EP3062589B1 - Procédé de génération d'un plasma pulsé - Google Patents

Procédé de génération d'un plasma pulsé Download PDF

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Publication number
EP3062589B1
EP3062589B1 EP16165871.1A EP16165871A EP3062589B1 EP 3062589 B1 EP3062589 B1 EP 3062589B1 EP 16165871 A EP16165871 A EP 16165871A EP 3062589 B1 EP3062589 B1 EP 3062589B1
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Prior art keywords
plasma
anode
channel
cathode
flow
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German (de)
English (en)
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EP3062589A1 (fr
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Nikolay Suslov
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Plasma Surgical Inc
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Plasma Surgical Inc
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3452—Supplementary electrodes between cathode and anode, e.g. cascade
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3457—Nozzle protection devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3484—Convergent-divergent nozzles

Definitions

  • the present invention relates to plasma generating methods for producing pulsed plasma for applications requiring pure plasma.
  • Plasma generating devices play an Important role in many areas.
  • plasma is used in displays, such as television sets and computer monitors, spectrography, in spraying applications such as coating, and in medicine.
  • plasma can be effectively used in the medical field for cutting, coagulation, and vaporization of tissues.
  • the generated plasma has to have precise characteristics, such as velocity, temperature, energy density, etc.
  • plasma used for medical applications has to be pure. In other words, it should contain only particles of the ionized plasma generating gas and no other particles, such as materials separated from various parts of the plasma-generating device during operation.
  • Plasma may have different effects when it comes in contact with a skin surface depending on, among others, the temperature increase that it produces on the surface of the skin. For example, increasing the temperature by approximately 35° - 38° C has a wrinkle reducing effect. Increasing the temperature by approximately 70° C removes the epidermis layer, which may be useful in plastic surgery. It has been recognized that a continuous plasma flow, suitable for cutting, coagulating, and evaporation of tissues, is not suitable for other types of tissue treatment in general, and for skin treatment in particular. Instead, to avoid undesired skin damage that would result from using continuous plasma flow, pulsed plasma is used. Two types of device that may be used for this purpose are presently known in the art.
  • the device disclosed in U.S. Patent No. 6,629,974 is an example of the first type.
  • plasma is generated by passing plasma generating gas, such as nitrogen, through an alternating electric field;
  • the alternating electric field creates a rapid motion of the free electrons in the gas.
  • the rapidly moving electrons strike out other electrons from the gas atoms, forming what is known as an electron avalanche, which in turn creates a corona discharge.
  • pulsed corona discharge is generated.
  • a truly pulsed flow refers to a flow that completely ceases during the off period of the pulse.
  • a drawback of devices and methods of the first type is that the generated corona discharge has a fixed maximum temperature of approximately 2000° C.
  • the corona discharge formed in the device never becomes a high temperature plasma.
  • the rate of plasma generating gas flow has to be relatively high.
  • using argon in such a device requires a flow of approximately 20 liters/min to achieve the required energy. That flow rate is impracticable for skin treatment.
  • nitrogen is used for generating plasma, the required energy can be achieved with a flow rate of only about 5 liters/min, but even this rate will create discomfort for a patient. Accordingly, the applications of devices of the first type are limited by the nature of the electrical discharge process that is capable of producing a corona discharge.
  • Devices of the second type generate plasma by heating the flow of plasma generating gas passing through a plasma channel by an electric arc that is established between a cathode and an anode that forms the plasma channel.
  • An example of a device of the second type is disclosed in U.S. Patent No. 6,475,215 .
  • the plasma generating gas preferably argon
  • a pulsed DC voltage is applied between the anode and the cathode.
  • a predetermined constant bias voltage may or may not be added to the pulsed DC voltage.
  • the number of free electrons in the plasma generating gas increases, resulting in a decrease in the resistance of the plasma and an exponential increase of the electric current flowing through the plasma.
  • the number of free electrons in the plasma generating gas decreases, resulting in an increase in resistance of the plasma and an exponential decrease in the current flowing through the plasma.
  • the standby current is undesirable because a truly pulsed plasma flow is not generated.
  • a continuous low-power plasma flow is maintained. In essence, the device does not generate pulsed plasma, but rather a continuous plasma flow with power spikes, called pulses, thus simulating pulsed plasma.
  • the device Because the off period is substantially longer then a pulse, the device outputs a significant amount of energy during the off period and, therefore, it cannot be utilized effectively for applications that require a truly pulsed plasma flow. For example, if the device is used for skin treatment, it may have to be removed from the skin surface after each pulse, so that the skin is not exposed to the low power plasma during the off period. This impairs the usability of the device.
  • Difficulties in generating a truly pulsed plasma flow by the means of heating the plasma generating gas with an electric arc are primarily due to the nature of processes occurring on the electrodes. In general, and for medical applications especially, it is critical to ensure operation free from the erosion of the anode and the cathode when the current rapidly increases. During the rapid current increase the temperature of the cathode may be low and not easily controlled during subsequent repetitions of the pulse.
  • the area of attachment of the arc to the cathode strongly depends on the initial temperature of the cathode. When the cathode is cold, then the area of attachment is relatively small.
  • the temperature of the cathode increases, so that during the period of a rapid current increase the area of attachment expands over the entire surface area of the cathode and even the cathode holder. Under these circumstances the electric potential of the cathode begins to fluctuate and the cathode erosion begins. Furthermore, if the area of attachment of the electric arc reaches the cathode holder it begins to melt thus introducing undesirable impurities into the plasma flow.
  • Plasma has to be pure, free from any electrode materials or other impurities.
  • properties of the generated pulse of plasma have to be controlled. Initially, by controlling the duration, voltage and current of the pulse the energy transferred by the pulse can be controlled. For some applications, such as skin treatment, merely controlling the energy transferred in the pulse is not enough; the energy and temperature have to be distributed substantially uniformly over the treated area.
  • US3,413,509 relates to an invention which aims to provide an arc electrode assembly which is adapted to stable operation at higher powers and with larger dimension than other devices. This object is achieved in part through the use of buffer electrodes adjacent the cathode and anode.
  • a system for generating pulsed plasma generally comprises a console 100 and a hand piece 200.
  • Hand piece 200 is sometimes referred to herein as the device.
  • Console 100 supplies electricity, plasma generating gas, preferably argon, cooling agents, such as water, and/or oxygen carrying gas, such as air, etc. to hand piece 200. Additionally, console 100 may contain one or more pumps that may be used to remove extraneous matter from the treated surface with the device 200 via one or more suction channels.
  • Console 100 has control circuitry for operating hand piece 200 and a user interface comprised of a display and controls, which are generally known in the art.
  • An operator such as a trained medical professional, programs the mode of operation of the device with the controls of console 100 in accordance with parameters for a given medical procedure, and then uses hand piece 200 to perform the given procedure.
  • a trained medical professional programs the mode of operation of the device with the controls of console 100 in accordance with parameters for a given medical procedure, and then uses hand piece 200 to perform the given procedure.
  • FIG. 2A shows a longitudinal cross section of one embodiment of the device.
  • casing 9 forms the outside of the device.
  • device 200 is cylindrical and all elements are annular and are arranged coaxially with respect to the axis of the device 50. In some embodiments, however, the device may not be cylindrical and a different internal or external geometry may be used.
  • the embodiment of the device shown in FIG. 2A comprises anode 1 and one or more cathodes 5a, 5b, 5c, preferably made of tungsten containing lanthanum, arranged in a cathode holder 6.
  • the cathode holder 6 prevents undesired angular displacement of the cathode from the axis of the device 50.
  • Cathode holder 6 also holds a portion of conductor 7, which is preferably a rod made of metal with high electric conductivity. Crimping of the components of the cathode assembly together during manufacture is one means for preventing displacement of the cathode along the axis 50.
  • the entire cathode assembly comprised of cathodes 5a, 5b, 5c, cathode holder 6, and electric conductor 7, is tightly fitted inside device 200 to prevent any movement of cathodes 5a, 5b, 5c.
  • Cathode insulator 11 surrounds longitudinal portions of cathode 5a, 5b, 5c. Cathode insulator 11 extends from the surface of the cathode holder 74 closest to the anode on one end to a point part way along the cathodes. Cathode insulator 11 is made of a material that provides both thermal and electrical insulation of cathode 5a, 5b, 5c. Electrical conductor 7 is used to supply electric potential to cathodes 5a, 5b, 5c. Cathodes 5a, 5b, 5c are electrically connected and always have the same electric potential. Insulator element 8 surrounds conductor 7 and a portion of cathode holder 6 as shown in FIG. 2A .
  • Insulator element 8 provides electrical insulation of conductor 7, and is preferably made of vinyl.
  • a passage 72 enables the flow of the plasma generating gas from console 100 along insulator 8. The gas then flows along space 54 between insulator 8 and water divider 10. Then, the gas flows through groove 56 in cathode holder 6, and then along cathodes 5a, 5b, 5c, inside the cathode insulator 11.
  • the cathode assembly may be the one shown in FIG. 4 .
  • the cathode assembly comprises two or more cathodes.
  • the cathode assembly comprises three cathodes 5a, 5b, 5c.
  • the diameter of each cathode is 0.5 mm.
  • the combined diameter of the three cathodes in the preferred embodiment is approximately I mm.
  • At least one of the cathodes has a different length compared to other cathodes of the cathode assembly.
  • each cathode has a different length from all other cathodes in the assembly.
  • the difference in length between two cathodes that have the closest lengths preferably equals to the cathode diameter, which is 0.5 mm in the preferred embodiment.
  • the difference in length among the cathodes creates a natural surface imperfection to which the electric arc tends to attach.
  • a cathode assembly with a single cathode may be used, but such an embodiment is limited to certain applications that require a limited number of pulses. Cleaning of substrate surfaces with plasma pulses in microchip manufacturing is one such application.
  • the embodiment of the device with the cathode assembly with a single cathode is suited to generate at most 300 - 500 pulses. After about 500 pulses, the temperature in the entire cathode body increases. This leads to an expansion of the area of contact between the plasma and the cathode surface when the arc is started. As a result, the plasma comes in contact with the cathode holder.
  • the cathode holder begins to melt, it damages the cathode at the point where the cathode and the cathode holder are connected, creating an imperfection in that spot on the cathode.
  • the electric arc tends to attach to that imperfection, instead of the tip of the cathode, which disrupts the normal process of pulsed plasma generation and results in operational instability of the device.
  • the device After the device cools down to room temperature, it is capable of generating another train of 300 - 500 pulses. Therefore, this alternative embodiment may be used for applications that require a limited number of pulses not exceeding approximately 500. The maximum number of pulses may be increased, but only insignificantly, by increasing the length of the cathode, thereby distancing the end of the cathode closest to the anode from the cathode holder.
  • the cathode may be "trained" in the continuous plasma mode before switching to the pulsed plasma.
  • Cathode training refers to the operation of the device in the continuous plasma mode, passing a high DC current through the cathode. Because initially, due to the geometry of the cathode and, in some embodiments the geometry of the plasma chamber, the electric arc attaches to the tip of the cathode, passing DC current through the tip of the cathode for a sufficiently long time creates a surface imperfection right at the tip of the cathode. After the cathode has been "trained,” when the device is switched to the pulsed plasma mode, the electric arc attaches to the imperfection at the tip of the cathode that was created by the "training.”
  • the plasma generating gas flows from console 100 to device 200.
  • the plasma generating gas enters the device through passage 72.
  • the plasma generating gas passes cathode insulator 11, it passes through a plasma channel 62.
  • This direction is referred to as the direction of the plasma flow.
  • the plasma generating gas passes plasma chamber 26 before it enters plasma channel 62.
  • Plasma channel 62 is formed by anode 1 and two or more intermediate electrodes.
  • the end of the plasma channel furthest from the cathodes is referred to as the anode end of the plasma channel; similarly the end of the plasma channel furthest from the anode is referred to as the cathode end of the plasma channel.
  • Plasma channel 62 has an outlet at the anode end.
  • plasma channel 62 is formed by anode I and intermediate electrodes 2, 3, and 4.
  • Intermediate electrode 4 also forms plasma chamber 26.
  • the electrode that forms plasma chamber 26 does not form a portion of plasma channel 62.
  • Insulators 14, 13, and 12 provide electrical insulation between pairs of adjacent electrodes. Insulator 14 provides electrical insulation between the anode I and intermediate electrode 2; insulator 13 provides electrical insulation between intermediate electrodes 2 and 3; and insulator 12 provides electrical insulation between intermediate electrodes 3 and 4.
  • Principles of plasma generation using a multi-electrode system are well known in the art.
  • FIG. 2B shows a longitudinal cross section transverse to the cross section shown in FIG. 2A of the embodiment of device 200 shown in FIG. 1 .
  • FIG. 2B shows a cooling system comprising inlet 76, forward coolant channel 78, circular cooling channel 42 (shown in FIG. 2A ), reverse coolant channel 79, and outlet 77.
  • a coolant preferably water, enters the device through inlet 76.
  • the coolant then traverses forward coolant channel 78 along plasma channel 62 in the direction of the plasma flow, from cathodes 5a, 5b, 5c to anode 1.
  • forward coolant channel 78 connects to circular channel 42, shown in FIG. 2A .
  • the coolant flows along circular channel 42 around anode 1.
  • circular channel 42 connects to reverse coolant channel 79.
  • the coolant flows along reverse coolant channel 79 in the direction opposite to the plasma flow, from anode 1 to cathodes 5a, 5b, 5c, and then exits the device through outlet 77.
  • FIG. 3 shows a coolant divider 10, which together with other elements forms forward coolant channel 78, circular channel 42, and reverse coolant channel 79.
  • Some embodiments of the device may comprise multiple cooling systems. Such embodiments also comprise multiple coolant dividers that would form the respective channels of other cooling systems.
  • FIG. 5 shows plasma chamber 26 in greater detail.
  • the geometry of the plasma chamber 26 is critical to proper functionality of the device.
  • Cathodes 5a, 5b, 5c tend to emit electrons from imperfections in their surfaces, for example their edges 68a, 68b, 68c, respectively.
  • a spark discharge has to be established between one of cathode edges 68a, 68b, 68c and a point on the inside surface of plasma channel 62. To accomplish this, the following condition has to be satisfied.
  • the distance between any of cathode edges 68a, 68b, 68c and a point on the inside surface of the plasma channel, for example point 64, must be less than or equal to the distance between any of cathode edges 68a, 68b, 68c and any other surface onto which an electric spark may terminate, such as the inside surface of plasma chamber 26 and the edge of the cathode insulator closest to anode 66. If the geometry of plasma chamber 26 and cathodes 5a, 5b, 5c shown in FIG. 5 is used, during the startup of the device, an electric spark occurs between cathodes 5a, 5b, 5c and a point on the inside surface of plasma channel 62, for example point 64. This ensures proper operation of the plasma generating process.
  • plasma chamber 26 also results in other benefits, such as decreasing the time required to achieve the arc discharge phase, which is critical for pulsed plasma, as described below. If device 200 is not subject to size constraints, which is the case for most skin treatment applications, the plasma chamber is optional.
  • FIG. 6 shows the structure of plasma channel 62.
  • Plasma channel 62 comprises heating portion 84, expansion portion 82, and anode portion 83.
  • Expansion portion 82 and anode portion 83 are used to expand the plasma flow to the required cross-sectional area for a given application.
  • Expansion portion 82 comprises one or more expansion sections. In the embodiment shown in FIG. 6 , expansion portion 82 comprises expansion sections 86, 88, and 90.
  • heating portion 84 is formed by two to five intermediate electrodes. In alternative embodiments, heating portion 84 may be formed by a single intermediate electrode or by six or more intermediate electrodes.
  • the diameter of heating portion 84, d hp is preferably in the range of 0.5 -1.5 mm.
  • the length of each electrode forming heating portion 84, l e_hp depends on d hp and is preferably in the range of d hp to 2 ⁇ d hp . The length of the entire heating portion depends on the flow rate of the plasma generating gas - a longer heating portion is required to heat a greater plasma generating gas flow.
  • the heating portion is formed by at least three intermediate electrodes.
  • the length of the entire heating portion, l hp may be approximated by multiplying the number of intermediate electrodes that are required to form the heating portion by the length of such an intermediate electrode, l e_hp .
  • the number of sections in expansion portion 82 depends on the diameter of the heating portion 84 and the diameter of anode portion 83, and is governed by the following relationship:
  • section 86 in FIG. 5 the value of d 0 , required to compute d 1 , is set to the diameter of the heating portion, d hp .
  • anode portion 83 The dimensions of anode portion 83 are preferably governed by the following relationships:
  • cross-sections of the plasma channel transverse to the longitudinal direction of the plasma channel are circles. In other embodiments, however, cross-sections may have a different geometric shape.
  • each section of the expansion portion is formed by a separate intermediate electrode.
  • a single intermediate electrode may form portions of two or more adjacent sections.
  • some intermediate electrodes may form a portion of a section, or an entire section, of the expansion portion, and other intermediate electrodes may form only portions of two or more adjacent sections.
  • intermediate electrode 3 forms section 86 (and heating portion 84), and intermediate electrode 2 forms sections 88 and 90.
  • Device 200 includes an extension nozzle.
  • extension nozzle 15 is affixed to the anode end of the device.
  • Extension nozzle 15 has extension channel 18, which extends the plasma channel.
  • a portion of the extension channel 18 is formed by tubular insulator element 17 made of a ceramic material or quartz.
  • Tubular insulator element 17 prevents the termination of an electric discharge in extension nozzle 15. That, in turn, prevents electrode materials from separating from extension nozzle 15 and entering the plasma flow during operation of device 200. This ensures the purity of the plasma exiting an extension channel from outlet 55.
  • the diameter of the portion of extension channel 18 formed by tubular insulator element 17 is preferably in the range of 1.0 - 1.3 times the diameter of anode portion 83 of plasma channel 62.
  • extension channel 18 is preferably 2-3 times its diameter.
  • extension nozzle 15 also has one or more oxygen carrying gas inlets 16 as shown in FIG. 2C .
  • Inlets 16 are used for supplying oxygen carrying gas, preferably air, to extension channel 18, which may be used for production of ozone, as described below.
  • the heating portion has a diameter of 1.0 mm and a length of 1.5 mm (which are governed largely by the flow rate of the plasma generating gas) and the desired diameter of the plasma flow exiting the device from the outlet of extension channel 55 is 4.8 mm.
  • the diameter of the extension channel would be 4.8 mm and its length may be set to any length in the range of 2 - 3 times its diameter, for example 14.0 mm.
  • the diameter of the extension channel should be 1.0 - 1.3 times the diameter of the anode portion of the plasma channel, and is preferably between 6 mm and 12 mm.
  • the diameter of the extension channel is 1.2 times the diameter of the anode portion of the plasma channel
  • the diameter of the anode would be 4.0 mm.
  • the length of the anode portion may be any length between 2 times its diameter and 5 times its diameter. In this example, when the length of the anode is set to 3 times its diameter, the length would be 12.0 mm.
  • the expansion portion expands the diameter of the plasma channel from the diameter of heating portion 84, which in this example is 1.0 mm, to the diameter of the anode portion of the plasma channel, which is 4.0 mm. Accordingly, in this example the expansion portion expands the diameter of the plasma channel by 3.0 mm. This expansion may be accomplished in a number of ways.
  • diameters of each section of the expansion portion may increase by the maximum c of 0.6 mm.
  • N s is 4.
  • the diameters of these sections are as follows: 1.6 mm, 2.2 mm, 2.8 mm, and 3.4 mm.
  • the lengths of the sections may be set to any values between one and two times the diameter. Accordingly, the length of the sections may be: 2.0 mm, 3.0 mm, 4.0 mm, and 5.0 mm, respectively. If the diameter increase of each section is chosen to be less than 0.6 mm, then more sections in the expansion portion are needed.
  • c may be set to the preferred value of 0.4 mm.
  • N s the number of sections in the expansion portion, N s , is 7.
  • the diameters of these sections are as follows: 1.4 mm, 1.8 mm, 2.2 mm, 2.6 mm, 3.0 mm, 3.4 mm, and 3.8 mm.
  • the lengths of the sections may be 3.5 mm, 4.5 mm, 5.5 mm, 6.5 mm, 7.5 mm, 8.5 mm, and 9.5 mm, respectively.
  • the expansion between the expansion section closest to the anode and the anode is only 0.2 mm, as opposed to 0.4 mm. This does not impair the functionality of the device.
  • the expansion from the heating portion to the first section may be 0.4 mm, and the expansion between other expansion sections and the anode may be 0.5 mm.
  • the intermediate electrodes, the anode, and the extension nozzle are annular, thus making the portions and sections of the plasma channel and the extension channel cylindrical.
  • other geometry of the device may be used.
  • the diameter of the cross section transverse to the longitudinal direction of the plasma channel which, for the purposes of this disclosure is the largest distance between any two points of a shape, remains the critical dimension for purposes of the foregoing calculations.
  • FIG. 7A shows an embodiment of the device with a suction module.
  • outer casing 92 encloses the device shown in FIGs 2A-C .
  • Outer casing 92 has one or more suction channels 94, 96.
  • a pump operating inside console 100 sucks the extraneous matter from the treated tissue. The extraneous matter flows along channels 94 and 96, and then to console 100, where it is accumulated in a collection unit (not shown in FIG. 7A ).
  • FIG. 7B shows a different embodiment of the device with a suction module. This embodiment is similar to the embodiment shown in FIG. 7A except that channels 94 and 96 do not extend along the partial length of the device and are connected with outlet 98. Note that in embodiments that include both a suction module and an extension nozzle with oxygen carrying gas inlets, the inlets extend through casing 92 as illustrated in FIG. 7C that shows cross section A-A in FIG. 7A .
  • FIG. 7D shows cross section A-A in embodiments comprising an extension nozzle without oxygen carrying gas inlets.
  • the device generates truly pulsed plasma. After each plasma pulse, during the off period, the flow of plasma completely ceases until the next pulse. Between the pulses, during the off period, the electric current does not flow between the cathode and the anode and no plasma is generated.
  • Console 100 has one or more electronic circuits for controlling the current through the plasma channel and applying the voltage between the cathode and the anode. These circuits are used for generation of each plasma pulse.
  • the process of plasma generation includes three phases: a spark discharge, a glow discharge, and an arc discharge.
  • an electric arc of a predetermined current that is established between one of the cathodes and the anode, heats the plasma generating gas flowing in plasma channel 62 and forms plasma.
  • Generation of each plasma pulse requires the plasma generating gas to go through all three phases. Prior to generation of a pulse, the resistance of the plasma generating gas is close to infinity.
  • the plasma formation process is controlled by (1) applying the voltage applied between the cathode and the anode as shown in FIG. 8A and ( 2 ) controlling the current passing through the plasma as shown in FIG. 8B .
  • the method of operating the device depends on the structure of the cathode assembly and may be modified depending on the configuration of the device and a particular application for which it is used.
  • a method of operation specifically adapted for the cathode assembly shown in FIG. 4 is used. Briefly, to create a spark discharge a high amplitude, high frequency voltage wave is applied between anode 1 and cathodes 5a, 5b, Sc. This wave increases the number of free electrons in plasma channel 62, between cathodes 5a, 5b, 5c and anode 1.
  • the frequency, duration, and amplitude of the wave depends on the geometry of the device.
  • a DC voltage is applied between anode 1 and cathodes 5a, 5b, 5c and a DC current is passed through the cathodes, plasma generating gas, and the anode, forming a spark discharge between cathodes 5a, 5b, Sc and anode 1.
  • the resistance of the plasma generating gas drops and the glow discharge phase begins.
  • the glow discharge phase positively charged ions, formed as a result of ionization, are attracted to the cathode under the influence of the electric field created by the voltage between cathodes 5a, 5b, 5c and anode 1.
  • the temperature of the cathode ends closest to anode 1 increases.
  • the arc discharge phase begins.
  • the surface area and volume of plasma chamber 26 provide a large number of ions, which shortens the time of the glow discharge phase.
  • the plasma is attached to all cathodes in the assembly.
  • the current passing through the plasma is then dropped, causing the area of attachment to decrease to almost the minimum area of attachment capable of sustaining the arc discharge.
  • This minimal area is referred to as the spot attachment area.
  • the area of plasma attachment is small, the attachment occurs only at a single cathode. Therefore, the current required to sustain the arc discharge, which is proportional to the cathodes diameter, is relatively low.
  • the area of attachment of plasma increases insignificantly, and only a single cathode continues to emit electrons for the rest of the pulse. Decreasing the area of plasma attachment, and then maintaining the small area, so that only a single cathode emits electrons from a controlled area is critical to the operation of the device.
  • the area of attachment may only be controlled with the length of the cathode and tapering of the cathode end or cathode training.
  • the current is increased to the operational level as soon as the arc discharge phase is reached.
  • the geometry of elements in the disclosed embodiments and the shape and synchronization of the voltage and current pulses ensure that the cathodes (or the cathode, depending on the embodiment) are not subjected to the stress of high current being passed through it when there is no thermionic electron emission sufficient to support the current. That in turn ensures that the device may be started thousands or even tens of thousands times with the same cathode assembly.
  • FIG. 9 illustrates this concept.
  • the heating portion 84a transitions into anode portion 83a.
  • the diameter of the anode portion 83a exceeds the diameter of the heating portion 84a by more than 0.6 mm.
  • the plasma flowing in plasma channel 62a does not expand, or expands insufficiently, during the operational period of the pulse, when the plasma enters the anode portion 83a.
  • a very similar situation occurs when there is an expansion portion, but the difference in the diameter between adjacent sections exceeds 0.6 mm.
  • the plasma flow expands to the entire cross-section at the anode end of each section, so that the diameter of the plasma flow equals the diameter of the extension channel at the outlet 55.
  • increases of 0.6 mm and above may result in partially expanded plasma flow.
  • a single diameter increase has to be less than or equal to 0.6 mm so that the plasma flow fully expands to the increased diameter in each section.
  • FIG. 9 shows electric arc 171 formed between the plasma flow and the wall of the anode 1.
  • Such an electric arc would introduce electrode materials into the plasma flow and would make the plasma impure.
  • This process of gradual widening of the plasma flow plays a major role in generating a truly pulsed plasma flow, when the current in the arc rapidly increases while the plasma in the flow has not been heated sufficiently.
  • each expansion section has its minimal length requirements, so having a greater number of expansion sections means having a longer and less convenient device.
  • an increased number of expansion sections requires more energy and therefore greater power for heating the plasma flow that traverses a plasma channel the length of which is increased due to the increased number of the expansion sections. Accordingly, although the device would function properly even with increases of section diameters of less than 0.2 mm, it is preferable that each expansion is within the range of 0.2 - 0.6 mm.
  • the heating portion is characterized by a power density in the range of 0.3 - 5 kW/mm 3 , as shown in FIG. 8D .
  • the average velocity of the plasma flow in the heating portion is preferably less than or equal to 500 m/s.
  • the average temperature of the plasma is 8 -18° kK, preferably 10 - 16° kK, as shown in FIG. 8C .
  • the electric field in the heating portion is preferably in the range of 2 - 25 V/mm.
  • the expansion portion is characterized by a power density of less than 0.3 kW/mm 3 .
  • the average temperature of the plasma in the expansion portion preferably remains in the range of 8 - 18° kK.
  • the electric field in the expansion portion of the plasma channel is preferably within a range of 1 - 5 V/mm.
  • Extension nozzle 15 has a dual effect on plasma flow: first it changes the temperature and energy distribution of the plasma flow to make it suitable for a particular application, such as tissue treatment and second, it may create ozone and nitric oxide in the plasma flow.
  • the first effect of extension nozzle 15 on the plasma flow is changing the temperature and energy distribution of the plasma flow.
  • the electric arc between the cathode and the anode heats the plasma in plasma channel 62. Only a small fraction of the plasma forms the center of the plasma flow where the temperature is high. The remaining plasma flows along the periphery of the plasma channel at a distance from the electric arc, and therefore has a substantially lower temperature.
  • the plasma flowing along the periphery of the plasma channel cannot be heated to the same temperature as the plasma flowing in the center because the intermediate electrodes and the anode forming the plasma channel are made of metals with a high thermal conductivity.
  • the heat transferred from the plasma flowing in the center to the plasma flowing along the periphery is transferred to the intermediate electrodes and the anode and is not retained by the plasma flowing along the periphery.
  • the plasma reaches the anode end of plasma channel 62, it has a substantially parabolic temperature distribution as shown in FIG. 10A .
  • the temperature of the plasma in the center of the plasma flow is substantially higher than the temperature at the periphery of the plasma flow.
  • the energy density of the plasma which is proportional to the temperature, is substantially higher in the center of the plasma flow than at the periphery.
  • FIG. 10B shows circular area 190 of the skin having the diameter of the plasma channel in the anode portion. If a pulse of plasma flow as shown in FIG. 10A comes in contact with area 190, an approximately 20% fraction 192 of area 190 absorbs approximately 80% of the energy stored in the plasma pulse. The remaining 80% fraction 194 of area 190 absorbs only about 20% of the energy stored in the plasma pulse.
  • the extension nozzle changes the temperature and energy density distribution to a substantially uniform one as illustrated in FIG. 11A .
  • the temperature and energy density of the plasma flow that exits the extension nozzle from outlet 55 is approximately the same in the entire cross section of the flow.
  • FIG. 11B illustrates an area of skin treated with a plasma flow having the distribution shown in FIG. 11A .
  • the geometry of the elements in the device as well as operational parameters i.e. plasma generating gas flow rate, magnitude of the current, etc.
  • the plasma when the plasma exits the anode and enters the extension channel; its temperature and energy density have a parabolic distribution as shown in FIG. 10A .
  • One of the main reasons that the plasma flow does not achieve uniform temperature in the plasma channel is that intermediate electrodes and the anode are made of metal, such as copper, having a high thermal conductivity. Due to the high thermal conductivity, the heat from the plasma is transferred to the coolant flowing along channels 78 and 79. Anode 1 and the intermediate electrodes intensively cool the periphery of the plasma, thus forming a large temperature gradient.
  • Insulator element 17 located in extension channel 18, is preferably made of quartz or a ceramic material that has a very low thermal conductivity.
  • the heat is not distributed through the entire volume of insulator element 17. Only the inside surface of the insulator element 17 that comes in contact with the heated plasma is rapidly heated to the temperature of the plasma and is not cooled down. Because there is minimal heat dissipation to the extension nozzle, the temperature of the plasma flowing along the periphery increases. As the heat is transferred from the center of the flow to the periphery, the heat is not transferred to the structural elements of the device. Also, in extension channel 18 the center of the plasma flow is not heated by the electric arc, which terminates at the anode. Accordingly, when the plasma flow exits extension channel outlet 55, it has a substantially uniform temperature and energy density distribution as shown in FIG. 11A. FIG. 11B shows that the substantially uniform temperature and energy density distribution results in the substantially uniform effect by the plasma on the treated tissue.
  • the second, optional, effect of the extension nozzle is generating ozone and nitric oxide.
  • ozone exhibits properties useful in medicine such as, for example, an antibacterial effect. In other countries, however, the benefits of ozone have not been recognized.
  • ozone may be formed from oxygen by electrical discharges, high temperature, and exposure to high energy electromagnetic radiation. When O 2 molecules are introduced in the plasma flow, some of them are disassociated into oxygen atoms under the influence of one or more of the above conditions, and then recombine with O 2 molecules to form ozone (O 3 ).
  • the device generates ozone, while in other embodiments, the device does not generate ozone.
  • Generation of ozone may be controlled in two ways. First, the inlet of oxygen carrying gas may be controlled by reducing the diameter, or even completely eliminating oxygen carrying gas inlets.
  • FIG. 12A illustrates extension nozzle 15 with inlets 16 of relatively small diameter.
  • FIG. 12B illustrates extension nozzle 15 having no oxygen carrying inlets at all.
  • the length of the extension channel 18 can be reduced so that oxygen entering through the inlets does not have time to undergo the reactions required to generate ozone. It should be understood that by using one of both of these ways of controlling generation of ozone, the amount of ozone generated by device 200 may be increased, reduced, or even completely eliminated.
  • generation of nitric oxide is controlled the same ways. The following discussion related to generation of ozone and nitric oxide presumes that extension nozzle 15 has one or more oxygen and nitrogen carrying gas inlets 16.
  • the plasma flow after having traversed the plasma channel, enters extension nozzle 15.
  • the temperature of the plasma flow in the extension channel drops preferably to 3-12° kK.
  • the fraction of air is preferably In the range of 5-25%, by volume. It is well known that air contains approximately 21% of O 2 oxygen by volume, and therefore, the fraction of O 2 in the extension channel is preferably in the range of 1-5%, by volume.
  • oxygen molecules will disassociate into atoms and then recombine with O 2 oxygen molecules, or sometimes with other disassociated oxygen atoms, to form ozone under the influence of two factors: (1) impacts of O 2 molecules with electrons that have a relatively high energy and (2) the ultra-violet radiation from the plasma channel due to the emission of plasma generating gas molecules, electrons, and other particles.
  • the formation of the ozone molecules occurs in accordance with the following chemical reactions:
  • nitric oxide NO
  • U.S. Pat. No. 5,396,882 discloses systems and methods for producing NO by introducing air into electric arc chamber.
  • Embodiments of the device having an expansion module likewise, create conditions for producing NO.
  • Introducing a nitrogen and oxygen carrying gas, such as air, into the plasma flow creates optimal conditions for the synthesis of NO in the expansion channel 18.
  • the temperature of the plasma at the anode outlet is in the range of 3° - 12° kK. This temperature is sufficiently high for the following chemical reaction to occur in the plasma flow having air molecules, concurrently with the ozone production: N 2 + O 2 ⁇ 2NO - 180.9 kJ.
  • the fraction of air, oxygen or both may be varied.
  • air enriched with oxygen may be supplied to the oxygen carrying gas inlets 16.
  • air supplied to the oxygen carrying gas inlets 16 may be pressurized, thus resulting in a higher concentration of air in the plasma.
  • the combination of the two above methods may be used.
  • the device In addition to outputting plasma, and in some embodiments ozone and nitric oxide, the device also emits light due to the radiation from the high temperature plasma in the heating portion of the plasma channel. It has been discovered and disclosed in, for example, U.S. Pub. No. 2003004556 that a pulsed light having a dominant emissive wavelength from about 300 nm to about 1600 nm, where the duration of pulses range between 1 femtosecond to 100 seconds has various therapeutic effects. Among others, treatment of hair, epidermis, sub-surface blood vessels, and many other organs has been shown beneficial with such pulsed light. U.S. Pub. No. 2003004556 discloses various devices and methods for producing the pulsed light with required characteristics.
  • the temperature of plasma in the heating portion is preferably between 8 - 18° kK. In this temperature range, the plasma flow emits light having a dominant emissive wavelength from about 400 nm to about 850 nm.
  • FIG. 13 shows spectral distribution of light 302 at the distance of about 3 mm from outlet 55 and spectral distribution of light 304 at the distance of about 30 mm from the outlet 55.
  • FIG. 13 shows the following spectral distribution:
  • device 200 may be used for pulsed light therapy in conjunction with its other uses.
  • the ratio of shorter wavelengths to longer wavelength in the spectrum of the emitted light may be easily changed by adjusting the magnitude of the current passing through the plasma flow during operational periods of pulses. With increased current, approximately the same amount of energy is used for plasma generation, but substantially more energy is used for light emission.
  • the device may be used safely and effectively without the need to remove it from the treated tissue after each pulse, as has to be done with some prior art devices. Therefore, pulses of plasma may be generated automatically with relatively high frequency.
  • a new plasma flow is generated by first passing through spark discharge and glow discharge phases, and then heating the plasma generating gas with an electric arc during the arc discharge phase.
  • the plasma flow is established, it is expanded in the plasma channel by passing through the sections of the expansion portion, then the anode portion, and then the extension channel.
  • the thermal and energy density distribution of the plasma flow is modified to be substantially uniform across the cross section of the extension channel, as described above. The expanded plasma flow with the modified thermal energy distribution is safely applied to the patient's skin for the duration of the pulse.
  • the light radiation which is generated may provide benefits for treating the skin and sub-surface organs, such as dermis and blood vessels, in addition to the benefits resulting from the plasma pulses.
  • Extraneous matter is removed from the surface of the treated skin. Removal of extraneous matter does not have to be synchronized with pulses and may be a continuous operation. Additionally, ozone may be mixed into the plasma flow applied to the patient's skin for additional beneficial effects. As discussed above, introducing an oxygen carrying gas in the inlets of the extension portion results in formation of ozone molecules in the plasma flow.
  • the plasma flow ceases completely until the next pulse.
  • plasma is not applied to the patient's skin and the patient is affected only by the harmless flow of a cool plasma generating gas and the vacuum suction of the extraneous matter pump. Accordingly, an operator using the device does not risk errors associated with removal of the device from a patient's skin during the offperiod and then attempting to correctly reposition the device to continue treatment. This substantially improves the safety and the duration of the procedure.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Radiation-Therapy Devices (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electrotherapy Devices (AREA)

Claims (10)

  1. Procédé de génération d'impulsions de plasma à l'aide d'un dispositif (200) comprenant un ensemble cathodique comprenant de multiples cathodes (5a, 5b, 5c) et une anode (1), le procédé comprenant :
    a. le passage d'un gaz générateur de plasma de l'ensemble cathodique (5a, 5b, 5c), à travers un canal plasma (62), et vers l'anode (1), et la réalisation de manière répétée des étapes suivantes :
    b. la génération d'une décharge d'étincelles en appliquant une onde de tension de haute fréquence et de grande amplitude entre l'anode (1) et l'ensemble cathodique (5a, 5b, 5c) ;
    c. la génération d'une décharge luminescente en appliquant une tension transitoire entre l'anode (1) et l'ensemble cathodique (5a, 5b, 5c) et en faisant passer un courant à travers l'ensemble cathodique (5a, 5b, 5c), le gaz générateur de plasma et l'anode (1), ce qui a pour effet de chauffer des extrémités de chacune des cathodes de l'ensemble cathodique (5a, 5b, 5c) de telle sorte que l'émission thermionique commence et qu'une décharge d'arc électrique est générée, le plasma étant attaché à toutes les cathodes de l'ensemble cathodique (5a, 5b, 5c) ;
    d. la diminution du courant pour réduire la zone de fixation du plasma de telle sorte que la fixation ne se produise qu'à une seule des cathodes de l'ensemble cathodique (5a, 5b, 5c) ;
    e. après une période de temps, l'augmentation du courant à un niveau opérationnel pendant une durée d'impulsion prédéterminée ; et
    f. l'arrêt de la décharge d'arc électrique en définissant la tension et le courant à zéro.
  2. Procédé selon la revendication 1, comprenant en outre la génération d'un flux de plasma pendant que la décharge d'arc électrique est établie entre la cathode unique de l'ensemble cathodique et l'anode.
  3. Procédé selon la revendication 2, comprenant en outre :
    deux ou plus de deux électrodes intermédiaires, les deux ou plus de deux électrodes intermédiaires formant au moins une partie du canal plasma, le canal plasma comprenant :
    une partie chauffante ;
    une partie d'expansion ; et
    une partie anode.
  4. Procédé selon la revendication 3, comprenant en outre :
    l'expansion du flux de plasma pour inhiber l'érosion des deux ou plus de deux électrodes intermédiaires, fournissant ainsi un flux de plasma qui est sensiblement exempt d'impuretés.
  5. Procédé selon la revendication 2, comprenant en outre :
    la commande d'une distribution thermique du flux de plasma en faisant passer le flux de plasma le long d'une surface à faible conductivité thermique afin d'isoler le flux de plasma contre le refroidissement.
  6. Procédé selon la revendication 2, comprenant en outre :
    en aval de l'anode, l'introduction dans le flux de plasma d'un gaz comprenant de l'azote et de l'oxygène à travers un canal du dispositif.
  7. Procédé selon la revendication 6, le plasma ayant une température comprise entre 3 et 12 kK dans une zone où le gaz comprenant de l'azote et de l'oxygène est introduit dans le flux de plasma.
  8. Procédé selon la revendication 6, le gaz comprenant de l'azote et de l'oxygène étant introduit sous une pression qui dépasse la pression atmosphérique.
  9. Procédé selon la revendication 6, comprenant en outre l'émission d'une lumière due au rayonnement du plasma.
  10. Procédé selon la revendication 9, la lumière ayant une longueur d'onde émissive dominante de 400 nm à 850 nm.
EP16165871.1A 2007-08-06 2007-08-06 Procédé de génération d'un plasma pulsé Active EP3062589B1 (fr)

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PCT/EP2007/006939 WO2009018837A1 (fr) 2007-08-06 2007-08-06 Dispositif de plasma pulsé et procédé de génération d'un plasma pulsé
EP07786582.2A EP2177092B1 (fr) 2007-08-06 2007-08-06 Dispositif de plasma pulsé
EP16165871.1A EP3062589B1 (fr) 2007-08-06 2007-08-06 Procédé de génération d'un plasma pulsé
EP11183953.6A EP2405721B1 (fr) 2007-08-06 2007-08-06 Dispositif à plasma pulsé

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EP11183953.6A Division EP2405721B1 (fr) 2007-08-06 2007-08-06 Dispositif à plasma pulsé

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Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9089319B2 (en) 2010-07-22 2015-07-28 Plasma Surgical Investments Limited Volumetrically oscillating plasma flows
ES2618375T3 (es) * 2010-07-22 2017-06-21 Plasma Surgical Investments Limited Flujos de plasma de oscilación volumétrica
US9036309B2 (en) 2010-09-16 2015-05-19 General Electric Company Electrode and plasma gun configuration for use with a circuit protection device
US8330069B2 (en) * 2010-09-16 2012-12-11 General Electric Company Apparatus and system for arc elmination and method of assembly
CN102548178A (zh) * 2010-12-07 2012-07-04 烟台龙源电力技术股份有限公司 电弧等离子体发生器
EP2689640B1 (fr) * 2011-02-25 2015-08-12 Nippon Steel & Sumitomo Metal Corporation Torche à plasma
US10157729B2 (en) 2012-02-22 2018-12-18 Lam Research Corporation Soft pulsing
JP2015513764A (ja) * 2012-02-28 2015-05-14 スルザー メトコ （ユーエス） インコーポレーテッド 延長カスケード・プラズマガン
US9150949B2 (en) * 2012-03-08 2015-10-06 Vladmir E. BELASHCHENKO Plasma systems and methods including high enthalpy and high stability plasmas
MX370385B (es) * 2013-03-15 2019-12-11 Massachusetts Gen Hospital Sintesis inspiratoria de oxido nitrico.
BR112015022468B1 (pt) * 2013-03-15 2022-11-01 The General Hospital Corporation Aparelho e método para síntese do gás óxido nítrico para inalação
JP5993338B2 (ja) * 2013-05-07 2016-09-14 長田電機工業株式会社 プラズマ殺菌装置
CN103648229A (zh) * 2013-11-22 2014-03-19 中国科学院力学研究所 一种电弧等离子体发生器及提高该发生器运行稳定性安全性的方法
US9594105B2 (en) 2014-01-10 2017-03-14 Lam Research Corporation Cable power loss determination for virtual metrology
US10950421B2 (en) 2014-04-21 2021-03-16 Lam Research Corporation Using modeling for identifying a location of a fault in an RF transmission system for a plasma system
BR112017007841B1 (pt) 2014-10-20 2022-11-08 The General Hospital Corporation Aparelho para gerar óxido nítrico
US9761459B2 (en) 2015-08-05 2017-09-12 Lam Research Corporation Systems and methods for reverse pulsing
EP3346806B1 (fr) * 2015-09-02 2020-07-22 FUJI Corporation Dispositif de génération de plasma à pression atmosphérique avec dispositif d'émission de lumière
CN105491779B (zh) * 2016-02-22 2017-09-29 衢州昀睿工业设计有限公司 一种电离协同的等离子体热解装置
RU2768488C2 (ru) 2016-03-25 2022-03-24 Дзе Дженерал Хоспитал Корпорейшн Системы доставки и способы для электрического плазменного синтеза оксида азота
EP4234018A3 (fr) * 2016-12-14 2023-11-01 Origin, Inc. Dispositif et méthode de production d'oxyde nitrique à haute concentration et basse température
CN106793440B (zh) * 2016-12-29 2023-07-28 中国航天空气动力技术研究院 一种大功率超高焓电弧加热器
MX2020010523A (es) 2017-02-27 2021-02-09 Third Pole Inc Sistemas y metodos para generar oxido nitrico.
EP4163253A1 (fr) 2017-02-27 2023-04-12 Third Pole, Inc. Systèmes et méthodes pour générer de l'oxyde nitrique
EP3585727B1 (fr) 2017-02-27 2022-03-16 Third Pole, Inc. Systèmes et méthodes pour la génération ambulatoire d'oxyde nitrique
JP7149954B2 (ja) * 2017-03-16 2022-10-07 エリコン メテコ（ユーエス）インコーポレイテッド プラズマガン用のニュートロードスタックの最適化された冷却
US10239038B2 (en) 2017-03-31 2019-03-26 The General Hospital Corporation Systems and methods for a cooled nitric oxide generator
CN107949139A (zh) * 2017-11-29 2018-04-20 中国航天空气动力技术研究院 一种串连式电弧等离子体发生器
CN108194293B (zh) * 2017-12-08 2019-09-27 北京交通大学 一种同轴式感应触发脉冲等离子体推进器
CN108079439A (zh) * 2017-12-29 2018-05-29 重庆半岛医疗科技有限公司 一种等离子治疗装置
CN109936904A (zh) * 2019-04-23 2019-06-25 武汉天和技术股份有限公司 一种分段式等离子体火炬阳极
EP3969416A4 (fr) 2019-05-15 2023-11-01 Third Pole, Inc. Systèmes et méthodes pour générer de l'oxyde nitrique
CN114269685A (zh) 2019-05-15 2022-04-01 第三极股份有限公司 用于一氧化氮生成的电极
CN110478236B (zh) * 2019-09-10 2024-08-02 烟台海灵健康科技有限公司 一种电灸头、包括其的电灸治疗仪及其使用方法
US11691879B2 (en) 2020-01-11 2023-07-04 Third Pole, Inc. Systems and methods for nitric oxide generation with humidity control
WO2021258025A1 (fr) 2020-06-18 2021-12-23 Third Pole, Inc. Systèmes et procédés de prévention et de traitement d'infections avec de l'oxyde nitrique
EP4205515A2 (fr) 2020-08-28 2023-07-05 Plasma Surgical Investments Limited Systèmes, procédés et dispositifs pour générer un flux de plasma étendu principalement radialement
CN113068295A (zh) * 2021-03-17 2021-07-02 电子科技大学 等离子体射流装置及等离子体切割系统
CN113350696B (zh) * 2021-06-10 2024-01-19 上海茜茜纤美美容科技有限公司 一种离子爆手具及系统
US11975139B2 (en) 2021-09-23 2024-05-07 Third Pole, Inc. Systems and methods for delivering nitric oxide
CN114068287B (zh) * 2021-10-26 2023-03-14 中国科学院上海有机化学研究所 一种能量可调的原位离子化方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61193783A (ja) * 1985-02-20 1986-08-28 Kawasaki Heavy Ind Ltd ガスシ−ルドア−ク溶接用ノズル
JPS61286075A (ja) * 1985-06-12 1986-12-16 Kawasaki Heavy Ind Ltd ガスシ−ルドア−ク溶接用ノズル
US3413509A (en) * 1966-04-27 1968-11-26 Xerox Corp Electrode structure with buffer coil
US4317984A (en) * 1978-07-07 1982-03-02 Fridlyand Mikhail G Method of plasma treatment of materials
JPS56152198A (en) * 1980-04-21 1981-11-25 Vysoka Skola Chem Tech Method and device for radially stabilizing and equalizing plasma stream
DE3578048D1 (de) * 1984-07-24 1990-07-12 Kawasaki Heavy Ind Ltd Duese zum lichtbogenschweissen unter schutzgas.
CA1237485A (fr) * 1985-02-20 1988-05-31 Shigetomo Matsui Ajutage pour le soudage a l'arc en atmosphere gazeuse
US5008511C1 (en) * 1990-06-26 2001-03-20 Univ British Columbia Plasma torch with axial reactant feed
US5396882A (en) 1992-03-11 1995-03-14 The General Hospital Corporation Generation of nitric oxide from air for medical uses
DE4105408C1 (fr) * 1991-02-21 1992-09-17 Plasma-Technik Ag, Wohlen, Ch
DE4105407A1 (de) * 1991-02-21 1992-08-27 Plasma Technik Ag Plasmaspritzgeraet zum verspruehen von festem, pulverfoermigem oder gasfoermigem material
SE503334C2 (sv) * 1993-06-01 1996-05-28 Nikval Int Ab Anordning för att stoppa en blödning och bilda en sårskorpa medelst en plasmastråle
JP3138578B2 (ja) * 1993-09-16 2001-02-26 日鐵溶接工業株式会社 多電極プラズマジェットトーチ
US6676655B2 (en) 1998-11-30 2004-01-13 Light Bioscience L.L.C. Low intensity light therapy for the manipulation of fibroblast, and fibroblast-derived mammalian cells and collagen
CN2413467Y (zh) * 1999-09-10 2001-01-03 北京航空工艺研究所 一种用于喷涂工艺的等离子发生器
US6629974B2 (en) 2000-02-22 2003-10-07 Gyrus Medical Limited Tissue treatment method
US6475215B1 (en) 2000-10-12 2002-11-05 Naim Erturk Tanrisever Quantum energy surgical device and method
CN2569514Y (zh) * 2002-09-09 2003-08-27 张芬红 等离子发生器
WO2006012165A2 (fr) * 2004-06-25 2006-02-02 H.C. Starck Inc. Appareil destine a generer un jet de plasma ainsi que procede d'utilisation associe
SE529058C2 (sv) * 2005-07-08 2007-04-17 Plasma Surgical Invest Ltd Plasmaalstrande anordning, plasmakirurgisk anordning, användning av en plasmakirurgisk anordning och förfarande för att bilda ett plasma
SE529053C2 (sv) * 2005-07-08 2007-04-17 Plasma Surgical Invest Ltd Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning

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EP2405721A2 (fr) 2012-01-11
CA2695650A1 (fr) 2009-02-12
CA2695650C (fr) 2015-11-03
CN101828432B (zh) 2013-11-06
EP3062589A1 (fr) 2016-08-31
JP5436424B2 (ja) 2014-03-05
WO2009018837A1 (fr) 2009-02-12
EP2177092B1 (fr) 2017-09-27
EP2405721B1 (fr) 2016-04-20
EP2177092A1 (fr) 2010-04-21
EP2405721A3 (fr) 2014-01-08
HK1165661A1 (zh) 2012-10-05
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