EP2803076B1 - Anode tournante pour tube à rayons x présentant une structure obtenue par polissage orientée radialement au moins en partie et méthode de fabrication - Google Patents

Anode tournante pour tube à rayons x présentant une structure obtenue par polissage orientée radialement au moins en partie et méthode de fabrication Download PDF

Info

Publication number
EP2803076B1
EP2803076B1 EP13705898.8A EP13705898A EP2803076B1 EP 2803076 B1 EP2803076 B1 EP 2803076B1 EP 13705898 A EP13705898 A EP 13705898A EP 2803076 B1 EP2803076 B1 EP 2803076B1
Authority
EP
European Patent Office
Prior art keywords
focal track
focal
ground structure
rotating
ray anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP13705898.8A
Other languages
German (de)
English (en)
Other versions
EP2803076A1 (fr
Inventor
Peter RÖDHAMMER
Jürgen SCHATTE
Wolfgang Glatz
Thomas Müller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plansee SE
Original Assignee
Plansee SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plansee SE filed Critical Plansee SE
Publication of EP2803076A1 publication Critical patent/EP2803076A1/fr
Application granted granted Critical
Publication of EP2803076B1 publication Critical patent/EP2803076B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
    • H01J35/101—Arrangements for rotating anodes, e.g. supporting means, means for greasing, means for sealing the axle or means for shielding or protecting the driving
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/083—Bonding or fixing with the support or substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/085—Target treatment, e.g. ageing, heating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/10—Drive means for anode (target) substrate
    • H01J2235/1006—Supports or shafts for target or substrate

Definitions

  • the present invention relates to an X-ray rotary anode having an annular focal track, the focal track surface having a directional abrasive structure.
  • X-ray anodes are used in X-ray tubes to generate X-rays.
  • X-ray devices with such X-ray rotary anodes are used in particular in the medical field in diagnostic imaging.
  • electrons are emitted from a cathode of the x-ray tube and accelerated in the form of a focused electron beam onto the rotated x-ray rotating anode.
  • Much of the energy of the electron beam is converted into heat in the X-ray rotary anode, while a small portion is emitted as X-radiation.
  • the locally released amounts of heat lead to a strong heating of the X-ray rotary anode.
  • annular path (focal path) is scanned in use due to the rotational movement of the x-ray rotary anode.
  • X-ray rotary anodes in the region of the focal track on a trained on a support body focal point coating.
  • thermomechanical load in the focal spot (point of impact of the electron beam on the X-ray rotary anode) occur in the region of the focal point surface cyclic compressive / tensile stresses, which in turn lead to plastic deformation in the region of the focal point surface as well as in the body of the X-ray rotary anode , Compressive stresses arise as a result of the expansion of the volume element acted upon by the electron beam in relation to the comparatively colder environment. Tensile stresses occur due to the plastic deformation taking place at high temperatures and due to the contraction of the previously strongly heated volume element occurring during the subsequent cooling. As a result, a network of micro and macrocracks forms on the focal surface.
  • cracks with widths of more than 100 ⁇ m are formed. Such macrocracks are particularly detrimental to the dose yield and thus on the picture quality. Furthermore, there is a risk of crack propagation deep into the body of the X-ray rotary anode, thereby increasing the risk of material eruption or breakage of the X-ray rotary anode.
  • the DE 10 2007 024 255 A1 It is proposed to introduce a pattern into the focal track surface by electrochemical etching.
  • the DE 103 60 018 A1 describes an X-ray rotary anode, in which at least partially defined micro-slots are arranged in the respective surface.
  • the focus is on the fact that the effect of expansion joints is essentially achieved by the defined structures in which the relative arrangement and dimensions of the individual grooves or slots is predetermined.
  • a controlled expansion and a controlled release of the elastic energy should be made possible.
  • the surface structure of a controlled microcracking can serve. The introduction of such defined structures is complex and associated with high costs.
  • the post-processing of the focal point of a built-in and rotating X-ray rotary anode is described by means of loops in order to correct any existing imbalance.
  • the object of the present invention is to provide an X-ray rotary anode which is inexpensive to manufacture and in which the occurrence of fatigue in use can be suppressed as effectively as possible.
  • the object is also to provide a corresponding method for producing an X-ray rotary anode.
  • an X-ray rotary anode having an annular groove in which the groove surface has a directional abrasive structure.
  • the orientation of the abrasive structure relative to a tangential reference direction in the respective surface portion is each inclined at an angle in the range of 15 ° to 90 ° inclusive.
  • the X-ray rotary anode has these features before it is first installed in an X-ray tube and exposed therein to an electron beam. After prolonged periods of use aging effects can occur, which - as described - lead to modifications of the focal surface.
  • a final surface-machining step in part in the (internal) state of the art in the production of X-ray rotary anodes, involves grinding the focal surface and surrounding areas such that a rotating abrasive wheel is circumferentially passed over the focal surface, that the orientation of the abrasive structure is tangential. Accordingly, the production of X-ray rotary anodes according to the invention can be realized largely without additional effort by aligning the grinding direction relative to the respective tangential reference direction according to the claimed angular range in the final surface processing step.
  • Another advantage of the aligned abrasive structure over the above-described provision of defined slot structures or defined patterns, which are intended to serve primarily as expansion joints, is that evenly distributed over the focal surface a plurality of cracking bacteria is provided.
  • a plurality of cracking bacteria is provided.
  • the individual grooves of an abrasive structure run comparatively pointedly to the groove bottom, a pronounced increase in stress occurs in this region under tensile stresses, which promotes crack initiation.
  • tensile stresses in the focal surface accordingly, at a plurality of locations (and not only at predefined positions) provides the possibility of forming microcracks, and the kerf surface can respond to the tensile stresses by forming a network of finely divided microcracks.
  • a formation of wide cracks is thereby avoided.
  • the latter are more likely to benefit from the provision of only a limited number of defined slots or other defined structures.
  • an advantage over the provision of defined slot structures or defined patterns is that a comparatively smooth track surface can be provided so that the self-absorption losses are negligible.
  • the inventive construction of the X-ray rotary anode in which the orientation of the abrasive structure is inclined relative to a tangential reference direction in the respective surface portion each with an angle in the range of 15 ° to 90 ° inclusive, the formation of wide and particularly critical, in the radial direction cracks can be prevented.
  • the respectively locally occurring strain in the region of the focal track surface can be determined by simulation and, accordingly, the orientation of the abrasive structure can be chosen such that it runs in each case substantially perpendicular to the orientation of the maximum local strain.
  • the claimed angular range has been found to be an advantageous area.
  • the term "focal path" refers to the surface section of the x-ray rotary anode which is intended to be scanned with an electron beam (and over which the electron beam is correspondingly guided in use). Accordingly, the focal path can form a surface section of a separate, generally ring-shaped, focal-path lining. However, it can also be formed directly on a (in this case substantially monolithic) body of the X-ray rotary anode. In general, further layers, add-on parts, etc., such as a graphite ring, etc., may also be provided on the x-ray rotary anode, in particular on the side remote from the focal track.
  • directional abrasive structure generally refers to surface texturing formed by a uniformly distributed family of individual grooves whose arrangement and dimensions (length, width, depth) are statistically distributed and which are oriented substantially along a preferred direction are (ie, which are substantially parallel to each other). In the process, a substantially smooth surface is achieved overall.
  • the directional abrasive structure is so far undefined that the position and dimensions of the individual grooves are not predetermined, in particular non-periodic or otherwise regular.
  • the directional abrasive structure can be achieved by a relative movement between that for introducing the abrasive structure
  • the abrasive article such as a grinding wheel, polishing pad and inserted mechanical polishing agent, brush) and the focal surface can be created along the desired orientation.
  • the directional abrasive structure is introduced in particular by a grinding process.
  • Grinding refers to a machining, path-controlled manufacturing process for machining surfaces with abrasives.
  • there are also other possibilities for introducing the directional abrasive structure such as, for example, by directional polishing (with a mechanical polishing agent) or by directional brushing.
  • the tangential reference direction is determined locally at the relevant surface section at which the orientation of the abrasive structure is to be determined.
  • a tangential direction (or circumferential direction), a radial direction and an axial direction are defined at the respective point to be characterized on the X-ray rotary anode by the ring shape of the focal track.
  • the angle between the tangential reference direction and the orientation of the abrasive structure is measured in the plane formed by the focal surface in this local area (tangent plane at the measurement point). It should be noted that the focal surface in the respective local area can also be inclined to a radial direction, which is the case in particular in a frustoconical focal track.
  • the focal path may extend only in the plane spanned by the radial directions.
  • orientation of the abrasive structure relative to the tangential reference direction can also vary over different, radial positions, and in this case also continuously in the claimed angular range (from 15 ° to 90 °, in particular from 35 °). 70 °). It can alternatively remain constant.
  • the tangential reference direction is clockwise, as well as the variant that the tangential reference direction runs counterclockwise (in plan view of the X-ray rotary anode).
  • the angle of the alignment Abrasive structure to the tangential reference direction respectively in the desired angular range are.
  • differences may arise as to whether the angle is set relative to a tangential reference direction running in the clockwise direction or relative to a counterclockwise tangential reference direction.
  • Which variant (depending on the particular application as well as the direction of rotation of the X-ray rotary anode in use) is preferable is to be determined in individual cases by experiments.
  • the inclination angle is preferably in a range of from 30 ° to 90 ° inclusive.
  • the orientation of the abrasive structure relative to a tangential reference direction in the respective surface section is inclined over the circumference of the annular focal track and beyond the radial extent of the focal track, in each case at an angle in the range of 60 ° to 90 ° inclusive.
  • This variant is particularly advantageous if, in particular, strains in the tangential direction (or circumferential direction) are to be compensated for in the relevant X-ray rotary anode.
  • strains in the tangential direction or circumferential direction
  • An optimum angle range can be determined in each case specifically as a function of the geometry and the materials used of the particular X-ray rotary anode type. Such a determination can be done in particular simulation-based.
  • the course of the directed abrasive structure is substantially rectilinear.
  • substantially rectilinear is such a course, in which the course is due to the (small) curvature of the surface of the focal track or due to the radially outward occurring expansion is slightly curved.
  • Such a rectilinear course of the abrasive structure can be achieved by a corresponding orientation of the grinding direction of the abrasive (or possibly also the direction of movement of a polishing body or a brush) relative to the tangential reference direction.
  • the X-ray rotary anode is segmented in the region of the focal point surface in such a way that in the circumferential direction in each case segments adjoin one another with a parallel orientation of the abrasive structure within the respective segment.
  • This can be achieved in the context of production in particular by introducing an abrasive structure on a circumferential segment of the X-ray rotary anode with a desired orientation and then subsequently rotating the X-ray rotary anode through an angle section to again produce an abrasive structure with the desired (same orientation) relative to the associated tangential reference direction to bring.
  • the angle between the orientation of the abrasive structure and a tangential reference direction in the respective surface section decreases along a radial direction from the inside to the outside over the radial extent of the focal track.
  • Such an abrasive structure can be introduced, in particular, by rotating the X-ray rotary anode during the introduction of the abrasive structure, while the direction of movement of the abrasive (or possibly also the direction of movement of a polishing body or a brush) is exclusively radial or optionally additionally tangential and / or axial Share has.
  • the mean roughness Ra in the region of the abrasive structure is in a range of from 0.05 ⁇ m to 0.5 ⁇ m inclusive.
  • this area still provides a sufficiently smooth surface with regard to the dose yield, while on the other hand it offers sufficient crack germs for the formation of a fine crack network.
  • different areas can be used be suitable.
  • a comparatively smooth surface is desired, so that the mean roughness Ra is preferably in a range of from 0.05 ⁇ m to 0.15 ⁇ m inclusive.
  • a mean range of from 0.15 ⁇ m to 0.3 ⁇ m inclusive of the mean roughness Ra is suitable.
  • a comparatively high roughness may also be permissible or desired, so that an abrasive structure having an average roughness Ra of 0.3 ⁇ m to 0.5 ⁇ m inclusive is suitable.
  • a measuring section running in a straight line and substantially perpendicular to the orientation of the grinding structure is used.
  • the profile is measured with a touch probe with a feed rate of 0.5 mm / s over a measuring length of 15 mm.
  • the first and the last 2.5 mm of the measured section are not evaluated but only the middle part of 10 mm length.
  • a filter according to ISO 16610-31 is used as part of the evaluation of the measurement data.
  • the average roughness Ra is determined in accordance with DIN EN ISO 4287: 2010-07.
  • the abrasive structure extends beyond the region of the focal path.
  • the abrasive structure extends both radially inwardly and radially outwardly beyond the region of the focal path. This takes into account that considerable thermal loads and also deformation of the entire body of the X-ray rotary anode occur even in the area adjoining the focal point. This development makes it possible to support the formation of a fine fracture network in this area as well.
  • the fuel track material in the region of the focal track is formed by tungsten or by a tungsten-based alloy.
  • tungsten-based alloy reference is made in particular to an alloy containing tungsten as the main constituent, ie to a higher proportion (measured in weight percent) than each, the other Has elements.
  • the focal lane is formed from a tungsten-rhenium alloy which may have a rhenium content of up to 26% by weight (wt%: wt%). In particular, the rhenium content is in a range of 5 to 10 wt.%.
  • the materials mentioned are advantageous in view of the high, thermal loads and with regard to the highest possible emissivity of X-radiation.
  • the body of the X-ray rotary anode is formed completely or alternatively only the carrier body of the X-ray rotary anode (on which a focal point lining is formed) made of molybdenum or a molybdenum-based alloy (eg TZM or also MHC). These materials have proven particularly useful in view of the high thermal and mechanical loads.
  • a molybdenum-based alloy is particularly referred to an alloy containing molybdenum as the main constituent, i. to a higher proportion (measured in weight percent) than any other containing element.
  • the molybdenum-based alloy may have a content of at least 80 wt.% (Wt.%: Wt.%) Of molybdenum, in particular of at least 98 wt.% Of molybdenum.
  • MHC is a molybdenum alloy which has an Hf content of 1.0 to 1.3% by weight (Hf: hafnium), a C content of 0.05-0.12% by weight, has an O content of less than 0.06 wt% and the remaining portion (other than impurities) molybdenum.
  • the x-ray rotary anode has a carrier body and a focal point coating formed on the carrier body, on which the focal path runs.
  • the materials can be adapted specifically to the requirements existing in the region of the focal point (high dose yield, high thermal load capacity) and, on the other hand, specifically to the requirements existing in the region of the carrier body (high mechanical strength, high thermal resistance, good heat dissipation).
  • the generally ring-shaped formed Brennbahnbelag extends on both sides (ie radially inward and radially outward) beyond the focal distance.
  • the abrasive structure - in particular on both sides (ie, radially inward and radially outward) - extends beyond the focal length.
  • the carrier body is formed from molybdenum or a molybdenum-based alloy (eg TZM, MHC, etc.) and that the focal path is formed from tungsten or a tungsten-based alloy.
  • the present invention further relates to a method for producing an x-ray rotary anode in which a directed abrasive structure is introduced at least in the region of an annular focal path of the x-ray rotary anode such that over the circumference of the annular focal track and over the radial extent of the focal track, the orientation of the abrasive structure is inclined relative to a tangential reference direction in the respective surface portion in each case with an angle in the range of 15 ° inclusive including 90 °.
  • the inventive method is characterized by the fact that an X-ray rotary anode can be provided by simple, inexpensive and reproducible feasible process steps, in which the occurrence of fatigue phenomena in the region of the focal surface can be significantly delayed.
  • it is possible to produce X-ray rotary anodes with the features explained above and in the following description part. Accordingly, reference is also made with respect to the inventive method to the explained to the X-ray rotary anode advantages.
  • the refinements and variants explained with reference to the x-ray rotary anode can also be realized in a corresponding manner, which may possibly be feasible by a corresponding adaptation of the method steps.
  • the x-ray rotary anode has a carrier body and a focal point coating formed thereon, then in principle it is also possible to first introduce the abrasive structure into the focal point coating and then attach the focal point coating to the carrier body (for example by soldering).
  • the abrasive structure is introduced into the focal track only when the track surface is already firmly connected to the carrier body (for example, by the carrier body and the fuel track are produced by powder metallurgy in the composite, or by the track coating by a vacuum plasma spraying on the carrier body is applied).
  • the occurrence of edges in the transition region between the track surface and carrier body can be avoided.
  • the step of introducing the abrasive structure forms the last, in the region of the focal point surface material-removing machining step in the production of the X-ray rotary anode.
  • the abrasive structure is introduced in particular by directional grinding, directional polishing and / or directional brushing.
  • grinding is preferred.
  • an abrasive e.g., grinding wheel
  • abrasive grains e.g., silicon carbide or diamond
  • Such an abrasive is particularly suitable for a tungsten or tungsten based alloy (e.g., tungsten-rhenium alloy) trace material.
  • an abrasive body is moved to introduce the abrasive structure such that its abrasive surface at least proportionally moves in the radial direction, and further that the abrasive body and the focal path are moved relative to each other in the circumferential direction (continuously during the introduction of the abrasive structure or intermittently by an angle section each between the processing steps).
  • the x-ray rotary anode is rotated about its axis of symmetry.
  • Fig. 1 is shown schematically the structure of a Röntgenformatanode -2-.
  • the X-ray rotary anode -2- is rotationally symmetrical to a rotational axis of symmetry -4- formed.
  • the rotation symmetry axis -4- is simultaneously an axial direction -6-, each of which runs through the relevant point to be characterized and parallel to the axis of rotation of symmetry -4-determined.
  • Perpendicular to the axial direction -6- extend the tangential direction -8- (in the present case opposite to the clockwise direction), which forms a tangent to the circumference in the respective point, and the radial direction -10-, perpendicular to the tangential -8- and the axial direction -6- stands.
  • the X-ray rotary anode -2- has a plate-shaped carrier body -12- which can be mounted on a corresponding shaft.
  • an annular focal lamination -14- is applied on the carrier body -12-.
  • the portion over which the annular focal lamination -14- extends, has the shape of a truncated cone (a flat cone).
  • the inclination of the surface of the Brennbahnbelags -14- is in Fig. 1 represented by the dashed line 15. The inclination is for example 12 ° relative to the radial direction -10-.
  • the Brennbahnbelag -4- covers at least the region of the support body -12-, which is intended for scanning with an electron beam and thus the Burning lane -16- forms.
  • a directional abrasive structure -18- is provided which extends over the entire, inclined surface of the focal-web covering -14-.
  • the orientation of the abrasive structure -18- is shown schematically as individual lines -20-.
  • the lines -20- merely represent the orientation of the abrasive structure and do not represent individual grinding marks. The latter are namely, as explained above, statistically distributed and have different dimensions. Only its course extends essentially along the illustrated lines -20-.
  • the abrasive structure -18-the in Fig. 2 illustrated, the first embodiment has a curved orientation.
  • the angle between the orientation of the abrasive structure -18- and a tangential reference direction -8- in the respective surface section decreases.
  • An introduction of such an abrasive structure -18- can be done in particular by rotating the X-ray rotary anode -2- during the introduction of the abrasive structure -18-, while the direction of movement of the abrasive is exclusively radial or optionally additionally tangential and / or axial portion (e.g., incorporation using a 5-axis grinder).
  • Such a direction of movement of the abrasive can be done in particular by rotation of a cup wheel with a corresponding orientation of the axis of rotation.
  • a directed abrasive structure -22- is provided, which in turn extends over the entire inclined surface of the Brennbahnbelags -14-.
  • the abrasive structure -22- is formed such that in the circumferential direction in each case segments with a parallel within the respective segment alignment of the abrasive structure -22- join each other.
  • the orientation of the abrasive structure within the respective segment is shown schematically as individual lines -24- at individual circumferential sections of the focal-web covering -14-.
  • the directional abrasive structure -22- of the Fig. 3 illustrated second embodiment has within the respective segment on a substantially rectilinear course.
  • the individual segments in the radially inner region are each narrower than in the radially outer region.
  • the orientation of the abrasive structure -22- remains substantially constant relative to the tangential reference direction -8-.
  • a substantially finer and more uniform crack network is formed than after the (internal) state the technique with an orientation of the abrasive structure in the tangential direction.
  • an angle in the range of up to and including 70 ° has proven to be particularly advantageous, in which the microcracks induced by the abrasive structure with their cumulative crack width are the total deformation of the focal path in use both in the radial direction and in the tangential direction compensate.
  • a further advantage is that due to the formation of fine microcracks the X-ray rotary anodes according to the invention, in addition to the increase in bursting safety and high-voltage stability, also have a significantly slower dose drop over the life of the X-ray rotary anode. This is attributed to the following effects: on the one hand, the crack widths and crack depths are reduced; on the other hand, the microcracks have a radial component. Both effects contribute in use to a reduction of the self-absorption of the X-radiation and thus to a comparatively high dose yield.
  • X-ray rotary anodes with a tungsten-rhenium alloy (10 wt.% Rhenium, 90 wt.% Tungsten) hardfacing firmly bonded to the molybdenum alloy support body were first pre-smoothed by precision turning. After the fine turning of the focal point lining, a directional grinding structure was introduced with a fine-grained diamond grinding wheel.
  • the cup diamond wheel had a grade of D76 indicated by the standard issued by FEPA (Fédération Europeene des Fabricants de Produits Abrasifs).
  • an arrangement was chosen in which the axis of rotation of the cup diamond grinding wheel was aligned substantially perpendicular to the focal surface (relative to the point of contact of the cup wheel with the focal path) and with respect to the radial direction substantially center of the focal path.
  • the arrangement was further chosen such that an annular grinding surface formed on the face side of the cup diamond grinding wheel, which is oriented perpendicular to the axis of rotation (the cup diamond grinding wheel), is rotated on a peripheral portion (the rotating one Pot-type diamond grinding wheel) engaged in the raceway surface while the opposite peripheral portion was spaced from the focal line.
  • the cup diamond grinding wheel and the x-ray rotating anode in this arrangement were respectively rotated about their axes of rotation using oil as the lubricant.
  • the inclination of the orientation of the introduced abrasive structure relative to the tangential reference direction depends on the relative speeds of the focal path relative to the grinding surface of the cup diamond wheel.
  • the rotational speed of the cup diamond grinding wheel must be sufficiently high relative to the rotational speed of the X-ray rotating anode to achieve a tendency of the orientation of the grinding structure relative to the tangential reference direction.
  • the X-ray rotary anode was rotated at 100 revolutions per minute, with the focal length extending over a radius of about 75 mm to about 100 mm of the X-ray rotary anode, and the cup diamond grinding wheel had a speed of 20 m / s in the area of the grinding surface ( Meters / second).
  • the resulting abrasive structure was substantially rectilinear, with a slight curvature due to the radius (62.5 mm in the present case) of the cup diamond wheel.
  • the orientation of the abrasive structure was approximately 85 ° -90 ° relative to the tangential reference direction (ie, approximately radial).
  • the present invention is not limited to the above-explained embodiments.
  • the outer shape and structure of the X-ray rotary anode may deviate from the X-ray rotary anode -2- shown in the figures.
  • the focal-path covering covers only a part of the frustoconical section and adjoins the surface of the support body radially inwardly and / or radially outwardly in the same plane on the surface of the focal-path covering.
  • the respective (inclined) surface portions of the carrier body may be provided with an abrasive structure.
  • the X-ray rotary anode has no separate focal track coating and the focal path on a substantially monolithic body (apart from attachments such as a graphite ring, etc.) is formed.
  • provision may be made for the surface in question to be smoothed as far as possible prior to the introduction of the abrasive structure in order to eliminate as far as possible the influences of existing structures on the surface.
  • smoothing can be done for example by mechanical polishing and / or electropolishing.
  • the X-ray rotary anode can only be coarsely pre-rotated in the circumferential direction in order to introduce relatively coarse grooves which are aligned in the circumferential direction.
  • the directional abrasive structure according to the invention which extends at least predominantly in the radial direction, can be introduced in such a way that the grooves resulting from the turning at least partially remain intact. In this way, grooves and thus directed cracking nuclei are provided, which have at least two different orientations at the respective surface sections and accordingly support the formation of a fine crack network.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • X-Ray Techniques (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Claims (12)

  1. Anode tournante à rayons X comprenant une bande focale (16) annulaire, la surface de la bande focale possédant une structure rectifiée (18 ; 22) dirigée, l'orientation de la structure rectifiée (18 ; 22) sur tout le pourtour de la bande focale (16) annulaire et sur toute l'étendue radiale de la bande focale (16) étant respectivement inclinée à un angle dans la plage de 15° inclus à 90° inclus par rapport à une direction de référence tangentielle (8) dans la portion de surface respective.
  2. Anode tournante à rayons X selon la revendication 1, avec laquelle l'orientation de la structure rectifiée (18 ; 22) sur tout le pourtour de la bande focale (16) et sur toute l'étendue radiale de la bande focale (16) est respectivement inclinée à un angle dans la plage de 35° inclus à 70° inclus par rapport à une direction de référence tangentielle (8) dans la portion de surface respective.
  3. Anode tournante à rayons X selon la revendication 1 ou 2, avec laquelle la structure rectifiée (22) dirigée possède respectivement un tracé sensiblement rectiligne.
  4. Anode tournante à rayons X selon la revendication 1 ou 2, avec laquelle l'angle entre l'orientation de la structure rectifiée (18) et une direction de référence tangentielle (8) dans la portion de surface respective diminue le long d'une direction radiale (10) de l'intérieur vers l'extérieur sur toute l'étendue radiale de la bande focale (16).
  5. Anode tournante à rayons X selon l'une des revendications précédentes, avec laquelle la profondeur de rugosité moyenne Ra dans la zone de la structure rectifiée (18 ; 22) est comprise dans une plage de 0,05 µm inclus à 0,5 µm inclus, un tronçon de mesure rectiligne et sensiblement perpendiculaire à l'orientation de la structure rectifiée étant utilisé pour la détermination de la profondeur de rugosité moyenne.
  6. Anode tournante à rayons X selon l'une des revendications précédentes, avec laquelle la structure rectifiée (18 ; 22) s'étend au-delà de la zone de la bande focale (16).
  7. Anode tournante à rayons X selon l'une des revendications précédentes, avec laquelle le matériau de la bande focale dans la zone de la bande focale (16) est formé de tungstène ou d'un alliage à base de tungstène.
  8. Anode tournante à rayons X selon l'une des revendications précédentes, avec laquelle celle-ci possède un corps porteur (12) et un revêtement de bande focale (14) formé sur le corps porteur (12) et sur lequel s'étend la bande focale (16).
  9. Procédé de fabrication d'une anode tournante à rayons X (2), selon lequel une structure rectifiée (18 ; 22) dirigée étant incorporée au moins dans la zone d'une bande focale (16) annulaire de l'anode tournante à rayons X (2) de telle sorte que l'orientation de la structure rectifiée (18 ; 22) sur tout le pourtour de la bande focale annulaire (16) et sur toute l'étendue radiale de la bande focale (16) est respectivement inclinée à un angle dans la plage de 15° inclus à 90° inclus par rapport à une direction de référence tangentielle (8) dans la portion de surface respective.
  10. Procédé selon la revendication 9, selon lequel l'étape d'incorporation de la structure rectifiée (18 ; 22) forme la dernière étape d'usinage d'enlèvement de matière dans la zone de la surface de la bande focale lors de la fabrication de l'anode tournante à rayons X (2).
  11. Procédé selon la revendication 9 ou 10, selon lequel la structure rectifiée (18 ; 22) est incorporée par rectification.
  12. Procédé selon l'une des revendications 9 à 11, selon lequel l'incorporation de la structure rectifiée (18 ; 22) est effectuée en déplaçant un corps abrasif de telle sorte que sa surface abrasive se déplace au moins proportionnellement dans la direction radiale (10) et en ce qu'en plus de cela, le corps abrasif et la bande focale (16) sont déplacés l'un par rapport à l'autre dans le sens du pourtour.
EP13705898.8A 2012-01-09 2013-01-07 Anode tournante pour tube à rayons x présentant une structure obtenue par polissage orientée radialement au moins en partie et méthode de fabrication Active EP2803076B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ATGM2/2012U AT12462U3 (de) 2012-01-09 2012-01-09 Röntgendrehanode mit zumindest anteilig radial ausgerichteter schleifstruktur
PCT/AT2013/000001 WO2013104008A1 (fr) 2012-01-09 2013-01-07 Anode tournante pour tube à rayons x présentant une structure en boucle orientée radialement au moins en partie

Publications (2)

Publication Number Publication Date
EP2803076A1 EP2803076A1 (fr) 2014-11-19
EP2803076B1 true EP2803076B1 (fr) 2016-08-31

Family

ID=45724359

Family Applications (1)

Application Number Title Priority Date Filing Date
EP13705898.8A Active EP2803076B1 (fr) 2012-01-09 2013-01-07 Anode tournante pour tube à rayons x présentant une structure obtenue par polissage orientée radialement au moins en partie et méthode de fabrication

Country Status (5)

Country Link
US (1) US9543108B2 (fr)
EP (1) EP2803076B1 (fr)
JP (1) JP6174043B2 (fr)
AT (1) AT12462U3 (fr)
WO (1) WO2013104008A1 (fr)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8349167B2 (en) 2006-12-14 2013-01-08 Life Technologies Corporation Methods and apparatus for detecting molecular interactions using FET arrays
ES2923759T3 (es) 2006-12-14 2022-09-30 Life Technologies Corp Aparato para medir analitos utilizando matrices de FET
US20100137143A1 (en) 2008-10-22 2010-06-03 Ion Torrent Systems Incorporated Methods and apparatus for measuring analytes
US20120261274A1 (en) 2009-05-29 2012-10-18 Life Technologies Corporation Methods and apparatus for measuring analytes
US8776573B2 (en) 2009-05-29 2014-07-15 Life Technologies Corporation Methods and apparatus for measuring analytes
AU2011226767B1 (en) 2010-06-30 2011-11-10 Life Technologies Corporation Ion-sensing charge-accumulation circuits and methods
US8455927B2 (en) 2010-06-30 2013-06-04 Life Technologies Corporation One-transistor pixel array with cascoded column circuit
EP2617061B1 (fr) 2010-09-15 2021-06-30 Life Technologies Corporation Procédés et appareil de mesure d'analytes
US9970984B2 (en) 2011-12-01 2018-05-15 Life Technologies Corporation Method and apparatus for identifying defects in a chemical sensor array
US8786331B2 (en) 2012-05-29 2014-07-22 Life Technologies Corporation System for reducing noise in a chemical sensor array
US9080968B2 (en) 2013-01-04 2015-07-14 Life Technologies Corporation Methods and systems for point of use removal of sacrificial material
US9841398B2 (en) 2013-01-08 2017-12-12 Life Technologies Corporation Methods for manufacturing well structures for low-noise chemical sensors
US8963216B2 (en) 2013-03-13 2015-02-24 Life Technologies Corporation Chemical sensor with sidewall spacer sensor surface
US9835585B2 (en) 2013-03-15 2017-12-05 Life Technologies Corporation Chemical sensor with protruded sensor surface
EP2972280B1 (fr) 2013-03-15 2021-09-29 Life Technologies Corporation Capteur chimique avec des surfaces de capteur continues
WO2014149779A1 (fr) 2013-03-15 2014-09-25 Life Technologies Corporation Dispositif chimique à élément conducteur mince
US20140336063A1 (en) 2013-05-09 2014-11-13 Life Technologies Corporation Windowed Sequencing
US10458942B2 (en) 2013-06-10 2019-10-29 Life Technologies Corporation Chemical sensor array having multiple sensors per well
EP3234576B1 (fr) 2014-12-18 2023-11-22 Life Technologies Corporation Circuit intégré à haut débit avec configuration d'émetteur
US10077472B2 (en) 2014-12-18 2018-09-18 Life Technologies Corporation High data rate integrated circuit with power management
WO2016100521A1 (fr) 2014-12-18 2016-06-23 Life Technologies Corporation Procédé et appareil pour mesurer des analytes au moyen de réseaux de tec à grande échelle
AT14990U1 (de) * 2015-05-08 2016-10-15 Plansee Se Beidseitig verwendbare Drehanode
US10165698B2 (en) * 2015-11-12 2018-12-25 Kimtron, Inc. Anode terminal for reducing field enhancement
EP3496128A1 (fr) * 2017-12-11 2019-06-12 Koninklijke Philips N.V. Anode rotative pour source de rayons x
EP3629361B1 (fr) * 2018-09-26 2020-10-28 Siemens Healthcare GmbH Émetteur de rayons x, emploi d'un émetteur de rayons x et procédé de fabrication d'un émetteur de rayons x
DE102019112606A1 (de) * 2019-05-14 2020-11-19 Thüringisches Institut für Textil- und Kunststoff-Forschung e. V. Rudolstadt Medizinisches Instrument und Vorrichtung mit echogenen Markierungen
US11043352B1 (en) * 2019-12-20 2021-06-22 Varex Imaging Corporation Aligned grain structure targets, systems, and methods of forming
CN115362524A (zh) * 2020-03-31 2022-11-18 安乃捷科技公司 旋转阳极单元及x射线产生装置
US11183356B2 (en) * 2020-03-31 2021-11-23 Energetiq Technology, Inc. Rotary anode unit and X-ray generation apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2625605A1 (fr) 1987-12-30 1989-07-07 Thomson Cgr Anode tournante pour tube a rayons x
US7079625B2 (en) 2003-01-20 2006-07-18 Siemens Aktiengesellschaft X-ray anode having an electron incident surface scored by microslits
DE10360018A1 (de) * 2003-01-20 2004-07-29 Siemens Ag Röntgenanode
JP4632658B2 (ja) * 2003-11-27 2011-02-16 株式会社日立メディコ Ｘ線発生装置
JP2009517828A (ja) * 2005-12-01 2009-04-30 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Ｘ線管および焦点スポット特性を定める方法
US7356122B2 (en) 2006-05-18 2008-04-08 General Electric Company X-ray anode focal track region

Also Published As

Publication number Publication date
US20150023473A1 (en) 2015-01-22
US9543108B2 (en) 2017-01-10
WO2013104008A1 (fr) 2013-07-18
JP6174043B2 (ja) 2017-08-02
JP2015506557A (ja) 2015-03-02
EP2803076A1 (fr) 2014-11-19
AT12462U2 (de) 2012-05-15
AT12462U3 (de) 2013-05-15

Similar Documents

Publication Publication Date Title
EP2803076B1 (fr) Anode tournante pour tube à rayons x présentant une structure obtenue par polissage orientée radialement au moins en partie et méthode de fabrication
EP3109889B1 (fr) Anode rotative de tube a rayons x
EP2670550B9 (fr) Outil de forage et procede de fabrication de trous
EP3144568A1 (fr) Élement d'etancheite, systeme d'etancheite comprenant un element d'etancheite, turbomachine comprenant un element d'etancheite et procede de production d'un element d'etancheite
AT14991U1 (de) Röntgenanode
EP3071355B1 (fr) Fraise à chanfreiner
EP3365573B1 (fr) Douille de palier lisse munie d'une lèvre d'étanchéité intégrée
EP2988903B1 (fr) Procédé de séparation individuelle de puces à partir d'une plaquette et puces ainsi produites
DE112014001875T5 (de) Lagerteil und sein Herstellungsverfahren
DE102011109071A1 (de) Rohrschmiedeverfahren mit urgeformten Hohlblock
WO2005015063A1 (fr) Anneau de glissement et systeme d'etancheite a anneau de glissement pour moteurs a reaction
DE102017116480A1 (de) Kolbenring mit kugelgestrahlter Einlaufschicht und Verfahren zur Herstellung
DE102011083413B4 (de) Verfahren zum Herstellen einer Röntgenanode und Röntgenanode
DE102019204407A1 (de) Bremsscheibe
DE102014017632A1 (de) Verfahren zum Härten zumindest eines Teilbereichs einer Wandung eines Bauteils
AT521162B1 (de) Trägerkörper für ein Schleifwerkzeug
WO2016198316A1 (fr) Perle de coupe pour un câble de sciage
EP2687820B1 (fr) Corps de mesure, son procédé de fabrication et utilisation d'un corps de mesure
DE102011116918B4 (de) Werkzeug mit geometrisch bestimmter Schneide zur spanabhebenden Finishbearbeitung einer Werkstückoberfläche, Werkzeugschneidengeometrie, Verfahren und Werkstück mit einer endbearbeiteten Funktionsoberfläche
DE3041249A1 (de) Koerper, der wenigstens teilweise aus pyrolytischem graphit besteht, insbesondere anodenscheibe fuer eine drehanoden-roentgenroehre und verfahren zu seiner herstellung
DE102005049519A1 (de) Drehanodenteller für Röntgenröhren
WO2014102654A1 (fr) Palier recepteur hydrodynamique
DE202013101528U1 (de) Hydrodynamisches Auffanglager
DE202014106220U1 (de) Schleifring
EP2954981A1 (fr) Meule

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20140702

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DAX Request for extension of the european patent (deleted)
GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

INTG Intention to grant announced

Effective date: 20160503

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: GERMAN

Ref country code: NL

Ref legal event code: FP

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 502013004268

Country of ref document: DE

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 825628

Country of ref document: AT

Kind code of ref document: T

Effective date: 20161015

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 5

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161130

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161201

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170102

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170131

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161130

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

REG Reference to a national code

Ref country code: CH

Ref legal event code: PK

Free format text: DAS PRIORITAETSAKTENZEICHEN WURDE BERICHTIGT: AT 22012 U / 09.01.2012

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 502013004268

Country of ref document: DE

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20170601

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170131

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170131

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170107

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 6

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20170131

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170107

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20130107

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161231

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20230124

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20230120

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20240119

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: AT

Payment date: 20240122

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20240119

Year of fee payment: 12

Ref country code: GB

Payment date: 20240123

Year of fee payment: 12