EP2757121A3 - Curable composition - Google Patents

Curable composition Download PDF

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Publication number
EP2757121A3
EP2757121A3 EP14001378.0A EP14001378A EP2757121A3 EP 2757121 A3 EP2757121 A3 EP 2757121A3 EP 14001378 A EP14001378 A EP 14001378A EP 2757121 A3 EP2757121 A3 EP 2757121A3
Authority
EP
European Patent Office
Prior art keywords
component
compound
curable composition
group
dimerdiol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP14001378.0A
Other languages
German (de)
French (fr)
Other versions
EP2757121A2 (en
Inventor
Kazuhiko Ooga
Ritsuko Azuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of EP2757121A2 publication Critical patent/EP2757121A2/en
Publication of EP2757121A3 publication Critical patent/EP2757121A3/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • H05K3/287Photosensitive compositions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30Low-molecular-weight compounds
    • C08G18/32Polyhydroxy compounds; Polyamines; Hydroxyamines
    • C08G18/3203Polyhydroxy compounds
    • C08G18/3212Polyhydroxy compounds containing cycloaliphatic groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/71Monoisocyanates or monoisothiocyanates
    • C08G18/718Monoisocyanates or monoisothiocyanates containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/80Masked polyisocyanates
    • C08G18/8003Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen
    • C08G18/8006Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen with compounds of C08G18/32
    • C08G18/8009Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen with compounds of C08G18/32 with compounds of C08G18/3203
    • C08G18/8012Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen with compounds of C08G18/32 with compounds of C08G18/3203 with diols
    • C08G18/8019Masked aromatic polyisocyanates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81Unsaturated isocyanates or isothiocyanates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81Unsaturated isocyanates or isothiocyanates
    • C08G18/8108Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C08G18/8116Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/83Chemically modified polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04Polyurethanes
    • C09D175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Organic Insulating Materials (AREA)

Abstract

The present invention provides a curable composition comprising:
(component A) a compound having a structural unit derived from a dimerdiol and having, as an end group, a group represented by formula (1):
Figure imga0001
wherein R1 represents H or CH3 and R2 represents a hydrocarbon group having 2 to 12 carbon atoms, at an end of the compound;
(component B) a non-silicon-containing monofunctional (meth)acryloyl group-containing compound;
(component C) a photopolymerization initiator; and
(component D) a silane coupling agent.
EP14001378.0A 2009-12-14 2010-12-06 Curable composition Withdrawn EP2757121A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009283328 2009-12-14
EP20100837530 EP2514781B1 (en) 2009-12-14 2010-12-06 Polymerizable compound and curable composition containing same

Related Parent Applications (2)

Application Number Title Priority Date Filing Date
EP20100837530 Division EP2514781B1 (en) 2009-12-14 2010-12-06 Polymerizable compound and curable composition containing same
EP20100837530 Division-Into EP2514781B1 (en) 2009-12-14 2010-12-06 Polymerizable compound and curable composition containing same

Publications (2)

Publication Number Publication Date
EP2757121A2 EP2757121A2 (en) 2014-07-23
EP2757121A3 true EP2757121A3 (en) 2014-12-03

Family

ID=44167258

Family Applications (3)

Application Number Title Priority Date Filing Date
EP14001378.0A Withdrawn EP2757121A3 (en) 2009-12-14 2010-12-06 Curable composition
EP20100837530 Not-in-force EP2514781B1 (en) 2009-12-14 2010-12-06 Polymerizable compound and curable composition containing same
EP14001379.8A Withdrawn EP2757122A2 (en) 2009-12-14 2010-12-06 Photocurable moisture-proof insulating coating material for mounting circuit boards

Family Applications After (2)

Application Number Title Priority Date Filing Date
EP20100837530 Not-in-force EP2514781B1 (en) 2009-12-14 2010-12-06 Polymerizable compound and curable composition containing same
EP14001379.8A Withdrawn EP2757122A2 (en) 2009-12-14 2010-12-06 Photocurable moisture-proof insulating coating material for mounting circuit boards

Country Status (7)

Country Link
US (2) US20120232183A1 (en)
EP (3) EP2757121A3 (en)
JP (3) JP5769635B2 (en)
KR (2) KR101420202B1 (en)
CN (2) CN102652147B (en)
TW (2) TW201406802A (en)
WO (1) WO2011074503A1 (en)

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Publication number Priority date Publication date Assignee Title
KR101420202B1 (en) * 2009-12-14 2014-07-17 쇼와 덴코 가부시키가이샤 Polymerizable compound and curable composition containing same
TWI510550B (en) * 2012-06-15 2015-12-01 Showa Denko Kk Polymerizable composition, polymer, optical adhesive sheet, image display device, and manufacturing method thereof
JP6072493B2 (en) * 2012-10-10 2017-02-01 株式会社カネカ Active energy ray-curable coating resin composition
JP6061728B2 (en) 2013-02-27 2017-01-18 株式会社オートネットワーク技術研究所 Radical and anion combined photo-curing material
WO2014188850A1 (en) * 2013-05-21 2014-11-27 昭和電工株式会社 Light-shielding moisture-proof insulating coating material, sealing/insulating treatment method using light-shielding moisture-proof insulating coating material, and electronic component which is sealed/insulated using light-shielding moisture-proof insulating coating material
CN105377911B (en) * 2013-07-25 2017-05-24 昭和电工株式会社 Composition, curable composition, production method therefor, and cured product
JP6539160B2 (en) * 2014-09-04 2019-07-03 積水化学工業株式会社 Sealant for liquid crystal display element and vertical conduction material
JP6529156B2 (en) * 2015-02-18 2019-06-12 昭和電工株式会社 Composition, method of producing composition and method of producing unsaturated compound
JP6610077B2 (en) * 2015-08-17 2019-11-27 日立化成株式会社 Optical three-dimensional modeling resin composition and method of manufacturing three-dimensional modeling
CN105860627A (en) * 2016-06-16 2016-08-17 马鞍山钢铁股份有限公司 Ultraviolet (UV) curing silicon steel insulating coating and preparation method thereof
JP6641497B2 (en) 2016-10-14 2020-02-05 旭化成株式会社 Isocyanate composition, method for producing isocyanate polymer, and isocyanate polymer
CN107353849A (en) * 2017-07-10 2017-11-17 苏州润德新材料有限公司 A kind of semiconductor special bonding agent
EP3842414B8 (en) 2018-08-20 2023-05-17 Resonac Corporation Composition, production method for composition, and production method for unsaturated compound
WO2020040050A1 (en) 2018-08-20 2020-02-27 昭和電工株式会社 Composition, production method for composition, and production method for unsaturated compound
US11661474B2 (en) 2018-08-20 2023-05-30 Showa Denko K.K. Composition, production method for composition, and production method for unsaturated compound
CN112469694A (en) 2018-08-20 2021-03-09 昭和电工株式会社 Composition, method for producing composition, and method for producing unsaturated compound
EP3894388A1 (en) * 2018-12-13 2021-10-20 Henkel IP & Holding GmbH (meth)acrylate-functionalized waxes and curable compositions made therewith

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EP0952167A1 (en) * 1996-06-17 1999-10-27 Kureha Kagaku Kogyo Kabushiki Kaisha Plastic lens material and process for preparing the same
WO2005107626A1 (en) * 2004-04-28 2005-11-17 The Regents Of The University Of Colorado Dimer acid-derived dimethacrylates and use in dental restorative compositions
JP2008291114A (en) * 2007-05-24 2008-12-04 Hitachi Chem Co Ltd Photosetting resin composition, photosetting and moistureproof insulating paint for mounted circuit board, electronic component and method for manufacturing the component

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Publication number Priority date Publication date Assignee Title
EP0952167A1 (en) * 1996-06-17 1999-10-27 Kureha Kagaku Kogyo Kabushiki Kaisha Plastic lens material and process for preparing the same
WO2005107626A1 (en) * 2004-04-28 2005-11-17 The Regents Of The University Of Colorado Dimer acid-derived dimethacrylates and use in dental restorative compositions
JP2008291114A (en) * 2007-05-24 2008-12-04 Hitachi Chem Co Ltd Photosetting resin composition, photosetting and moistureproof insulating paint for mounted circuit board, electronic component and method for manufacturing the component

Also Published As

Publication number Publication date
JP2015096608A (en) 2015-05-21
EP2757122A2 (en) 2014-07-23
EP2514781A4 (en) 2013-11-06
EP2757121A2 (en) 2014-07-23
US20120232183A1 (en) 2012-09-13
TW201406802A (en) 2014-02-16
CN102652147B (en) 2013-11-20
JP5832625B2 (en) 2015-12-16
EP2514781B1 (en) 2015-04-22
KR20130122807A (en) 2013-11-08
EP2514781A1 (en) 2012-10-24
TWI431023B (en) 2014-03-21
KR20120045024A (en) 2012-05-08
CN103396733A (en) 2013-11-20
JP5769635B2 (en) 2015-08-26
US20140309326A1 (en) 2014-10-16
JP2015091975A (en) 2015-05-14
CN102652147A (en) 2012-08-29
KR101420202B1 (en) 2014-07-17
KR101393467B1 (en) 2014-05-13
JPWO2011074503A1 (en) 2013-04-25
WO2011074503A1 (en) 2011-06-23
TW201136959A (en) 2011-11-01

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