturing a microstructured device.
  • one objective of the invention is to be able to broaden the range of materials which can be envisaged for producing the device.
  • another objective of the invention is to be able to have access to fields other than microfluidics, in which the pattern aims to form a cavity.
  • a microstructure is a structure of which at least two dimensions are less than 1000 microns.
  • This method can be implemented in different ways.
  • the device 100 comprises a substrate 1 and a device 10 for printing by inkjet on the substrate 1.
  • the device 10 for printing by ink jet comprises a reservoir 11 in which ink is located, a heating means 12 for the ink located in the reservoir 11, a printing nozzle 13 and a heating means 14 for the ink located in the print nozzle 13.
  • the device 100 also comprises a first platen 20 mounted on the device 10 for inkjet printing.
  • This first plate allows said device 10 to move along a predefined axis, in this case on the figure 1 , along the vertical axis OZ (vertical axis). It is thus possible to adjust as desired the distance, taken along the axis OZ, between the outlet S of the printing nozzle 13 and the substrate 1.
  • Device 100 also includes a second plate 30 on which substrate 1 is mounted.
  • This second plate 30 allows the movement of the substrate 1 in the horizontal plane (O, X, Y).
  • This horizontal plane is also the plane in which the substrate 1 extends. This makes it possible to give the desired shape to the ink (pattern deposited during step b) on the substrate 1.
  • the substrate 1 could be inclined, that is to say present an orientation comprising a component along the OZ (vertical) axis, and in particular with an inclination of up to 45° with respect to the OX axis.
  • the device 100 can comprise a cooler, operating for example by the Peltier effect.
  • This cooler 40 can be useful when the ink used, heated at the level of the jet printing device 10 of ink, needs to be cooled quickly.
  • the device 100 can provide a means 50 for discharging the heat between the cooler 40 and the second plate 30.
  • the ink used by this ink jet printing technique has a viscosity of less than or equal to 30 mPa.s ⁇ 1 .
  • the implementation of the method according to the invention with the second device 100' is based on the use of a syringe 10' containing the ink, instead of the device 10 for printing by ink jet of the first device 100.
  • the syringe 10' comprises a reservoir 11' in which the ink is located, a piston 15' to be able to eject the ink from said reservoir 11' and a heating means 12' to heat the ink present in tank 11'.
  • the outlet of the syringe 10' is called S'.
  • this second device 100′ it is thus possible to use inks whose viscosity is higher than with the first device 100.
  • an inkjet printing technique printing nozzle
  • the use of a syringe certainly makes it possible to remove such a constraint and to have access to inks, which although not solid, present a viscosity greater than 30 mPa.s -1 .
  • the substrate provided in step a) may be a hydrophobic material, chosen in particular from: polyimides (PI), silicones including polydimethylsiloxane (PDMS), polypropylene (PP), polytetrafluoroethylene (PTFE) or the copolymer of cyclic olefin (COC).
  • PI polyimides
  • PDMS polydimethylsiloxane
  • PP polypropylene
  • PTFE polytetrafluoroethylene
  • COC copolymer of cyclic olefin
  • the substrate provided in step a) may be a hydrophilic material, chosen in particular from silicon, glass, cellulose, glass fibers.
  • the polymer intended to form the envelope may be chosen from polydimethylsiloxane (PDMS), polyimides, agarose gels or certain glues (acrylic, for example).
  • PDMS polydimethylsiloxane
  • polyimides polyimides
  • agarose gels or certain glues (acrylic, for example).
  • the substrate can be treated to improve its adhesion strength with the ink to be deposited and/or the polymer intended to form the envelope.
  • the advantage of such a treatment depends mainly on the nature (type of material used) of the substrate.
  • This treatment can be chosen from among a plasma treatment, in particular at reduced pressure and under a flow of oxygen, a treatment by ultraviolet-ozone or a treatment by chemical oxidation.
  • the frequencies of ejection of the drops and the relative displacement speed mentioned above make it possible to manage the distance separating two drops successively deposited on the substrate. From a very practical point of view, the drops should not be too far apart if one wants to obtain a microstructure of controlled size (this is particularly the case for an application microfluidics for which we seek to define a channel). Conversely, the drops should also not be too close to correctly manage the thickness of the pattern.
  • the size of a drop makes it possible to manage the quantity of ink deposited locally on the substrate, which has in particular an influence on the width and the thickness of the pattern.
  • the three parameters mentioned above contribute to the definition of the geometry of the pattern deposited on the substrate.
  • the flow rate of ink dispensed and the relative displacement speed mentioned above make it possible to manage the quantity of ink deposited locally on the substrate, which has in particular an influence on the width and the thickness of the pattern.
  • the substrate can be cooled to a temperature below the solidification temperature of the ink.
  • this makes it possible to accelerate the solidification of the ink on the substrate.
  • This makes it possible, for certain inks, to improve the control of the geometry of the pattern deposited in step b).
  • the ejection or deposition conditions often allow complete control of the geometry of the pattern deposited on the substrate, it turns out that, for certain inks, this cooling avoids excessive spreading of the drop on the substrate. before its solidification. This makes it possible to retain the geometry of the desired pattern with the ejection or deposition conditions mentioned previously. Another consequence is that this makes it possible to accelerate the manufacture of the microstructured device.
  • cooling of the substrate can be managed by a Peltier effect cell.
  • Step b) can be carried out under vacuum (high vacuum) or under a neutral atmosphere, for example under air.
  • a neutral atmosphere in particular in air
  • Working under air at atmospheric pressure facilitates implementation.
  • Step c) can be carried out by pouring the polymer onto the substrate printed by the pattern.
  • the polymer, intended to form the envelope is then deposited in liquid form.
  • the polymer chosen to form the envelope is immiscible with the ink (pattern). Otherwise, it would not be possible to obtain the microstructured device, namely to simply define a cavity or a channel.
  • the polymer comprises an additive capable of allowing the crosslinking of the polymer intended to form the envelope, during the subsequent stage d).
  • the polymer/additive mixture is prepared upstream so that a polymer containing this additive is poured (poured).
  • Step d) crosslinking of the envelope is therefore based on the presence of this additive.
  • This additive can be a cross-linking agent such as methylhydrosiloxane, a photo-initiator such as 1-Hydroxy-cyclohexyl-phenyl-ketone or a solvent such as formaldehyde.
  • a cross-linking agent such as methylhydrosiloxane
  • a photo-initiator such as 1-Hydroxy-cyclohexyl-phenyl-ketone
  • a solvent such as formaldehyde.
  • the crosslinking can be carried out at ambient temperature, possibly aided by low heating to accelerate the crosslinking. Still when the additive is a crosslinking agent, and if the nature of the crosslinking agent and/or that of the polymer does not allow crosslinking at ambient temperature, the crosslinking can be carried out by heating.
  • the crosslinking can be carried out by subjecting the polymer to ultraviolet radiation.
  • a photo-initiator can in particular be envisaged with certain adhesives, which then become crosslinkable by ultraviolet rays.
  • the crosslinking takes place by simple evaporation of the solvent, which generally takes place at room temperature. Once the solvent has evaporated, the polymer crosslinks.
  • step d the negative pattern (ink) is in solid form.
  • the crosslinking temperature of the polymer should be lower than the melting temperature of the polymer. ink, even if the crosslinking can provide, in order to finalize the crosslinking, a brief passage at a temperature higher than the melting temperature of the pattern. In the latter case, a small part of the pattern may liquefy, but since the polymer is for the most part already crosslinked, this then does not involve any modification of the interface between the pattern and the envelope.
  • crosslinking at room temperature, for 24 hours, followed by finalization of the crosslinking at higher temperature, in particular above the melting point of the pattern, without however spend this pattern in the gaseous state, for a few tens of minutes, or even an hour.
  • the polymer forming the envelope may have a crosslinking temperature less than or equal to 90% of the melting point of the ink (pattern).
  • step e) is carried out by heating and by applying a pressure differential between the inside of the assembly formed at the end of step d) and the outside.
  • This makes it possible to place oneself, in the phase diagram of the ink (pattern), on a pressure/temperature couple which directly allows the transition from the solid state to the vapor state.
  • it is particularly advantageous because the level of heating of the assembly formed in step d), and therefore the energy expended, is limited to put the pattern in the form of vapor and therefore eliminate it in order to form the microstructure (cavity, channel, etc.).
  • step e) is carried out by heating in order to ensure the liquefaction, then the vaporization of the ink (pattern).
  • the envelope must remain in solid form. And it is therefore for this reason that the polymer chosen for the envelope must have a melting temperature (transition from the solid state to the liquid state) strictly higher than the sublimation temperature of the ink (pattern), or as the case may be, higher than the evaporation temperature of the ink (pattern).
  • step e This ensures that the envelope remains in place during the implementation of step e).
  • the polymer forming the envelope may have a melting temperature strictly greater than or equal to 110% of the sublimation temperature or, as the case may be, of the evaporation temperature of the ink forming the pattern.
  • a melting temperature strictly greater than or equal to 110% of the sublimation temperature or, as the case may be, of the evaporation temperature of the ink forming the pattern.
  • annealing makes it possible to reduce the roughness of the pattern deposited in step b). Indeed, once the pattern has solidified and despite the care given to the deposition conditions, it can be seen that the pattern, in solid form, has a non-negligible roughness. Consequently, this roughness may be found on the microstructure to be formed (negative). In particular, for microfluidic applications, the roughness can change the flow conditions in the microstructure (channel) and consequently the pressure drops and/or the heat exchanges. For other applications, for example in optics, it is understood that this roughness within the microstructure (cavity) can also modify the analysis conditions.
  • annealing like any annealing, will be carried out at a temperature strictly below the melting temperature of the pattern (ink) deposited in step b) on the substrate and typically in a range of values between 10 % and 80% of the melting temperature of the pattern (ink, in solid form).
  • a cavity may be of interest for certain applications, for example in optics or acoustics.
  • the method will be more particularly for manufacturing a microfluidic device, in which the microstructure is a channel (therefore comprising openings, such as an inlet and an outlet for a fluid).
  • the printing carried out during step b), is carried out so that each end of the negative pattern of said at least one channel of the microfluidic device to be manufactured is located at the edge of the substrate, so that each end can, on the device to be manufactured, form a channel opening, such as a fluid inlet or outlet.
  • a microfluidic connection may also be made to place a microfluidic connection, partly at the level of the region of the pattern which is intended to form a channel opening. and partly outside the substrate; then applying ink between said connection and the pattern.
  • connection thus formed which forms an integral part of the fabricated microfluidic device, then protrudes partly from the substrate (and therefore from the envelope). This therefore greatly facilitates the fluidic connection to an external system.
  • a polyimide substrate was supplied (step a)), in this case a Kapton® HN offered by the company DuPont de Nemours.
  • the Kapton® HN used is stable at the temperatures used in this example.
  • this ink was heated to 65°C (therefore, in liquid form) to carry out the printing on the substrate, according to the inkjet printing technique (this temperature allows in particular to ensure that the dynamic viscosity of the liquid ink is less than 30 mPa.s).
  • the print nozzle was positioned 5mm from the substrate.
  • Each drop of ink ejected from the print nozzle had a diameter of 60 ⁇ m.
  • the drops were ejected from the print nozzle at a frequency of 100Hz.
  • the relative speed between the printing nozzle and the substrate was 4mm/s.
  • each end of the negative pattern of the microstructure to be manufactured is located at the edge of the substrate, so that each end can, on the device to be manufactured, form a channel opening (an entrance and a fluid outlet).
  • the substrate was cooled to -10°C (with a Peltier effect cell) to ensure faster solidification of the ink.
  • Envelope (polymer) The polymer used is polydimethylsiloxane (PDMS), in this case Sylgard ® 184.
  • PDMS polydimethylsiloxane
  • This polymer was mixed with a crosslinking agent, in this case methylhydrosiloxane, in a mass ratio of 1/10 (1 for the crosslinking agent and 10 for the polymer).
  • a crosslinking agent in this case methylhydrosiloxane
  • the polymer thus prepared was cast, at room temperature, on the substrate printed with the pattern, to implement step c).
  • crosslinking step d) was implemented: crosslinking for 24 hours at room temperature.
  • the PDMS mentioned above is stable over the temperature range of -45°C to 200°C.
  • Step e) was then carried out.
  • step d) the assembly obtained at the end of step d) was heated to a temperature of 100° C. and under a pressure of 0.1 bar.
  • the Kapton® substrate (Example 1) is replaced by a glass substrate.
  • the printing step was carried out under air, with a relative humidity of less than 15%.
  • the glass has a hydrophilic nature whereas the Kapton® used as substrate in Example 1 has a hydrophobic nature.
  • a device comprising an envelope on a substrate.
  • the cohesion between the envelope and the substrate is relatively weak.
  • the step of treatment (plasma, etc.) of the substrate mentioned above can be provided.
  • the substrate is made of glass.
  • the printing step was carried out under air, with a relative humidity of less than 15%.
  • step b the printing step for which several successive layers of ink are printed on top of each other.
  • this is done by making one or more additional passes of the printing nozzle, above the first layer of ink deposited in the first pass, the conditions of deposition of the or each pass additional being identical to the conditions of deposit of the first passage.
  • the substrate is made of glass.
  • the printing step was carried out under air, with a relative humidity of less than 15%.
  • step b) is carried out in a specific way in order to be able to manufacture intersecting channels.

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  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Micromachines (AREA)
  • Ink Jet (AREA)

Description

L'invention concerne le domaine des dispositifs microstructurés.The invention relates to the field of microstructured devices.

Plus précisément, l'invention propose un procédé de fabrication d'un dispositif microstructuré, notamment un dispositif microfluidique.More specifically, the invention proposes a method for manufacturing a microstructured device, in particular a microfluidic device.

Il existe différentes techniques pour fabriquer des dispositifs microstructurés.There are different techniques for fabricating microstructured devices.

Parmi ces techniques, on peut citer la microfabrication, qui couvre notamment le micro-usinage ou la photolithographie. Le micro-usinage consiste à usiner directement une microstructure (par exemple un canal pour les applications microfluidiques, ou une cavité pour d'autres applications) dans un matériau plastique. Le matériau plastique est ensuite collé à un substrat pour former les canaux. La photolithographie reprend les techniques classiques de la microélectronique. On peut par exemple se référer à C. Iliescu, Microfluidics in Glass : Technologies and Applications. Informacije MIDEM 36(2006), vol. 4 ou à Y. Xia & al., Soft lithography, Angew. Chem. Int. Ed. 1998, vol. 37, pp. 550-575 , selon la nature du substrat.Among these techniques, mention may be made of microfabrication, which notably covers micromachining or photolithography. Micromachining consists of directly machining a microstructure (for example a channel for microfluidic applications, or a cavity for other applications) in a plastic material. The plastic material is then bonded to a substrate to form the channels. Photolithography uses the classic techniques of microelectronics. For example, one can refer to C. Iliescu, Microfluidics in Glass: Technologies and Applications. Informacije MIDEM 36(2006), vol. 4 or at Y. Xia & al., Soft lithography, Angew. Chem. Int. Ed. 1998, vol. 37, p. 550-575 , depending on the nature of the substrate.

Plus récemment, il a été proposé de s'appuyer sur les possibilités offertes par l'impression, en particulier l'impression par jet d'encre. On pourra par exemple se référer à N. Bhattacharjee & al., Lab Chip, 2016, vol. 16, pp. 1720-1742 pour identifier les différentes sous-techniques susceptibles d'être classées dans la technique d'impression.More recently, it has been proposed to rely on the possibilities offered by printing, in particular inkjet printing. For example, we can refer to N. Bhattacharjee & al., Lab Chip, 2016, vol. 16, p. 1720-1742 to identify the various sub-techniques that may be classified under printing technique.

Parmi ces sous-techniques entrant dans le cadre de l'impression, l'impression par jet d'encre, ou ce qui revient sensiblement au même, l'impression par l'intermédiaire d'une seringue comportant l'encre, est largement utilisée. Ici, l'idée est de déposer sur un substrat, une encre destinée à se solidifier et à former un motif en négatif d'une microstructure (par exemple un canal pour les applications microfluidiques) du dispositif en cours de fabrication. Le motif et le substrat sont ensuite recouverts par une enveloppe. Puis, le ou chaque motif en négatif est éliminé. Il reste alors l'enveloppe sur le substrat, la microstructure étant alors formée dans l'enveloppe.Among these sub-techniques falling within the scope of printing, inkjet printing, or what amounts to substantially the same thing, printing via a syringe comprising the ink, is widely used. . Here, the idea is to deposit on a substrate an ink intended to solidify and to form a negative pattern of a microstructure (for example a channel for microfluidic applications) of the device being manufactured. The pattern and the substrate are then covered by an envelope. Then, the or each negative pattern is eliminated. There then remains the envelope on the substrate, the microstructure then being formed in the envelope.

Ici, l'étape critique réside dans l'élimination du motif, nécessaire pour réaliser la microstructure.Here, the critical step lies in the elimination of the pattern, necessary to achieve the microstructure.

Une approche classique pour éliminer le motif consiste à appliquer un jet de fluide (eau, notamment) sous haute pression. Le problème de cette approche est qu'elle implique des contraintes mécaniques sur le substrat et sur l'enveloppe, et en particulier au niveau de l'interface entre l'enveloppe et le substrat. On peut donc desceller le dispositif microstructuré et si ce n'est pas le cas, le déformer.A classic approach to removing the pattern is to apply a jet of fluid (especially water) under high pressure. The problem with this approach is that it involves mechanical stresses on the substrate and on the envelope, and in particular at the level of the interface between the envelope and the substrate. It is therefore possible to unseal the microstructured device and, if this is not the case, to deform it.

Par ailleurs, cette approche ne peut fonctionner que pour des applications microfluidiques (présence d'un canal et en conséquence d'ouvertures permettant l'évacuation du motif par le jet de fluide. Autrement dit, cette approche n'est pas applicable lorsque le motif sert à former une cavité, comme cela peut être le cas pour d'autres applications (optique, par exemple).Moreover, this approach can only work for microfluidic applications (presence of a channel and consequently of openings allowing the evacuation of the pattern by the jet of fluid. In other words, this approach is not applicable when the pattern serves to form a cavity, as may be the case for other applications (optics, for example).

Une autre approche consiste à employer un motif particulier.Another approach is to use a particular pattern.

Ainsi, l'article de Thierrault et al, « Chaotic mixing in three-dimensional microvascular networks fabricated by direct-write assembly », Nature materials, vol. 2, Avril 2003, pp. 265-347 , propose l'emploi d'une encre organique de type paraffine, laquelle se présente sous la forme d'une pâte à température ambiante. Cette pâte est alors liquéfiée (par chauffage) et aspirée vers l'extérieur.Thus, the article of Thierrault et al, “Chaotic mixing in three-dimensional microvascular networks fabricated by direct-write assembly”, Nature materials, vol. 2, April 2003, p. 265-347 , proposes the use of an organic ink of the paraffin type, which is in the form of a paste at room temperature. This paste is then liquefied (by heating) and sucked out.

Avec cette autre approche, le risque de desceller ou déformer le dispositif microstructuré est amoindri.With this other approach, the risk of unsealing or deforming the microstructured device is reduced.

Cependant, cette autre approche reste limitée à un type particulier d'encre. Cela limite donc les types de dispositifs que l'on peut obtenir.However, this other approach remains limited to a particular type of ink. This therefore limits the types of devices that can be obtained.

Par ailleurs, cette autre approche reste également limitée aux applications microfluidiques, dans la mesure où il reste nécessaire d'avoir des ouvertures pour évacuer le motif une fois liquéfié.Moreover, this other approach also remains limited to microfluidic applications, insofar as it remains necessary to have openings to evacuate the pattern once liquefied.

US2014/183044 et US 2005/151285 divulguent des procédés de fabrication d'un dispositif microstructuré sur un substrat en utilisant une couche d'encre solidifiée comme matériau sacrificiel qui est utilisé pour former la forme particulière d'une structure polymère déposée sur la couche d'encre. US2014/183044 And US 2005/151285 disclose methods of fabricating a microstructured device on a substrate using a solidified ink layer as the sacrificial material which is used to form the particular shape of a polymeric structure deposited on the ink layer.

Ainsi, un but de l'invention est de proposer un procédé de fabrication amélioré d'un dispositif microstructuré.Thus, an object of the invention is to propose an improved method of manufacturing a microstructured device.

En particulier, un objectif de l'invention est de pouvoir élargir la gamme de matériaux envisageables pour réaliser le dispositif.In particular, one objective of the invention is to be able to broaden the range of materials which can be envisaged for producing the device.

En particulier également, un autre objectif de l'invention est de pouvoir avoir accès à d'autres domaines que la microfluidique, dans lesquels le motif vise à former une cavité. Dans ce cas, il est en effet important de pouvoir évacuer le motif sans la présence d'ouvertures permettant cette évacuation.Also in particular, another objective of the invention is to be able to have access to fields other than microfluidics, in which the pattern aims to form a cavity. In this case, it is indeed important to be able to evacuate the pattern without the presence of openings allowing this evacuation.

A cet effet, l'invention propose un procédé de fabrication d'un dispositif microstructuré comprenant les étapes suivantes :

  1. a) fournir un substrat ;
  2. b) imprimer une encre, non solide, sur le substrat, l'encre se solidifiant au contact du substrat pour former un motif en négatif d'au moins une microstructure du dispositif microstructuré à fabriquer ;
  3. c) envelopper l'encre sous forme solide avec un polymère non réticulé et comportant un additif apte à permettre une réticulation dudit polymère, ledit polymère étant non miscible avec le motif obtenu à l'étape b) afin de former une enveloppe pour le motif, ledit polymère présentant une température de fusion strictement supérieure à la température de sublimation ou d'évaporation de l'encre formant le motif ;
  4. d) réticuler l'enveloppe ; puis
  5. e) sublimer ou, selon la nature de l'encre, liquéfier puis évaporer l'encre de sorte à former le dispositif microstructuré comportant ladite au moins une microstructure.
To this end, the invention proposes a method for manufacturing a microstructured device comprising the following steps:
  1. a) providing a substrate;
  2. b) printing a non-solid ink on the substrate, the ink solidifying on contact with the substrate to form a negative pattern of at least one microstructure of the microstructured device to be manufactured;
  3. c) enveloping the ink in solid form with a non-crosslinked polymer and comprising an additive capable of allowing crosslinking of said polymer, said polymer being immiscible with the pattern obtained in step b) in order to form an envelope for the pattern, said polymer having a melting temperature strictly higher than the sublimation or evaporation temperature of the ink forming the pattern;
  4. d) cross-linking the envelope; Then
  5. e) sublimating or, depending on the nature of the ink, liquefying then evaporating the ink so as to form the microstructured device comprising said at least one microstructure.

Le procédé selon l'invention pourra comprendre également l'une au moins des caractéristiques suivantes, prises seules ou en combinaison :

  • le substrat fourni à l'étape a) est un matériau hydrophobe choisi parmi : les polyimides (PI), les silicones dont le polydiméthylsiloxane (PDMS), le poplypropylène (PP), le polytétrafluoroéthylène (PTFE), le copolymère d'oléfine cyclique (COC) ou un matériau hydrophile choisi parmi le silicium, le verre, la cellulose, les fibres de verre ;
  • entre l'étape a) et l'étape b), on réalise un traitement du substrat pour améliorer sa force d'adhésion avec l'encre à déposer et/ou le polymère destiné à former l'enveloppe ;
  • au moins au cours de l'étape b), le substrat est refroidi à une température inférieure à la température de solidification de l'encre ;
  • l'étape b) s'effectue sous une atmosphère présentant une humidité relative ne dépassant pas 30%, voire 15% ;
  • au cours de l'étape b), l'impression s'effectue de sorte que chaque extrémité du motif en négatif de ladite au moins une microstructure du dispositif microstructuré à fabriquer se situe en bordure du substrat, de sorte que chaque extrémité puisse, sur le dispositif à fabriquer, former une ouverture, telle qu'une entrée ou une sortie de fluide, de sorte à former une microstructure se présentant sous la forme d'un canal ;
  • entre l'étape b) et l'étape c), on réalise les sous-étapes suivantes : placer une connexion microfluidique, en partie au niveau de la région du motif qui est destinée à former une ouverture de canal et en partie à l'extérieur du substrat ; et appliquer de l'encre entre ladite connexion et le motif ;
  • entre les étapes b) et c), on réalise un recuit, à une température avantageusement comprise entre 10% et 80% de la température de fusion du motif ;
  • l'étape c) est réalisée en coulant le polymère sur le substrat imprimé par le motif ;
  • le polymère introduit à l'étape c) est choisi parmi : le polydiméthylsiloxane (PDMS), les polyimides, les gels d'agarose ou une colle telle que l'acrylique ;
  • l'additif présent dans le polymère est choisi parmi un agent réticulant, un photo-initiateur ou un solvant ;
  • ledit polymère destiné à former l'enveloppe présente une température de fusion strictement supérieure à 110% de la température de sublimation ou d'évaporation de l'encre formant le motif ;
  • l'étape e) s'effectue par chauffage et en appliquant un différentiel de pression entre l'intérieur de l'ensemble formé à l'issue de l'étape d) et l'extérieur ;
  • la liquéfaction puis l'évaporation de l'encre à l'étape e) est réalisée par chauffage ;
  • l'encre est choisie parmi :
    • les glycols linéaires dont la formule brute générique est C2nH4n+2O2 où n est un nombre entier positif supérieur ou égal à 1, de préférence tel que n = 3, 4 ou 5 ;
    • le cyclohexanediol ;
    • le biphényl ;
    • le tri(cyclohexyl)méthane ;
    • les alcools de formule brute CnH2n+2O où n est un nombre entier positif supérieur ou égal à 1, de préférence tel que n = 10, 11 ou 12 ;
  • au cours de l'étape b) on imprime plusieurs couches d'encre successives les unes sur les autres ;
  • l'étape b) s'effectue par impression par jet d'encre, au moyen d'une buse d'impression et d'une encre liquide dont la viscosité est inférieure ou égale à 30 mPa.s-1 ;
  • la distance entre d'une part, ladite buse d'impression et d'autre part, le substrat est comprise entre 0,5mm et 20mm ; la taille d'une goutte d'encre éjectée par ladite buse d'impression est comprise entre 10µm et 100µm; la fréquence d'éjection des gouttes d'encre de ladite buse est comprise entre 50Hz et 5kHz ; le substrat d'une déplacement relatif de l'un par rapport à l'autre avec une vitesse de déplacement relative contrôlée, comprise entre 1mm/s et 100mm/s ;
  • l'étape b) s'effectue au moyen d'une seringue contenant l'encre ;
  • la distance entre d'une part, une extrémité de la seringue par laquelle l'encre est dispensée et d'autre part, le substrat est comprise entre 0,1mm et 1mm ; le débit d'encre dispensé par l'extrémité de ladite seringue est compris entre 0,01 nl/s et 10 nl/s ; le substrat d'une part et, ladite extrémité de seringue d'autre part, étant adaptés pour autoriser un déplacement relatif de l'un par rapport à l'autre avec une vitesse de déplacement relative contrôlée, comprise entre 0,1mm/s et 10mm/s.
The method according to the invention may also comprise at least one of the following characteristics, taken alone or in combination:
  • the substrate provided in step a) is a hydrophobic material chosen from: polyimides (PI), silicones including polydimethylsiloxane (PDMS), polypropylene (PP), polytetrafluoroethylene (PTFE), cyclic olefin copolymer ( COC) or a hydrophilic material chosen from silicon, glass, cellulose, glass fibers;
  • between step a) and step b), the substrate is treated to improve its adhesion strength with the ink to be deposited and/or the polymer intended to form the envelope;
  • at least during step b), the substrate is cooled to a temperature below the solidification temperature of the ink;
  • step b) is carried out in an atmosphere having a relative humidity not exceeding 30%, or even 15%;
  • during step b), the printing is carried out so that each end of the negative pattern of said at least one microstructure of the microstructured device to be manufactured is located at the edge of the substrate, so that each end can, on the device to be manufactured, forming an opening, such as a fluid inlet or outlet, so as to form a microstructure in the form of a channel;
  • between step b) and step c), the following sub-steps are carried out: placing a microfluidic connection, partly at the level of the region of the pattern which is intended to form a channel opening and partly outside the substrate; and applying ink between said connection and the pattern;
  • between steps b) and c), annealing is carried out, at a temperature advantageously between 10% and 80% of the melting temperature of the pattern;
  • step c) is carried out by pouring the polymer onto the substrate printed by the pattern;
  • the polymer introduced in step c) is chosen from: polydimethylsiloxane (PDMS), polyimides, agarose gels or an adhesive such as acrylic;
  • the additive present in the polymer is chosen from a crosslinking agent, a photoinitiator or a solvent;
  • said polymer intended to form the envelope has a melting temperature strictly greater than 110% of the sublimation or evaporation temperature of the ink forming the pattern;
  • step e) is carried out by heating and by applying a pressure differential between the inside of the assembly formed at the end of step d) and the outside;
  • the liquefaction then the evaporation of the ink in step e) is carried out by heating;
  • the ink is chosen from:
    • linear glycols whose generic formula is C 2n H 4n+2 O 2 where n is a positive integer greater than or equal to 1, preferably such that n=3, 4 or 5;
    • cyclohexanediol;
    • biphenyl;
    • tri(cyclohexyl)methane;
    • the alcohols of structural formula C n H 2n + 2 O where n is a positive integer greater than or equal to 1, preferably such that n=10, 11 or 12;
  • during step b) several successive layers of ink are printed on top of each other;
  • step b) is carried out by ink jet printing, using a printing nozzle and a liquid ink whose viscosity is less than or equal to 30 mPa.s -1 ;
  • the distance between, on the one hand, said printing nozzle and, on the other hand, the substrate is between 0.5 mm and 20 mm; the size of an ink drop ejected from said printing nozzle is between 10µm and 100µm; the ink drop ejection frequency from said nozzle is between 50Hz and 5kHz; the substrate of a relative displacement of one relative to the other with a controlled relative displacement speed, between 1mm/s and 100mm/s;
  • step b) is carried out using a syringe containing the ink;
  • the distance between, on the one hand, one end of the syringe through which the ink is dispensed and, on the other hand, the substrate is between 0.1 mm and 1 mm; the ink flow dispensed by the end of said syringe is between 0.01 nl/s and 10 nl/s; the substrate on the one hand and, said end of the syringe on the other hand, being adapted to allow relative movement of one with respect to the other with a controlled relative speed of movement, between 0.1 mm/s and 10mm/s.

L'invention sera mieux comprise et d'autres buts, avantages et caractéristiques de celle-ci apparaîtront plus clairement à la lecture de la description qui suit et qui est faite au regard des dessins annexés, sur lesquels :

  • la figure 1 représente un premier dispositif apte à mettre en oeuvre le procédé selon l'invention ;
  • la figure 2 représente un deuxième dispositif également apte à mettre en oeuvre le procédé selon l'invention ;
  • la figure 3 représente l'évolution de l'épaisseur d'un dispositif microfluidique (canal), obtenu par la mise en oeuvre du procédé selon l'invention, en fonction d'un paramètre de fabrication de ce dispositif ;
  • la figure 4 représente un dispositif microfluidique obtenu avec le procédé selon l'invention.
The invention will be better understood and other aims, advantages and characteristics thereof will appear more clearly on reading the description which follows and which is given with regard to the appended drawings, in which:
  • there figure 1 represents a first device capable of implementing the method according to the invention;
  • there figure 2 represents a second device also able to implement the method according to the invention;
  • there picture 3 represents the change in the thickness of a microfluidic device (channel), obtained by implementing the method according to the invention, as a function of a manufacturing parameter of this device;
  • there figure 4 represents a microfluidic device obtained with the method according to the invention.

L'invention concerne un procédé de fabrication d'un dispositif microstructuré comprenant les étapes suivantes :

  • a) fournir un substrat ;
  • b) imprimer une encre, non solide, sur le substrat, l'encre se solidifiant au contact du substrat pour former un motif en négatif d'au moins une microstructure du dispositif microstructuré à fabriquer ;
  • c) envelopper l'encre sous forme solide avec un polymère non réticulé et comportant un additif apte à permettre une réticulation dudit polymère, ledit polymère étant non miscible avec le motif obtenu à l'étape b) afin de former une enveloppe pour le motif, ledit polymère présentant une température de fusion strictement supérieure à la température de sublimation ou d'évaporation de l'encre formant le motif ;
  • d) réticuler l'enveloppe ; puis
    polymère présentant une température de fusion strictement supérieure à la température de sublimation ou d'évaporation de l'encre formant le motif ;
  • d) réticuler l'enveloppe ; puis
  • e) sublimer ou, selon la nature de l'encre, liquéfier puis évaporer l'encre de sorte à former le dispositif microstructuré comportant ladite au moins une microstructure.
The invention relates to a method of manufacturing a microstructured device comprising the following steps:
  • a) providing a substrate;
  • b) printing a non-solid ink on the substrate, the ink solidifying on contact with the substrate to form a negative pattern of at least one microstructure of the microstructured device to be manufactured;
  • c) enveloping the ink in solid form with a non-crosslinked polymer and comprising an additive capable of allowing crosslinking of said polymer, said polymer being immiscible with the pattern obtained in step b) in order to form an envelope for the pattern, said polymer having a melting temperature strictly higher than the sublimation or evaporation temperature of the ink forming the pattern;
  • d) cross-linking the envelope; Then
    polymer having a melting temperature strictly higher than the sublimation or evaporation temperature of the ink forming the pattern;
  • d) cross-linking the envelope; Then
  • e) sublimating or, depending on the nature of the ink, liquefying then evaporating the ink so as to form the microstructured device comprising said at least one microstructure.

Dans le cadre de l'invention, une microstructure est une structure dont au moins deux dimensions sont inférieures à 1000 microns.In the context of the invention, a microstructure is a structure of which at least two dimensions are less than 1000 microns.

Ce procédé peut être mis en oeuvre de différentes façons.This method can be implemented in different ways.

En particulier, on a représenté sur la figure 1 un premier dispositif 100 apte à mettre en oeuvre l'étape b).In particular, we have represented on the figure 1 a first device 100 capable of implementing step b).

Sur la figure 1, on a représenté un repère orthogonal direct (O, X, Y, Z).On the figure 1 , a direct orthogonal coordinate system (O, X, Y, Z) has been represented.

Le dispositif 100 comprend un substrat 1 et un dispositif 10 d'impression par jet d'encre sur le substrat 1.The device 100 comprises a substrate 1 and a device 10 for printing by inkjet on the substrate 1.

Le dispositif 10 d'impression par jet d'encre comporte un réservoir 11 dans lequel se situe de l'encre, un moyen de chauffage 12 pour l'encre située dans le réservoir 11, une buse d'impression 13 et un moyen de chauffage 14 pour l'encre située dans la buse d'impression 13.The device 10 for printing by ink jet comprises a reservoir 11 in which ink is located, a heating means 12 for the ink located in the reservoir 11, a printing nozzle 13 and a heating means 14 for the ink located in the print nozzle 13.

Le dispositif 100 comprend également une première platine 20 montée sur le dispositif 10 d'impression par jet d'encre. Cette première platine permet le déplacement dudit dispositif 10 selon un axe prédéfini, en l'occurrence sur la figure 1, selon l'axe vertical OZ (axe vertical). On peut ainsi régler à souhait la distance, prise selon l'axe OZ, entre la sortie S de la buse d'impression 13 et le substrat 1.The device 100 also comprises a first platen 20 mounted on the device 10 for inkjet printing. This first plate allows said device 10 to move along a predefined axis, in this case on the figure 1 , along the vertical axis OZ (vertical axis). It is thus possible to adjust as desired the distance, taken along the axis OZ, between the outlet S of the printing nozzle 13 and the substrate 1.

Le dispositif 100 comprend aussi une deuxième platine 30 sur laquelle le substrat 1 est monté. Cette deuxième platine 30 permet le déplacement du substrat 1 dans le plan horizontal (O, X, Y). Ce plan horizontal est aussi le plan dans lequel le substrat 1 s'étend. Ceci permet de pouvoir donner la forme souhaitée à l'encre (motif déposé lors de l'étape b) sur le substrat 1. Il convient cependant de noter que le substrat 1 pourrait être incliné, c'est-à-dire présenter une orientation comportant une composante selon l'axe OZ (vertical), et notamment avec une inclinaison pouvant aller jusqu'à 45° par rapport à l'axe OX.Device 100 also includes a second plate 30 on which substrate 1 is mounted. This second plate 30 allows the movement of the substrate 1 in the horizontal plane (O, X, Y). This horizontal plane is also the plane in which the substrate 1 extends. This makes it possible to give the desired shape to the ink (pattern deposited during step b) on the substrate 1. It should however be noted that the substrate 1 could be inclined, that is to say present an orientation comprising a component along the OZ (vertical) axis, and in particular with an inclination of up to 45° with respect to the OX axis.

Entre le substrat 1 et la deuxième platine 30, le dispositif 100 peut comprendre un refroidisseur, fonctionnant par exemple par effet Peltier. Ce refroidisseur 40 peut être utile lorsque l'encre employée, chauffée au niveau du dispositif 10 d'impression par jet d'encre, a besoin d'être refroidi rapidement. Enfin, le dispositif 100 peut prévoir un moyen 50 d'évacuation de la chaleur entre le refroidisseur 40 et la deuxième platine 30.Between the substrate 1 and the second plate 30, the device 100 can comprise a cooler, operating for example by the Peltier effect. This cooler 40 can be useful when the ink used, heated at the level of the jet printing device 10 of ink, needs to be cooled quickly. Finally, the device 100 can provide a means 50 for discharging the heat between the cooler 40 and the second plate 30.

Avantageusement, l'encre employée par cette technique d'impression par jet d'encre présente une viscosité inférieure ou égale à 30mPa.s-1.Advantageously, the ink used by this ink jet printing technique has a viscosity of less than or equal to 30 mPa.s −1 .

On a représenté sur la figure 2 un deuxième dispositif 100' également apte à mettre en oeuvre l'étape b).We represented on the picture 2 a second device 100' also able to implement step b).

La mise en oeuvre du procédé selon l'invention avec le deuxième dispositif 100' s'appuie sur l'emploi d'une seringue 10' contenant l'encre, en lieu et place du dispositif 10 d'impression par jet d'encre du premier dispositif 100. Ainsi, la seringue 10' comporte un réservoir 11' dans lequel se situe l'encre, un piston 15' pour pouvoir éjecter l'encre dudit réservoir 11' et un moyen de chauffage 12' pour chauffer l'encre présente dans le réservoir 11'. On notera que la sortie de la seringue 10' est dénommée S'.The implementation of the method according to the invention with the second device 100' is based on the use of a syringe 10' containing the ink, instead of the device 10 for printing by ink jet of the first device 100. Thus, the syringe 10' comprises a reservoir 11' in which the ink is located, a piston 15' to be able to eject the ink from said reservoir 11' and a heating means 12' to heat the ink present in tank 11'. It will be noted that the outlet of the syringe 10' is called S'.

Tout le reste est identique à ce qui a été décrit précédemment pour le premier dispositif 100 et en particulier, on notera que la première platine 20 est alors montée sur la seringue 10'.Everything else is identical to what was described above for the first device 100 and in particular, it will be noted that the first plate 20 is then mounted on the syringe 10'.

Avec ce deuxième dispositif 100', on peut ainsi employer des encres dont la viscosité est plus élevée qu'avec le premier dispositif 100. En effet, avec une technique d'impression par jet d'encre (buse d'impression), on utilise une encre liquide dont la viscosité est généralement inférieure ou égale à 30 mPa.s-1. Si des viscosités plus importantes peuvent être envisagées avec une technique d'impression par jet d'encre, l'utilisation d'une seringue permet assurément de lever une telle contrainte et d'avoir accès à des encres, qui bien que non solides, présentent une viscosité supérieure à 30mPa.s-1.With this second device 100′, it is thus possible to use inks whose viscosity is higher than with the first device 100. Indeed, with an inkjet printing technique (printing nozzle), one uses a liquid ink whose viscosity is generally less than or equal to 30 mPa.s -1 . If higher viscosities can be envisaged with an inkjet printing technique, the use of a syringe certainly makes it possible to remove such a constraint and to have access to inks, which although not solid, present a viscosity greater than 30 mPa.s -1 .

Nous allons maintenant décrire différentes caractéristiques du procédé selon l'invention.We will now describe various characteristics of the method according to the invention.

Le substrat fourni à l'étape a) pourra être un matériau hydrophobe, notamment choisi parmi : les polyimides (PI), les silicones dont le polydiméthylsiloxane (PDMS), le polypropylène (PP), le polytétrafluoroéthylène (PTFE) ou le copolymère d'oléfine cyclique (COC).The substrate provided in step a) may be a hydrophobic material, chosen in particular from: polyimides (PI), silicones including polydimethylsiloxane (PDMS), polypropylene (PP), polytetrafluoroethylene (PTFE) or the copolymer of cyclic olefin (COC).

En variante, le substrat fourni à l'étape a) pourra être un matériau hydrophile, notamment choisi parmi le silicium, le verre, la cellulose, les fibres de verre.Alternatively, the substrate provided in step a) may be a hydrophilic material, chosen in particular from silicon, glass, cellulose, glass fibers.

Par ailleurs, l'encre pourra notamment être choisie parmi :

  • les glycols linéaires dont la formule brute générique est C2nH4n+2O2 où n est un nombre entier positif supérieur ou égal à 1, de préférence tel que n = 3, 4 ou 5 ;
  • le cyclohexanédiol ;
  • le biphényl ;
  • le tri(cyclohexyl)méthane ;
  • les alcools de formule brute CnH2n+2O où n est un nombre entier positif supérieur ou égal à 1, de préférence tel que n = 10, 11 ou 12.
Furthermore, the ink may in particular be chosen from:
  • linear glycols whose generic formula is C 2n H 4n+2 O 2 where n is a positive integer greater than or equal to 1, preferably such that n=3, 4 or 5;
  • cyclohexanediol;
  • biphenyl;
  • tri(cyclohexyl)methane;
  • alcohols of structural formula C n H 2n+2 O where n is a positive integer greater than or equal to 1, preferably such that n=10, 11 or 12.

En outre, le polymère destiné à former l'enveloppe pourra être choisi parmi le polydiméthylsiloxane (PDMS), les polyimides, les gels d'agarose ou certaines colles (acrylique, par exemple).In addition, the polymer intended to form the envelope may be chosen from polydimethylsiloxane (PDMS), polyimides, agarose gels or certain glues (acrylic, for example).

En particulier, on pourra prévoir l'association suivante (exemple 1 détaillé par la suite):

  • substrat : polyimide
  • encre (motif) :1,6-hexanediol (C6H14O2), glycol linéaire avec n = 3 selon la formule brute générique rappelée précédemment
  • polymère (enveloppe) : polydiméthylsiloxane (PDMS)
In particular, the following association can be provided (example 1 detailed below):
  • substrate: polyimide
  • ink (pattern): 1,6-hexanediol (C 6 H 14 O 2 ), linear glycol with n = 3 according to the generic formula given above
  • polymer (shell): polydimethylsiloxane (PDMS)

On pourra aussi prévoir l'association suivante (exemple 2 détaillé par la suite):

  • substrat : verre
  • encre (motif) :1,6-hexanediol
  • polymère (enveloppe) : polydiméthylsiloxane (PDMS)
We can also provide the following association (example 2 detailed below):
  • substrate: glass
  • ink (pattern): 1,6-hexanediol
  • polymer (shell): polydimethylsiloxane (PDMS)

On notera que les deux exemples fournis ci-dessus, et détaillés par la suite, permettent de réaliser une microstructure se présentant sous la forme d'une cavité. En effet, l'encre 1,6-hexanediol peut passer à travers l'enveloppe en PDMS lorsque, cette encre est sublimée ou évaporée.It will be noted that the two examples provided above, and detailed subsequently, make it possible to produce a microstructure in the form of a cavity. Indeed, the 1,6-hexanediol ink can pass through the PDMS envelope when this ink is sublimated or evaporated.

En particulier également, on pourra prévoir l'association suivante :

  • substrat : polyimide
  • encre (motif) : 1,6-hexanediol
  • polymère (enveloppe) : acrylique
Also in particular, the following association may be provided:
  • substrate: polyimide
  • ink (pattern): 1,6-hexanediol
  • polymer (shell): acrylic

Encore une autre possibilité est de prévoir l'association suivante :

  • substrat : gel d'agarose
  • encre (motif) : biphényl
  • polymère (enveloppe) : gel d'agarose
Yet another possibility is to provide the following association:
  • substrate: agarose gel
  • ink (pattern): biphenyl
  • polymer (shell): agarose gel

Il ne s'agit que d'exemples et d'autres associations sont envisageables.These are only examples and other combinations are possible.

Entre l'étape a) et l'étape b), on peut réaliser un traitement du substrat pour améliorer sa force d'adhésion avec l'encre à déposer et/ou le polymère destiné à former l'enveloppe. L'intérêt d'un tel traitement dépend principalement de la nature (type de matériau employé) du substrat. Ce traitement peut être choisi parmi un traitement plasma, en particulier à pression réduite et sous flux d'oxygène, un traitement par ultraviolets-ozone ou un traitement par oxydation par voie chimique.Between step a) and step b), the substrate can be treated to improve its adhesion strength with the ink to be deposited and/or the polymer intended to form the envelope. The advantage of such a treatment depends mainly on the nature (type of material used) of the substrate. This treatment can be chosen from among a plasma treatment, in particular at reduced pressure and under a flow of oxygen, a treatment by ultraviolet-ozone or a treatment by chemical oxidation.

D'un point de vue pratique, le procédé selon l'invention est tel que, au cours de l'étape b) et dans le cas de l'impression par jet d'encre :

  • La distance entre d'une part, ladite buse d'impression et d'autre part, le substrat est comprise entre 0,5mm et 20mm ;
  • La taille d'une goutte d'encre éjectée par ladite buse d'impression est comprise entre 10µm et 100µm ;
  • La fréquence d'éjection des gouttes d'encre de ladite buse est comprise entre 50Hz et 5kHz ;
  • Le substrat d'une part et ladite buse d'impression d'autre part, étant adaptés pour autoriser un déplacement relatif de l'un par rapport à l'autre avec une vitesse de déplacement relative contrôlée, comprise entre 1mm/s et 100mm/s.
From a practical point of view, the method according to the invention is such that, during step b) and in the case of inkjet printing:
  • The distance between, on the one hand, said printing nozzle and, on the other hand, the substrate is between 0.5 mm and 20 mm;
  • The size of a drop of ink ejected by said printing nozzle is between 10 μm and 100 μm;
  • The ink drop ejection frequency from said nozzle is between 50Hz and 5kHz;
  • The substrate on the one hand and said printing nozzle on the other hand, being adapted to allow relative movement of one relative to the other with a controlled relative speed of movement, between 1mm/s and 100mm/ s.

Les quatre paramètres mentionnés ci-dessus (taille de goutte, distance extrémité de buse au substrat, fréquence d'éjection des gouttes et vitesse de déplacement relatif entre buse et substrat) contribuent à la définition de la géométrie du motif déposé sur le substrat.The four parameters mentioned above (drop size, nozzle end distance from the substrate, drop ejection frequency and relative displacement speed between nozzle and substrate) contribute to the definition of the geometry of the pattern deposited on the substrate.

Ainsi, si la distance entre d'une part, ladite buse d'impression par laquelle l'encre est éjectée et d'autre part, le substrat est trop petite, on perd en résolution. Si cette même distance est trop grande, la goutte d'encre risque d'être perturbée dans sa descente vers le substrat. Il est donc plus avantageux de travailler dans la gamme de distance mentionnée ci-dessus.Thus, if the distance between, on the one hand, said printing nozzle through which the ink is ejected and, on the other hand, the substrate is too small, resolution is lost. If this same distance is too great, the drop of ink risks being disturbed in its descent towards the substrate. It is therefore more advantageous to work in the distance range mentioned above.

La fréquence d'éjection des gouttes et la vitesse de déplacement relative mentionnées ci-dessus permettent de gérer la distance séparant deux gouttes déposées successivement sur le substrat. D'un point de vue très pratique, il convient en effet que les gouttes ne soient pas trop distantes l'une de l'autre si l'on veut obtenir une microstructure de taille contrôlée (c'est en particulier le cas pour une application microfluidique pour laquelle on cherche à définir un canal). A contrario, il convient également que les gouttes ne soient pas trop proches pour gérer correctement l'épaisseur du motif.The frequency of ejection of the drops and the relative displacement speed mentioned above make it possible to manage the distance separating two drops successively deposited on the substrate. From a very practical point of view, the drops should not be too far apart if one wants to obtain a microstructure of controlled size (this is particularly the case for an application microfluidics for which we seek to define a channel). Conversely, the drops should also not be too close to correctly manage the thickness of the pattern.

La taille d'une goutte permet de gérer la quantité d'encre déposée localement sur le substrat, ce qui a notamment une influence sur la largeur et l'épaisseur du motif.The size of a drop makes it possible to manage the quantity of ink deposited locally on the substrate, which has in particular an influence on the width and the thickness of the pattern.

D'un point de vue pratique également, le procédé selon l'invention est tel que, au cours de l'étape b) et dans le cas de l'impression avec une seringue :

  • La distance entre d'une part, une extrémité de la seringue par laquelle l'encre est dispensée et d'autre part, le substrat est comprise entre 0,1mm et 1mm ;
  • Le débit d'encre dispensé par l'extrémité de ladite seringue est compris entre 0,01 nl/s (nanolitre par seconde) et 10 nl/s ;
  • Le substrat d'une part et, ladite extrémité de seringue d'autre part, étant adaptés pour autoriser un déplacement relatif de l'un par rapport à l'autre avec une vitesse de déplacement relative contrôlée, comprise entre 0,1mm/s et 10mm/s.
Also from a practical point of view, the method according to the invention is such that, during step b) and in the case of printing with a syringe:
  • The distance between, on the one hand, one end of the syringe through which the ink is dispensed and, on the other hand, the substrate is between 0.1 mm and 1 mm;
  • The ink flow dispensed by the end of said syringe is between 0.01 nl/s (nanolitre per second) and 10 nl/s;
  • The substrate on the one hand and said end of the syringe on the other hand, being adapted to allow relative movement of one with respect to the other with a controlled relative speed of movement, between 0.1 mm/s and 10mm/s.

Les trois paramètres mentionnés ci-dessus (volume dispensé, distance extrémité de seringue au substrat et vitesse de déplacement relatif entre la seringue et le substrat) contribuent à la définition de la géométrie du motif déposé sur le substrat.The three parameters mentioned above (dispensed volume, syringe end distance from the substrate and relative displacement speed between the syringe and the substrate) contribute to the definition of the geometry of the pattern deposited on the substrate.

Ainsi, si la distance entre d'une part, l'extrémité de la seringue par laquelle l'encre est dispensée et d'autre part, le substrat est trop faible, on perd en résolution. Si cette même distance est trop grande, la colonne de liquide se déstabilise. On pourrait parfaitement ne pas fonctionner dans la gamme susmentionnée, mais ce choix est plus avantageux car cela facilite la mise en oeuvre.Thus, if the distance between, on the one hand, the end of the syringe through which the ink is dispensed and, on the other hand, the substrate is too small, resolution is lost. If this same distance is too great, the column of liquid destabilizes. It would be perfectly possible not to operate in the aforementioned range, but this choice is more advantageous because it facilitates implementation.

Le débit d'encre dispensée et la vitesse de déplacement relative mentionnée ci-dessus permettent de gérer la quantité d'encre déposée localement sur le substrat, ce qui a notamment une influence sur la largeur et l'épaisseur du motif.The flow rate of ink dispensed and the relative displacement speed mentioned above make it possible to manage the quantity of ink deposited locally on the substrate, which has in particular an influence on the width and the thickness of the pattern.

Par ailleurs, au moins au cours de l'étape b), le substrat peut être refroidi à une température inférieure à la température de solidification de l'encre. Pour certaines encres dont la température d'impression (non solide) est relativement importante par rapport à la température de solidification, cela permet d'accélérer la solidification de l'encre sur le substrat. Ceci permet, pour certaines encres, d'améliorer le contrôle de la géométrie du motif déposé à l'étape b). En effet, si les conditions d'éjection ou de dépôt permettent souvent le contrôle complet de la géométrie du motif déposé sur le substrat, il s'avère que, pour certaines encres, ce refroidissement évite un étalement trop important de la goutte sur le substrat avant sa solidification. Cela permet de conserver la géométrie du motif souhaitée avec les conditions d'éjection ou de dépôt mentionnées précédemment. Une autre conséquence est que cela permet d'accélérer la fabrication du dispositif microstructuré.Furthermore, at least during step b), the substrate can be cooled to a temperature below the solidification temperature of the ink. For certain inks whose printing temperature (non-solid) is relatively high compared to the solidification temperature, this makes it possible to accelerate the solidification of the ink on the substrate. This makes it possible, for certain inks, to improve the control of the geometry of the pattern deposited in step b). Indeed, if the ejection or deposition conditions often allow complete control of the geometry of the pattern deposited on the substrate, it turns out that, for certain inks, this cooling avoids excessive spreading of the drop on the substrate. before its solidification. This makes it possible to retain the geometry of the desired pattern with the ejection or deposition conditions mentioned previously. Another consequence is that this makes it possible to accelerate the manufacture of the microstructured device.

On notera que le refroidissement du substrat peut être géré par une cellule à effet Peltier.It will be noted that the cooling of the substrate can be managed by a Peltier effect cell.

L'étape b) peut s'effectuer sous vide (vide poussé) ou sous atmosphère neutre, par exemple sous air. Lorsque cette étape s'effectue sous atmosphère neutre, en particulier sous air, on peut notamment envisager de fonctionner à pression atmosphérique. Travailler sous air à pression atmosphérique facilite en effet la mise en oeuvre. Typiquement, on peut envisager de mettre en oeuvre l'étape b) dans une gamme de pression comprise entre 10-4 Pa et 1,013.105 Pa.Step b) can be carried out under vacuum (high vacuum) or under a neutral atmosphere, for example under air. When this step is carried out in a neutral atmosphere, in particular in air, it is possible in particular to envisage operating at atmospheric pressure. Working under air at atmospheric pressure facilitates implementation. Typically, it is possible to envisage implementing step b) in a pressure range of between 10 −4 Pa and 1.013×10 5 Pa.

Lorsque l'on n'est pas sous vide, différents types d'atmosphère peuvent être envisagés, notamment à l'air ambient. Dans ce dernier cas, il peut être avantageux, tout particulièrement lorsqu'une encre hydrophile est employée, de faire en sorte que le taux d'humidité relative ne dépasse pas, au moins au cours de cette étape b), 30%, voire 15%. Cela permet d'éviter que l'encre, dans son parcours entre la buse ou, selon le cas, l'extrémité de la seringue d'une part et le substrat d'autre part, n'absorbe de l'humidité ; ce qui peut avoir un impact sur la résolution du dépôt du motif sur le substrat. Cela permet aussi d'éviter la condensation éventuelle d'eau sur le substrat (que celui-ci soit hydrophile ou hydrophobe), laquelle est alors également favorisée par le refroidissement du substrat, avec pour conséquence néfaste éventuelle un mauvais contrôle de la forme et de la résolution du motif.When one is not under vacuum, different types of atmosphere can be envisaged, in particular in ambient air. In the latter case, it may be advantageous, especially when a hydrophilic ink is used, to ensure that the relative humidity does not exceed, at least during this step b), 30%, or even 15 %. This prevents the ink, in its path between the nozzle or, as the case may be, the end of the syringe on the one hand and the substrate on the other hand, from absorbing moisture; which can have an impact on the resolution of the deposition of the pattern on the substrate. This also makes it possible to avoid the possible condensation of water on the substrate (whether the latter is hydrophilic or hydrophobic), which is then also favored by the cooling of the substrate, with the possible harmful consequence of poor control of the shape and pattern resolution.

L'étape c) peut s'effectuer en coulant le polymère sur le substrat imprimé par le motif. Le polymère, destiné à former l'enveloppe, est alors déposé sous forme liquide. Par ailleurs, il convient de noter que le polymère choisi pour former l'enveloppe est non miscible avec l'encre (motif). Dans le cas contraire, il ne serait pas envisageable d'obtenir le dispositif microstructuré, à savoir de définir tout simplement une cavité ou un canal.Step c) can be carried out by pouring the polymer onto the substrate printed by the pattern. The polymer, intended to form the envelope, is then deposited in liquid form. Furthermore, it should be noted that the polymer chosen to form the envelope is immiscible with the ink (pattern). Otherwise, it would not be possible to obtain the microstructured device, namely to simply define a cavity or a channel.

Il convient de noter que le polymère comprend un additif apte à permettre la réticulation du polymère destiné à former l'enveloppe, lors de l'étape d) ultérieure. D'un point de vue pratique, le mélange polymère/additif est préparé en amont si bien qu'on coule (verse) un polymère comportant cet additif.It should be noted that the polymer comprises an additive capable of allowing the crosslinking of the polymer intended to form the envelope, during the subsequent stage d). From a practical point of view, the polymer/additive mixture is prepared upstream so that a polymer containing this additive is poured (poured).

L'étape d) (réticulation de l'enveloppe) s'appuie donc sur la présence de cet additif.Step d) (crosslinking of the envelope) is therefore based on the presence of this additive.

Cet additif peut être un agent réticulant tel que le méthylhydrosiloxane, un photo-initiateur tel que le 1-Hydroxy-cyclohexyl-phenyl-kétone ou un solvant tel que le formaldéhyde.This additive can be a cross-linking agent such as methylhydrosiloxane, a photo-initiator such as 1-Hydroxy-cyclohexyl-phenyl-ketone or a solvent such as formaldehyde.

Dans le cas où l'additif est un agent réticulant, et en fonction de la nature de ce réticulant et/ou du polymère, la réticulation peut s'effectuer à température ambiante, éventuellement aidé par un faible chauffage pour accélérer la réticulation. Toujours lorsque l'additif est un agent réticulant, et si la nature du réticulant et/ou celle du polymère n'autorise pas une réticulation à température ambiante, la réticulation peut s'effectuer par chauffage.In the case where the additive is a crosslinking agent, and depending on the nature of this crosslinking agent and/or of the polymer, the crosslinking can be carried out at ambient temperature, possibly aided by low heating to accelerate the crosslinking. Still when the additive is a crosslinking agent, and if the nature of the crosslinking agent and/or that of the polymer does not allow crosslinking at ambient temperature, the crosslinking can be carried out by heating.

Dans le cas où l'additif est un photo-initiateur, la réticulation peut s'effectuer en soumettant le polymère à un rayonnement ultraviolet. Un photo-initiateur peut notamment être envisagé avec certaines colles, qui deviennent alors réticulables par ultraviolets.In the case where the additive is a photoinitiator, the crosslinking can be carried out by subjecting the polymer to ultraviolet radiation. A photo-initiator can in particular be envisaged with certain adhesives, which then become crosslinkable by ultraviolet rays.

Enfin, dans le cas où l'additif est un solvant, la réticulation s'effectue par simple évaporation du solvant, qui s'effectue généralement à température ambiante. Une fois l'évaporation du solvant effectué, le polymère réticule.Finally, in the case where the additive is a solvent, the crosslinking takes place by simple evaporation of the solvent, which generally takes place at room temperature. Once the solvent has evaporated, the polymer crosslinks.

A l'étape d), le motif en négatif (encre) est sous forme solide.In step d), the negative pattern (ink) is in solid form.

Ainsi, lorsque l'additif présent dans le polymère non réticulé est un agent de réticulation, et qu'il convient de chauffer le polymère pour assurer sa réticulation, il convient que la température de réticulation du polymère soit inférieure à la température de fusion de l'encre, même si la réticulation peut prévoir, afin de finaliser la réticulation, un bref passage à une température supérieure à la température de fusion du motif. Dans ce dernier cas, une petite partie du motif peut se liquéfier, mais comme le polymère est en grande majorité déjà réticulé, cela n'implique alors pas de modification de l'interface entre le motif et l'enveloppe. En particulier, dans bien des cas, on peut envisager une réticulation à température ambiante, pendant 24h, suivi d'une finalisation de la réticulation à température plus élevée, en particulier au-dessus de la température de fusion du motif, sans pour autant faire passer ce motif à l'état gazeux, pendant quelques dizaines de minutes, voire une heure.Thus, when the additive present in the non-crosslinked polymer is a crosslinking agent, and it is necessary to heat the polymer to ensure its crosslinking, the crosslinking temperature of the polymer should be lower than the melting temperature of the polymer. ink, even if the crosslinking can provide, in order to finalize the crosslinking, a brief passage at a temperature higher than the melting temperature of the pattern. In the latter case, a small part of the pattern may liquefy, but since the polymer is for the most part already crosslinked, this then does not involve any modification of the interface between the pattern and the envelope. In particular, in many cases, it is possible to envisage crosslinking at room temperature, for 24 hours, followed by finalization of the crosslinking at higher temperature, in particular above the melting point of the pattern, without however spend this pattern in the gaseous state, for a few tens of minutes, or even an hour.

Avantageusement, on pourra prévoir que le polymère formant l'enveloppe présente une température de réticulation inférieure ou égale à 90% de la température de fusion de l'encre (motif).Advantageously, provision may be made for the polymer forming the envelope to have a crosslinking temperature less than or equal to 90% of the melting point of the ink (pattern).

En fonction de l'encre employée, on peut soit sublimer le motif, soit le liquéfier puis l'évaporer.Depending on the ink used, you can either sublimate the pattern or liquefy it and then evaporate it.

Ainsi, pour sublimer le motif l'étape e) s'effectue par chauffage et en appliquant un différentiel de pression entre l'intérieur de l'ensemble formé à l'issue de l'étape d) et l'extérieur. Ceci permet de se placer, dans le diagramme de phase de l'encre (motif), sur un couple pression, température permettant directement le passage de l'état solide à l'état vapeur. Lorsque cela est envisageable, c'est particulièrement avantageux car on limite le niveau de chauffage de l'ensemble formé à l'étape d), et donc l'énergie dépensée, pour mettre le motif sous forme de vapeur et donc l'éliminer afin de former la microstructure (cavité, canal, ...).Thus, to sublimate the pattern, step e) is carried out by heating and by applying a pressure differential between the inside of the assembly formed at the end of step d) and the outside. This makes it possible to place oneself, in the phase diagram of the ink (pattern), on a pressure/temperature couple which directly allows the transition from the solid state to the vapor state. When this is possible, it is particularly advantageous because the level of heating of the assembly formed in step d), and therefore the energy expended, is limited to put the pattern in the form of vapor and therefore eliminate it in order to form the microstructure (cavity, channel, etc.).

En variante, ou à défaut, lorsqu'il n'est pas raisonnablement possible de prévoir une sublimation de l'encre (motif), l'étape e) est réalisée par chauffage afin d'assurer la liquéfaction, puis la vaporisation de l'encre (motif).As a variant, or failing that, when it is not reasonably possible to provide sublimation of the ink (pattern), step e) is carried out by heating in order to ensure the liquefaction, then the vaporization of the ink (pattern).

Dans les deux cas, mettre l'encre (motif) sous forme vapeur est particulièrement avantageux dans la mesure où l'extraction des vapeurs est très aisé.In both cases, putting the ink (pattern) in vapor form is particularly advantageous insofar as the extraction of the vapors is very easy.

On comprend aussi pourquoi il est important de choisir un polymère pour l'enveloppe avec certaines propriétés physiques. En effet, lors du chauffage visant à faire disparaître l'encre (motif) pour définir ladite au moins une microstructure, l'enveloppe doit rester sous forme solide. Et c'est donc pour cette raison que le polymère choisi pour l'enveloppe doit présenter une température de fusion (passage de l'état solide vers l'état liquide) strictement supérieure à la température de sublimation de l'encre (motif), ou selon le cas, supérieure à la température d'évaporation de l'encre (motif).We also understand why it is important to choose a polymer for the envelope with certain physical properties. Indeed, during the heating aimed at causing the ink (pattern) to disappear in order to define said at least one microstructure, the envelope must remain in solid form. And it is therefore for this reason that the polymer chosen for the envelope must have a melting temperature (transition from the solid state to the liquid state) strictly higher than the sublimation temperature of the ink (pattern), or as the case may be, higher than the evaporation temperature of the ink (pattern).

On s'assure ainsi que l'enveloppe reste en place lors de la mise en oeuvre de l'étape e).This ensures that the envelope remains in place during the implementation of step e).

Avantageusement, on pourra prévoir que le polymère formant l'enveloppe présente une température de fusion strictement supérieure ou égale à 110% de la température de sublimation ou, selon le cas de la température d'évaporation de l'encre formant le motif. Cela revient à dire que l'encre formant le motif présente une température de sublimation ou, selon le cas une température d'évaporation, sensiblement inférieure ou égale à 90% de la température de fusion de l'enveloppe.Advantageously, provision may be made for the polymer forming the envelope to have a melting temperature strictly greater than or equal to 110% of the sublimation temperature or, as the case may be, of the evaporation temperature of the ink forming the pattern. This amounts to saying that the ink forming the pattern has a sublimation temperature or, depending on the case, an evaporation temperature, substantially less than or equal to 90% of the melting temperature of the envelope.

Il peut être intéressant d'effectuer, entre les étapes b) et c) un recuit. Un tel recuit permet de diminuer la rugosité du motif déposé à l'étape b). En effet, une fois le motif solidifié et malgré le soin apporté aux conditions de dépôt, on peut constater que le motif, sous forme solide, présente une rugosité non négligeable. En conséquence, cette rugosité pourra se retrouver sur la microstructure à former (négatif). En particulier, pour les applications microfluidiques, la rugosité peut changer les conditions d'écoulement dans la microstructure (canal) et par suite, les pertes de charges et/ou les échanges thermiques. Pour d'autres applications, par exemple en optique, on comprend que cette rugosité au sein de la microstructure (cavité) peut également modifier les conditions d'analyse.It may be advantageous to carry out, between steps b) and c), an annealing. Such annealing makes it possible to reduce the roughness of the pattern deposited in step b). Indeed, once the pattern has solidified and despite the care given to the deposition conditions, it can be seen that the pattern, in solid form, has a non-negligible roughness. Consequently, this roughness may be found on the microstructure to be formed (negative). In particular, for microfluidic applications, the roughness can change the flow conditions in the microstructure (channel) and consequently the pressure drops and/or the heat exchanges. For other applications, for example in optics, it is understood that this roughness within the microstructure (cavity) can also modify the analysis conditions.

On comprend qu'un tel recuit, comme tout recuit, s'effectuera à une température strictement inférieure à la température de fusion du motif (encre) déposé à l'étape b) sur le substrat et typiquement dans une gamme de valeurs comprise entre 10% et 80% de la température de fusion du motif (encre, sous forme solide).It is understood that such annealing, like any annealing, will be carried out at a temperature strictly below the melting temperature of the pattern (ink) deposited in step b) on the substrate and typically in a range of values between 10 % and 80% of the melting temperature of the pattern (ink, in solid form).

Avec le procédé selon l'invention, il est possible de réaliser un dispositif comprenant une microstructure, fermée (cavité) ou ouverte (canal) entre le substrat et l'enveloppe.With the method according to the invention, it is possible to produce a device comprising a closed (cavity) or open (channel) microstructure between the substrate and the envelope.

Une cavité peut présenter un intérêt pour certaines applications, par exemple en optique ou en acoustique.A cavity may be of interest for certain applications, for example in optics or acoustics.

Toutefois, dans le cadre de l'invention, le procédé sera tout particulièrement pour fabriquer un dispositif microfluidique, dans lequel la microstructure est un canal (comprenant donc des ouvertures, telle qu'une entrée et une sortie pour un fluide).However, in the context of the invention, the method will be more particularly for manufacturing a microfluidic device, in which the microstructure is a channel (therefore comprising openings, such as an inlet and an outlet for a fluid).

Dans le cas où la microstructure est un canal, l'impression réalisée au cours de l'étape b), s'effectue de sorte que chaque extrémité du motif en négatif dudit au moins un canal du dispositif microfluidique à fabriquer se situe en bordure du substrat, de sorte que chaque extrémité puisse, sur le dispositif à fabriquer, former une ouverture de canal, telle qu'une entrée ou une sortie de fluide.In the case where the microstructure is a channel, the printing carried out during step b), is carried out so that each end of the negative pattern of said at least one channel of the microfluidic device to be manufactured is located at the edge of the substrate, so that each end can, on the device to be manufactured, form a channel opening, such as a fluid inlet or outlet.

Afin de faciliter la connexion du dispositif microfluidique fabriqué avec le procédé selon l'invention à tout système externe, on peut en outre prévoir de placer une connexion microfluidique, en partie au niveau de la région du motif qui est destinée à former une ouverture de canal et en partie à l'extérieur du substrat ; puis d'appliquer de l'encre entre ladite connexion et le motif.In order to facilitate the connection of the microfluidic device manufactured with the method according to the invention to any external system, provision may also be made to place a microfluidic connection, partly at the level of the region of the pattern which is intended to form a channel opening. and partly outside the substrate; then applying ink between said connection and the pattern.

La connexion ainsi formée, qui fait partie intégrante du dispositif microfluidique fabriqué, dépasse alors en partie du substrat (et donc de l'enveloppe). Ceci facilite donc grandement la connexion fluidique à un système externe.The connection thus formed, which forms an integral part of the fabricated microfluidic device, then protrudes partly from the substrate (and therefore from the envelope). This therefore greatly facilitates the fluidic connection to an external system.

Nous allons maintenant décrire quelques exemples de réalisation d'un dispositif microfluidique avec un procédé conforme à l'invention.We will now describe a few embodiments of a microfluidic device with a method in accordance with the invention.

Exemple 1Example 1

Substrat : un substrat en polyimide a été fourni (étape a)), en l'occurrence un Kapton® HN proposé par la société DuPont de Nemours.Substrate: a polyimide substrate was supplied (step a)), in this case a Kapton® HN offered by the company DuPont de Nemours.

Dans le cas d'espèce, le Kapton® HN utilisé est stable aux températures employées dans cet exemple.In the present case, the Kapton® HN used is stable at the temperatures used in this example.

Motif (encre) : le 1,6-hexanediol (C6H14O2) a été choisi comme encre. Pattern (ink): 1,6-hexanediol (C 6 H 14 O 2 ) was chosen as the ink.

Cette encre présente les propriétés suivantes : Tfusion = 45°C (air, pression atmosphérique) et Tvaporisation = 250°C (air, pression atmosphérique).This ink has the following properties: T fusion = 45°C (air, atmospheric pressure) and T vaporization = 250°C (air, atmospheric pressure).

Pour mettre en oeuvre l'étape b), cette encre a été chauffée à 65°C (donc, sous forme liquide) pour réaliser l'impression sur le substrat, selon la technique d'impression par jet d'encre (cette température permet notamment de s'assurer que la viscosité dynamique de l'encre liquide est inférieure à 30 mPa.s).To implement step b), this ink was heated to 65°C (therefore, in liquid form) to carry out the printing on the substrate, according to the inkjet printing technique (this temperature allows in particular to ensure that the dynamic viscosity of the liquid ink is less than 30 mPa.s).

La buse d'impression a été positionnée à 5mm du substrat.The print nozzle was positioned 5mm from the substrate.

Chaque goutte d'encre éjectée de la buse d'impression présentait un diamètre de 60µm. Les gouttes ont été éjectées de la buse d'impression à une fréquence de 100Hz.Each drop of ink ejected from the print nozzle had a diameter of 60µm. The drops were ejected from the print nozzle at a frequency of 100Hz.

La vitesse relative entre la buse d'impression et le substrat était de 4mm/s.The relative speed between the printing nozzle and the substrate was 4mm/s.

L'impression s'est effectuée de sorte que chaque extrémité du motif en négatif de la microstructure à fabriquer se situe en bordure du substrat, de sorte que chaque extrémité puisse, sur le dispositif à fabriquer, former une ouverture de canal (une entrée et une sortie de fluide).The printing was carried out so that each end of the negative pattern of the microstructure to be manufactured is located at the edge of the substrate, so that each end can, on the device to be manufactured, form a channel opening (an entrance and a fluid outlet).

Par ailleurs, lors de l'impression, le substrat a été refroidi à -10°C (avec une cellule à effet Peltier) pour assurer la solidification plus rapide de l'encre.Furthermore, during printing, the substrate was cooled to -10°C (with a Peltier effect cell) to ensure faster solidification of the ink.

Enveloppe (polymère) :
Le polymère employé est du polydiméthylsiloxane (PDMS), en l'occurrence le Sylgard® 184.
Envelope (polymer):
The polymer used is polydimethylsiloxane (PDMS), in this case Sylgard ® 184.

Ce polymère a été mélangé avec un agent réticulant, en l'occurrence le méthylhydrosiloxane, dans un rapport massique de 1/10 (1 pour l'agent réticulant et 10 pour le polymère).This polymer was mixed with a crosslinking agent, in this case methylhydrosiloxane, in a mass ratio of 1/10 (1 for the crosslinking agent and 10 for the polymer).

Le polymère ainsi préparé a été coulé, à température ambiante, sur le substrat imprimé par le motif, pour mettre en oeuvre l'étape c).The polymer thus prepared was cast, at room temperature, on the substrate printed with the pattern, to implement step c).

Ensuite, l'étape d) de réticulation a été mise en oeuvre : réticulation pendant 24h à température ambiante.Then, crosslinking step d) was implemented: crosslinking for 24 hours at room temperature.

Une fois réticulé, le PDMS mentionné ci-dessus est stable sur la plage de température comprise entre -45°C et 200°C.Once cured, the PDMS mentioned above is stable over the temperature range of -45°C to 200°C.

L'étape e) a ensuite été effectuée.Step e) was then carried out.

A cet effet, l'ensemble obtenu à l'issue de l'étape d) a été chauffée à une température de 100°C et sous une pression de 0.1bar.To this end, the assembly obtained at the end of step d) was heated to a temperature of 100° C. and under a pressure of 0.1 bar.

Dans ces conditions, le motif s'est sublimé.Under these conditions, the motif was sublimated.

Exemple 2Example 2

Dans ce deuxième exemple, le substrat en Kapton® (Exemple 1) est remplacé par un substrat en verre.In this second example, the Kapton® substrate (Example 1) is replaced by a glass substrate.

L'étape d'impression a été réalisée sous air, avec une humidité relative inférieure à 15%. En effet, le verre présente un caractère hydrophile alors que le Kapton® employé comme substrat dans l'exemple 1 présente un caractère hydrophobe.The printing step was carried out under air, with a relative humidity of less than 15%. In fact, the glass has a hydrophilic nature whereas the Kapton® used as substrate in Example 1 has a hydrophobic nature.

Tout le reste est identique au premier exemple.Everything else is the same as the first example.

Fin de l'exemple 2.End of example 2.

Il convient de noter enfin qu'à l'issue du procédé de fabrication, on obtient un dispositif comportant une enveloppe sur un substrat. Comme cela a été indiqué précédemment, en fonction de la nature (matériau) de l'enveloppe et/ou de la nature (matériau) du substrat (matériau), il peut arriver que la cohésion entre l'enveloppe et le substrat soit relativement faible. Si l'on souhaite faire en sorte que le polymère tienne sur le substrat, on peut prévoir l'étape de traitement (plasma, etc...) du substrat mentionnée précédemment.Finally, it should be noted that at the end of the manufacturing process, a device is obtained comprising an envelope on a substrate. As indicated above, depending on the nature (material) of the envelope and/or the nature (material) of the substrate (material), it may happen that the cohesion between the envelope and the substrate is relatively weak. . If it is desired to ensure that the polymer holds on the substrate, the step of treatment (plasma, etc.) of the substrate mentioned above can be provided.

Toutefois, on peut aussi mettre à profit ce manque de cohésion entre le substrat et l'enveloppe pour ne récupérer que l'enveloppe. Cette enveloppe peut alors servir de moule pour d'autres utilisations.However, it is also possible to take advantage of this lack of cohesion between the substrate and the envelope to recover only the envelope. This envelope can then serve as a mold for other uses.

Exemple 3Example 3

Dans ce troisième exemple, le substrat est en verre.In this third example, the substrate is made of glass.

L'étape d'impression a été réalisée sous air, avec une humidité relative inférieure à 15%.The printing step was carried out under air, with a relative humidity of less than 15%.

Le reste est identique à l'exemple 1, à l'exception du fait que l'étape d'impression (étape b)) pour laquelle on imprime plusieurs couches d'encre successives les unes sur les autres.The rest is identical to example 1, except for the fact that the printing step (step b)) for which several successive layers of ink are printed on top of each other.

D'un point de vue pratique, ceci s'effectue en effectuant un ou plusieurs passages supplémentaires de la buse d'impression, au-dessus de la première couche d'encre déposée au premier passage, les conditions de dépôt du ou de chaque passage supplémentaire étant identique aux conditions de dépôt du premier passage.From a practical point of view, this is done by making one or more additional passes of the printing nozzle, above the first layer of ink deposited in the first pass, the conditions of deposition of the or each pass additional being identical to the conditions of deposit of the first passage.

La figure 3 représente l'évolution de la hauteur du canal ainsi obtenu en fonction du nombre de couches d'encre successivement déposées au cours de l'étape b). On note que cette relation est linéaire. Ceci es lié au fait que les conditions de dépôt de l'encre sont identiques d'une couche à l'autre.There picture 3 represents the change in the height of the channel thus obtained as a function of the number of layers of ink successively deposited during step b). Note that this relationship is linear. This is linked to the fact that the ink deposition conditions are identical from one layer to another.

Au final, ceci permet donc de définir un canal dont la section présente un rapport de forme élevé ( = rapport hauteur/largeur).In the end, this therefore makes it possible to define a channel whose section has a high aspect ratio (= height/width ratio).

Exemple 4Example 4

Dans ce quatrième exemple, le substrat est en verre.In this fourth example, the substrate is made of glass.

L'étape d'impression a été réalisée sous air, avec une humidité relative inférieure à 15%.The printing step was carried out under air, with a relative humidity of less than 15%.

Le reste est identique à l'exemple 1, à l'exception du fait que l'étape d'impression (étape b)) est réalisée de manière spécifique pour pouvoir fabriquer des canaux qui se croisent.The rest is identical to example 1, except that the printing step (step b)) is carried out in a specific way in order to be able to manufacture intersecting channels.

Ainsi, après avoir déposé de l'encre, conformément à l'exemple 1, afin de former une première partie de canal PPC et déposé de l'encre pour former d'autres parties de canal APC1, APC2 de part et d'autre de la première partie de canal, ces autres parties de canal étant destinées à croiser la première partie de canal, il convient de réaliser une arche permettant de relier les parties de canal APC1, APC2 en passant par-dessus la première partie de canal PPC.Thus, after having deposited ink, in accordance with example 1, in order to form a first channel part PPC and deposited ink to form other channel parts APC1, APC2 on either side of the first channel part, these other channel parts being intended to cross the first channel part, an arch should be made to connect the channel parts APC1, APC2 by passing over the first channel part PPC.

A cet effet, certaines conditions de dépôt de l'étape b) d'impression ont été modifiées. En l'occurrence :

  • Les gouttes d'encre ont été éjectées à une fréquence de 4Hz ;
  • La vitesse relative entre la buse d'impression et le substrat était de 0,12 mm/s.
To this end, certain deposition conditions of step b) of printing have been modified. As it happens :
  • The ink drops were ejected at a frequency of 4Hz;
  • The relative speed between the printing nozzle and the substrate was 0.12 mm/s.

La figure 4 montre l'arche A ainsi formée, faisant partie intégrante du canal.There figure 4 shows the arch A thus formed, forming an integral part of the channel.

Claims (20)

  1. A method for manufacturing a microstructured device comprising the following steps:
    a) providing a substrate
    b) printing a non-solid ink on the substrate, the ink solidifying upon contact with the substrate to form a negative pattern of at least one microstructure of the microstructured device to be fabricated;
    c) covering the ink in solid form with a non-crosslinked polymer comprising an additive capable of allowing crosslinking of said polymer, said polymer being immiscible with the pattern obtained in step b) in order to form a cover for the pattern, said polymer having a melting temperature strictly higher than the sublimation or evaporation temperature of the ink forming the pattern;
    d) cross-linking the cover; then
    e) sublimating or, depending on the nature of the ink, liquefying and then evaporating the ink so as to form the microstructured device comprising said at least one microstructure.
  2. The method according to claim 1, wherein the substrate provided in step a) is a hydrophobic material selected from: polyimides (P!), silicones including polydimethylsiloxane (PDMS), polypropylene (PP), polytetrafluoroethylene (PTFE), cyclic olefin copolymer (COC), or a hydrophilic material selected from silicon, glass, cellulose, glass fibres.
  3. The method according to one of the preceding claims, wherein between step a) and step b), a treatment of the substrate is performed to improve its adhesion strength with the ink to be deposited and/or the polymer intended to form the cover.
  4. The method according to one of the preceding claims, wherein, at least during step b), the substrate is cooled to a temperature below the solidification temperature of the ink.
  5. The method according to one of the preceding claims, wherein step b) is carried out in an atmosphere having a relative humidity not exceeding 30% or even 15%.
  6. The method according to one of the preceding claims, wherein in step b), the printing is carried out so that each end of the negative pattern of said at least one microstructure of the microstructured device to be manufactured is located at the edge of the substrate, so that each end can, on the device to be manufactured, form an opening, such as a fluid inlet or outlet, so as to form a microstructure in the form of a channel.
  7. The method according to the preceding claim, wherein, between the step b) and step c), the following sub-steps are performed:
    - placing a microfluidic connection, partly at the region of the pattern which is intended to form a channel opening and partly outside the substrate; and
    - applying the ink between said connection and the pattern.
  8. The method according to one of the preceding claims, wherein, between the steps b) and c), annealing is performed, at a temperature advantageously between 10% and 80% of the melting temperature of the pattern.
  9. The method according to one of the preceding claims, in which the step c) is carried out by casting the polymer onto the substrate printed by the pattern.
  10. The method according to one of the preceding claims, wherein the polymer introduced in step c) is selected from: polydimethylsiloxane (PDMS), polyimides, agarose gels or an adhesive such as acrylic.
  11. The method according to one of the preceding claims, wherein the additive present in the polymer is selected from a cross-linking agent, a photoinitiator or a solvent.
  12. The method according to one of the preceding claims, wherein said polymer for forming the cover has a melting temperature strictly 110% of the sublimation or evaporation temperature of the ink forming the pattern.
  13. The method according to one of the preceding claims, wherein the sublimation of step e) is carried out by heating and by applying a pressure differential between the inside of the assembly formed after step d) and the outside.
  14. The method according to one of claims 1 to 16 wherein the liquefaction and subsequent evaporation of the ink in step e) is carried out by heating.
  15. The method according to one of the preceding claims, wherein the ink is selected from:
    - linear glycols with the generic empirical formula C2nH4n+2O2 where n is a positive integer greater than or equal to 1, preferably such that n = 3, 4 or 5;
    - cyclohexanediol;
    - biphenyl;
    - tri(cyclohexyl)methane;
    - alcohols with the gross formula CnH2n+2O where n is a positive integer greater than or equal to 1, preferably such that n = 10, 11 or 12.
  16. The method according to one of the preceding claims, wherein in the step b) a plurality of successive layers of ink are printed on top of each other.
  17. The method according to one of the preceding claims, wherein the step b) is carried out by ink jet printing, using a printing nozzle and a liquid ink whose viscosity is less than or equal to 30 mPa.s-1.
  18. The method according to the preceding claim, wherein:
    - the distance between, on the one hand, said printing nozzle and, on the other hand, the substrate is between 0.5 mm and 20 mm;
    - the size of an ink drop ejected by said printing nozzle is between 10µm and 100µm;
    - the frequency of ejecting ink drops from said nozzle is between 50Hz and 5kHz;
    - the substrate on the one hand and said printing nozzle on the other hand being adapted to allow relative movement of one with respect to the other with a controlled relative movement speed of between 1mm/s and 100mm/s.
  19. The method according to one of claims 1 to 16, wherein the step b) is performed by means of a syringe containing the ink.
  20. The method according to the preceding claim, wherein:
    - the distance between, on the one hand, an end of the syringe through which the ink is dispensed and, on the other hand, the substrate is between 0.1mm and 1mm;
    - the flow rate of ink dispensed by the end of said syringe is between 0.01 nl/s and 10 nl/s;
    - the substrate, on the one hand, and said syringe tip, on the other hand, being adapted to allow relative displacement of one with respect to the other with a controlled relative displacement speed of between 0.1mm/s and 10mm/s.
EP18786360.0A 2017-10-19 2018-10-19 Method for manufacturing a microstructured device Active EP3697727B1 (en)

Applications Claiming Priority (2)

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FR1759832A FR3072664B1 (en) 2017-10-19 2017-10-19 METHOD FOR MANUFACTURING A MICROSTRUCTURE DEVICE
PCT/EP2018/078796 WO2019077144A1 (en) 2017-10-19 2018-10-19 Method for manufacturing a microstructured device and associated implementation devices

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EP3697727B1 true EP3697727B1 (en) 2023-06-07

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CN110357032A (en) * 2019-08-27 2019-10-22 江苏集萃精凯高端装备技术有限公司 A kind of fluid channel processing method that hydrophilic and hydrophobic is controllable
FR3143018A1 (en) 2022-12-09 2024-06-14 Commissariat A L'energie Atomique Et Aux Energies Alternatives Method for manufacturing a fluidic device comprising a substrate carrying at least one porous or hollow solid element

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US5121329A (en) * 1989-10-30 1992-06-09 Stratasys, Inc. Apparatus and method for creating three-dimensional objects
JP2597778B2 (en) * 1991-01-03 1997-04-09 ストラタシイス,インコーポレイテッド Three-dimensional object assembling system and assembling method
US6561616B1 (en) * 2000-10-25 2003-05-13 Eastman Kodak Company Active compensation for changes in the direction of drop ejection in an inkjet printhead
US20050151285A1 (en) * 2004-01-12 2005-07-14 Grot Annette C. Method for manufacturing micromechanical structures
JPWO2005084581A1 (en) * 2004-03-03 2008-01-17 独立行政法人科学技術振興機構 Medical three-dimensional structure, manufacturing method and manufacturing apparatus thereof
FR3000485A1 (en) * 2012-12-28 2014-07-04 Commissariat Energie Atomique METHOD FOR PRODUCING A MICROFLUIDIC NETWORK

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FR3072664A1 (en) 2019-04-26
FR3072664B1 (en) 2019-11-22
WO2019077144A1 (en) 2019-04-25

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