EP3610052A4 - Récipient sans aérosol pour le bullage de précurseurs chimiques dans un procédé de dépôt - Google Patents
Récipient sans aérosol pour le bullage de précurseurs chimiques dans un procédé de dépôt Download PDFInfo
- Publication number
- EP3610052A4 EP3610052A4 EP18784890.8A EP18784890A EP3610052A4 EP 3610052 A4 EP3610052 A4 EP 3610052A4 EP 18784890 A EP18784890 A EP 18784890A EP 3610052 A4 EP3610052 A4 EP 3610052A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- aerosol
- deposition process
- chemical precursors
- free vessel
- bubbling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C3/00—Vessels not under pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0311—Closure means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0352—Pipes
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762483784P | 2017-04-10 | 2017-04-10 | |
PCT/US2018/026535 WO2018191125A1 (fr) | 2017-04-10 | 2018-04-06 | Récipient sans aérosol pour le bullage de précurseurs chimiques dans un procédé de dépôt |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3610052A1 EP3610052A1 (fr) | 2020-02-19 |
EP3610052A4 true EP3610052A4 (fr) | 2020-12-09 |
Family
ID=63793009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP18784890.8A Pending EP3610052A4 (fr) | 2017-04-10 | 2018-04-06 | Récipient sans aérosol pour le bullage de précurseurs chimiques dans un procédé de dépôt |
Country Status (8)
Country | Link |
---|---|
US (1) | US20200131630A1 (fr) |
EP (1) | EP3610052A4 (fr) |
JP (1) | JP7028955B2 (fr) |
KR (1) | KR102415265B1 (fr) |
CN (2) | CN208501094U (fr) |
SG (1) | SG11201909402XA (fr) |
TW (1) | TWI675120B (fr) |
WO (1) | WO2018191125A1 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20200131630A1 (en) * | 2017-04-10 | 2020-04-30 | Versum Materials Us, Llc | Aerosol-free vessel for bubbling chemical precursors in a deposition process |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000005431A1 (fr) * | 1998-07-21 | 2000-02-03 | Applied Materials, Inc. | Appareil de depot chimique en phase vapeur |
US20020124961A1 (en) * | 2001-02-28 | 2002-09-12 | Porter George K. | Manifolded fluid delivery system |
US20050072357A1 (en) * | 2002-07-30 | 2005-04-07 | Shero Eric J. | Sublimation bed employing carrier gas guidance structures |
US8986456B2 (en) * | 2006-10-10 | 2015-03-24 | Asm America, Inc. | Precursor delivery system |
US20160271519A1 (en) * | 2013-05-03 | 2016-09-22 | Jayden David Harman | Vacuum Condenser |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3690638A (en) * | 1970-05-15 | 1972-09-12 | Republic Steel Corp | Apparatus and method for vaporizing molten metal |
US5360572A (en) * | 1991-11-29 | 1994-11-01 | The United States Of America As Represented By The Secretary Of The Air Force | Aerogel mesh getter |
US5887117A (en) * | 1997-01-02 | 1999-03-23 | Sharp Kabushiki Kaisha | Flash evaporator |
US7464917B2 (en) | 2005-10-07 | 2008-12-16 | Appiled Materials, Inc. | Ampoule splash guard apparatus |
US10107490B2 (en) * | 2014-06-30 | 2018-10-23 | Lam Research Corporation | Configurable liquid precursor vaporizer |
US10563305B2 (en) * | 2015-05-13 | 2020-02-18 | Versum Materials Us, Llc | Container for chemical precursors in a deposition process |
US20200131630A1 (en) * | 2017-04-10 | 2020-04-30 | Versum Materials Us, Llc | Aerosol-free vessel for bubbling chemical precursors in a deposition process |
-
2018
- 2018-04-06 US US16/603,757 patent/US20200131630A1/en not_active Abandoned
- 2018-04-06 WO PCT/US2018/026535 patent/WO2018191125A1/fr unknown
- 2018-04-06 JP JP2020504280A patent/JP7028955B2/ja active Active
- 2018-04-06 EP EP18784890.8A patent/EP3610052A4/fr active Pending
- 2018-04-06 KR KR1020197033084A patent/KR102415265B1/ko active IP Right Grant
- 2018-04-06 SG SG11201909402X patent/SG11201909402XA/en unknown
- 2018-04-09 CN CN201820494808.3U patent/CN208501094U/zh not_active Expired - Fee Related
- 2018-04-09 TW TW107112052A patent/TWI675120B/zh active
- 2018-04-09 CN CN201810312046.5A patent/CN108690971B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000005431A1 (fr) * | 1998-07-21 | 2000-02-03 | Applied Materials, Inc. | Appareil de depot chimique en phase vapeur |
US20020124961A1 (en) * | 2001-02-28 | 2002-09-12 | Porter George K. | Manifolded fluid delivery system |
US20050072357A1 (en) * | 2002-07-30 | 2005-04-07 | Shero Eric J. | Sublimation bed employing carrier gas guidance structures |
US8986456B2 (en) * | 2006-10-10 | 2015-03-24 | Asm America, Inc. | Precursor delivery system |
US20160271519A1 (en) * | 2013-05-03 | 2016-09-22 | Jayden David Harman | Vacuum Condenser |
Non-Patent Citations (1)
Title |
---|
See also references of WO2018191125A1 * |
Also Published As
Publication number | Publication date |
---|---|
CN208501094U (zh) | 2019-02-15 |
TW201837226A (zh) | 2018-10-16 |
CN108690971B (zh) | 2020-10-30 |
EP3610052A1 (fr) | 2020-02-19 |
WO2018191125A1 (fr) | 2018-10-18 |
KR102415265B1 (ko) | 2022-06-29 |
JP7028955B2 (ja) | 2022-03-02 |
JP2020516775A (ja) | 2020-06-11 |
CN108690971A (zh) | 2018-10-23 |
US20200131630A1 (en) | 2020-04-30 |
KR20190128265A (ko) | 2019-11-15 |
TWI675120B (zh) | 2019-10-21 |
SG11201909402XA (en) | 2019-11-28 |
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Legal Events
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
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17P | Request for examination filed |
Effective date: 20191008 |
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AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
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AX | Request for extension of the european patent |
Extension state: BA ME |
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DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20201111 |
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: C23C 16/52 20060101ALI20201105BHEP Ipc: C23C 16/448 20060101AFI20201105BHEP |
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P01 | Opt-out of the competence of the unified patent court (upc) registered |
Effective date: 20230602 |