EP3083140A4 - Polishing cushion, polishing apparatus, polishing method, and article including object polished by the polishing method - Google Patents

Polishing cushion, polishing apparatus, polishing method, and article including object polished by the polishing method Download PDF

Info

Publication number
EP3083140A4
EP3083140A4 EP14871298.7A EP14871298A EP3083140A4 EP 3083140 A4 EP3083140 A4 EP 3083140A4 EP 14871298 A EP14871298 A EP 14871298A EP 3083140 A4 EP3083140 A4 EP 3083140A4
Authority
EP
European Patent Office
Prior art keywords
polishing
cushion
polishing method
article including
including object
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP14871298.7A
Other languages
German (de)
French (fr)
Other versions
EP3083140A1 (en
Inventor
Michihiro Yamahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of EP3083140A1 publication Critical patent/EP3083140A1/en
Publication of EP3083140A4 publication Critical patent/EP3083140A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/001Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as supporting member
    • B24D3/002Flexible supporting members, e.g. paper, woven, plastic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/22Lapping pads for working plane surfaces characterised by a multi-layered structure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001Manufacture of flexible abrasive materials
    • B24D11/003Manufacture of flexible abrasive materials without embedded abrasive particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/02Backings, e.g. foils, webs, mesh fabrics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D9/00Wheels or drums supporting in exchangeable arrangement a layer of flexible abrasive material, e.g. sandpaper
    • B24D9/02Expansible drums for carrying flexible material in tubular form, e.g. expanded by centrifugal force
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D9/00Wheels or drums supporting in exchangeable arrangement a layer of flexible abrasive material, e.g. sandpaper
    • B24D9/08Circular back-plates for carrying flexible material

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
EP14871298.7A 2013-12-20 2014-12-18 Polishing cushion, polishing apparatus, polishing method, and article including object polished by the polishing method Withdrawn EP3083140A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013263590A JP6279309B2 (en) 2013-12-20 2013-12-20 Polishing cushion, polishing apparatus, polishing method, and article including an object polished by the polishing method
PCT/US2014/071095 WO2015095489A1 (en) 2013-12-20 2014-12-18 Polishing cushion, polishing apparatus, polishing method, and article including object polished by the polishing method

Publications (2)

Publication Number Publication Date
EP3083140A1 EP3083140A1 (en) 2016-10-26
EP3083140A4 true EP3083140A4 (en) 2017-09-06

Family

ID=53403680

Family Applications (1)

Application Number Title Priority Date Filing Date
EP14871298.7A Withdrawn EP3083140A4 (en) 2013-12-20 2014-12-18 Polishing cushion, polishing apparatus, polishing method, and article including object polished by the polishing method

Country Status (6)

Country Link
US (1) US20160303708A1 (en)
EP (1) EP3083140A4 (en)
JP (1) JP6279309B2 (en)
CN (1) CN105829022B (en)
TW (1) TW201544258A (en)
WO (1) WO2015095489A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6426403B2 (en) * 2014-08-27 2018-11-21 株式会社フジミインコーポレーテッド Polishing method
DE102019122711A1 (en) * 2019-08-23 2021-02-25 Atlantic Gmbh Three-layer grinding wheel

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0167679A1 (en) * 1984-07-13 1986-01-15 Nobuhiko Yasui Polishing apparatus
US5975999A (en) * 1997-01-06 1999-11-02 3M Innovative Properties Company Hand tool having a cushioned laminate attachment surface
US20020002027A1 (en) * 2000-05-23 2002-01-03 Eppert Stanley E. Eliminating air pockets under a polishing pad
EP1661665A1 (en) * 2003-07-10 2006-05-31 Matsushita Electric Industrial Co., Ltd. Viscoelastic polisher and polishing method using the same
US20100075578A1 (en) * 2008-09-19 2010-03-25 Hung-Ke Chou Abrasive polishing net with a stickable fiber layer
JP2014151410A (en) * 2013-02-12 2014-08-25 Fujibo Holdings Inc Protective sheet

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2119738A (en) * 1937-03-08 1938-06-07 Harry W Dempsey Abrading apparatus
US2644280A (en) * 1950-09-13 1953-07-07 Carborundum Co Sanding disk accessory
GB813963A (en) * 1956-06-01 1959-05-27 Carborundum Co Improvements in or relating to contact elements for backing up abrasive belts or thelike
FR1390205A (en) * 1963-06-04 1965-02-26 Zane & C Snc Flexible abrasive disc, process for its manufacture and means for carrying out this process
US4287685A (en) * 1978-12-08 1981-09-08 Miksa Marton Pad assembly for vacuum rotary sander
US4937984A (en) * 1989-02-23 1990-07-03 Taranto Thomas F Vacuum sander
US5212910A (en) * 1991-07-09 1993-05-25 Intel Corporation Composite polishing pad for semiconductor process
JPH11238768A (en) * 1998-02-20 1999-08-31 Japan Electronic Materials Corp Probe end cleaning sheet
US6810554B2 (en) * 1998-06-12 2004-11-02 Rapid Brands Corporation Cleaning tool with removable cleaning sheets
US6666751B1 (en) * 2000-07-17 2003-12-23 Micron Technology, Inc. Deformable pad for chemical mechanical polishing
CN100379522C (en) * 2000-12-01 2008-04-09 东洋橡膠工业株式会社 Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad
US6612917B2 (en) * 2001-02-07 2003-09-02 3M Innovative Properties Company Abrasive article suitable for modifying a semiconductor wafer
US6632129B2 (en) * 2001-02-15 2003-10-14 3M Innovative Properties Company Fixed abrasive article for use in modifying a semiconductor wafer
US7238092B2 (en) * 2001-09-28 2007-07-03 Novellus Systems, Inc. Low-force electrochemical mechanical processing method and apparatus
US6942549B2 (en) * 2003-10-29 2005-09-13 International Business Machines Corporation Two-sided chemical mechanical polishing pad for semiconductor processing
US7393269B2 (en) * 2005-09-16 2008-07-01 3M Innovative Properties Company Abrasive filter assembly and methods of making same
US8574040B2 (en) * 2008-12-30 2013-11-05 Saint-Gobain Abrasives, Inc. Multi-air aqua reservoir moist sanding system
JP5355310B2 (en) * 2009-09-03 2013-11-27 富士紡ホールディングス株式会社 Holding pad
US20130269134A1 (en) * 2012-04-13 2013-10-17 Meng-Jie Lin Cleaning cloth

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0167679A1 (en) * 1984-07-13 1986-01-15 Nobuhiko Yasui Polishing apparatus
US5975999A (en) * 1997-01-06 1999-11-02 3M Innovative Properties Company Hand tool having a cushioned laminate attachment surface
US20020002027A1 (en) * 2000-05-23 2002-01-03 Eppert Stanley E. Eliminating air pockets under a polishing pad
EP1661665A1 (en) * 2003-07-10 2006-05-31 Matsushita Electric Industrial Co., Ltd. Viscoelastic polisher and polishing method using the same
US20100075578A1 (en) * 2008-09-19 2010-03-25 Hung-Ke Chou Abrasive polishing net with a stickable fiber layer
JP2014151410A (en) * 2013-02-12 2014-08-25 Fujibo Holdings Inc Protective sheet

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2015095489A1 *

Also Published As

Publication number Publication date
US20160303708A1 (en) 2016-10-20
TW201544258A (en) 2015-12-01
EP3083140A1 (en) 2016-10-26
WO2015095489A1 (en) 2015-06-25
CN105829022B (en) 2019-05-28
CN105829022A (en) 2016-08-03
JP6279309B2 (en) 2018-02-14
JP2015116653A (en) 2015-06-25

Similar Documents

Publication Publication Date Title
SG11201506001VA (en) Polishing composition, method for producing polishing composition and method for producing polished article
EP3127655A4 (en) Polishing pad and process for producing same
IL253117A0 (en) Abrasive articles and methods for forming same
SG10201403995WA (en) Film-thickness measuring apparatus, film-thickness measuring method, and polishing apparatus having the film-thickness measuring apparatus
EP3052271A4 (en) Bonded abrasive articles and methods
SG10201405189QA (en) Polishing method and polishing apparatus
EP3107714A4 (en) System for use with three-dimensional printer and method for using the same
EP3017912A4 (en) Polishing device and polishing method
SG10201407062PA (en) Polishing apparatus and polishing method
SG11201506296VA (en) Polishing composition and method for producing polished article
EP3123993A4 (en) Method for producing absorbent article and absorbent article
EP3366837A4 (en) Rail surface grinding device and rail surface grinding method using same
EP3036288A4 (en) Rigid foam and associated article and method
SG11201609296XA (en) Polishing pad and method for manufacturing the same
IL251183A0 (en) Nonporous molded article for polishing layer, polishing pad, and polishing method
SG11201607359XA (en) Polishing composition, polishing method, and method for producing substrate
EP3101172A4 (en) Sheet-like article, and method for producing same
EP2974829A4 (en) Polishing pad and polishing method
EP3013529A4 (en) Abrasive article
EP3083145A4 (en) Abrasive, abrasive article and the method for preparing the same
EP3105010A4 (en) Abrasive article and method of using the same
SG11201702215RA (en) Polishing composition, method for manufacturing same, and polishing method
SG10201407353UA (en) Substrate holder, polishing apparatus, polishing method, and retaining ring
SG10201403725TA (en) Polishing apparatus, polishing pad positioning method, and polishing pad
EP3235404A4 (en) Seat pad and method for manufacturing seat pad

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20160616

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20170808

RIC1 Information provided on ipc code assigned before grant

Ipc: B24D 9/02 20060101ALI20170731BHEP

Ipc: B24B 37/22 20120101AFI20170731BHEP

Ipc: B24D 11/00 20060101ALI20170731BHEP

Ipc: B24D 3/00 20060101ALI20170731BHEP

Ipc: B24D 11/02 20060101ALI20170731BHEP

Ipc: B24D 9/08 20060101ALI20170731BHEP

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20180306