EP3098334A1 - Electrolytic process for coating metal surfaces to provide high wear resistance - Google Patents
Electrolytic process for coating metal surfaces to provide high wear resistance Download PDFInfo
- Publication number
- EP3098334A1 EP3098334A1 EP16171777.2A EP16171777A EP3098334A1 EP 3098334 A1 EP3098334 A1 EP 3098334A1 EP 16171777 A EP16171777 A EP 16171777A EP 3098334 A1 EP3098334 A1 EP 3098334A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- process according
- surfactant
- electrolytic bath
- boron carbide
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 49
- 230000008569 process Effects 0.000 title claims abstract description 49
- 238000000576 coating method Methods 0.000 title claims abstract description 31
- 239000011248 coating agent Substances 0.000 title claims abstract description 29
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 21
- 239000002184 metal Substances 0.000 title claims abstract description 21
- 229910052580 B4C Inorganic materials 0.000 claims abstract description 40
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims abstract description 40
- 239000002245 particle Substances 0.000 claims abstract description 35
- 239000011247 coating layer Substances 0.000 claims abstract description 23
- 238000004070 electrodeposition Methods 0.000 claims abstract description 23
- 239000007864 aqueous solution Substances 0.000 claims abstract description 21
- 150000003839 salts Chemical class 0.000 claims abstract description 20
- 239000011574 phosphorus Substances 0.000 claims abstract description 16
- 239000004094 surface-active agent Substances 0.000 claims abstract description 14
- 239000000725 suspension Substances 0.000 claims abstract description 13
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 claims abstract description 8
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 claims abstract description 7
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical class [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 6
- 150000003018 phosphorus compounds Chemical class 0.000 claims abstract description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 34
- 239000002736 nonionic surfactant Substances 0.000 claims description 13
- 229910052698 phosphorus Inorganic materials 0.000 claims description 13
- -1 polyoxyethylene Polymers 0.000 claims description 9
- 239000002280 amphoteric surfactant Substances 0.000 claims description 8
- 238000004064 recycling Methods 0.000 claims description 8
- 150000001450 anions Chemical class 0.000 claims description 6
- 125000002091 cationic group Chemical group 0.000 claims description 6
- 239000003093 cationic surfactant Substances 0.000 claims description 5
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 3
- 229940006460 bromide ion Drugs 0.000 claims description 3
- 238000009826 distribution Methods 0.000 claims description 3
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical group [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 claims description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 2
- 229910006147 SO3NH2 Inorganic materials 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims description 2
- 125000006353 oxyethylene group Chemical group 0.000 claims description 2
- 150000005621 tetraalkylammonium salts Chemical class 0.000 claims description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims 3
- 229960003237 betaine Drugs 0.000 claims 2
- 229920001451 polypropylene glycol Polymers 0.000 claims 1
- 229910001096 P alloy Inorganic materials 0.000 abstract description 14
- 229910000990 Ni alloy Inorganic materials 0.000 abstract description 9
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract description 8
- 239000011159 matrix material Substances 0.000 abstract description 5
- 238000000151 deposition Methods 0.000 description 21
- 230000008021 deposition Effects 0.000 description 20
- 239000010410 layer Substances 0.000 description 14
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 12
- 230000007797 corrosion Effects 0.000 description 9
- 238000005260 corrosion Methods 0.000 description 9
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 7
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 239000004310 lactic acid Substances 0.000 description 6
- 235000014655 lactic acid Nutrition 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 5
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 5
- 229940081974 saccharin Drugs 0.000 description 5
- 235000019204 saccharin Nutrition 0.000 description 5
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 239000008139 complexing agent Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 2
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 238000004049 embossing Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 2
- AIYYMMQIMJOTBM-UHFFFAOYSA-L nickel(ii) acetate Chemical compound [Ni+2].CC([O-])=O.CC([O-])=O AIYYMMQIMJOTBM-UHFFFAOYSA-L 0.000 description 2
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000001632 sodium acetate Substances 0.000 description 2
- 235000017281 sodium acetate Nutrition 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- DMKKMGYBLFUGTO-UHFFFAOYSA-N 2-methyloxirane;oxirane Chemical compound C1CO1.C1CO1.CC1CO1 DMKKMGYBLFUGTO-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000006295 amino methylene group Chemical group [H]N(*)C([H])([H])* 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- XCZQFKOJEOJRRO-UHFFFAOYSA-N azane;sulfurocyanidic acid Chemical compound [NH4+].[O-]S(=O)(=O)C#N XCZQFKOJEOJRRO-UHFFFAOYSA-N 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- GNVMUORYQLCPJZ-UHFFFAOYSA-N carbamothioic s-acid Chemical compound NC(S)=O GNVMUORYQLCPJZ-UHFFFAOYSA-N 0.000 description 1
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229930182478 glucoside Natural products 0.000 description 1
- 150000008131 glucosides Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 231100000086 high toxicity Toxicity 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 150000003017 phosphorus Chemical class 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- KSEORDDPLGPXCR-UHFFFAOYSA-N potassium;sulfurocyanidic acid Chemical compound [K].OS(=O)(=O)C#N KSEORDDPLGPXCR-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/02—Maintaining the aggregation state of the mixed materials
- B01F23/023—Preventing sedimentation, conglomeration or agglomeration of solid ingredients during or after mixing by maintaining mixed ingredients in movement
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/10—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/619—Amorphous layers
Definitions
- the present invention relates to an electrolytic process for coating metal surfaces. More particularly, the present invention relates to an electrolytic process for coating metal surfaces with a layer comprising a nickel/phosphorus alloy matrix and boron carbide particles, in order to provide high wear resistance.
- the coatings of metal articles are conventionally made by chromium plating, namely electrolytic deposition of a chromium layer having a thickness of the order of 100 ⁇ m.
- the chromium plating has low costs, it does not always allow to obtain high-uniformity coatings, especially in the case of surfaces with complex geometry (for example, groovings or other deep embossings) wherein, due to the tip effect, excessive thicknesses are obtained on the tips and pour thickness are obtained in the grooves of the embossings.
- the use of hexavalent chromium gives serious problems as for the environmental sustainability, due to the high toxicity of this metal, as well as causing high costs in terms of energy and the disposal thereof.
- Another type of coating suitable for conferring wear resistance is that one which uses tungsten carbide, which allows to obtain surfaces with high hardness (Vickers hardness of about 1300 HV), but very high costs, such that to limit the use to specific industrial applications.
- the patent application EP 1 067 220 A2 discloses a process for manufacturing a coating with boron carbide into a nickel-phosphorus matrix, wherein the article to be coated is subjected to electrodeposition into an electrolytic bath comprising two or more nickel salts, in particular a mixture of nickel sulfate and nickel chloride, at least one complexing agent, at least one phosphorus salt, a detensioning agent and boron carbide in the powder form having a particle dimension from 3 to 6 ⁇ m.
- the cathode consists of the material to be coated, while the anode consists of electrolytic nickel.
- the electrolytic process is carried out at a temperature from 40°C to 70°C with a current density from 1 to 10 A/dm 2 , under stirring.
- the article thus coated is then subjected to a heat treatment, in particular at a temperature from 250°C to 400°C.
- the Applicant considered the technical problem to manufacture a coating of metal surfaces which allows to obtain high wear resistance, and at the same time high performances in terms of corrosion resistance against oxygen or other chemical agents, with controlled and uniform thicknesses, also in the presence of surfaces having a complex geometry. Furthermore, the Applicant considered the problem to develop a process of electrolytic coating which allows the use of insoluble anodes, namely anodes that remain unchanged during the process, without significant consumption of the material constituting such anodes, thus allowing the use of insoluble anodes commonly used in the conventional chromium plating processes.
- the present invention relates to a process for coating a metal article, which comprises:
- Such process allows to obtain the metal article coated with a layer comprising a nickel/phosphorus (Ni/P) alloy matrix and boron carbide particles having an average size from 0.01 ⁇ m to 2 ⁇ m, which are present in an very high amount, generally from 10% to 50% by volume, preferably from 5% to 45% by volume, with respect to the total volume of the coating.
- the coating layer thus obtained has a very high wear resistance, also at high temperatures, and high hardness (up to 1500 HV), and at the same time high thickness uniformity.
- the metal article to be coated can be formed at least partially by one metal, for example, selected from: steel, aluminum, copper, brass, cast iron, and others.
- the process in accordance with the present invention can be advantageously used for coating metal articles in various technical fields, in particular for coating cylinders for the production of corrugated cardboard, or for coating the internal surface barrel of firearms, that has groovings with an extremely precise geometry and where the abrasive action of bullets is very height, with the develop of high amounts of heat.
- the boron carbide particles have an average size from 0.01 ⁇ m to 2 ⁇ m, preferably from 0.05 ⁇ m to 1 ⁇ m.
- the boron carbide particles in suspension are present in an amount preferably from 1 g/l to 20 g/l, more preferably from 5 to 15 g/l.
- the aqueous solution comprises at least one Ni(II) salt with an anion containing sulfur, for example nickel (II) sulfate. More preferably, this is nickel (II) sulfamate (Ni(SO 3 NH 2 ) 2 ).
- nickel (II) sulfamate Ni(SO 3 NH 2 ) 2 .
- the use of nickel (II) sulfamate is particularly preferred as it allows to increase the electrodeposition rate, with a substantial improvement in terms of productivity and cost of the process.
- the aqueous solution can comprise at least another Ni(II) salt, preferably selected from: nickel (II) carbonate, nickel (II) acetate. It is also possible to use nickel (II) chloride, although this is not particularly preferred if the cathode is a nickel cathode, as the presence of chloride ions causes the consumption of the nickel electrode due to anodic attack.
- the aqueous solution comprises Ni (II) ions in a total concentration of from 0.3 moles/l to 3.0 moles/l, more preferably from 0.5 moles/l to 1.5 moles/l.
- the aqueous solution comprises a Ni(II) salt with an anion containing sulfur, and a second salt selected from nickel (II) carbonate and nickel (II) acetate, the concentration of the first salt being comprised between 0.3 moles/l and 1.8 moles/l, more preferably between 0.5 moles/l and 1.4 moles/l; the concentration of the second salt being comprised between 0.02 moles/l and 1.0 moles/l, more preferably between 0.05 moles/l and 0.6 moles/l.
- phosphorus compound As far as the phosphorus compound is concerned, this is selected from: phosphoric acid, phosphorous acid, hypophosphorous acid or salts thereof.
- salts for example, alkaly metal salts (for example potassium, sodium) or alkaline-earth metal salts (for example magnesium, calcium) can be used.
- the phosphorus compound is a phosphorous acid/hypophosphorous acid mixture, or salts thereof, preferably in a weight ratio comprised between 0.8:1 and 1.2:1. It is believed that such mixture allows to further enhance the characteristics of the final coating, thus achieving an optimal compromise between crystalline phase and amorphous phase in the coating material and therefore between hardness and corrosion resistance thereof.
- the amount of phosphorous compound to be added to the electrolytic bath is mainly selected depending on the type of nickel/phosphorus alloy to be obtained, namely a so-called "low-phosphorus” alloy, namely in general with an amount of phosphorus from 1 to 8% by weight, extremes included (with respect to the weight of the Ni/P alloy), or a so-called “high-phosphorus” alloy, namely in general with an amount of phosphorus higher than 8% and lower than or equal to 16% by weight (with respect to the weight of the Ni/P alloy).
- the obtaining of a high-phosphorus phosphorus/nickel alloy allows to significantly increase the corrosion resistance of the coating, in particular resistance to the corrosion due to the contact with water with a high content of salt, for example sea water.
- a low-phosphorus phosphorus/nickel alloy has a lower corrosion resistance, but is characterized by a higher hardness with respect to a high-phosphorus alloy.
- the aqueous solution comprises at least one iodide of an alkaly metal, preferably potassium iodide. It is believed that the presence of iodide in the electrolytic bath allows to further enhance the corrosion resistance of the coating, in particular the corrosion resistance in salt fog, a particularly severe test for any material.
- the iodide of an alkali metal is present in the solution in an amount comprised between 0.1 and 10 g/L, more preferably between 0.5 and 3g/L.
- the aqueous solution comprises at least one surfactant, which has mainly the function to facilitate the deposition of the boron carbide particles, particularly when these particles have reduced tank sizes so tending to form agglomerates that remain in suspension or deposit to the bottom of the electrolytic tank instead of depositing on the metal surface together with the Ni/P alloy.
- the surfactant is a cationic, non-ionic or amphoteric surfactant, as these, being positively charged or being neutral, do not undergo the electrostatic repulsive action from the cathode where the deposition of boron carbide occurs.
- the cationic surfactant is preferably selected from tetraalkylammonium salts R 1 R 2 R 3 R 4 N + X - wherein R 1 is an C 8 -C 24 alkyl, while R 2 , R 3 , R 4 , equal to or different from each other, are C 1 -C 6 alkyls; X - is an anion, preferably chloride ion or bromide ion. Particularly preferred are the alkyltrimethylammonium salts, such as, for example: cetyltrimethylammonium bromide, hexadecyltrimethylammonium bromide, cetyltrimethylammonium chloride.
- the non-ionic surfactant is preferably selected from: polyoxyethilene C 8 -C 24 -alkyl ethers, polyoxypropilene C 8 -C 24 -alkyl ethers, oxyethylene/oxypropilene copolymers C 8 -C 24 -alkyl ethers, polyoxyethylene C 6 -C 24 -alkylphenyl ethers, glucosides C 8 -C 24 -alkyl ethers.
- the non-ionic surfactant is capable of increasing in a particularly effective way the wettability of the particles of boron carbide, slowing the sedimentation and promoting particles to be kept in suspension.
- non-ionic surfactant is particularly effective to prevent the packing of the boron carbide on the bottom of the tank. Therefore, the use of such surfactant is advantageous both during the deposition step and in those steps wherein the plant does not work and so the solution is maintained at rest.
- the amphoteric surfactant having zwitterionic hydrophilic groups, is preferably selected from: C 8 -C 24 -alkyl betaines, C 8 -C 24 -alkylamidopropyl betaines, C 8 -C 24 -alkylamphodiacetates, C 8 -C 24 -alkilamphodipropionates.
- an amphoteric surfactant is preferably used because it provides the boron carbide particles with a charge, thus increasing the amount of said particles in the coating layer obtained by electrolytic deposition.
- the surfactants at least partially fluorinated, preferably cationic, non-ionic or amphoteric surfactants, are particularly preferred. These generally have formula: Rf-Q-T where:
- T can be selected from:
- amphoteric surfactant has general formula wherein:
- the non-ionic surfactant has general formula: Rf-Q-Y wherein:
- the concentration of said at least one surfactant is preferably comprised between 0.01 g/l and 2 g/l, more preferably between 0.05 g/l and 1 g/l.
- the aqueous solution has a pH from 0.5 to 4, more preferably from 1.5 to 3.
- a strong acid is preferably added to the aqueous solution, in particular an aqueous solution of sulfuric acid.
- a buffering agent may be advantageous, for example a boric/borate acid or acetic acid/acetate system.
- the aqueous solution further comprises at least one detensioning agent, which has the function to reduce tensions which are generated within the coating mainly due to the presence of phosphorous, tensions which can cause a deterioration of the coating layer, with the formation of cracks and possible detachments thereof.
- at least one detensioning agent which has the function to reduce tensions which are generated within the coating mainly due to the presence of phosphorous, tensions which can cause a deterioration of the coating layer, with the formation of cracks and possible detachments thereof.
- the detensioning agents is preferably selected from: saccharin; thiocarbamic acid, possibly N or N,N' substituted by C 1 -C 4 alkyls, or derivatives thereof, such as salts or C 1 -C 4 esters, preferably N,N'-diethyl-carbamic acid or salts or esters thereof; thiocompounds (for example thiourea, ammonium sulphocyanide, potassium sulphocyanide).
- the concentration of the detensioning agent is preferably comprised between 0.2 g/l and 10 g/l, more preferably between 4 g/l and 8 g/l.
- the aqueous solution further comprises at least one complexing agent, which is preferably selected from the carboxilic acids or derivatives thereof, such as, for example: citric acid, lactic acid, malic acid, malonic acid, succinic acid, glycolic acid, or mixtures thereof.
- the lactic acid is particularly preferred.
- the concentration of the complexing agent is preferably comprised between 0.05 moles/l and 2 moles/l, more preferably between 0.5 moles/l and 1 moles/l.
- the final coating has a high amount of phosphorous. Therefore, in such cases, it is preferable to work with a bath at high concentrations of phosphorous in the absence of the detensioning agent and/or of the complexing agent, as said agents generally tend to reduce the content of phosphorus in the bath, as well as reducing the deposition ratio.
- the Applicant noted that the presence of boron carbide particles in the electrolytic bath affects the deposition ratio of the coating layer, thus causing a slowing of the rate at which said deposition occurs. Therefore, according to a preferred aspect, before carrying out the electrodeposition in the presence of boron carbide particles, the article is preventively coated with a first coating layer by electrodeposition in a first electrolytic bath consisting of an aqueous solution, free of boron carbide particles, comprising:
- such deposition sequence enables a first fast deposition of the first layer free of boron carbide, while the second deposition, which is slower, enables to give the desired wear and corrosion resistance properties to the surface of the article.
- an overall saving of time with respect to that one necessary for an single deposition in the presence of boron carbide, with evident advantages for the overall productivity of the process, is obtained.
- said process can be carried out according to conventional modes, provided that a constant and homogeneous movement of the electrolytic bath is ensured, mainly in order to maintain in suspension the boron carbide particles without causing perturbations in the process of electrolytic deposition. Particularly, it is appropriate to avoid the formation of preferential routes for the flow of the suspension into the electrolytic bath, which could cause a lack of homogeneity in the coating layer.
- the recycling system comprises at least one intake line of the bath provided with an intake head inserted into the tank, at least one supply line of the bath into the tank which leads into a distribution chamber delimited by an external wall of the tank and by an internal wall provided with passing holes through which the bath flows into the tank.
- the passing holes are homogeneously distributed along the perimeter of the inner wall, thus making an intake of the bath into the tank as much as possible uniform, without generating preferential flows which would cause nonhomogeneity in the electrolytic deposition of the coating layer.
- the intake head is preferably placed at a certain distance from the bottom of the tank, so as to avoid obstructions of the intake line, especially when the boron carbide particles are deposited on the bottom after a prolonged shutdown of the apparatus.
- the recycling system comprises at least two supply lines of the bath into the tank, which lead into the tank in diametrically opposite positions, preferably at the same level in the tank and tangential with respect to the external wall, so as to make a rotary flow of the suspension into the tank.
- the two supply lines lead into the lower part of the tank, in correspondence of the bottom, so that the inlet flows contribute to the mixing of boron carbide particles possibly settled on the bottom.
- the recycling system comprises a third supply line placed in correspondence of a different level of the tank with respect to the two above-mentioned supply lines, preferably in the top of the tank, in order to make a better mixing of the suspension into the tank because of convective motions derived from liquid flows placed at several heights.
- the process according to the present invention can be carried out within a wide range of temperatures, generally from 30°C to 90°C, preferably from 40°C to 70°C. Lower temperatures to the above-mentioned ranges would cause a reduction of the electrodeposition efficiency, while higher temperatures would have as a disadvantage an excessive evaporation of the electrolytic bath, with consequent inefficiency from the energetic point of view.
- the electrolytic bath preferably has a pH value from 1 to 5, more preferably from 1.5 to 3.
- the metal article to be coated is immersed in the the electrolytic bath, which acts as cathode, and an anode, preferably an insoluble anode, for example an anode selected from: anodes made of titanium platinized or coated with mix oxides; anodes made of stainless steel (for example AISI 316), possibly coated with a noble metal, for example gold or platinum; nickel anodes.
- anode preferably an insoluble anode, for example an anode selected from: anodes made of titanium platinized or coated with mix oxides; anodes made of stainless steel (for example AISI 316), possibly coated with a noble metal, for example gold or platinum; nickel anodes.
- the passage necessary to carry out the process of electrodeposition is obtained tank to the connection of the electrodes with a generator of continuous electric energy, so as to obtain a current density in the electrolytic bath generally comprised between 1 and 40 mA/cm 2 , preferably between 5 and 30 mA/cm 2 .
- the process of electrodeposition is carried out for a time so as to obtain the desired thickness of the coating, which is generally comprised between 5 ⁇ m and 100 ⁇ m, more preferably between 10 ⁇ m and 40 ⁇ m.
- the article thus coated is subjected to a heat treatment, at a temperature generally comprised between 250°C and 400°C, preferably between 300°C and 375°C, for a time variable within wide limits, for example between 1 and 24 hours, preferably between 6 and 18 hours.
- the heat treatment mainly has the aim to form the Ni/P alloy, thus removing the hydrogen formed during the electrolytic process, so as to obtain a coating layer stable and homogeneous, thus minimizing defects and internal tensions.
- the apparatus comprise an electrolytic tank (1), preferably cylindrical-shaped, and a system for recycling the electrolytic bath comprising at least one intake line (2) of the bath provided with one intake head (3) inserted into the tank (1), at least one supply line (4', 4" and 4"') of the bath into the tank (1) which leads into a distribution chamber (5), preferably present on the top of the tank (1), delimited by an external wall (6) of the tank (1) and by an internal wall (7) provided with passing holes (8) through which the bath flows into the tank (1).
- the arrows in Figure 1 have the aim to show the direction of the flows of the electrolytic bath.
- the apparatus comprises three supply lines of the electrolytic bath into the tank (1), a first one (4') placed in correspondence of the lower portion of the tank (1), a second one (4") placed at the same height and in the position diametrically opposite with respect to the first one (4'), and a third one (4"') placed in correspondence of the higher portion of the tank (1).
- the combination of the three inlet flows has the function to create a movement of the electrolytic bath both in circular direction, along the internal wall (7), and in vertical direction, so as to increase the mixing and therefore the homogeneity of the suspension during the electrolytic process and minimizing the risk of flows with preferential directions.
- the recycling system of the electrolytic bath is obviously provided with a pump (9) and a plurality of valves (10', 10") in order to put into pressure the supply and intake lines and suitably managing the flows of the electrolytic bath into the tank (1).
- a water-based electrolytic bath (total volume: 200 ml) consisting of: NiSO 4 1.16 moles/l; H 3 PO 3 0.3 moles/l; lactic acid 0.5 moles/l; saccharin 1 g/l; non ionic surfactant 0.35 g/l; was prepared.
- Boron carbide particles was added to the bath in an amount equal to 10 g/l, having average sizes equal to 0.4 ⁇ m.
- the electrolytic bath had a pH value equal to 2.0.
- the electrodeposition process was carried out into an apparatus as illustrated in Figure 1 , maintaining the electrolytic bath at a temperature of about 65°C.
- the current density was maintained at a pH value of about 20 mA/cm 2 for three hours.
- the coating was made on a steel plate, used as a cathode, while a titanium anode coated with mix oxides was used as an anode.
- a coating layer of the plate having a thickness of about 120 ⁇ m, containing about 4% by weight of phosphorous, having Vickers hardness equal to 750 HV, is obtained.
- a water-based electrolytic bath (total volume: 200 ml) consisting of: NiSO 4 1.16 moli/l; H 3 PO 3 1.0 moli/l; Lactic acid 0.5 moli/l; saccharin 1 g/l; non-ionic surfactant 0.35 g/l; was prepared.
- Boron carbide particles were added to the bath in an amount equal to 10 g/l, having average sizes equal to 0.4 ⁇ m.
- the electrolytic bath had a pH value equal to 2.0.
- the electrodeposition process was carried out into an apparatus as illustrated in Figure 1 , maintaining the electrolytic bath at a temperature of about 65°C.
- the current density was maintained to a value of about 20 mA/cm 2 for three hours.
- the coating was made on a steel plate, used as a cathode, while a titanium anode coated with mix oxides was used as an anode.
- a coating layer of the plate having a thickness of about 120 ⁇ m, containing about 12% by weight of phosphorous, having Vickers hardness equal to 450 HV, is obtained.
- a water-based electrolytic bath (total volume: 200 ml) consisting of: Ni sulfamate 1.1 moles/l; H 3 PO 3 0.22 moles/l; Lactic acid 0.5 moles/l; saccharin 1 g/l; fluorinated non ionic surfactant 0.35 g/l; was prepared.
- Boron carbide particles were added to the bath in an amount equal to 10 g/l, having average sizes equal to 0.4 ⁇ m.
- the electrolytic bath had a pH value equal to 2.0.
- the electrodeposition process was carried out into an apparatus as illustrated in Figure 1 , maintaining the electrolytic bath at a temperature of about 65°C.
- the current density was maintained at a value of about 20 mA/cm 2 for three hours.
- the coating was made on a steel plate, used as a cathode, while a titanium anode coated with mix oxides was used as an anode.
- a coating layer of the plate having a thickness of about 60 ⁇ m is obtained, containing about 4% by weight of phosphorous, having Vickers hardness equal to 590 HV, is obtained.
- ESEMPIO 4 high-P Ni/P alloy.
- a water-based electrolytic bath (total volume: 200 ml) consisting of: Ni sulfamate 1.1 moles/l; H 3 PO 3 0.8 moles/l; Lactic acid 0.5 moles/l; saccharin 1 g/l; fluorinated non ionic surfactant 0.35 g/l; was prepared.
- Boron carbide particles were added to the bath in an amount equal to 10 g/l, having average sizes equal to 0.4 ⁇ m.
- the electrolytic bath had a pH value equal to 2.0.
- the electrodeposition process was carried out into an apparatus as illustrated in Figure 1 , maintaining the electrolytic bath at a temperature of about 65°C.
- the current density was maintained at a value of about 20 mA/cm 2 for one hour.
- the coating was made on a steel plate, used as a cathode, while a 316 L stainless steel anode was used as an anode.
- a double layer coating was made ( Figure 3 ), where the first layer was free of boron carbide particles, while the second layer contained boron carbide particles.
- a first water-based electrolytic bath (total volume: 200 ml) consisting of a solution so called "high-ratio" and high-phosphorous, free of boron carbide particles, comprising: • phosphorous acid 100 g/L • nickel sulfate (NiSO 4 * 6H 2 O) 55 g/L • sulforic acid (H 2 SO 4 ) 30 g/L • sodium acetate (CH 3 COONa) 120 g/L • KI 10 g/L, was prepared.
- the electrolytic bath was brought at a pH value equal to 3.0 with NaOH.
- the electrodeposition process was carried out into an apparatus as illustrated in Figure 1 , maintaining the electrolytic bath at a temperature of about 60°C.
- the current density was maintained at a value comprised in the range of 7-10 mA/cm 2 for one hour.
- the coating was made on a steel plate, used as a cathode, while a pure nickel anode was used as an anode.
- the first coating layer As far as the first coating layer is concerned, a deposition efficiency of 120 ⁇ m/h and a hardness of 750 HV were observed. However, after a heat treatment at 400°C for 1h, it was possible to obtain an enhanced hardness of said first layer equal to about 1100 HV. Furthermore, the coating layer obtained had a weight content of phosphorous equal to about 14%.
- a second electrolytic bath (total volume: 200 ml) was prepared.
- the electrolytic bath was brought at a pH value equal to 2.0 with an aqueous solution of H 2 SO 4 .
- a suspension of boron carbide thus prepared was added to the aqueous solution.
- 1 g/L of a fluorinated non-ionic surfactant was added to 10 g/L of boron carbide and the whole was subjected to stirring for 10 minutes and ultrasonic for 5 minutes.
- 2 g/L of an amphoteric surfactant having functional groups containing fluorine were added to the mixture thus obtained and the whole was subjected under stirring for 10 minutes.
- the electrodeposition process was carried out into an apparatus as illustrated in Figure 1 , maintaining the electrolytic bath at a temperature of about 80°C.
- the current density was maintained at a value of 2 mA/cm 2 for one hour.
- the coating was made in the same electrolytic cell of the first layer by using as a cathode that one coated with the first layer.
- a deposition efficiency of the second layer between 10 and 30 ⁇ m/h and an hardness of said second layer of 900 HV were observed. However, after a heat treatment at 400°C for 1 hour, it was possible to obtain an enhanced hardness equal to about 1350 HV. Furthermore, the coating layer obtained has a weight content of phosphorous equal to about 7%.
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Abstract
Description
- The present invention relates to an electrolytic process for coating metal surfaces. More particularly, the present invention relates to an electrolytic process for coating metal surfaces with a layer comprising a nickel/phosphorus alloy matrix and boron carbide particles, in order to provide high wear resistance.
- The need to manufacture metal articles having high surface wear resistance is deeply felt. Generally, the coatings of metal articles are conventionally made by chromium plating, namely electrolytic deposition of a chromium layer having a thickness of the order of 100 µm. Although the chromium plating has low costs, it does not always allow to obtain high-uniformity coatings, especially in the case of surfaces with complex geometry (for example, groovings or other deep embossings) wherein, due to the tip effect, excessive thicknesses are obtained on the tips and pour thickness are obtained in the grooves of the embossings. Furthermore, the use of hexavalent chromium gives serious problems as for the environmental sustainability, due to the high toxicity of this metal, as well as causing high costs in terms of energy and the disposal thereof.
- Another type of coating suitable for conferring wear resistance is that one which uses tungsten carbide, which allows to obtain surfaces with high hardness (Vickers hardness of about 1300 HV), but very high costs, such that to limit the use to specific industrial applications.
- The
patent application EP 1 067 220 A2 discloses a process for manufacturing a coating with boron carbide into a nickel-phosphorus matrix, wherein the article to be coated is subjected to electrodeposition into an electrolytic bath comprising two or more nickel salts, in particular a mixture of nickel sulfate and nickel chloride, at least one complexing agent, at least one phosphorus salt, a detensioning agent and boron carbide in the powder form having a particle dimension from 3 to 6 µm. The cathode consists of the material to be coated, while the anode consists of electrolytic nickel. The electrolytic process is carried out at a temperature from 40°C to 70°C with a current density from 1 to 10 A/dm2, under stirring. The article thus coated is then subjected to a heat treatment, in particular at a temperature from 250°C to 400°C. - The Applicant considered the technical problem to manufacture a coating of metal surfaces which allows to obtain high wear resistance, and at the same time high performances in terms of corrosion resistance against oxygen or other chemical agents, with controlled and uniform thicknesses, also in the presence of surfaces having a complex geometry. Furthermore, the Applicant considered the problem to develop a process of electrolytic coating which allows the use of insoluble anodes, namely anodes that remain unchanged during the process, without significant consumption of the material constituting such anodes, thus allowing the use of insoluble anodes commonly used in the conventional chromium plating processes.
- These and other objectives, which will be further illustrated below, were achieved by the Applicant thought the process as defined hereinafter in the present description and attached claims, which allows to obtain a coating layer comprising a nickel/phosphorus (Ni/P) alloy matrix and boron carbide particles having an average size from 0.01 µm to 2 µm.
- Therefore, according to a first aspect, the present invention relates to a process for coating a metal article, which comprises:
- providing an electrolytic bath comprising a suspension of boron carbide particles, having an average size from 0.01 µm to 2 µm, preferably from 0.05 µm to 1 µm, in an aqueous solution comprising:
- at least one nickel (II) salt;
- at least one phosphorous compound selected from: phosphoric acid, phosphorous acid, hypophosphorous acid or salts thereof;
- at least one surfactant;
- immersing in the electrolytic bath a cathode comprising the article to be coated and an anode, and carrying out an electrodeposition by passing direct current in the electrolytic bath;
- subjecting the thus coated metal article to a heat treatment.
- Such process allows to obtain the metal article coated with a layer comprising a nickel/phosphorus (Ni/P) alloy matrix and boron carbide particles having an average size from 0.01 µm to 2 µm, which are present in an very high amount, generally from 10% to 50% by volume, preferably from 5% to 45% by volume, with respect to the total volume of the coating. The coating layer thus obtained has a very high wear resistance, also at high temperatures, and high hardness (up to 1500 HV), and at the same time high thickness uniformity.
- The metal article to be coated can be formed at least partially by one metal, for example, selected from: steel, aluminum, copper, brass, cast iron, and others. The process in accordance with the present invention can be advantageously used for coating metal articles in various technical fields, in particular for coating cylinders for the production of corrugated cardboard, or for coating the internal surface barrel of firearms, that has groovings with an extremely precise geometry and where the abrasive action of bullets is very height, with the develop of high amounts of heat.
- The boron carbide particles have an average size from 0.01 µm to 2 µm, preferably from 0.05 µm to 1 µm.
- The boron carbide particles in suspension are present in an amount preferably from 1 g/l to 20 g/l, more preferably from 5 to 15 g/l.
- Preferably, the aqueous solution comprises at least one Ni(II) salt with an anion containing sulfur, for example nickel (II) sulfate. More preferably, this is nickel (II) sulfamate (Ni(SO3NH2)2). The use of nickel (II) sulfamate is particularly preferred as it allows to increase the electrodeposition rate, with a substantial improvement in terms of productivity and cost of the process.
- As an alternative or in addition to the Ni(II) salt with an anion containing sulfur, the aqueous solution can comprise at least another Ni(II) salt, preferably selected from: nickel (II) carbonate, nickel (II) acetate. It is also possible to use nickel (II) chloride, although this is not particularly preferred if the cathode is a nickel cathode, as the presence of chloride ions causes the consumption of the nickel electrode due to anodic attack.
- Preferably, the aqueous solution comprises Ni (II) ions in a total concentration of from 0.3 moles/l to 3.0 moles/l, more preferably from 0.5 moles/l to 1.5 moles/l.
- Preferably, the aqueous solution comprises a Ni(II) salt with an anion containing sulfur, and a second salt selected from nickel (II) carbonate and nickel (II) acetate, the concentration of the first salt being comprised between 0.3 moles/l and 1.8 moles/l, more preferably between 0.5 moles/l and 1.4 moles/l; the concentration of the second salt being comprised between 0.02 moles/l and 1.0 moles/l, more preferably between 0.05 moles/l and 0.6 moles/l.
- As far as the phosphorus compound is concerned, this is selected from: phosphoric acid, phosphorous acid, hypophosphorous acid or salts thereof. As salts, for example, alkaly metal salts (for example potassium, sodium) or alkaline-earth metal salts (for example magnesium, calcium) can be used.
- According to a preferred aspect, the phosphorus compound is a phosphorous acid/hypophosphorous acid mixture, or salts thereof, preferably in a weight ratio comprised between 0.8:1 and 1.2:1. It is believed that such mixture allows to further enhance the characteristics of the final coating, thus achieving an optimal compromise between crystalline phase and amorphous phase in the coating material and therefore between hardness and corrosion resistance thereof.
- The amount of phosphorous compound to be added to the electrolytic bath is mainly selected depending on the type of nickel/phosphorus alloy to be obtained, namely a so-called "low-phosphorus" alloy, namely in general with an amount of phosphorus from 1 to 8% by weight, extremes included (with respect to the weight of the Ni/P alloy), or a so-called "high-phosphorus" alloy, namely in general with an amount of phosphorus higher than 8% and lower than or equal to 16% by weight (with respect to the weight of the Ni/P alloy). The obtaining of a high-phosphorus phosphorus/nickel alloy allows to significantly increase the corrosion resistance of the coating, in particular resistance to the corrosion due to the contact with water with a high content of salt, for example sea water. However, a low-phosphorus phosphorus/nickel alloy has a lower corrosion resistance, but is characterized by a higher hardness with respect to a high-phosphorus alloy.
- According to a preferred aspect, the aqueous solution comprises at least one iodide of an alkaly metal, preferably potassium iodide. It is believed that the presence of iodide in the electrolytic bath allows to further enhance the corrosion resistance of the coating, in particular the corrosion resistance in salt fog, a particularly severe test for any material. Preferably, the iodide of an alkali metal is present in the solution in an amount comprised between 0.1 and 10 g/L, more preferably between 0.5 and 3g/L.
- The aqueous solution comprises at least one surfactant, which has mainly the function to facilitate the deposition of the boron carbide particles, particularly when these particles have reduced tank sizes so tending to form agglomerates that remain in suspension or deposit to the bottom of the electrolytic tank instead of depositing on the metal surface together with the Ni/P alloy. Preferably, the surfactant is a cationic, non-ionic or amphoteric surfactant, as these, being positively charged or being neutral, do not undergo the electrostatic repulsive action from the cathode where the deposition of boron carbide occurs.
- The cationic surfactant is preferably selected from tetraalkylammonium salts R1R2R3R4N+X- wherein R1 is an C8-C24 alkyl, while R2, R3, R4, equal to or different from each other, are C1-C6 alkyls; X- is an anion, preferably chloride ion or bromide ion. Particularly preferred are the alkyltrimethylammonium salts, such as, for example: cetyltrimethylammonium bromide, hexadecyltrimethylammonium bromide, cetyltrimethylammonium chloride.
- The non-ionic surfactant is preferably selected from: polyoxyethilene C8-C24-alkyl ethers, polyoxypropilene C8-C24-alkyl ethers, oxyethylene/oxypropilene copolymers C8-C24-alkyl ethers, polyoxyethylene C6-C24-alkylphenyl ethers, glucosides C8-C24-alkyl ethers. The non-ionic surfactant is capable of increasing in a particularly effective way the wettability of the particles of boron carbide, slowing the sedimentation and promoting particles to be kept in suspension. Furthermore the non-ionic surfactant is particularly effective to prevent the packing of the boron carbide on the bottom of the tank. Therefore, the use of such surfactant is advantageous both during the deposition step and in those steps wherein the plant does not work and so the solution is maintained at rest.
- The amphoteric surfactant, having zwitterionic hydrophilic groups, is preferably selected from: C8-C24-alkyl betaines, C8-C24-alkylamidopropyl betaines, C8-C24-alkylamphodiacetates, C8-C24-alkilamphodipropionates. As the boron carbide is free of electrical charge, an amphoteric surfactant is preferably used because it provides the boron carbide particles with a charge, thus increasing the amount of said particles in the coating layer obtained by electrolytic deposition.
- The surfactants at least partially fluorinated, preferably cationic, non-ionic or amphoteric surfactants, are particularly preferred. These generally have formula:
Rf-Q-T
where: - Rf is a C2-C20 perfluoroalkyl group, linear or branched;
- Q is a non-fluorinated bifunctional group, for example -(CH2)nCH(OH)CH2-NH(CH2)3-, -(CH2)nCH(OCOCH3)CH2-, -(CH2)nSCH2CH(OH)CH2- or -SO2NH(CH2)3-, where n is 1 or 2;
- T is a hydrophilic cationic, non-ionic or amphoteric group.
- For example, T can be selected from:
- cationic groups of formula -N+R3X-, where R, equal to or different from each other, are C1-C4 alkyls, X- is an anion, preferably chloride or bromide ion;
- polyethylene oxide groups -(CH2CH2O)mH, where m is an integer from 1 to 20;
- amphoteric groups, such as, for example:-N+(CH3)2CH2COO-, -N+(CH3)2O-, -SCH(COO-)CH2CONH(CH2)3N+(CH3)3.
-
- Rf is a linear or branched perfluorinated alkyl group of formula -CnF2n+1 wherein n is an integer comprised between 4 and 20, preferably between 6 and 14, extremes included, more preferably n is 4 or 6;
- Q is selected from:
- i) a group of formula -(CpH2p)-, linear or branched, where p is an integer comprised between 1 and 50, preferably between 2 and 10, extremes included;
- ii) a group of formula -(CpH2p)q-C6H4-(Cp1H2p1)r- wherein q and r are each independently 0 or 1, p1 is an integer comprised between 1 and 50, extremes included, and p is as defined above;
- iii) a group of formula -(CpH2p)q-C6H4-(CH2CH2O)D- where p and q are as defined above, and D is an integer comprised between 1 and 40, extremes included;
- iv) a group of formula
- wherein R is selected from hydrogen and a linear or branched C1-C5 alkyl group, preferably R is -CH3 or H, more preferably R is H;
- R1 and R2, equal to or different from each other, are selected from: a linear or branched C1-C5 alkyl group, a Rf-Q- group as defined above, or, together with the N atom to which they are bounded, form a piperidine, morpholine or N-alkyl (C1-C4) piperazine ring;
- m is an integer comprised between 1 and 10, preferably comprised between 2 and 3, extremes included.
- According to another preferred aspect of the invention, the non-ionic surfactant has general formula:
Rf-Q-Y
wherein: - Rf is a perfluorinated alkyl group, linear or branched, having formula -CnF2n+1 wherein n is an integer comprised between 4 and 20, preferably comprised between 6 and 14, extremes included, more preferably n is 4 or 6;
- Q is selected from:
- i) a group of formula -(CpH2p)-, linear or branched, wherein p is an integer comprised between 1 and 50, preferably comprised between 2 and 10, extremes included;
- ii) a group of formula - (CpH2p)q-C6H4-(Cp1H2p1)r- wherein q and r are each independently 0 or 1, p1 is an integer comprised between 1 and 50, extremes included, and p is as above defined;
- iii) a group of formula - (CpH2p)q-C6H4-(CH2CH2O)D- wherein p and q are as defined above, and D is an integer comprised between 1 and 40, extremes included;
- iv) a group of formula
- v) a group selected from:
- vi) a group of formula -(CH2CH2O)D- where D is as above defined;
- vii) a group of formula
- viii) an ethylene oxide and propylene oxide block copolymer of formula
- ix) an ethylene oxide-propylene oxide-ethylene oxide block copolymer of formula
- x) a group of formula
- where R is selected from hydrogen and a C1-C5 alkyl group, linear or branched, preferably R is -CH3 or H, more preferably R is H;
- Y is an hydrogen or a C1-C10 alkyl group, linear or branched, preferably Y is -CH3 or H.
- The concentration of said at least one surfactant is preferably comprised between 0.01 g/l and 2 g/l, more preferably between 0.05 g/l and 1 g/l.
- Preferably the aqueous solution has a pH from 0.5 to 4, more preferably from 1.5 to 3. In order to obtain pH values within the above mentioned ranges, a strong acid is preferably added to the aqueous solution, in particular an aqueous solution of sulfuric acid. In certain cases, in order to maintain the pH within the selected range, the addition of a buffering agent may be advantageous, for example a boric/borate acid or acetic acid/acetate system.
- Preferably, the aqueous solution further comprises at least one detensioning agent, which has the function to reduce tensions which are generated within the coating mainly due to the presence of phosphorous, tensions which can cause a deterioration of the coating layer, with the formation of cracks and possible detachments thereof.
- The detensioning agents is preferably selected from: saccharin; thiocarbamic acid, possibly N or N,N' substituted by C1-C4 alkyls, or derivatives thereof, such as salts or C1-C4 esters, preferably N,N'-diethyl-carbamic acid or salts or esters thereof; thiocompounds (for example thiourea, ammonium sulphocyanide, potassium sulphocyanide).
- The concentration of the detensioning agent is preferably comprised between 0.2 g/l and 10 g/l, more preferably between 4 g/l and 8 g/l.
- Preferably, the aqueous solution further comprises at least one complexing agent, which is preferably selected from the carboxilic acids or derivatives thereof, such as, for example: citric acid, lactic acid, malic acid, malonic acid, succinic acid, glycolic acid, or mixtures thereof. The lactic acid is particularly preferred.
- The concentration of the complexing agent is preferably comprised between 0.05 moles/l and 2 moles/l, more preferably between 0.5 moles/l and 1 moles/l.
- If the obtaining of a particularly high corrosion resistance is desirable, it is preferable that the final coating has a high amount of phosphorous. Therefore, in such cases, it is preferable to work with a bath at high concentrations of phosphorous in the absence of the detensioning agent and/or of the complexing agent, as said agents generally tend to reduce the content of phosphorus in the bath, as well as reducing the deposition ratio.
- As far as this latter aspect is concerned, the Applicant noted that the presence of boron carbide particles in the electrolytic bath affects the deposition ratio of the coating layer, thus causing a slowing of the rate at which said deposition occurs. Therefore, according to a preferred aspect, before carrying out the electrodeposition in the presence of boron carbide particles, the article is preventively coated with a first coating layer by electrodeposition in a first electrolytic bath consisting of an aqueous solution, free of boron carbide particles, comprising:
- at least one nickel (II) salt;
- at least one phosphorus compound selected from: phosphoric acid, phosphorous acid, hypophosphorous acid or salts thereof. In this way a first deposition of a first coating layer free of boron carbide particles and a following deposition of a second coating layer containing boron carbide particles, is carried out.
- Advantageously, such deposition sequence enables a first fast deposition of the first layer free of boron carbide, while the second deposition, which is slower, enables to give the desired wear and corrosion resistance properties to the surface of the article. In such a way, an overall saving of time with respect to that one necessary for an single deposition in the presence of boron carbide, with evident advantages for the overall productivity of the process, is obtained.
- As for the way to carry out the electrochemical process object of the present invention, said process can be carried out according to conventional modes, provided that a constant and homogeneous movement of the electrolytic bath is ensured, mainly in order to maintain in suspension the boron carbide particles without causing perturbations in the process of electrolytic deposition. Particularly, it is appropriate to avoid the formation of preferential routes for the flow of the suspension into the electrolytic bath, which could cause a lack of homogeneity in the coating layer.
- For this purpose it is particularly advantageous to carry out the process according to the present invention into an apparatus comprising an electrolytic tank and a system for recycling the electrolytic bath. In particular, the recycling system comprises at least one intake line of the bath provided with an intake head inserted into the tank, at least one supply line of the bath into the tank which leads into a distribution chamber delimited by an external wall of the tank and by an internal wall provided with passing holes through which the bath flows into the tank.
- Preferably, the passing holes are homogeneously distributed along the perimeter of the inner wall, thus making an intake of the bath into the tank as much as possible uniform, without generating preferential flows which would cause nonhomogeneity in the electrolytic deposition of the coating layer.
- The intake head is preferably placed at a certain distance from the bottom of the tank, so as to avoid obstructions of the intake line, especially when the boron carbide particles are deposited on the bottom after a prolonged shutdown of the apparatus.
- Preferably, the recycling system comprises at least two supply lines of the bath into the tank, which lead into the tank in diametrically opposite positions, preferably at the same level in the tank and tangential with respect to the external wall, so as to make a rotary flow of the suspension into the tank. Preferably, the two supply lines lead into the lower part of the tank, in correspondence of the bottom, so that the inlet flows contribute to the mixing of boron carbide particles possibly settled on the bottom.
- Preferably, the recycling system comprises a third supply line placed in correspondence of a different level of the tank with respect to the two above-mentioned supply lines, preferably in the top of the tank, in order to make a better mixing of the suspension into the tank because of convective motions derived from liquid flows placed at several heights.
- The process according to the present invention can be carried out within a wide range of temperatures, generally from 30°C to 90°C, preferably from 40°C to 70°C. Lower temperatures to the above-mentioned ranges would cause a reduction of the electrodeposition efficiency, while higher temperatures would have as a disadvantage an excessive evaporation of the electrolytic bath, with consequent inefficiency from the energetic point of view.
- The electrolytic bath preferably has a pH value from 1 to 5, more preferably from 1.5 to 3.
- The metal article to be coated is immersed in the the electrolytic bath, which acts as cathode, and an anode, preferably an insoluble anode, for example an anode selected from: anodes made of titanium platinized or coated with mix oxides; anodes made of stainless steel (for example AISI 316), possibly coated with a noble metal, for example gold or platinum; nickel anodes.
- The passage necessary to carry out the process of electrodeposition is obtained tank to the connection of the electrodes with a generator of continuous electric energy, so as to obtain a current density in the electrolytic bath generally comprised between 1 and 40 mA/cm2, preferably between 5 and 30 mA/cm2.
- The process of electrodeposition is carried out for a time so as to obtain the desired thickness of the coating, which is generally comprised between 5 µm and 100 µm, more preferably between 10 µm and 40 µm.
- After the electrodeposition, the article thus coated is subjected to a heat treatment, at a temperature generally comprised between 250°C and 400°C, preferably between 300°C and 375°C, for a time variable within wide limits, for example between 1 and 24 hours, preferably between 6 and 18 hours. The heat treatment mainly has the aim to form the Ni/P alloy, thus removing the hydrogen formed during the electrolytic process, so as to obtain a coating layer stable and homogeneous, thus minimizing defects and internal tensions.
- The present invention will be now further illustrated with reference to the non-limiting figures attached to the present description, wherein:
-
Figures 1 and 2 represent a scheme of an apparatus for carrying out a process according to the present invention,Figure 1 according to a plan view,Figure 2 according to a side view; -
Figure 3 shows the SEM image of a double layer coating, obtained by a deposition in succession; -
Figure 4 show the SEM image of the surface of a coating layer made of high-phosphorous Ni-P alloy, free of boron carbide particles. - With reference to said
Figures 1 and 2 , the apparatus comprise an electrolytic tank (1), preferably cylindrical-shaped, and a system for recycling the electrolytic bath comprising at least one intake line (2) of the bath provided with one intake head (3) inserted into the tank (1), at least one supply line (4', 4" and 4"') of the bath into the tank (1) which leads into a distribution chamber (5), preferably present on the top of the tank (1), delimited by an external wall (6) of the tank (1) and by an internal wall (7) provided with passing holes (8) through which the bath flows into the tank (1). The arrows inFigure 1 have the aim to show the direction of the flows of the electrolytic bath. - In the embodiment according to
Figure 1 , the apparatus comprises three supply lines of the electrolytic bath into the tank (1), a first one (4') placed in correspondence of the lower portion of the tank (1), a second one (4") placed at the same height and in the position diametrically opposite with respect to the first one (4'), and a third one (4"') placed in correspondence of the higher portion of the tank (1). The combination of the three inlet flows has the function to create a movement of the electrolytic bath both in circular direction, along the internal wall (7), and in vertical direction, so as to increase the mixing and therefore the homogeneity of the suspension during the electrolytic process and minimizing the risk of flows with preferential directions. - The recycling system of the electrolytic bath is obviously provided with a pump (9) and a plurality of valves (10', 10") in order to put into pressure the supply and intake lines and suitably managing the flows of the electrolytic bath into the tank (1).
- The following examples of embodiment are provided only for illustrative purposes of the present invention and they are not to be intended as limitative of the scope of protection defined by the attached claims.
- A water-based electrolytic bath (total volume: 200 ml) consisting of:
NiSO4 1.16 moles/l; H3PO3 0.3 moles/l; lactic acid 0.5 moles/l; saccharin 1 g/l; non ionic surfactant 0.35 g/l; - Boron carbide particles was added to the bath in an amount equal to 10 g/l, having average sizes equal to 0.4 µm. The electrolytic bath had a pH value equal to 2.0.
- The electrodeposition process was carried out into an apparatus as illustrated in
Figure 1 , maintaining the electrolytic bath at a temperature of about 65°C. The current density was maintained at a pH value of about 20 mA/cm2 for three hours. The coating was made on a steel plate, used as a cathode, while a titanium anode coated with mix oxides was used as an anode. - At the end of the electrodeposition process, a coating layer of the plate having a thickness of about 120µm, containing about 4% by weight of phosphorous, having Vickers hardness equal to 750 HV, is obtained.
- A water-based electrolytic bath (total volume: 200 ml) consisting of:
NiSO4 1.16 moli/l; H3PO3 1.0 moli/l; Lactic acid 0.5 moli/l; saccharin 1 g/l; non-ionic surfactant 0.35 g/l; - Boron carbide particles were added to the bath in an amount equal to 10 g/l, having average sizes equal to 0.4 µm. The electrolytic bath had a pH value equal to 2.0.
- The electrodeposition process was carried out into an apparatus as illustrated in
Figure 1 , maintaining the electrolytic bath at a temperature of about 65°C. The current density was maintained to a value of about 20 mA/cm2 for three hours. The coating was made on a steel plate, used as a cathode, while a titanium anode coated with mix oxides was used as an anode. - At the end of the electrodeposition process, a coating layer of the plate having a thickness of about 120µm, containing about 12% by weight of phosphorous, having Vickers hardness equal to 450 HV, is obtained.
- A water-based electrolytic bath (total volume: 200 ml) consisting of:
Ni sulfamate 1.1 moles/l; H3PO3 0.22 moles/l; Lactic acid 0.5 moles/l; saccharin 1 g/l; fluorinated non ionic surfactant 0.35 g/l; - Boron carbide particles were added to the bath in an amount equal to 10 g/l, having average sizes equal to 0.4 µm. The electrolytic bath had a pH value equal to 2.0.
- The electrodeposition process was carried out into an apparatus as illustrated in
Figure 1 , maintaining the electrolytic bath at a temperature of about 65°C. The current density was maintained at a value of about 20 mA/cm2 for three hours. The coating was made on a steel plate, used as a cathode, while a titanium anode coated with mix oxides was used as an anode. - At the end of the electrodeposition process, a coating layer of the plate having a thickness of about 60µm is obtained, containing about 4% by weight of phosphorous, having Vickers hardness equal to 590 HV, is obtained.
- A water-based electrolytic bath (total volume: 200 ml) consisting of:
Ni sulfamate 1.1 moles/l; H3PO3 0.8 moles/l; Lactic acid 0.5 moles/l; saccharin 1 g/l; fluorinated non ionic surfactant 0.35 g/l; - Boron carbide particles were added to the bath in an amount equal to 10 g/l, having average sizes equal to 0.4 µm. The electrolytic bath had a pH value equal to 2.0.
- The electrodeposition process was carried out into an apparatus as illustrated in
Figure 1 , maintaining the electrolytic bath at a temperature of about 65°C. The current density was maintained at a value of about 20 mA/cm2 for one hour. The coating was made on a steel plate, used as a cathode, while a 316 L stainless steel anode was used as an anode. - At the end of the electrodeposition process, a coating layer of the plate having a thickness of about 42 µm, containing about 12% by weight of phosphorous, having Vickers hardness equal to 700 HV, is obtained.
- A double layer coating was made (
Figure 3 ), where the first layer was free of boron carbide particles, while the second layer contained boron carbide particles. - A first water-based electrolytic bath (total volume: 200 ml) consisting of a solution so called "high-ratio" and high-phosphorous, free of boron carbide particles, comprising:
• phosphorous acid 100 g/L • nickel sulfate (NiSO4 * 6H2O) 55 g/L • sulforic acid (H2SO4) 30 g/L • sodium acetate (CH3COONa) 120 g/L • KI 10 g/L, - The electrolytic bath was brought at a pH value equal to 3.0 with NaOH.
- The electrodeposition process was carried out into an apparatus as illustrated in
Figure 1 , maintaining the electrolytic bath at a temperature of about 60°C. The current density was maintained at a value comprised in the range of 7-10 mA/cm2 for one hour. The coating was made on a steel plate, used as a cathode, while a pure nickel anode was used as an anode. - As far as the first coating layer is concerned, a deposition efficiency of 120 µm/h and a hardness of 750 HV were observed. However, after a heat treatment at 400°C for 1h, it was possible to obtain an enhanced hardness of said first layer equal to about 1100 HV. Furthermore, the coating layer obtained had a weight content of phosphorous equal to about 14%.
- For the deposition of the second coating layer a second electrolytic bath (total volume: 200 ml) was prepared. First of all, an aqueous solution so-called "low-phosphorous", consisting of:
- Nickel sulfate (NiSO4 * 6H2O) 75 g/L; - phosphorous acid 15 g/L; - sodium hypophosphite 20 g/L; - sodium acetate (CH3COONa) 120 g/L; - KI 10 g/L; - The electrolytic bath was brought at a pH value equal to 2.0 with an aqueous solution of H2SO4.
- Then, a suspension of boron carbide thus prepared was added to the aqueous solution. 1 g/L of a fluorinated non-ionic surfactant was added to 10 g/L of boron carbide and the whole was subjected to stirring for 10 minutes and ultrasonic for 5 minutes. 2 g/L of an amphoteric surfactant having functional groups containing fluorine were added to the mixture thus obtained and the whole was subjected under stirring for 10 minutes.
- The electrodeposition process was carried out into an apparatus as illustrated in
Figure 1 , maintaining the electrolytic bath at a temperature of about 80°C. The current density was maintained at a value of 2 mA/cm2 for one hour. The coating was made in the same electrolytic cell of the first layer by using as a cathode that one coated with the first layer. - A deposition efficiency of the second layer between 10 and 30 µm/h and an hardness of said second layer of 900 HV were observed. However, after a heat treatment at 400°C for 1 hour, it was possible to obtain an enhanced hardness equal to about 1350 HV. Furthermore, the coating layer obtained has a weight content of phosphorous equal to about 7%.
Claims (14)
- Process for coating a metal article, which comprises:- providing an electrolytic bath comprising a suspension of boron carbide particles, having an average size from 0.01 µm to 2 µm, in an aqueous solution comprising:at least one nickel (II) salt;at least one phosphorous compound selected from: phosphoric acid, phosphorous acid, hypophosphorous acid or salts thereof;at least one surfactant;- immersing in the electrolytic bath a cathode comprising the article to be coated and an anode, and carrying out an electrodeposition by passing direct current in the electrolytic bath;- subjecting the thus coated metal article to a heat treatment.
- Process according to claim 1, wherein the boron carbide particles in suspension are present in an amount of from 1 g/l to 20 g/l, preferably from 5 to 15 g/l.
- Process according to claim 1 or 2, wherein the nickel (II) salt is nickel (II) sulfamate (Ni (SO3NH2)2).
- Process according to anyone of the preceding claims, wherein the aqueous solution comprises Ni(II) ions in a total concentration of from 0.3 moles/l to 3.0 moles/l, preferably from 0.5 moles/l to 1.5 moles/l.
- Process according to anyone of the preceding claims, wherein said at least one surfactant is a cationic, non-ionic or amphoteric surfactant.
- Process according to claim 5, wherein said at least one surfactant is a cationic surfactant selected from tetraalkylammonium salts R1R2R3R4N+X-, wherein R1 is a C8-C24 alkyl, whereas R2, R3, R4, equal to or different from each other, are C1-C6 alkyls; X- is an anion, preferably chloride ion or bromide ion.
- Process according to claim 5, wherein said at least one surfactant is a non-ionic surfactant selected from: polyoxyethylene C8-C24-alkyl ethers, polyoxypropylene C8-C24-alkyl ethers, oxyethylene/oxypropylene copolymers C8-C24-alkyl ethers, polyoxyethylene C6-C24-alkylphenyl ethers, glucosyde C8-C24-alkyl ethers.
- Process according to claim 5, wherein said at least one surfactant is an amphoteric surfactant selected from: C8-C24-alkyl betaine, C8-C24-alkylamidopropyl betaine, C8-C24-alkylamphodiacetates, C8-C24-alkylamphodipropionates.
- Process according to anyone of the preceding claims, wherein said at least one surfactant is a surfactant at least partially fluorinated, preferably cationic, non-ionic or amphoteric.
- Process according to anyone of the preceding claims, wherein the aqueous solution has a pH from 0.5 to 4, preferably from 1.5 to 3.
- Process according to anyone of the preceding claims, wherein the anode is an insoluble anode.
- Process according to anyone of the preceding claims, wherein, before carrying out the electrodeposition in the presence of boron carbide particles, the article is preventively coated with a first coating layer by electrodeposition in a first electrolytic bath consisting of an aqueous solution, free of boron carbide particles, comprising:at least one nickel (II) salt;at least one phosphorus compound selected from: phosphoric acid, phosphorous acid, hypophosphorous acid or salts thereof.
- Process according to any one of the preceding claims, wherein the electrolytic bath is contained into an apparatus comprising an electrolytic tank and a system for recycling the electrolytic bath, the recycling system comprising at least one intake line of the bath provided with an intake head inserted into the tank, at least one supply line of the bath into the tank which leads into a distribution chamber delimited by an external wall of the tank and by an internal wall provided with passing holes through which the bath flows into the tank.
- Process according to anyone of the preceding claims, wherein the heat treatment is carried out at a temperature comprised from 250°C to 400°C, preferably from 300°C to 375°C.
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JP2017110276A (en) * | 2015-12-18 | 2017-06-22 | 石原ケミカル株式会社 | Method for forming conductive film onto passivation formable light metal |
IT201700079843A1 (en) * | 2017-07-14 | 2019-01-14 | Metalcoating S R L | ELECTROLYTIC PROCESS FOR THE COATING OF METALLIC SURFACES IN THE PURPOSE OF PROVIDING HIGH RESISTANCE TO CORROSION AND ABRASION. |
WO2020083808A1 (en) * | 2018-10-24 | 2020-04-30 | Mahle International Gmbh | Gas exchange valve |
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