EP3492892A1 - Thermischer mustersensor mit pyroelektrischer kapazität - Google Patents

Thermischer mustersensor mit pyroelektrischer kapazität Download PDF

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Publication number
EP3492892A1
EP3492892A1 EP18209895.4A EP18209895A EP3492892A1 EP 3492892 A1 EP3492892 A1 EP 3492892A1 EP 18209895 A EP18209895 A EP 18209895A EP 3492892 A1 EP3492892 A1 EP 3492892A1
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EP
European Patent Office
Prior art keywords
pyroelectric
layer
zno
particles
sensor
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EP18209895.4A
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English (en)
French (fr)
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Mohammed Benwadih
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Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N19/00—Integrated devices, or assemblies of multiple devices, comprising at least one thermoelectric or thermomagnetic element covered by groups H10N10/00 - H10N15/00
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0022—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiation of moving bodies
    • G01J5/0025—Living bodies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/0225—Shape of the cavity itself or of elements contained in or suspended over the cavity
    • G01J5/024—Special manufacturing steps or sacrificial layers or layer structures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/04—Casings
    • G01J5/046—Materials; Selection of thermal materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
    • G01J5/061—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity by controlling the temperature of the apparatus or parts thereof, e.g. using cooling means or thermostats
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/34—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using capacitors, e.g. pyroelectric capacitors
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12—Fingerprints or palmprints
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12—Fingerprints or palmprints
    • G06V40/13—Sensors therefor
    • G06V40/1306—Sensors therefor non-optical, e.g. ultrasonic or capacitive sensing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N15/00—Thermoelectric devices without a junction of dissimilar materials; Thermomagnetic devices, e.g. using the Nernst-Ettingshausen effect
    • H10N15/10—Thermoelectric devices using thermal change of the dielectric constant, e.g. working above and below the Curie point
    • H10N15/15—Thermoelectric active materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/34—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using capacitors, e.g. pyroelectric capacitors
    • G01J2005/345—Arrays

Definitions

  • the invention relates to a thermal pattern sensor, exploiting the pyroelectricity properties of a material, and advantageously forming a fingerprint sensor.
  • Fingerprint detection can be performed by so-called "passive" sensors exploiting a temperature difference between that of the finger and that of the sensor, as described in the documents US 4,394,773 , US 4,429,413 and US 6,289,114 .
  • the finger At the level of the peaks of the impression, the finger is in direct physical contact with the sensor.
  • a heat transfer between the skin and the contact surface of the sensor is carried out by conduction, which leads to a first time variation of temperature.
  • the valleys of the footprint the finger is not in direct physical contact with the sensor, the heat transfer is therefore performed through the air which is rather a thermal insulator, which leads to a second temporal variation temperature, less important.
  • the difference between these two temporal variations in temperature results in a difference between the signals measured by the pyroelectric capacitors, depending on whether they are under a valley or under a crest of the footprint.
  • the image of the impression therefore has a contrast that depends on this difference.
  • the level of the signal obtained is zero when the finger and the sensor are at the same temperature, or that the contrast of the captured images varies, which then poses problems during the subsequent processing of the images. obtained (for example, a reversal of temperatures results in an inversion of the image obtained).
  • Another type of sensor offers a solution to this problem through the addition of heating elements under the contact surface of the sensor.
  • Such a sensor is described for example in the patent application EP 2 385 486 A1 .
  • the heating elements dissipate a certain amount of heat in each pixel of the sensor and the heating of the pixels is measured after a certain time.
  • the temperature variation obtained is therefore important in the valleys of the impression, where the heat is transferred to the finger through the air, and lower at the crests of the impression, where the heat is transferred directly to the finger. , by conduction.
  • the elements described above for fingerprint detection also apply to the detection of a thermal pattern other than a fingerprint, the element whose thermal pattern to be detected is disposed on the sensor during the measurement. .
  • a thermal pattern sensor includes thermal sensing means which may be pyroelectric elements, diodes, thermistors or any other temperature sensitive element for converting a temperature change into a potential or electric current variation.
  • a pyroelectric type sensor comprises a matrix of pyroelectric capacitors arranged on a substrate, for example made of glass.
  • Each pyroelectric capacitance comprises a pyroelectric material portion, disposed between a lower electrode and an upper electrode.
  • An electrode is brought to a constant potential, and forms a reference electrode.
  • the other electrode collects pyroelectric charges, generated by the pyroelectric material in response to a temperature change.
  • the pyroelectric material may be for example a poly (vinylidene fluoride-trifluoroethylene) (denoted P (VDF-TrFE)), a polyvinylidene fluoride (PVDF), a ceramic such as PZT (lead titano-zirconate, or "Lead”). Zirconate Titanate "), AIN, BaTiO 3 or ZnO.
  • VDF-TrFE poly (vinylidene fluoride-trifluoroethylene)
  • PVDF polyvinylidene fluoride
  • a ceramic such as PZT (lead titano-zirconate, or "Lead”
  • Zirconate Titanate ") AIN, BaTiO 3 or ZnO.
  • Other pyroelectric materials are possible, namely all those that produce electric charges according to a pyroelectric parameter.
  • the upper electrode is covered with a protective layer on which the element whose thermal pattern is measured, for example a finger,
  • the senor is also provided with a heating element generally made from the same electrically conductive layer as that used to make the upper electrode.
  • This heating element is for example made in the form of a coil partially surrounding the upper electrodes and for laterally heating the pyroelectric capacitors at the upper electrodes.
  • Each pyroelectric capacitance forms a transducer that translates a time variation in temperature into an electrical signal such as a difference in electrical potentials.
  • the senor When the sensor has to be made with a large area or with a low cost, the sensor is advantageously made in so-called printed technology, or deposit by printing, less expensive than semiconductor lithography.
  • the different conductive portions forming the elements of the pixels of the sensor can in this case be made with conductive inks sufficiently stable not to require high performance encapsulation.
  • the embodiment of the sensor is conceivable by printing, for example on simple plastic substrates such as polyethylene terephthalate (PET), poly (ethylene naphthalate) (PEN) or polycarbonate (PC) films.
  • the printed pyroelectric material has several defects inherent in printing techniques such as a certain porosity and edge effects generating large leakage currents, between the electrodes of the capacitors, which can prevent the smooth operation of the sensor.
  • the leakage currents are of the order of 1 ⁇ A, which is too important since the pyroelectric currents obtained are of the order of nA.
  • Such a leakage current is obtained because of the large porosities (diameter of the order of 5 microns) formed in the PVDF.
  • An object of the present invention is to provide a thermal pattern sensor whose structure is compatible with the production of a passive or active type sensor, and whose leakage currents are reduced compared to the prior art.
  • the present invention proposes a thermal pattern sensor comprising a plurality of pixels arranged on a substrate, each pixel comprising a pyroelectric capacitance, the pyroelectric capacitance comprising a layer of porous pyroelectric material, disposed between a first electrically conductive electrode and a second electrically electrically conductive, particles of a first material at least partially filling the pores of the porous pyroelectric material layer, the first material being electrically insulating and having pyroelectric properties.
  • a layer of a second material is disposed between the porous pyroelectric material layer and the second electrode, the second material being electrically insulating and having pyroelectric properties.
  • the first material and the second material may be the same or different.
  • the invention is fundamentally different from the prior art in that electrically insulating particles (typically having an electrical resistivity greater than 10 9 ohm, and preferably greater than or equal to 10 10 ohm) and having pyroelectric properties (typically having a pyroelectric coefficient greater than 5 ⁇ C / m 2 K) at least partially fill the pores of the porous pyroelectric material, which greatly reduces the leakage current and improves the overall polarization of the device.
  • the integration of these particles into the pyroelectric material at least locally densifies the layer of pyroelectric material without changing its pyroelectric properties.
  • the pyroelectric coefficient of capacitance and the heat transfer between the two electrodes are improved with respect to a capacitance comprising, for example, PVDF alone without particles.
  • the layer of a second layer material forms a dielectric layer that enhances the densification of the layer of pyroelectric material under the second electrode, without modifying its pyroelectric properties.
  • the second material layer may be a particulate layer or a non-porous dense layer. At least partially filling the pores means that the pore volume is at least partially filled by the particles and / or at least a part of the total number of pores is filled by the particles.
  • the particles may be located at the pore openings and / or penetrate the pore volume. The particles can completely clog a part of the pores or all the pores.
  • the first material and / or the second material are in stoichiometric ZnO, and / or in a mixture of stoichiometric and / or non-stoichiometric Zn (OH) 2 and ZnO, and / or in AlN, and / or in a mixture of AlN and Zn (OH) 2 and / or stoichiometric and / or non-stoichiometric ZnO.
  • Stoichiometric ZnO is electrically insulating and has good pyroelectric properties.
  • Non-stoichiometric ZnO is electrically semiconductive and has good pyroelectric properties.
  • Zinc hydroxide is electrically insulating and has no pyroelectric properties.
  • the ZnO / Zn (OH) 2 mixture has a low electrical conductivity and good pyroelectric properties, which makes it possible to limit the leakage currents while ensuring a continuity of pyroelectric properties between the pyroelectric material layer and the second electrode.
  • non-stoichiometric ZnO will be selected which is less expensive to produce than stoichiometric ZnO which requires a heat treatment step in a high temperature reactor.
  • the stoichiometric ZnO is less stable under ultraviolet radiation and has a tendency to degrade to non-stoichiometric ZnO.
  • particles in a mixture of ZnO / Zn (OH) 2 is meant a mixture of ZnO particles and / or Zn (OH) 2 particles and / or particles in a mixture of ZnO / Zn (OH) 2 .
  • AIN aluminum nitride is a very good electrical insulator (on the order of 10 14 ohm.cm, that is to say a resistance greater than 10 10 ohm) and has good pyroelectric properties. This material also has a very good thermal conductivity (of the order of 140-180 Wm -1 K -1 ).
  • the first material and / or the second material are in a mixture of AlN and ZnO / Zn (OH) 2 comprising 50% by weight of AlN.
  • Such a material is easy to develop.
  • the pyroelectric material is polyvinylidene fluoride, a copolymer of polyvinylidene fluoride, such as poly (vinylidene fluoride-trifluoroethylene), a ceramic, such as PZT, AIN, BaTiO 3 or ZnO .
  • the invention is particularly relevant in the case of PVDF which has several defects inherent in printing techniques (porosity and edge effects generating large leakage currents) preventing the proper operation of the devices.
  • the pyroelectric material has a surface porosity greater than 15% of the total surface of the pyroelectric material.
  • the layer of pyroelectric material has a thickness ranging from 20 nm to 5 ⁇ m, and preferably from 2 ⁇ m to 4 ⁇ m.
  • the senor further comprises at least one electrically insulated heating element electrically conductive electrodes and disposed facing at least a portion of the layer of pyroelectric material such that the layer of pyroelectric material is disposed between the heating element and the substrate.
  • the senor is a fingerprint sensor.
  • the first material and the second material are identical, which simplifies the production process, the particles and the layer on the pyroelectric layer can be made in a single step.
  • the method comprises an additional step in which a heat treatment at a temperature of 120 ° C at 180 ° C is achieved.
  • the annealing makes it possible to completely evaporate the solvent residues and / or to form a crystalline pyroelectric material, which improves its pyroelectric properties, in particular in the case of ZnO or ZnO / Zn (OH) 2 particles.
  • the material is self-organized at the outlet of the deposit and there is no need to perform annealing and / or polarization steps.
  • step b) is carried out by depositing a solution containing stoichiometric ZnO particles and / or a mixture of stoichiometric or non-stoichiometric Zn (OH) 2 and ZnO, and a solvent, preferably chosen among butyl acetate, propyl acetate, isopropanol, ethanol, methanol, methoxyethanol, ethoxyethanol, hexane, and cyclohexane.
  • a solvent preferably chosen among butyl acetate, propyl acetate, isopropanol, ethanol, methanol, methoxyethanol, ethoxyethanol, hexane, and cyclohexane.
  • the solution containing the particles is deposited by spin coating or screen printing.
  • a silkscreen deposit allows the particles to be deposited locally.
  • the solution contains from 5 mg / ml to 100 mg / ml, and preferably from 10 mg / ml to 50 mg / ml of particles.
  • the layer of porous pyroelectric material is deposited by a printing technique such as screen printing.
  • Figures 1 and 2 represent sectional views of a portion of a pixel 102 of a thermal pattern sensor, according to different embodiments.
  • the substrate 104 is a first layer of the substrate 104 :
  • the pixel 102 is formed on a substrate 104, for example made of glass or semiconductor material (for example silicon).
  • the substrate 104 may also be a flexible substrate, for example based on polyimide, PEN (polyethylene naphthalate), PET (polyethylene terephthalate), or polycarbonate (PC), on which the electronic elements of the sensor, such as transistors thin film (TFT for "Thin Film Transistor") are made by printed electronic technology (for example via an embodiment with writing heads of inkjet, screen printing, offset and gravure printing) or by lithography.
  • TFT Thin Film Transistor
  • the pixels 102 are identical to the pixels 102 :
  • a single pixel is represented on the substrate 104 shown in FIG. figure 1 , for more readability, but the substrate of a thermal pattern sensor comprises a plurality of pixels 102.
  • the pixels 102 of the sensor are arranged forming a matrix of several lines and several columns of pixels 102.
  • the pitch of the pixels 102, in the plane of the substrate 104 is for example between about 50 microns and 100 microns. In the case of a resolution sensor equal to 500 dpi ("dot per inch”), the pixel pitch 102 is equal to 50.8 ⁇ m.
  • Each of the pixels 102 of the sensor comprises measurement means, or detection, thermal formed by a pyroelectric capacitance.
  • Each pyroelectric capacitor successively comprises, from the substrate 104, a lower electrode 108, a pyroelectric material 200 and an upper electrode 110.
  • the capacitance is described here and thereafter as being a vertical capacitor, but it could also be a horizontal capacity.
  • the pyroelectric material 200 is a pyroelectric material 200 :
  • the layer of pyroelectric material 200 is a porous layer.
  • the layer includes a first major face in contact with the first electrode. By contact is meant that these elements are adjacent.
  • the second main face is opposite the second electrode.
  • the pyroelectric material is, for example, polyvinylidene fluoride or a copolymer of polyvinylidene fluoride, such as the polyvinylidene fluoride and trifluoroethylene copolymer P (VDF-Trfe).
  • TrFe in P VDF-TrFe
  • Different compositions in TrFe in P can be envisaged, in order to obtain high values of pyroelectric coefficient.
  • These compositions may correspond to a mole percentage ranging from 10% to 50% for TrFe and ranging from 90% to 50% for PVDF.
  • the mole percentage is about 20% for TrFe and about 80% for PVDF, which makes it possible to obtain better characteristics in crystallization of the pyroelectric material.
  • PVDF has, for example, a dielectric permittivity of the order of 10.
  • the thickness of the layer of pyroelectric material 200 is, for example, from 20 nm to 5 ⁇ m, and preferably from 1 ⁇ m to 5 ⁇ m. It is, for example, 2 ⁇ m. Preferably, it ranges from 100 nm to 3 ⁇ m, more preferably from 100 nm to 2 ⁇ m and for example equal to approximately 1 ⁇ m.
  • the thickness of the deposited pyroelectric material 200 is controlled because this thickness corresponds to the thickness of the pyroelectric capacitance (distance between the electrodes) and is directly involved in the calculation of the value of the pyroelectric capacitor C.
  • the pore size of the pyroelectric material is, for example, from 1 ⁇ m to 10 ⁇ m, and preferably from 2 ⁇ m to 10 ⁇ m. For example, pore sizes of the order of 5 ⁇ m will be chosen.
  • the pores of the layer of pyroelectric material are at least partially filled with particles 210 made of a first electrically insulating material and having properties.
  • the particles 210 may be located at the pore openings on the second side of the porous pyroelectric material layer. They can partially or completely plug the pore openings. They can also be localized in the pore volume. They may be located, for example, in the first third or in the first half of the thickness of the porous pyroelectric material layer from the second main of said layer. The second main face may be in contact with the second electrode.
  • particles means elements of nanometric or micrometric size and of spherical, cylindrical or ovoid shape.
  • the particles have, for example, a larger dimension ranging from 20 nm to 1 ⁇ m, and preferably from 20 nm to 100 nm.
  • the particles 210 may be partially or completely covered by a layer of organic residues from the synthesis of said particles.
  • a layer 220 made of a second material covers, in addition, the layer of pyroelectric material.
  • the layer 220 made of a second material is in contact with the second electrode.
  • the layer 220 may be a layer of particles in contact with each other, or a dense, solid (non-particulate) layer.
  • the layer 220 has a thickness ranging from 10 nm to 500 nm, for example from 10 nm to 300 nm, and preferably from 50 nm to 500 nm.
  • the first material and / or the second material are stoichiometric ZnO and / or a stoichiometric or non-stoichiometric mixture of Zn (OH) 2 and ZnO, and / or AlN, and / or a mixture of AIN and Zn (OH) 2 and / or stoichiometric and / or non-stoichiometric ZnO.
  • the resistance of such materials is greater than 10 9 ohm.cm, preferably greater than 10 10 ohm.cm, even more preferably greater than 10 14 ohm.cm. This prevents leakage currents between the two electrodes.
  • the presence of a ZnO / Zn (OH) 2 layer 220 of 100 nm thickness on a PVDF pyroelectric layer whose pores are partially filled with ZnO / Zn (OH) 2 particles 210 does not modify the capacitance .
  • the electrodes 108, 110 are identical to each other.
  • the lower electrode (or first electrode) 108 and the upper electrode (or second electrode) 110 each comprise at least one electrically conductive material.
  • the electrodes 108, 110 may comprise at least one of the following materials: Ti, Pt, Ni, Au, Al, Mo, Ag, MoCr, AlSi, AlCu.
  • One of the electrodes 108, 110, advantageously the upper electrode 110, or each of the two electrodes 108, 110, can be formed by a stack of several electrically conductive materials, for example a Ti / TiN, Ti / TiN / AICu stack. , or Ti / Au.
  • each of the electrodes 108, 110 is for example between about 0.01 ⁇ m and 1 ⁇ m.
  • the thickness of each of the electrodes 108, 110 may be greater, for example up to about 5 ⁇ m, especially when these electrodes are produced by printing using materials such as silver, copper, carbon or else PEDOT (poly (3,4-ethylenedioxythiophene)
  • PEDOT poly (3,4-ethylenedioxythiophene
  • a gold layer deposited by photolithography has, for example, a thickness of 50 nm.
  • the upper electrode 110 and / or the lower electrode 108 is a layer of thickness equal to about 0.2 ⁇ m, made of titanium and / or molybdenum and / or aluminum and / or a conductive oxide such as ITO (indium tin oxide) and / or a conductive polymer.
  • the upper electrode 110 and / or the lower electrode 108 is formed of one or more Ti / TiN type stacks with a thickness of Ti ranging between approximately 50 nm and 500 nm and a thickness of TiN between about 10 nm and 500 nm. It will also be possible to use a Ti / Au stack with a thickness of Ti of 5 nm and a thickness of Au of 50 nm, or a layer of gold of 50 nm thick, or a MoCr alloy of 50 nm thick. It is possible to combine, for example, a lower Ti / Au electrode, for example deposited by photolithography, and a PEDOT-PSS top electrode 1 ⁇ m thick.
  • the upper electrode 110 and / or the lower electrode 108 is, for example, in the form of metallic lines parallel to each other. Such lines are, for example, gold.
  • the lower electrode 108 may also be of gold, and the upper electrode 110 may be PEDOT-PPS and may have, for example, a thickness of 1 .mu.m.
  • the dielectric layer 112 is :
  • the upper electrode 110 is covered by a dielectric layer 112.
  • the thickness of the dielectric layer is, for example, from 0.1 ⁇ m to 5 ⁇ m.
  • the dielectric layer is, for example, polyimide. It makes it possible to electrically isolate the upper electrode 110 from the heating elements 114.
  • the heating elements 114 are identical to the heating elements 114:
  • the sensor in addition to the elements previously described, the sensor also comprises heating elements 108 dissipating a certain amount of heat in the pixels 102, and in particular in the pyroelectric material 200
  • These heating elements 108 are for example formed by electrically conductive portions coming from the same layer as that used for producing the upper electrodes 110 or the lower electrodes 108.
  • the material or materials used for producing the heating element 114 may be selected from my following materials: Ti, Pt, Ni, Au, Al, Ag, AlSi, AlCu.
  • the heating elements 114 are for example made by depositing a metallic ink, for example comprising silver deposited by printing.
  • the heating elements 114 are, for example, in the form of metal lines parallel to each other. As shown on the figure 5 the lines forming the heating elements may be perpendicular to the lines of the lower electrode 108.
  • the heating element 114 may comprise a Ti layer having a thickness of about 30 nm to 100 nm and another electrically conductive layer of AISi or AlCu and having a thickness of 100 nm to 700 nm.
  • the AISi or AICu layer protects the titanium or TiAu layer against oxidation.
  • the heating elements 114 have, for example, a thickness ranging from 0.5 ⁇ m to 10 ⁇ m, and preferably ranging from 1 ⁇ m to 5 ⁇ m.
  • Each of the heating elements 114 forms a resistive metal element (electrical resistance for example between approximately 10 ⁇ and 100 ⁇ ) associated with a pixel 102 and which makes it possible to heat this pixel 102 independently of the heating elements 114 associated with the other pixels 102.
  • heaters 114 allow, during a detection implemented by the device, to dissipate a certain amount of heat in the pixels 102, and in particular in the pyroelectric material of the layer 113.
  • the heating of the portion 200 of pyroelectric material is obtained by circulating a current in the heating element 114 forming the heating resistor of each of the pixels 102.
  • the heating of the pyroelectric material 200 is obtained by circulating a current in the heating element 114 forming the heating resistor of each of the pixels 102.
  • the electrical powers injected into the heating element can range from 0.5 mW / pixel to 5 mW / pixel in the case of pixels having sides of dimension equal to about 50 microns (as is the case for a standard fingerprint sensor of resolution equal to 500 dpi).
  • the protective layer 116 is a layer of the protective layer 116.
  • the heating elements 114 as well as the portions of the dielectric layer 112 on which the heating elements 114 are not present are advantageously covered by a protective layer 116, corresponding for example to a laminated layer of PET or of any other suitable material to the realization of this layer.
  • a protective layer 116 corresponding for example to a laminated layer of PET or of any other suitable material to the realization of this layer.
  • Other materials are also conceivable for this layer 116, such as for example polyimide, PVDF and / or its copolymers, PMMA, etc.
  • the material or materials used and the thickness of the layer are chosen to obtain a good heat transfer from the front face 116 to the pyroelectric capacitance.
  • the protective layer 116 is made such that it is neither too thermally resistive (because the heat would not cross it), nor too thermally conductive (because the heat would leave in this case on the sides, towards the other pixels, causing the diathermy within the sensor), neither too thick (to have a heat transfer from the front face of the protective layer 116 to the pyroelectric capacitor), nor too thin (the thickness of the layer 116 must be all of even be sufficient for its protective role to be fulfilled).
  • the thickness of the protective layer 116 may range from a few microns (for example 5 microns) to about 100 microns. The thickness is for example of the order of 10 .mu.m.
  • the protective layer 116 may correspond to a layer of DLC ("Diamond Like Carbon") with a thickness of less than about 1 ⁇ m.
  • the upper face of the protective layer 116 corresponds to the surface on which is located the thermal pattern to be detected, for example a finger whose fingerprint is intended to be detected.
  • the part of a finger 300 with the depressions and bumps of the imprint are represented on the figure 1 .
  • the first solvent and the second solvent are compatible with the pyroelectric layer, in particular in the case of a pyroelectric layer of PVDF or of PVDF copolymer.
  • the first solvent and the solvent independently of each other, are selected from among butyl acetate, propyl acetate, isopropanol, ethanol, methanol, methoxyethanol, ethoxyethanol, hexane, and cyclohexane.
  • the first and second solvents are identical. Even more preferentially, it is methanol.
  • Step iii may be carried out for from 1h to 10h, for example 3h.
  • step iv can be carried out for several hours, for example for a period ranging from 2 hours to 10 hours, for example 4 hours.
  • the supernatant may be removed and replaced with the same or different volume of the solvent or solvent mixture. For example, 50mL of solvent or solvent mixture can be added.
  • the surfactant has the role of dispersing the particles 210 to make the solution homogeneous and transparent.
  • a homogeneous solution will facilitate a homogeneous deposit. It is possible to add from 1% to 10% molar, for example 5% molar, of surfactant to the quantity of particles 210.
  • the surfactant is preferably chosen from methoxyacoxyacetic acid (MEA), methoxybenzoic acid, (ethylthio) benzoic acid, dimethoxybenzoic acid, decanoic acid, nitrobenzoic acid, trifluoromethylbenzoic acid, or a mixture thereof.
  • the solution is then deposited by any suitable printing technique involving liquid inks (screen printing, gravure printing, inkjet, flexo-engraving, offset etching) or coating.
  • the solution is deposited by spin coating (or "spin-coating").
  • the figure 5 represents the thickness of the layer 220 in particles as a function of the mass concentration of particles in the solution and as a function of the deposition rate. For example, to have a thickness of 35 nm, we will use a deposition rate of about 1000 rpm and a particle concentration of 10 mg / ml.
  • a heat treatment is performed after deposition of the particles.
  • the annealing is performed in situ on the underlying layers of the thermal pattern sensor.
  • the heat treatment is carried out at a temperature, preferably ranging from 120 ° C to 180 ° C, for example at a temperature of 150 ° C. Such temperatures may advantageously be used for annealing on plastic substrates.
  • the annealing step makes it possible to partially or completely eliminate the organic compounds originating from the synthesis (for example the additives and / or the solvent), which can influence the pyroelectric properties and / or the permittivity of the layer.
  • the organic compounds are not completely removed, the particles are covered locally or partially by a layer of organic residues.
  • the annealing step also makes it possible to form crystalline ZnO.
  • the material after annealing contains crystalline ZnO, and Zn (OH) 2 hydroxide ( figure 6 ).
  • a compact arrangement of the ZnO particles is noted before the annealing step.
  • the ZnO layer 220 is densified.
  • the thermal conductivity is substantially identical (here of the same order of magnitude) after densification.
  • the densification can be, for example, quantified by X-ray reflectivity measurement.
  • the annealing can be carried out for a duration ranging from a few minutes (for example 5 minutes) to a few hours (for example 2 hours). For example, it is possible to anneal at 150 ° C. for 15 minutes.
  • the annealing can be carried out in an oven.
  • the sensor is made from the substrate 104.
  • the material of the substrate 104 (glass, semiconductor, plastic, etc.) is chosen according to the technology with which the various electronic elements of the sensor are made.
  • the substrate 104 is first cleaned to remove organic residues present thereon. The type of cleaning used will be a function of the material of the substrate 104.
  • the second step is to deposit on the front face of the substrate 104 a first electrically conductive layer, for example metal, from which the electrode 108 is intended to be made.
  • the layer may be vapor deposition PVD by evaporation ("sputtering" in English), screen printing, spray ("spray” in English) or even by inkjet, depending on the materials and thicknesses to be deposited.
  • the thickness of the layer goes, for example from about 100 nm to 2 ⁇ m. In general, the thickness of the layer is greater than or equal to about 100 nm. Other types of deposition may allow the production of a thick layer greater than about 2 microns.
  • the structure of the electrodes 108 may be defined by implementing a step of photolithography and etching of the layer.
  • the pyroelectric material layer 200 is then formed on the first electrode 108.
  • the PVDF pyroelectric material or one of its copolymers can be deposited by "spin coating". Other types of localized deposits may be used such as screen printing or spraying or even ink jet deposition.
  • a step of irradiating the pyroelectric material can then be implemented to crystallize at least the second face of the pyroelectric material layer, to improve the pyroelectric performance.
  • This irradiation is for example carried out with a UV flash light, with a duration of the flash, or the pulse, of between about 500 ⁇ s at 2 ms, a fluence (energy delivered per unit of area) of between about 15 J / cm 2 and 25 J / cm 2 , and with a light of wavelength between about 200 nm and 380 nm.
  • the number of flashes, or pulses, of UV light produced during this irradiation varies according to the thickness on which the pyroelectric material is to be crystallized.
  • the irradiation can be carried out with a fluence equal to about 17 J / cm 2 , a pulse duration equal to about 2 ms and a number of pulses equal to 5.
  • the pyroelectric material having optionally undergone a previous crystallization is then annealed, for example made at about 130 ° C. for about 60 minutes, to finalize the total crystallization of the pyroelectric material.
  • the crystallization of the pyroelectric material can therefore be carried out in two stages: first of all irradiation by UV light impulse to crystallize well the second face of the layer made of pyroelectric material in order to increase its thermal conductivity, then a thermal annealing completing the crystallization for the remainder of pyroelectric material not crystallized by the previous irradiation.
  • the pyroelectric material is a P-based copolymer (VDF-TrFe)
  • VDF-TrFe P-based copolymer
  • This polarization is performed only once for the entire lifetime of the pyroelectric material.
  • This DC bias can be at room temperature or hot (up to about 100 ° C).
  • the polarization is carried out at a room temperature, it is possible to apply a DC voltage up to about 150V / ⁇ m of thickness of the pyroelectric layer for a period of time for example between a few seconds and a few minutes.
  • a voltage of 120V / ⁇ m will be applied for 20s.
  • a DC voltage for example between about 50 V and 80 V per micron thickness of the pyroelectric layer can be applied for a duration for example between about 1 min and 5 min.
  • the temperature is then lowered until the ambient temperature is reached, then the electric field applied to the pyroelectric material, via the applied DC voltage, is stopped.
  • Such polarizations allow the PVDF to reach pyroelectric coefficients between about 20 and 45 ⁇ C / (m 2 .K).
  • the molecules inside the pyroelectric layer 200 remain oriented thus, even when the material is no longer subjected to this electric field.
  • the material may thus be polarized by applying an initial bias voltage across the electrodes 108, 110.
  • a pyroelectric material thickness of less than or equal to about 2 ⁇ m will be chosen in order to favor the polarization of the pyroelectric material of this capacitance. and the level of the electrical voltage applied between the electrodes 108, 110 for effecting the initial polarization of the pyroelectric material (when the pyroelectric material is to be initially polarized).
  • the ZnO and / or ZnO / Zn (OH) 2 particles 210 are then deposited on the pyroelectric material layer 200, so as to at least partly or completely fill the pores of the second main face of said layer. pyroelectric 200, and optionally, to further form a layer of ZnO 220 on said pyroelectric layer 200.
  • the ZnO and / or ZnO / Zn (OH) 2 210 particles may be deposited by any printing technique involving liquid inks (screen printing, gravure printing, inkjet, flexo-engraving, offset etching). .
  • this layer can be deposited by vacuum technology, such as Atomic Layer Deposition (ALD), by physical phase deposition. vapor (PVD for ("Physical Vapor Deposition") or by cathodic sputtering.
  • ALD Atomic Layer Deposition
  • PVD Physical Vapor Deposition
  • cathodic sputtering
  • Portions of the pyroelectric material 200 are defined by the implementation of photolithography and etching of the pyroelectric material.
  • the etching used corresponds to a plasma etching
  • an O 2 plasma can be used alone or in combination with SF 6 (sulfur hexafluoride).
  • the portions of pyroelectric material conserved after the implementation of this etching correspond to the portions of the pyroelectric material located at the level of the pixels 102 of the sensor.
  • the portions may be made directly, without an etching step, by a localized deposit corresponding, for example, to ultrasonic spray deposition, or to inkjet or screen printing.
  • the second electrode, or upper electrode, 110 is then deposited, according to deposition techniques that may be identical or different from those used to deposit the first electrode.
  • One or more second electrically conductive layers for forming the heating elements 118 are then deposited on the structure obtained at this stage of the process.
  • the heating element 118 is then formed by etching the electrically conductive layer or layers previously deposited in the pattern of the heating element 118, for example in the form of a coil or in the form of a rectangular line.
  • a photolithography step followed by a plasma etch step or in wet are for example implemented for the formation of the heating element 118.
  • the layer is etched, for example via the implementation of a plasma etching.
  • the material or materials intended to form the protective layer 116 is or are then deposited on the entire structure previously made.
  • the deposit (s) may be physically (for example PVD) at low temperature or by liquid means (for example by centrifugation, spraying or inkjet).
  • the protective layer 116 is formed as soon as the deposition is localized on the heating element 118 and any parts of the material pyroelectric not covered by the heating element 118 (as is the case when the heating element 118 forms a coil located only above the portions 200), and it is not necessary to implement an engraving of or deposited materials to form the layer 116.
  • the material or materials are also deposited next to the portions of pyroelectric material, an etching, for example by plasma, is then implemented in order to remove the portions of the material or materials deposited next to the portions, thus allowing access to the ends.
  • the senor is used as a fingerprint detector.
  • the sensor can be used to carry out a thermal pattern detection other than fingerprints, because each pixel 102 of the sensor reads the heat capacity placed above it and that whatever the nature of the thermal pattern.
  • the senor can also be used for producing a non-cooled infrared imager.
  • the pixels 102 of the sensor are in this case integrated on a CCD or CMOS type of integrated circuit collecting the electrical charges generated by the sensor.
  • Such an imager further comprises an infrared lens filtering the light arriving on the sensor. So that the sensor can be subjected to a temperature difference (necessary given the measurement made by the pyroelectric capacitors), the imager comprises a device successively for blocking the infrared light arriving on the sensor and then let this light.
  • Such device can correspond to a "chopper", that is to say a wheel with a hole and rotating in front of the sensor.
  • An absorber member may be added to the pyroelectric material to improve the absorption of the received infrared radiation.

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DE102020116989B4 (de) 2019-06-28 2023-06-01 Ihp Gmbh - Innovations For High Performance Microelectronics / Leibniz-Institut Für Innovative Mikroelektronik Pyroelektrischer Sensor für elektromagnetische Strahlung und dazugehöriges Herstellungsverfahren

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