EP3080847A4 - MANUFACTURE OF SOLAR CELL EMITTING REGIONS USING ION IMPLANTATION - Google Patents
MANUFACTURE OF SOLAR CELL EMITTING REGIONS USING ION IMPLANTATIONInfo
- Publication number
- EP3080847A4 EP3080847A4 EP14869894.7A EP14869894A EP3080847A4 EP 3080847 A4 EP3080847 A4 EP 3080847A4 EP 14869894 A EP14869894 A EP 14869894A EP 3080847 A4 EP3080847 A4 EP 3080847A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- manufacture
- solar cell
- ion implantation
- emitting regions
- cell emitting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005468 ion implantation Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/146—Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
- H10F71/1221—The active layers comprising only Group IV materials comprising polycrystalline silicon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/128—Annealing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/131—Recrystallisation; Crystallization of amorphous or microcrystalline semiconductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/137—Batch treatment of the devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
- H10F77/219—Arrangements for electrodes of back-contact photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
- H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/707—Surface textures, e.g. pyramid structures of the substrates or of layers on substrates, e.g. textured ITO layer on a glass substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361913614P | 2013-12-09 | 2013-12-09 | |
US14/562,159 US9401450B2 (en) | 2013-12-09 | 2014-12-05 | Solar cell emitter region fabrication using ion implantation |
PCT/US2014/069169 WO2015088992A1 (en) | 2013-12-09 | 2014-12-08 | Solar cell emitter region fabrication using ion implantation |
Publications (3)
Publication Number | Publication Date |
---|---|
EP3080847A1 EP3080847A1 (en) | 2016-10-19 |
EP3080847A4 true EP3080847A4 (en) | 2016-10-19 |
EP3080847B1 EP3080847B1 (en) | 2019-04-10 |
Family
ID=53272043
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP14869894.7A Active EP3080847B1 (en) | 2013-12-09 | 2014-12-08 | Solar cell emitter region fabrication using ion implantation |
Country Status (14)
Country | Link |
---|---|
US (2) | US9401450B2 (en) |
EP (1) | EP3080847B1 (en) |
JP (2) | JP6636913B2 (en) |
KR (1) | KR102407023B1 (en) |
CN (1) | CN105659395B (en) |
AU (1) | AU2014364086B2 (en) |
BR (1) | BR112016013216B1 (en) |
MX (1) | MX2016006973A (en) |
MY (1) | MY192488A (en) |
PH (1) | PH12016501052A1 (en) |
SA (1) | SA516371270B1 (en) |
TW (1) | TWI655676B (en) |
WO (1) | WO2015088992A1 (en) |
ZA (1) | ZA201603437B (en) |
Families Citing this family (31)
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US12074240B2 (en) * | 2008-06-12 | 2024-08-27 | Maxeon Solar Pte. Ltd. | Backside contact solar cells with separated polysilicon doped regions |
US7851698B2 (en) * | 2008-06-12 | 2010-12-14 | Sunpower Corporation | Trench process and structure for backside contact solar cells with polysilicon doped regions |
US9401450B2 (en) * | 2013-12-09 | 2016-07-26 | Sunpower Corporation | Solar cell emitter region fabrication using ion implantation |
US9577134B2 (en) * | 2013-12-09 | 2017-02-21 | Sunpower Corporation | Solar cell emitter region fabrication using self-aligned implant and cap |
US9627558B2 (en) * | 2014-04-09 | 2017-04-18 | Arizona Board Of Regents On Behalf Of Arizona State University | Methods and apparatuses for manufacturing self-aligned integrated back contact heterojunction solar cells |
US9263625B2 (en) * | 2014-06-30 | 2016-02-16 | Sunpower Corporation | Solar cell emitter region fabrication using ion implantation |
US9520507B2 (en) | 2014-12-22 | 2016-12-13 | Sunpower Corporation | Solar cells with improved lifetime, passivation and/or efficiency |
US20160284913A1 (en) * | 2015-03-27 | 2016-09-29 | Staffan WESTERBERG | Solar cell emitter region fabrication using substrate-level ion implantation |
KR102272433B1 (en) * | 2015-06-30 | 2021-07-05 | 엘지전자 주식회사 | Solar cell and method of manufacturing the same |
NL2015534B1 (en) | 2015-09-30 | 2017-05-10 | Tempress Ip B V | Method of manufacturing a solar cell. |
JP2018073969A (en) * | 2016-10-28 | 2018-05-10 | 株式会社アルバック | Method for manufacturing solar battery |
US10749052B2 (en) | 2017-02-14 | 2020-08-18 | Alliance For Sustainable Energy, Llc | Methods of forming interdigitated back contact solar cells |
US10801593B2 (en) | 2017-04-26 | 2020-10-13 | Paratech, Incorporated | Strut extender mechanism |
CN108831953B (en) * | 2017-05-04 | 2021-04-27 | 上海凯世通半导体股份有限公司 | How to make a solar cell |
US10714652B2 (en) * | 2017-06-21 | 2020-07-14 | Alliance For Sustainable Energy, Llc | Methods of forming interdigitated back contact layers |
JP2019110185A (en) * | 2017-12-18 | 2019-07-04 | 株式会社アルバック | Manufacturing method of solar battery |
CN110010451A (en) * | 2018-01-05 | 2019-07-12 | 上海凯世通半导体股份有限公司 | Doping method |
CN110010719B (en) * | 2018-01-05 | 2021-02-19 | 上海凯世通半导体股份有限公司 | Doping method |
CN110098279A (en) * | 2018-01-30 | 2019-08-06 | 上海凯世通半导体股份有限公司 | The production method of solar battery |
EP3624204B1 (en) * | 2018-09-13 | 2023-04-26 | IMEC vzw | Selective deposition for interdigitated patterns in solar cells |
CN109509813A (en) * | 2018-11-26 | 2019-03-22 | 东方日升(常州)新能源有限公司 | A kind of preparation method of the p-type all back-contact electrodes contact crystal silicon solar battery of no exposure mask |
CN109671790A (en) * | 2018-12-25 | 2019-04-23 | 浙江晶科能源有限公司 | A kind of N-type double-sided solar battery and preparation method thereof |
US11267699B2 (en) * | 2019-02-21 | 2022-03-08 | Invensense, Inc. | Modification to rough polysilicon using ion implantation and silicide |
US11329087B2 (en) | 2020-03-25 | 2022-05-10 | Globalfoundries U.S. Inc. | Photodetectors with adjacent anode-cathode pairs |
US20230220226A1 (en) | 2020-05-27 | 2023-07-13 | Ricoh Company, Ltd. | White ink, non-white ink, ink set, printing set, printing method, and printing apparatus |
CN113871494B (en) * | 2020-06-30 | 2024-03-15 | 泰州隆基乐叶光伏科技有限公司 | Solar cell and manufacturing method thereof |
CN111816727A (en) * | 2020-07-14 | 2020-10-23 | 普乐新能源科技(徐州)有限公司 | An Interdigitated Back Contact Heterojunction Solar Cell Based on High Efficiency Doped Amorphous Silicon Technology Based on LPCVD |
CN111739984A (en) * | 2020-08-10 | 2020-10-02 | 浙江晶科能源有限公司 | Solar cell and method of making the same |
EP4195299A1 (en) * | 2021-12-13 | 2023-06-14 | International Solar Energy Research Center Konstanz E.V. | Interdigitated back contact solar cell and method for producing an interdigitated back contact solar cell |
CN114883424B (en) * | 2022-05-25 | 2023-11-21 | 中国科学院电工研究所 | A method for preparing a fully back-contact crystalline silicon heterojunction solar cell structure based on screen printing |
CN117410385B (en) * | 2023-12-14 | 2024-02-27 | 金阳(泉州)新能源科技有限公司 | A method for preparing a jointly passivated back contact battery by removing part of the mask layer |
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-
2014
- 2014-12-05 US US14/562,159 patent/US9401450B2/en active Active
- 2014-12-08 KR KR1020167014749A patent/KR102407023B1/en active IP Right Grant
- 2014-12-08 JP JP2016520002A patent/JP6636913B2/en active Active
- 2014-12-08 BR BR112016013216-5A patent/BR112016013216B1/en active IP Right Grant
- 2014-12-08 EP EP14869894.7A patent/EP3080847B1/en active Active
- 2014-12-08 MY MYPI2016000904A patent/MY192488A/en unknown
- 2014-12-08 MX MX2016006973A patent/MX2016006973A/en active IP Right Grant
- 2014-12-08 CN CN201480056579.1A patent/CN105659395B/en active Active
- 2014-12-08 WO PCT/US2014/069169 patent/WO2015088992A1/en active Application Filing
- 2014-12-08 AU AU2014364086A patent/AU2014364086B2/en active Active
- 2014-12-09 TW TW103142921A patent/TWI655676B/en active
-
2016
- 2016-05-19 ZA ZA2016/03437A patent/ZA201603437B/en unknown
- 2016-06-02 PH PH12016501052A patent/PH12016501052A1/en unknown
- 2016-06-06 SA SA516371270A patent/SA516371270B1/en unknown
- 2016-06-29 US US15/197,616 patent/US9716205B2/en active Active
-
2019
- 2019-12-19 JP JP2019229344A patent/JP7028853B2/en active Active
Patent Citations (2)
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WO2011109058A2 (en) * | 2010-03-04 | 2011-09-09 | Sunpower Corporation | Method of fabricating a back-contact solar cell and device thereof |
US20110237022A1 (en) * | 2010-03-25 | 2011-09-29 | Varian Semiconductor Equipment Associates, Inc. | Implant alignment through a mask |
Non-Patent Citations (1)
Title |
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See also references of WO2015088992A1 * |
Also Published As
Publication number | Publication date |
---|---|
ZA201603437B (en) | 2018-11-28 |
KR102407023B1 (en) | 2022-06-10 |
JP6636913B2 (en) | 2020-01-29 |
TWI655676B (en) | 2019-04-01 |
AU2014364086B2 (en) | 2019-06-20 |
WO2015088992A1 (en) | 2015-06-18 |
BR112016013216A2 (en) | 2017-08-08 |
PH12016501052B1 (en) | 2016-08-15 |
MY192488A (en) | 2022-08-23 |
PH12016501052A1 (en) | 2016-08-15 |
US20160315214A1 (en) | 2016-10-27 |
JP2020092269A (en) | 2020-06-11 |
EP3080847B1 (en) | 2019-04-10 |
TW201528344A (en) | 2015-07-16 |
US20150162483A1 (en) | 2015-06-11 |
SA516371270B1 (en) | 2021-01-14 |
US9716205B2 (en) | 2017-07-25 |
JP7028853B2 (en) | 2022-03-02 |
JP2017504950A (en) | 2017-02-09 |
EP3080847A1 (en) | 2016-10-19 |
BR112016013216B1 (en) | 2022-06-14 |
AU2014364086A1 (en) | 2016-03-24 |
MX2016006973A (en) | 2016-09-27 |
CN105659395A (en) | 2016-06-08 |
US9401450B2 (en) | 2016-07-26 |
KR20160096084A (en) | 2016-08-12 |
CN105659395B (en) | 2018-02-02 |
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