EP3009537A4 - Anode and high-speed plating device provided with same - Google Patents

Anode and high-speed plating device provided with same Download PDF

Info

Publication number
EP3009537A4
EP3009537A4 EP14810217.1A EP14810217A EP3009537A4 EP 3009537 A4 EP3009537 A4 EP 3009537A4 EP 14810217 A EP14810217 A EP 14810217A EP 3009537 A4 EP3009537 A4 EP 3009537A4
Authority
EP
European Patent Office
Prior art keywords
anode
same
device provided
plating device
speed plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP14810217.1A
Other languages
German (de)
French (fr)
Other versions
EP3009537A1 (en
Inventor
Yoshitaka Mochizuki
Toshihisa Miyazaki
Akira Takamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KYB Corp
Original Assignee
KYB Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KYB Corp filed Critical KYB Corp
Publication of EP3009537A1 publication Critical patent/EP3009537A1/en
Publication of EP3009537A4 publication Critical patent/EP3009537A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007—Current directing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
EP14810217.1A 2013-06-14 2014-06-06 Anode and high-speed plating device provided with same Withdrawn EP3009537A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013125552A JP6189655B2 (en) 2013-06-14 2013-06-14 Anode manufacturing method
PCT/JP2014/065049 WO2014199907A1 (en) 2013-06-14 2014-06-06 Anode and high-speed plating device provided with same

Publications (2)

Publication Number Publication Date
EP3009537A1 EP3009537A1 (en) 2016-04-20
EP3009537A4 true EP3009537A4 (en) 2017-03-22

Family

ID=52022203

Family Applications (1)

Application Number Title Priority Date Filing Date
EP14810217.1A Withdrawn EP3009537A4 (en) 2013-06-14 2014-06-06 Anode and high-speed plating device provided with same

Country Status (8)

Country Link
US (1) US20160108542A1 (en)
EP (1) EP3009537A4 (en)
JP (1) JP6189655B2 (en)
CN (1) CN105324521A (en)
BR (1) BR112015030429A2 (en)
MX (1) MX2015016094A (en)
TW (1) TWI646225B (en)
WO (1) WO2014199907A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6189656B2 (en) 2013-06-14 2017-08-30 Ｋｙｂ株式会社 Power supply member and high-speed plating apparatus including the same
JP6193005B2 (en) 2013-06-14 2017-09-06 Ｋｙｂ株式会社 Holding device and high-speed plating apparatus provided with the same
US11542626B2 (en) 2020-10-08 2023-01-03 Honeywell International Inc. Systems and methods for enclosed electroplating chambers
KR20240037387A (en) 2021-10-19 2024-03-21 히다치 아스테모 가부시키가이샤 Rod manufacturing method and anode device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5082543A (en) * 1989-11-16 1992-01-21 Peroxid-Chemie Gmbh Filter press electrolysis cell
US20010040090A1 (en) * 2000-01-19 2001-11-15 Tetsuya Kuroda Plating pretreatment apparatus and plating treatment apparatus
JP2002256497A (en) * 2001-03-05 2002-09-11 Daiso Co Ltd Insoluble anode
JP2013060658A (en) * 2011-08-25 2013-04-04 Yuken Industry Co Ltd Device for electroplating shaft, method for manufacturing shaft having plated film, and plating liquid for forming zinc-plated film on shaft

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6046195B2 (en) * 1979-04-13 1985-10-15 ヤマハ発動機株式会社 High speed plating device
US4543172A (en) * 1981-03-03 1985-09-24 Toshiyuki Suzuki High speed plating apparatus
DE10029837B4 (en) * 2000-06-16 2005-02-17 Degussa Galvanotechnik Gmbh Process for the production of unilaterally platinated plates and expanded metal gratings of refractory metals
ITMI20050373A1 (en) * 2005-03-09 2006-09-10 Nora Elettrodi S P A CYLINDRICAL ELECTRODE
JP4873695B2 (en) * 2006-04-14 2012-02-08 ダイソー株式会社 Hollow electrode with electrodeposition film

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5082543A (en) * 1989-11-16 1992-01-21 Peroxid-Chemie Gmbh Filter press electrolysis cell
US20010040090A1 (en) * 2000-01-19 2001-11-15 Tetsuya Kuroda Plating pretreatment apparatus and plating treatment apparatus
JP2002256497A (en) * 2001-03-05 2002-09-11 Daiso Co Ltd Insoluble anode
JP2013060658A (en) * 2011-08-25 2013-04-04 Yuken Industry Co Ltd Device for electroplating shaft, method for manufacturing shaft having plated film, and plating liquid for forming zinc-plated film on shaft

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2014199907A1 *

Also Published As

Publication number Publication date
MX2015016094A (en) 2016-05-31
JP2015001005A (en) 2015-01-05
BR112015030429A2 (en) 2017-08-29
JP6189655B2 (en) 2017-08-30
US20160108542A1 (en) 2016-04-21
EP3009537A1 (en) 2016-04-20
TWI646225B (en) 2019-01-01
TW201510292A (en) 2015-03-16
WO2014199907A1 (en) 2014-12-18
CN105324521A (en) 2016-02-10

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Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

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17P Request for examination filed

Effective date: 20151119

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20170222

RIC1 Information provided on ipc code assigned before grant

Ipc: C25D 17/12 20060101AFI20170215BHEP

Ipc: C25D 17/06 20060101ALI20170215BHEP

Ipc: C25D 7/00 20060101ALI20170215BHEP

Ipc: C25D 17/00 20060101ALI20170215BHEP

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN

18W Application withdrawn

Effective date: 20190102