EP2157212A3 - Oberflächenbehandlungsverfahren für ein Gehäuse - Google Patents

Oberflächenbehandlungsverfahren für ein Gehäuse Download PDF

Info

Publication number
EP2157212A3
EP2157212A3 EP09166155.3A EP09166155A EP2157212A3 EP 2157212 A3 EP2157212 A3 EP 2157212A3 EP 09166155 A EP09166155 A EP 09166155A EP 2157212 A3 EP2157212 A3 EP 2157212A3
Authority
EP
European Patent Office
Prior art keywords
housing
treatment method
surface treatment
chromium coating
electroplating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP09166155.3A
Other languages
English (en)
French (fr)
Other versions
EP2157212A2 (de
Inventor
Jong-Yi Su
Cheng-Shin Chen
Ren-Ning Wang
Bin Liu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Futaihong Precision Industry Co Ltd
FIH Hong Kong Ltd
Original Assignee
Shenzhen Futaihong Precision Industry Co Ltd
FIH Hong Kong Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Futaihong Precision Industry Co Ltd, FIH Hong Kong Ltd filed Critical Shenzhen Futaihong Precision Industry Co Ltd
Publication of EP2157212A2 publication Critical patent/EP2157212A2/de
Publication of EP2157212A3 publication Critical patent/EP2157212A3/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/36—Pretreatment of metallic surfaces to be electroplated of iron or steel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
EP09166155.3A 2008-07-30 2009-07-22 Oberflächenbehandlungsverfahren für ein Gehäuse Withdrawn EP2157212A3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN200810303201A CN101638801A (zh) 2008-07-30 2008-07-30 壳体的表面处理方法

Publications (2)

Publication Number Publication Date
EP2157212A2 EP2157212A2 (de) 2010-02-24
EP2157212A3 true EP2157212A3 (de) 2014-03-12

Family

ID=41327686

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09166155.3A Withdrawn EP2157212A3 (de) 2008-07-30 2009-07-22 Oberflächenbehandlungsverfahren für ein Gehäuse

Country Status (3)

Country Link
US (1) US20100025256A1 (de)
EP (1) EP2157212A3 (de)
CN (1) CN101638801A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8290604B2 (en) * 2008-08-19 2012-10-16 Sony Computer Entertainment America Llc Audience-condition based media selection
ES2753180T3 (es) * 2010-12-10 2020-04-07 Hayward Ind Inc Fuentes de alimentación para equipo de piscina y spa

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4278512A (en) * 1978-11-11 1981-07-14 International Business Machines Corporation Low concentration trivalent chromium electroplating solution and process
DE19529843A1 (de) * 1995-08-12 1997-02-13 Marco Santini Verfahren zur galvanischen Verchromung
EP1918425A1 (de) * 2006-10-24 2008-05-07 Wolf-Dieter Franz Graustichige Chromoberflächen
EP2108716A2 (de) * 2008-04-11 2009-10-14 Shenzhen Futaihong Precision Industry Co., Ltd. Verfahren zum Elektroplattieren eines Kunststoffsubstrats

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3232854A (en) * 1959-06-05 1966-02-01 Diamond Alkali Co Chromium plating
US3414492A (en) * 1965-12-14 1968-12-03 Corillium Corp Chromium plating process
FR2297906A1 (fr) * 1975-01-14 1976-08-13 Ugine Kuhlmann Stabilisation du peroxyde d'hydrogene dans les bains acides pour le decapage des metaux
US5110035A (en) * 1990-02-01 1992-05-05 Westinghouse Electric Corp. Method for improving the solderability of corrosion resistant heat exchange tubing

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4278512A (en) * 1978-11-11 1981-07-14 International Business Machines Corporation Low concentration trivalent chromium electroplating solution and process
DE19529843A1 (de) * 1995-08-12 1997-02-13 Marco Santini Verfahren zur galvanischen Verchromung
EP1918425A1 (de) * 2006-10-24 2008-05-07 Wolf-Dieter Franz Graustichige Chromoberflächen
EP2108716A2 (de) * 2008-04-11 2009-10-14 Shenzhen Futaihong Precision Industry Co., Ltd. Verfahren zum Elektroplattieren eines Kunststoffsubstrats

Also Published As

Publication number Publication date
US20100025256A1 (en) 2010-02-04
EP2157212A2 (de) 2010-02-24
CN101638801A (zh) 2010-02-03

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