EP2505042A2 - Dispositif et procédé servant à produire un plasma pulsé anisotherme sous pression atmosphérique - Google Patents

Dispositif et procédé servant à produire un plasma pulsé anisotherme sous pression atmosphérique

Info

Publication number
EP2505042A2
EP2505042A2 EP10805398A EP10805398A EP2505042A2 EP 2505042 A2 EP2505042 A2 EP 2505042A2 EP 10805398 A EP10805398 A EP 10805398A EP 10805398 A EP10805398 A EP 10805398A EP 2505042 A2 EP2505042 A2 EP 2505042A2
Authority
EP
European Patent Office
Prior art keywords
plasma
electrode
gas
generating
voltage electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP10805398A
Other languages
German (de)
English (en)
Inventor
Eckhard Kindel
Klaus-Dieter Weltmann
Thomas Kocher
Norbert Lembke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leibniz Institut fuer Plasmaforschung und Technologie eV
Original Assignee
Leibniz Institut fuer Plasmaforschung und Technologie eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leibniz Institut fuer Plasmaforschung und Technologie eV filed Critical Leibniz Institut fuer Plasmaforschung und Technologie eV
Publication of EP2505042A2 publication Critical patent/EP2505042A2/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/47—Generating plasma using corona discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/10—Testing at atmospheric pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/20—Non-thermal plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/30—Medical applications
    • H05H2245/34—Skin treatments, e.g. disinfection or wound treatment

Definitions

  • a number of plasma arrays have been developed, for example, on the basis of a dielectrically impeded discharge [M.Laroussi IEEE Trans Plasma Sei 24 (1996), 1188-1191], an arc discharge [DE 195 32 412 C2], a Corona discharge [M. Laroussi et al IEEE Trans Plasma, 28 (2000), 184-188] or an RF or Microwave Excited Jet [HW Herrmann et al. Phys. Plasma 6 (1999), 2284-2289, BJ Park et al Phys. Plasma 10 (2003), 4539-4544] work. Without significant increase in gas temperature, these anisothermal plasmas can enhance chemical and biochemical reactions.
  • the generated ozone concentration is minimal (at least two to three times smaller than the former MAK value of 0.1 ppm). Due to the length of the plasma of about 1 cm, it is possible for the user to bring the plasma directly into contact with the contaminated object.
  • the length of the plasma is mainly determined by the gas flow rate and the level of applied high voltage. The invention will be explained below with reference to Figures 1-3, without limiting the invention to these examples.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Fluid Mechanics (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
  • Plasma Technology (AREA)
  • Cleaning In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

L'invention concerne un dispositif et un procédé servant à produire un plasma pulsé (intermittent) froid sous la pression atmosphérique, de préférence un fil, pour un traitement antimicrobien ponctuel précis par plasma (destruction des germes, désinfection, stérilisation, décontamination) de surfaces et de cavités de très petites dimensions, y compris sur des corps humains et animaux vivants, de préférence dans le domaine de la médecine, au moyen d'une décharge corona négative à courant continu avec au moins une électrode. L'électrode sert à générer de forts champs électriques et est traversée dans un canal par le gaz à ioniser. L'objet électroconducteur à traiter (surface, cavité) sert d'électrode antagoniste. Ce plasma peut à la base également être utilisé pour nettoyer, revêtir, activer ou graver des surfaces.
EP10805398A 2009-11-27 2010-11-27 Dispositif et procédé servant à produire un plasma pulsé anisotherme sous pression atmosphérique Withdrawn EP2505042A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009047220A DE102009047220A1 (de) 2009-11-27 2009-11-27 Vorrichtung und Verfahren zur Erzeugung eines gepulsten Anisothermen Atmosphärendruck-Plasmas
PCT/DE2010/001390 WO2011063798A2 (fr) 2009-11-27 2010-11-27 Dispositif et procédé servant à produire un plasma pulsé anisotherme sous pression atmosphérique

Publications (1)

Publication Number Publication Date
EP2505042A2 true EP2505042A2 (fr) 2012-10-03

Family

ID=43896865

Family Applications (1)

Application Number Title Priority Date Filing Date
EP10805398A Withdrawn EP2505042A2 (fr) 2009-11-27 2010-11-27 Dispositif et procédé servant à produire un plasma pulsé anisotherme sous pression atmosphérique

Country Status (4)

Country Link
US (1) US20130026137A1 (fr)
EP (1) EP2505042A2 (fr)
DE (1) DE102009047220A1 (fr)
WO (1) WO2011063798A2 (fr)

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DE102011076806A1 (de) * 2011-05-31 2012-12-06 Leibniz-Institut für Plasmaforschung und Technologie e.V. Vorrichtung und Verfahren zur Erzeugung eines kalten, homogenen Plasmas unter Atmosphärendruckbedingungen
DE102014105720A1 (de) 2014-04-23 2015-10-29 Inp Greifswald E.V. Wirkauflage und Verfahren zur Behandlung einer Oberfläche
DE102014013716B4 (de) 2014-09-11 2022-04-07 Cinogy Gmbh Elektrodenanordnung zur Ausbildung einer dielektrisch behinderten Plasmaentladung
TWI548310B (zh) 2014-11-21 2016-09-01 財團法人工業技術研究院 電漿處理之模組化電極裝置
DE102015101315B3 (de) * 2015-01-29 2016-04-21 Inp Greifswald E.V. Plasmabehandlungsgerät und Verfahren zur Plasmabehandlung
US11490947B2 (en) 2015-05-15 2022-11-08 Clear Intradermal Technologies, Inc. Tattoo removal using a liquid-gas mixture with plasma gas bubbles
EP3294419A1 (fr) 2015-05-15 2018-03-21 Clearit, LLC Systèmes et procédés d'enlèvement de tatouage à l'aide d'un plasma froid
US20160361558A1 (en) * 2015-06-10 2016-12-15 Plasmology4, Inc. Internal cold plasma system
WO2017197071A1 (fr) 2016-05-12 2017-11-16 EP Technologies LLC Procédés et systèmes d'administration de substance trans-tissulaire par plasmaporation
DE102016118569A1 (de) 2016-09-30 2018-04-05 Cinogy Gmbh Elektrodenanordnung zur Ausbildung einer dielektrisch behinderten Plasmaentladung
WO2018089577A1 (fr) 2016-11-10 2018-05-17 EP Technologies LLC Procédés et systèmes pour la génération de liquide activé par plasma
US11871978B2 (en) 2017-04-20 2024-01-16 Boise State University Plasma scalpel for selective removal of microbes and microbial biofilms
TWI691237B (zh) * 2018-02-13 2020-04-11 國立交通大學 常壓電漿束產生裝置
US20220008122A1 (en) * 2018-10-10 2022-01-13 Pulse Biosciences, Inc. Treatment of dermal glands by the application of non-thermal energy
IT201800009541A1 (it) * 2018-10-17 2020-04-17 Plume Srl Sistema di tipo scarica di superficie con barriera dielettrica e metodo per la generazione di un plasma atmosferico a basso contenuto di ozono
US11911090B2 (en) 2018-12-19 2024-02-27 Clear Intradermal Technologies, Inc. Systems and methods for tattoo removal using an applied electric field
CN111420109B (zh) * 2020-03-01 2022-05-10 杭州维那泰克医疗科技有限责任公司 电磁脉冲协同等离子体高效空气净化消毒设备
DE102020109380A1 (de) 2020-04-03 2021-10-07 Relyon Plasma Gmbh Sondenvorrichtung
US20210385934A1 (en) * 2020-04-09 2021-12-09 Chiscan Holdings, Llc Treatment of infectious diseases using non-thermal plasma
CN113275327B (zh) * 2021-04-28 2022-12-02 广东安达智能装备股份有限公司 一种旋风式等离子清洗方法
CN113663214A (zh) * 2021-07-27 2021-11-19 飞迪科美容设备（上海）有限公司 一种用于皮肤美容仪plasma脉冲波控制方法及应用
CN115243439A (zh) * 2022-07-28 2022-10-25 中国科学院苏州生物医学工程技术研究所 一种非接触式高压脉冲装置

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US4060088A (en) * 1976-01-16 1977-11-29 Valleylab, Inc. Electrosurgical method and apparatus for establishing an electrical discharge in an inert gas flow
US4781175A (en) * 1986-04-08 1988-11-01 C. R. Bard, Inc. Electrosurgical conductive gas stream technique of achieving improved eschar for coagulation
GB2246955B (en) 1990-08-16 1994-04-06 Jonathan Hugh Lambert Copus Destruction of microorganisms
DE19532412C2 (de) 1995-09-01 1999-09-30 Agrodyn Hochspannungstechnik G Vorrichtung zur Oberflächen-Vorbehandlung von Werkstücken
JP2001056395A (ja) * 1999-06-11 2001-02-27 Ramuda:Kk マイナスイオン放射方法及びその装置
EP1148770A3 (fr) * 2000-04-21 2008-01-02 Söring GmbH Générateur de plasma pour la chirurgie HF
AU2006220583B2 (en) * 2005-03-07 2011-01-20 Old Dominion University Plasma generator
DE102005049287A1 (de) * 2005-06-16 2006-12-28 Siemens Ag Siebvorrichtung für die Herstellung von Papier und Verfahren zur Behandlung unverwobener Faserstoffe
DE102005028024A1 (de) * 2005-06-16 2006-12-28 Siemens Ag Verfahren und Vorrichtung zur Erzeugung großflächiger Atmosphärendruck-Plasmen
DE102006019664B4 (de) * 2006-04-27 2017-01-05 Leibniz-Institut für Plasmaforschung und Technologie e.V. Kaltplasma-Handgerät zur Plasma-Behandlung von Oberflächen
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See also references of WO2011063798A2 *

Also Published As

Publication number Publication date
WO2011063798A2 (fr) 2011-06-03
WO2011063798A3 (fr) 2011-07-21
US20130026137A1 (en) 2013-01-31
DE102009047220A1 (de) 2011-06-01

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