EP2187462A2 - Piezoelectric/electrostrictive ceramics composition, piezoelectric/electrostrictive ceramics sintered body, pieroelectric/electrostrictive element, manufacturing method of piezoelectric/electrostrictive ceramics composition, and manufacturing method of piezoelectric/electrostrictive element - Google Patents
Piezoelectric/electrostrictive ceramics composition, piezoelectric/electrostrictive ceramics sintered body, pieroelectric/electrostrictive element, manufacturing method of piezoelectric/electrostrictive ceramics composition, and manufacturing method of piezoelectric/electrostrictive element Download PDFInfo
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- EP2187462A2 EP2187462A2 EP20090252637 EP09252637A EP2187462A2 EP 2187462 A2 EP2187462 A2 EP 2187462A2 EP 20090252637 EP20090252637 EP 20090252637 EP 09252637 A EP09252637 A EP 09252637A EP 2187462 A2 EP2187462 A2 EP 2187462A2
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- 239000000919 ceramic Substances 0.000 title claims abstract description 53
- 239000000203 mixture Substances 0.000 title claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 230000002950 deficient Effects 0.000 claims abstract description 62
- 229910010252 TiO3 Inorganic materials 0.000 claims abstract description 17
- 238000010587 phase diagram Methods 0.000 claims abstract description 16
- 229910002113 barium titanate Inorganic materials 0.000 claims abstract description 10
- PCTMTFRHKVHKIS-BMFZQQSSSA-N (1s,3r,4e,6e,8e,10e,12e,14e,16e,18s,19r,20r,21s,25r,27r,30r,31r,33s,35r,37s,38r)-3-[(2r,3s,4s,5s,6r)-4-amino-3,5-dihydroxy-6-methyloxan-2-yl]oxy-19,25,27,30,31,33,35,37-octahydroxy-18,20,21-trimethyl-23-oxo-22,39-dioxabicyclo[33.3.1]nonatriaconta-4,6,8,10 Chemical compound C1C=C2C[C@@H](OS(O)(=O)=O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2.O[C@H]1[C@@H](N)[C@H](O)[C@@H](C)O[C@H]1O[C@H]1/C=C/C=C/C=C/C=C/C=C/C=C/C=C/[C@H](C)[C@@H](O)[C@@H](C)[C@H](C)OC(=O)C[C@H](O)C[C@H](O)CC[C@@H](O)[C@H](O)C[C@H](O)C[C@](O)(C[C@H](O)[C@H]2C(O)=O)O[C@H]2C1 PCTMTFRHKVHKIS-BMFZQQSSSA-N 0.000 claims abstract description 9
- 229910052797 bismuth Inorganic materials 0.000 claims description 13
- 229910052700 potassium Inorganic materials 0.000 claims description 12
- 239000007858 starting material Substances 0.000 claims description 12
- 229910052708 sodium Inorganic materials 0.000 claims description 11
- 238000002156 mixing Methods 0.000 claims description 9
- 239000006104 solid solution Substances 0.000 claims description 8
- 230000005684 electric field Effects 0.000 abstract description 58
- 230000032683 aging Effects 0.000 abstract description 7
- 239000013078 crystal Substances 0.000 description 44
- 239000011734 sodium Substances 0.000 description 28
- 239000000758 substrate Substances 0.000 description 23
- 238000000034 method Methods 0.000 description 19
- 239000000463 material Substances 0.000 description 17
- 238000010304 firing Methods 0.000 description 16
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 16
- 239000000843 powder Substances 0.000 description 14
- 239000012071 phase Substances 0.000 description 12
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 11
- 229910001928 zirconium oxide Inorganic materials 0.000 description 11
- 238000006073 displacement reaction Methods 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 229910052697 platinum Inorganic materials 0.000 description 8
- 230000010287 polarization Effects 0.000 description 8
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 7
- 239000002003 electrode paste Substances 0.000 description 7
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- 239000011230 binding agent Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 238000005452 bending Methods 0.000 description 5
- 238000001354 calcination Methods 0.000 description 5
- 239000002612 dispersion medium Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 238000007650 screen-printing Methods 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- FSAJRXGMUISOIW-UHFFFAOYSA-N bismuth sodium Chemical compound [Na].[Bi] FSAJRXGMUISOIW-UHFFFAOYSA-N 0.000 description 3
- 229910002115 bismuth titanate Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 239000000543 intermediate Substances 0.000 description 3
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 3
- 238000003801 milling Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 230000002040 relaxant effect Effects 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- YPQJHZKJHIBJAP-UHFFFAOYSA-N [K].[Bi] Chemical compound [K].[Bi] YPQJHZKJHIBJAP-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000002609 medium Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 238000003746 solid phase reaction Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 238000001636 atomic emission spectroscopy Methods 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000009614 chemical analysis method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010344 co-firing Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- -1 first Substances 0.000 description 1
- 238000007716 flux method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000007569 slipcasting Methods 0.000 description 1
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- 230000035882 stress Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910003454 ytterbium oxide Inorganic materials 0.000 description 1
- 229940075624 ytterbium oxide Drugs 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8561—Bismuth based oxides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/09—Forming piezoelectric or electrostrictive materials
- H10N30/093—Forming inorganic materials
- H10N30/097—Forming inorganic materials by sintering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/05—Manufacture of multilayered piezoelectric or electrostrictive devices, or parts thereof, e.g. by stacking piezoelectric bodies and electrodes
- H10N30/053—Manufacture of multilayered piezoelectric or electrostrictive devices, or parts thereof, e.g. by stacking piezoelectric bodies and electrodes by integrally sintering piezoelectric or electrostrictive bodies and electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/50—Piezoelectric or electrostrictive devices having a stacked or multilayer structure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Definitions
- the piezoelectric/electrostrictive film 410 can be formed by a method such as ion beam, sputtering, vacuum vapor deposition, PVD, ion plating, CVD, plating, sol-gel, aerosol deposition, screen printing, spray or dipping.
- a screen printing method is preferred since the planar shape and the film thickness have high accuracy and a piezoelectric/electrostrictive film can be continuously formed.
- the heat treatment of the electrode films 408 and 412 is performed simultaneously with firing in view of the productivity. However, this description does not interfere with the heat treatment carried out for each formation of the electrode films 408 and 412.
- firing of the piezoelectric/electrostrictive film 410 is performed prior to the heat treatment of the electrode film 412, the electrode film 412 is subjected to a heat treatment at a temperature lower than the firing temperature of the piezoelectric/electrostrictive film 410.
- the grain size of the sintered body of samples X1 to X16, A1 to A9, B1 to B9, C1 to C9, D1 to D9, E1 to E6, F1 to F6, G1 to G6 and H1 to H6, which are made of ceramics, was calculated from an electron micrograph of the polished surface by a line intercept method. As a result, the grain size was from 0.5 to 5 ⁇ m.
Abstract
Description
- The present invention relates to a sodium bismuth titanate-based piezoelectric/electrostrictive ceramic composition and a technology in relation to the same.
- A piezoelectric/electrostrictive actuator has such an advantage that a displacement can be accurately controlled in a submicron order. Particularly, a piezoelectric/electrostrictive actuator using a sintered body of piezoelectric/electrostrictive ceramics as a piezoelectric/electrostrictive body can accurately control a displacement, and also has advantages such as high electromechanical conversion efficiency, a large generation force, a high response speed, high durability and less power consumption. Therefore, the piezoelectric/electrostrictive actuator using the sintered body of piezoelectric/electrostrictive ceramics as the piezoelectric/electrostrictive body is employed as a head of an inkjet printer, an injector of a diesel engine and so on utilizing these advantages.
- As the sintered body of piezoelectric/electrostrictive ceramics for a piezoelectric/electrostrictive actuator, a lead zirconate titanate (hereinafter referred to as "PZT')-based leaded piezoelectric/electrostrictive material has hitherto been used. However, ever since an influence of lead from a sintered body on the global environment came to be strongly feared, it has also been studied to use a lead-free piezoelectric/electrostrictive material such as a sodium bismuth titanate (hereinafter referred to as "BNT")-based material.
- In a BNT-based lead-free piezoelectric/electrostrictive material, there was made a trial of increasing an electric field-induced strain, which is important for a piezoelectric/electrostrictive actuator, by solid-dissolving bismuth potassium titanate (hereinafter referred to as "BKT") or barium titanate (hereinafter referred to as "BT") in BNT. However, it is difficult to obtain a large electric field-induced strain, which is equivalent to that of a PZT-based leaded piezoelectric/electrostrictive material, only by the above method.
- Therefore, trials for obtaining a larger electric field-induced strain by introducing defects into a crystal have been made.
- For example, Non-Patent Document 1 describes that a large electric field-induced strain is obtained by introducing defects into a single crystal of BNT-BKT-BT, which is a solid solution of BNT, BKT and BT.
- Patent Documents 1 and 2 describe that a large electric field-induced strain is obtained by substituting a portion of constituent elements with a donor or an acceptor and introducing defects having the same symmetry as that of a crystal into a single crystal or ceramics through an aging treatment for 5 days to 3 months.
- [Non-Patent Document 1]Teranishi and other six persons, "Giant-Strain Characteristics in (Bi0.5Na0.5)TiO3-based Ferroelectric Substance", Preliminary Manuscript of 46th Symposium on Basic Science of Ceramics, The Ceramic Society of Japan, Division of Basic Science, January 2008, pp. 482-483
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- [Patent Document 1]Japanese Patent Application Laid-Open No.
2004-363557 - [Patent Document 2]Japanese Patent Application Laid-Open No.
2006-137654 - Since a growing temperature of a BNT-based single crystal is as high as at least 1300°C, it is difficult to control the concentration of easily volatilizable components such as Bi (bismuth) and K (potassium) in the production of a BNT-based single crystal. Therefore, in the BNT-based single crystal, the composition of starting materials upon mixing is different from that of the grown single crystal. This means that it is difficult to control the amount of defects which has a close correlation with the magnitude of an electric field-induced strain.
- There is also a problem that it is difficult to process a single crystal into a film shape suited for a piezoelectric/electrostrictive body to be used in a piezoelectric/electrostrictive actuator since there is a restriction on processing of a single crystal.
- Taking these facts into consideration, it is desired to use, as the piezoelectric/electrostrictive body of the piezoelectric/electrostrictive actuator, a sintered body of ceramics as compared with the single crystal described in Non-Patent Document 1. However, since a hetero-phase is likely to be precipitated on crystal grain boundaries in the sintered body of piezoelectric/electrostrictive ceramics, it is impossible to directly apply findings with respect to the single crystal obtained by Non-Patent Document 1 to piezoelectric/electrostrictive ceramics.
- Therefore, findings with respect to induction of defects into piezoelectric/electrostrictive ceramics are required. However, induction of defects into piezoelectric/electrostrictive ceramics by the techniques of Patent Documents 1 and 2 is not suited for industrial production since an aging treatment requires a long period.
- The present invention has been made so as to solve these problems and a first object thereof is to provide piezoelectric/electrostrictive ceramics with a large electric filed-induced strain without performing an aging treatment. A second object thereof is to provide a piezoelectric/electrostrictive element with a large displacement without performing an aging treatment.
- In order to achieve the above objects, as the composition of piezoelectric/electrostrictive ceramics, there was employed a composition represented by the general formula: x(Bi1/2Na1/2)TiO3-y(Bi1/2K1/2)TiO3-zBaTiO3 wherein at least one kind among Bi, Na and K as A-site elements is allowed to become deficient from stoichiometry in which a point (x, y, z) representing content ratios x, y and z of (Bi1/2Na1/2)TiO3, (Bi1/2K1/2)TiO3 and BaTiO3 is within a range (also including a border line) of a quadrangle ABCD with a point A (x = 0.93, y = 0, z = 0.07), a point B (x = 0.86, y = 0, z = 0.14), a point C (x = 0.74, y = 0.20, z = 0.06) and a point D (x = 0.80, y = 0.20, z = 0.00) as vertices in a ternary phase diagram, and thus vacancies are formed in the A-site of a perovskite structure.
- A stoichiometrically deficient amount of the A-site elements is at least 2 mol% to at most 6 mol%, and an amount of A-site vacancies of the perovskite structure is at least 2 mol% to at most 6 mol%.
- According to the inventions of claims 1, 2 and 4, piezoelectric/electrostrictive ceramics with a large electric field-induced strain can be provided without performing an aging treatment.
- According to the inventions of claims 3 and 5, a piezoelectric/electrostrictive element with a large displacement can be provided without performing an aging treatment.
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FIG. 1 ] This is a diagram showing a ternary phase diagram for explaining a desired composition range of piezoelectric/electrostrictive ceramics according to a first embodiment; - [
FIG. 2 ] This is a flow chart for explaining a production flow of the piezoelectric/electrostrictive ceramics according to the first embodiment; - [
FIG. 3 ] This is a sectional view of a piezoelectric/electrostrictive actuator according to a second embodiment; - [
FIG. 4 ] This is a sectional view of a piezoelectric/electrostrictive actuator according to a third embodiment; - [
FIG. 5 ] This is a sectional view of a piezoelectric/electrostrictive actuator according to a fourth embodiment; - [
FIG. 6 ] This is a perspective view of a piezoelectric/electrostrictive actuator according to a fifth embodiment; - [
FIG. 7 ] This is a longitudinal sectional view of the piezoelectric/electrostrictive actuator according to the fifth embodiment; - [
FIG. 8 ] This is a transverse sectional view of the piezoelectric/electrostrictive actuator according to the fifth embodiment; - [
FIG. 9 ] This is an exploded perspective view of a portion of the piezoelectric/electrostrictive actuator according to the fifth embodiment; - [
FIG. 10 ] This is a graph showing a polarization change to an electric field when an AC electric field is applied to a sample X1; - [
FIG. 11 ] This is a graph showing a polarization change to an electric field when an AC electric field is applied to a sample X3; - [
FIG. 12 ] This is a graph showing a strain change to an electric field when an AC electric field is applied to the sample X1; and - [
FIG. 13 ] This is a graph showing a strain change to an electric field when an AC electric field is applied to the sample X3. - These and other objects, features, aspects and advantages of the present invention will become more apparent with reference to the following detailed description along with the accompanied drawings.
- A first embodiment relates to piezoelectric/electrostrictive ceramics.
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FIG. 1 is a diagram showing a desired composition range of the piezoelectric/electrostrictive ceramics according to the first embodiment.FIG. 1 is a three component-based ternary phase diagram of sodium bismuth titanate ((Bi1/2Na1/2)TiO3, hereinafter referred to as "BNT"), bismuth potassium titanate ((Bi1/2K1/2)TiO3, hereinafter referred to as "BKT") and barium titanate ((BaTiO3, hereinafter referred to as "BT"). - The piezoelectric/electrostrictive ceramics according to the first embodiment have the composition represented by the general formula: xBNT-yBKT-zBT (x + y + z = 1) wherein at least one kind among Bi (bismuth), Na (sodium) and K (potassium) as A-site elements is allowed to become deficient from stoichiometry in which a point (x, y, z) representing content ratios x, y and z of BNT, BKT and BT is within a range (also including a border line) of a quadrangle ABCD with a point A (x = 0.93, y = 0, z = 0.07), a point B (x = 0.86, y = 0, z = 0.14), a point C (x = 0.74, y = 0.20, z = 0.06) and a point D (x = 0.80, y = 0.20, z = 0.00) as vertices in a ternary phase diagram shown in
FIG. 1 . A stoichiometrically deficient amount of the A-site elements is at least 2 mol% to at most 8 mol%. When there are two or more kinds of elements which are allowed to become deficient from stoichiometry, there is no limitation on the combination of the elements which are allowed to become deficient. - The composition of the piezoelectric/electrostrictive ceramics according to the first embodiment can also be represented by the general formula: (Bi0.5x+0.5y pNa0.5x-qK0.5y-rBaz)TiO3-δ (x + y + z = 1, 0.02 ≤ p + q + r ≤ 0.06, 0 ≤ p, o ≤ q, 0 ≤ r).
- The piezoelectric/electrostrictive ceramics according to the first embodiment may contain slight impurities.
- The content ratios x, y and z of BNT, BKT and BT are adjusted to the above range because an electric field-induced strain tends to decrease when the content ratios deviate from the above range (not including border line). When the content ratio y of BKT exceeds a line CD connecting the point C and the point D of the ternary phase diagram shown in
FIG. 1 , a leak current tends to increase. - The stoichiometrically deficient amount of the A-site elements was adjusted to the above range because an electric field-induced strain tends to decrease when the stoichiometrically deficient amount is less than the above range, and also the electric field-induced strain tends to decrease and the leak current tends to increase when the stoichiometrically deficient amount is more than the above range.
- The piezoelectric/electrostrictive ceramics according to the first embodiment includes BNT·BKT·-BT, which is a solid solution of BNT, BKT and BT, and the crystal structure is a perovskite structure. The piezoelectric/electrostrictive ceramics according to the first embodiment may contain a slight hetero-phase.
- The line AD connecting the point A and the point D of the ternary phase diagram shown in
FIG. 1 exists in the vicinity of a morphotropic phase boundary between a tetragonal phase with a space group of P4 mm and a rhombohedral phase with a space group of R3C. In the range of a quadrangle ABCD, a crystal system of the solid solution BNT-BKT-BT is composed of a tetragonal phase as a main phase. A crystal system composed of a tetragonal phase having lattice anisotropy contributes to an increase in the electric field-induced strain due to non-180° domain switching. - As described above, when the A-site elements are allowed to become deficient from stoichiometry, vacancies are formed in the A-site of a perovskite structure. The amount of A-site vacancies is at least 2 mol% to at most 6 mol%.
- As described above, formation of A-site vacancies enables easy occurrence of domain switching and contributes to the occurrence of a large electric field-induced strain caused by rotation of a non-180° domain. In the case where rotation of a non-180° domain is likely to occur, when an AC electric field is applied, there is observed a jump phenomenon in which the strain and polarization rapidly nonlinearly increase in a certain electric field. Specific examples thereof are mentioned in the following "Examples".
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FIG. 2 is a flow chart for explaining a production flow of the piezoelectric/electrostrictive ceramics according to the first embodiment. - First, starting materials of constituent elements (Bi, Na, K, Ba, Ti) weighed so as to have the above composition are mixed. As the starting materials, an oxide or compounds such as a carbonate, a tartrate or an oxalate, which are finally converted into oxides, are used. Mixing is performed by a ball mill and so on. When mixing is performed by a ball mill, an organic solvent such as ethanol, toluene or acetone is used as a dispersion medium, while removal of the dispersion medium from the slurry is performed by evaporation and drying, filtration, centrifugal separation, or the like. Mixing may be performed by a dry method in place of a wet method.
- After mixing the starting materials, the resulting mixed materials are reacted by calcination. The calcination temperature is preferably from 800 to 1000°C. The time of maintaining a maximum temperature is preferably from 2 to 10 hours.
- In order to adjust the particle diameter and the specific surface area, the resultant powder may be pulverized. In this case, calcination and pulverization may be repeated twice or more times. In order to adjust the particle diameter distribution, the resultant powder may be classified. Furthermore, in order to adjust the shape and the particle diameter of secondary particles, a slurry of the resultant powder may be subjected to a granulation treatment such as spray drying.
- After calcining the mixed materials, the resultant powder is formed. Forming is performed by extrusion molding, injection molding, press molding, slip casting, tape casting, or cold isostatic press (CIP) molding. CIP molding may be performed after performing pressmolding. Prior to the forming, the powder may be mixed with a binder. When the powder is mixed with a binder, a polyvinylbutyral resin, a polyvinyl alcohol resin, a polyvinyl acetate resin or a polyacrylic resin is used as the binder.
- After forming the powder, the resulting formed body is fired. The firing temperature is preferably from 1100 to 1200°C. The time of maintaining a maximum temperature is preferably from 2 to 10 hours. When the powder is mixed with a resin binder, a heat treatment for removing the resin binder from the formed body is preferably performed. The resulting sintered body may be subjected to a processing such as cutting, grinding or polishing. Prior to firing, an electrode film may be formed on a surface of the formed body, followed by co-firing of the formed body and the electrode film.
- When the resulting sintered body is used for a piezoelectric/electrostrictive actuator and an electric field more than the coercive electric field is applied, it is not necessarily required to subject the resulting sintered body to a polarization treatment. However, this description does not interfere with a polarization treatment of the resulting sintered body.
- It is not essential that the starting materials of all the constituent elements are reacted at a time as described above, and the starting materials may be reacted by two or more portions. For example, after synthesizing intermediates such as BNT, BKT and BT, a solid solution BNT-BKT-BT may be synthesized by reacting the intermediates. The solid solution BNT-BKT-BT or the intermediates may also be synthesized by a method other than a solid phase reaction method such as an alkoxide method.
- The sintered body of the piezoelectric/electrostrictive ceramics of the first embodiment is suitably used for a piezoelectric/electrostrictive actuator because of a large electric field-induced strain obtained when a large electric field is applied. However, this description does not interfere with the use of the sintered body of the piezoelectric/electrostrictive ceramics of the first embodiment for other piezoelectric/electrostrictive elements, for example, a resonator and a sensor. As a matter of course, when the sintered body of the piezoelectric/electrostrictive ceramics is used for a resonator or a sensor and an electric field more than the coercive electric field is not applied, the resulting sintered body is subjected to a polarization treatment.
- The second embodiment relates to a piezoelectric/
electrostrictive actuator 402 using the piezoelectric/electrostrictive ceramics of the first embodiment. -
FIG. 3 is a schematic view of the piezoelectric/electrostrictive actuator 402 of the second embodiment.FIG. 3 is a sectional view of a single-layered piezoelectric/electrostrictive actuator 402. - As shown in
FIG. 3 , the piezoelectric/electrostrictive actuator 402 has a structure in which anelectrode film 408, a piezoelectric/electrostrictive film 410 and anelectrode film 412 are laminated in this order on a top surface of asubstrate 404. Theelectrode films electrostrictive film 410 face each other across the piezoelectric/electrostrictive film 410. A laminate 406 in which theelectrode film 408, the piezoelectric/electrostrictive film 410 and theelectrode film 412 are laminated is fixed to thesubstrate 404. - "Fixation" as used herein means that the laminate 406 is bonded to the
substrate 404 by a solid phase reaction at an interface between thesubstrate 404 and the laminate 406 without using an organic adhesive or an inorganic adhesive. - In the piezoelectric/
electrostrictive actuator 402, when a voltage is applied, the piezoelectric/electrostrictive film 410 is expanded and contracted in a direction perpendicular to the electric field according to the applied voltage and, as a result, a bending displacement arises. - The piezoelectric/
electrostrictive film 410 is constituted using the sintered body of the piezoelectric/electrostrictive ceramics of the first embodiment. - The film thickness of the piezoelectric/
electrostrictive film 410 is preferably from 0.5 to 50 µm, more preferably from 0.8 to 40 µm, and particularly preferably from 1 to 30 µm. When the film thickness is smaller than the above range, densification tends to become insufficient. In contrast, when the film thickness is larger than the above range, since shrinkage stress during sintering increases, the board thickness of thesubstrate 404 has to be increased and miniaturization of the piezoelectric/electrostrictive actuator 402 becomes difficult. - The material of the
electrode films - The film thickness of the
electrode films electrode films electrode films - It is preferred that the
electrode films electrostrictive film 410. For example, it is preferred to form theelectrode films electrostrictive film 410 and to cover at least 80% of both main surfaces of the piezoelectric/electrostrictive film 410. - Although the
substrate 404 is made of ceramics, there is no limitation on the kind of the material. In view of heat resistance, chemical stability and insulating properties, ceramics containing at least one kind selected from the group consisting of stabilized zirconium oxide, aluminum oxide, magnesium oxide, mullite, aluminum nitride, silicon nitride and glass are preferred. Among these, stabilized zirconium oxide is more preferred in view of the mechanical strength and toughness. The term "stabilized zirconium oxide" as used herein means zirconium oxide in which phase transition of a crystal is suppressed by the addition of a stabilizer and includes, in addition to stabilized zirconium oxide, partially stabilized zirconium oxide. - Examples of stabilized zirconium oxide include zirconium oxide containing 1 to 30 mol% of calcium oxide, magnesium oxide, yttrium oxide, ytterbium oxide or cerium oxide, or an oxide of a rare earth metal as a stabilizer. Among these, zirconium oxide containing yttrium oxide as the stabilizer is preferred in view of particularly high mechanical strength. The content of yttrium oxide is preferably from 1.5 to 6 mol%, and more preferably from 2 to 4 mol%. It is more preferred that zirconium oxide contains, in addition to yttrium oxide, 0.1 to 5 mol% of aluminum oxide. The crystal phase of the stabilized zirconium oxide may be a mixed crystal of a cubic crystal and a monoclinic crystal, a mixed crystal of a tetragonal crystal and a monoclinic crystal, or a mixed crystal of a cubic crystal, a tetragonal crystal and a monoclinic crystal. In view of the mechanical strength, toughness and durability, a main crystal phase is preferably a mixed crystal of a tetragonal crystal and a cubic crystal, or a tetragonal.
- The board thickness of the
substrate 404 is preferably from 1 to 1,000 µm, more preferably from 1.5 to 500 µm, and particularly preferably from 2 to 200 µm. When the board thickness is smaller than the above range, the mechanical strength of the piezoelectric/electrostrictive actuator 402 tends to decrease. In contrast, when the board thickness is larger than the above range, the rigidity of thesubstrate 404 increases and the bending displacement due to the expansion and contraction of the piezoelectric/electrostrictive film 410 upon application of a voltage tends to decrease. - The surface shape (shape of the surface to which the
laminate 406 is fixed) of thesubstrate 404 is not particularly limited, and may be triangle, quadrangle (rectangle or square), oval or circle, and a triangle and a quadrangle may be subjected to chamfering. The surface shape may be a combined shape of these basic shapes. - In the production of the piezoelectric/
electrostrictive actuator 402, first, anelectrode film 408 is formed on asubstrate 404. Theelectrode film 408 can be formed by a method such as ion beam, sputtering, vacuum vapor deposition, PVD (physical vapor deposition), ion plating, CVD (chemical vapor deposition), plating, aerosol deposition, screen printing, spray or dipping. Among these, a sputtering method or a screen printing method is preferred in view of bondability between thesubstrate 404 and the piezoelectric/electrostrictive film 410. Theelectrode film 408 thus formed can be fixed to thesubstrate 404 and the piezoelectric/electrostrictive film 410 by a heat treatment. - Subsequently, on the
electrode film 408, the piezoelectric/electrostrictive film 410 is formed. The piezoelectric/electrostrictive film 410 can be formed by a method such as ion beam, sputtering, vacuum vapor deposition, PVD, ion plating, CVD, plating, sol-gel, aerosol deposition, screen printing, spray or dipping. Among these, a screen printing method is preferred since the planar shape and the film thickness have high accuracy and a piezoelectric/electrostrictive film can be continuously formed. - Subsequently, on the piezoelectric/
electrostrictive film 410, anelectrode film 412 is formed. Theelectrode film 412 can be formed in the same procedure as in theelectrode film 408. - Thereafter, the
substrate 404 on which thelaminate 406 is formed is integrally fired. This firing enables the progress of sintering of the piezoelectric/electrostrictive film 410 and a heat treatment of theelectrode films - It is preferred that the heat treatment of the
electrode films electrode films electrostrictive film 410 is performed prior to the heat treatment of theelectrode film 412, theelectrode film 412 is subjected to a heat treatment at a temperature lower than the firing temperature of the piezoelectric/electrostrictive film 410. - The third embodiment relates to a structure of a piezoelectric/
electrostrictive actuator 502 which can be employed in place of the structure of the piezoelectric/electrostrictive actuator 402 of the second embodiment. -
FIG. 4 is a schematic view of the piezoelectric/electrostrictive actuator 502 of the third embodiment.FIG. 4 is a sectional view of a multi-layered piezoelectric/electrostrictive actuator 502. - As shown in
FIG. 4 , the piezoelectric/electrostrictive actuator 502 has a structure in which anelectrode film 514, a piezoelectric/electrostrictive film 516, anelectrode film 518, a piezoelectric/electrostrictive film 520 and anelectrode film 522 are laminated in this order on a top surface of asubstrate 504. Theelectrode films electrostrictive film 516 face each other across the piezoelectric/electrostrictive film 516, while theelectrode films electrostrictive film 520 face each other across the piezoelectric/electrostrictive film 520. A laminate 506 in which theelectrode film 514, the piezoelectric/electrostrictive film 516, theelectrode film 518, the piezoelectric/electrostrictive film 520 and theelectrode film 522 are laminated is fixed to thesubstrate 504. AlthoughFIG. 4 shows the case where the piezoelectric/electrostrictive film is constituted of two layers, the piezoelectric/electrostrictive film may be constituted of three or more layers. - In the
substrate 504 of the multi-layered piezoelectric/electrostrictive actuator 502, the board thickness of acenter portion 524 to be bonded with the laminate 506 is smaller than that of aperipheral portion 526 so as to increase the bending displacement while maintaining the mechanical strength of thesubstrate 504. In the single-layered piezoelectric/electrostrictive actuator 402, thesubstrate 504 may be used in place of thesubstrate 404. - The multi-layered piezoelectric/
electrostrictive actuator 502 is produced in the same procedure as in the single-layered piezoelectric/electrostrictive actuator 402, except that the numbers of piezoelectric/electrostrictive films and the electrode films to be formed increase. - The fourth embodiment relates to a structure of a piezoelectric/
electrostrictive actuator 602 which can be employed in place of the structure of the piezoelectric/electrostrictive actuator 402 of the second embodiment. -
FIG. 5 is a schematic view of the piezoelectric/electrostrictive actuator 602 of the fourth embodiment.FIG. 5 is a sectional view of the multi-layered piezoelectric/electrostrictive actuator 602. - As shown in
FIG. 5 , the piezoelectric/electrostrictive actuator 602 includes asubstrate 604 in which thesubstrate 504 shown inFIG. 4 as a unit structure is repeated, and laminates 606 fixed on the unit structures. The laminate 606 is the same as the laminate 506 in the third embodiment. - The piezoelectric/
electrostrictive actuator 602 is also produced in the same procedure as in the piezoelectric/electrostrictive actuator 402, except that the numbers of piezoelectric/electrostrictive films and the electrode films to be formed increase and the number of laminates increases. - The fifth embodiment relates to a piezoelectric/
electrostrictive actuator 702 using the piezoelectric/electrostrictive ceramic sintered body according to the first embodiment. -
FIG. 6 to FIG. 8 are schematic views of the piezoelectric/electrostrictive actuator 702.FIG. 6 is a perspective view of the piezoelectric/electrostrictive actuator 702,FIG. 7 is a longitudinal sectional view of the piezoelectric/electrostrictive actuator 702, andFIG. 8 is a transverse sectional view of the piezoelectric/electrostrictive actuator 702. - As shown in
FIG. 6 to FIG. 8 , the piezoelectric/electrostrictive actuator 702 has a structure in which a piezoelectric/electrostrictive film 728 and aninternal electrode film 730 are alternately laminated in the direction of an axis A, andexternal electrode films end surfaces electrostrictive film 728 and theinternal electrode film 730 are laminated. As shown in an exploded perspective view ofFIG. 9 showing a state where a portion of the piezoelectric/electrostrictive actuator 702 is decomposed in the direction of the axis A, theinternal electrode film 730 includes a firstinternal electrode film 732 which reaches theend surface 740 but does not reach theend surface 742, and a secondinternal electrode film 734 which reaches theend surface 742 but does not reach theend surface 740. The firstinternal electrode film 732 and the secondinternal electrode film 734 are alternately provided. The firstinternal electrode film 732 is contacted with theexternal electrode film 736 on theend surface 740, and is electrically connected with theexternal electrode film 736. The secondinternal electrode film 734 is contacted with theexternal electrode film 738 at theend surface 742, and is electrically connected with theexternal electrode film 738. Therefore, when theexternal electrode film 736 is connected with a plus side of a driving signal source and theexternal electrode film 738 is connected with a minus side of the driving signal source, a driving signal is applied to the firstinternal electrode film 732 and the secondinternal electrode film 734 which face with each other across the piezoelectric/electrostrictive film 728, and an electric field is applied in the thickness direction of the piezoelectric/electrostrictive film 728. As a result, the piezoelectric/electrostrictive film 728 expands and contacts in the thickness direction, and theentire laminate 706 is deformed into the shape indicated by the broken line inFIG. 6 . - Unlike the piezoelectric/
electrostrictive actuators electrostrictive actuator 702 does not include a substrate to be fixed with thelaminate 706. Since the piezoelectric/electrostrictive actuator 702 is alternately provided with the firstinternal electrode film 732 and the secondinternal electrode film 734, each having a different pattern, the actuator is also referred to as an "offset type piezoelectric/electrostrictive actuator." - The piezoelectric/
electrostrictive film 728 is constituted using the piezoelectric/electrostrictive ceramic sintered body according to the first embodiment. The film thickness of the piezoelectric/electrostrictive film 728 is preferably from 5 to 500 µm. When the film thickness of the piezoelectric/electrostrictive film 728 is smaller than the above range, it becomes difficult to produce the green sheet described later. In contrast, when the film thickness is larger than the above range, it becomes difficult to apply a sufficient electric field to the piezoelectric/electrostrictive film 728. - The material of the
internal electrode film 730 and theexternal electrode films internal electrode film 730 is preferably platinum or an alloy containing platinum as a main component in view of high heat resistance during firing and easy co-sintering with the piezoelectric/electrostrictive film 728. Depending on the firing temperature, an alloy such as silver-palladium can also be suitably used. - The film thickness of the
internal electrode film 730 is preferably at most 10 µm. When the film thickness is larger than the above range, theinternal electrode film 730 serves as a relaxing layer and the displacement tends to decrease. In order to make theinternal electrode film 730 properly fulfill the role, the film thickness is preferably at least 0.1 µm. - Although
FIG. 6 to FIG. 8 show a case where the piezoelectric/electrostrictive film 728 is constituted of ten layers, the piezoelectric/electrostrictive film 728 may be constituted of nine or less layers or eleven or more layers. - In the production of a piezoelectric/
electrostrictive actuator 702, first, a binder, a plasticizer, a dispersant and a dispersion medium are added to a piezoelectric/electrostrictive ceramic powder, followed by mixing using a ball mill and so on. The resulting slurry is formed into a sheet by a doctor blade method to obtain a green sheet. - Subsequently, the green sheet is punched using a punch or a die, and the green sheet is provided with a positioning hole and so on.
- Furthermore, an electrode paste is applied to a surface of the green sheet by screen printing and so on to obtain a green sheet on which a pattern of the electrode paste is formed. The pattern of the electrode paste includes two kinds of patterns one of which serves as the first
internal electrode film 732 after firing and another of which serves as the secondinternal electrode film 734 after firing. As a matter of course, it is possible to obtain theinternal electrode films - Next, the green sheet on which the pattern of the first electrode paste is formed and the green sheet on which the pattern of the second electrode paste is formed are alternately laid one upon another and a green sheet on which the electrode paste is not applied is further laid thereon, and then the green sheets are pressure-welded by pressing in the thickness direction. At this time, the position of the positioning hole formed on the green sheet is adjusted. In the case of pressure welding of the green sheets, the green sheets are preferably pressure-welded while being heated by heating a die to be used for pressure welding.
- A laminate 706 can be obtained by firing the thus obtained pressure-welded material of the green sheets and processing the resulting sintered body using a dicing saw and so on. Then, the
external electrode films - Samples X1 to X16, A1 to A9, B1 to B9, C1 to C9, D1 to D9, E1 to E6, F1 to F6, G1 to G6, H1 to H6, X91 to X93 and G91 to G93 were produced and evaluated. The results will be explained below. Samples X1 to X16, A1 to A9, B1 to B9, C1 to C9, D1 to D9, E1 to E6, F1 to F6, G1 to G6 and H1 to H6 are made of ceramics, while samples X91 to X93 and G91 to G93 are made of a single crystal.
- In the production of samples X1 to X16, A1 to A9, B1 to B9, C1 to C9, D1 to D9, E1 to E6, F1 to F6, G1 to G6 and H1 to H6 made of ceramics, first, Bi2O3 (bismuth oxide), TiO2 (titanium oxide), Na2CO3 (sodium carbonate), K2CO3 (potassium carbonate) and BaCO3 (barium carbonate) as starting materials were weighed so as to obtain the compositions shown in Table 1 to Table 9. The compositions of samples X1 to X16, A1 to A9, B1 to B9, C1 to C9, D1 to D9, E1 to E6, F1 to F6, G1 to G6 and H1 to H6 are compositions represented by the general formula: xBNT-yBKT-zBT (x + y + z = 1) wherein Bi, Na and K are allowed to become deficient from stoichiometry in which content ratios x, y and z of BNT, BKT and BT are shown in columns "x", "y" and "z" in Table 1 to Table 9. Stoichiometrically deficient amounts of Bi, Na and K are respectively described in the columns "Bi deficient amount (mol%)", "Na deficient amount (mol%)" and "K deficient amount (mol%)" in Table 1 to Table 9. In the column "amount of vacancies (mol%)" of Table 1 to Table 9, the total of stoichiometrically deficient amounts p, q and r of Bi, Na and K, p + q + r, is described. In a ternary phase diagram of
FIG. 1 , the point X is a point representing content ratios x, y and z of BNT, BKT and BT of samples X1 to X16 (Table 1), the point A is a point representing content ratios x, y and z of BNT, BKT and BT of samples A1 to A9 (Table 2), the point B is a point representing content ratios x, y and z of BNT, BKT and BT of samples B1 to B9 (Table 3), the point C is a point representing content ratios x, y and z of BNT, BKT and BT of samples C1 to C9 (Table 4), the point D is a point representing content ratios x, y and z of BNT, BKT and BT of samples D1 to D9 (Table 5), the point E is a point representing content ratios x, y and z of BNT, BKT and BT of samples E1 to E6 (Table 6), the point F is a point representing content ratios x, y and z of BNT, BKT and BT of samples F1 to F6 (Table 7), the point G is a point representing content ratios x, y and z of BNT, BKT and BT of samples G1 to G6 (Table 8), and the point H is a point representing content ratios x, y and z of BNT, BKT and BT of samples H1 to H6 (Table 9) -
[Table 1] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)X1 0.81 0.14 0.05 0.0 0.0 0.0 0.0 0.10 10-8 - 10-7 X2 0.81 0.14 0.05 1.0 0.0 0.0 1.0 0.12 10-8 - 10-7 X3 0.81 0.14 0.05 2.0 0.0 0.0 2.0 0.23 10-8 - 10-7 X4 0.81 0.14 0.05 4.0 0.0 0.0 4.0 0.21 10-8 - 10-7 X5 0.81 0.14 0.05 6.0 0.0 0.0 6.0 0.22 10-8 - 10-7 X6 0.81 0.14 0.05 8.0 0.0 0.0 8.0 0.18 10-8 - 10-7 X7 0.81 0.14 0.05 10.0 0.0 0.0 10.0 0.09 10-7 - 10-6 X8 0.81 0.14 0.05 0.0 2.0 0.0 2.0 0.27 10-8 - 10-7 X9 0.81 0.14 0.05 0.0 6.0 0.0 6.0 0.22 10-8 - 10-7 X10 0.81 0.14 0.05 0.0 8.0 0.0 8.0 0.15 10-7 - 10-6 X11 0.81 0.14 0.05 0.0 0.0 2.0 2.0 0.25 10-8 - 10-7 X12 0.81 0.14 0.05 0.0 0.0 6.0 6.0 0.24 10-8 - 10-7 X13 0.81 0.14 0.05 0.0 0.0 8.0 8.0 0.12 10-7 - 10-6 X14 0.81 0.14 0.05 0.0 1.0 1.0 2.0 0.23 10-8 - 10-7 X15 0.81 0.14 0.05 0.0 3.0 3.0 6.0 0.24 10-8 - 10-7 X16 0.81 0.14 0.05 0.0 4.0 4.0 8.0 0.11 10-7 - 10-6 -
[Table 2] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)A1 0.93 0.00 0.07 2.0 0.0 0.0 2.0 0.23 10-8 - 10-7 A2 0.93 0.00 0.07 6.0 0.0 0.0 6.0 0.21 10-8 - 10-7 A3 0.93 0.00 0.07 8.0 0.0 0.0 8.0 0.10 10-8 - 10-7 A4 0.93 0.00 0.07 0.0 2.0 0.0 2.0 0.24 10-8 - 10-7 A5 0.93 0.00 0.07 0.0 6.0 0.0 6.0 0.22 10-8 - 10-7 A6 0.93 0.00 0.07 0.0 0.0 2.0 2.0 0.25 10-8 - 10-7 A7 0.93 0.00 0.07 0.0 0.0 6.0 6.0 0.21 10-8 - 10-7 A8 0.93 0.00 0.07 0.0 1.0 1.0 2.0 0.22 10-8 - 10-7 A9 0.93 0.00 0.07 0.0 3.0 3.0 6.0 0.20 10-8 - 10-7 -
[Table 3] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)B1 0.86 0.00 0.14 2.0 0.0 0.0 2.0 0.20 10-8 - 10-7 B2 0.86 0.00 0.14 6.0 0.0 0.0 6.0 0.20 10-8 - 10-7 B3 0.86 0.00 0.14 8.0 0.0 0.0 8.0 0.11 10-8 - 10-7 B4 0.86 0.00 0.14 0.0 2.0 0.0 2.0 0.23 10-8 - 10-7 B5 0.86 0.00 0.14 0.0 6.0 0.0 6.0 0.21 10-8 - 10-7 B6 0.86 0.00 0.14 0.0 0.0 2.0 2.0 0.23 10-8 - 10-7 B7 0.86 0.00 0.14 0.0 0.0 6.0 6.0 0.20 10-8 - 10-7 B8 0.86 0.00 0.14 0.0 1.0 1.0 2.0 0.24 10-8 - 10-7 B9 0.86 0.00 0.14 0.0 3.0 3.0 6.0 0.21 10-8 - 10-7 -
[Table 4] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)C1 0.74 0.20 0.06 2.0 0.0 0.0 2.0 0.20 10-8 - 10-7 C2 0.74 0.20 0.06 6.0 0.0 0.0 6.0 0.21 10-8 - 10-7 C3 0.74 0.20 0.06 8.0 0.0 0.0 8.0 0.09 10-8 - 10-7 C4 0.74 0.20 0.06 0.0 2.0 0.0 2.0 0.22 10-8 - 10-7 C5 0.74 0.20 0.06 0.0 6.0 0.0 6.0 0.21 10-8 - 10-7 C6 0.74 0.20 0.06 0.0 0.0 2.0 2.0 0.25 10-8 - 10-7 C7 0.74 0.20 0.06 0.0 0.0 6.0 6.0 0.20 10-8 - 10-7 C8 0.74 0.20 0.06 0.0 1.0 1.0 2.0 0.24 10-8 - 10-7 C9 0.74 0.20 0.06 0.0 3.0 3.0 6.0 0.20 10-8 - 10-7 -
[Table 5] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)D1 0.80 0.20 0.00 2.0 0.0 0.0 2.0 0.22 10-8 - 10-7 D2 0.80 0.20 0.00 6.0 0.0 0.0 6.0 0.21 10-8 - 10-7 D3 0.80 0.20 0.00 8.0 0.0 0.0 8.0 0.12 10-8 - 10-7 D4 0.80 0.20 0.00 0.0 2.0 0.0 2.0 0.26 10-8 - 10-7 D5 0.80 0.20 0.00 0.0 6.0 0.0 6.0 0.23 10-8 - 10-7 D6 0.80 0.20 0.00 0.0 0.0 2.0 2.0 0.27 10-8 - 10-7 D7 0.80 0.20 0.00 0.0 0.0 6.0 6.0 0.22 10-8 - 10-7 D8 0.80 0.20 0.00 0.0 1.0 1.0 2.0 0.25 10-8 - 10-7 D9 0.80 0.20 0.00 0.0 3.0 3.0 6.0 0.20 10-8 - 10-7 -
[Table 6] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)E1 0.98 0.00 0.02 2.0 0.0 0.0 2.0 0.05 10-8 - 10-7 E2 0.98 0.00 0.02 6.0 0.0 0.0 6.0 0.07 10-7 - 10-6 E3 0.98 0.00 0.02 0.0 2.0 0.0 2.0 0.10 10-8 - 10-7 E4 0.98 0.00 0.02 0.0 6.0 0.0 6.0 0.05 10-8 - 10-7 E5 0.98 0.00 0.02 0.0 0.0 2.0 2.0 0.12 10-8 - 10-7 E6 0.98 0.00 0.02 0.0 0.0 6.0 6.0 0.06 10-8 - 10-7 -
[Table 7] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)F1 0.08 0.00 0.20 2.0 0.0 0.0 2.0 0.08 10-8 - 10-7 F2 0.08 0.00 0.20 6.0 0.0 0.0 6.0 0.10 10-7 - 10-6 F3 0.08 0.00 0.20 0.0 2.0 0.0 2.0 0.14 10-8 - 10-7 F4 0.08 0.00 0.20 0.0 6.0 0.0 6.0 0.11 10-8 - 10-7 F5 0.08 0.00 0.20 0.0 0.0 2.0 2.0 0.13 10-8 - 10-7 F6 0.08 0.00 0.20 0.0 0.0 6.0 6.0 0.09 10-8 - 10-7 -
[Table 8] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)G1 0.68 0.24 0.08 2.0 0.0 0.0 2.0 0.13 10-7 - 10-6 G2 0.68 0.24 0.08 6.0 0.0 0.0 6.0 0.02 10-5 - 10-4 G3 0.68 0.24 0.08 0.0 2.0 0.0 2.0 0.09 10-6 - 10-5 G4 0.68 0.24 0.08 0.0 6.0 0.0 6.0 0.04 10-6 - 10-5 G5 0.68 0.24 0.08 0.0 0.0 2.0 2.0 0.02 10-7 - 10-6 G6 0.68 0.24 0.08 0.0 0.0 6.0 6.0 0.10 10-5 - 10-4 -
[Table 9] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)H1 0.76 0.24 0.00 2.0 0.0 0.0 2.0 0.10 10-7 - 10-6 H2 0.76 0.24 0.00 6.0 0.0 0.0 6.0 0.08 10-6 - 10-5 H3 0.76 0.24 0.00 0.0 2.0 0.0 2.0 0.16 10-6 - 10-5 H4 0.76 0.24 0.00 0.0 6.0 0.0 6.0 0.06 10-5 - 10-4 H5 0.76 0.24 0.00 0.0 0.0 2.0 2.0 0.11 10-6 - 10-5 H6 0.76 0.24 0.00 0.0 0.0 6.0 6.0 0.03 10-6 - 10-5 - After weighing starting materials, the weighed starting materials, ethanol as a dispersion medium and silicon nitride balls as a milling medium were enclosed in a wide-mouth bottle, and then the starting materials were mixed and pulverized over 1 hour using a planetary ball mill. After completion of mixing and milling, ethanol was removed from the slurry by evaporation and drying.
- Subsequently, the mixed materials were calcined at 1000°C. The time of maintaining a maximum temperature was 4 hours.
- Subsequently, the calcined materials, ethanol as a dispersion medium and silicon nitride balls as a milling medium were enclosed in a wide-mouth bottle, and then the calcined materials were milled over 1 hour using a planetary ball mill.
- Subsequently, a powder was charged in a cylindrical hole having a diameter of 10 mm formed in a mold of a forming machine and then the powder was subjected to a monoaxial pressure forming under a pressure of 15 MPa. Furthermore, the resultant formed body was subjected to CIP forming under a pressure of 100 MPa.
- Subsequently, the formed body was fired at 1170°C. The time of maintaining a maximum temperature was 4 hours. The sintered body thus obtained was sliced by a step cutter and then processed into a disk having a thickness of 200 µm.
- Finally, a gold electrode film having a thickness of 100 nm was formed on both surfaces of a disk-shaped sintered body by sputtering. The gold electrode film has a circular planar shape and has a diameter of 1 mm.
- The electric field-induced strain and the leak current of samples X1 to X16, A1 to A9, B1 to B9, C1 to C9, D1 to D9, E1 to E6, F1 to F6, G1 to G6 and H1 to H6, which are made of ceramics, were measured. The results are shown in Table 1 to Table 9. The electric field-induced strain was measured by using a ferroelectric substance evaluation system 6252 Rev. B manufactured by TOYO Corporation. The electric field-induced strain is an elongation percentage in the thickness direction when an AC electric field is applied to a disk-shaped sintered body in the thickness direction. The amplitude of the applied AC electric field is 100 kV/cm, and the frequency is 0.5 Hz. The leak current is the value when the relaxing time is 30 seconds.
- As shown in Table 1 to Table 5, in samples X3 to X5, X8, X9, X11, X12, X14, X15, A1, A2, A4 to A9, B1, B2, B4 to B9, C1, C2, C4 to C9, D1, D2, and D4 to D9 in which the content ratios x, y and z of BNT, BKT and BT are within the above range and the amount of vacancies was adjusted to 2.0 to 6.0 mol%, regardless of A-site elements to be allowed to become deficient from stoichiometry, the samples showed an electric field-induced strain of 0.2% or more.
- As shown in Table 6 to Table 9, in samples E1 to E6, F1 to F6, G1 to G6, and H1 to H6 in which content ratios x, y and z of BNT, BKT and BT are not within the above range, regardless of the amount of vacancies within a range from 2.0 to 6.0 mol%, the electric field-induced strain became less than 0.2%. In some of samples G1 to G6 and H1 to H6, the leak current increased.
- As shown in Table 1, in samples X1 and X2 in which the amount of vacancies was decreased to less than 2.0 mol%, regardless of content ratios x, y and z of BNT, BKT and BT within the above range, the electric field-induced strain was less than 0.2%.
- As shown in Table 1 to Table 5, in samples X6, X7, X10, X13, X16, A3, B3, C3 and D3 in which the amount of vacancies is more than 6 mol%, regardless of content ratios x, y and z of BNT, BKT and BT within the above range, the electric field-induced strain was less than 0.2% and the leak current increased in some cases. X-ray diffraction analysis of the sintered body of sample X7 revealed the existence of a hetero-phase to be identified as Bi4Ti3O12.
-
FIG. 10 and FIG. 11 are graphs showing a polarization change to the electric field when an AC electric field is applied to samples X1 and X3, respectively. As is apparent from a comparison betweenFIG. 10 and FIG. 11 , in sample X3 including A-site vacancies, the polarization quickly changed at around the portion indicated by the arrow and a hysteresis loop close to that of an antiferroelectric substance was observed. -
FIG. 12 and FIG. 13 are graphs showing a strain change to the electric field when an AC electric field is applied to samples X1 and X3, respectively. As is apparent from a comparison betweenFIG. 12 and FIG. 13 , in sample X3 including A-site vacancies, the strain quickly changed at around the portion indicated by the arrow. - The grain size of the sintered body of samples X1 to X16, A1 to A9, B1 to B9, C1 to C9, D1 to D9, E1 to E6, F1 to F6, G1 to G6 and H1 to H6, which are made of ceramics, was calculated from an electron micrograph of the polished surface by a line intercept method. As a result, the grain size was from 0.5 to 5 µm.
- In the production of samples X91 to X93 and G91 to G93 which are made of a single crystal, the single crystal was grown by a self-flux method.
- In the production of samples X91 to X93 and G91 to G93 which are made of a single crystal, first, powders of a polycrystal with the compositions shown in Table 10 and Table 11 were produced in the same procedure as in samples made of ceramics. The compositions of samples X91 to X93 and G91 to G93 are represented by the general formula: xBNT-yBKT-zBT (x + y + z = 1) wherein Bi, Na and K are allowed to become deficient from stoichiometry in which content ratios x, y and z of BNT, BKT and BT are shown in columns "X", "y" and "z" in Table 10 and Table 11. Stoichiometrically deficient amounts of Bi, Na and K are respectively described in the columns "Bi deficient amount (mol%)", "Na deficient amount (mol%)" and "K deficient amount (mol%)" in Table 10 and Table 11. In the column "amount of vacancies (mol%)" of Table 10 and Table 11, the total of stoichiometrically deficient amounts of Bi, Na and K is described. In the ternary phase diagram of
FIG. 1 , the point X is a point representing content ratios x, y and z of BNT, BKT and BT of samples X91 to X93 (Table 10) and the point G is a point representing content ratios x, y and z of BNT, BKT and BT of samples G91 to G93 (Table 11). - After producing powders of a polycrystal, a mixture of a flux and each powder of a polycrystal thus obtained was charged in a platinum crucible and, after closing the crucible with a platinum lid, the mixture was heated to 1300°C and then melted by maintaining the state of 1300°C for 5 hours. The melt was slowly cooled to obtain a single crystal. As the flux, Bi2O3 with a purity of 99.9999% was used.
- Subsequently, the resulting single crystal was treated with 10% by weight of nitric acid, thereby dissolving the adhered flux. Then, the single crystal was washed with pure water.
- The single crystal was washed with pure water and was annealed under an air atmosphere at 950°C over 10 hours to obtain samples X91 to X93 and G91 to G93.
- Subsequently, the charge-induced strain and the leak current of samples X91 to X93 and G91 to G93 were measured in the same procedure as in samples X1 to X16, A1 to A9, B1 to B9, C1 to C9, D1 to D9, E1 to E6, F1 to F6, G1 to G6 and H1 to H6. The results are shown in Table 10 and Table 11.
-
[Table 10] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)X91 0.81 0.14 0.05 2.0 0.0 0.0 2.0 0.43 10-8 - 10-7 X92 0.81 0.14 0.05 0.0 2.0 0.0 2.0 0.25 10-8 - 10-7 X93 0.81 0.14 0.05 0.0 0.0 2.0 2.0 0.18 10-8 - 10-7 -
[Table 11] Samples x y z Bi deficient amount
(mol%)Na deficient amount
(mol%)K deficient amount
(mol%)Amount of vacancies
(mol%)Electric field-induced strain
(%)Leak current
(A/cm2)G91 0.68 0.24 0.08 2.0 0.0 0.0 2.0 0.82 10-8 - 10-7 G92 0.68 0.24 0.08 0.0 2.0 0.0 2.0 0.67 10-8 - 10-7 G93 0.68 0.24 0.08 0.0 0.0 2.0 2.0 0.55 10-8 - 10-7 - In the case of ceramics, the electric field-induced strain tends to increase toward the point X from the point G in the ternary phase diagram of
FIG. 1 . In contrast, in the case of the single crystal, the electric field-induced strain tends to increase toward the point X from the point G in the ternary phase diagram ofFIG. 1 - The composition is quantitatively determined by ICP (inductively coupled plasma) atomic emission spectrometry. The contents of Bi and Ti are more accurately determined by a wet chemical analysis method such as a weight method or a titration method.
- While the present invention has been described in detail, the description is intended to be illustrative in all aspects and should not be taken to be limiting. Non-exemplified numerous variations can be made without department from the scope of the invention.
-
- 402, 502, 602, 702: Piezoelectric/electrostrictive actuator
- 410, 516, 520: Piezoelectric/electrostrictive film
- 728: Piezoelectric/electrostrictive film
- 408, 412, 514, 518, 522, 730: Electrode film
Claims (5)
- A piezoelectric/electrostrictive ceramic composition with the composition represented by the general formula: x(Bi1/2Na1/2)TiO3-y(Bi1/2K1/2)TiO3-zBaTiO3 (x + y + z = 1) wherein at least one kind among Bi, Na and K as A-site elements is allowed to become deficient from stoichiometry in which a point (x, y, z) representing content ratios x, y and z of (Bi1/2Na1/2)TiO3, (Bi1/2K1/2)TiO3 and BaTiO3 is within a range (also including a border line) of a quadrangle ABCD with a point A (x = 0.93, y = 0, z = 0.07), a point B (x = 0.86, y = 0, z = 0.14), a point C (x = 0.74, y = 0.20, z = 0.06) and a point D (x = 0.80, y = 0.20, z = 0.00) as vertices in a ternary phase diagram, and thus a stoichiometrically deficient amount of the A-site elements is adjusted to at least 2 mol% to at most 6 mol%.
- A sintered body of piezoelectric/electrostrictive ceramics with the composition represented by the general formula:
x(Bi1/2Na1/2)TiO3-y(Bi1/2K1/2)TiO3-zBaTiO3 (x + y + z = 1)
wherein vacancies are formed in an A-site of a solid solution having a perovskite structure in which a point (x, y, z) representing content ratios x, y and z of (Bi1/2Na1/0TiO3, (Bi1/2K1/2)TiO3 and BaTiO3 is within a range (also including a border line) of a quadrangle ABCD with a point A (x = 0.93, y = 0, z = 0.07), a point B (x = 0.86, y = 0, z = 0.14), a point C (x = 0.74, y = 0.20, z = 0.06) and a point D (x = 0.80, y = 0.20, z = 0.00) as vertices in a ternary phase diagram, and thus an amount of the A-site vacancies is adjusted to at least 2 mol% to at most 6 mol%. - A piezoelectric/electrostrictive element comprising:a sintered body of piezoelectric/electrostrictive ceramics, andelectrodes facing each other across said sintered body, whereinsaid sintered body has the composition represented by the general formula: x(Bi1/2Na1/2)TiO3-y(Bi1/2K1/2)TiO3-zBaTiO3 (x + y + z = 1) and vacancies are formed in an A-site of a solid solution having a perovskite structure in which a point (x, y, z) representing content ratios x, y and z of (Bi1/2Na1/2)TiO3, (Bi1/2K1/2)TiO3 and BaTiO3 is within a range (also including a border line) of a quadrangle ABCD with a point A (x = 0.93, y = 0, z = 0.07), a point B (x = 0.86, y = 0, z = 0.14), a point C (x = 0.74, y = 0.20, z = 0.06) and a point D (x = 0.80, y = 0.20, z = 0.00) as vertices in a ternary phase diagram, and thus an amount of the A-site vacancies is adjusted to at least 2 mol% to at most 6 mol%.
- A method for producing a piezoelectric/electrostrictive ceramic composition, which comprises:a) a step of mixing starting materials with the composition represented by the general formula x(Bi1/2Na1/2)TiO3-y(Bi1/2K1/2)TiO3-zBaTiO3 (x + y + z = 1) so that at least one kind among Bi, Na and K as A-site elements is allowed to become deficient from stoichiometry in which a point (x, y, z) representing content ratios x, y and z of (Bi1/2Na1/2)TiO3, (Bi1/2K1/2)TiO3 and BaTiO3 is within a range (also including a border line) of a quadrangle ABCD with a point A (x = 0.93, y = 0, z = 0.07), a point B (x = 0.86, y = 0, z = 0.14), a point C (x = 0.74, y = 0.20, z = 0.06) and a point D (x = 0.80, y = 0.20, z = 0.00) as vertices in a ternary phase diagram, and thus a stoichiometrically deficient amount of the A-site elements is adjusted to at least 2 mol% to at most 6 mol%, andb) a step of reacting the starting materials mixed in said step a).
- A method for producing a piezoelectric/electrostrictive element, which comprises:a) a step of producing a sintered body of piezoelectric/electrostrictive ceramics with the composition represented by the general formula
x(Bi1/2Na1/2)TiO3-y(Bi1/2K1/2)TiO3-zBaTiO3 (x + y + z = 1)
wherein vacancies are formed in an A-site of a solid solution having a perovskite structure in which a point (x, y, z) representing content ratios x, y and z of (Bi1/2Na1/2)TiO3, (Bi1/2K1/2)TiO3 and BaTiO3 is within a range (also including a border line) of a quadrangle ABCD with a point A (x = 0.93, y = 0, z = 0.07), a point B (x = 0.86, y = 0, z = 0.14), a point C (x = 0.74, y = 0.20, z = 0.06) and a point D (x = 0.80, y = 0.20, z = 0.00) as vertices in a ternary phase diagram, and thus an amount of the A-site vacancies is adjusted to at least 2 mol% to at most 6 mol%, andb) a step of producing electrodes facing each other across said sintered body.
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US8269402B2 (en) | 2012-09-18 |
EP2187462B1 (en) | 2015-07-22 |
EP2187462A3 (en) | 2012-10-31 |
US20100123370A1 (en) | 2010-05-20 |
JP2010150126A (en) | 2010-07-08 |
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