EP3391421A1 - Dispositif optique pour diminuer la visibilite des interconnexions electriques dans des modules photovoltaiques semi-transparents en couches minces - Google Patents
Dispositif optique pour diminuer la visibilite des interconnexions electriques dans des modules photovoltaiques semi-transparents en couches mincesInfo
- Publication number
- EP3391421A1 EP3391421A1 EP16823305.4A EP16823305A EP3391421A1 EP 3391421 A1 EP3391421 A1 EP 3391421A1 EP 16823305 A EP16823305 A EP 16823305A EP 3391421 A1 EP3391421 A1 EP 3391421A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- transparency
- lines
- transparent
- photovoltaic module
- cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 9
- 230000003287 optical effect Effects 0.000 title description 5
- 238000010292 electrical insulation Methods 0.000 claims abstract description 13
- 210000004027 cell Anatomy 0.000 claims description 35
- 239000002184 metal Substances 0.000 claims description 15
- 238000009413 insulation Methods 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 8
- 239000006096 absorbing agent Substances 0.000 claims description 7
- 210000004460 N cell Anatomy 0.000 claims description 6
- 238000002955 isolation Methods 0.000 claims description 6
- 230000000007 visual effect Effects 0.000 abstract description 12
- 238000000034 method Methods 0.000 abstract description 11
- 238000000608 laser ablation Methods 0.000 abstract description 10
- 238000001459 lithography Methods 0.000 abstract description 6
- 230000003252 repetitive effect Effects 0.000 abstract 1
- 238000002679 ablation Methods 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000009877 rendering Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 210000003041 ligament Anatomy 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- AHKZTVQIVOEVFO-UHFFFAOYSA-N oxide(2-) Chemical compound [O-2] AHKZTVQIVOEVFO-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
- H01L31/0468—PV modules composed of a plurality of thin film solar cells deposited on the same substrate comprising specific means for obtaining partial light transmission through the module, e.g. partially transparent thin film solar modules for windows
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022441—Electrode arrangements specially adapted for back-contact solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
- H01L31/0463—PV modules composed of a plurality of thin film solar cells deposited on the same substrate characterised by special patterning methods to connect the PV cells in a module, e.g. laser cutting of the conductive or active layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
- H01L31/0465—PV modules composed of a plurality of thin film solar cells deposited on the same substrate comprising particular structures for the electrical interconnection of adjacent PV cells in the module
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Definitions
- the present invention relates to semitransparent photovoltaic modules composed of thin-film solar cells connected together by visible interconnection and electrical insulation lines, and more particularly the photovoltaic modules whose transparency rate is obtained by creating a more or less dense network of geometric transparency zones in the structure of said thin layers.
- a photovoltaic module is composed of a multitude of photovoltaic cells connected in series. Each cell consists of a stack of thin layers positioned in the following order: a transparent substrate (for example mineral or organic glass), then a conductive transparent front electrode generally consisting of a conductive transparent oxide, designated hereinafter by the term "TCO” (Acronym of the term “Transparent Conductive Oxide”), then a photo-active layer generally called “absorber”, then a conductive back electrode, usually called “back contact”, which is often metallic.
- TCO conductive transparent oxide
- Absorber a photo-active layer
- back contact usually called “back contact”
- the scribes are lines called P1, P2 and P3 which are generally made by laser.
- Other architectures exist which cause the phenomenon of transparency and which do not require any ablation WO 2008/093933 and US 2013/0247969) but no particular characteristic concerning the optical quality of the device is described.
- the visual quality of a photovoltaic module we can also define this quality as the absence, or the least visual distinction, of the geometric, colorimetric and contrast discontinuities that could be seen on its surface by the eye of an observer placed at a distance of about 30 cm.
- the size and the position of the lines of interconnection and isolation of the cells (the scribes) with respect to the zones of transparency create a geometric and contrast discontinuity which is generally perceived by the eye and degrades the desired visual quality.
- Such a good visual quality is mainly sought for photovoltaic glass.
- the invention hereinafter describes a device which makes it possible to improve the visual quality of a photovoltaic surface composed of a multitude of thin-film cells connected by electrical interconnection and isolation lines (scribes), this improvement. visual quality is obtained by making said interconnection and isolation lines less visible, or even invisible, for an observer placed at about 40 cm from said photovoltaic surface.
- the subject of the invention is a semi-transparent photovoltaic module comprising: on the one hand a stack of thin layers including at least one transparent thin layer which has the function of a front electrode, a photovoltaic thin film which has the function of an absorber, and a thin metallic layer which has the function of a rear electrode ; said thin layers being deposited on a transparent substrate; said photovoltaic module being partitioned into a plurality of N, N + 1,..., N + x cells electrically interconnected by means of electrical interconnection lines P2 making the junction between the rear electrode of the N cell and the front electrode of the N + 1 cell, and by means of electrical insulation lines making the insulation P3 between the rear electrode of the N cell and the N + 1 cell, and the insulation P1 between the front electrode N cell and N + 1 cell;
- a multitude of transparency zones arranged at least in said rear metal electrode and in said photovoltaic absorber thin layer; said transparency areas all having the same geometric shape and being positioned relative to each other to form one or more networks visually revealing a multitude of rectilinear strip areas whose longitudinal axes are parallel; some of said transparency zones being arranged in bands having a high density of transparency and some of said transparency zones being arranged in a band having a low transparency density, characterized in that said electrical insulation lines P1 and P3 are positioned in said rectilinear bands of high density of transparency, and said electrical interconnection lines P2 are positioned in said rectilinear strips of low transparency density, so as to reduce the visibility with the naked eye of said lines of insulation and electrical interconnection P1, P2 and P3.
- the electrical interconnection lines P2 and the insulation lines P1 and P3 have different colors and transparencies depending on whether said lines are positioned in a transparency zone or not and that the manufacturing is done by laser ablation (ablation direct thin film) or by lithography processes (etching layers through a mask).
- the analysis of the different possible cases shows that the visibility of said lines (P1.P2.P3) is reduced when they are positioned in zones in rectilinear bands whose color or transparency as the case is similar to theirs,
- a typical particular case is that of a photovoltaic surface whose partial transparency is achieved by the removal of a network of zones, holes, having the form of disks.
- the discs must not touch each other so that the electric current can flow from one cell to another.
- the spaces between the holes are aligned and form a multitude of areas in rectilinear bands of low transparency. It is then in this zone of low transparency that it is wise to place the connector P2 which is itself opaque.
- Insulation lines P1 and P3 are lines drawn respectively in the front and back electrodes, it is then advisable to place these lines in the zones in rectilinear bands of high transparency which have formed along the lines which pass through the center ablated areas, here the center of the circular holes. In this case, the lines P1 and P3 will naturally be transparent.
- the geometric shapes of the transparency zones constituting said ordered network are chosen from among the following forms or in combination: discs, oval, polygonal, hexagonal, square surfaces.
- the disks make it possible to minimize the diffraction effects with respect to the polygonal shapes.
- the width of said three lines of interconnection and electrical insulation is less than 100 micrometers. This width makes it easy to place the interconnection line P2 in a band of low transparency, so as not to be visible in a transparent zone.
- the distance separating two consecutive interconnection or electrical insulation lines is greater than 100 micrometers. It can be shown that in this configuration, said three lines are at the limit of the separating power of the eye, substantially 116 microns for observation at a distance of more than 40 cm from the module.
- the geometric shapes of said transparency zones have their largest dimension greater than 400 micrometers. Such dimensions improve the optical quality of the semi-transparent photovoltaic module, in particular by reducing blur.
- the opaque zones separating said transparency zones have their smallest dimension less than 100 micrometers.
- Figure 1 is a cross-sectional diagram of a photovoltaic module composed of thin layers.
- FIG. 2 represents a table summarizing the different appearances of the electrical connection lines in the case of a laser ablation transparency embodiment.
- FIG. 3 represents a table summarizing the different appearances of the electrical connection lines in the case of a lithographic transparency embodiment.
- FIG. 4 represents an example of non-optimized positioning of the scribes in the case of laser ablation or by lithographic process.
- FIG. 5 represents an example of optimized positioning of the scribes which then become invisible in the case of laser ablation or lithographic process.
- Figure 6 shows the example of a network of circular transparency zones and the calculation of the dimensions and the optimal positioning of the scribes.
- Figure 7 shows an example of hexagonal honeycomb transparency zones.
- FIG. 1 represents in section a photovoltaic module (1) and its constituents: N, N + 1, N + X cells are connected in series mode. All the cells have an identical width L and are constituted by the stack of a transparent substrate (S), usually made of glass or plastic, of a thin layer of transparent conductive oxide (2) also called the front electrode which is deposited on the transparent substrate (5), a thin absorber layer (3) which is a photovoltaic layer, for example amorphous silicon, and then a thin conductive metal layer (4) called a back electrode.
- S transparent substrate
- P1 insulating lines
- a second etching line (P2) is formed in the absorber (3), which is then filled with metal and forms the contact between the rear electrode (4) and the front electrode (2) of the cell (N). , making it an Interconnection line.
- Insulation lines (P3) are formed in the rear electrode (4). For practical reasons, the etching of the lines P3 is generally done up to the front electrode (2) of the cell (N).
- the lines P1, P2 and P3 do not have the same color since they are not covered by the same material.
- the device can be observed either on the side of the rear contact (4), or on the side of the transparent substrate (5).
- the line P1 is covered by the metal (4) and is therefore only very little or not visible.
- the P2 line is also covered with metal but can be more visible if the TCO (2) / metal (4) interface is textured, while the P3 line is completely transparent, thus contrasting with the metal, making it visible .
- the line P1 has the color of the photoactive layer (3), the line P2 that of the metal (4) and the line P3 remains completely transparent.
- the width of the insulation and interconnection lines (P1.P2.P3) varies from about ten microns to a hundred microns and the distance between the lines also varies from ten to a hundred microns.
- FIG. 2 is a two-input array that applies to laser etched cells and maps each of the P1, P2, P3 connection lines (the first column showing their original color) and their possible position. outside a transparency zone (OUT) or inside a transparency zone (IN). Each case envisaged gives six combinations, six boxes whose dark or light aspect informs on the visual rendering of each line (P1.P2.P3). It can thus be seen that P1 and P2, which are originally opaque, remain dark after ablation when they are outside a transparency zone (OUT) but only P1 becomes transparent in a zone of transparency (IN), while P2 remains opaque. P3, which is originally transparent, remains transparent after ablation both in a transparent area (IN) and in a non-transparent area (OUT).
- the fourth column indicates the best optical positioning choice (IN or OUT) for each of the three lines (P1.P2.P3).
- FIG. 3 is a two-input table that applies to cells made by lithography etching processes and which matches each of the connection lines P1, P2, P3 (the first column showing their original color). ) and their possible position outside a transparent area (OUT) or inside a transparent area (IN).
- Each case envisaged gives six combinations, six boxes whose dark or light aspect informs on the visual rendering of each line (P1.P2.P3).
- P1 and P2 which are originally opaque, remain dark after etching when they are outside a transparency zone (OUT) and that P3, which is originally transparent, remains transparent outside this transparency zone. (OUT).
- all the scribes P1, P2 and P3 are transparent in the zones of transparency (IN) after engraving.
- the fourth column indicates the best choice of positioning (IN or OUT) for each of the three lines (P1.P2.P3).
- P1 and P3 in zones (IN) "while it is possible optically to position the lines P2 indifferently in (IN) or (OUT) zones.
- P2 is the electrical interconnection line between the front electrode and the rear electrode, if it were placed in an area (IN), only part of the line would effectively serve to interconnect the two electrodes. This would have the effect of increasing the resistance of the cell and thus reduce the electrical performance of the photovoltaic module.
- the interconnection line P2 must advantageously be placed outside a transparent zone (OUT) for reasons of electrical production.
- FIG. 4 represents a junction between two N and N + 1 cells in the case where the zones of transparency (6) (here disks) are made by laser ablation and when the position of the scribes is not optimized.
- the incident beam of the laser passes through the transparent substrate first. Due to the differences in absorption of the laser beam by the different materials that make up the cell, depending on the wavelength and the proper fluence of the laser, some thin layers of the cell may be transparent. For example, a pulsed green laser with a wavelength of 532 nrn will be used to ablate the photocurrent layer. The TCO is transparent for this wavelength of the laser, the ablation then occurs first in the photoactive layer which sprays the thin metal placed behind.
- the content of the scribe P1 is ablated together with the photoactive layer if the latter is located in the zone of transparency, whereas the scribe P2 which contains only the metal may not be ablated by the laser (at the same time). fluence).
- the P2 can therefore remain visible through the transparency zone. This is shown in Figure 4. At the visual level it is the entire line of vertical disks (7) which becomes darker and the scribe P3, which is transparent, adds transparency to the line of vertical disks ( 8) because said scribe P3 is positioned mostly in areas of non-transparency (9), which will be perceived by the eye of the observer as an amplified contrast defect.
- Figure 5 shows the example of Figure 4 above but this time the position of the scribes is optimized by following the guidelines in column (4) of the table in Figure 2.
- the scribes P1 and P3 are placed in the areas of transparency (IN, 6), that is to say substantially in the center and parallel to the parallel bands of high transparency (7,8) and the scribe P2 is placed in a zone of non-transparency (OUT), that is to say say substantially in the center and parallel to parallel bands of low transparency (9).
- "Parallel bands of high or low transparency” means the respective appearance of light or dark bands perceived by the observer who, being at a distance from the areas of transparency greater than the separating power of his eye, does not distinguish the contents said bands.
- said bands of high transparency (7, 8) consist of the alignment of the transparent discs (6)
- said bands of low transparency (9) consist of the spaces between the alignment of the transparent disks (6).
- FIG. 6 illustrates a calculation method for calculating the distance d between the centers of two rows of disks (6) for a photovoltaic module which must be rendered semi-transparent by laser ablation. If R is the radius of the disks (6) and Cd is the distance between the disks, the geometric formula is:
- the width of each cell that composes the module, and thus the distance between two consecutive lines P1 is L
- the condition for the lines P1 and P3 to be positioned at the center of the transparency patterns (6) at each interconnection is that the width L of each cell is proportional to the distance d:
- the width L of each cell and the distance d between the geometric shapes of the zones of transparency (6) is given by the relation L * k d; k 5 being an integer.
- the width of the cells L is fixed beforehand during the deposition of the layers by scribes P1 made in the TCO.
- the positioning of the scribes with respect to the bands of high or low transparency which are generally performed after the deposition of the thin layers of the photovoltaic module. is optimized at each interconnection by adjusting the radius R of the circular holes and the distance Cd between them according to the degree of transparency. This optimization is done via a simple algorithm known to those skilled in the art so as to satisfy the relationship (2).
- the width L of the cells is then calculated before the realization of the Insulation scribes P1 so as to satisfy the relation (2).
- the positioning of the scribes P2 and P3 is done according to the dimensions R of the circular holes and the distance Cd between the holes.
- the scribes are fixed beforehand during the deposition of the various layers constituting the photovoltaic module, the scribe P2 being located halfway between the scribes P1 and P3.
- their position is detected using a camera.
- a correction either of the size of the geometric shapes of the transparency zones, or of the distance between said shapes, is progressively made on all of said shapes or alternatively on the shapes close to the scribes. This correction can be done using a pilot program the laser to position the bands of high density of transparency at the insulation line P1 and P3, and low density bands of transparency at the line P2.
- FIG. 7 illustrates another example of optimized positioning of scribes P1, P2 and P3 in a network of hexagonal holes.
- P1 and P3 are placed in the areas of transparency (IN), that is to say substantially in the center and parallel to parallel bands of high transparency (7,8) and P2 is placed in a non-transparent area (OUT) that is to say substantially in the center and parallel to the parallel strips of low transparency (9).
- the invention responds well to the goals set by improving the visual quality of a photovoltaic module (1) composed of a multitude of thin-film cells connected by interconnection lines and electrical insulation (P1 .P2.P3), this improvement in the visual quality is obtained by making the said interconnection and electrical insulation lines less visible, or even non-visible, by placing the said lines (P1.P2.P3) in zones of transparency or of non transparency in relation to the similarity of their apparent colors.
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- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1502617A FR3045945B1 (fr) | 2015-12-16 | 2015-12-16 | Dispositif optique pour diminuer la visibilite des interconnexions electriques dans des modules photovoltaiques semi-transparents en couches minces |
PCT/FR2016/000207 WO2017103350A1 (fr) | 2015-12-16 | 2016-12-12 | Dispositif optique pour diminuer la visibilite des interconnexions electriques dans des modules photovoltaiques semi-transparents en couches minces |
Publications (1)
Publication Number | Publication Date |
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EP3391421A1 true EP3391421A1 (fr) | 2018-10-24 |
Family
ID=55345882
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP16823305.4A Withdrawn EP3391421A1 (fr) | 2015-12-16 | 2016-12-12 | Dispositif optique pour diminuer la visibilite des interconnexions electriques dans des modules photovoltaiques semi-transparents en couches minces |
Country Status (6)
Country | Link |
---|---|
US (1) | US20190006546A1 (fr) |
EP (1) | EP3391421A1 (fr) |
JP (1) | JP2018537863A (fr) |
CN (1) | CN108431966A (fr) |
FR (1) | FR3045945B1 (fr) |
WO (1) | WO2017103350A1 (fr) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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FR3076079B1 (fr) * | 2017-12-27 | 2021-11-05 | Sunpartner Technologies | Dispositif photovoltaique multi-cellule semi-transparent |
US10884272B2 (en) | 2018-10-17 | 2021-01-05 | Garmin Switzerland Gmbh | Energy-collecting touchscreen unit |
WO2020188449A1 (fr) | 2019-03-18 | 2020-09-24 | Kamereon, Inc. | Aspect graphique pour modules solaires |
CN110071186B (zh) * | 2019-04-28 | 2020-11-20 | 西安富阎移动能源有限公司 | 一种薄膜光伏组件内联结构及生产工艺 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02271681A (ja) * | 1989-04-13 | 1990-11-06 | Fuji Electric Co Ltd | 太陽電池装置 |
JP2001102603A (ja) * | 1999-09-28 | 2001-04-13 | Sharp Corp | 薄膜太陽電池およびその製造方法 |
US20080105303A1 (en) * | 2003-01-03 | 2008-05-08 | Bp Corporation North America Inc. | Method and Manufacturing Thin Film Photovoltaic Modules |
KR101617267B1 (ko) * | 2009-12-07 | 2016-05-02 | 엘지전자 주식회사 | 이동 단말기 및 이것의 충전 제어 방법 |
JP4920105B2 (ja) * | 2010-01-22 | 2012-04-18 | シャープ株式会社 | 光透過型太陽電池モジュール及びその製造方法ならびに光透過型太陽電池モジュールを搭載した移動体 |
CN104051551B (zh) * | 2013-03-14 | 2017-03-01 | 台湾积体电路制造股份有限公司 | 薄膜太阳能电池及其形成方法 |
CN104425637A (zh) * | 2013-08-30 | 2015-03-18 | 中国建材国际工程集团有限公司 | 部分透明的薄层太阳能模块 |
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2015
- 2015-12-16 FR FR1502617A patent/FR3045945B1/fr not_active Expired - Fee Related
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2016
- 2016-12-12 WO PCT/FR2016/000207 patent/WO2017103350A1/fr active Application Filing
- 2016-12-12 EP EP16823305.4A patent/EP3391421A1/fr not_active Withdrawn
- 2016-12-12 US US16/061,818 patent/US20190006546A1/en not_active Abandoned
- 2016-12-12 JP JP2018531598A patent/JP2018537863A/ja active Pending
- 2016-12-12 CN CN201680073943.4A patent/CN108431966A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
US20190006546A1 (en) | 2019-01-03 |
FR3045945A1 (fr) | 2017-06-23 |
CN108431966A (zh) | 2018-08-21 |
WO2017103350A1 (fr) | 2017-06-22 |
FR3045945B1 (fr) | 2017-12-15 |
JP2018537863A (ja) | 2018-12-20 |
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