EP3574719B1 - System zur erzeugung eines plasmastrahls von metallionen - Google Patents
System zur erzeugung eines plasmastrahls von metallionen Download PDFInfo
- Publication number
- EP3574719B1 EP3574719B1 EP18705434.1A EP18705434A EP3574719B1 EP 3574719 B1 EP3574719 B1 EP 3574719B1 EP 18705434 A EP18705434 A EP 18705434A EP 3574719 B1 EP3574719 B1 EP 3574719B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- metal
- tube
- generating
- plasma
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910021645 metal ion Inorganic materials 0.000 title claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 97
- 239000002184 metal Substances 0.000 claims description 97
- 238000010438 heat treatment Methods 0.000 claims description 42
- 238000002844 melting Methods 0.000 claims description 18
- 230000008018 melting Effects 0.000 claims description 18
- 239000007787 solid Substances 0.000 claims description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 10
- 229910052737 gold Inorganic materials 0.000 claims description 10
- 239000010931 gold Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 4
- 239000012777 electrically insulating material Substances 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 description 26
- 239000000463 material Substances 0.000 description 13
- 150000002739 metals Chemical class 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- 229910052724 xenon Inorganic materials 0.000 description 8
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 8
- 230000004907 flux Effects 0.000 description 6
- 230000001133 acceleration Effects 0.000 description 5
- 230000007935 neutral effect Effects 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 230000002547 anomalous effect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 239000003380 propellant Substances 0.000 description 3
- 229910052716 thallium Inorganic materials 0.000 description 3
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 230000005355 Hall effect Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- 101100536354 Drosophila melanogaster tant gene Proteins 0.000 description 1
- 229910002060 Fe-Cr-Al alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- -1 des ions Chemical class 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910000953 kanthal Inorganic materials 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/54—Plasma accelerators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/02—Circuits or systems for supplying or feeding radio-frequency energy
- H05H2007/022—Pulsed systems
Definitions
- the present invention relates to a system for generating a plasma jet.
- Systems for generating plasma of a metal from a solid block of this metal are known. Such systems are used to deposit a metallic coating on a substrate, in particular a thin film coating. These systems essentially produce neutral metal vapours, ie metal atoms of which only a part is ionized.
- such a system comprises a vacuum chamber in which is placed a block of metal which is brought to a positive potential to become an anode, a cathode which generates electrons, and a substrate intended to receive a coating of this metal.
- the system further comprises a series of magnets which are intended to guide the metal ions formed by vaporization of the metal.
- the electrons emitted in a beam by the cathode are attracted by the block of metal forming the anode. Under the effect of the bombardment by the electrons of this beam and the local and intense rise in temperature which results from it, part of the block melts and is transformed into metallic gas. The atoms of this gas are then partially ionized by the flow of electrons emitted by the cathode and form a plasma of positive metal ions and electrons. These positive metal ions are accelerated towards the cathode and towards the substrate which is also placed at a negative potential.
- the cathode is generally annular in shape, so that the ions, guided by the series of magnets arranged around the path between the block of metal and the substrate, pass through the cathode and impact the substrate in order to form a metallic coating.
- the electron emitter is placed in the path of the flow of metal ions, and is therefore progressively damaged by this flow, in particular because of an undesirable deposit of metal ions which forms on the emitter.
- the lifetime of the emitter, and consequently of the plasma generation system, is therefore reduced.
- the present invention aims to remedy these drawbacks.
- the invention aims to propose a system for generating a plasma jet comprising metal ions which is able to generate a directional flow, whose service life is improved, whose manufacture is simplified, and which operates without magnets.
- the system for generating a plasma jet comprises a tube of electrically insulating material containing a metal in solid form at room temperature and an anode in contact with this metal, a generator connected to the anode suitable to create a positive electrical potential at this anode, a heating element capable of heating part of the metal to a heating temperature Tc sufficient to vaporize this part of the metal, a source of electrons located outside the tube and outside the longitudinal axis of the tube, and being able to generate a flow of electrons capable of ionizing the vapor of the metal to form metal ions, so that the metal ions thus produced are able to be repelled and thus accelerated by this potential and ejected out of the tube by the downstream end of the tube, and being partially neutralized by electrons in order to form a plasma flow, the system operating without magnets, without access grid leration.
- the system for generating a plasma jet is simplified because no magnets are used to direct the plasma flow. Indeed, it is the specific distribution of the electric field inside and near the tube which directs the plasma.
- the electron source being located outside the tube and outside its longitudinal axis, is not damaged by the plasma beam.
- the lifetime of the plasma generation system is therefore increased.
- the metal used has an atomic mass greater than or equal to that of gold or has a melting point less than or equal to that of gold.
- the system according to the invention can operate with a metal whose melting point is lower than other metals, since the system does not use a concentrated electron beam, the characteristic of which is to heat the metal very strongly and therefore evaporate it too quickly, unlike existing systems.
- the heating element surrounds the downstream part of the tube.
- the tube is made of ceramic, providing electrical and thermal insulation.
- the anode is separate from the metal contained in the tube.
- the electron source comprises the heating element.
- the electron source comprises an external electron emitter separate from the heating element.
- the generator provides a direct electric current.
- the generator provides pulses generating an electric current.
- inside and outside indicate the region inside and outside the tube, respectively.
- upstream and downstream designate the parts of the tube and of the metal cylinder with respect to the direction of circulation of the ions in the tube.
- the system according to the invention comprises a tube 10, which contains a metal cylinder 20 which provides the metal atoms immediately ionized by the high current density of electrons, the expulsion of which from the tube constitutes the plasma jet.
- this metal is referred to as "plasma metal” to distinguish it from other metals used in the system.
- the tube 10 is made of a material whose melting temperature is higher than the melting temperature Tm of the plasma metal 20.
- the tube 10 is made of ceramic. This ceramic is for example an aluminum oxide, or a boron nitride.
- Tube 10 is electrically insulating.
- a heating element 40 surrounds at least the downstream part 12 of the tube 10. This heating element 40 is powered by a heating source 42. For example, the heating element 40 surrounds the entire tube 10. The heating element is for example a filament wound around the tube 10 helically to form a turn.
- the system according to the invention also comprises an electron source 60.
- This source of electrons is necessary to balance the positive charge of the ions emitted by the plasma metal 20, so that the particles emitted by the system and used for propulsion are globally electrically neutral, downstream of the cylinder.
- the heating element 40 emits electrons, and is therefore the whole of the electron source 60. This is the case when the heating element 40 is a filament. This filament is for example made of tungsten.
- the heating element 40 being the only source of electrons 60, the manufacture of the system is simplified, since the system does not include a separate source of electrons.
- heating element 40 is a cathode (negatively charged).
- the heating element 40 does not emit electrons.
- a source of electrons 60 distinct from the heating element 40, and external to the tube 10, is necessary. This situation is represented on the figure 2 .
- the heating element 40 is a ring which surrounds the downstream part 12 of the tube 10.
- the electron source 60 is an external emitter 62, which is a cathode located close to the downstream end 15 of the downstream part 12 of the tube 10, or an arc generator.
- the external emitter 62 is the only cathode in the system.
- the heating element 40 is for example made of a material such as an Ni-Cr alloy (for example Nichrome ® ), an Fe-Cr-Al alloy (such as Kanthal ® ), or a cupronickel.
- both the heating element 40 and the external emitter 62 are a cathode.
- the electron source 60 then consists of the heating element 40 and the external emitter 62.
- the electron source is located outside the tube 10 and outside the longitudinal axis of the tube 10.
- the heating element 40 is for example made of a material such as lanthanum hexaboride, cerium hexaboride, or mixtures of oxides of barium, strontium, and calcium.
- the heating element 40 is surrounded by an electrical insulator.
- the system comprises an anode 30 (positively charged) which is in contact with the plasma metal 20 when this metal is in solid form.
- the anode 30 is therefore in contact with the plasma metal 20 located in the tube 10.
- the anode 30 is separate from the plasma metal 20 and is located inside the tube 10.
- the anode 30 is made of a conductive material which remains solid during operation of the system for generating a plasma jet.
- the anode 30 is a metal with a melting temperature much higher than that of the plasma metal 20.
- the anode is made of tungsten, tantalum, molybdenum, rhenium, or an alloy of these metals.
- Anode 30 is a wire that extends through the center of plasma metal cylinder 20, from its upstream end to its downstream end.
- An electrical generator 50 is connected to anode 30 and maintains positive electrical potential at anode 30.
- the anode 30 can have any geometry, for example one or more wires embedded in the plasma metal 20, or a grid embedded in the plasma metal 20, or a grid that lines the internal face of the tube 10. Whatever its geometry , the anode 30 is still in contact with the plasma metal 20, which makes it possible to maintain the arrival of the flow of electrons in the plasma metal 20.
- This embodiment has the advantage that the electrical potential is maintained on the plasma metal 20 even when part of the plasma metal 20 passes into the liquid phase.
- Another advantage is that in the event of formation of metal droplets downstream of the plasma metal cylinder 20 during its partial vaporization, the electrical connection to the anode 30 is still made. In fact, these droplets are liable to disturb this electrical connection.
- the anode 30 is formed by the plasma metal 20 itself.
- anode in contact with the metal covers the embodiment where the anode is an element distinct from the metal and in contact with the metal, and the embodiment where the anode is formed by the metal .
- the plasma metal cylinder 20 is fed continuously, that is to say that the cylinder 20 slides in the tube 10 from upstream to downstream in such a way that its solid downstream end is always substantially at the same position in the tube 10 as the plasma metal 20 located at the level of the downstream end 15 of the tube 10 is vaporized.
- the plasma metal cylinder 20 is supplied from a coil.
- Plasma metal 20 is solid at ambient temperature and pressure (about 20° C., 1 atmosphere).
- the plasma generation system according to the invention preferably uses a plasma metal 20 whose atomic mass is greater than or equal to that of gold (whose atomic mass is 197), or whose melting temperature is lower or lower. equal to that of gold (1064°C).
- the plasma metals are chosen from lead (atomic mass of 207, melting temperature of 327°C), bismuth (atomic mass of 208, melting temperature of 271°C), tin (melting temperature of 232°C), zinc (melting temperature 420°C), tellurium (melting temperature 450°C), indium (melting temperature 156°C), thallium (atomic mass 204 , melting temperature of 303°C).
- the melting temperature of plasma metal 20 is less than 500°C.
- the plasma metal 20 has an atomic mass greater than or equal to that of gold, and a melting temperature is less than or equal to that of gold.
- these metals have a lower melting temperature than other metals.
- the heating temperature necessary to melt these metals which is at most of the order of the melting temperature Tm of the metal, is then lower, which makes it possible to dispense with a device for cooling the tube 10.
- the power required to heat the plasma metal 20 and produce the ions is lower, which means a lower energy expenditure.
- the only ions are metal ions.
- the system according to the invention can be used in a space vehicle propulsion system.
- the ejection of the plasma generates a moment which can be used for propulsion (see below the description of the propulsion systems).
- the higher the plasma metal 20 has a high atomic mass in particular if it is greater to that of xenon (of atomic mass 131), the more the impulse generated during the expulsion of this metal is higher than that generated when xenon is used, for the same state of ionization.
- a metal with a high atomic mass has a lower first ionization potential than other materials. For example, it is 6.1 eV for thallium, 7.4 eV for lead, and 9.2 eV for gold, which is lower than the ionization potential of xenon (12.1 eV). Thus, the probability of ionizing these metals is higher than that of ionizing xenon.
- a metal with a high atomic mass has a higher probability of being doubly ionized, i.e., it loses two electrons to form metal ions.
- an ion of this metal is accelerated more than ions losing only one electron, as is generally the case for Xenon.
- the double ionization potentials of lead (15 eV), thallium (20.4 eV) and gold (20.2 eV) are lower than the double ionization potential of xenon (21 eV).
- the invention also relates to a method for generating plasma, the operation of which is described below.
- the plasma metal cylinder 20, in solid form, is placed in the tube 10.
- the plasma metal 20 is then heated by the heating element 40, supplied by the heating source 42, to a heating temperature Tc sufficient to vaporize the downstream end of the plasma metal cylinder 20.
- the heating temperature Tc is therefore much higher than the ambient temperature.
- plasma metal 20 is placed at a non-zero positive potential by generator 50 (either directly or via anode 30 in contact with plasma metal 20).
- the metallic gas, product of this vaporization is ionized by the electrons emitted by the electron source 60 (which is either the heating element 40, or the external emitter 62, or both together). These metal ions are repelled by the metal cylinder 20 because they have the same positive charge, and are accelerated towards the downstream end 15 of the tube 10. These metal ions, which form a plasma, also collide with the electrons emitted by the electron source 60 such that the plasma flux 70 emitted by the tube 10 at its downstream end 15 is partly a flux of electrically neutral metallic particles, partly a flow of metal ions, partly a flow of electrons. The direction of propagation of the flux 70 is indicated by an arrow on the figures 1 and 2 .
- the metal ions are accelerated and then ejected from the tube 10, and during their ejection a part of these metal ions is neutralized by collision with the electrons emitted by the electron source 60. These metal ions which are neutralized are transformed into metal particles electrically neutral.
- the system according to the invention does not include an ion acceleration grid, unlike the HC thrusters (see below). Indeed, these grids are useless because the ions are repelled by the anode and accelerated under a sufficiently high positive voltage (see explanation below). Thus, the manufacture of the system is simplified.
- the system according to the invention does not include magnets, unlike HE thrusters (see below).
- the system therefore does not use a magnetic field generated by magnets to act on the electrons, or on the ions ejected from the metal.
- the system is therefore simpler and less expensive to manufacture.
- the system according to the invention is therefore more compact than other systems according to the prior art.
- the length of the system is of the order of 10 cm, and its diameter is less than 1 cm, for example equal to 0.5 cm.
- the tube 10 Since the tube 10 is heated when the system is operating, the metal vapor particles which could have deposited on the internal surface of the downstream part of the tube 10 will be easily vaporized and will come off the surface during future operation. Thus, the tube 10 is not clogged with deposits.
- the system according to the invention operates with direct current generated by the generator 50, which avoids interference with any electronic components located close to the system which could occur if radio frequency or high frequencies are used. .
- the potential supplied to the anode 30 by the generator 50 is of the order of several hundred volts.
- the intensity of the current is of the order of 1 Amp and more, being able to reach for example 5A or more in pulsed mode.
- the system operates with a series of electrical pulses (pulsed current), using a pulse generator.
- This mode operating mode has the advantage of providing a higher thrust in the case where the system according to the invention is used in a space vehicle propulsion system (see below).
- the pulse generator is powered by generator 50.
- the tests carried out by the inventors show that a stable current of 2 A (Amps) can be reached with an average voltage jump of 2 kV (kiloVolts), which gives a power at each pulse of 4 kW (kiloWatts) per pulse.
- the duration of the pulse is variable between 10 and a few hundred ⁇ s. In the operating example given in picture 3 , the duration of the pulse is approximately 40 ⁇ s (microseconds).
- the curve referenced S represents the pulse signal (in Volts)
- the curve referenced V represents the discharge potential at the anode (in kiloVolts)
- the curve referenced I represents the discharge current at the anode (in Amperes ).
- the duration of the pulse is 40 ⁇ s (microseconds), the unit on the abscissa axis of the picture 3 being in ⁇ s.
- the system allows the efficient transfer of momentum to the heavy ions, all the greater as the voltage applied to the anode is great.
- the system according to the invention does not operate in arc mode standard.
- the voltage supplied initially is of the order of several thousand volts, and remains at a few hundred volts after formation of the arc (breakage or breakdown phenomenon).
- the high value of this voltage (voltage) even after breakdown is due to the formation at the downstream output of the tube 10 of a plasma sphere whose surface is the boundary of the shock wave generated by the expansion of the ion flux in vacuum.
- this boundary is strongly electrically charged, which contributes to accelerating the metal ions ejected by the plasma metal cylinder 20.
- this operating mode from the standard arc, it will be called “anomalous arc”.
- the metal ions are naturally repelled by the anode, and in steady state the plasma is self-sustaining with a heating maintained by the discharge current (i.e., the electrons of the plasma which join the anode), especially for regimes high current.
- the discharge current i.e., the electrons of the plasma which join the anode
- an external electron emitter 62 will be used as an electron source only to emit electrons serving to neutralize the ion plasma towards the downstream end 15 of the tube 10.
- the cathode when the anomalous arc is maintained, can be operated without additional heating.
- This mode of operation of the plasma generation system has the advantage that in steady state the source of electrons 60, in this case the external emitter 62, can operate at a lower electrical power consumption.
- the system (and the method) for generating plasma according to the invention is used in a propulsion system of a space vehicle, the ejection of the plasma serving for the propulsion of this vehicle.
- Hall effect thrusters or HE (“Hall Effect Thruster”) thrusters
- This thruster has an annular space with a bottom at one end, and open at the other end, in which a magnetic field is established.
- a cathode which emits electrons, is located at the open end of the annular space often operating with a gas supply (hollow cathode).
- the bottom of the annular space constitutes an anode, through which are injected atoms of xenon or another propellant gas, often stored in liquefied form.
- the electrons emitted by the cathode are trapped at the entrance to the annular space by the magnetic field, where they accumulate, part of the electrons continuing their journeys towards the anode.
- the propellant gas atoms are ionized by collision with the electrons in the annular space, and accelerated by the electric field towards the open end of this space.
- the ions are neutralized by crossing the cloud of electrons and ejected out of space in the form of a plasma with zero charge. The ejection of this plasma provides propulsion to the space vehicle.
- a gas is injected through a tube (hollow cylinder) forming the anode, the internal surface of which is covered with a material which emits electrons when heated (thermionic emission).
- heating the tube causes ionization of the gas as it passes through the tube.
- the ions thus formed are then accelerated by the potential difference between the anode and the cathode which is located at the end of the tube which is opposite to that through which the gas is injected.
- the HC propellant has drawbacks.
- the HC thruster operates with a low potential difference (approximately 30 V) and therefore a low intrinsic thrust. Accelerating the ions further to achieve greater thrust requires voltages (voltage) of several hundred volts, which involves the use of biased grids. These grids are placed downstream of the tube. This complicates the propulsion system. Moreover, these grids, being subjected to the flow of accelerated ions, wear out, which reduces their long-term effectiveness.
- the propulsion system is simplified because it is not necessary to deposit a coating of an additional material, a source of electrons, on the internal face of the tube. Indeed, the source of electrons is located outside the tube.
- the initial source (precursor material) of material for the ions is, at ambient temperature, not a gas, nor a liquid, but a solid.
- the precursor material which is used by the system according to the invention before the start of its operation, therefore before the heating of this precursor material is a solid metal.
- the acceleration potential of the ions of the propulsion system is higher than that of HC thrusters and the ions are accelerated under a sufficiently high voltage (see explanation above), which makes it possible to overcome the use of polarized grids and therefore to reduce the weight of the system, and which increases its efficiency.
- the system therefore operates without acceleration grids.
- the system works without magnets and therefore without a magnetic field, unlike HE thrusters.
- the system is therefore simpler and less expensive to manufacture.
- the system according to the invention is therefore more compact than other systems according to the prior art.
- the length of the system is of the order of 10 cm, and its diameter is less than 1 cm, for example equal to 0.5 cm.
- the system according to the invention can also be used for other applications, such as the production of multicharged heavy ions for particle accelerators, or for thermonuclear fusion by heavy ions.
- the system according to the invention thus advantageously replaces the existing systems for the production of heavy ions, which use magnetic fields.
- the pulses supplied by the generator are of high power, of the order of several hundred kV.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Electron Sources, Ion Sources (AREA)
Claims (11)
- System zum Erzeugen eines Plasmastrahls, umfassend eine Röhre (10) aus elektrisch isolierendem Material, welches ein Metall (20) enthält, welches bei Raumtemperatur fest ist, und eine Anode (30) in Kontakt mit dem Metall (20), einen elektrischen Generator (50), welcher mit der Anode (30) verbunden ist, welcher in der Lage ist, ein positives elektrisches Potenzial auf Höhe der Anode (30) zu erzeugen, ein Heizelement (40), welches in der Lage ist, einen Teil des Metalls (20) auf eine Heiztemperatur Tc zu erhitzen, welche ausreicht, um den Teil des Metalls (20) zu verdampfen, eine Elektronenquelle (60), welche sich außerhalb der Röhre (10) und außerhalb der Längsachse der Röhre (10) befindet, und in der Lage ist, einen Elektronenfluss zu erzeugen, welcher in der Lage ist, den Dampf aus dem Metall zu ionisieren, um Metallionen dergestalt zu bilden, dass die so hergestellten Metallionen in der Lage sind, durch das Potenzial abgestoßen und dadurch beschleunigt und aus der Röhre (10) durch das vorgelagerte Ende (15) der Röhre (10) ausgeworfen zu werden, und welche zu einem Teil durch Elektronen neutralisiert werden, welche durch die Elektronenquelle (60) abgegeben werden, um einen Plasmafluss (70) zu bilden.
- System zum Erzeugen eines Plasmastrahls nach Anspruch 1, wobei das Metall (20) eine Atommasse aufweist, welche größer als die oder gleich derjenigen von Gold ist, oder eine Schmelztemperatur aufweist, welche kleiner als die oder gleich derjenigen von Gold ist.
- System zum Erzeugen eines Plasmastrahls nach Anspruch 1 oder 2, wobei das Heizelement (40) den vorgelagerten Teil (12) der Röhre (10) umgreift.
- System zum Erzeugen eines Plasmastrahls nach einem der Ansprüche 1 bis 3, wobei die Röhre (10) aus Keramik besteht.
- System zum Erzeugen eines Plasmastrahls nach einem der Ansprüche 1 bis 4, wobei die Anode (30) sich von dem in der Röhre (10) enthaltenen Metall (20) unterscheidet.
- System zum Erzeugen eines Plasmastrahls nach einem der Ansprüche 1 bis 5, wobei die Elektronenquelle (60) das Heizelement (40) umfasst.
- System zum Erzeugen eines Plasmastrahls nach einem der Ansprüche 1 bis 6, wobei die Elektronenquelle (60) eine externe Elektronen emittierende Vorrichtung (62) umfasst, welche sich von dem Heizelement (40) unterscheidet.
- Antriebssystem für ein Raumfahrzeug, umfassend ein System zum Erzeugen eines Plasmastrahls nach einem der vorhergehenden Ansprüche, wobei der Auswurf des Plasmas dem Antrieb dient.
- Verfahren zum Erzeugen eines Plasmastrahls, dadurch gekennzeichnet, dass es folgende Schritte umfasst:(a) Man stellt eine Röhre (10) aus elektrisch isolierendem Material bereit, welches ein Metall (20) umfasst, welches bei Raumtemperatur fest ist, und eine Anode (30) in Kontakt mit dem Metall (20), einen Generator (50), welcher mit der Anode (30) verbunden ist, und eine Elektronenquelle (60), welche sich außerhalb der Röhre (10) und außerhalb der Längsachse der Röhre (10) befindet,(b) Man legt ein positives elektrisches Potenzial auf Höhe der Anode (30) mithilfe des Generators (50) an,(c) Man erhitzt einen Teil des Metalls (20) auf eine Heiztemperatur Tc, welche ausreicht, um den Teil des Metalls (20) zu verdampfen,(d) Man ionisiert den so hergestellten Dampf des Metalls durch die durch die Elektronenquelle (60) emittierten Elektronen zum Bilden von Metallionen, welche durch das Potenzial beschleunigt und aus der Röhre (10) durch das vorgelagerte Ende (15) der Röhre (10) ausgeworfen werden, und welche zu einem Teil durch die durch die Elektronenquelle (60) emittierten Ionen neutralisiert werden, um einen Plasmafluss (70) zu bilden.
- Verfahren zum Erzeugen eines Plasmastrahls nach Anspruch 9, wobei der Generator (50) einen elektrischen Gleichstrom bereitstellt.
- Verfahren zum Erzeugen eines Plasmastrahls nach Anspruch 9, wobei der Generator (50) Impulse bereitstellt, welche einen elektrischen Strom erzeugen.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1750750A FR3062545B1 (fr) | 2017-01-30 | 2017-01-30 | Systeme de generation d'un jet plasma d'ions metalliques |
PCT/FR2018/050205 WO2018138458A1 (fr) | 2017-01-30 | 2018-01-30 | Systeme de generation d'un jet plasma d'ions metalliques |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3574719A1 EP3574719A1 (de) | 2019-12-04 |
EP3574719B1 true EP3574719B1 (de) | 2022-04-20 |
Family
ID=59253595
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP18705434.1A Active EP3574719B1 (de) | 2017-01-30 | 2018-01-30 | System zur erzeugung eines plasmastrahls von metallionen |
Country Status (4)
Country | Link |
---|---|
US (1) | US10863612B2 (de) |
EP (1) | EP3574719B1 (de) |
FR (1) | FR3062545B1 (de) |
WO (1) | WO2018138458A1 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110732301B (zh) * | 2019-11-08 | 2021-07-13 | 天津双微电子科技有限公司 | 液态汽化等离子体结构 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4328667A (en) * | 1979-03-30 | 1982-05-11 | The European Space Research Organisation | Field-emission ion source and ion thruster apparatus comprising such sources |
DE10130464B4 (de) * | 2001-06-23 | 2010-09-16 | Thales Electron Devices Gmbh | Plasmabeschleuniger-Anordnung |
US6769241B2 (en) * | 2001-07-09 | 2004-08-03 | W. E. Research Llc | Description of methods to increase propellant throughput in a micro pulsed plasma thruster |
DE10153723A1 (de) * | 2001-10-31 | 2003-05-15 | Thales Electron Devices Gmbh | Plasmabeschleuniger-Anordnung |
HUP0400808A2 (hu) * | 2004-04-19 | 2005-11-28 | Dr.Kozéky László Géza | Fémgőz ívű plazmafáklya és annak alkalmazása a metallurgiában, a plazmaenergiás pirolízisben és vitrifikációban, és más anyagátalakító eljárásokban |
US7701145B2 (en) * | 2007-09-07 | 2010-04-20 | Nexolve Corporation | Solid expellant plasma generator |
DE102007044074B4 (de) * | 2007-09-14 | 2011-05-26 | Thales Electron Devices Gmbh | Elektrostatische Ionenbeschleunigeranordnung |
US9603233B2 (en) * | 2010-11-11 | 2017-03-21 | Schlumberger Technology Corporation | Particle accelerator with a heat pipe supporting components of a high voltage power supply |
FR3040442B1 (fr) * | 2015-08-31 | 2019-08-30 | Ecole Polytechnique | Propulseur ionique a grille avec propergol solide integre |
-
2017
- 2017-01-30 FR FR1750750A patent/FR3062545B1/fr not_active Expired - Fee Related
-
2018
- 2018-01-30 US US16/479,903 patent/US10863612B2/en active Active
- 2018-01-30 WO PCT/FR2018/050205 patent/WO2018138458A1/fr unknown
- 2018-01-30 EP EP18705434.1A patent/EP3574719B1/de active Active
Also Published As
Publication number | Publication date |
---|---|
EP3574719A1 (de) | 2019-12-04 |
US10863612B2 (en) | 2020-12-08 |
FR3062545A1 (fr) | 2018-08-03 |
US20190373711A1 (en) | 2019-12-05 |
WO2018138458A1 (fr) | 2018-08-02 |
FR3062545B1 (fr) | 2020-07-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0650557B1 (de) | Plasmatriebwerk mit geschlossener elektronenlaufbahn | |
EP0781921B1 (de) | Ionenquelle mit geschlossener Elektronendrift | |
EP2798209B1 (de) | Plasmatriebwerk und verfahren zur erzeugung eines plasmaantriebsschubs | |
RU2445510C2 (ru) | Ракетный двигатель малой тяги для космического летательного аппарата | |
EP1496727B1 (de) | Plasmabeschleuniger mit geschlossener Elektronenbahn | |
US20070026160A1 (en) | Apparatus and method utilizing high power density electron beam for generating pulsed stream of ablation plasma | |
WO2002012591A1 (fr) | Procede et dispositif pour traiter des substrats metalliques au defile par plasma | |
EP0914560B1 (de) | PLASMATRIEBWERK mit einer IONENSTRAHLFOKUSIERUNGSVORRICHTUNG | |
EP0645947B1 (de) | Neutronenröhre mit magnetischem Elektroneneinschluss durch Dauermagneten und dessen Herstellungsverfahren | |
EP3574719B1 (de) | System zur erzeugung eines plasmastrahls von metallionen | |
EP1767894B1 (de) | Im Innern eines Flugkörpers angebrachte Plasmaentladungen erzeugende Vorrichtung zur Steuerung eines supersonischen oder hypersonischen Flugkörpers | |
FR2984028A1 (fr) | Eclateur haute tension a amorcage par laser comportant une cathode en materiau refractaire poreux a charge photoemissive | |
EP3250822B1 (de) | Hall-effekt-antrieb und raumfahrzeug mit diesem antrieb | |
EP3350441B1 (de) | Verfahren zur treibmittelversorgung des antriebs eines satelliten und nach diesem verfahren angetriebenes satellitenantriebsmodul | |
Loktionov et al. | Combined impact features for laser plasma generation | |
EP2311061B1 (de) | Elektronenzyklotronresonanzionengenerator | |
WO2014095888A1 (fr) | Dispositif d'optique electronique | |
EP0387145A1 (de) | Elektronenstrahlerzeuger und elektronische Vorrichtungen mit einem solchen Erzeuger | |
FR2635913A1 (fr) | Diode a emission de champ | |
WO2018007542A1 (fr) | Procédé de contrôle d'un propulseur électrique à effet hall | |
CA2139581A1 (fr) | Moteur a plasma a derive fermee d'electrons |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: UNKNOWN |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
17P | Request for examination filed |
Effective date: 20190724 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: GRANT OF PATENT IS INTENDED |
|
INTG | Intention to grant announced |
Effective date: 20211202 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE PATENT HAS BEEN GRANTED |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D Free format text: LANGUAGE OF EP DOCUMENT: FRENCH |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R096 Ref document number: 602018034110 Country of ref document: DE |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: REF Ref document number: 1486189 Country of ref document: AT Kind code of ref document: T Effective date: 20220515 |
|
REG | Reference to a national code |
Ref country code: LT Ref legal event code: MG9D |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: MP Effective date: 20220420 |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: MK05 Ref document number: 1486189 Country of ref document: AT Kind code of ref document: T Effective date: 20220420 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220822 Ref country code: NO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220720 Ref country code: LT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: HR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220721 Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: BG Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220720 Ref country code: AT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: RS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: PL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: LV Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: IS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220820 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R097 Ref document number: 602018034110 Country of ref document: DE |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SM Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: RO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: EE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: CZ Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed |
Effective date: 20230123 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20230130 |
|
REG | Reference to a national code |
Ref country code: BE Ref legal event code: MM Effective date: 20230131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20230131 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20230131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20230131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20230130 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20240228 Year of fee payment: 7 Ref country code: GB Payment date: 20240131 Year of fee payment: 7 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20240130 Year of fee payment: 7 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20220420 |