EP3511177B1 - Security element with optically variable embossed structure - Google Patents

Security element with optically variable embossed structure Download PDF

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Publication number
EP3511177B1
EP3511177B1 EP19000014.1A EP19000014A EP3511177B1 EP 3511177 B1 EP3511177 B1 EP 3511177B1 EP 19000014 A EP19000014 A EP 19000014A EP 3511177 B1 EP3511177 B1 EP 3511177B1
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EP
European Patent Office
Prior art keywords
embossed
plateau
embossing
security element
elements
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EP19000014.1A
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German (de)
French (fr)
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EP3511177A1 (en
Inventor
Karlheinz Mayer
Thanh-Hao Huynh
Peter Franz
Raphael DEHMEL
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Giesecke and Devrient Currency Technology GmbH
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Giesecke and Devrient Currency Technology GmbH
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Publication of EP3511177A1 publication Critical patent/EP3511177A1/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/324Reliefs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40Manufacture
    • B42D25/405Marking
    • B42D25/425Marking by deformation, e.g. embossing

Definitions

  • the invention relates to a security element made of a substrate with an optically variable structure which has an embossed structure and a coating, the embossed structure and the coating being combined in such a way that at least parts of the coating are completely visible when viewed perpendicularly, but are covered when viewed obliquely, so that when the viewing direction changes, different information becomes visible, the embossed structure consisting of non-linear embossed elements which adjoin one another, with each non-linear embossed element essentially consisting of a flank.
  • the invention also relates to an embossing tool for producing such a security element.
  • an embossing tool for producing a security element with an optically variable structure is known, the optically variable structure showing a tilting effect when the security element is tilted about an axis.
  • the embossing tool consists of an embossing plate with a surface, the surface of the embossing plate having a plurality of groove-shaped depressions arranged essentially parallel to one another.
  • the channel-shaped depressions each consist of a first and a second flank, which are opposite one another.
  • the first flank of a depression and the second flank of the depression adjacent to this depression converge in the direction of the surface of the embossing plate, the first flank of each channel-shaped depression having a different angle of inclination to the surface of the embossing plate than the corresponding second flank.
  • a flat area is arranged which is aligned essentially parallel to the surface of the embossing plate.
  • a security element with an optically variable structure which has an embossed structure and a coating, the embossed structure and the coating being combined in such a way that at least parts of the coating are completely visible when viewed perpendicularly, but are covered when viewed obliquely, so that when there is a change Different information becomes visible depending on the viewing direction.
  • the embossed structure consists of non-linear embossed elements which can in particular be arranged in a grid shape and can have the shape of a tetrahedron, spherical segment, truncated pyramid, truncated cone, cylinder segment, torus, oval, drop or pyramid.
  • a security element with an optically variable structure which has a plurality of embossed elements, each of the embossed elements consisting of at least two flanks which converge at a specific angle and / or a specific direction.
  • the surface of the embossing elements is reflective.
  • the security element consists of at least two groups of embossed elements, the at least two groups only differing from one another in the angle and / or the direction at which the flanks of the embossed elements converge.
  • Each embossing element of the WO 2013/045054 has a regular hexagonal base.
  • the aim of the invention is to prevent the fine, tapered flanks from being rounded off during the complex production of embossing forms and process steps for intaglio printing or gravure printing, and thus the optically variable effect to be generated suffers. Furthermore the aim is to avoid changes in the structures to be depicted or wear and tear of a knife, wiper cylinder, etc. when the embossing forms are subsequently used for longer runs. surrender.
  • the invention is therefore based on the object of developing a generic security element in such a way that the disadvantages of the prior art are eliminated and the protection against counterfeiting is further increased.
  • a flat area or a plateau is arranged between adjoining embossing elements, which area is arranged essentially parallel to the surface of the substrate surrounding the embossing element.
  • Essentially parallel means that the angle between the flat area or plateau and the surface of the substrate surrounding the security element or the embossing tool is preferably 0 ° (exactly parallel) and particularly preferably 0.5 ° to 5 °.
  • the flat area or the plateau is only arranged between two adjacent embossing elements, so that it is only located near the surface of the substrate or the embossing plate.
  • the flat area or the plateau is arranged around the entire embossing element, that is to say runs around the entire embossing element and is therefore not only arranged between two adjacent embossing elements.
  • the invention also relates to an embossing tool for producing such a security element.
  • the embossing tool is preferably an embossing cylinder, an embossing die or a printing plate, in particular a intaglio printing plate, the elements to be embossed being designed as an engraving or an elevation in the surface of the embossing tool.
  • the flat area or the plateau has the advantage over pointed structures that it is less sensitive to erosion by processing tools with which the embossing tool is engraved, in particular a (wide) laser beam. Furthermore, plateaus are less sensitive to deburring, cleaning and polishing of the embossing tool, for example by means of a doctor blade, polishing agent, abrasive, water jet cleaning, etching process or by means of rotating brushes, and thus show less plate wear. Furthermore, a downstream chrome plating of the embossing tool has better adhesion to the carrier material, which also reduces mechanical wear. In addition, the stamping tool itself, when used as intended, is more stable against wear and tear due to process-related influences.
  • the edge of a flat area or plateau can run towards the flank of an adjacent embossed element in such a way that the plateau is surrounded by a “sharp” edge.
  • the flat area with a certain inclination merges directly into the embossing element with a different inclination, the inclination directly at the edge not being differentiable in a mathematical sense.
  • the edge of a flat area or plateau can also continuously merge into a flank of an adjoining embossed element, so that an arcuate or round transition results from the flat area to the flank of the adjoining embossed element.
  • an approximately steady transition is also possible, in which the inclination of the flat area gradually merges over one or more adjacent flat areas with a gradually changing inclination into the flank of the adjacent embossed element.
  • the angle of the flank remains the same within an embossed element.
  • the engraving depth must be adjusted accordingly.
  • a constant flank angle is necessary if the micromirror element should only appear in a certain angular range.
  • the non-linear embossed elements have a base in the form of a triangle, square, hexagonal honeycomb, octagon or other polygon. Mixtures of various of the aforementioned shapes are also possible, for example hexagons that border on quadrilaterals.
  • the width of the flat area i.e. both the "peak” (near the surface of the embossing plate or the substrate) and the “troughs” (away from the surface of the embossing plate or the substrate) are preferably 1 ⁇ m to 200 ⁇ m, particularly preferably 5 ⁇ m to 150 ⁇ m and very particularly preferably 10 ⁇ m to 120 ⁇ m.
  • the ratio of the distance between adjacent engravings and the corresponding engraving depth is 1: 5 to 20: 1, preferably 1: 3 to 10: 1 and particularly preferably 1: 2 to 6: 1 amounts.
  • the depth of the engraved depressions is 10 ⁇ m to 500 ⁇ m, preferably 10 ⁇ m to 350 ⁇ m and particularly preferably 10 ⁇ m to 200 ⁇ m.
  • embossed structures below the plate level were shown, as are mainly used in intaglio printing. If the embossing structure for gravure printing is used as blind embossing (round embossing cylinder versus round impression cylinder) or embossing (flat embossing plate versus flat impression plate), these are usually used raised above the plate surface. This increases the partial embossing pressure enormously and at the same time reduces the requirement for the provision of printing.
  • the plateaus are then particularly preferably to be attached to the edges and tips which protrude farthest from the plate surface.
  • the embossing tool according to the invention is particularly suitable for engraving processes in which a rotating cylindrical workpiece made of plastic, for example Kapton, or of metal, for example brass, is engraved by means of a laser beam, the so-called “Computer to Intaglioplate” or “CTiP” method .
  • CTiP Computer to Intaglioplate
  • the invention preferably makes it possible to use CTiP systems and thus to enable the use of “data merchandise”, that is to say predetermined embossing data for certain banknote denominations of a currency. Even if the laser diameter is not compensated, a suitable choice of the plateaus can prevent damage to the desired embossed structures by keeping sufficiently wide plateaus within the data structure.
  • the invention is not limited to embossing tools that are engraved by means of a laser beam. Rather, all other engraving methods known from the prior art can also be used, such as mechanical engraving using a stylus. In addition, direct manufacturing processes are also possible, such as 3D printing or sintering.
  • the plateau leads to a reduction in the sharpness of the edges, so that possible paper damage can be prevented during the embossing and the durability of the wiping cylinder of a intaglio printing machine can be increased.
  • the plateaus are also less sensitive to wear and tear from the wiping cylinder.
  • Advantages of the invention are an improvement in the implementation and durability of the sensitive flanks and edges, an improved optically variable effect even with origination processes such as CtIP (creation of embossed structures in plastic plates or cylinders by means of laser radiation), better repeatability and greater adaptability to the substrate and counter pressure form.
  • An optically variable element in the context of this invention is an element whose visual appearance changes when the element is tilted or rotated. For example, when the optically variable element is tilted or rotated, its color changes, a bar appears to move from one side of the element to another, different characters are displayed when tilted or rotated, or a so-called pumping effect results in the form of an enlarging or decreasing effect Outline of an image motif.
  • the substrate particularly preferably consists of paper made of cotton fibers, as is used for example for bank notes, or of other natural fibers or of synthetic fibers or a mixture of natural and synthetic fibers, or of at least one plastic film. Furthermore, the substrate preferably consists of a combination of at least two different substrates arranged one above the other and connected to one another, a so-called hybrid.
  • the Substrate for example, from a combination of plastic film-paper-plastic film, i.e. a substrate made of paper is covered on each of its two sides by a plastic film, or from a combination of paper-plastic film-paper, i.e. a substrate made of a plastic film is covered on each of its two sides Paper covered.
  • the font DE 102 43 653 A9 states in particular that the paper layer usually has a weight of 50 g / m 2 to 100 g / m 2 , preferably 80 g / m 2 to 90 g / m 2 .
  • any other suitable weight can be used depending on the application.
  • Documents of value for which such a substrate or security paper can be used are, in particular, banknotes, shares, bonds, certificates, vouchers, checks, high-quality entry tickets, but also other forgery-prone papers, such as passports and other identification documents, as well as cards, such as credit cards. or debit cards, the card body of which has at least one layer of security paper, and also product security elements such as labels, seals, packaging, folding boxes, package inserts, blisters and the like.
  • the simplified designation of value document includes all of the above materials, documents and product security means.
  • register the positional accuracy of printed images or other elements with respect to one another on the front and / or back of a substrate.
  • register For example, interfere with parts of print images which, when viewed through, form an overall print image add, even small deviations of less than 0.1 mm between the respective print images significantly improve the visual impression when viewed through.
  • DIN 16500-2: 1987-01 defines register as the accuracy in printing technology with which the intended reproduction quality of the details to be reproduced is achieved or maintained.
  • Information within the meaning of this invention is a visually perceptible representation designed in the form of a pattern. This can, for example, form an alphanumeric string of digits and / or letters, a graphic image, an image, a text or other characters.
  • the information particularly preferably consists of positive and / or negative motifs.
  • a motif element itself is applied to the substrate, whereas in the case of a negative motif, the area surrounding the motif element is applied to the substrate.
  • a positive motif is, for example, a letter printed in dark color on the light substrate.
  • a negative motif is, for example, an area applied in dark color to the light-colored substrate, which has an unprinted area in the form of a letter within the area.
  • the embodiments described in the following examples are reduced to the essential core information for better understanding.
  • much more complex patterns or images in single or multi-color printing can be used as a coating.
  • the information presented in the following examples can also be replaced by any complex image or text information.
  • the generation of the coating z. B. as an imprint usually uses the possibilities of printing technology. Typical dimensions of non-linear basic elements from approx. 10 ⁇ m are used.
  • Embossed elements that form the embossed structure generally have an embossed height in the range from 10 ⁇ m to 500 ⁇ m, preferably from 50 ⁇ m to 120 ⁇ m.
  • Fig. 1 shows schematically an arrangement of two embossed structures 1, 2 in the form of hexagonal honeycombs and here in the left figure in plan view and in the right figure in cross section along the cutting axis AB.
  • the angle ⁇ at the honeycomb edge that is, between the honeycomb mirror surfaces of the relevant edge is greater than 120 °, so that, according to the above statements, no plateau is inserted between the two honeycombs.
  • the honeycomb edge is at the level of the substrate or plate surface 3, which is indicated in the right figure by the dashed line.
  • Fig. 2 shows schematically the two embossed structures 4, 5 in the form of hexagonal honeycombs, here in contrast to the honeycombs Fig. 1 the angle ⁇ at the honeycomb edge is less than 120 °, so that, according to the above statements, a plateau is inserted between the two honeycombs.
  • the plateau is in Fig. 2 to clarify the angle ⁇ not shown.
  • the honeycomb edge is located recessed by the distance d from the substrate or plate surface 3, with d ⁇ 20 ⁇ m, preferably d ⁇ 10 ⁇ m, particularly preferably d ⁇ 5 ⁇ m.
  • a plateau is in Fig. 3 and in Fig. 4 shown.
  • Fig. 3 shows a plan view in the left figure and a plateau along the sectional axis EF in the right figure, which is arranged both between the two embossed structures 4 and 5 and around both embossed structures 4 and 5.
  • Fig. 4 shows in the left figure a plan view and in the right figure along the sectional axis GH a plateau which is only arranged between the two embossed structures 4 and 5.
  • the plateau between the two embossed structures 4 and 5 is arranged recessed by the distance d from the substrate or plate surface 3.
  • the embossed structures are in FIGS. 1 to 4 each shown as a hexagonal honeycomb.
  • any other shapes are also possible, such as triangles, squares, octagons or other polygons. Mixtures of various of the aforementioned shapes are also possible, for example hexagons that border on quadrilaterals.
  • embossed structures on or below the substrate or plate surface 3 were shown, as are mainly used in intaglio printing. If the embossing structure for gravure printing is used as blind embossing (round / round) or embossing (flat / flat), these are used as in Fig. 6 shown, mostly inserted raised above the plate surface 3. This increases the partial embossing pressure enormously and at the same time reduces the requirement for the provision of printing. According to Fig. 6 In this case, the plateaus should preferably be attached to the edges and tips that protrude farthest from the plate surface.

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Description

Die Erfindung betrifft ein Sicherheitselement aus einem Substrat mit einer optisch variablen Struktur, die eine Prägestruktur und eine Beschichtung aufweist, wobei die Prägestruktur und die Beschichtung so kombiniert sind, dass wenigstens Teile der Beschichtung bei senkrechter Betrachtung vollständig sichtbar sind, bei Schrägbetrachtung aber verdeckt werden, so dass bei Änderung der Betrachtungsrichtung unterschiedliche Informationen sichtbar werden, wobei die Prägestruktur aus nicht linienförmigen Prägeelementen besteht, die aneinander angrenzen, wobei jedes nichtlinienförmige Prägeelement im Wesentlichen aus einer Flanke besteht. Die Erfindung betrifft weiterhin ein Prägewerkzeug zur Herstellung eines derartigen Sicherheitselements.The invention relates to a security element made of a substrate with an optically variable structure which has an embossed structure and a coating, the embossed structure and the coating being combined in such a way that at least parts of the coating are completely visible when viewed perpendicularly, but are covered when viewed obliquely, so that when the viewing direction changes, different information becomes visible, the embossed structure consisting of non-linear embossed elements which adjoin one another, with each non-linear embossed element essentially consisting of a flank. The invention also relates to an embossing tool for producing such a security element.

Aus EP 3124285 A1 ist ein Prägewerkzeug zur Herstellung eines Sicherheitselements mit einer optisch variablen Struktur bekannt, wobei die optisch variable Struktur beim Kippen des Sicherheitselementes um eine Achse einen Kippeffekt zeigt. Das Prägewerkzeug besteht aus einer Prägeplatte mit einer Oberfläche, wobei die Oberfläche der Prägeplatte eine Vielzahl von im Wesentlichen parallel zueinander angeordneten, rinnenförmigen Vertiefungen aufweist. Die rinnenförmigen Vertiefungen bestehen jeweils aus einer ersten und einer zweiten Flanke, die sich gegenüberliegen. Jeweils die erste Flanke einer Vertiefung und die zweite Flanke der dieser Vertiefung benachbarten Vertiefung laufen in Richtung der Oberfläche der Prägeplatte aufeinander zu, wobei die erste Flanke jeder rinnenförmigen Vertiefung einen anderen Neigungswinkel gegenüber der Oberfläche der Prägeplatte aufweist, als die entsprechende zweite Flanke. Jeweils zwischen der ersten Flanke einer Vertiefung und der zweiten Flanke der dieser Vertiefung benachbarten Vertiefung ist ein ebener Bereich angeordnet, der im Wesentlichen parallel zur Oberfläche der Prägeplatte ausgerichtet ist.Out EP 3124285 A1 an embossing tool for producing a security element with an optically variable structure is known, the optically variable structure showing a tilting effect when the security element is tilted about an axis. The embossing tool consists of an embossing plate with a surface, the surface of the embossing plate having a plurality of groove-shaped depressions arranged essentially parallel to one another. The channel-shaped depressions each consist of a first and a second flank, which are opposite one another. The first flank of a depression and the second flank of the depression adjacent to this depression converge in the direction of the surface of the embossing plate, the first flank of each channel-shaped depression having a different angle of inclination to the surface of the embossing plate than the corresponding second flank. In each case between the first flank of a depression and the second flank of the one adjacent to this depression In the recess, a flat area is arranged which is aligned essentially parallel to the surface of the embossing plate.

Aus WO 2006/018232 A1 ist ein Sicherheitselement mit einer optisch variablen Struktur bekannt, die eine Prägestruktur und eine Beschichtung aufweist, wobei die Prägestruktur und die Beschichtung so kombiniert sind, dass wenigstens Teile der Beschichtung bei senkrechter Betrachtung vollständig sichtbar sind, bei Schrägbetrachtung aber verdeckt werden, so dass bei Änderung der Betrachtungsrichtung unterschiedliche Informationen sichtbar werden. Die Prägestruktur besteht aus nicht linienförmigen Prägeelementen, die insbesondere rasterförmig angeordnet sein können und die Form eines Tetraeders, Kugelabschnittes, Pyramidenstumpfes, Kegelstumpfes, Zylinderabschnittes, Torus, Ovals, Tropfens oder einer Pyramide aufweisen können. Aus WO 2013/045054 A1 ist ein Sicherheitselement mit einer optisch variablen Struktur bekannt, die eine Vielzahl von Prägeelementen aufweist, wobei jedes der Prägeelemente aus mindestens zwei Flanken besteht, die in einem bestimmten Winkel und/ oder einer bestimmten Richtung aufeinander zulaufen. Die Oberfläche der Prägeelemente ist reflektierend ausgeführt. Des Weiteren besteht das Sicherheitselement aus mindestens zwei Gruppen von Prägeelementen, wobei sich die mindestens zwei Gruppen lediglich in dem Winkel und/oder der Richtung, mit dem bzw. der die Flanken der Prägeelemente aufeinander zulaufen, voneinander unterscheiden. Jedes Prägeelement der WO 2013/045054 weist eine regelmäßige sechseckige Grundfläche auf.Out WO 2006/018232 A1 A security element with an optically variable structure is known which has an embossed structure and a coating, the embossed structure and the coating being combined in such a way that at least parts of the coating are completely visible when viewed perpendicularly, but are covered when viewed obliquely, so that when there is a change Different information becomes visible depending on the viewing direction. The embossed structure consists of non-linear embossed elements which can in particular be arranged in a grid shape and can have the shape of a tetrahedron, spherical segment, truncated pyramid, truncated cone, cylinder segment, torus, oval, drop or pyramid. Out WO 2013/045054 A1 a security element with an optically variable structure is known which has a plurality of embossed elements, each of the embossed elements consisting of at least two flanks which converge at a specific angle and / or a specific direction. The surface of the embossing elements is reflective. Furthermore, the security element consists of at least two groups of embossed elements, the at least two groups only differing from one another in the angle and / or the direction at which the flanks of the embossed elements converge. Each embossing element of the WO 2013/045054 has a regular hexagonal base.

Dokument US 5,538,753 offenbart ein Sicherheitselement nach dem Oberbegriff des Anspruchs 1.document U.S. 5,538,753 discloses a security element according to the preamble of claim 1.

Durch die Erfindung soll vermieden werden, dass während der aufwändigen Herstellung von Prägeformen und Prozessschritte für den Stichtiefdruck oder den Tiefdruck die feinen spitz zulaufenden Flanken abgerundet werden und damit der zu erzeugende optisch variable Effekt leidet. Des Weiteren soll vermieden werden, dass sich bei einer nachfolgenden Verwendung der Prägeformen für höhere Auflagen Veränderungen der abzubildenden Strukturen oder eine Abnutzung eines Rackelmessers, Wischzylinders o.ä. ergeben.The aim of the invention is to prevent the fine, tapered flanks from being rounded off during the complex production of embossing forms and process steps for intaglio printing or gravure printing, and thus the optically variable effect to be generated suffers. Furthermore the aim is to avoid changes in the structures to be depicted or wear and tear of a knife, wiper cylinder, etc. when the embossing forms are subsequently used for longer runs. surrender.

Der Erfindung liegt deshalb die Aufgabe zugrunde, ein gattungsgemäßes Sicherheitselement derart weiterzubilden, dass die Nachteile des Standes der Technik behoben werden und der Schutz gegenüber Fälschungen weiter erhöht wird.The invention is therefore based on the object of developing a generic security element in such a way that the disadvantages of the prior art are eliminated and the protection against counterfeiting is further increased.

Diese Aufgabe wird durch die Merkmale der unabhängigen Ansprüche gelöst. Weiterbildungen der Erfindung sind Gegenstand der abhängigen Ansprüche.This object is achieved by the features of the independent claims. Developments of the invention are the subject of the dependent claims.

Erfindungsgemäß ist zwischen angrenzenden Prägeelementen ein ebener Bereich bzw. ein Plateau angeordnet, der im Wesentlichen parallel zu der das Prägeelement umgebenden Oberfläche des Substrats angeordnet ist. Im Wesentlichen parallel bedeutet hierbei, dass der Winkel zwischen dem ebenen Bereich bzw. Plateau und der Oberfläche des das Sicherheitselement umgebenden Substrats bzw. dem Prägewerkzeug zueinander bevorzugt 0° (exakt parallel) und besonders bevorzugt 0,5° bis 5° beträgt.According to the invention, a flat area or a plateau is arranged between adjoining embossing elements, which area is arranged essentially parallel to the surface of the substrate surrounding the embossing element. Essentially parallel here means that the angle between the flat area or plateau and the surface of the substrate surrounding the security element or the embossing tool is preferably 0 ° (exactly parallel) and particularly preferably 0.5 ° to 5 °.

Gemäß einer bevorzugten Ausführungsform ist der ebene Bereich bzw. das Plateau nur zwischen zwei angrenzenden Prägeelementen angeordnet, so dass es sich nur nahe der Oberfläche des Substrats oder der Prägeplatte befindet. Alternativ ist der ebene Bereich bzw. das Plateau um das gesamte Prägeelement herum angeordnet, verläuft also um das gesamte Prägeelement herum und ist damit nicht nur zwischen zwei angrenzenden Prägeelementen angeordnet.According to a preferred embodiment, the flat area or the plateau is only arranged between two adjacent embossing elements, so that it is only located near the surface of the substrate or the embossing plate. Alternatively, the flat area or the plateau is arranged around the entire embossing element, that is to say runs around the entire embossing element and is therefore not only arranged between two adjacent embossing elements.

Erfindungsgemäß sollen insbesondere fragile, in die Höhe stehende Spitzen vor dem "Erodieren" oder mechanischen Beschädigungen in den verschiedenen Prozess-Schritten und während des Prägeprozesses bewahrt werden. Deshalb ist es besonders vorteilhaft, wenn ein ebener Bereich bzw. ein Plateau an den Kanten zwischen zwei angrenzenden Prägeelementen einführt wird, wenn die beiden folgenden Bedingungen erfüllt sind:

  • Die Kante zwischen zwei Prägeelementen befindet sich an der Plattenoberfläche oder ist maximal um den Abstand d von der Plattenoberfläche vertieft angeordnet, wobei d < 20 µm, bevorzugt d < 10 µm, besonders bevorzugt d < 5 µm ist, und
  • der Winkel α zwischen der Spiegelfläche des Prägeelements und der betreffenden Kante beträgt α < 120°, bevorzugt α < 90° und besonders bevorzugt α < 60°.
According to the invention, in particular, fragile, tall peaks are to be protected from "eroding" or mechanical damage in the various process steps and during the embossing process. It is therefore particularly advantageous if a flat area or a plateau is introduced at the edges between two adjacent embossing elements if the following two conditions are met:
  • The edge between two embossed elements is located on the plate surface or is recessed by a maximum of the distance d from the plate surface, with d <20 μm, preferably d <10 μm, particularly preferably d <5 μm, and
  • the angle α between the mirror surface of the embossing element and the relevant edge is α <120 °, preferably α <90 ° and particularly preferably α <60 °.

Das entsprechende Plateau verläuft dort, wo die beiden vorangehenden Bedingungen im überwiegenden Teil der Kante des Prägeelements erfüllt sind, parallel zur Plattenoberfläche und zwar jeweils in der Tiefe, in der sich die beiden Prägeelement-Flächen an der Kante treffen. Sollte an der Kante ein Tiefensprung zwischen den beiden Prägeelement-Flächen bestehen, wird für das Plateau die Tiefe derjenigen Prägeelement-Fläche verwendet, deren Abstand zur Platenoberfläche geringer ist.The corresponding plateau runs where the two preceding conditions are met in the predominant part of the edge of the embossing element, parallel to the plate surface and in each case in the depth at which the two embossing element surfaces meet at the edge. If there is a jump in depth between the two embossed element surfaces at the edge, the depth of that embossed element surface is used for the plateau whose distance from the surface of the plate is smaller.

Die Erfindung betrifft weiterhin eine Prägewerkzeug zur Herstellung eines derartigen Sicherheitselements. Das Prägewerkzeug ist bevorzugt ein Prägezylinder, ein Prägestempel oder eine Druckplatte, insbesondere eine Stichtiefdruckplatte, wobei die zu prägenden Elemente als Gravur oder als Erhöhung in der Oberfläche des Prägewerkzeuges ausgeführt sind.The invention also relates to an embossing tool for producing such a security element. The embossing tool is preferably an embossing cylinder, an embossing die or a printing plate, in particular a intaglio printing plate, the elements to be embossed being designed as an engraving or an elevation in the surface of the embossing tool.

Der ebene Bereich bzw. das Plateau hat gegenüber spitzen Strukturen den Vorteil, dass es unempfindlicher gegen Erosion durch Bearbeitungswerkzeuge ist, mit denen das Prägewerkzeug graviert wird, insbesondere einen (breiten) Laserstrahl. Des Weiteren sind Plateaus unempfindlicher bei Entgratung, Reinigung und Polieren des Prägewerkzeugs, beispielsweise mittels Rakel, Poliermittel, Schleifmittel, Wasserstrahlreinigung, Ätzverfahren oder mittels rotierender Bürsten und weisen somit einen geringeren Plattenverschleiß auf. Des Weiteren hat eine nachgelagerte Verchromung des Prägewerkzeugs eine bessere Haftung auf dem Trägermaterial, wodurch sich der mechanische Verschleiß zusätzlich reduziert. Außerdem ist auch das Prägewerkzeug selbst in seinem bestimmungsgemäßen Einsatz stabiler gegen Verschleiß durch verfahrensbedingte Einflüsse.The flat area or the plateau has the advantage over pointed structures that it is less sensitive to erosion by processing tools with which the embossing tool is engraved, in particular a (wide) laser beam. Furthermore, plateaus are less sensitive to deburring, cleaning and polishing of the embossing tool, for example by means of a doctor blade, polishing agent, abrasive, water jet cleaning, etching process or by means of rotating brushes, and thus show less plate wear. Furthermore, a downstream chrome plating of the embossing tool has better adhesion to the carrier material, which also reduces mechanical wear. In addition, the stamping tool itself, when used as intended, is more stable against wear and tear due to process-related influences.

Der Rand eines ebenen Bereichs bzw. Plateaus kann derart auf die Flanke eines angrenzenden Prägeelements zulaufen, dass das Plateau von einer "scharfen" Kante umgeben ist. Hierbei geht der ebene Bereich mit einer bestimmten Neigung direkt in das Prägeelement mit einer anderen Neigung über, wobei die Neigung direkt an der Kante im mathematischen Sinn nicht differenzierbar ist. Alternativ kann jedoch der Rand eines ebenen Bereichs bzw. Plateaus auch stetig in eine Flanke eines angrenzenden Prägeelements übergehen, so dass sich ein bogenförmiger oder runder Übergang von dem ebenen Bereich zu der Flanke des angrenzenden Prägeelements ergibt. Selbstverständlich ist auch ein angenähert stetiger Übergang möglich, bei dem die Neigung des ebenen Bereichs schrittweise über einen oder mehrere angrenzende ebene Bereiche mit einer schrittweise sich verändernden Neigung in die Flanke des angrenzenden Prägeelement übergeht.The edge of a flat area or plateau can run towards the flank of an adjacent embossed element in such a way that the plateau is surrounded by a “sharp” edge. Here, the flat area with a certain inclination merges directly into the embossing element with a different inclination, the inclination directly at the edge not being differentiable in a mathematical sense. Alternatively, however, the edge of a flat area or plateau can also continuously merge into a flank of an adjoining embossed element, so that an arcuate or round transition results from the flat area to the flank of the adjoining embossed element. Of course, an approximately steady transition is also possible, in which the inclination of the flat area gradually merges over one or more adjacent flat areas with a gradually changing inclination into the flank of the adjacent embossed element.

Besonders bevorzugt bleibt der Winkel der Flanke innerhalb eines Prägeelements gleich. Die Gravurtiefe muss entsprechend angepasst werden. Ein gleichbleibender Flankenwinkel ist erforderlich, wenn das Mikrospiegel-Element nur in einem bestimmten Winkelbereich aufscheinen soll.Particularly preferably, the angle of the flank remains the same within an embossed element. The engraving depth must be adjusted accordingly. A A constant flank angle is necessary if the micromirror element should only appear in a certain angular range.

Die nichtlinearen Prägeelemente haben erfindungsgemäß eine Grundfläche in Form eines Dreiecks, Vierecks, einer sechseckigen Waben, eines Achtecks oder sonstigen Polygons. Des Weiteren sind auch Mischungen aus verschiedenen der vorgenannten Formen möglich, beispielsweise Sechsecke, die an Vierecke grenzen.According to the invention, the non-linear embossed elements have a base in the form of a triangle, square, hexagonal honeycomb, octagon or other polygon. Mixtures of various of the aforementioned shapes are also possible, for example hexagons that border on quadrilaterals.

Die Breite des ebenen Bereichs bzw. Plateaus, d.h. sowohl der "Gipfel" (nahe der Oberfläche der Prägeplatte bzw. des Substrats) als auch der "Täler" (entfernt von der Oberfläche der Prägeplatte bzw. des Substrats), beträgt bevorzugt 1 µm bis200 µm, besonders bevorzugt 5 µm bis 150 µm und ganz besonders bevorzugt 10 µm bis 120 µm.The width of the flat area, i.e. both the "peak" (near the surface of the embossing plate or the substrate) and the "troughs" (away from the surface of the embossing plate or the substrate) are preferably 1 μm to 200 μm, particularly preferably 5 μm to 150 μm and very particularly preferably 10 μm to 120 μm.

Der Abstand d des Plateaus zur Plattenoberfläche kann auch Null sein (d = 0), dann liegt das Plateau auf Platten-Niveau. Sofern überwiegend Plateaus auf Platten-Niveau eingesetzt werden, können die Strukturen auch im konventionellen Tiefdruck farbführend verwendet werden. In diesem Fall stellen die Plateaus eine Stützstruktur für das Rakelmesser dar.The distance d of the plateau to the plate surface can also be zero (d = 0), then the plateau is at the plate level. If plateaus at plate level are predominantly used, the structures can also be used in conventional gravure printing to carry ink. In this case, the plateaus represent a support structure for the doctor blade.

Besonders zweckmäßig ist es darüber hinaus, wenn das Verhältnis aus dem Abstand benachbarter Gravuren und der entsprechenden Gravurtiefe, das sogenannte Aspektverhältnis, 1:5 bis 20:1, bevorzugt 1:3 bis 10:1 und besonders bevorzugt 1:2 bis 6:1 beträgt.It is also particularly useful if the ratio of the distance between adjacent engravings and the corresponding engraving depth, the so-called aspect ratio, is 1: 5 to 20: 1, preferably 1: 3 to 10: 1 and particularly preferably 1: 2 to 6: 1 amounts.

Gemäß einer bevorzugten Ausführungsform beträgt die Tiefe der gravierten Vertiefungen 10 µm bis 500 µm, bevorzugt 10 µm bis 350 µm und besonders bevorzugt 10 µm bis 200 µm.According to a preferred embodiment, the depth of the engraved depressions is 10 μm to 500 μm, preferably 10 μm to 350 μm and particularly preferably 10 μm to 200 μm.

In den oben ausgeführten Darstellungen wurden nur Prägestrukturen unter Platten-Niveau gezeigt, wie sie hauptsächlich im Stichtiefdruck verwendet werden. Wird die Prägestruktur für den Tiefdruck als Blindprägung (runder Prägezylinder gegen runden Gegendruckzylinder) oder Prägedruck (flache Prägeplatte gegen flache Gegendruckplatte) eingesetzt, werden diese meist erhaben über der Plattenoberfläche eingesetzt. Dies erhöht den partiellen Prägedruck enorm und vermindert gleichzeitig die Anforderung an die Druckbeistellung. Die Plateaus sind dann besonders bevorzugt an den Kanten und Spitzen anzubringen, die aus der Plattenoberfläche am weitesten herausragen.In the illustrations above, only embossed structures below the plate level were shown, as are mainly used in intaglio printing. If the embossing structure for gravure printing is used as blind embossing (round embossing cylinder versus round impression cylinder) or embossing (flat embossing plate versus flat impression plate), these are usually used raised above the plate surface. This increases the partial embossing pressure enormously and at the same time reduces the requirement for the provision of printing. The plateaus are then particularly preferably to be attached to the edges and tips which protrude farthest from the plate surface.

Das erfindungsgemäße Prägewerkzeug eignet sich besonders bevorzugt bei Gravurverfahren, bei denen mittels Laserstrahl in ein rotierendes zylindrisches Werkstück aus Kunststoff, beispielsweise Kapton, oder aus Metall, beispielsweise Messing, graviert wird, das sogenannte "Computer to Intaglioplate"- bzw. "CTiP"-Verfahren. Dabei ist es durch die Erfindung bevorzugt möglich, CTiP-Anlagen zum Einsatz kommen zu lassen und so die Verwendung von "Daten-Handelsware" zu ermöglichen, also vorgegebenen Prägedaten für bestimmte Banknoten-Nennwerte einer Währung. Auch bei fehlender Kompensation des Laserdurchmessers, kann durch geeignete Wahl der Plateaus eine Verletzung der gewünschten Prägestrukturen vermieden werden, indem innerhalb der Datenstruktur ausreichend breite Plateaus vorgehalten werden.The embossing tool according to the invention is particularly suitable for engraving processes in which a rotating cylindrical workpiece made of plastic, for example Kapton, or of metal, for example brass, is engraved by means of a laser beam, the so-called "Computer to Intaglioplate" or "CTiP" method . The invention preferably makes it possible to use CTiP systems and thus to enable the use of “data merchandise”, that is to say predetermined embossing data for certain banknote denominations of a currency. Even if the laser diameter is not compensated, a suitable choice of the plateaus can prevent damage to the desired embossed structures by keeping sufficiently wide plateaus within the data structure.

Die Erfindung ist jedoch nicht nur auf Prägewerkzeuge beschränkt, die mittels Laserstrahl graviert werden. Vielmehr können auch alle anderen aus dem Stand der Technik bekannten Gravurverfahren verwendet werden, wie beispielsweise mechanische Gravur mittels Stichel. Des Weiteren sind auch direkt aufbauende Herstellungsverfahren möglich, wie beispielsweise 3D-Druck oder Sintern.However, the invention is not limited to embossing tools that are engraved by means of a laser beam. Rather, all other engraving methods known from the prior art can also be used, such as mechanical engraving using a stylus. In addition, direct manufacturing processes are also possible, such as 3D printing or sintering.

Besondere Vorteile des erfindungsgemäßen Prägewerkzeugs sind weiterhin, dass das Plateau zu einer Reduzierung der Kantenschärfe führt, so dass während der Prägung einer möglichen Papierverletzung vorgebeugt und die Haltbarkeit des Wischzylinders einer Stichtiefduckmaschine erhöht werden kann. Umgekehrt sind die Plateaus auch unempfindlicher gegen Abnutzung durch den Wischzylinder. Vorteile der Erfindung sind also eine Verbesserung der Umsetzung und Haltbarkeit der empfindlichen Flanken und Kanten, ein verbesserter optisch variabler Effekt auch mit Originationverfahren wie beispielsweise CtIP (Erzeugung von Prägestrukturen in Kunststoffplatten oder -zylinder mittel Laserstrahlung), eine bessere Wiederholgenauigkeit sowie eine größere Anpassungsmöglichkeit auf Substrat und Gegendruckform.Particular advantages of the embossing tool according to the invention are furthermore that the plateau leads to a reduction in the sharpness of the edges, so that possible paper damage can be prevented during the embossing and the durability of the wiping cylinder of a intaglio printing machine can be increased. Conversely, the plateaus are also less sensitive to wear and tear from the wiping cylinder. Advantages of the invention are an improvement in the implementation and durability of the sensitive flanks and edges, an improved optically variable effect even with origination processes such as CtIP (creation of embossed structures in plastic plates or cylinders by means of laser radiation), better repeatability and greater adaptability to the substrate and counter pressure form.

Ein optisch variables Element im Sinne dieser Erfindung ist ein Element, dessen visuelles Erscheinungsbild sich bei Verkippen oder Drehen des Elements ändert. Beispielsweise ändert sich bei Verkippen oder Drehen des optisch variablen Elements dessen Farbe, bewegt sich scheinbar ein Balken von einer Seite des Elements zu einer anderen Seite, werden beim Verkippen oder Drehen unterschiedliche Zeichen dargestellt oder ergibt sich ein sogenannter Pumpeffekt in Form einer sich vergrößernden oder verkleinernden Umrisslinie eines Bildmotivs.An optically variable element in the context of this invention is an element whose visual appearance changes when the element is tilted or rotated. For example, when the optically variable element is tilted or rotated, its color changes, a bar appears to move from one side of the element to another, different characters are displayed when tilted or rotated, or a so-called pumping effect results in the form of an enlarging or decreasing effect Outline of an image motif.

Das Substrat besteht besonders bevorzugt aus Papier aus Baumwollfasern, wie es beispielsweise für Banknoten verwendet wird, oder aus anderen natürlichen Fasern oder aus Synthesefasern oder einer Mischung aus natürlichen und synthetischen Fasern, oder aus mindestens einer Kunststofffolie. Weiterhin bevorzugt besteht das Substrat aus einer Kombination aus mindestens zwei übereinander angeordneten und miteinander verbundenen unterschiedlichen Substraten, einem sogenannten Hybrid. Hierbei besteht das Substrat beispielsweise aus einer Kombination Kunststofffolie-Papier-Kunststofffolie, d.h. ein Substrat aus Papier wird auf jeder seiner beiden Seiten durch eine Kunststofffolie bedeckt, oder aus einer Kombination Papier-Kunststofffolie-Papier, d.h. ein Substrat aus einer Kunststofffolie wird auf jeder seiner beiden Seiten durch Papier bedeckt.The substrate particularly preferably consists of paper made of cotton fibers, as is used for example for bank notes, or of other natural fibers or of synthetic fibers or a mixture of natural and synthetic fibers, or of at least one plastic film. Furthermore, the substrate preferably consists of a combination of at least two different substrates arranged one above the other and connected to one another, a so-called hybrid. Here is the Substrate, for example, from a combination of plastic film-paper-plastic film, i.e. a substrate made of paper is covered on each of its two sides by a plastic film, or from a combination of paper-plastic film-paper, i.e. a substrate made of a plastic film is covered on each of its two sides Paper covered.

Angaben zum Gewicht des verwendeten Substrats sind beispielsweise in der Schrift DE 102 43 653 A9 angegeben, deren Ausführungen diesbezüglich vollumfänglich in diese Anmeldung aufgenommen werden. Die Schrift DE 102 43 653 A9 führt insbesondere aus, dass die Papierschicht üblicherweise ein Gewicht von 50 g/m2 bis 100 g/m2 aufweist, vorzugsweise von 80 g/m2 bis 90 g/m2. Selbstverständlich kann je nach Anwendung jedes andere geeignete Gewicht eingesetzt werden.Information on the weight of the substrate used is for example in the document DE 102 43 653 A9 specified, the explanations of which are fully included in this application. The font DE 102 43 653 A9 states in particular that the paper layer usually has a weight of 50 g / m 2 to 100 g / m 2 , preferably 80 g / m 2 to 90 g / m 2 . Of course, any other suitable weight can be used depending on the application.

Wertdokumente, für die ein derartiges Substrat bzw. Sicherheitspapier verwendet werden kann, sind insbesondere Banknoten, Aktien, Anleihen, Urkunden, Gutscheine, Schecks, hochwertige Eintrittskarten, aber auch andere fälschungsgefährdete Papiere, wie Pässe und sonstige Ausweisdokumente, sowie Karten, wie beispielsweise Kredit- oder Debitkarten, deren Kartenkörper mindestens eine Lage eines Sicherheitspapiers aufweist, und auch Produktsicherungselemente, wie Etiketten, Siegel, Verpackungen, Faltschachteln, Beipackzettel, Blister und dergleichen.Documents of value for which such a substrate or security paper can be used are, in particular, banknotes, shares, bonds, certificates, vouchers, checks, high-quality entry tickets, but also other forgery-prone papers, such as passports and other identification documents, as well as cards, such as credit cards. or debit cards, the card body of which has at least one layer of security paper, and also product security elements such as labels, seals, packaging, folding boxes, package inserts, blisters and the like.

Die vereinfachte Benennung Wertdokument schließt alle oben genannten Materialien, Dokumente und Produktsicherungsmittel ein.The simplified designation of value document includes all of the above materials, documents and product security means.

Als Passer oder Register im Sinne dieser Erfindung wird die Lagegenauigkeit von Druckbildern oder anderer Elemente zueinander auf Vorder- und/oder Rückseite eines Substrats bezeichnet. Beispielsweise stören bei Teilen von Druckbildern, die sich in Durchsicht zu einem Gesamtdruckbild ergänzen, bereits geringe Abweichungen von weniger als 0,1 mm zwischen den jeweiligen Druckbildern den visuellen Eindruck in Durchsicht erheblich. Die DIN 16500-2: 1987-01 definiert als Passer die Genauigkeit in der Drucktechnik, mit der die vorgesehene Wiedergabegüte der zu reproduzierenden Details erreicht bzw. eingehalten wird.In the context of this invention, the positional accuracy of printed images or other elements with respect to one another on the front and / or back of a substrate is referred to as register. For example, interfere with parts of print images which, when viewed through, form an overall print image add, even small deviations of less than 0.1 mm between the respective print images significantly improve the visual impression when viewed through. DIN 16500-2: 1987-01 defines register as the accuracy in printing technology with which the intended reproduction quality of the details to be reproduced is achieved or maintained.

Eine Information im Sinne dieser Erfindung ist eine musterförmig gestaltete und visuell wahrnehmbare Darstellung. Diese kann beispielsweise eine alphanumerische Zeichenfolge aus Ziffern und/oder Buchstaben, eine graphische Abbildung, ein Bild, einen Text oder sonstige Zeichen bilden. Besonders bevorzugt besteht die Information dabei aus positiven oder/und negativen Motiven. Bei einem positiven Motiv wird hierbei ein Motivelement selbst auf das Substrat aufgebracht, wohingegen bei einem negativen Motiv der das Motivelement umgebende Bereich auf das Substrat aufgebracht wird. Ein positives Motiv ist beispielsweise ein in dunkler Farbe auf das helle Substrat aufgedruckter Buchstabe. Ein negatives Motiv ist beispielsweise eine in dunkler Farbe auf das helle Substrat aufgebrachte Fläche, die innerhalb der Fläche einen unbedruckten Bereich in Form eines Buchstabens aufweist.Information within the meaning of this invention is a visually perceptible representation designed in the form of a pattern. This can, for example, form an alphanumeric string of digits and / or letters, a graphic image, an image, a text or other characters. The information particularly preferably consists of positive and / or negative motifs. In the case of a positive motif, a motif element itself is applied to the substrate, whereas in the case of a negative motif, the area surrounding the motif element is applied to the substrate. A positive motif is, for example, a letter printed in dark color on the light substrate. A negative motif is, for example, an area applied in dark color to the light-colored substrate, which has an unprinted area in the form of a letter within the area.

Es versteht sich, dass die vorstehend genannten und die nachfolgend noch zu erläuternden Merkmale nicht nur in den angegebenen Kombinationen, sondern auch in anderen Kombinationen einsetzbar sind, ohne den Rahmen der vorliegenden Erfindung zu verlassen, soweit dies von dem Schutzumfang der Ansprüche erfasst ist.It goes without saying that the features mentioned above and those yet to be explained below can be used not only in the specified combinations but also in other combinations without departing from the scope of the present invention, insofar as this is covered by the scope of protection of the claims.

Anhand der nachfolgenden Ausführungsbeispiele und der ergänzenden Figuren werden die Vorteile der Erfindung erläutert. Die Ausführungsbeispiele stellen bevorzugte Ausführungsformen dar, auf die jedoch die Erfindung in keinerlei Weise beschränkt sein soll. Des Weiteren sind die Darstellungen in den Figuren des besseren Verständnisses wegen stark schematisiert und spiegeln nicht die realen Gegebenheiten wider. Insbesondere entsprechen die in den Figuren gezeigten Proportionen nicht den in der Realität vorliegenden Verhältnissen und dienen ausschließlich zur Verbesserung der Anschaulichkeit.The advantages of the invention are explained on the basis of the following exemplary embodiments and the supplementary figures. The exemplary embodiments represent preferred embodiments to which, however, the invention is not intended to be restricted in any way. Furthermore, the representations The figures are highly schematic for better understanding and do not reflect the real conditions. In particular, the proportions shown in the figures do not correspond to the conditions present in reality and serve exclusively to improve the clarity.

Die in den folgenden Beispielen beschriebenen Ausführungsformen sind der besseren Verständlichkeit wegen auf die wesentlichen Kerninformationen reduziert. Bei der praktischen Umsetzung können wesentlich komplexere Muster oder Bilder im Ein- oder Mehrfarbendruck als Beschichtung zur Anwendung kommen. Dasselbe gilt für die Prägestrukturen. Die in den folgenden Beispielen dargestellten Informationen können ebenfalls durch beliebig aufwendige Bild- oder Textinformationen ersetzt werden. Die Erzeugung der Beschichtung z. B. als Aufdruck nutzt üblicherweise die Möglichkeiten der Drucktechnik aus. Es kommen typische Abmessungen von nicht linienförmigen Grundelementen ab ca. 10 µm zur Anwendung. Prägeelemente, die die Prägestruktur bilden, weisen im Regelfall eine Prägehöhe im Bereich von 10 µm bis 500 µm, bevorzugt von 50 µm bis 120 µm auf.The embodiments described in the following examples are reduced to the essential core information for better understanding. In the practical implementation, much more complex patterns or images in single or multi-color printing can be used as a coating. The same applies to the embossed structures. The information presented in the following examples can also be replaced by any complex image or text information. The generation of the coating z. B. as an imprint usually uses the possibilities of printing technology. Typical dimensions of non-linear basic elements from approx. 10 µm are used. Embossed elements that form the embossed structure generally have an embossed height in the range from 10 μm to 500 μm, preferably from 50 μm to 120 μm.

Ferner werden in den folgenden Beispielen lediglich die Ausgestaltung und gegenseitige Zuordnung der Prägestruktur und der Beschichtung dargestellt, um die optischen Effekte der erfindungsgemäßen optisch variablen Struktur anschaulich darstellen zu können.Furthermore, in the following examples only the design and mutual association of the embossed structure and the coating are shown in order to be able to clearly show the optical effects of the optically variable structure according to the invention.

Im Einzelnen zeigen schematisch:

Fig. 1
eine erstes Ausführungsbeispiel einer Prägestruktur in Form von zwei sechseckigen Waben und hierbei in der linken Figur in Draufsicht und in der rechten Figur im Querschnitt entlang der Schnittachse AB,
Fig. 2
eine zweites Ausführungsbeispiel einer Prägestruktur in Form von zwei sechseckigen Waben und hierbei in der linken Figur in Draufsicht und in der rechten Figur im Querschnitt entlang der Schnittachse CD,
Fig. 3
eine erstes Ausführungsbeispiel einer erfindungsgemäßen Prägestruktur in Form von zwei sechseckigen Waben mit einem Plateau und hierbei in der linken Figur in Draufsicht und in der rechten Figur im Querschnitt entlang der Schnittachse EF,
Fig. 4
eine zweites Ausführungsbeispiel einer erfindungsgemäßen Prägestruktur in Form von zwei sechseckigen Waben mit einem Plateau und hierbei in der linken Figur in Draufsicht und in der rechten Figur im Querschnitt entlang der Schnittachse EF,
Fig. 5
eine drittes Ausführungsbeispiel einer erfindungsgemäßen Prägestruktur in Form von zwei Waben mit einem Plateau im Querschnitt,
Fig. 6
eine viertes Ausführungsbeispiel einer erfindungsgemäßen Prägestruktur in Form von zwei Waben mit einem Plateau im Querschnitt.
In detail show schematically:
Fig. 1
a first embodiment of an embossed structure in the form of two hexagonal honeycombs and here in the left figure in Top view and in the right figure in cross section along the cutting axis AB,
Fig. 2
a second embodiment of an embossed structure in the form of two hexagonal honeycombs and here in the left figure in plan view and in the right figure in cross section along the cutting axis CD,
Fig. 3
a first embodiment of an embossed structure according to the invention in the form of two hexagonal honeycombs with a plateau and here in the left figure in plan view and in the right figure in cross section along the sectional axis EF,
Fig. 4
a second embodiment of an embossed structure according to the invention in the form of two hexagonal honeycombs with a plateau and here in the left figure in plan view and in the right figure in cross section along the sectional axis EF,
Fig. 5
a third embodiment of an embossed structure according to the invention in the form of two honeycombs with a plateau in cross section,
Fig. 6
a fourth embodiment of an embossed structure according to the invention in the form of two honeycombs with a plateau in cross section.

Fig. 1 zeigt schematisch eine Anordnung von zwei Prägestrukturen 1, 2 in Form von sechseckigen Waben und hierbei in der linken Figur in Draufsicht und in der rechten Figur im Querschnitt entlang der Schnittachse AB. Der Winkel α an der Wabenkante, also zwischen den Waben-Spiegelflächen der betreffenden Kante, ist größer als 120°, so dass gemäß den obigen Ausführungen kein Plateau zwischen den beiden Waben eingefügt wird. Zusätzlich befindet sich die Wabenkante auf Höhe der Substrat- oder Plattenoberfläche 3, die in der rechten Figur durch die gestrichelte Linie angedeutet wird. Fig. 1 shows schematically an arrangement of two embossed structures 1, 2 in the form of hexagonal honeycombs and here in the left figure in plan view and in the right figure in cross section along the cutting axis AB. The angle α at the honeycomb edge, that is, between the honeycomb mirror surfaces of the relevant edge is greater than 120 °, so that, according to the above statements, no plateau is inserted between the two honeycombs. In addition, the honeycomb edge is at the level of the substrate or plate surface 3, which is indicated in the right figure by the dashed line.

Fig. 2 zeigt schematisch die zwei Prägestrukturen 4, 5 in Form von sechseckigen Waben, wobei hier im Gegensatz zu den Waben aus Fig. 1 der Winkel α an der Wabenkante kleiner als 120° ist, so dass gemäß den obigen Ausführungen ein Plateau zwischen den beiden Waben eingefügt wird. Das Plateau ist in Fig. 2 zur Verdeutlichung des Winkels α nicht dargestellt. Zusätzlich befindet sich die Wabenkante um den Abstand d von der Substrat- oder Plattenoberfläche 3 vertieft angeordnet, wobei d < 20µm, bevorzugt d < 10µm, besonders bevorzugt d < 5 µm ist. Fig. 2 shows schematically the two embossed structures 4, 5 in the form of hexagonal honeycombs, here in contrast to the honeycombs Fig. 1 the angle α at the honeycomb edge is less than 120 °, so that, according to the above statements, a plateau is inserted between the two honeycombs. The plateau is in Fig. 2 to clarify the angle α not shown. In addition, the honeycomb edge is located recessed by the distance d from the substrate or plate surface 3, with d <20 μm, preferably d <10 μm, particularly preferably d <5 μm.

Ein derartiges Plateau ist in Fig. 3 und in Fig. 4 dargestellt. Fig. 3 zeigt hierbei in der linken Figur Draufsicht und in der rechten Figur entlang der Schnittachse EF ein Plateau, das sowohl zwischen den beiden Prägestrukturen 4 und 5, als auch um beide Prägestrukturen 4 und 5 herum angeordnet ist. Fig. 4 zeigt in der linken Figur Draufsicht und in der rechten Figur entlang der Schnittachse GH ein Plateau, das lediglich zwischen den beiden Prägestrukturen 4 und 5 angeordnet ist. In Fig. 3 und in Fig. 4 ist jeweils das Plateau zwischen den beiden Prägestrukturen 4 und 5 um den Abstand d von der Substrat- oder Plattenoberfläche 3 vertieft angeordnet.Such a plateau is in Fig. 3 and in Fig. 4 shown. Fig. 3 shows a plan view in the left figure and a plateau along the sectional axis EF in the right figure, which is arranged both between the two embossed structures 4 and 5 and around both embossed structures 4 and 5. Fig. 4 shows in the left figure a plan view and in the right figure along the sectional axis GH a plateau which is only arranged between the two embossed structures 4 and 5. In Fig. 3 and in Fig. 4 the plateau between the two embossed structures 4 and 5 is arranged recessed by the distance d from the substrate or plate surface 3.

Die Prägestrukturen sind in Fig. 1 bis Fig. 4 jeweils als sechseckige Waben dargestellt. Es sind jedoch auch beliebige andere Formen möglich, wie beispielsweise Dreiecke, Vierecke, Achtecke oder sonstige Polygone. Des Weiteren sind auch Mischungen aus verschiedenen der vorgenannten Formen möglich, beispielsweise Sechsecke, die an Vierecke grenzen.The embossed structures are in FIGS. 1 to 4 each shown as a hexagonal honeycomb. However, any other shapes are also possible, such as triangles, squares, octagons or other polygons. Mixtures of various of the aforementioned shapes are also possible, for example hexagons that border on quadrilaterals.

Fig. 5 zeigt, dass der Abstand d des Plateaus zur Plattenoberfläche auch Null sein kann (d = 0). In diesem Fall liegt das Plateau auf Höhe der Substrat- oder Plattenoberfläche 3. Fig. 5 shows that the distance d of the plateau to the plate surface can also be zero (d = 0). In this case the plateau lies at the level of the substrate or plate surface 3.

In den oben ausgeführten Darstellungen wurden nur Prägestrukturen auf oder unterhalb der Substrat- oder Plattenoberfläche 3 gezeigt, wie sie hauptsächlich im Stichtiefdruck verwendet werden. Wird die Prägestruktur für den Tiefdruck als Blindprägung (rund / rund) oder Prägedruck (flach / flach) eingesetzt, werden diese, wie in Fig. 6 dargestellt, meist erhaben über der Plattenoberfläche 3 eingesetzt. Dies erhöht den partiellen Prägedruck enorm und vermindert gleichzeitig die Anforderung an die Druckbeistellung. Gemäß Fig. 6 sind die Plateaus in diesem Fall vorzugsweise an den Kanten und Spitzen anzubringen, die am weitesten aus der Plattenoberfläche herausragen.In the above illustrations, only embossed structures on or below the substrate or plate surface 3 were shown, as are mainly used in intaglio printing. If the embossing structure for gravure printing is used as blind embossing (round / round) or embossing (flat / flat), these are used as in Fig. 6 shown, mostly inserted raised above the plate surface 3. This increases the partial embossing pressure enormously and at the same time reduces the requirement for the provision of printing. According to Fig. 6 In this case, the plateaus should preferably be attached to the edges and tips that protrude farthest from the plate surface.

Claims (11)

  1. Security element made from a substrate with an optically variable structure comprising an embossed structure and a coating, wherein the embossed structure and the coating are combined such that at least parts of the coating are entirely visible when viewed perpendicularly but are hidden when viewed at an angle, with the result that different pieces of information become visible as the viewing direction changes, wherein the embossed structure consists of non-line-shaped embossed elements that adjoin one another, wherein each non-line-shaped embossed element substantially consists of a flank, wherein a planar region or a plateau, arranged substantially parallel to the surface of the substrate which surrounds the embossed element, is arranged between adjoining embossed elements, characterized in that the non-linear embossed elements have a base area in the shape of a triangle, a rectangle, a hexagonal honeycomb, an octagon or another polygon.
  2. Security element according to Claim 1, characterized in that the angle between the planar region or plateau and the surface of the substrate surrounding the security element or between the planar region or plateau and the embossing tool with respect to one another is preferably 0° and preferably from 0.5° to 5°.
  3. Security element according to Claim 1 or 2, characterized in that the planar region or the plateau is arranged only between two adjoining embossed elements.
  4. Security element according to Claim 1 or 2, characterized in that the planar region or the plateau is arranged around the entire embossed element.
  5. Security element according to one of the preceding claims, characterized in that the periphery of a planar region or plateau extends with respect to the flank of an adjoining embossed element in such a manner that the plateau is surrounded by a "sharp" edge.
  6. Security element according to one of Claims 1 to 4, characterized in that the periphery of a planar region or plateau continually transitions into a flank of an adjoining embossed element, forming an arcuate or round transition from the planar region to the flank of the adjoining embossed element.
  7. Embossing tool for producing a security element from a substrate with an optically variable structure comprising an embossed structure and a coating, wherein the embossed structure and the coating are combined such that at least parts of the coating are entirely visible when viewed perpendicularly but are hidden when viewed at an angle, with the result that different pieces of information become visible as the viewing direction changes, wherein the embossed structure consists of non-line-shaped embossed elements that adjoin one another, wherein each non-line-shaped embossed element substantially consists of a flank, characterized in that a planar region or a plateau, arranged substantially parallel to the surface of the substrate which surrounds the embossed element, is arranged between adjoining embossed elements, wherein the non-linear embossed elements have a base area in the shape of a triangle, a rectangle, a hexagonal honeycomb, an octagon or another polygon.
  8. Embossing tool according to Claim 8, characterized in that the embossing tool is an embossing cylinder, an embossing die or a printing plate, in particular an intaglio printing plate, wherein the elements to be embossed are designed as an engraving or as an elevation in the surface of the embossing tool.
  9. Embossing tool according to Claim 9, characterized in that the printing plate or intaglio printing plate is preferably fastened to a rotating cylinder.
  10. Embossing tool according to one of Claims 8 to 10, characterized in that a planar region or a plateau is introduced at the edges between two adjoining embossed elements if
    • the edge is located between two embossed elements on the plate surface or is recessed relative to the plate surface by a maximum distance d, with d < 20 µm, preferable d < 10 µm, with particular preference d < 5 µm, and
    • the angle α between the reflective face of the embossed element and the relevant edge is α < 120°, preferably α < 90° and with particular preference α < 60°.
  11. Embossing tool according to one of Claims 8 to 11, characterized in that the security element comprises at least one of the features of Claims 2 to 7.
EP19000014.1A 2018-01-12 2019-01-10 Security element with optically variable embossed structure Active EP3511177B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102018000193.9A DE102018000193A1 (en) 2018-01-12 2018-01-12 Security element with an optically variable embossed structure

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EP3511177A1 EP3511177A1 (en) 2019-07-17
EP3511177B1 true EP3511177B1 (en) 2020-08-19

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DE (1) DE102018000193A1 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59005737D1 (en) * 1989-12-01 1994-06-23 Landis & Gyr Business Support Arrangement to improve the security against forgery of a document of value.
US5538753A (en) * 1991-10-14 1996-07-23 Landis & Gyr Betriebs Ag Security element
DE10243653A1 (en) 2002-09-19 2004-04-01 Giesecke & Devrient Gmbh security paper
DE102005011612A1 (en) 2004-08-13 2006-02-23 Giesecke & Devrient Gmbh Data carrier with an optically variable structure
DE102011114645A1 (en) 2011-09-30 2013-04-04 Giesecke & Devrient Gmbh Security element with an optically variable structure of micromirrors
DE102013019585A1 (en) * 2013-11-21 2015-05-21 Giesecke & Devrient Gmbh Method for producing a value document and a security element, value document obtainable therefrom and security element and device for carrying out the method
DE102015009786A1 (en) 2015-07-27 2017-02-02 Giesecke & Devrient Gmbh Embossing tool for producing a security element with an optically variable structure

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
None *

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DE102018000193A1 (en) 2019-07-18

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