EP2979276A1 - Phasenkontrast-röntgenbildgebungsvorrichtung und brechungsgitter für eine solche - Google Patents
Phasenkontrast-röntgenbildgebungsvorrichtung und brechungsgitter für eine solcheInfo
- Publication number
- EP2979276A1 EP2979276A1 EP14724384.4A EP14724384A EP2979276A1 EP 2979276 A1 EP2979276 A1 EP 2979276A1 EP 14724384 A EP14724384 A EP 14724384A EP 2979276 A1 EP2979276 A1 EP 2979276A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- refraction
- grating
- phase
- webs
- gradient
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/065—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using refraction, e.g. Tomie lenses
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
- G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
Definitions
- the invention relates to a phase-contrast X-ray imaging device, that is to say an X-ray device for phase-contrast imaging.
- the invention further relates to a diffraction grating for such.
- the X-ray device and the diffraction grating are provided in particular for phase contrast imaging in the medical field.
- the interaction of electromagnetic radiation in general, and X-ray radiation in particular, with a medium is usually described by specifying a complex refractive index.
- the real part and the imaginary part of the refractive index are each dependent on the material composition of the medium to which the complex refractive index is assigned. While the imaginary part reflects the absorption of the electromagnetic radiation in the medium, the real part of the refractive index describes the material-dependent phase velocity, and thus the refraction of the electromagnetic radiation.
- X-ray imaging devices usually detect only the material-dependent radiation absorption in an object to be examined, wherein the intensity of the transmitted X-ray transmitted through the object is recorded spatially resolved.
- a Talbot-Lau interferometer is typically used, as described, for example, in "X-ray phase imaging with a grating interferometer, T. Weitkamp et al. , August 8, 2005 / Vol. 13, No. 16 / OPTICS EXPRESS "is described.
- an X-ray source In a conventional Talbot-type interferometer, an X-ray source, a coherence grating G 0 , a phase grating (or diffraction grating) Gi, an analysis grating (or absorption grating) G 2, and an X-ray detector constructed of a plurality of pixels are arranged along an optical axis.
- the coherence grating G 0 serves to ensure sufficient spatial coherence of the X-ray source. Accordingly, the coherence grating G 0 can be dispensed with in the case of an approximately punctiform X-ray radiation source.
- the phase grating Gi With the aid of the phase grating Gi, which typically has a uniform striped structure, an interference pattern is generated whose intensity distribution is detected by means of the X-ray detector.
- the period of this interference pattern is typically significantly smaller than the size of the pixels of the X-ray detector, so that a direct detection of the interference pattern with the X-ray detector is not possible.
- the X-ray detector is therefore usually preceded by the analysis grid (or absorption grating) G 2 , by means of which the interference pattern can be scanned by spatial-periodic blanking of X-ray radiation.
- the analysis grid G 2 is displaced in a plane perpendicular to the optical axis and the structure of the interference pattern.
- the coherence grating G 0 or the phase grating Gi can also be shifted.
- the object to be examined is positioned between the X-ray source (and the optional coherence grating) on the one hand and the phase grating Gi on the other hand.
- the object can also be positioned between the phase grating Gi and the analysis grating G 2 .
- the object causes a location-dependent varying phase shift of the X-ray radiation, which measurably changes the interference pattern generated by the phase grating Gi.
- the changed interference pattern is detected in the manner described above by means of the X-ray detector. From the measured intensity distribution of the interference pattern is then calculated back to the location-dependent phase shift.
- the image information is either obtained directly from the phase.
- the image information may also be determined from the density (i.e., the integrated phase) or the angular spread (dark field).
- the phase contrast image is sometimes used with the simultaneously obtained absorption contrast image in order to reduce the image noise.
- phase-contrast X-ray imaging is that structures in the soft tissue (in particular tissue, water and body fats) usually stand out more in phase contrast than in absorption contrast.
- Talbot-Lau interferometers either cause a strong loss of intensity (and thus a high X-ray dose) or a poor visibility of the interference pattern (and thus a poor phase contrast measurement efficiency), depending on the absorption behavior of the analysis grid used.
- the invention has for its object to improve the phase contrast - X-ray imaging.
- the invention proceeds from the idea of modifying the usual construction of a Talbot-Lau interferometer by positioning, instead of the analysis grating G 2 or in addition thereto, a diffraction grating G L (also referred to as a lens grating) in the beam path of the X-ray radiation.
- the diffraction grating is configured in such a way that it breaks several adjacent, mutually corresponding structures (eg intensity maxima or intensity minima) of the interference pattern to a common focus, while structures lying between them (eg intensity minima or intensity maxima) of the interference pattern one of them spatially different focus will be broken.
- the basic concept of this idea has already been described in the predecessor application WO 2013/160 153 AI. The entire disclosure content of this predecessor application is - unless otherwise described below - also part of the present invention.
- the diffraction grating according to the invention in this case has a transverse surface, which is spanned by an x-axis and a y-axis perpendicular thereto, and which is to be aligned substantially (i.e., exactly or at least approximately) transversely to a radiation incident direction.
- the intended direction of radiation incidence defines a z-axis of the refraction grating, which in the intended installation position of the refraction grating is in particular parallel to an optical grating
- the transversal area can in principle be defined at any z-position (ie position along the z-axis) within the volume of space occupied by the refraction grid.
- the transverse surface is formed by the "front" end face of the refraction grating over which the radiation is incident in the diffraction grating.
- the axes introduced above span a Cartesian coordinate system.
- the spatial directions defined by the orientation of the x, y and z axes are referred to below as (positive) x, y or z direction.
- the respective opposite spatial directions are designated as (negative) as x, y or z direction.
- Positions on the x, y, and z axes are labeled as x, y, and z positions, respectively.
- the transverse surface is divided into elongated refraction strips in each case in the y-direction, which are lined up parallel next to one another in the x-direction.
- Adjacent refraction strips differ from one another in that they are always aligned with respect to the refractive properties of the grating material arranged in the region of this refraction strip to different focuses.
- the material of the refraction grating which is arranged along the z-axis above and / or below a refraction strip, is designed such that it breaks radiation of at least one specific design wavelength into a specific focus, while the material of the refraction grating, the along the z-axis above and / or below an adjacent one
- Refraction strip is arranged, the radiation breaks into another focus.
- the transverse surface and the refraction stripes formed on it are mathematically abstract structures.
- the radiation-refractive effect of the refraction grating is generated by a plurality of refraction webs of an optically comparatively thin base material (ie a solid having a relatively low real part of the refractive index for X-rays), these refractive webs being arranged alternately with optically comparatively dense interspaces. Due to the separating gaps, the refraction webs run within the transverse surface forcibly at least approximately parallel.
- the refractive webs are formed here from gold, nickel or silicon.
- the interspaces are optionally formed by gaps (air- or liquid-filled) or by intermediate webs of an optically comparatively dense material (ie a solid having a relatively large real part of the refractive index for X-rays), for example of photoresist.
- an optically comparatively dense material ie a solid having a relatively large real part of the refractive index for X-rays
- photoresist for example of photoresist.
- the surface areas respectively occupied by the refraction webs within the transversal surface are not congruent with the refraction stripes, which are defined only by the refractive properties of the refraction grating. Rather, according to the invention, the refraction webs are designed in such a way that they extend diagonally (ie obliquely) within the transverse surface at least in sections, that is to say at an angle exceeding 0 ° and falling below 90 ° to the y-axis.
- the at least sectionally diagonal course of the refraction webs in the transverse surface is characterized in that for at least one refraction web, the web of this refraction web in x-
- Direction limiting side surfaces extend within the transverse surface over at least two refraction strips. Since the refraction webs, due to the interspaces, must extend at least approximately parallel, this property necessarily extends to all refraction webs
- the side surfaces of all refraction webs preferably extend over a multiplicity of refraction stripes, in particular over all refraction stripes, apart from any edge effects.
- the "diagonal course" of the refractive webs in the transversal surface is characterized by the fact that at least one refraction web extends over at least four refraction stripes. This property also applies due to the at least approximately parallel course of the refraction stripes - of any edge effects Owing to the properties described above, the "diagonal layout" of the diffraction gratings of the invention differs qualitatively from the "stripe-shaped layout" of the diffraction gratings of the diffraction gratings given in WO 2013/160 153 A1 in the longitudinal direction of the refraction stripes, ie in y
- each refraction web always remain within the space assigned to a single refraction stripe, whereby the stripe-shaped refraction webs can extend over only two or at most three refraction stripes.
- the diffraction grating can be used according to the invention instead of the analysis grating of the conventional Talbot-Lau interferometer.
- the diffraction grating is arranged at its focal distance from the X-ray detector, so that the X-ray radiation is focused by the diffraction grating directly onto the individual pixels or pixel columns of the X-ray detector.
- the refraction grating as also already described in WO 2013/160 153 A1, can be interposed between the phase grating and the analysis grating. In this case, the X-radiation is focused through the diffraction grating on the slots and ridges of the analysis grid.
- the diffraction grating acts as a periodic arrangement of converging lenses, by which the interference pattern is coarsened. This allows the use of a correspondingly coarser and better absorbing in the grid bars analysis grid, whereby the visibility (visibility) is improved. This in turn makes it possible to reduce the picture noise and the x-ray dose, in particular in the case of high-energy (short-wave) X-ray radiation.
- the analysis grating is omitted, the absorption caused thereby is eliminated, whereby a reduction of the picture noise and the x-ray dose is also achieved, in particular with low-energy (long-wave) X-ray radiation.
- a diffraction grating can usually be manufactured with a smaller height than an analysis grating, the stripe width of the diffraction grating can be made smaller compared to the typical stripe width of an analysis grating. In this way, a larger (ie corresponding to a higher multiple of the Talbot distance) distance can be set between the phase grating and the refraction grating than between the phase grating and the analysis grating of a typical Talbot-Lau interferometer. This results in a higher (angular) sensitivity, whereby the disadvantage of a slightly lower visibility is outweighed. This allows a further improvement of the picture noise and / or a further reduction of the X-ray dose.
- the diffraction grating is preferably in a photolithographic production process, in particular dam so-called
- LIGA lithographic electroplating-molding
- a limiting factor for the production of the diffraction gratings is the aspect ratio, which is limited by production methods, and which, given the grating height in the z direction, can be determined by the minimum distances that can be established between the side grids. walls of the refractive webs is determined, namely - depending on the specific manufacturing process - by the minimum thickness of the refractive webs and / or the minimum thickness of the interstices.
- the diagonal layout of the refracting webs for a given grating height and given refractive properties of the refracting strips allows particularly large minimum distances between the sidewalls of the refracting webs to be maintained both within the refracting webs and between adjacent refracting webs.
- This in turn allows the production of refractive gratings with a particularly large grid height in the z-direction or a particularly small width of the refraction strips.
- Such refraction gratings enable the realization of phase-contrast X-ray imaging.
- the refraction webs are each formed in the manner of oblique prisms inclined in the y-direction, the base surface and top surface of which lie respectively in the end surfaces of the refraction grid parallel to the transversal surface.
- the diffraction grating in particular, as already described in WO 2013/160 153 A1, is produced by X-radiation by means of a photolithographic method, in particular LIGA, under oblique exposure of the photoresist layer.
- the base and the opposite top surface of the prism usually have a complex, polygonal shape here in each case.
- the refraction webs can be cut off to form azimuthally aligned edge surfaces, differing from a pure prism shape.
- the refractive webs are arranged in such a way that a material structure which repeats in the y direction with ay period period is produced in each refraction stripe.
- the refraction webs are thus designed such that they always occupy parallel-displaced, congruent and uniformly spaced surface sections in each refraction strip.
- the refraction webs are inclined in the y direction such that the cover surface of each refraction web opposite the base surface is offset from the base surface by an integer number of period lengths, in particular by exactly one period length.
- the two opposite in the z-direction end faces of the refraction grid thus have an identical layout, ie an identical formed of refraction webs and spaces material structure.
- the side surfaces of the refractive webs are each alternately composed of active sub-areas with comparatively strong refractive effect in the x-direction and passive sub-areas with little or vanishing refractive effect in the x-direction.
- the active partial surfaces can be regarded as refracting surfaces of (partial) prisms which, with their non-refractive back surfaces, are combined to form the multi-prism forming the respective refractive segment.
- the active and passive partial surfaces are preferably each formed by flat (non-curved) surface sections.
- the refractive effect of each partial area is determined by the associated gradient.
- Each active or passive partial surface preferably extends over an integral number of refraction strips within the transverse surface in the x-direction.
- the transition between active and passive sub-areas of a side surface thus preferably coincides with the transition between two refraction strips.
- Active and passive partial surfaces are preferably offset from one another on the two side surfaces of a refractive web.
- the other side surface of the same ridge thus has a passive sub-area and vice versa.
- refracting strips without refractive effect in the x-direction (neutral refraction strips), in which both side surfaces of a refraction ridge each have passive partial surfaces form an exception to this rule.
- the passive subfaces also have a small gradient (offset slope).
- this offset pitch is dimensioned such that the gradient Ay of the passive partial areas over a refraction strip, measured in the y direction, corresponds approximately to between 20% and 50%, preferably approximately 25%, of the strip width s L measured in the x direction (0.2 ⁇ Ay / s L -S 0.5).
- the offset slope of the passive sub-areas also causes a flattening of the angle formed between the active and passive sub-areas, which favors the technical manufacturability of the diffraction grating. Since the offset slope affects equally the upper and lower edges of a column, it does not change the phase shift coded thereby.
- the Offset increases a rectangle ("Gradient 0") into a parallelogram, which acts in the same way on the phase of the passing light as a rectangle, and the offset slope is suitably chosen to be the same between the upper edge and the lower edge of the material underneath.
- different columns may also have different additional gradients for edges that have an x-component (purely vertical jumps in the y-direction are not affected.)
- a column in the left and in the right part (in the x-direction) may have a different gradient Offset slope exists if there is a kink in between.
- each refraction web within the transverse surface extends in alternating sections diagonally in the positive y-direction and in the negative y-direction.
- the refraction webs thus have kinks.
- the refraction webs are alternately oppositely bent at regular intervals along the x-axis, so that the respective refraction web runs meandering within the transverse surface in the direction of the x-axis.
- the kinks are preferably provided in each case in the region of neutral or weakly refractive refraction strips.
- the course of each refraction web within the transverse surface thus changes the direction respectively to refraction stripes with a small or vanishing refractive effect.
- a uniformly predetermined number of refraction strips is assigned to a common position. kus aligned.
- the focused on a common focus refraction strips are referred to collectively as a focusing group.
- the focusing groups preferably each comprise an odd number of refraction stripes, for example 3, 5, 7 or 9 refraction stripes.
- Such a focusing group comprises a neutral refractive index with a vanishing refractive effect, around which the further refraction stripes of the focusing group are symmetrically arranged, the refraction effect of which in the x-direction increases with increasing distance to the neutral refraction strip.
- the refraction stripes of adjacent focusing groups are interleaved in this case.
- one or more of the design features described above are further provided in order to further increase the minimum spacings within the diffraction webs and between adjacent refractive webs and / or to optimize the optical properties of the diffraction grating:
- the gradient compression is realized by the active partial area is not guided over the full stripe width s L , but only over a proportion 1 / c (with c> 1) of this stripe width s L , while the active partial area in the z-direction preferably over the entire grid height h extends.
- the gradient compression changes at least then little if the intensity in the remaining edge of the refracting strip is relatively low. For example, if the high intensity stripes of the interference pattern formed by the phase grating Gi in the diffraction grating G L exactly fall on a stripe, the main intensity flows in the stripe center
- a method described in the application US 2012/0041679 A1 aims at aligning all grids in a computer tomograph based on phase-contrast imaging in such a way that in the absence of the patient in the beam, the bright stripes of the interference pattern generated by the phase grating Gi exactly on Strip boundaries of the analysis grid are aligned. For a full turn of the CT scanner (in the presence of the patient), the patient then strips once after e.g. right and (after 180 °
- the gradient compression is expediently carried out asymmetrically.
- it is expediently determined beforehand which gap boundaries of the refraction grid should receive the high intensity.
- the compressed gradient is shifted from the center of the strip to this gap boundary.
- the asymmetric compression thus has the gradient-free part of the width s.sub.il-1 / c) coherently on the initially unlit side of the refraction strip and the gradient up to the edge of the illuminated column boundary.
- the strongest subprisms distribute the light intensity over a wide range (often over more than one pixel width or S 2 gap width). Their gradients are therefore not variable without further loss of visibility in the corresponding refraction stripes.
- the weaker the partial prisms become the closer the subprisms lie along the x-axis to the corresponding focus), the closer the individual wavelengths are to each other, the narrower the overall illuminated area becomes. This provides the freedom to easily increase or decrease the gradient of these prisms without significantly degrading visibility.
- the weakest subprisms are located regularly (along the x axis) between the strongest subprisms and the second strongest subprisms. prisms of the adjacent focusing group.
- the minimum distances inside the refraction webs and between the refracting webs can be increased by compressing the associated partial surfaces in the z direction. Often it is also possible to reduce gradients of equally strong neighboring partial prisms, which reduces absorption by the diffraction grating.
- the base height i.e., the rectangular or parallelogram portion of the material over the full stripe width in the layout
- the aspect ratio is thereby reduced by increasing the base height by adding material in the layout across the full stripe width.
- the free space aspect ratio can be improved by reducing the base height - this can also be used to reduce the proportion of material and hence absorption for a given and overfilled aspect ratio. This change mainly affects weak partial prisms (with a small gradient) and medium prisms.
- Edge trimmed in the direction of the stripe center of the refraction strip with stripe width SL, so that the minimum distances can be increased.
- the meander-shaped material strip of two adjacent columns becomes narrower overall.
- the free space minimum distance can increase in this way. If the inner edge is cut to size (this is the edge in which there is a lot of material in the y direction), then ultimately the column boundary between the adjacent ones becomes
- Refracted diffraction strips of the meandering strip of material in the direction of the weaker subprism The minimum material distance can be increased in this way become. In order to minimize the maximum visibility, a maximum of 10-15% of the strip width should be influenced.
- phase jump saves material on the one hand, but on the other hand, material must be added in order to still have enough material at the jump points. In the end, that may mean adding material.
- F7 - Additional phase jumps In contrast to the dispersion correction discussed under point F6, here the dispersion is increased (and is at low gradient then approximately independent of a variation of the gradient). The dispersion of the weakest partial prisms is expediently increased by one or more additional 2n jumps (jumps of one wavelength in each case). As a result, the proportion of material in the layout initially increases, and the material minimum distance can thereby - desirably - also increase.
- the x-positions of the ⁇ phase jumps within the strip By choosing the x-positions of the ⁇ phase jumps within the strip, one can influence whether the free space distance (in the direction of the opposite strongest subprisms) is greater or less than the material distance (within the meandering material strip with the adjacent prism column). to be flown. For larger grid heights it may also be useful to distribute several complete phase jumps relatively evenly across the column width (eg three phase jumps at the positions 12.5%, 50%, 87.5% of the partial prism width or at the x-positions 25%, 50) %, 75% of SL). This also applies accordingly to the dispersion correction discussed under point F6.
- 2013/160153 AI be used to further increase the minimum distances within the refractive webs and between adjacent refraction webs and / or to optimize the optical properties of the refraction grating.
- Each of the features discussed under points Fl to F6 is therefore considered in isolation (irrespective of the large-scale running the refractive webs in the transverse surface) considered as an independent invention.
- the (phase contrast x-ray imaging) device comprises an x-ray source, a phase grating and an x-ray detector having a one-dimensional or two-dimensional array of pixels.
- the device according to the invention furthermore comprises a diffraction grating of the type described above arranged between the phase grating and the x-ray detector.
- the device additionally comprises a coherence grating, which is interposed between the X-ray source and the phase grating.
- the device additionally comprises an analysis grid, which is interposed between the refraction grid and the X-ray detector.
- the diffraction grating may also be connected directly upstream of the x-ray detector in an alternative embodiment of the device.
- the device further embodies one or more of the design features described below
- Emax / E m i n ⁇ 3 1 2 satisfy (from the other pixel center must be deflected at least half a pixel width s 2/2 and a maximum of 3 s 2/2 Therefore, it must (max / cCmin -. 3 be valid.
- tantalum 67.4 keV
- tungsten (69.5 keV)
- rhenium 71.7 keV
- other design wavelengths have other useful materials.
- phase changes along the x-axis and along the y-axis are measured simultaneously, eg using a coherence grating G 0 , which filters line by line and column by column with an opening fraction of 0 ⁇ q
- G 0 coherence grating
- a two-dimensional phase grating Gi is used, so that a checkerboard-like interference pattern (eg black checkerboard fields dark, white light) is formed at the location of the diffraction grating G L.
- a corresponding diffraction grating is formed, for example, from two diffraction gratings of the type described above with diagonal layout, these refraction gratings being superimposed rotated through 90 ° so that overlapping piecewise lenses in the x-direction through one of the two diffraction gratings and overlapping piecewise lenses in y-Ri result from the other grid.
- the advantage of this design is that there are now multiple paths for each pixel inside the measured image, along which the phase can be integrated (the farther in the center of the image, the more paths are worthwhile or have larger weights). Accordingly, the image noise can be reduced compared to the one-dimensional case by notifying these results along different paths (usually lines).
- FIG. 4 shows a variant of the refraction grating according to FIG. 3, in which the profile of FIG 2, a further variant of the refraction grating according to FIG. 3, in which the course of the refraction webs within the transverse surface changes direction in uniformly spaced kinks, in nine individual representations according to FIG 2 different embodiments of the refraction grating, in which an offset slope of the refraction grating is varied, in six individual representations according to FIG.
- FIG. 19 shows in two individual representations according to FIG. 2 further variants of the refraction grating according to FIG. 18, in which additionally a dispersion correction (point F6) is provided,
- Refraction web in a central region of a diagonal layout, wherein the refraction web is shown in each case resolved into individual prisms.
- the (phase-contrast X-ray imaging) device 2 shown schematically in FIG. 1 comprises an X-ray source 4, a coherence grating G 0 , a phase grating Gi, a diffraction grating G L , an analysis grating G 2 and an X-ray detector 6 constructed from a plurality of pixels P ,
- the structure can be assigned a system axis (referred to below as optical axis 8), which is aligned in the case of the embodiment in a z-direction.
- optical axis 8 The individual optical elements of the X-ray device 2 are configured flat in the exemplary embodiment, arranged along this optical axis 8 and aligned in each case perpendicular to this.
- the X-ray device 2 is provided for obtaining medical differential phase contrast images. For image acquisition, a patient between the coherence grating G 0 and the phase grating Gi, preferably immediately before the phase grating Gi, positioned.
- the metrological detection or rather the determination of the spatial distribution of the phase shift caused by the patient takes place in the X-ray device 2 presented here according to a known per se and, for example, in X-ray phase imaging with a grating interferometer, T. Weitkamp et al. , August 8, 2005 / Vol. 13, No. 16 / OPTICS EXPRESS "principle.
- the coherence grating G 0 has a grating period (grating period) po and a grating height h 0 (measured in the z direction) and serves to ensure sufficient spatial coherence of the x-ray radiation used for the interferometric measuring method.
- the coherence grating G 0 is typically positioned at a distance of approximately 10 cm from the X-ray source 4 and, in typical dimensioning, has approximately the same size as the X-ray source 4
- a stamp on In an alternative embodiment of the device 2, instead of a spatially extended X-ray source 4, a X-ray source which is punctiform to a good approximation is used, which already emits sufficiently coherent X-ray radiation. In this case, the coherence grating G 0 is omitted.
- the x - ray source 4 emits x - ray radiation with a photon energy of up to about 100 keV.
- the phase grating Gi is arranged.
- This serves as in a conventional Talbot-Lau interferometer to produce a strip-like interference pattern and for this purpose has a strip-like structure with webs and slots formed therebetween, wherein the webs and slots parallel to each other in a (perpendicular to the z-axis) y Direction bridge.
- the y-axis is aligned perpendicular to the plane of the drawing.
- the phase grating Gi is designed such that the incident x-ray radiation through the webs at a photon energy of e.g. 65 keV experiences a phase shift by a quarter of the wavelength, ie by ⁇ / 2, while the X-ray radiation incident in the region of the slots passes through the phase grating Gi without significant phase change.
- a value of 42 ⁇ was chosen.
- the phase grating Gi can also be designed so that it generates a phase shift of the X-radiation by half a wavelength in the region of its webs. In this case, the lattice constant pi is 2.84 ⁇ .
- the diffraction grating G L is positioned at a distance d 1L of, for example, 55.91 mm offset from the phase grating Gi.
- the geometry of the refraction grating G L is characterized by three axes, which are designated as x-axis, y-axis and z-axis in accordance with the intended orientation of the refraction grating G L in the device 2.
- the diffraction grating G L is arranged within the device 2 such that its z-axis is arranged parallel to the optical axis 8, and thus to the z-direction and the averaged radiation propagation direction within the device 2.
- the x-axis and the y-axis of the refraction grating G L which are aligned perpendicular to both the z-axis and each other, thus span a transversal surface 10 extending perpendicular to the radiation incident direction.
- the diffraction grating G L has a grating height h L of approximately 60 ⁇ .
- the diffraction grating G L is used for manipulating the X-ray field emanating from the phase grating Gi and for this purpose has a grating constant p L of, for example, 1 .mu.m, which corresponds to the periodicity. corresponds to the interference pattern generated by the phase grating Gi at the location of the refraction grating G L.
- the transverse surface 10 of the refraction lattice G L shown in more detail in FIG. 2 is divided into individual elongated refraction laths 12 (FIG. 2) which extend over the entire transverse surface 10 in the y direction and in the x direction are lined up parallel to each other.
- Each two adjacent refraction strips 12 thus have together one of the lattice constant p L corresponding width.
- the end face of the refraction grating G L is identified by way of example with the transversal surface 10 which faces the X-ray source 4 and at which the X-ray radiation thus enters the refraction grating G L.
- each refraction strip 12 is aligned with an associated focus F.
- the material structure of the refraction grating G L arranged in the z-direction above the respective refraction strip 12 is selected such that the x-radiation falling in this refraction strip 12 is refracted into the associated focus F.
- Adjacent refraction strips 12 are always aligned with different focuses F.
- the number N describes the number of refraction strips 12, which are aligned to a common focus F. These refractive webs 12 aligned with a common focus F are-as already mentioned above-designated as the focusing group.
- the number N is uniformly selected for all focusing groups and thus represents a global property of the diffraction grating G L.
- each focus group has a neutral refraction stripe 12a in which incident x-ray radiation is not or only to a negligible extent refracted.
- the said diffraction grating G L associated focuses F are in a (in the z direction of the diffraction grating G L was a waste d L2 of, for example 43,92 ⁇ spaced) arranged focal plane in which the analyzer grating is positioned G. 2
- the distances of the foci F correspond to half the lattice constant p 2 of the analysis grid G 2 , which has a strip-like structure of webs and slots (columns), so that the foci F lie alternately in the webs and slots of the analysis grid G 2 .
- the refraction grating G L depending on the relative x-position of the coherence grating Gi, the refraction grating G L and the analysis grating G 2 -
- the intermediate interference minima (or interference maxima) are focused on the adjacent lands of the analysis grid G 2 .
- the grid height h 2 of the analysis grid G 2 is, for example 400 ⁇ , the lattice constant p 2, for example, 7, 81 ⁇ .
- the dimensions of the gratings Gi, G L , G 2 in the x-direction and in the y-direction are essentially the same in the exemplary embodiment according to FIG. Notwithstanding the schematic representation according to FIG. 1, the extent of the refraction grating G L and the analysis grating G 2 in the x direction and in the y direction preferably corresponds approximately to the extent of the X-ray detector 6, more precisely the detector surface spanned by the pixels P of the X-ray detector 6 , As with the coherence grating G 0 , the respective webs are preferably also made of gold in the case of the phase grating Gi and the anlead grating G 2 .
- the analysis grid G 2 can be coarser structured than in a conventional Talbot -Lau interferometer, without thereby affecting the visibility of the interference pattern changed significantly.
- the diffraction grating G L is formed from a number of approximately parallel refraction webs 14 made of gold, between which intermediate spaces 16 are formed.
- the spaces 16 may be air-filled gaps. Alternatively, however, the spaces 16 may also be filled by intermediate webs of photoresist.
- the refraction webs 14 and the optional intermediate webs are constructed on a base plate 17 (FIG.
- the diffraction grating G L is preferably by means of the LIGA
- a radiation-absorbing mask eg made of gold
- X-radiation exposure radiation
- filling areas in the form of holes or trenches, which form a negative mold for the refracting webs 14 to be produced detach from the photoresist layer.
- These filling areas are filled with metal, in particular gold, in a subsequent electroplating process step.
- the remaining in the interstices 16 photoresist can be left after the preparation of the refractive webs 14 to form the intermediate webs or be dissolved out to form the gaps.
- the structure of the mask used in the LIGA method corresponds to the material structure that is visible on the transverse surface 10 of the finished refraction grid G L.
- An example of this (hereinafter referred to as layout) material structure is shown in section in FIG.
- the (corresponding to the gold structures of the mask) refraction webs 14 are shown here as dark areas.
- the gaps 14 corresponding to the gaps in the mask are shown as white areas. It can be seen from this illustration that the refraction webs 14 (and correspondingly also the interspaces 16) extend diagonally across the transverse surface 10, that is to say at an angle which exceeds 0 ° and passes 90 ° in relation to the axis.
- All refraction webs 14 have the same shape except for any edge effects (ie cut-off partial volumes at the edges of the refraction grid G L ).
- the refraction webs 14 are arranged parallel to one another in the y-direction, so that the material structure in the
- Transversal surface 10 has a periodicity with a period length p y .
- the two side surfaces 18, over which each refraction web 14 is delimited from the adjacent interspace 16, are structured by a sequence of "steep" sub-surfaces 20, with relatively strong slope through the transverse surface 10 pull, and "flat" faces 22, in of the transverse surface 10 have only a slight (offset) incline (or, for example, in the exemplary embodiment according to FIG. 4), in some cases even horizontally (ie in the transverse plane 10 in the x direction).
- each of the side surfaces 18, the steep partial surfaces 20 and flat partial surfaces 22 usually follow one another alternately, each partial surface 20 or 22 extending over the full strip width s L of a refraction strip 14.
- the steep partial surfaces 20 and flat partial surfaces 22 of the two side surfaces 18 of a refractive web 14 are arranged in strips offset from one another.
- the other side surface 18 has a flat partial surface 20, and vice versa.
- neutral refraction strips 12a in the area of which both side surfaces 18 have flat partial surfaces 22.
- the flat faces 22 extend over each over the full width of two refraction strips 12.
- the steep faces 20 and flat faces 22 are sometimes interposed vertical jump surfaces 24 which extend in the transverse surface 10 in the y direction.
- the diffraction grating G L is produced under oblique illumination in the LIGA process.
- the mask is exposed with exposure radiation whose beam profile is aligned obliquely in the z plane.
- the inclination of the beam path against the z-direction is expediently between 2 ° and 30 ° and in particular between 5 ° and 15 °.
- the refractive webs 14 therefore each have the shape of an oblique prism in three-dimensional space. Except for any edge effects, the refractive webs 14 therefore have in the transverse plane 10 and the opposite end face of the refraction grid G L in the z-direction - the base area or
- the refraction webs 14 can be mentally subdivided into active partial prisms each having a triangular base area, one edge of this base area delimiting one of the steep partial surfaces 20, and in
- the steep partial surface 20 of each active subprism generates a comparatively strong refraction of the x-ray radiation incident along the optical axis 8 in the x direction.
- the steep partial surfaces 20 are therefore also referred to as "active" partial surfaces 20.
- the flat partial surface 22 of each passive partial prism generates no or only a negligible refraction of the x-ray radiation incident along the optical axis 8.
- the flat partial surfaces 22 are therefore Also referred to as "passive" faces 22.
- the passive partial prisms serve for the mechanical connection of the active partial prisms and are provided for production-technical reasons in order to comply with the minimum manufacturable material widths.
- partial prisms are illustrated in the region of the second refraction strip 12 from the left-there at the central refraction web 14. It can be seen from the illustration that the active partial prism there has a material height y g in the y direction, while the passive part prism has a material height y m .
- the adjacent intermediate spaces 16 each have a width y f measured in the y direction.
- y m indicate the minimum manufacturable material height
- y g the minimum manufacturable gap width in the y direction.
- the vertical period length y in the layout thus exists first of all from a fixed y-proportion of material, namely here the material height y m ,
- variable portion per refraction strip 12 here the material height y g , the actual Gradien- th and any phase jumps (eg in the context of a
- Dispersion correction according to item F6 or in the context of additional phase jumps according to item F7) and the basic height can be coded and vary between proportions of material 0% to 100%, as well as
- the height (h / p y ) (y m + y f ) represents an additional one
- the width S L of G L encodes one edge (here, for example, the top one) from left to right. or material thickness that increases suddenly, the other edge (here, for example, the lower one), from left to right continuously or suddenly decreasing material thickness.
- Each of the edges runs initially (in the 'pure' formulation) either from left to right or from bottom to top, or in a mixture of the two directions, but preferably never to the right or to the left.
- the gradient is regularly pronounced differently.
- the active sub-areas 20 of the five focusing groups associated refraction strips 12a, 12b and 12c in Figure 2 are each highlighted by rectangular frames.
- kinks DK are provided in the diagonal layout, so that the refraction webs 14 in the transversal plane 10 meander around the x-axis and thus alternate in sections diagonally in the positive y-direction and in the negative y-direction.
- the kinks DK are provided in the neutral refraction strips 12a.
- the kinks DK are respectively provided in the refraction strips 12 with the weakest active partial prisms, ie the smallest gradient g different from zero.
- the weakest active partial prisms are additionally given a base height (point F3) for a better material aspect ratio in the direction of the refraction strips 12 with the second strongest subprisms.
- FIG. 7 shows the effect of the gradient compression described above under point F1.
- this effect is shown for strip-like layouts, as basically disclosed in WO 2013/160 153 A1.
- the right-hand column illustrates the effect of gradient compression on diagonal layouts.
- the respective layouts without Grdientenkompression are shown.
- the arrows inserted here point to the equal to the layouts of the top row shifted corners.
- excerpts of the respective overlying layouts are enlarged. It can be seen that the gradients Ay / ⁇ of all the active partial areas 20 formed in the transverse plane 10 are increased to 150% as a result of the gradient compression.
- the gradient is restricted to less than the stripe width. Shown is the case that the gradient is realized in the middle of the respective refraction strip 12, that is to say that the gradient in the x direction is uniformly compressed from both sides. A displacement of the gradient to one of the edges of the respective refraction strip 12 is alternatively also possible.
- the second line from the top shows corresponding layouts in which the critical minimum distances are improved by means of gradient variation (point F2) (here registered arrows indicate changes from the top line).
- point F2 the critical minimum distances are improved by means of gradient variation
- the diagonal layout right column
- gradients are also reduced to reduce material or to approximate gradients.
- the third line from the top shows corresponding layouts in which the critical minimum distances are improved by varying the basic height (point F3) (the arrows entered here indicate changes from the top line). This increases the free space distance to the strongest prism and reduces material.
- the bottom line shows corresponding layouts in which the critical minimum distances were improved by gradients narrowing (point F5).
- interspaces were inserted according to the measure described above under point F4.
- target positions between -35% and + 35% (relative to the radius of a "pixel" in G 2 , ie N s L / 2) to facilitate the production of the layout. improve or improve.
- all target positions between -100% and + 100% allow the intensity maxima of all wavelengths to remain in the target range of width s 2 for all subprisms.
- the width of the diffraction region and the number of openings in G 0 often result in a narrower choice of target positions.
- Particularly suitable target positions between -35% and + 35% are recommended.
- FIG. 10 the optimization of strip-type layouts according to WO 2013/160 153 A1 (left-hand column, S L ) or diagonal layouts (right-hand column D L ) is illustrated by the following measures: F6: dispersion correction and
- the measure F6 removes material, which reduces the dispersion but would in itself lead to bottlenecks which are difficult to produce.
- Measure F7 adds material elsewhere, widening these bottlenecks to facilitate manufacturing. The resulting increase in dispersion is tolerable in the area of small gradients - where this measure is used.
- Figures 11 and 12 show schematically ways to change the shape of the refracting webs 14 for the realization of negative and positive phase jumps, avoiding hard-to-make bottlenecks.
- FIG. 13 schematically shows two superimposed refraction gratings G L rotated by 90 ° relative to one another for a two-dimensional formulation of the phase contrast (as explained above under point F9). Shown are areas of action 26a-26c of the individual focusing groups, ie those areas to which they focus. Marked by a cross of solid lines are those areas of action 26a into which refraction gratings 12 L of each of the two refraction gratings G L are focused. Marked by a cross of dashed lines are those areas of action 26b into which the refractive gratings 12e, which are shown in white in FIG. 12, focus in each case from two refraction gratings G L.
- the refraction gratings G L shown in FIG. 13 are each designed with a strip-shaped layout, as described in WO 2013/160 153 A1.
- the crossed refraction gratings G L can also be designed with a diagonal layout, for example designed according to one of FIGS. 2 to 6.
- FIGS. 14 to 19 show concrete simulations.
- the lower picture shows an additional gradient variation
- the upper left image shows a theoretical layout in which the refraction webs 14 form only gradients and no ground level is present. It can be seen that here at many points of the transverse surface 10, the minimum distances are not met.
- the upper right image shows a layout which is improved by gradient variation (point F2), variation of the basic height (point F3) and gradient narrowing (point F5), but which does not yet have any phase jumps.
- the lower picture shows an optimized layout in which compliance with the minimum distances was ensured by additional phase tests (point F7). With this layout, a maximum gradient of 130 is symmetric
- the simulation was carried out for a diffraction grating G L with refraction webs 14 of nickel and photoresist-filled interstices 16. The picture above shows one already
- the middle picture shows an improved variant of the layout, in which an additional phase jump (point F7) was introduced to maintain the minimum distances in the weakest prisms.
- the lower picture shows an enlarged section of the middle picture.
- the layout variant shown in the upper image of FIG. 18 was realized without gradient variation (point F2).
- the layout variant shown in the lower image of FIG. 18 has been realized (to achieve larger minimum distances) with gradient variation (point F2).
- the top image of FIG. 19 shows a layout variant in which the refraction webs 14 were additionally provided with a negative phase jump (point F6) for reducing chromatic aberrations.
- point F6 negative phase jump
- the lower image of FIG. 19 shows the reduction of color errors in 6 of 17 stripes per pixel. In each case three refraction webs 14 which follow each other within the focusing group, a phase jump is inserted for dispersion correction.
- FIG. 20 finally shows schematically in two variants a part of a refraction web 14 in a central area of a diagonal layout.
- Different partial prisms of the refraction web 14 are hereby emphasized for clarification by different filling or hatching. As in the preceding examples, these partial prisms are also made of the same material and are connected together in one piece to form the refraction web 14.
- the variant of the refraction web 14 shown in the right-hand half of the figure differs from the variant shown in the right-hand half of the figure by added material for realizing a dispersion correction (point F6) and additional phase jumps (point F7).
- the dispersion correction can be achieved by adding material on the half of the refraction strip 12 with the lower material fraction (in particular the refraction stripe 14 with the strongest prism part) and that the use of stripes can be useful in which the effects of the measures Cancel F6 and F7.
- This is shown in the layout variant shown on the right for the weakest subprism, where in the left half additional material for the dispersion correction (point F6), and in the right half as much additional material for the realization of an additional phase jump (point F7) has been added.
- Optical power (simulated with 21 discrete wavelengths 38keV, 41 keV, ..., 98keV with 3keV energy distance respectively), here on the basis of visibility of various boundary conditions and sections (columns). For the visibilities for one strip (the central) or two strips (two strips of the same prism geometry), the other columns were simulated as completely absorbing ("black").
- FIG. 16 shows that in the case of strip-type layouts, as disclosed in principle in WO 2013/160 153 A1, gradients are possible which exceed the aspect ratio.
- N 7: Measures Fl, F2, F3, F5 and F7 (phase shift) allow a maximum gradient of 130 with a symmetrical aspect ratio of 100.
- the last line in the above table is the situation without diffraction grating G L (ie, G 2 instead of G L ). It was decided not to model the absorption of G 2 in particular.
- the central strip of the layouts according to the partial images b) and c) has higher visibility than the situation without diffraction grating G L.
- the reason is that a hardening takes place through 87 ⁇ gold, which removes the low-energy components and over 80.7 keV (gold K), which are less well represented by G L by diffraction between G L and G 2 . Therefore, relatively more intensity remains near the design wavelength.
- the refraction webs 14 are made of nickel.
- the spaces 16 are filled with photoresist.
- N 17, strip-shaped
- the target positions for the design of the prisms are descending (from the column or the stripe of the strongest prisms ("1.") to the stripe of the weakest prisms ("8.”), central stripe 9. always 0%):
- Target positions 1. 0%, 2. 0%, 3. -30%, 4. + 25%. 5. + 25%, 6. + 25%, 7. + 35%, 8. + 25%,
- Optical power (21 discrete photon energies at 18 keV, 19 keV, ..., 38 keV with intervals of 1 keV each), here on the basis of visibility of various boundary conditions and sections (stripes).
- the transmission is about 74% with lens grid and about 94.5% without lens grid.
- the upper image (partial image a)) in FIG. 18 is realized without gradient variation (point F2).
- the lower image (partial image b)) in FIG. 18 is realized in order to achieve larger minimum distances with gradient variation.
- the upper image (partial image c)) in FIG. 19 is additionally provided with a negative phase jump for the reduction of chromatic aberrations (point F6).
- the lower image (partial image d)) from FIG. 19 shows the reduction of chromatic aberrations in 6 of 17 stripes per pixel.
- Gi as in example C
- Optical performance (spectrum as in example C), again based on visibility of various boundary conditions and sections (columns).
- the transmission is about 75.8% with diffraction grating (77% in panel c)) and about 94.2% without diffraction grating.
- the shortening of the distance improves the visibility only slightly and only between d) and e), because the highest photon energies are a little more broken.
- the invention is not limited to the exemplary embodiments described above. Rather, other variants of the invention can be derived therefrom by the person skilled in the art without departing from the subject matter of the invention. In particular, all individual features described in connection with the exemplary embodiments are also combinable with one another in other ways, without departing from the subject matter of the invention.
- the noise represented by the standard deviation ⁇ ⁇ ) is proportional to (At Io) "2. In order to halve the noise, the fourfold dose At Io is needed. the dependence of the noise ⁇ ⁇ on the stripe phase ⁇ (where V is the (stripe) visibility or visibility
- V (Imax ⁇ 1min) / (Imax ⁇ 1min)
- I max and I m i n denote the maximum / minimum intensities depending on the x position of a displaceable GQ: ⁇ ⁇ 2 oc 1 / (At Io V 2 T), wherein visibility V and the transmission T respectively in the Limits 0-100% can vary. In order to keep the noise at a certain value, At I 0 ⁇ / 2 T must remain unchanged.
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Abstract
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013008583 | 2013-05-10 | ||
| PCT/EP2014/059331 WO2014180901A1 (de) | 2013-05-10 | 2014-05-07 | Phasenkontrast-röntgenbildgebungsvorrichtung und brechungsgitter für eine solche |
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| Publication Number | Publication Date |
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| EP2979276A1 true EP2979276A1 (de) | 2016-02-03 |
| EP2979276B1 EP2979276B1 (de) | 2017-11-29 |
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| EP (1) | EP2979276B1 (de) |
| WO (1) | WO2014180901A1 (de) |
Cited By (1)
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| RU230741U1 (ru) * | 2024-07-24 | 2024-12-18 | Федеральное государственное автономное образовательное учреждение высшего образования "Балтийский федеральный университет имени Иммануила Канта" | Устройство для фокусировки рентгеновского излучения |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9763634B2 (en) | 2013-05-22 | 2017-09-19 | Siemens Aktiengesellschaft | Phase-contrast X-ray imaging device |
| EP3042383A1 (de) | 2013-10-07 | 2016-07-13 | Siemens Healthcare GmbH | Phasenkontrast-röntgenbildgebungsvorrichtung und phasengitter für eine solche |
| DE102016213990B4 (de) | 2016-07-29 | 2019-02-07 | Siemens Healthcare Gmbh | Verfahren und Vorrichtung zum Einstellen eines räumlichen Absorptionsprofils eines Röntgenstrahls in einem Computertomographen |
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| EP1117010B1 (de) * | 2000-01-14 | 2006-05-31 | ASML Netherlands B.V. | Lithographischer Apparat mit System zur Bestimmung des Abbe-Abstandes |
| CN102325498B (zh) | 2009-02-05 | 2013-07-10 | 中国科学院高能物理研究所 | 基于低剂量单步光栅的x射线相位衬度成像 |
| JP5586899B2 (ja) * | 2009-08-26 | 2014-09-10 | キヤノン株式会社 | X線用位相格子及びその製造方法 |
| JP2012161412A (ja) * | 2011-02-04 | 2012-08-30 | Fujifilm Corp | 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム |
| DE112013002177A5 (de) | 2012-04-24 | 2014-12-31 | Siemens Aktiengesellschaft | Röntgenvorrichtung |
-
2014
- 2014-05-07 EP EP14724384.4A patent/EP2979276B1/de not_active Not-in-force
- 2014-05-07 WO PCT/EP2014/059331 patent/WO2014180901A1/de not_active Ceased
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| RU230741U1 (ru) * | 2024-07-24 | 2024-12-18 | Федеральное государственное автономное образовательное учреждение высшего образования "Балтийский федеральный университет имени Иммануила Канта" | Устройство для фокусировки рентгеновского излучения |
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| WO2014180901A1 (de) | 2014-11-13 |
| EP2979276B1 (de) | 2017-11-29 |
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