EP3156517B1 - Use of water soluble and air stable phosphaadamantanes as stabilizer in electrolytes for electroless metal deposition - Google Patents
Use of water soluble and air stable phosphaadamantanes as stabilizer in electrolytes for electroless metal deposition Download PDFInfo
- Publication number
- EP3156517B1 EP3156517B1 EP15189465.6A EP15189465A EP3156517B1 EP 3156517 B1 EP3156517 B1 EP 3156517B1 EP 15189465 A EP15189465 A EP 15189465A EP 3156517 B1 EP3156517 B1 EP 3156517B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- metal
- group
- electrolyte
- acid
- stabilizer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000003792 electrolyte Substances 0.000 title claims description 141
- 239000003381 stabilizer Substances 0.000 title claims description 54
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title description 4
- 238000000454 electroless metal deposition Methods 0.000 title description 2
- 229910052751 metal Inorganic materials 0.000 claims description 106
- 239000002184 metal Substances 0.000 claims description 106
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 56
- 239000000758 substrate Substances 0.000 claims description 39
- 125000004432 carbon atom Chemical group C* 0.000 claims description 32
- 239000000203 mixture Substances 0.000 claims description 32
- 230000008021 deposition Effects 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 28
- 229910052759 nickel Inorganic materials 0.000 claims description 27
- 239000003638 chemical reducing agent Substances 0.000 claims description 25
- 150000001875 compounds Chemical class 0.000 claims description 21
- 229910021645 metal ion Inorganic materials 0.000 claims description 19
- 239000008139 complexing agent Substances 0.000 claims description 18
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 16
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 14
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 14
- -1 aromatic carboxylic acids Chemical class 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 13
- 229910052802 copper Inorganic materials 0.000 claims description 13
- 239000010949 copper Substances 0.000 claims description 13
- 150000003839 salts Chemical class 0.000 claims description 13
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 claims description 12
- 229910001379 sodium hypophosphite Inorganic materials 0.000 claims description 12
- GLSRAPNRLWOZMY-UHFFFAOYSA-N 1-phosphatricyclo[3.3.1.13,7]decane Chemical compound C1C(C2)CC3CC1CP2C3 GLSRAPNRLWOZMY-UHFFFAOYSA-N 0.000 claims description 11
- 229910017052 cobalt Inorganic materials 0.000 claims description 11
- 239000010941 cobalt Substances 0.000 claims description 11
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 11
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 229910052796 boron Inorganic materials 0.000 claims description 9
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 8
- 125000003158 alcohol group Chemical group 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 229910052794 bromium Inorganic materials 0.000 claims description 8
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 8
- 150000001735 carboxylic acids Chemical class 0.000 claims description 8
- 229910052801 chlorine Inorganic materials 0.000 claims description 8
- 229910052731 fluorine Inorganic materials 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- 229910052709 silver Inorganic materials 0.000 claims description 8
- 239000004332 silver Substances 0.000 claims description 8
- 239000004202 carbamide Substances 0.000 claims description 7
- 235000013877 carbamide Nutrition 0.000 claims description 7
- 229960002449 glycine Drugs 0.000 claims description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052737 gold Inorganic materials 0.000 claims description 7
- 239000010931 gold Substances 0.000 claims description 7
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 6
- TVJORGWKNPGCDW-UHFFFAOYSA-N aminoboron Chemical compound N[B] TVJORGWKNPGCDW-UHFFFAOYSA-N 0.000 claims description 6
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical class B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims description 6
- 229910000085 borane Inorganic materials 0.000 claims description 6
- YPTUAQWMBNZZRN-UHFFFAOYSA-N dimethylaminoboron Chemical compound [B]N(C)C YPTUAQWMBNZZRN-UHFFFAOYSA-N 0.000 claims description 6
- 235000013905 glycine and its sodium salt Nutrition 0.000 claims description 6
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 claims description 6
- 229940091173 hydantoin Drugs 0.000 claims description 6
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims description 6
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- HJSRRUNWOFLQRG-UHFFFAOYSA-N propanedioic acid Chemical compound OC(=O)CC(O)=O.OC(=O)CC(O)=O HJSRRUNWOFLQRG-UHFFFAOYSA-N 0.000 claims description 6
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical compound O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 claims description 6
- 150000002825 nitriles Chemical class 0.000 claims description 5
- 150000003464 sulfur compounds Chemical class 0.000 claims description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 claims description 4
- 229940065287 selenium compound Drugs 0.000 claims description 4
- 150000003343 selenium compounds Chemical class 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 239000011593 sulfur Substances 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 3
- 239000000194 fatty acid Substances 0.000 claims description 3
- 229930195729 fatty acid Natural products 0.000 claims description 3
- 150000004665 fatty acids Chemical class 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- 150000001253 acrylic acids Chemical class 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 claims description 2
- 150000004715 keto acids Chemical class 0.000 claims description 2
- 229920006395 saturated elastomer Polymers 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 150000003628 tricarboxylic acids Chemical class 0.000 claims description 2
- 229940061720 alpha hydroxy acid Drugs 0.000 claims 1
- 150000001280 alpha hydroxy acids Chemical class 0.000 claims 1
- 238000007747 plating Methods 0.000 description 36
- 238000000151 deposition Methods 0.000 description 32
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 150000001576 beta-amino acids Chemical class 0.000 description 15
- 150000002739 metals Chemical group 0.000 description 14
- 150000002500 ions Chemical class 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- 229910001385 heavy metal Inorganic materials 0.000 description 12
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 238000007772 electroless plating Methods 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 9
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 8
- JVTAAEKCZFNVCJ-REOHCLBHSA-N L-lactic acid Chemical compound C[C@H](O)C(O)=O JVTAAEKCZFNVCJ-REOHCLBHSA-N 0.000 description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 8
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 8
- 229910052787 antimony Inorganic materials 0.000 description 8
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 8
- 238000009472 formulation Methods 0.000 description 8
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 7
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 7
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 7
- 229910052698 phosphorus Inorganic materials 0.000 description 7
- OQEBBZSWEGYTPG-UHFFFAOYSA-N 3-aminobutanoic acid Chemical compound CC(N)CC(O)=O OQEBBZSWEGYTPG-UHFFFAOYSA-N 0.000 description 6
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 229910001960 metal nitrate Inorganic materials 0.000 description 6
- 229910052763 palladium Inorganic materials 0.000 description 6
- 239000011574 phosphorus Substances 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 150000001340 alkali metals Chemical class 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
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- 229910052736 halogen Inorganic materials 0.000 description 5
- 229910001510 metal chloride Inorganic materials 0.000 description 5
- 229940081974 saccharin Drugs 0.000 description 5
- 235000019204 saccharin Nutrition 0.000 description 5
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical compound NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 description 4
- 239000007859 condensation product Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
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- XOAAWQZATWQOTB-UHFFFAOYSA-N taurine Chemical compound NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 4
- IEDIKTABXQYWBL-UHFFFAOYSA-N 3-aminopropanoic acid Chemical compound NCCC(O)=O.NCCC(O)=O IEDIKTABXQYWBL-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
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- 229940093930 potassium iodate Drugs 0.000 description 2
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- 230000000052 comparative effect Effects 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- ZMMDPCMYTCRWFF-UHFFFAOYSA-J dicopper;carbonate;dihydroxide Chemical compound [OH-].[OH-].[Cu+2].[Cu+2].[O-]C([O-])=O ZMMDPCMYTCRWFF-UHFFFAOYSA-J 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- GQZXNSPRSGFJLY-UHFFFAOYSA-N hydroxyphosphanone Chemical compound OP=O GQZXNSPRSGFJLY-UHFFFAOYSA-N 0.000 description 1
- 229940046817 hypophosphorus acid Drugs 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229940116298 l- malic acid Drugs 0.000 description 1
- 229960000448 lactic acid Drugs 0.000 description 1
- XQHAGELNRSUUGU-UHFFFAOYSA-M lithium chlorate Chemical compound [Li+].[O-]Cl(=O)=O XQHAGELNRSUUGU-UHFFFAOYSA-M 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 229940099690 malic acid Drugs 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- MBKDYNNUVRNNRF-UHFFFAOYSA-N medronic acid Chemical compound OP(O)(=O)CP(O)(O)=O MBKDYNNUVRNNRF-UHFFFAOYSA-N 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- NALMPLUMOWIVJC-UHFFFAOYSA-N n,n,4-trimethylbenzeneamine oxide Chemical compound CC1=CC=C([N+](C)(C)[O-])C=C1 NALMPLUMOWIVJC-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 125000002743 phosphorus functional group Chemical group 0.000 description 1
- 229920001184 polypeptide Polymers 0.000 description 1
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 239000001508 potassium citrate Substances 0.000 description 1
- 229960002635 potassium citrate Drugs 0.000 description 1
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 1
- 235000011082 potassium citrates Nutrition 0.000 description 1
- MXXRJZJYTALZLW-UHFFFAOYSA-M potassium iodite Chemical compound [K+].[O-]I=O MXXRJZJYTALZLW-UHFFFAOYSA-M 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011697 sodium iodate Substances 0.000 description 1
- 235000015281 sodium iodate Nutrition 0.000 description 1
- 229940032753 sodium iodate Drugs 0.000 description 1
- IUOAWALEYWGAFR-UHFFFAOYSA-M sodium iodite Chemical compound [Na+].[O-]I=O IUOAWALEYWGAFR-UHFFFAOYSA-M 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 239000003017 thermal stabilizer Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
- C23C18/405—Formaldehyde
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
- C23C18/50—Coating with alloys with alloys based on iron, cobalt or nickel
Definitions
- the present invention relates to the use of water soluble and air stable phosphaadamantanes as stabilizer in electrolytes for electroless metal deposition, an electrolyte as well as a method for the electroless deposition of metals, particularly layers of nickel, copper, cobalt, boron, silver, palladium or gold, as well as layers of alloys comprising at least one of the aforementioned metals as alloying metal.
- the present invention further relates to an organic stabilizer for electroless plating processes, and an electrolyte for the electroless deposition of a metal layer on a substrate, comprising a metal ion source for the metal to be deposited, a reducing agent, a complexing agent, a stabilizer and preferably an accelerator, as well as a method for the electroless deposition of a metal layer on a surface from an electrolyte according to the invention.
- electroless plating methods have long been known from the state of the art.
- electroless plating also known as chemical plating
- the coating of almost every metal and a huge number of non-conductive substrate surfaces is possible.
- the electroless deposited metal layers differ from the galvanically deposited metal layers, i.e. those layers deposited by the use of an external current, in physical as well as mechanical aspects.
- metal alloy layers with non-metal elements like for example cobalt/phosphor, nickel/phosphor, nickel/boron or boron carbide layers are deposited by means of electroless deposition methods.
- electroless deposited layers in many cases differ also in their chemical nature from the galvanically deposited layers.
- One major advantage of the electroless deposited metal layer is the outline accuracy of the layer thickness of the deposited layer independent from the substrate geometry.
- electroless methods are also used for the coating of other non-conductive substrates, like for example plastic substrates, to render the surface of such substrates conductive and/or to change the appearance of the substrate in aesthetic respect.
- the material properties of the coated substrate can be improved or amended.
- the corrosion resistance or the hardness of the surface and/or the wear resistance of the substrate can be improved, e.g. for gas and/or oil industry applications.
- Electroless plating methods are based on an autocatalytic process, in which process the metal ions comprised in the electrolytes are reduced to the elemental metal by a reducing agent which is oxidized during this redox reaction.
- a reducing agent commonly used in the field of electroless deposition of metals on substrate surfaces is sodium hypophosphite. However, also other reducing agents are used in dependency of the metals to be deposited.
- U.S. Pat. No. 6,146,702 discloses an electroless nickel cobalt phosphorus composition and plating process. The process is provided for enhancing the wear resistance of aluminium and other materials by depositing on the substrate a nickel, cobalt, phosphorus alloy coating using an electroless plating bath to provide a plated alloy having a cobalt content of at least about 20% by weight and a % Co / % P weight ratio of at least about 5.
- European patent application EP 1 413 646 A2 discloses, for example, an electrolyte for the electroless deposition of nickel layers having internal compressive stress.
- the electrolyte disclosed in this application comprises a metal salt of the metal to be deposited, a reducing agent, a complexing agent, an accelerator, and a stabilizer.
- the accelerator is used to increase the deposition rate of the metal on the substrate surface.
- JP 2009-149965A discloses a silver-plating method, which does not need to form an unnecessary layer of a nickel layer in between a substrate which is difficult to be plated and a silver-plated film, and can form the silver-plated film having sufficient adhesiveness directly on the substrate which is difficult to be plated with the use of a halide-free plating bath under a satisfactory working environment.
- the silver-plating method disclosed is used for forming the silver-plated film on the substrate on which an oxide film is easily formed and the oxide film hinders the adhesiveness of a plated film, and comprises at least the steps of: (A) degreasing the substrate; (B) removing the oxide film with a strongly acidic solution; and subsequently to the step (B), (C) plating the substrate with silver by using a phosphine-containing acidic silver-plating bath which essentially does not contain a halide ion and a cyanide ion while skipping a step of nickel strike plating or nickel-alloy strike plating.
- JP 2005-290415A discloses a stabilizing agent for electroless copper-plating electrolytes, which imparts adequate stability to an electroless copper-plating solution without lowering characteristics of an electroless copper-plated film, and is made of a highly safe material.
- the electroless copper-plating solution includes a phosphine compound expressed by the following general formula, as the stabilizing agent: wherein R1, R2 and R3, are each the same or different, represent a monovalent aliphatic hydrocarbon group which may have a substituent group, an aryl group which may have a substituent group, or a heterocyclic group which may have a substituent group.
- CN 101348927A discloses a cyanogen-free preplated copper solution.
- the solution adopts a nontoxic organic phosphine compound to replace cyanide as a complexing agent for the preplated copper, and is particularly suitable for preplated copper used to electroplate steel, aluminum, magnesium, zinc, titanium and titanium alloy.
- the cyanogen-free preplated copper solution has the following main technical characteristic that the solution consists of (a) one sort of copper sulphate, basic cupric carbonate or copper nitrate with the volume concentration of between 30 and 60 g/L; (b) one sort or two sorts of compounds selected from methylene diphosphonic acid, 1-hydroxyethylidene 1.1 diphosphonic acid and 1-hydroxybutyleneidene 1.1 diphosphonic acid with the volume concentration of between 120 and 160 g/L; (c) one sort or two sorts of compounds selected from methylamino dimethylene diphosphonic acid, hexamethylene diamine tetramethylene phosphonic acid and ethylenediamine tetramethylene phosphonic acid with the volume concentration of between 2 and 5 g/L; (d) one sort of potassium citrate, amine citrate or s pizzate salt with the volume concentration of between 6 and 12 g/L, and (e) polyethyleneimine alkyl slat or aliphatic amine ethoxy
- EP1138803A2 Another way of achieving plating on plastics is for instance disclosed in EP1138803A2 .
- This document disclose a process for metallizing of at least one insulating layer of an electronic or micromechanical element comprises applying at least one of the insulating layers to the substrate and activating by treating with an activator; applying the further insulating layer and structuring; and metallizing the first insulating layer.
- an aqueous electrolyte for the electroless deposition of a metal layer on a substrate comprising a metal ion source for the metal to be deposited, a reducing agent, a complexing agent for reducing the metal ions, an accelerator, and a stabilizer, characterized in that the electrolyte comprises as stabilizer a phosphaadamantane according to the general formula I wherein the hydrogen atoms on carbon atom 1 to 6 may independently from each other substituted by a moiety of the group consisting of F, Cl, Br, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and an alcohol group having 1 to 6 carbon atom.
- phosphaadamantanes according to the general formula I are capable to replace heavy metal stabilizers, cyanides, selenium compounds as well as sulfur compounds comprising sulfur in an oxidation state between -2 and +5 in electrolytes for the electroless deposition of metal layers, totally.
- the applicant believes that the phosphaadamantanes according to general formula I due to their indirectly tertiary amino groups as well as their tertiary phosphorus group are capable to at least temporarily jam the active centers on the substrate surface which are responsible for the uncontrolled deposition. So the wild deposition of the metals can be avoided. Additionally, also the foreign ions comprised in the electrolyte which are responsible for the wild deposition, too, are inactivated by the used such phosphaadamantanes.
- a further benefit of the inventive electrolyte is that an effect known as edge weakness can be avoided.
- edge weakness When using electrolytes for the electroless deposition of metal layers which comprise heavy metal ions as stabilizers at high convection of the electrolyte a decreased deposition of metal at the edges of the substrate occurs. This is deemed to be related to an increased assembly of the heavy metal ions used as stabilizers in these areas. This effect deteriorates the outline accuracy of the plating.
- phosphaadamantanes according to general formula I as stabilizers in electroless plating methods this edge weakening effect can be avoided which significantly increases the overall outline accuracy of the plating especially when plating large substrates.
- phosphaadamantanes according to general formula I as stabilizers result in an improved deposition and a significant reduction of discard.
- a further benefit of the inventive electrolyte is that a significant reduction of deposition on components of the plating equipment, especially on the heating systems used in the plating equipment, occurs. By this the need for maintenance is significantly reduced which in turn results in a notable economic benefit to the plating shops due to less down time.
- An electrolytic bath, with a single class of metal, containing the stabilizer of the present invention leads to deposited metal layers, having properties like an amorphous metal. These properties are, for example, that these layers have no edge weakness effect; they are very passive; have a good resistance against corrosion; wear-resistance; and good compressive stress properties.
- the stabilizer according to the present invention is metal free; provides a deposit having significantly better corrosion resistance including excellent resistance vs. nitric acid; is environmental friendly (non-toxic additive); has a higher phosphorus concentration at given pH level; and lower plating temperatures can be used to achieve the same plating speed and phosphorus content.
- plating electrolytes for the electroless deposition become less sensitive to foreign metal carry-over, like e.g. palladium ions resulting from the activation pretreatment of the substrate to be plated.
- foreign metal carry-over like e.g. palladium ions resulting from the activation pretreatment of the substrate to be plated.
- non-conductive substrates like e.g. plastics
- noble metal colloids for seeding the surfaces.
- the known plating electrolytes turned out to be quit sensitive to foreign metals and therefore required intensive rinse steps after the activation, the inventive plating electrolytes does not show any significant deterioration even at Pd-concentrations » 2mg/L.
- phosphaadamantanes according to general formula I having no hydrogene substituted are found to be very effective as stabilizers in electroless plating electrolytes.
- 1,3,5-Triaza-7-phosphatricyclo[3.3.1.1]decane (PTA) is a preferred embodiment of the phosphaadamantanes according to general formula I.
- PTA has a sufficiently high solubility in aqueous systems and has a high oxidations stability.
- the phosphaadamantanes according to general formula I can be comprised in the inventive electrolyte within a range of ⁇ 0.05 mg/L and ⁇ 100 mg/L, preferably between ⁇ 0.1 mg/L and ⁇ 25 mg/L, most preferably between ⁇ 0.5 mg/L and ⁇ 10 mg/L.
- At least one reducing agent of the group consisting of sodium hypophosphite, formaldehyde, dimethylaminoborane, aminoborane, or other organic boranes can be comprised.
- the reducing agent may be comprised in the electrolyte in a concentration of between 0.08 mol/L and 0.5 mol/L, preferably, 0.1 mol/L and 0.3 mol/L.
- the electrolyte may comprises e,g, sodium hypophosphite (mono hydrate) with a concentration of 10 to 40 g/l, and even more preferably with a concentration of 12 to 30 g/l.
- a metal compound of the group consisting metal chloride, metal sulfate, metal acetate, metal nitrate, metal propionate, metal formiate, metal oxalate, metal citrate, and metal ascorbinate can be used, i.e., the source of cations of the metal to be deposited may comprise the counter anion of any of such salts.
- the metal compounds having volatile ions like for example metal acetate, metal nitrate, metal propionate, and metal formiate are preferred since the volatile character of the anion those anions leak out from the electrolyte in gaseous form which enables to reduce the amount of anions in the electrolyte.
- Volatile ions in the sense of this invention are ions which form together with according counter ion moieties which are volatile at the temperature the electrolyte is commonly used at.
- An example for such volatile ions is acetate which forms under the plating conditions acetic acid. Since acetic acid has a vapor pressure of 16hPa at 20 °C it will evaporate from the electrolyte under the plating conditions and can be recovered from the exhaust air system.
- the inventive electrolyte comprises a compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA, and amino acetic acid.
- the complexing agent may be comprised in the electrolyte in a concentration of between 0.05 mol/L and 0.5 mol/L, preferably 0.2 mol/L and 0.4 mol/L.
- the inventive electrolyte comprises an accelerator, which may preferably comprise a compound of the group consisting of saccharin, hydantoin, rhodanine, or carbamide and its derivates.
- the accelerator may be comprised in the electrolyte in a concentration of between 0.05 mmol/L and 0.1 mol/L, preferably 0.005 mol/L and 0.025mol/L.
- the inventive electrolyte may comprise a metal of the group consisting of nickel, copper, cobalt, boron, silver, palladium and gold.
- the metal to be deposited also alloys like for example nickel/cobalt-alloys, nickel/phosphor-alloys, cobalt/phosphor-alloys nickel/boron or the like can be deposited.
- the deposition of nickel/PTFE-layers or nickel/boron carbide/graphite-layers from dispersion bathes is possible by the inventive electrolyte.
- the inventive electrolyte can have a pH-value within a range of between pH 4 and pH 7, preferably within pH 4 and pH 6. Hence, it is preferred that the inventive electrolyte is slightly acidic.
- the pH-value of the electrolyte it may comprise pH adjusting compounds, like e.g. acids, bases, and/or buffers.
- organic and inorganic acids may be comprised in the electrolyte, e.g. sulfuric acid, acetic acid, lactic acid, citric acid, hypophosphorus acid, sulfonic acids or combinations of these.
- bases e.g. sodium carbonate, ammonium hydroxide, sodium hydroxide, potassium hydroxide, lithium hydroxide, or combination of these may be comprised in the electrolyte.
- the electrolyte may comprise e.g. an acetic acid/ acetate buffer, or a citric acid / citrate buffer.
- the electrolyte may comprise as an additional stabilizer a ⁇ -amino acid.
- ⁇ -amino acids having a pK a -value within a range of 4 to 8, preferably within a range of 5 to 7 seems to be suitable in this respect.
- 3-amino propionic acid ( ⁇ -alanin), 3-aminobutyric acid, 3-amino-4-methyl valeric acid and 2-aminoethane-sulfonic acid (Taurin) are usable as additional stabilizers.
- the ⁇ -amino acid may be comprised in the inventive electrolyte within a range of 1 mg/L to 5 g/L, preferably 100 mg/L to 2 g/L, and even more preferred 200 mg/L to 1.5 g/L.
- the formulation of the invention may comprises an organic stabilizer for electroless plating processes comprising an organic molecule which is the condensation product (adduct) of at least one ⁇ .-amino acid and at least one carboxyl component which may be introduced into the aqueous medium as, e.g., the free carboxylic acid or a salt thereof.
- the condensation product of the ⁇ -amino acid e.g. ⁇ -alanine
- a carboxylic functional group as derived for the carboxylic acid or its salt
- the condensation product is present in a monomeric, oligomeric and/or polymeric form, i.e., as the N-terminal amide of a ⁇ -amino acid monomer, dimer, trimer, oligopeptide and polypeptide.
- the condensation product of the ⁇ -amino acid may be comprised in the inventive electrolyte within a range of 1 mg/L to 5 g/L, preferably 100 mg/L to 2 g/L, and even more preferred 200 mg/L to 1.5 g/L.
- a pre mixture of a ⁇ -amino acid, like e.g. ⁇ .-alanine, with a carboxylic acid, like e.g. lactic acid, glycine, or malic acid increases the stabilizing effect and can those beneficially be used as a second stabilizer in sense of the invention. It has been discovered that the carboxylic acid reacts with ⁇ -amino acids to form amide structures which is deemed to be the reason for the enhanced stabilizing effect.
- the carboxylic acid may be a compound of the group consisting of acrylic acids, aromatic carboxylic acids, fatty acids, aliphatic carboxylic acids, keto acids, dicarboxylic acids, tricarboxylic acids, straight chain carboxylic acids, heterocyclic carboxylic acids, saturated carboxylic acids, unsaturated carboxylic acids, and .alpha.-hydroxy acids. It is also possible to use other organic compounds having a carboxylic functional group. In particular, the salts of carboxylic acids (carboxylate anion -RCO 2 - ) can be used.
- the electrolyte according to this invention may additionally comprise an inorganic stabilizer, preferably antimony.
- an inorganic stabilizer may be comprised in a concentration of between 0.05 mg/L and 0.5 g/L, preferably 0.5 mg/L and 0.1 g/L.
- the electrolyte may comprise three different stabilizers, one being a phosphine according to the general formula I, like e.g. PTA, a second one being a ⁇ -amino acid, and a third one being an inorganic stabilizer, like e.g. antimony.
- a phosphine according to the general formula I like e.g. PTA
- a second one being a ⁇ -amino acid
- an inorganic stabilizer like e.g. antimony.
- a metal layer on a surface of a substrate is deposited, wherein the phosphorous content of the metal layer is 2-6%, 6-10% or >10.5%.
- the amount of phosphorous has a considerable effect on the properties of the metal layer.
- a high phosphorous content of the metal layer leads to improved properties, for example improved corrosion resistance and a lower phosphorous content for example improved hardness of the metal layer.
- a further property of a metal layer according to the present invention is that it is very passive.
- a further advantage of the metal layers according to the present invention is the good residual compressive stress.
- a stabilizer according to the present invention it is possible to yield metal layers having various phosphorus content: low phosphorus, 3-5% (crystalline); middle phosphorus, 5-7 (9) % (partially crystalline); high phosphorus, >10% (amorphous).
- the electrolyte may comprise an alkali metal halogenide and/or an alkali metal halogenate, i.e. a salt of an alkali metal with a halogen or a conjugated base of a halogen acid wherein the halogen has an oxidation state of +5.
- halogen and/or halogen oxygen compounds may be comprised in the inventive electrolyte in a concentration of between ⁇ 0.05 g/L and ⁇ 5 g/L, preferably between ⁇ 0.1 g/L and ⁇ 2 g/L. While not being bound to this theory it is assumed that these compounds act as thermal stabilizers by which addition deposition of nickel on the heating elements or areas of local overheating is avoid.
- Example for alkali metal halogenides and/or an alkali metal halogenates are, e.g. potassium iodite, potassium iodate, sodium iodite, sodium iodate, potassium chloride, potassium chlorate, sodium bromide, lithium chloride, lithium iodate or lithium chlorate.
- the object of the invention is solved by a method for the electroless deposition of a metal layer on a substrate comprising the steps of contacting the substrate to be plated with an electrolyte comprising a metal ion source for the metal to be deposited, a reducing agent for reducing the metal ions, a complexing agent, an accelerator, and a stabilizer, characterized in that the electrolyte comprises as stabilizer a phosphaadamantane according to the general formula I wherein the hydrogen atoms on carbon atom 1 to 6 may independently from each other substituted by a moiety of the group consisting of F, Cl, Br, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and an alcohol group having 1 to 6 carbon atom.
- the substrate is contacted with the electrolyte at a temperature within the range of between ⁇ 20 °C and ⁇ 100 °C, preferably between ⁇ 25 °C and ⁇ 95 °C, e.g. between ⁇ 70 °C and ⁇ 91 °C.
- the substrate is contacted with the electrolyte for a time between ⁇ 1s and ⁇ 480 min, preferably between ⁇ 10s and ⁇ 240 min.
- the formulation of the invention contains ions of at least one metal of the group consisting of nickel, copper, cobalt, boron, silver, palladium and gold.
- salts of the metals are comprised in the electrolyte, e.g. metal chloride, metal sulfate, metal acetate, metal nitrate, metal propionate, metal formiate, metal oxalate, metal citrate, and metal ascorbinate of the respective metals.
- the metal ions are comprised in the electrolyte in a concentration between 0.01 mol/L and 0.5 mol/L, preferably between 0.02 mol/L and 0.2 mol/L.
- the electrolyte comprises at least one reducing agent of the group consisting of sodium hypophosphite, formaldehyde, dimethylaminoborane, aminoborane, or other organic boranes.
- the reducing agent may be comprised in the electrolyte in a concentration of between 0.08 mol/L and 0.5 mol/L, preferably, 0.1 mol/L and 0.3 mol/L.
- the electrolyte comprises a compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA, and amino acetic acid.
- the complexing agent is comprised in the electrolyte in a concentration of between 0.05 mol/L and 0.5 mol/L, preferably 0.2 mol/L and 0.4mol/L.
- the electrolyte comprises a compound of the group consisting of saccharin, hydantoin, rhodanine, or carbamide and its derivates.
- the accelerator is comprised in the electrolyte in a concentration of between 0.05 mmol/L and 0.1 mol/L, preferably, 5 mmol/L and 0.25 mol/L.
- the electrolyte comprises at least a phosphaadamantane according to the general formula I wherein the hydrogen atoms on carbon atom 1 to 6 may independently from each other substituted by a moiety of the group consisting of F, Cl, Br, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and an alcohol group having 1 to 6 carbon atom.
- Said phosphadamantne is comprised within a range of ⁇ 0.05 mg/L and ⁇ 100 mg/L, preferably between ⁇ 0.1 mg/L and ⁇ 25 mg/L, most preferably between ⁇ 0.5 mg/L and ⁇ 10 mg/L.
- the use of a phosphaadamantane according to general formula I as stabilizer results in a more even deposition having less nodules.
- the formulation of the invention contains ions of at least one metal of the group consisting of nickel, copper, cobalt, boron, silver, palladium and gold.
- salts of the metals are comprised in the electrolyte, e.g. metal chloride, metal sulfate, metal acetate, metal nitrate, metal propionate, metal formiate, metal oxalate, metal citrate, and metal ascorbinate of the respective metals.
- the metal ions are comprised in the electrolyte in a concentration between 0.01 mol/L and 2 mol/L, preferably between 0.02 mol/L and 0.5 mol/L.
- the electrolyte comprises at least one reducing agent of the group consisting of sodium hypophosphite, formaldehyde, dimethylaminoborane, aminoborane, or other organic boranes.
- the reducing agent may be comprised in the electrolyte in a concentration of between 0.08 mol/L and 0.5 mol/L, preferably, 0.1 mol/L and 0.3 mol/L.
- the electrolyte comprises a compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA, and amino acetic acid.
- the complexing agent is comprised in the electrolyte in a concentration of between 0.05 mol/L and 0.5 mol/L, preferably 0.2 mol/L and 0.4mol/L.
- the electrolyte comprises a compound of the group consisting of saccharin, hydantoin, rhodanine, or carbamide and its derivates.
- the accelerator is comprised in the electrolyte in a concentration of between 0.05 mmol/L and 0.1 mol/L, preferably, 5 mmol/L and 0.25 mol/L.
- the electrolyte comprises at least a phosphaadamantane according to the general formula I wherein the hydrogen atoms on carbon atom 1 to 6 may independently from each other substituted by a moiety of the group consisting of F, Cl, Br, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and an alcohol group having 1 to 6 carbon atom.
- Said phosphadamantne is comprised within a range of ⁇ 0.05 mg/L and ⁇ 100 mg/L, preferably between ⁇ 0.1 mg/L and ⁇ 25 mg/L, most preferably between ⁇ 0.5 mg/L and ⁇ 10 mg/L.
- the electrolyte comprises at least one ⁇ -amino acid having a pK a -value within a range of 4 to 8, preferably within a range of 5 to 7.
- the electrolyte comprises at least one ⁇ -amino acid of the group consisting of 3-amino propionic acid ( ⁇ -alanin), 3-aminobutyric acid, 3-amino-4-methyl valeric acid and 2-aminoethane-sulfonic acid (Taurin).
- the ⁇ -amino acid is comprised in this embodiment of the inventive electrolyte within a range of 1 mg/L to 2 g/l, preferably 100 mg/L to 1 g/l, and even more preferred 200 mg/L to 400 mg/L.
- the use of a combination of two stabilizers beneficially results in a further improvement of the deposition by reduction of nodules.
- the formulation of the invention contains ions of at least one metal of the group consisting of nickel, copper, cobalt, boron, silver, palladium and gold.
- salts of the metals are comprised in the electrolyte, e.g. metal chloride, metal sulfate, metal acetate, metal nitrate, metal propionate, metal formiate, metal oxalate, metal citrate, and metal ascorbinate of the respective metals.
- the metal ions are comprised in the electrolyte in a concentration between 0.01 mol/L and 0.5 mol/L, preferably between 0.02 mol/L and 0.2 mol/L.
- the electrolyte comprises at least one reducing agent of the group consisting of sodium hypophosphite, formaldehyde, dimethylaminoborane, aminoborane, or other organic boranes.
- the reducing agent may be comprised in the electrolyte in a concentration of between 0.08 mol/L and 0.5 mol/L, preferably, 0.1 mol/L and 0.3 mol/L.
- the electrolyte comprises a compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA, and amino acetic acid.
- the complexing agent is comprised in the electrolyte in a concentration of between 0.05 mol/L and 0.5 mol/L, preferably 0.2 mol/L and 0.4mol/L.
- the electrolyte comprises a compound of the group consisting of saccharin, hydantoin, rhodanine, or carbamide and its derivates.
- the accelerator is comprised in the electrolyte in a concentration of between 0.05 mmol/L and 0.1 mol/L, preferably, 5 mmol/L and 0.25 mol/L.
- the electrolyte comprises at least a phosphaadamantane according to the general formula I wherein the hydrogen atoms on carbon atom 1 to 6 may independently from each other substituted by a moiety of the group consisting of F, Cl, Br, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and an alcohol group having 1 to 6 carbon atom.
- Said phosphadamantne is comprised within a range of ⁇ 0.05 mg/L and ⁇ 100 mg/L, preferably between ⁇ 0.1 mg/L and ⁇ 25 mg/L, most preferably between ⁇ 0.5 mg/L and ⁇ 10 mg/L.
- the electrolyte comprises antimony as an inorganic stabilizer.
- Antimony is comprised in a concentration of between 0.05 mg/L and 0.5 g/l, preferably 0.5 mg/L and 0.1 g/l.
- the antimony is added as water soluble salt, preferably as chloride, sulfate, acetate, nitrate, propionate, formiate, oxalate, citrate, ascorbinate, or a mixture of these.
- the formulation of the invention contains ions of at least one metal of the group consisting of nickel, copper, cobalt, boron, silver, and gold.
- salts of the metals are comprised in the electrolyte, e.g. metal chloride, metal sulfate, metal acetate, metal nitrate, metal propionate, metal formiate, metal oxalate, metal citrate, and metal ascorbinate of the respective metals.
- the metal ions are comprised in the electrolyte in a concentration between 0.01 mol/L and 2 mol/L, preferably between 0.02 mol/L and 0.5 mol/L.
- the electrolyte comprises at least one reducing agent of the group consisting of sodium hypophosphite, formaldehyde, dimethylaminoborane, aminoborane, or other organic boranes.
- the reducing agent may be comprised in the electrolyte in a concentration of between 0.08 mol/L and 0.5 mol/L, preferably, 0.1 mol/L and 0.3 mol/L.
- the electrolyte comprises a compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA, and amino acetic acid.
- the complexing agent is comprised in the electrolyte in a concentration of between 0.05 mol/L and 0.5 mol/L, preferably 0.2 mol/L and 0.4mol/L.
- the electrolyte comprises a compound of the group consisting of saccharin, hydantoin, rhodanine, or carbamide and its derivates.
- the accelerator is comprised in the electrolyte in a concentration of between 0.05 mmol/L and 0.1 mol/L, preferably, 5 mmol/L and 0.25 mol/L.
- the electrolyte comprises at least a phosphaadamantane according to the general formula I wherein the hydrogen atoms on carbon atom 1 to 6 may independently from each other substituted by a moiety of the group consisting of F, Cl, Br, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and an alcohol group having 1 to 6 carbon atom.
- Said phosphadamantne is comprised within a range of ⁇ 0.05 mg/L and ⁇ 100 mg/L, preferably between ⁇ 0.1 mg/L and ⁇ 25 mg/L, most preferably between ⁇ 0.5 mg/L and ⁇ 10 mg/L.
- the electrolyte comprises at least one ⁇ -amino acid having a pK a -value within a range of 4 to 8, preferably within a range of 5 to 7.
- the electrolyte comprises at least one ⁇ -amino acid of the group consisting of 3-amino propionic acid ( ⁇ -alanin), 3-aminobutyric acid, 3-amino-4-methyl valeric acid and 2-aminoethane-sulfonic acid (Taurin).
- the ⁇ -amino acid is comprised in this embodiment of the inventive electrolyte within a range of 1 mg/L to 2 g/l, preferably 100 mg/L to 1 g/l, and even more preferred 200 mg/L to 400 mg/L.
- the electrolyte comprises antimony as an inorganic stabilizer.
- Antimony is comprised in a concentration of between 0.05 mg/L and 0.5 g/l, preferably 0.5 mg/L and 0.1 g/l.
- the antimony is added as water soluble salt, preferably as chloride, sulfate, acetate, nitrate, propionate, formiate, oxalate, citrate, ascorbinate, or a mixture of these.
- the formulation of the invention contains a carboxyl component.
- the electrolyte formulation may contain a monocarboxylic, dicarboxylic, or tricarboxylic organic acid.
- This component can comprise an aryl carboxylic acid, an aliphatic carboxylic acid, or a heterocyclic carboxylic acid.
- suitable aliphatic carboxylic acids are fatty acids, ⁇ -hydroxycarboxylic acids, including ⁇ -hydroxy dicarboxylic acids particularly C 1 to C 4 , ⁇ - ⁇ -unsaturated carboxylic acids, particularly C 1 to C 4 and especially acrylic.
- the electrolyte comprises:
- a substrate (steel sheet) was brought into contact with an electrolyte comprising:
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Description
- The present invention relates to the use of water soluble and air stable phosphaadamantanes as stabilizer in electrolytes for electroless metal deposition, an electrolyte as well as a method for the electroless deposition of metals, particularly layers of nickel, copper, cobalt, boron, silver, palladium or gold, as well as layers of alloys comprising at least one of the aforementioned metals as alloying metal.
- The present invention further relates to an organic stabilizer for electroless plating processes, and an electrolyte for the electroless deposition of a metal layer on a substrate, comprising a metal ion source for the metal to be deposited, a reducing agent, a complexing agent, a stabilizer and preferably an accelerator, as well as a method for the electroless deposition of a metal layer on a surface from an electrolyte according to the invention.
- Among electrolytic methods for the plating of substrates with metal layers, electroless plating methods have long been known from the state of the art. By electroless plating, also known as chemical plating, the coating of almost every metal and a huge number of non-conductive substrate surfaces is possible. The electroless deposited metal layers differ from the galvanically deposited metal layers, i.e. those layers deposited by the use of an external current, in physical as well as mechanical aspects. Often, metal alloy layers with non-metal elements, like for example cobalt/phosphor, nickel/phosphor, nickel/boron or boron carbide layers are deposited by means of electroless deposition methods. In this respect, electroless deposited layers in many cases differ also in their chemical nature from the galvanically deposited layers.
- One major advantage of the electroless deposited metal layer is the outline accuracy of the layer thickness of the deposited layer independent from the substrate geometry.
- Many times, electroless methods are also used for the coating of other non-conductive substrates, like for example plastic substrates, to render the surface of such substrates conductive and/or to change the appearance of the substrate in aesthetic respect. Furthermore, by the deposited layers, the material properties of the coated substrate can be improved or amended. Especially, the corrosion resistance or the hardness of the surface and/or the wear resistance of the substrate can be improved, e.g. for gas and/or oil industry applications.
- Electroless plating methods are based on an autocatalytic process, in which process the metal ions comprised in the electrolytes are reduced to the elemental metal by a reducing agent which is oxidized during this redox reaction.
- A reducing agent commonly used in the field of electroless deposition of metals on substrate surfaces is sodium hypophosphite. However, also other reducing agents are used in dependency of the metals to be deposited.
- In known electroplating baths it is necessary to use a stabilizer to avoid the uncontrolled plate-out (wild deposition) of the electrolyte, which means the unregulated wild deposition of metal on the substrate surface and tank walls. Hitherto, in the state of the art, heavy metals like lead, bismuth, zinc or tin are used as stabilizers. According to common environmental regulations [ROHS (Restriction of the use of certain hazardous substances), WEEE (Waste electrical and electronic equipment), ELV (End of lifetime of vehicles)] prior to the disposal of expended electrolytes and the co-deposition of heavy metals such heavy metals have to be withdrawn from the aqueous solution used as electrolyte in an adequate treatment step. Also when the heavy metals are comprised in the electrolyte only in small amounts, such a treatment causes additional expenses for the disposal. Therefore, the use of heavy metal in electrolytes for the deposition of metal layers has to be avoided. In some other types of electrolytes, like for example electrolytes for the electroless deposition of copper, cyanides are used as stabilizers. Like heavy metal ions, such cyanides are subject to environmental regulations. The same is true for selenium compounds which are also commonly used as stabilizers. In addition, some heavy metal stabilizers are difficult to analyze. Since analyzing of concentration of said heavy metal stabilizers is mandatory but difficult, bath control can be difficult, too.
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U.S. Pat. No. 6,146,702 discloses an electroless nickel cobalt phosphorus composition and plating process. The process is provided for enhancing the wear resistance of aluminium and other materials by depositing on the substrate a nickel, cobalt, phosphorus alloy coating using an electroless plating bath to provide a plated alloy having a cobalt content of at least about 20% by weight and a % Co / % P weight ratio of at least about 5. - European patent application
EP 1 413 646 A2 discloses, for example, an electrolyte for the electroless deposition of nickel layers having internal compressive stress. The electrolyte disclosed in this application comprises a metal salt of the metal to be deposited, a reducing agent, a complexing agent, an accelerator, and a stabilizer. Here, the accelerator is used to increase the deposition rate of the metal on the substrate surface. -
JP 2009-149965A -
JP 2005-290415A -
CN 101348927A discloses a cyanogen-free preplated copper solution. The solution adopts a nontoxic organic phosphine compound to replace cyanide as a complexing agent for the preplated copper, and is particularly suitable for preplated copper used to electroplate steel, aluminum, magnesium, zinc, titanium and titanium alloy. The cyanogen-free preplated copper solution has the following main technical characteristic that the solution consists of (a) one sort of copper sulphate, basic cupric carbonate or copper nitrate with the volume concentration of between 30 and 60 g/L; (b) one sort or two sorts of compounds selected from methylene diphosphonic acid, 1-hydroxyethylidene 1.1 diphosphonic acid and 1-hydroxybutyleneidene 1.1 diphosphonic acid with the volume concentration of between 120 and 160 g/L; (c) one sort or two sorts of compounds selected from methylamino dimethylene diphosphonic acid, hexamethylene diamine tetramethylene phosphonic acid and ethylenediamine tetramethylene phosphonic acid with the volume concentration of between 2 and 5 g/L;; (d) one sort of potassium citrate, amine citrate or seignette salt with the volume concentration of between 6 and 12 g/L, and (e) polyethyleneimine alkyl slat or aliphatic amine ethoxy sulfonated substance (AESS) with the volume concentration of between 0.02 and 0.05 g/L. The cyanogen-free preplated copper solution has the characteristics of stable service performance, simple solution compositions, convenient maintenance, high safety, environmental protection, reliable plating coat binding and the like. - Another way of achieving plating on plastics is for instance disclosed in
EP1138803A2 . This document disclose a process for metallizing of at least one insulating layer of an electronic or micromechanical element comprises applying at least one of the insulating layers to the substrate and activating by treating with an activator; applying the further insulating layer and structuring; and metallizing the first insulating layer. - Furthermore, there is an interest in the art of metal plating to avoid sulfur compounds which comprise sulfur in an oxidation state between -2 and +5, since these compounds are also subject to environmental regulations. However, by now such compounds are often needed in the electrolytes to gain good plating results. Especially for so called "high phos" electroless nickel electrolytes the use of sulfur compounds is critical, since such compounds may negatively affect the corrosion resistance of the plated nickel layer.
- It is therefore an object of the present invention to provide an improved formulation for electroless plating that is stabilized against uncontrolled plate-out of the metal to be deposited.
- It is a more particular object of various preferred embodiments of the pending application to provide an electrolyte for the electroless deposition which is free of heavy metal stabilizers, cyanides, selenium compounds, and/or sulfur compounds comprising sulfur in an oxidation state between -2 and +5.
- This object is solved by an aqueous electrolyte for the electroless deposition of a metal layer on a substrate, comprising a metal ion source for the metal to be deposited, a reducing agent, a complexing agent for reducing the metal ions, an accelerator, and a stabilizer, characterized in that the electrolyte comprises as stabilizer a phosphaadamantane according to the general formula I
- It is a further object of the present invention to provide an improved stabilizer for electroless plating processes, and a new electrolyte as well as a method for the electroless deposition of a metal layer having improved properties.
- Surprisingly, it was found that phosphaadamantanes according to the general formula I are capable to replace heavy metal stabilizers, cyanides, selenium compounds as well as sulfur compounds comprising sulfur in an oxidation state between -2 and +5 in electrolytes for the electroless deposition of metal layers, totally.
- While not being bound to this theory, the applicant believes that the phosphaadamantanes according to general formula I due to their indirectly tertiary amino groups as well as their tertiary phosphorus group are capable to at least temporarily jam the active centers on the substrate surface which are responsible for the uncontrolled deposition. So the wild deposition of the metals can be avoided. Additionally, also the foreign ions comprised in the electrolyte which are responsible for the wild deposition, too, are inactivated by the used such phosphaadamantanes.
- A further benefit of the inventive electrolyte is that an effect known as edge weakness can be avoided. When using electrolytes for the electroless deposition of metal layers which comprise heavy metal ions as stabilizers at high convection of the electrolyte a decreased deposition of metal at the edges of the substrate occurs. This is deemed to be related to an increased assembly of the heavy metal ions used as stabilizers in these areas. This effect deteriorates the outline accuracy of the plating. Surprisingly, by the use of phosphaadamantanes according to general formula I as stabilizers in electroless plating methods this edge weakening effect can be avoided which significantly increases the overall outline accuracy of the plating especially when plating large substrates.
- Furthermore, the use of a phosphaadamantane according to general formula I as stabilizer results in a more even deposition having less nodules.
- Especially on alumina or zincate substrates the use of phosphaadamantanes according to general formula I as stabilizers result in an improved deposition and a significant reduction of discard.
- A further benefit of the inventive electrolyte is that a significant reduction of deposition on components of the plating equipment, especially on the heating systems used in the plating equipment, occurs. By this the need for maintenance is significantly reduced which in turn results in a notable economic benefit to the plating shops due to less down time.
- An electrolytic bath, with a single class of metal, containing the stabilizer of the present invention leads to deposited metal layers, having properties like an amorphous metal. These properties are, for example, that these layers have no edge weakness effect; they are very passive; have a good resistance against corrosion; wear-resistance; and good compressive stress properties.
- Further benefits of the stabilizer according to the present invention are, that it is metal free; provides a deposit having significantly better corrosion resistance including excellent resistance vs. nitric acid; is environmental friendly (non-toxic additive); has a higher phosphorus concentration at given pH level; and lower plating temperatures can be used to achieve the same plating speed and phosphorus content.
- Surprisingly, it was found that by the use of phosphaadamantanes according to the general formula I plating electrolytes for the electroless deposition become less sensitive to foreign metal carry-over, like e.g. palladium ions resulting from the activation pretreatment of the substrate to be plated. This is especially relevant when non-conductive substrates, like e.g. plastics, are intended to be plated by direct plating processes using noble metal colloids for seeding the surfaces. While the known plating electrolytes turned out to be quit sensitive to foreign metals and therefore required intensive rinse steps after the activation, the inventive plating electrolytes does not show any significant deterioration even at Pd-concentrations » 2mg/L.
- In particular, phosphaadamantanes according to general formula I having no hydrogene substituted are found to be very effective as stabilizers in electroless plating electrolytes. Hence, 1,3,5-Triaza-7-phosphatricyclo[3.3.1.1]decane (PTA) is a preferred embodiment of the phosphaadamantanes according to general formula I. Beneficially, PTA has a sufficiently high solubility in aqueous systems and has a high oxidations stability.
- The phosphaadamantanes according to general formula I can be comprised in the inventive electrolyte within a range of ≥0.05 mg/L and ≤ 100 mg/L, preferably between ≥0.1 mg/L and ≤ 25 mg/L, most preferably between ≥0.5 mg/L and ≤ 10 mg/L.
- According to an embodiment of the invention as reducing agent in the inventive electrolyte at least one reducing agent of the group consisting of sodium hypophosphite, formaldehyde, dimethylaminoborane, aminoborane, or other organic boranes can be comprised. The reducing agent may be comprised in the electrolyte in a concentration of between 0.08 mol/L and 0.5 mol/L, preferably, 0.1 mol/L and 0.3 mol/L. Preferably, the electrolyte may comprises e,g, sodium hypophosphite (mono hydrate) with a concentration of 10 to 40 g/l, and even more preferably with a concentration of 12 to 30 g/l.
- As a metal ion source in the inventive electrolyte, advantageously a metal compound of the group consisting metal chloride, metal sulfate, metal acetate, metal nitrate, metal propionate, metal formiate, metal oxalate, metal citrate, and metal ascorbinate can be used, i.e., the source of cations of the metal to be deposited may comprise the counter anion of any of such salts. Here, especially, the metal compounds having volatile ions, like for example metal acetate, metal nitrate, metal propionate, and metal formiate are preferred since the volatile character of the anion those anions leak out from the electrolyte in gaseous form which enables to reduce the amount of anions in the electrolyte. This enables to extend the lifetime of the electrolyte significantly, which under normal conditions is only limited. For example, by the use of volatile anions also at a metal turnover rate of 22 metal layers having internal compressive stress can be deposited. Volatile ions in the sense of this invention are ions which form together with according counter ion moieties which are volatile at the temperature the electrolyte is commonly used at. An example for such volatile ions is acetate which forms under the plating conditions acetic acid. Since acetic acid has a vapor pressure of 16hPa at 20 °C it will evaporate from the electrolyte under the plating conditions and can be recovered from the exhaust air system.
- According to an embodiment of the invention as a complexing agent the inventive electrolyte comprises a compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA, and amino acetic acid. The complexing agent may be comprised in the electrolyte in a concentration of between 0.05 mol/L and 0.5 mol/L, preferably 0.2 mol/L and 0.4 mol/L.
- The inventive electrolyte comprises an accelerator, which may preferably comprise a compound of the group consisting of saccharin, hydantoin, rhodanine, or carbamide and its derivates. The accelerator may be comprised in the electrolyte in a concentration of between 0.05 mmol/L and 0.1 mol/L, preferably 0.005 mol/L and 0.025mol/L.
- As metal to be deposited the inventive electrolyte may comprise a metal of the group consisting of nickel, copper, cobalt, boron, silver, palladium and gold. By an appropriate choice of the metal to be deposited also alloys like for example nickel/cobalt-alloys, nickel/phosphor-alloys, cobalt/phosphor-alloys nickel/boron or the like can be deposited. Also, the deposition of nickel/PTFE-layers or nickel/boron carbide/graphite-layers from dispersion bathes is possible by the inventive electrolyte.
- The inventive electrolyte can have a pH-value within a range of between pH 4 and pH 7, preferably within pH 4 and pH 6. Hence, it is preferred that the inventive electrolyte is slightly acidic. To control the pH-value of the electrolyte it may comprise pH adjusting compounds, like e.g. acids, bases, and/or buffers.
- With respect to the acids organic and inorganic acids may be comprised in the electrolyte, e.g. sulfuric acid, acetic acid, lactic acid, citric acid, hypophosphorus acid, sulfonic acids or combinations of these.
- With respect to the bases, e.g. sodium carbonate, ammonium hydroxide, sodium hydroxide, potassium hydroxide, lithium hydroxide, or combination of these may be comprised in the electrolyte.
- With respect to the buffer the electrolyte may comprise e.g. an acetic acid/ acetate buffer, or a citric acid / citrate buffer.
- According to another embodiment of the invention the electrolyte may comprise as an additional stabilizer a β-amino acid.
- Preferably, β-amino acids having a pKa-value within a range of 4 to 8, preferably within a range of 5 to 7 seems to be suitable in this respect. In particular, 3-amino propionic acid (β-alanin), 3-aminobutyric acid, 3-amino-4-methyl valeric acid and 2-aminoethane-sulfonic acid (Taurin) are usable as additional stabilizers.
- The β-amino acid may be comprised in the inventive electrolyte within a range of 1 mg/L to 5 g/L, preferably 100 mg/L to 2 g/L, and even more preferred 200 mg/L to 1.5 g/L.
- The formulation of the invention may comprises an organic stabilizer for electroless plating processes comprising an organic molecule which is the condensation product (adduct) of at least one β.-amino acid and at least one carboxyl component which may be introduced into the aqueous medium as, e.g., the free carboxylic acid or a salt thereof.
- The condensation product of the β-amino acid (e.g. β-alanine) and a carboxylic functional group as derived for the carboxylic acid or its salt, is a β-amide. The condensation product is present in a monomeric, oligomeric and/or polymeric form, i.e., as the N-terminal amide of a β-amino acid monomer, dimer, trimer, oligopeptide and polypeptide.
- The condensation product of the β-amino acid may be comprised in the inventive electrolyte within a range of 1 mg/L to 5 g/L, preferably 100 mg/L to 2 g/L, and even more preferred 200 mg/L to 1.5 g/L.
- The addition of a pre mixture of a β-amino acid, like e.g. β.-alanine, with a carboxylic acid, like e.g. lactic acid, glycine, or malic acid increases the stabilizing effect and can those beneficially be used as a second stabilizer in sense of the invention. It has been discovered that the carboxylic acid reacts with β-amino acids to form amide structures which is deemed to be the reason for the enhanced stabilizing effect.
- In this concern, in preferred embodiments of the invention the carboxylic acid may be a compound of the group consisting of acrylic acids, aromatic carboxylic acids, fatty acids, aliphatic carboxylic acids, keto acids, dicarboxylic acids, tricarboxylic acids, straight chain carboxylic acids, heterocyclic carboxylic acids, saturated carboxylic acids, unsaturated carboxylic acids, and .alpha.-hydroxy acids. It is also possible to use other organic compounds having a carboxylic functional group. In particular, the salts of carboxylic acids (carboxylate anion -RCO2 -) can be used.
- The electrolyte according to this invention may additionally comprise an inorganic stabilizer, preferably antimony. Such an inorganic stabilizer may be comprised in a concentration of between 0.05 mg/L and 0.5 g/L, preferably 0.5 mg/L and 0.1 g/L.
- Yet in another embodiment of the invention the electrolyte may comprise three different stabilizers, one being a phosphine according to the general formula I, like e.g. PTA, a second one being a β-amino acid, and a third one being an inorganic stabilizer, like e.g. antimony.
- By the use of the inventive electrolyte a metal layer on a surface of a substrate is deposited, wherein the phosphorous content of the metal layer is 2-6%, 6-10% or >10.5%. The amount of phosphorous has a considerable effect on the properties of the metal layer. A high phosphorous content of the metal layer leads to improved properties, for example improved corrosion resistance and a lower phosphorous content for example improved hardness of the metal layer.
- A further property of a metal layer according to the present invention is that it is very passive.
- A further advantage of the metal layers according to the present invention is the good residual compressive stress.
- Using a stabilizer according to the present invention, it is possible to yield metal layers having various phosphorus content: low phosphorus, 3-5% (crystalline); middle phosphorus, 5-7 (9) % (partially crystalline); high phosphorus, >10% (amorphous).
- According to another embodiment of the invention the electrolyte may comprise an alkali metal halogenide and/or an alkali metal halogenate, i.e. a salt of an alkali metal with a halogen or a conjugated base of a halogen acid wherein the halogen has an oxidation state of +5. Such halogen and/or halogen oxygen compounds may be comprised in the inventive electrolyte in a concentration of between ≥ 0.05 g/L and ≤ 5 g/L, preferably between ≥ 0.1 g/L and ≤ 2 g/L. While not being bound to this theory it is assumed that these compounds act as thermal stabilizers by which addition deposition of nickel on the heating elements or areas of local overheating is avoid. Example for alkali metal halogenides and/or an alkali metal halogenates are, e.g. potassium iodite, potassium iodate, sodium iodite, sodium iodate, potassium chloride, potassium chlorate, sodium bromide, lithium chloride, lithium iodate or lithium chlorate.
- With respect to the method the object of the invention is solved by a method for the electroless deposition of a metal layer on a substrate comprising the steps of contacting the substrate to be plated with an electrolyte comprising a metal ion source for the metal to be deposited, a reducing agent for reducing the metal ions, a complexing agent, an accelerator, and a stabilizer, characterized in that the electrolyte comprises as stabilizer a phosphaadamantane according to the general formula I
- According to an embodiment of the inventive method, the substrate is contacted with the electrolyte at a temperature within the range of between ≥20 °C and ≤ 100 °C, preferably between ≥25 °C and ≤ 95 °C, e.g. between ≥70 °C and ≤ 91 °C.
- According to another embodiment of the inventive method, the substrate is contacted with the electrolyte for a time between ≥ 1s and ≤ 480 min, preferably between ≥ 10s and ≤ 240 min.
- The inventive electrolyte as well as the inventive method for the electroless deposition of metal layers on substrates are explained in terms of examples in the following, while the electrolyte as well as the method cannot be restricted to these embodiments only.
- In preferred embodiments, the formulation of the invention contains ions of at least one metal of the group consisting of nickel, copper, cobalt, boron, silver, palladium and gold. As source for these metal ions salts of the metals are comprised in the electrolyte, e.g. metal chloride, metal sulfate, metal acetate, metal nitrate, metal propionate, metal formiate, metal oxalate, metal citrate, and metal ascorbinate of the respective metals. The metal ions are comprised in the electrolyte in a concentration between 0.01 mol/L and 0.5 mol/L, preferably between 0.02 mol/L and 0.2 mol/L. As reducing agent the electrolyte comprises at least one reducing agent of the group consisting of sodium hypophosphite, formaldehyde, dimethylaminoborane, aminoborane, or other organic boranes. The reducing agent may be comprised in the electrolyte in a concentration of between 0.08 mol/L and 0.5 mol/L, preferably, 0.1 mol/L and 0.3 mol/L. As a complexing agent the electrolyte comprises a compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA, and amino acetic acid. The complexing agent is comprised in the electrolyte in a concentration of between 0.05 mol/L and 0.5 mol/L, preferably 0.2 mol/L and 0.4mol/L. As an accelerator the electrolyte comprises a compound of the group consisting of saccharin, hydantoin, rhodanine, or carbamide and its derivates. The accelerator is comprised in the electrolyte in a concentration of between 0.05 mmol/L and 0.1 mol/L, preferably, 5 mmol/L and 0.25 mol/L. As stabilizer the electrolyte comprises at least a phosphaadamantane according to the general formula I
- According to another embodiment of the invention, the formulation of the invention contains ions of at least one metal of the group consisting of nickel, copper, cobalt, boron, silver, palladium and gold. As source for these metal ions salts of the metals are comprised in the electrolyte, e.g. metal chloride, metal sulfate, metal acetate, metal nitrate, metal propionate, metal formiate, metal oxalate, metal citrate, and metal ascorbinate of the respective metals. The metal ions are comprised in the electrolyte in a concentration between 0.01 mol/L and 2 mol/L, preferably between 0.02 mol/L and 0.5 mol/L. As reducing agent the electrolyte comprises at least one reducing agent of the group consisting of sodium hypophosphite, formaldehyde, dimethylaminoborane, aminoborane, or other organic boranes. The reducing agent may be comprised in the electrolyte in a concentration of between 0.08 mol/L and 0.5 mol/L, preferably, 0.1 mol/L and 0.3 mol/L. As a complexing agent the electrolyte comprises a compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA, and amino acetic acid. The complexing agent is comprised in the electrolyte in a concentration of between 0.05 mol/L and 0.5 mol/L, preferably 0.2 mol/L and 0.4mol/L. As an accelerator the electrolyte comprises a compound of the group consisting of saccharin, hydantoin, rhodanine, or carbamide and its derivates. The accelerator is comprised in the electrolyte in a concentration of between 0.05 mmol/L and 0.1 mol/L, preferably, 5 mmol/L and 0.25 mol/L. As stabilizer the electrolyte comprises at least a phosphaadamantane according to the general formula I
- In another preferred embodiment of the invention the formulation of the invention contains ions of at least one metal of the group consisting of nickel, copper, cobalt, boron, silver, palladium and gold. As source for these metal ions salts of the metals are comprised in the electrolyte, e.g. metal chloride, metal sulfate, metal acetate, metal nitrate, metal propionate, metal formiate, metal oxalate, metal citrate, and metal ascorbinate of the respective metals. The metal ions are comprised in the electrolyte in a concentration between 0.01 mol/L and 0.5 mol/L, preferably between 0.02 mol/L and 0.2 mol/L. As reducing agent the electrolyte comprises at least one reducing agent of the group consisting of sodium hypophosphite, formaldehyde, dimethylaminoborane, aminoborane, or other organic boranes. The reducing agent may be comprised in the electrolyte in a concentration of between 0.08 mol/L and 0.5 mol/L, preferably, 0.1 mol/L and 0.3 mol/L. As a complexing agent the electrolyte comprises a compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA, and amino acetic acid. The complexing agent is comprised in the electrolyte in a concentration of between 0.05 mol/L and 0.5 mol/L, preferably 0.2 mol/L and 0.4mol/L. As an accelerator the electrolyte comprises a compound of the group consisting of saccharin, hydantoin, rhodanine, or carbamide and its derivates. The accelerator is comprised in the electrolyte in a concentration of between 0.05 mmol/L and 0.1 mol/L, preferably, 5 mmol/L and 0.25 mol/L. As stabilizer the electrolyte comprises at least a phosphaadamantane according to the general formula I
- In a preferred embodiment of the invention, the formulation of the invention contains ions of at least one metal of the group consisting of nickel, copper, cobalt, boron, silver, and gold. As source for these metal ions salts of the metals are comprised in the electrolyte, e.g. metal chloride, metal sulfate, metal acetate, metal nitrate, metal propionate, metal formiate, metal oxalate, metal citrate, and metal ascorbinate of the respective metals. The metal ions are comprised in the electrolyte in a concentration between 0.01 mol/L and 2 mol/L, preferably between 0.02 mol/L and 0.5 mol/L. As reducing agent the electrolyte comprises at least one reducing agent of the group consisting of sodium hypophosphite, formaldehyde, dimethylaminoborane, aminoborane, or other organic boranes. The reducing agent may be comprised in the electrolyte in a concentration of between 0.08 mol/L and 0.5 mol/L, preferably, 0.1 mol/L and 0.3 mol/L. As a complexing agent the electrolyte comprises a compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA, and amino acetic acid. The complexing agent is comprised in the electrolyte in a concentration of between 0.05 mol/L and 0.5 mol/L, preferably 0.2 mol/L and 0.4mol/L. As an accelerator the electrolyte comprises a compound of the group consisting of saccharin, hydantoin, rhodanine, or carbamide and its derivates. The accelerator is comprised in the electrolyte in a concentration of between 0.05 mmol/L and 0.1 mol/L, preferably, 5 mmol/L and 0.25 mol/L. As stabilizer the electrolyte comprises at least a phosphaadamantane according to the general formula I
- In preferred embodiments, the formulation of the invention contains a carboxyl component. For example, the electrolyte formulation may contain a monocarboxylic, dicarboxylic, or tricarboxylic organic acid. This component can comprise an aryl carboxylic acid, an aliphatic carboxylic acid, or a heterocyclic carboxylic acid. Among the suitable aliphatic carboxylic acids are fatty acids, α-hydroxycarboxylic acids, including α-hydroxy dicarboxylic acids particularly C1 to C4, α-β-unsaturated carboxylic acids, particularly C1 to C4 and especially acrylic.
- The electrolyte comprises:
- 13.03 g/l nickel sulfate;
- 1.925 mg/L potassium iodide
- 17.27 g/l lactic acid;
- 5.94 g/l malic acid;
- 40.2 g/l sodium hypophosphite;
- 9.81 g/l sodium hydroxide; and
- 1.00 mg/L PTA
- At a temperature between 80 °C and 94 °C a substrate (steel sheet) was brought into contact with an electrolyte comprising:
- 8.8 g/l nickel acetate tertahydrat;
- 0.2 g/L potassium iodide
- 30 g/L lactic acid;
- 2.5 g/L saccharine, sodium salt
- 16 g/l sodium hydroxide solution, 33 % by weight;
- 30 g/L sodium acetat
- 35 g/L sodium hypophosphite dihydrate
- 2.0 mg/l PTA
- In another preferred embodiment of the invention the electrolyte according to the present invention comprises:
- 8.8 g/L nickel acetate tertahydrat;
- 0.2 g/L potassium iodide
- 30 g/L lactic acid;
- 2.5 g/L saccharine, sodium salt
- 16 g/L sodium hydroxide solution, 33 % by weight;
- 35 g/L sodium hypophosphite dihydrate
- 0.5 mg/L PTA
- 15 mg/L potassium antimony tartrate
- In another preferred embodiment of the invention the electrolyte according to the present invention comprises:
- 8.8 g/L nickel sulfate;
- 0.1 mg/L potassium iodate
- 25g/L lactic acid;
- 1.0 g/L saccharine
- 2 g/L β-alanin
- 15.5 g/l sodium hydroxide solution, 33 % by weight;
- 20 g/L sodium acetat
- 35 g/L sodium hypophosphite dihydrate
- 0.5 mg/l PTA
- 18 mg/L potassium antimony tartrate
Claims (14)
- An aqueous electrolyte composition for the electroless deposition of a metal layer on a substrate, comprising a metal ion source for the metal to be deposited, a reducing agent for reducing the metal ions, a complexing agent, an accelerator, and a stabilizer, characterized in that the electrolyte comprises as stabilizer a phosphaadamantane according to the general formula I
- The aqueous electrolyte composition according to claim 1, wherein the electrolyte comprises the phosphaadamantane at a concentration between ≥0.05 mg/L and ≤ 100 mg/L, preferably between ≥0.1 mg/L and ≤ 25 mg/L, most preferably between ≥0.5 mg/L and ≤ 10 mg/L.
- The aqueous electrolyte composition according to any of the preceding claims, wherein the metal to be deposited is at least one metal selected from the group consisting of nickel, copper, cobalt, boron, silver, and gold.
- The aqueous electrolyte composition according to any of the preceding claims, wherein an accelerator is at least one accelerator of the group consisting of saccharine, hydantoin, rhodanine, carbamide and carbamide derivates.
- The aqueous electrolyte composition according to any of the preceding claims, wherein the electrolyte is free of inorganic stabilizers, specifically free of lead, bismuth, zinc and/or tin.
- The aqueous electrolyte composition according to any of the preceding claims, wherein the composition is free of cyanides, selenium compounds and sulfur compounds comprising sulfur in an oxidation state between -2 and +5.
- The aqueous electrolyte composition according to any of the preceding claims, further comprising at least one additional carboxylic acid and/or at least one salt of a carboxylic acid
- The aqueous electrolyte composition according to claim 7 wherein the carboxylic acid is a compound of the group consisting of acrylic acids, aromatic carboxylic acids, fatty acids, aliphatic carboxylic acids, keto acids, dicarboxylic acids, tricarboxylic acids, straight chained carboxylic acids, heterocyclic carboxylic acids, saturated carboxylic acids, unsaturated carboxylic acids, and α-hydroxy acids.
- The aqueous electrolyte composition according to any of the preceding claims, wherein the pH-value of the composition is in the range of between pH 4 and pH 7.
- The aqueous electrolyte composition according to any of the preceding claims, wherein the reducing agent is at least one compound of the group consisting of sodium hypophosphite, formaldehyde, dimethyl aminoborane, amino borane, and other organic boranes.
- The aqueous electrolyte composition according to any of the preceding claims, wherein the complexing agent is at least one compound of the group consisting of 2-hydroxy propionic acid, propanedioic acid (malonic acid), EDTA and amino acetic acid.
- A method for the electroless deposition of a metal layer on a substrate comprising the steps of contacting the substrate to be plated with an electrolyte comprising a metal ion source for the metal to be deposited, a reducing agent for reducing the metal ions, a complexing agent, an accelerator, and a stabilizer, characterized in that the electrolyte comprises as stabilizer a phosphaadamantane according to the general formula I
- The method according to claim 12, wherein the substrate is contacted with the electrolyte at a temperature within the range of between ≥20 °C and ≤ 85 °C, preferably between ≥25 °C and ≤ 70 °C.
- The method according to any of the claims 12 and 13, wherein the substrate is contacted with the electrolyte for a time between ≥ 1s and ≤ 180 min, preferably between ≥ 10s and ≤ 60 min.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES15189465T ES2712858T3 (en) | 2015-10-13 | 2015-10-13 | Use of water-soluble and air-stable phospha-adamantanes as stabilizers in electrolytes for non-electrolytic deposition of metal |
EP15189465.6A EP3156517B1 (en) | 2015-10-13 | 2015-10-13 | Use of water soluble and air stable phosphaadamantanes as stabilizer in electrolytes for electroless metal deposition |
KR1020187013527A KR20180089398A (en) | 2015-10-13 | 2016-10-06 | The water-soluble and air-stable phosphaadamantane as a stabilizer for electroless metal plating |
US15/765,637 US20190085461A1 (en) | 2015-10-13 | 2016-10-06 | Water soluble and air stable phosphaadamantanes as stabilizers for electroless metal deposition |
PCT/US2016/055655 WO2017066069A1 (en) | 2015-10-13 | 2016-10-06 | Water soluble and air stable phosphaadamantanes as stabilizers for electroless metal deposition |
CN201680059667.6A CN108495952A (en) | 2015-10-13 | 2016-10-06 | As the water solubility of electroless metal deposition stabilizer and the phospha-adamantane of air-stable |
TW105132884A TW201718938A (en) | 2015-10-13 | 2016-10-12 | Use of water soluble and air stable phosphaadamantanes as stabilizers in electrolytes for electroless metal deposition |
Applications Claiming Priority (1)
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EP15189465.6A EP3156517B1 (en) | 2015-10-13 | 2015-10-13 | Use of water soluble and air stable phosphaadamantanes as stabilizer in electrolytes for electroless metal deposition |
Publications (3)
Publication Number | Publication Date |
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EP3156517A1 EP3156517A1 (en) | 2017-04-19 |
EP3156517A8 EP3156517A8 (en) | 2017-06-07 |
EP3156517B1 true EP3156517B1 (en) | 2018-12-05 |
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Country Status (7)
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US (1) | US20190085461A1 (en) |
EP (1) | EP3156517B1 (en) |
KR (1) | KR20180089398A (en) |
CN (1) | CN108495952A (en) |
ES (1) | ES2712858T3 (en) |
TW (1) | TW201718938A (en) |
WO (1) | WO2017066069A1 (en) |
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TWI646215B (en) * | 2017-11-03 | 2019-01-01 | 陳始明 | Electroless metal plating appratus and method thereof |
CN109457238B (en) * | 2018-08-30 | 2021-01-15 | 上海昕沐化学科技有限公司 | High-speed stable chemical copper plating solution and preparation method thereof |
JP7228411B2 (en) * | 2019-03-06 | 2023-02-24 | 上村工業株式会社 | Electroless gold plating bath |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
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EP0769572A1 (en) | 1995-06-06 | 1997-04-23 | ENTHONE-OMI, Inc. | Electroless nickel cobalt phosphorous composition and plating process |
JP3816241B2 (en) * | 1998-07-14 | 2006-08-30 | 株式会社大和化成研究所 | Aqueous solution for reducing and precipitating metals |
DE10015214C1 (en) * | 2000-03-27 | 2002-03-21 | Infineon Technologies Ag | Process for metallizing an insulator and / or a dielectric |
DE10246453A1 (en) | 2002-10-04 | 2004-04-15 | Enthone Inc., West Haven | Electrolyte used in process for high speed electroless plating with nickel film having residual compressive stress is based on nickel acetate and also contains reducing agent, chelant, accelerator and stabilizer |
JP2005290415A (en) | 2004-03-31 | 2005-10-20 | Okuno Chem Ind Co Ltd | Electroless copper-plating solution |
JP5247142B2 (en) | 2007-12-19 | 2013-07-24 | 株式会社大和化成研究所 | Silver plating method |
CN101348927B (en) | 2008-09-05 | 2010-10-06 | 江南机器(集团)有限公司 | Non-cyanide copper plating solution |
GB2467163B (en) * | 2009-01-26 | 2013-11-06 | Rhodia Operations | Ligands |
ES2714824T3 (en) * | 2009-07-03 | 2019-05-30 | Macdermid Enthone Inc | Electrolyte comprising beta-amino acids and method for the deposition of a metal layer |
-
2015
- 2015-10-13 EP EP15189465.6A patent/EP3156517B1/en active Active
- 2015-10-13 ES ES15189465T patent/ES2712858T3/en active Active
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- 2016-10-06 CN CN201680059667.6A patent/CN108495952A/en active Pending
- 2016-10-06 KR KR1020187013527A patent/KR20180089398A/en not_active Application Discontinuation
- 2016-10-06 US US15/765,637 patent/US20190085461A1/en not_active Abandoned
- 2016-10-06 WO PCT/US2016/055655 patent/WO2017066069A1/en active Application Filing
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TW201718938A (en) | 2017-06-01 |
ES2712858T3 (en) | 2019-05-16 |
EP3156517A1 (en) | 2017-04-19 |
KR20180089398A (en) | 2018-08-08 |
US20190085461A1 (en) | 2019-03-21 |
EP3156517A8 (en) | 2017-06-07 |
WO2017066069A1 (en) | 2017-04-20 |
WO2017066069A8 (en) | 2018-07-19 |
CN108495952A (en) | 2018-09-04 |
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