EP2175048A1 - Metal plating composition for deposition of tin-zinc alloys onto a substrate - Google Patents
Metal plating composition for deposition of tin-zinc alloys onto a substrate Download PDFInfo
- Publication number
- EP2175048A1 EP2175048A1 EP08166465A EP08166465A EP2175048A1 EP 2175048 A1 EP2175048 A1 EP 2175048A1 EP 08166465 A EP08166465 A EP 08166465A EP 08166465 A EP08166465 A EP 08166465A EP 2175048 A1 EP2175048 A1 EP 2175048A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- tin
- plating bath
- zinc alloy
- formula
- alloy plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 69
- 238000007747 plating Methods 0.000 title claims abstract description 65
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical group [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 title claims abstract description 63
- 229910001297 Zn alloy Inorganic materials 0.000 title claims abstract description 60
- 239000000758 substrate Substances 0.000 title abstract description 19
- 230000008021 deposition Effects 0.000 title abstract description 8
- 229910052751 metal Inorganic materials 0.000 title description 14
- 239000002184 metal Substances 0.000 title description 14
- 239000000654 additive Substances 0.000 claims abstract description 31
- 230000000996 additive effect Effects 0.000 claims abstract description 23
- 150000003839 salts Chemical class 0.000 claims description 13
- 239000002253 acid Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 8
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 claims description 7
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims description 6
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 229910001432 tin ion Inorganic materials 0.000 claims description 3
- 150000001450 anions Chemical class 0.000 claims description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 2
- 239000004202 carbamide Substances 0.000 claims 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims 1
- 150000003672 ureas Chemical class 0.000 claims 1
- 229920000642 polymer Polymers 0.000 abstract description 15
- 125000001453 quaternary ammonium group Chemical group 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 3
- 229910052718 tin Inorganic materials 0.000 description 25
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 18
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 15
- 239000011701 zinc Substances 0.000 description 15
- 235000002639 sodium chloride Nutrition 0.000 description 13
- 229910052725 zinc Inorganic materials 0.000 description 12
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 9
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 6
- -1 amine compounds Chemical class 0.000 description 5
- 235000015165 citric acid Nutrition 0.000 description 5
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 5
- 238000006068 polycondensation reaction Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 150000003934 aromatic aldehydes Chemical class 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 125000001391 thioamide group Chemical group 0.000 description 4
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 235000019270 ammonium chloride Nutrition 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001805 chlorine compounds Chemical group 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 238000002161 passivation Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000001878 scanning electron micrograph Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- FCQPNTOQFPJCMF-UHFFFAOYSA-N 1,3-bis[3-(dimethylamino)propyl]urea Chemical compound CN(C)CCCNC(=O)NCCCN(C)C FCQPNTOQFPJCMF-UHFFFAOYSA-N 0.000 description 2
- DEWLEGDTCGBNGU-UHFFFAOYSA-N 1,3-dichloropropan-2-ol Chemical compound ClCC(O)CCl DEWLEGDTCGBNGU-UHFFFAOYSA-N 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 2
- IAVREABSGIHHMO-UHFFFAOYSA-N 3-hydroxybenzaldehyde Chemical compound OC1=CC=CC(C=O)=C1 IAVREABSGIHHMO-UHFFFAOYSA-N 0.000 description 2
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 239000000176 sodium gluconate Substances 0.000 description 2
- 235000012207 sodium gluconate Nutrition 0.000 description 2
- 229940005574 sodium gluconate Drugs 0.000 description 2
- 238000010561 standard procedure Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical compound [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 2
- WJUFSDZVCOTFON-UHFFFAOYSA-N veratraldehyde Chemical compound COC1=CC=C(C=O)C=C1OC WJUFSDZVCOTFON-UHFFFAOYSA-N 0.000 description 2
- 150000003751 zinc Chemical class 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- BHHYHSUAOQUXJK-UHFFFAOYSA-L zinc fluoride Chemical compound F[Zn]F BHHYHSUAOQUXJK-UHFFFAOYSA-L 0.000 description 2
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- SQAINHDHICKHLX-UHFFFAOYSA-N 1-naphthaldehyde Chemical compound C1=CC=C2C(C=O)=CC=CC2=C1 SQAINHDHICKHLX-UHFFFAOYSA-N 0.000 description 1
- OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 description 1
- YSFBEAASFUWWHU-UHFFFAOYSA-N 2,4-dichlorobenzaldehyde Chemical compound ClC1=CC=C(C=O)C(Cl)=C1 YSFBEAASFUWWHU-UHFFFAOYSA-N 0.000 description 1
- DMIYKWPEFRFTPY-UHFFFAOYSA-N 2,6-dichlorobenzaldehyde Chemical compound ClC1=CC=CC(Cl)=C1C=O DMIYKWPEFRFTPY-UHFFFAOYSA-N 0.000 description 1
- FXWFZIRWWNPPOV-UHFFFAOYSA-N 2-aminobenzaldehyde Chemical compound NC1=CC=CC=C1C=O FXWFZIRWWNPPOV-UHFFFAOYSA-N 0.000 description 1
- FPYUJUBAXZAQNL-UHFFFAOYSA-N 2-chlorobenzaldehyde Chemical compound ClC1=CC=CC=C1C=O FPYUJUBAXZAQNL-UHFFFAOYSA-N 0.000 description 1
- IMNKQTWVJHODOS-UHFFFAOYSA-N 2-ethoxynaphthalene-1-carbaldehyde Chemical compound C1=CC=CC2=C(C=O)C(OCC)=CC=C21 IMNKQTWVJHODOS-UHFFFAOYSA-N 0.000 description 1
- NTCCNERMXRIPTR-UHFFFAOYSA-N 2-hydroxy-1-naphthaldehyde Chemical compound C1=CC=CC2=C(C=O)C(O)=CC=C21 NTCCNERMXRIPTR-UHFFFAOYSA-N 0.000 description 1
- YIQGLTKAOHRZOL-UHFFFAOYSA-N 2-methoxynaphthalene-1-carbaldehyde Chemical compound C1=CC=CC2=C(C=O)C(OC)=CC=C21 YIQGLTKAOHRZOL-UHFFFAOYSA-N 0.000 description 1
- PJKVFARRVXDXAD-UHFFFAOYSA-N 2-naphthaldehyde Chemical compound C1=CC=CC2=CC(C=O)=CC=C21 PJKVFARRVXDXAD-UHFFFAOYSA-N 0.000 description 1
- ZWUSBSHBFFPRNE-UHFFFAOYSA-N 3,4-dichlorobenzaldehyde Chemical compound ClC1=CC=C(C=O)C=C1Cl ZWUSBSHBFFPRNE-UHFFFAOYSA-N 0.000 description 1
- CASRSOJWLARCRX-UHFFFAOYSA-N 3,5-dichlorobenzaldehyde Chemical compound ClC1=CC(Cl)=CC(C=O)=C1 CASRSOJWLARCRX-UHFFFAOYSA-N 0.000 description 1
- SRWILAKSARHZPR-UHFFFAOYSA-N 3-chlorobenzaldehyde Chemical compound ClC1=CC=CC(C=O)=C1 SRWILAKSARHZPR-UHFFFAOYSA-N 0.000 description 1
- JJKVMNNUINFIRK-UHFFFAOYSA-N 4-amino-n-(4-methoxyphenyl)benzamide Chemical compound C1=CC(OC)=CC=C1NC(=O)C1=CC=C(N)C=C1 JJKVMNNUINFIRK-UHFFFAOYSA-N 0.000 description 1
- AVPYQKSLYISFPO-UHFFFAOYSA-N 4-chlorobenzaldehyde Chemical compound ClC1=CC=C(C=O)C=C1 AVPYQKSLYISFPO-UHFFFAOYSA-N 0.000 description 1
- QPUGTXPVMBIBDL-UHFFFAOYSA-N 4-ethoxynaphthalene-1-carbaldehyde Chemical compound C1=CC=C2C(OCC)=CC=C(C=O)C2=C1 QPUGTXPVMBIBDL-UHFFFAOYSA-N 0.000 description 1
- LORPDGZOLAPNHP-UHFFFAOYSA-N 4-hydroxynaphthalene-1-carbaldehyde Chemical compound C1=CC=C2C(O)=CC=C(C=O)C2=C1 LORPDGZOLAPNHP-UHFFFAOYSA-N 0.000 description 1
- MVXMNHYVCLMLDD-UHFFFAOYSA-N 4-methoxynaphthalene-1-carbaldehyde Chemical compound C1=CC=C2C(OC)=CC=C(C=O)C2=C1 MVXMNHYVCLMLDD-UHFFFAOYSA-N 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- DAOANAATJZWTSJ-UHFFFAOYSA-N N-Decanoylmorpholine Chemical compound CCCCCCCCCC(=O)N1CCOCC1 DAOANAATJZWTSJ-UHFFFAOYSA-N 0.000 description 1
- 229910001295 No alloy Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910020994 Sn-Zn Inorganic materials 0.000 description 1
- 229910009069 Sn—Zn Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 229910007610 Zn—Sn Inorganic materials 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- JALQQBGHJJURDQ-UHFFFAOYSA-L bis(methylsulfonyloxy)tin Chemical compound [Sn+2].CS([O-])(=O)=O.CS([O-])(=O)=O JALQQBGHJJURDQ-UHFFFAOYSA-L 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229940117916 cinnamic aldehyde Drugs 0.000 description 1
- KJPRLNWUNMBNBZ-UHFFFAOYSA-N cinnamic aldehyde Natural products O=CC=CC1=CC=CC=C1 KJPRLNWUNMBNBZ-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- PNOXNTGLSKTMQO-UHFFFAOYSA-L diacetyloxytin Chemical compound CC(=O)O[Sn]OC(C)=O PNOXNTGLSKTMQO-UHFFFAOYSA-L 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Substances C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- ZPRVNEJJMJMSCN-UHFFFAOYSA-L tin(2+);disulfamate Chemical compound [Sn+2].NS([O-])(=O)=O.NS([O-])(=O)=O ZPRVNEJJMJMSCN-UHFFFAOYSA-L 0.000 description 1
- OBBXFSIWZVFYJR-UHFFFAOYSA-L tin(2+);sulfate Chemical compound [Sn+2].[O-]S([O-])(=O)=O OBBXFSIWZVFYJR-UHFFFAOYSA-L 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- 229910000375 tin(II) sulfate Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- MKRZFOIRSLOYCE-UHFFFAOYSA-L zinc;methanesulfonate Chemical compound [Zn+2].CS([O-])(=O)=O.CS([O-])(=O)=O MKRZFOIRSLOYCE-UHFFFAOYSA-L 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
Definitions
- the present invention relates to electroplating bath compositions for the deposition of tin-zinc alloys useful for corrosion protection of a metal substrate. Further, the invention relates to a process for the preparation of additives and their use in said metal plating compositions.
- the electrodeposition of tin-zinc alloys is used for, e.g., corrosion protection of metal substrates, especially steel substrates.
- the corrosion protection capability by tin-zinc alloy deposits depends on various parameters such as small grain size of the deposit ( Y.-S. Choi, P. Ganesan, S. P. Kumaraguru, B. N. Popov “Development of Sacrificial Zn-Sn Coatings by a Pulse Electrodeposition Process", Journal of Applied Surface Finishing 2 (1), 29-36 (2007 )).
- the deposits in most cases consist of mixtures of individual tin and zinc grains. Such deposits are referred herein as tin-zinc alloys. Usually, no alloy particles of Sn x Zn y type are formed. Therefore, it is important to generate a deposit with a homogeneous distribution of tin and zinc domains (i.e., grains) within the deposits in order to obtain a good corrosion protection.
- Polyquaternary amine compounds of different types have been suggested to deposit zinc and zinc alloy coatings possessing a good corrosion protection.
- Polycondensation products obtained by reacting of di-tertiary amines with a methylene linker are disclosed in EP 1 114 206 B1 .
- Polycondensation products derived from di-tertiary amines including an amide or thioamide functional group and ether type linkers are disclosed as additives for zinc and zinc-transition metal alloy plating compositions in US 5,405,523 and US 5,435,898 , and for application in tin-zinc alloy plating compositions in EP 1 201 789 B9 .
- WO 02/08497 discloses polycondensation products derived from di-tertiary amines including an amide or thioamide functional group with a linker bearing an unsaturated moiety and optionally a second di-tertiary amine with or without an unsaturated moiety as additives for zinc and zinc alloy plating compositions. Furthermore, WO 02/08497 describes another type of additive derived by polycondensation of a di-tertiary amine including an amide or thioamide functional group, a di-tertiary amine without an amide or thioamide functional group and a linker.
- tin-zinc alloy plating compositions are suitable for tin-rich tin-zinc alloy deposits with a tin content > 50 wt.-% but suffer from higher deviations from the targeted composition for tin-zinc alloys deposits with a tin content of 30 to 50 wt.-%.
- the object of the present invention is to provide a metal plating composition, which can be used to deposit a tin-zinc alloy layer with a composition of 0.1 to 99.9 wt.-% Sn, more preferred 20 to 60 wt.-% Sn and most preferred 30 to 50 wt.-% Sn on a metal substrate.
- the deposited tin-zinc alloy layer preferably shows the following properties:
- the tin-zinc alloy plating composition should allow to reach the above mentioned criteria in a wide range of current densities and lead to deposits of high brightness.
- the present invention relates to an aqueous tin-zinc alloy plating bath composition comprising a novel type of additives for deposition of tin-zinc alloy layers on metal substrates. Furthermore, the inventive plating bath composition allows the deposition of tin-zinc alloys with a tin content of 30 to 50 wt.-% in a wide current density range of 0.01 to 10 A/dm 2 .
- the aqueous tin-zinc plating bath composition comprises stannous ions in form of at least one water soluble stannous salt, at least one water soluble zinc salt, at least one acid and at least one quaternary ammonium polymer additive which is represented by formula I: wherein a, b, c, d, e and f are identical or different and represent an integer ranging from 1 to 5, n is an integer greater than 1, R1, R2, R3 and R4 are identical or different and represent a substituted or unsubstituted C1 to C6 alkyl or a -CH 2 CH 2 (OCH 2 CH 2 ) y -OH residue, wherein y is ranging from 1 to 6, and X- is a suitable anion.
- the substituted or unsubstituted C1 to C6 alkyl residues R1, R2, R3 and R4 are more preferred selected independently from the group consisting of methyl, ethyl, propyl and butyl and their hydroxy derivatives
- Said quaternary ammonium polymers may be prepared by a condensation polymerization of one or more amine monomers of formula III, wherein R1, R2, R3, R4, a and b are defined as in formula I, with one or more hydroxyl functionalized aliphatic dihalogenide compound of formula IV, wherein c, d, e and X are defined as in formula I.
- the molecular weight of the quaternary ammonium polymer according to formula I may range from about 500 to 100,000 Da, preferred from about 5,000 to 30,000 Da.
- the amount of the quaternary ammonium polymer according to formula I included in the tin-zinc alloy plating bath composition is added in an amount sufficient to provide desired improvements in the deposited tin-zinc alloy such as reduced burning of high current density deposits, homogeneous composition of tin and zinc domains in the deposit, fine and uniform grain size and improved corrosion resistance.
- the tin-zinc alloy plating bath composition of the present invention contain from about 0.1 to 10 g/l of the quaternary ammonium polymer according to formula I, more preferred 0.2 to 6 g/l.
- the inventive additive is characterized by formula II. wherein n is greater than 10 and X- is a halogenide or pseudohalogenide ion.
- Pseudohalogenide ions are selected from the group comprising -OCN, -NCO, -CNO, -SCN, -NCS, alkylsulfonates, mesitylate and triflate.
- the tin-zinc alloy plating bath composition of the present invention will contain stannous ions in a concentration of about 1 to 100 g/l, more preferred 5 to 40 g/l.
- the one or more source of stannous tin ions is preferably selected from the group comprising tin(II) sulfate, tin(II) methanesulfonate, tin(II) chloride, tin(II) fluoride, tin(II) sulfamate, tin(II) acetate and tin(II) oxide.
- the tin-zinc alloy plating bath composition contains zinc ions in a concentration of about 1 to 100 g/l, more preferred 5 to 50 g/l.
- the one or more source of zinc ions is preferably selected from the group comprising zinc sulfate, zinc methanesulfonate, zinc sulfamate, zinc chloride, zinc fluoride, zinc acetate and zinc fluoroborate.
- the weight ratio of tin and zinc ions in the plating bath composition is ranging from 1 : 5 to 5 : 1, more preferred 2 : 5 to 5 : 2 and is most preferred 2 : 3. Throughout this written description of the invention, the range and ratio limits may be combined.
- composition of the tin-zinc alloy deposit derived from the metal plating bath contains 0.1 to 99.9 wt.-% of tin, preferred 20 to 60 wt.-% of tin and most preferred 30 to 50 wt.-% of tin.
- the tin-zinc alloy plating bath composition of the invention also may contain one or more conducting salts such as sodium chloride, sodium fluoride, sodium sulfate, potassium chloride, potassium fluoride, potassium sulfate, ammonium chloride, ammonium fluoride and/or ammonium sulfate in an amount of about 50 to 300 g/l or more.
- the conductive salt is a chloride
- the stannous salt is a chloride
- the zinc salt is a chloride, thus forming an "all chloride" plating composition.
- the tin-zinc alloy plating bath composition of the present invention also contains at least one acid.
- Suitable acids are hydroxy polycarboxylic acid and/or hydroxy carboxylic acid with about 3 to 15 carbon atoms per molecule, or a water soluble salt thereof.
- the hydroxy polycarboxylic acids and/or hydroxy carboxylic acid contains 3 to 7 carbon atoms. Mixtures of hydroxy carboxylic acids can be utilized.
- Examples of hydroxy carboxylic acids which can be utilized for the tin-zinc plating bath composition of the present invention include monohydroxy and polyhydroxy carboxylic and polycarboxylic acids such as tartaric acid, malic acid, citric acid, gluconic acid and their respective salts, e.
- Citric acid is a particularly useful hydroxy polycarboxylic acid for the tin-zinc plating bath composition of the present invention. Both stannous and zinc ions form complexes with hydroxy polycarboxylic acids like citric acid. The amount of hydroxy carboxylic acid ranges from about 5 to 200 g/l, more preferred from 10 to 150 g/l.
- aromatic aldehydes known as brightener additives in tin-zinc alloy plating electrolytes are benzaldehyde, o-chlorbenzaldehyde, m-chlorbenzaldehyde, p-chlorbenzaldehyde, o-hydroxybenzaldehyde, m-hydroxybenzaldehyde, p-hydroxybenzaldehyde, o-aminobenzaldehyde, verataldehyde, 2,4-dichlorbenzaldehyde, 3,4-dichlorbenzaldehyde, 3,5-dichlorbenzaldehyde, 2,6-dichlorbenzaldehyde, tolualdehyde, 3,4-dimethoxybenzaldehyde, cin
- the tin-zinc alloy plating bath composition contains at least one brightener selected from aromatic carbonyl-containing compounds.
- the carbonyl compounds are useful for improving the brightness and luster of the deposits produced by the tin-zinc plating compositions of the present invention.
- the aromatic carbonyl-containing compounds act as a brightener imparting optimum leveling action over a wider plating range.
- the aromatic carbonyl-containing compounds may be aromatic aldehydes, ketones, or carboxylic acids or the water soluble salts thereof.
- the amount of aromatic aldehyde or other aromatic carbonyl-containing compounds included in the tin-zinc alloy plating compositions range from about 0.005 to 2 g/l.
- the aldehyde brighteners are added as a bisulfite addition product.
- the tin ion sources in metal plating compositions for deposition of tin-zinc alloys are mainly salts of Sn 2+ ions. Therefore, an antioxidant or a mixture of more than one antioxidant is preferably added to such compositions in order to prevent oxidation of Sn 2+ to Sn 4+ and subsequent precipitation of insoluble SnO 2 .
- An overview of typical compounds used for this purpose is given in the textbook "The Electrodeposition of Tin and its alloys" (M. Jordan, Eugen G. Leuze Publ., 1 st Ed., 1995, p. 80-84) and include hydroquinone and phenol and their respective derivatives.
- Heterocyclic antioxidants, e. g., amino-hydroxy substituted pyridine for tin and tin alloy plating compositions with improved properties are disclosed in the European Patent Application 08075139.9 .
- the bath is operated at temperatures in the range of about 15 to 60 °C, more preferred at 20 to 30 °C.
- An average cathode current density of about 0.01 to 10 A/m 2 , preferred 0.5 to 5 A/dm 2 , most preferred 1.5 to 2 A/m 2 is applied.
- the tin-zinc alloy plating bath composition can be used for barrel and rack plating.
- N,N'-Bis(dimethylaminopropyl)urea 10 g (0.0434 mol) N,N'-Bis(dimethylaminopropyl)urea are dissolved in 23.6 g DI water. 5.71 g (0.0434 mol) of 1,3-Dichlor-propan-2-ol are added to this solution and held at 90 °C for 5 h.
- tin-zinc alloy plating solution a tin-zinc alloy plating solution was prepared, the composition is shown below: Sn 2+ salt 12 g/l Sn Zn 2+ salt 18 g/l Zn Sodium-Gluconate 50 g/l Citric acid 20 g/l Inventive additive according to formula II 3.52 g/l Anisaldehyde (brightener) 120 mg/l Ammonium chloride 80 g/l
- a metal plating solution was prepared, the composition is shown below: Sn 2+ salt 12 g/l Sn Zn 2+ salt 18 g/l Zn Sodium-Gluconate 50 g/l Citric acid 20 g/l Mirapol A-15 ( EP 1 201 789 B1 ; example 1; available from Rhodia) 5.87 g/l Anisaldehyde (brightener) 120 mg/l Ammonium chloride 80 g/l
- the tin-zinc alloy composition distribution on a substrate was evaluated with EDX for a deposit derived from a tin-zinc alloy plating composition containing an additive according to formula II (example 1 of the present invention) and a deposit derived from a tin-zinc alloy plating composition containing a prior art quaternary ammonium polymer additive disclosed in example 1 of the patent EP 1 201 789 B9 (example 2 of the present invention).
- the target tin-zinc alloy composition was in both cases 40 wt.-% tin and 60 wt.-% zinc.
- Table 1 The results of the comparative experiment are summarized in Table 1.
- the plating bath comprising the inventive additive according to formula II leads to a more homogeneous tin-zinc alloy deposit composition compared to the deposit derived from a prior art plating bath over the entire current density range.
- Table 1 deviation from the average alloy deposit composition derived from example 1 and comparative example 2. Absolute value of deviation from target average composition of 40 wt.-% tin and 60 wt.-% zinc (values given in %) current density (A/dm 2 ) example 1 (inventive additive) example 2 (prior art additive) >> 3,5 5.47 8.64 3.5 6.56 10.01 2.6 6.88 10.47 1.9 6.56 9.38 1.4 6.41 9.98 1 4.54 6.80 0.7 0.80 2.26 0.4 14.54 11.94
- a FIB-SEM micrograph ( Figure 1 ) of a tin-zinc alloy deposit obtained according to example 1 shows the reduced grain size of the deposit compared to a deposit derived from a tin-zinc plating composition containing a prior art quaternary ammonium polymer additive ( Figure 2 , example 2). Furthermore, the grain size distribution is narrower for the deposit obtained with an inventive quaternary ammonium polymer according to formula II.
- a substrate coated from a plating bath according to example 1 was subjected to a salt spray test after deposition of a passivation layer. Formation of white rust was observed after 48 h.
- a substrate coated form a plating bath according to experiment 2 was subjected to a salt spray test after deposition of a passivation layer. Formation of white rust was observed after 24 h.
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Abstract
Description
- The present invention relates to electroplating bath compositions for the deposition of tin-zinc alloys useful for corrosion protection of a metal substrate. Further, the invention relates to a process for the preparation of additives and their use in said metal plating compositions.
- The electrodeposition of tin-zinc alloys is used for, e.g., corrosion protection of metal substrates, especially steel substrates.
- The corrosion protection capability by tin-zinc alloy deposits depends on various parameters such as small grain size of the deposit (Y.-S. Choi, P. Ganesan, S. P. Kumaraguru, B. N. Popov "Development of Sacrificial Zn-Sn Coatings by a Pulse Electrodeposition Process", Journal of Applied Surface Finishing 2 (1), 29-36 (2007)).
- The deposits in most cases consist of mixtures of individual tin and zinc grains. Such deposits are referred herein as tin-zinc alloys. Mostly, no alloy particles of SnxZny type are formed. Therefore, it is important to generate a deposit with a homogeneous distribution of tin and zinc domains (i.e., grains) within the deposits in order to obtain a good corrosion protection.
- Another important factor influencing the capability of corrosion protection of tin-zinc alloy deposits is a homogeneous composition distribution of said deposits. Many efforts were taken to improve the compositional homogeneity.
- The above mentioned criteria, i.e., a narrow compositional homogeneity range for a tin-zinc alloy deposit to enable good corrosion protection to a metal substrate can be fulfilled by selecting appropriate additives to be added to the metal plating composition.
- Polyquaternary amine compounds of different types have been suggested to deposit zinc and zinc alloy coatings possessing a good corrosion protection.
- Polycondensation products obtained by reacting of di-tertiary amines with a methylene linker are disclosed in
EP 1 114 206 B1 . Polycondensation products derived from di-tertiary amines including an amide or thioamide functional group and ether type linkers are disclosed as additives for zinc and zinc-transition metal alloy plating compositions inUS 5,405,523 andUS 5,435,898 , and for application in tin-zinc alloy plating compositions inEP 1 201 789 B9 . Document discloses polycondensation products derived from di-tertiary amines including an amide or thioamide functional group with a linker bearing an unsaturated moiety and optionally a second di-tertiary amine with or without an unsaturated moiety as additives for zinc and zinc alloy plating compositions. Furthermore,WO 02/08497 describes another type of additive derived by polycondensation of a di-tertiary amine including an amide or thioamide functional group, a di-tertiary amine without an amide or thioamide functional group and a linker.WO 02/08497 - The above discussed additives for tin-zinc alloy plating compositions are suitable for tin-rich tin-zinc alloy deposits with a tin content > 50 wt.-% but suffer from higher deviations from the targeted composition for tin-zinc alloys deposits with a tin content of 30 to 50 wt.-%.
- The object of the present invention is to provide a metal plating composition, which can be used to deposit a tin-zinc alloy layer with a composition of 0.1 to 99.9 wt.-% Sn, more preferred 20 to 60 wt.-% Sn and most preferred 30 to 50 wt.-% Sn on a metal substrate. The deposited tin-zinc alloy layer preferably shows the following properties:
- (i) Small (< 1µm) and uniform grain size of deposited Sn and Zn particles
- (ii) homogeneous distribution of Sn and Zn domains in the deposit
- (iii) good corrosion protection to a substrate.
- Furthermore, the tin-zinc alloy plating composition should allow to reach the above mentioned criteria in a wide range of current densities and lead to deposits of high brightness.
- The present invention relates to an aqueous tin-zinc alloy plating bath composition comprising a novel type of additives for deposition of tin-zinc alloy layers on metal substrates. Furthermore, the inventive plating bath composition allows the deposition of tin-zinc alloys with a tin content of 30 to 50 wt.-% in a wide current density range of 0.01 to 10 A/dm2.
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Figure 1 shows a FIB-SEM micrograph of a tin-zinc alloy layer coated on a metal substrate derived from example 1. The additive used in the corresponding plating bath composition was the polycondensation product of N,N'-Bis(dimethylaminopropyl)urea and 1,3-Dichlor-propan-2-ol according to the present invention. The micrograph shows a uniform distribution of tin and zinc grains within the tin-zinc alloy deposit. (FIB-SEM = Focused Ion Beam-Scanning Electron Microscope) -
Figure 2 shows a FIB-SEM micrograph of a tin-zinc alloy layer deposited from a prior art plating bath composition on a metal substrate derived from example 2. The additive used in the corresponding plating bath was Mirapol A-15 (disclosed in example 1 ofEP 1 201 789 B9 ). The dark spots within the tin-zinc alloy deposit are composed of tin. The distribution of tin and zinc grains is not as uniform as in the deposit derived from an plating bath containing an additive from the present invention (example 1). - The aqueous tin-zinc plating bath composition comprises stannous ions in form of at least one water soluble stannous salt, at least one water soluble zinc salt, at least one acid and at least one quaternary ammonium polymer additive which is represented by formula I:
wherein a, b, c, d, e and f are identical or different and represent an integer ranging from 1 to 5, n is an integer greater than 1, R1, R2, R3 and R4 are identical or different and represent a substituted or unsubstituted C1 to C6 alkyl or a -CH2CH2(OCH2CH2)y-OH residue, wherein y is ranging from 1 to 6, and X- is a suitable anion. The substituted or unsubstituted C1 to C6 alkyl residues R1, R2, R3 and R4 are more preferred selected independently from the group consisting of methyl, ethyl, propyl and butyl and their hydroxy derivatives. - Said quaternary ammonium polymers may be prepared by a condensation polymerization of one or more amine monomers of formula III, wherein R1, R2, R3, R4, a and b are defined as in formula I, with one or more hydroxyl functionalized aliphatic dihalogenide compound of formula IV, wherein c, d, e and X are defined as in formula I.
- The molecular weight of the quaternary ammonium polymer according to formula I may range from about 500 to 100,000 Da, preferred from about 5,000 to 30,000 Da.
- The amount of the quaternary ammonium polymer according to formula I included in the tin-zinc alloy plating bath composition is added in an amount sufficient to provide desired improvements in the deposited tin-zinc alloy such as reduced burning of high current density deposits, homogeneous composition of tin and zinc domains in the deposit, fine and uniform grain size and improved corrosion resistance.
- Preferably, the tin-zinc alloy plating bath composition of the present invention contain from about 0.1 to 10 g/l of the quaternary ammonium polymer according to formula I, more preferred 0.2 to 6 g/l.
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- Pseudohalogenide ions are selected from the group comprising -OCN, -NCO, -CNO, -SCN, -NCS, alkylsulfonates, mesitylate and triflate.
- The tin-zinc alloy plating bath composition of the present invention will contain stannous ions in a concentration of about 1 to 100 g/l, more preferred 5 to 40 g/l. The one or more source of stannous tin ions is preferably selected from the group comprising tin(II) sulfate, tin(II) methanesulfonate, tin(II) chloride, tin(II) fluoride, tin(II) sulfamate, tin(II) acetate and tin(II) oxide. Further, the tin-zinc alloy plating bath composition contains zinc ions in a concentration of about 1 to 100 g/l, more preferred 5 to 50 g/l. The one or more source of zinc ions is preferably selected from the group comprising zinc sulfate, zinc methanesulfonate, zinc sulfamate, zinc chloride, zinc fluoride, zinc acetate and zinc fluoroborate. The weight ratio of tin and zinc ions in the plating bath composition is ranging from 1 : 5 to 5 : 1, more preferred 2 : 5 to 5 : 2 and is most preferred 2 : 3. Throughout this written description of the invention, the range and ratio limits may be combined.
- The composition of the tin-zinc alloy deposit derived from the metal plating bath contains 0.1 to 99.9 wt.-% of tin, preferred 20 to 60 wt.-% of tin and most preferred 30 to 50 wt.-% of tin.
- The tin-zinc alloy plating bath composition of the invention also may contain one or more conducting salts such as sodium chloride, sodium fluoride, sodium sulfate, potassium chloride, potassium fluoride, potassium sulfate, ammonium chloride, ammonium fluoride and/or ammonium sulfate in an amount of about 50 to 300 g/l or more. In one embodiment, the conductive salt is a chloride, the stannous salt is a chloride, and the zinc salt is a chloride, thus forming an "all chloride" plating composition.
- The tin-zinc alloy plating bath composition of the present invention also contains at least one acid. Suitable acids are hydroxy polycarboxylic acid and/or hydroxy carboxylic acid with about 3 to 15 carbon atoms per molecule, or a water soluble salt thereof. In one embodiment, the hydroxy polycarboxylic acids and/or hydroxy carboxylic acid contains 3 to 7 carbon atoms. Mixtures of hydroxy carboxylic acids can be utilized. Examples of hydroxy carboxylic acids which can be utilized for the tin-zinc plating bath composition of the present invention include monohydroxy and polyhydroxy carboxylic and polycarboxylic acids such as tartaric acid, malic acid, citric acid, gluconic acid and their respective salts, e. g., sodium, potassium or ammonium salts. Citric acid is a particularly useful hydroxy polycarboxylic acid for the tin-zinc plating bath composition of the present invention. Both stannous and zinc ions form complexes with hydroxy polycarboxylic acids like citric acid. The amount of hydroxy carboxylic acid ranges from about 5 to 200 g/l, more preferred from 10 to 150 g/l.
- When used with one or more brightener compositions such as aromatic aldehydes and ketones, improved brightness is obtainable. Such brightener compositions are known in the art (see for example
EP 1 201 789 ). Examples of aromatic aldehydes known as brightener additives in tin-zinc alloy plating electrolytes are benzaldehyde, o-chlorbenzaldehyde, m-chlorbenzaldehyde, p-chlorbenzaldehyde, o-hydroxybenzaldehyde, m-hydroxybenzaldehyde, p-hydroxybenzaldehyde, o-aminobenzaldehyde, verataldehyde, 2,4-dichlorbenzaldehyde, 3,4-dichlorbenzaldehyde, 3,5-dichlorbenzaldehyde, 2,6-dichlorbenzaldehyde, tolualdehyde, 3,4-dimethoxybenzaldehyde, cinnamaldehyde, anisaldehyde, 1-naphthaldehyde, 2-naphthaldehyde, 2-methoxy-1-naphthaldehyde, 2-hydroxy-1-naphthaldehyde, 2-ethoxy-1-naphthaldehyde, 4-methoxy-1-naphthaldehyde, 4-ethoxy-1-naphthaldehyde and 4-hydroxy-1-naphthaldehyde. In one embodiment, the tin-zinc alloy plating bath composition contains at least one brightener selected from aromatic carbonyl-containing compounds. The carbonyl compounds are useful for improving the brightness and luster of the deposits produced by the tin-zinc plating compositions of the present invention. The aromatic carbonyl-containing compounds act as a brightener imparting optimum leveling action over a wider plating range. The aromatic carbonyl-containing compounds may be aromatic aldehydes, ketones, or carboxylic acids or the water soluble salts thereof. The amount of aromatic aldehyde or other aromatic carbonyl-containing compounds included in the tin-zinc alloy plating compositions range from about 0.005 to 2 g/l. In one embodiment of the present invention, the aldehyde brighteners are added as a bisulfite addition product. - The tin ion sources in metal plating compositions for deposition of tin-zinc alloys are mainly salts of Sn2+ ions. Therefore, an antioxidant or a mixture of more than one antioxidant is preferably added to such compositions in order to prevent oxidation of Sn2+ to Sn4+ and subsequent precipitation of insoluble SnO2. An overview of typical compounds used for this purpose is given in the textbook "The Electrodeposition of Tin and its alloys" (M. Jordan, Eugen G. Leuze Publ., 1st Ed., 1995, p. 80-84) and include hydroquinone and phenol and their respective derivatives. Heterocyclic antioxidants, e. g., amino-hydroxy substituted pyridine for tin and tin alloy plating compositions with improved properties are disclosed in the European Patent Application
.08075139.9 - In practice of the present invention, the bath is operated at temperatures in the range of about 15 to 60 °C, more preferred at 20 to 30 °C. An average cathode current density of about 0.01 to 10 A/m2, preferred 0.5 to 5 A/dm2, most preferred 1.5 to 2 A/m2 is applied. The tin-zinc alloy plating bath composition can be used for barrel and rack plating.
- The following examples illustrate the tin-zinc alloy plating composition of the present invention and its utility.
- Preparation of a polymer according to formula II with R1, R2, R3, R4 = methyl and a, b = 3 and c, d, e, f = 1 and n = 70 (approximately 25,000 Da).
- 10 g (0.0434 mol) N,N'-Bis(dimethylaminopropyl)urea are dissolved in 23.6 g DI water. 5.71 g (0.0434 mol) of 1,3-Dichlor-propan-2-ol are added to this solution and held at 90 °C for 5 h.
- 39.3 g of a colourless polymer solution is obtained, which contains about 40 wt.-% of a polymer according to formula II. The polymer solution was subjected directly as the additive for example 1.
- Steel substrates were degreased with standard procedures.
- Next, a tin-zinc alloy plating solution was prepared, the composition is shown below:
Sn2+ salt 12 g/l Sn Zn2+ salt 18 g/l Zn Sodium-Gluconate 50 g/l Citric acid 20 g/l Inventive additive according to formula II 3.52 g/l Anisaldehyde (brightener) 120 mg/l Ammonium chloride 80 g/l - The above mentioned substrate was immersed in this plating bath solution and a tin-zinc alloy with a targeted composition of 40 wt.-% Sn was deposited using the following conditions:
Temperature: 20 to 25 °C pH: 5 to 6 current density: 0.1 to 3.5 A/dm2 - Steel substrates were degreased with standard procedures.
- Next, a metal plating solution was prepared, the composition is shown below:
Sn2+ salt 12 g/l Sn Zn2+ salt 18 g/l Zn Sodium-Gluconate 50 g/l Citric acid 20 g/l Mirapol A-15 ( EP 1 201 789 B1 ; example 1;available from Rhodia)5.87 g/l Anisaldehyde (brightener) 120 mg/l Ammonium chloride 80 g/l - The above mentioned substrate was immersed in this plating bath solution and a tin-zinc alloy with a targeted composition of 40 wt.-% Sn was deposited using the same conditions as in example 2.
- The tin-zinc alloy composition distribution on a substrate was evaluated with EDX for a deposit derived from a tin-zinc alloy plating composition containing an additive according to formula II (example 1 of the present invention) and a deposit derived from a tin-zinc alloy plating composition containing a prior art quaternary ammonium polymer additive disclosed in example 1 of the patent
EP 1 201 789 B9 (example 2 of the present invention). The target tin-zinc alloy composition was in both cases 40 wt.-% tin and 60 wt.-% zinc. The results of the comparative experiment are summarized in Table 1. The plating bath comprising the inventive additive according to formula II leads to a more homogeneous tin-zinc alloy deposit composition compared to the deposit derived from a prior art plating bath over the entire current density range.Table 1: deviation from the average alloy deposit composition derived from example 1 and comparative example 2. Absolute value of deviation from target average composition of 40 wt.-% tin and 60 wt.-% zinc (values given in %) current density (A/dm2) example 1 (inventive additive) example 2 (prior art additive) >> 3,5 5.47 8.64 3.5 6.56 10.01 2.6 6.88 10.47 1.9 6.56 9.38 1.4 6.41 9.98 1 4.54 6.80 0.7 0.80 2.26 0.4 14.54 11.94 - A FIB-SEM micrograph (
Figure 1 ) of a tin-zinc alloy deposit obtained according to example 1 shows the reduced grain size of the deposit compared to a deposit derived from a tin-zinc plating composition containing a prior art quaternary ammonium polymer additive (Figure 2 , example 2). Furthermore, the grain size distribution is narrower for the deposit obtained with an inventive quaternary ammonium polymer according to formula II. - Formation of white rust was investigated for the tin-zinc alloy deposits derived from examples 1 and 2 using standard salt spray test conditions (DIN EN ISO 9227). Prior to the salt spray test the substrates coated with Sn-Zn alloy were coated with a further passivation layer (Ecotri HC2, product of Atotech Deutschland GmbH).
- A substrate coated from a plating bath according to example 1 was subjected to a salt spray test after deposition of a passivation layer. Formation of white rust was observed after 48 h.
- A substrate coated form a plating bath according to experiment 2 was subjected to a salt spray test after deposition of a passivation layer. Formation of white rust was observed after 24 h.
Claims (12)
- A tin-zinc alloy plating bath composition, comprisingi) at least one additive according to formula I:
wherein a, b, c, d, e and f are identical or different and represent an integer ranging from 1 to 5,n is an integer greater than 1,R1, R2, R3 and R4 are identical or different and represent a substituted or unsubstituted C1 to C6 alkyl or a -CH2CH2(OCH2CH2)y-OH residue, wherein y is ranging from 1 to 6, andX- is a suitable anion,ii) at least one zinc ion source andiii) at least one tin ion source andiv) at least one acid. - A tin-zinc alloy plating bath composition according to claim 1, wherein R1, R2, R3 and R4 are selected independently from the group consisting of methyl, ethyl, propyl and butyl and their hydroxy derivatives.
- A tin-zinc alloy plating bath composition according to any of the foregoing claims, wherein 0.1 to 10 g/l of at least one additive according to formula I or II is present in the plating bath.
- A tin-zinc alloy plating bath composition according to any of the foregoing claims, wherein 0.2 to 6 g/l of at least one additive according to formula I or II is present in the plating bath.
- A tin-zinc alloy plating bath composition according to any of the foregoing claims, wherein the molecular weight of the additive according to formula I or II is between 500 Da and 100,000 Da.
- A tin-zinc alloy plating bath composition according to any of the foregoing claims, wherein the molecular weight of the additive according to formula I or II is between 5,000 Da and 30,000 Da.
- A tin-zinc alloy plating bath composition according to any of the foregoing claims, wherein the acid is a hydroxy carboxylic acid or a salt thereof.
- A tin-zinc alloy plating bath composition according to any of the foregoing claims, wherein the additives according to formula I and formula II are synthesized from a N,N'-bis(dialkylaminoalkylene)urea derivative and a α,ω-dihalogenide compound.
- A tin-zinc alloy plating bath composition according to claim 1, wherein the N,N'-bis(dialkylaminoalkylene)urea component is described by formula III:
wherein R1 and R2 are identical or different and represent a substituted or unsubstituted C1 to C6 alkyl or -CH2CH2(OCH2CH2)y-OH, wherein y is ranging from 1 to 6. - A tin-zinc alloy plating bath composition, wherein R1, R2, R3 and R4 of the N,N'-bis(dialkylaminoalkylene)urea component described by formula III are selected independently from the group consisting of methyl, ethyl, propyl and butyl and their hydroxy derivatives.
- A metal alloy plating bath composition according to claim 1, wherein the α,ω-dihalogenide compound is described by formula IV:
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|---|---|---|---|
| EP08166465A EP2175048A1 (en) | 2008-10-13 | 2008-10-13 | Metal plating composition for deposition of tin-zinc alloys onto a substrate |
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| Application Number | Priority Date | Filing Date | Title |
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| EP08166465A EP2175048A1 (en) | 2008-10-13 | 2008-10-13 | Metal plating composition for deposition of tin-zinc alloys onto a substrate |
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| EP2175048A1 true EP2175048A1 (en) | 2010-04-14 |
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| EP08166465A Withdrawn EP2175048A1 (en) | 2008-10-13 | 2008-10-13 | Metal plating composition for deposition of tin-zinc alloys onto a substrate |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104357884A (en) * | 2014-11-14 | 2015-02-18 | 无锡伊佩克科技有限公司 | Method for plating zinc-tin alloy on ferrous material |
| WO2016118400A1 (en) | 2015-01-22 | 2016-07-28 | Baker Hughes Incorporated | Use of hydroxyacid to reduce the localized corrosion potential of low dose hydrate inhibitors |
| CN107406999A (en) * | 2015-03-26 | 2017-11-28 | 三菱综合材料株式会社 | The electroplate liquid of ammonium salt is used |
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| US5435898A (en) | 1994-10-25 | 1995-07-25 | Enthone-Omi Inc. | Alkaline zinc and zinc alloy electroplating baths and processes |
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| EP1201789A2 (en) | 2000-10-19 | 2002-05-02 | ATOTECH Deutschland GmbH | Plating bath and method for electroplating tin-zinc alloys |
| EP1114206B1 (en) | 1998-09-02 | 2003-02-26 | ATOTECH Deutschland GmbH | Cyanide-free aqueous alkaline bath used for the galvanic application of zinc or zinc-alloy coatings |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104357884A (en) * | 2014-11-14 | 2015-02-18 | 无锡伊佩克科技有限公司 | Method for plating zinc-tin alloy on ferrous material |
| WO2016118400A1 (en) | 2015-01-22 | 2016-07-28 | Baker Hughes Incorporated | Use of hydroxyacid to reduce the localized corrosion potential of low dose hydrate inhibitors |
| EP3247761A4 (en) * | 2015-01-22 | 2018-07-04 | Baker Hughes, A Ge Company, Llc | Use of hydroxyacid to reduce the localized corrosion potential of low dose hydrate inhibitors |
| CN107406999A (en) * | 2015-03-26 | 2017-11-28 | 三菱综合材料株式会社 | The electroplate liquid of ammonium salt is used |
| CN107406999B (en) * | 2015-03-26 | 2019-08-27 | 三菱综合材料株式会社 | Plating solution using ammonium salt |
| US10450665B2 (en) | 2015-03-26 | 2019-10-22 | Mitsubishi Materials Corporation | Plating solution using ammonium salt |
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