EP3587615A1 - Procédé et dispositif de fabrication de couches ou de corps dans l'espace - Google Patents

Procédé et dispositif de fabrication de couches ou de corps dans l'espace Download PDF

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Publication number
EP3587615A1
EP3587615A1 EP18000567.0A EP18000567A EP3587615A1 EP 3587615 A1 EP3587615 A1 EP 3587615A1 EP 18000567 A EP18000567 A EP 18000567A EP 3587615 A1 EP3587615 A1 EP 3587615A1
Authority
EP
European Patent Office
Prior art keywords
powder
aerosol
substrate
carrier gas
reservoir
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP18000567.0A
Other languages
German (de)
English (en)
Inventor
Marc Häming
Ralf Moos
Jaroslaw Kita
Philipp Nieke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airbus Defence and Space GmbH
Airbus Defence and Space SAS
Original Assignee
Airbus Defence and Space GmbH
Airbus Defence and Space SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Airbus Defence and Space GmbH, Airbus Defence and Space SAS filed Critical Airbus Defence and Space GmbH
Priority to EP18000567.0A priority Critical patent/EP3587615A1/fr
Publication of EP3587615A1 publication Critical patent/EP3587615A1/fr
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/137—Spraying in vacuum or in an inert atmosphere
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C23C24/082—Coating starting from inorganic powder by application of heat or pressure and heat without intermediate formation of a liquid in the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/01—Selective coating, e.g. pattern coating, without pre-treatment of the material to be coated

Definitions

  • the invention relates to a method and a device for producing layers or bodies in space, in particular on the earth's moon, another non-earthly celestial body (planets, meteorites) or an artificial satellite (e.g. a space station in an orbit in space).
  • a non-earthly celestial body planes, meteorites
  • an artificial satellite e.g. a space station in an orbit in space
  • a sintering temperature above 1000 ° C. is usually necessary for the production of ceramic layers or bodies.
  • An integration or combination of ceramics with low-melting plastics, glasses or metals is hardly or not possible [1].
  • Another difficulty is represented by ceramics with a high covalent bond fraction. In this case, the ceramic may decompose prior to compression, which means that it is not possible or only with considerable effort to produce dense components or layers [2].
  • aerosol and vacuum-based layer deposition is only known for terrestrial applications [3].
  • the process has recently been referred to in German as “aerosol-based cold deposition” or “aerosol deposition method”, or “ADM” for short.
  • ADM aerosol deposition method
  • layers that are dense at room temperature can be deposited directly from the starting powders onto a wide variety of substrate materials. These are characterized both by firm adherence to the substrate, high tightness and material properties that are similar to those of the starting powders used.
  • a device for aerosol-based cold deposition of powders according to the prior art are, as in Fig. 1 a vacuum chamber 1, an evacuation device 2, an aerosol generating device 3 and a nozzle apparatus 4.
  • Publications regarding the system structure can be found, for example, in the US 7,553,376 B2 ,
  • the principle of a system for aerosol-based cold separation of powders is based on the fact that a vacuum is created within the vacuum chamber 1 via an evacuation device 2 [5].
  • the aerosol-generating device 3 mixes a gas, for example oxygen or nitrogen, with particles 5 and thus produces a powder aerosol [4].
  • the particles are transported from the aerosol generating device 3 into the vacuum chamber 1 via a connecting line 4.1.
  • the connecting line 4.1 opens into a nozzle 4.2, in which the particles 5 are further accelerated by changing the cross section.
  • the particles 5 meet a moving substrate 6 and form a dense scratch-resistant film [1] there, even though no temperature treatment is necessary.
  • the invention is based on the object of a method for producing layers or bodies in space (ie under different atmospheric and / or gravity and / or temperature conditions compared to the conditions on earth, in particular on the earth's moon, another non-earthly celestial body , e.g. planets, meteorites, or an artificial satellite (e.g. a space station in an orbit in space), which can be operated economically there.
  • a method for producing layers or bodies in space ie under different atmospheric and / or gravity and / or temperature conditions compared to the conditions on earth, in particular on the earth's moon, another non-earthly celestial body , e.g. planets, meteorites, or an artificial satellite (e.g. a space station in an orbit in space), which can be operated economically there.
  • the carrier gas reservoir A1 is preferably a closed container and stores any gas or gas mixture in the pressure range from 0.5 to 300 bar. Hydrogen, helium, nitrogen or oxygen is preferably used as such a carrier gas for the aerosol to be generated.
  • the carrier gas reservoir A1 advantageously contains at least one pressure sensor and at least one controllable outlet valve (actuator).
  • the high pressure gas line A1.1 connects the gas outlet valve to the gas pressure and gas flow regulator A2.
  • the latter A2 has at least one gas inlet and one gas outlet.
  • the gas pressure and gas flow regulator A2 have a plurality of gas outlets which are connected to different subunits of the coating device according to the invention. A specific exemplary embodiment of this is shown in FIG Fig. 6 and 7 explained.
  • Gas pressure and gas flow controller A2 advantageously includes a pressure sensor or a flow sensor and a finely adjustable outlet valve (actuator) for each gas outlet, which has a specific gas pressure or gas flow in the range 0.001 to 100 bar or 0.01 to 1000 NI / min (standard liters per minute ) generated.
  • the gas pressure and gas flow regulator A2 is connected to the aerosol generating unit A3 via at least one gas low pressure line A2.1.
  • the aerosol generating device A3 mixes the carrier gas with powder from the powder reservoir A7 and thus generates a powder aerosol.
  • the powder reservoir A7 advantageously comprises a gas-tight lock A7.3 for loading with powder from outside the device and a powder level sensor.
  • the powder feed line A7.1 leads powder from the powder reservoir A7 to the aerosol generating unit A3.
  • the low-pressure aerosol line A3.1 directs the generated aerosol from the aerosol-generating unit A3 into the nozzle A4.
  • the aerosol is accelerated by changing the cross section and directed onto the substrate A5. There it forms a scratch-resistant functional layer.
  • the device according to the invention optionally comprises a plurality of individual nozzles (see Fig. 11 ) with controllable change in cross-section.
  • the nozzle shape can be made convergent, divergent or convergent-divergent.
  • the substrate A5 is directly connected to the surroundings of the device according to the invention, in which there is a reduced pressure, typically vacuum (vacuum here is to be understood as a pressure p ⁇ 0.1 bar).
  • the position of the substrate A5 can be regulated in three dimensions using an XYZ traversing mechanism.
  • the substrate shield A6 separates the sample area from the other elements of the device according to the invention.
  • the nozzle is directly connected to the substrate shield A6.
  • the substrate shield A6 can also comprise a feedthrough or opening through which the nozzle A4 is inserted.
  • the thermal control unit A8 comprises an electronic regulating and control unit and an electronic data memory.
  • the thermal control unit A8 is connected to a temperature sensor and heating element network A8.1, which in each case comprises at least one temperature sensor and one heating element including electrical supply lines per subunit A1 - A5.
  • the electronic data memory stores temperature values and control parameters, which are saved and read out via a direct data connection to the command and data processing system A9.
  • the command and data processing system A9 contains an electronic regulation and control unit as well as an electronic data memory, in which control and regulation parameters are stored and read out via an external data interface A9.2.
  • the signals of all sensors of subunits A1, A2, A3, A4, A5, A7, A8, A10 are transmitted to A9 via data network A9.1 and all control parameters from A9 to actuators of subunits A1, A2, A3, A4, A5, A7, A8, A10 transmitted.
  • the electrical energy store A10 supplies the assemblies A1, A2, A3, A4, A5, A6, A7, A8, A9, A10 with an electrical direct voltage via the electrical supply network A10.1.
  • the electrical energy storage device A10 is charged through the external interface A10.2.
  • the frame structure A11 forms a torsionally rigid installation space in which all assemblies A1 - A10 as well as thermal shielding and insulation material are integrated and fastened.
  • the substrate can, as in Fig. 2 shown, placed freely in the area.
  • the structure shown also enables integration as a payload in an aircraft or spacecraft.
  • the lock A7.3 in the powder container A7 enables loading in a non-terrestrial environment. This enables the direct processing of found resources during a space mission, for example for the production of protective or functional layers, and an improved layer formation. In addition, this enables the processing of extremely dry powders such as moon dust and / or meteroite dust and / or dust on other planets that absorb moisture during terrestrial processing. This results in a better layer formation during the extraterrestrial processing of these powders.
  • the Fig. 3 shows a further embodiment of the coating device according to the invention.
  • the substrate shield A6 which completely surrounds the substrate.
  • the substrate shield A6 is semi-permeable in sections (dash-dotted line).
  • semi-permeable means that the substrate shielding is permeable to the carrier gas, but impermeable to the powder. This could be achieved, for example, by microperforation.
  • the substrate shield delimits the inside of the device from the inside of the substrate shield (solid line), the substrate shield is impermeable to prevent gas from entering the device.
  • the substrate shield A6 can be designed as a flexible and / or stretchable and / or foldable and / or rigid membrane or film which is connected to and connected to the nozzle apparatus.
  • the substrate shield A6 which completely surrounds the substrate, is impermeable. Both carrier gas and powder particles cannot penetrate through the substrate shield and are held within the substrate shield.
  • the substrate shield A6 is designed as a rigid partition and can be coupled to a pump A14 in order to transport the carrier gas back to the carrier gas reservoir A1 via lines A6.2 and A14.1 for gas recovery.
  • a semipermeable filter device A6.1 can advantageously be present (impenetrable for powder), so that no powder can penetrate into the pump A14.
  • the impermeable substrate shield does not allow an exchange with the environment, the same pressure level prevails inside and outside the substrate shield, namely the local ambient pressure (typically vacuum).
  • the impermeable So substrate shielding does not have to be designed as a pressure-resistant container.
  • the substrate shield is designed as a flexible bellows, which interacts with a lifting mechanism for contraction of the substrate shield. This enables the carrier gas to be returned to the carrier gas reservoir via an adjustable line A6.2.
  • a separate filter device can also be used here (see A6.1 in Fig. 4 ) be integrated to retain the powder within the substrate shield during gas recovery.
  • An opening mechanism can optionally be integrated in the substrate shield in order to be able to remove the excess powder after gas recovery.
  • the aerosol generating unit A3 comprises an aerosol generating nozzle A3.3, which has a gas inlet with a reduced cross-section to the interior of the nozzle, a powder inlet with a reduced cross-section to the interior of the nozzle and an aerosol outlet with an enlarged cross-section to the nozzle outlet.
  • the powder reservoir A7 is connected to the powder inlet of the aerosol generating nozzle A3.3.
  • the gas low pressure line A2.1 is connected to the gas inlet of the aerosol generating nozzle A3.3.
  • the aerosol generating unit A3 has a second gas supply A3.2 which is connected to the aerosol outlet of the aerosol generating nozzle A3.3.
  • the pressure difference between the gas inlet and the aerosol outlet of the aerosol generating nozzle A3.3 and between the inlet and outlet of the nozzle A4 can thus be regulated.
  • the powder reservoir A7 has a separate gas supply A7.2, which is used to regulate the powder entry into the aerosol generating nozzle A3.3.
  • Fig. 7 shows a further embodiment of a device according to the invention, in which the substrate is arranged directly behind the outlet cross section of the aerosol-generating device. Compared to the device after Fig. 6 the aerosol line A3.1 and the nozzle 4 and the second gas supply A3.2 are omitted here.
  • the aerosol generating unit can be used directly to accelerate the aerosol and thus for spraying, without the need for an additional nozzle. Due to the smaller number of components, a more compact design with lower mass can be achieved with this version.
  • Fig. 8 a further embodiment of an aerosol generating unit is shown.
  • the interior of the aerosol-producing unit A3 is provided with a semi-permeable partition A3.4 for improved gas swirling. This is located in the carrier gas stream, preferably transversely to its direction of flow.
  • the Partition A3.4 is impermeable to particles and can be porous. A frit can advantageously be used.
  • Fig. 9 shows a further embodiment of a device according to the invention, with a rotating element A3.5, for example a brush, which promotes the transport of the powder from the powder reservoir A7 into the aerosol-generating unit A3.
  • the rotating element A3.5 is advantageously arranged in the area of the outlet of the powder reservoir A7 in the transition to the aerosol-generating unit.
  • the powder can advantageously be present in compact form in the powder reservoir A7 and can be moved towards the rotating element by means of a feed device.
  • Fig. 10 shows a further embodiment of a device according to the invention with a plurality of powder reservoirs A7 connected in parallel, each feeding the same aerosol-generating unit A3 (via the collecting line A7.1). Valves A7.4 on the individual powder reservoirs A7 can each be switched on or off individually.
  • FIG. 11 shows a further embodiment of a device according to the invention with a plurality of nozzles A4 and a plurality of aerosol-generating units A3. Any number of nozzles A4 can be positioned in front of the substrate A5. Each nozzle apparatus A4 is fed by a separate aerosol generating unit A3. Each of these aerosol-generating units is advantageously connected to a separate powder reservoir. In a further embodiment (not shown), a plurality of nozzles can also be fed by only one aerosol-generating unit. In a further advantageous embodiment, the nozzles are positioned so close to one another that their outlet cross sections practically form a common outlet cross section.
  • Fig. 12 shows a further embodiment of a device according to the invention with a coating mask A12 positioned in front of the substrate A5.
  • the mask A12 can also be designed to be movable.
  • Fig. 13 shows a further embodiment of a device according to the invention with a substrate changer A5.1.
  • Several substrates A5 are arranged on the substrate changer.
  • the substrate changer 5.1 is, for example, rotatable (turret version). In the example shown, it has a cross section in the form of a regular pentagon, so that five substrates can be applied, which can be coated alternately over time.
  • the substrate changer is designed in such a way that it or the individual substrates can be decoupled and transferred to a transport device, e.g. for subsequent on-site analytical investigations or return to Earth.
  • substrates can be positioned on a table that can be moved in XYZ.
  • a substrate ring can also be used.
  • a substrate belt, on which a plurality of substrates are arranged, is used, which is guided over a roller device.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Nozzles (AREA)
EP18000567.0A 2018-06-29 2018-06-29 Procédé et dispositif de fabrication de couches ou de corps dans l'espace Pending EP3587615A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP18000567.0A EP3587615A1 (fr) 2018-06-29 2018-06-29 Procédé et dispositif de fabrication de couches ou de corps dans l'espace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP18000567.0A EP3587615A1 (fr) 2018-06-29 2018-06-29 Procédé et dispositif de fabrication de couches ou de corps dans l'espace

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EP3587615A1 true EP3587615A1 (fr) 2020-01-01

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112775444A (zh) * 2020-12-02 2021-05-11 上海航天设备制造总厂有限公司 一种空间粉末床增材制造加工系统及方法
DE102020005726A1 (de) 2020-09-18 2022-03-24 Jörg Exner Vorrichtung für die aerosolbasierte Kaltabscheidung (Aerosol-Depositions-Methode, ADM) zur Verwendung in flüssigen Umgebungen

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7553376B2 (en) 1999-10-12 2009-06-30 Toto Ltd. Apparatus for forming composite structures
DE102015012425A1 (de) * 2015-09-25 2017-03-30 Michaela Bruckner Vorrichtung zur aerosolbasierten Kaltabscheidung ( Aerosol-Depositions-Methode, ADM)
DE102016202607A1 (de) * 2016-02-19 2017-11-16 Siemens Aktiengesellschaft Verfahren zur Fertigung einer Schicht mit perowskitischem Material und Vorrichtung mit einer solchen Schicht

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7553376B2 (en) 1999-10-12 2009-06-30 Toto Ltd. Apparatus for forming composite structures
DE102015012425A1 (de) * 2015-09-25 2017-03-30 Michaela Bruckner Vorrichtung zur aerosolbasierten Kaltabscheidung ( Aerosol-Depositions-Methode, ADM)
DE102016202607A1 (de) * 2016-02-19 2017-11-16 Siemens Aktiengesellschaft Verfahren zur Fertigung einer Schicht mit perowskitischem Material und Vorrichtung mit einer solchen Schicht

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
ERIC IRISSOU ET AL: "Review on Cold Spray Process and Technology: Part I?Intellectual Property", JOURNAL OF THERMAL SPRAY TECHNOLOGY, ASM INTERNATIONAL, MATERIALS PARK, US, vol. 17, no. 4, 1 December 2008 (2008-12-01), pages 495 - 516, XP002625101, ISSN: 1059-9630, DOI: 10.1007/S11666-008-9203-3 *
H. SALMANG; H. SCHOLZE: "Keramik", 2007, SPRINGER-VERLAG, pages: 857 - 859,906
J. AKEDO: "Room temperature impact consolidation (RTIC) of fine ceramic powder by aerosol deposition method and applications to microdevices", J. THERM. SPRAY TECH., vol. 17, 2008, pages 181 - 198, XP055060029, DOI: doi:10.1007/s11666-008-9163-7
J. AKEDO; M. LEBEDEV: "Microstructure and Electrical Properties of Lead Zirconate Titanate (Pb(Zr /Ti )0 ) Thick Films Deposited by Aerosol Deposition Method", JPN. J. APPL. PHYS., vol. 38, 1999, pages 5397 - 5401, XP001092887, DOI: doi:10.1143/JJAP.38.5397
K. SAHNER; M. KASPA; R. MOOS: "Assessment of the novel aerosol deposition method for room temperature preparation of metal oxide gas sensor films", SENS. ACTUATORS. B: CHEMICAL, vol. 139, 2009, pages 394 - 399, XP026138586, DOI: doi:10.1016/j.snb.2009.03.011
M. SCHUBERT; J. EXNER; R. MOOS: "Influence of carrier gas composition on the stress of AI O coatings prepared by the aerosol deposition method", MATERIALS, vol. 7, 2014, pages 5633 - 5642

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020005726A1 (de) 2020-09-18 2022-03-24 Jörg Exner Vorrichtung für die aerosolbasierte Kaltabscheidung (Aerosol-Depositions-Methode, ADM) zur Verwendung in flüssigen Umgebungen
CN112775444A (zh) * 2020-12-02 2021-05-11 上海航天设备制造总厂有限公司 一种空间粉末床增材制造加工系统及方法

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