EP2155932A2

EP2155932A2 - Method for the production of an optical element by means of a molding process, optical element produced according to said method, collector, and lighting system

Info

Publication number: EP2155932A2
Application number: EP08801441A
Authority: EP
Inventors: Udo Dinger; Ulrich Bingel; Jeffrey Erxmeyer; Eral Erzin; Bernhard Weigl; Stephane Bruynooghe
Original assignee: Carl Zeiss SMT GmbH
Current assignee: Carl Zeiss SMT GmbH
Priority date: 2007-05-31
Filing date: 2008-05-29
Publication date: 2010-02-24
Also published as: KR20100017443A; JP2010528480A; WO2008145364A3; US20100182710A1; WO2008145364A2

Abstract

Disclosed is a method for producing an optical element or part of an optical element having a base. Said method comprises the following steps: - a mold (21, 1000, 2000) is provided that has a surface corresponding to the geometry of the optical element; - a layer system (7) encompassing at least one separation layer system (15, 1010, 2010) is deposited on the surface of the mold (21, 1000, 2000); - a base (4, 1030, 2030) is electroformed on the layer system (7); - at least the base on the separation layer system (15, 1010, 2010) is detached from the mold (21, 1000, 2000).

Description

Method for producing an optical element by means of impression molding, optical element produced by this method, collector and illumination system

The invention relates to a method for producing an optical element by molding, an optical element produced by such a method, a collector shell, in particular for a grazing-incidence collector for use, in particular in EUV radiation in the wavelength range of 4 to 30 nm, preferably from 7 to 15 nm. Furthermore, the invention relates to a microlithography projection exposure apparatus, in particular also an illumination system of such a microlithography projection exposure apparatus.

Optical elements, for example for microlithography systems, have hitherto been produced, for example, by vapor deposition on prefabricated substrates. This is described for example in DE 10 2005 017 742 A1. In the method according to DE 10 2005 017 742 A1, at least the optically active coating is deposited on a substrate. Such methods are on the one hand very expensive, on the other hand for coating, for example, in closed areas unsuitable.

Optical surfaces which are formed closed can be found e.g. at collectors. In this regard, reference is made to US Pat. No. 7,244,954.

A disadvantage of the systems, for example from DE 10 2005 017 742 A1, was that the substrates were non-conductors which could charge electrostatically, for example, when installed in an illumination system.

Collectors for illumination systems having a wavelength preferably ≤126 nm, particularly preferably wavelengths in the EUV range of 4 to 30 nm, in particular at 7 nm or at 13.5 nm for receiving the from a light source radiated light and for illuminating a region in a plane with a plurality of rotationally symmetrical mirror shells, which are arranged one inside the other about a common axis of rotation, are known in a variety of designs.

US 5,763,930 shows a nested collector for a pinch-plasma light source, which serves to collect the radiation emitted by the light source and to focus in a light guide.

The document US 6,285,737 B1 discloses a lighting system with a grazing-incidence collector mirror. The collector mirror comprises a plurality of individual mirrors in a stacked arrangement. The individual mirror surfaces of the stack do not form a contiguous surface, in particular no closed surface such as, for example, a surface of revolution. A surface of revolution is an area obtained by rotating about an axis of rotation of a curve lying in a plane including the axis of rotation.

The individual mirrors of the stacked mirror array according to US Pat. No. 6,285,737 B1 consist of a base layer which forms the base body and is coated with a reflection layer of, for example, rhodium, molybdenum, gold or other alloys. Preferably, the single mirror is coated with ruthenium. The application of the individual layers is carried out by a vapor deposition or a sputtering method, d. H. with conventionally known methods on a base body. The thickness of the metal layer forming the reflection layer is very large, in particular more than 100 nm, in order to be resistant to the thermal influences due to the arrangement with respect to the light source. After vapor deposition, the layer is optically polished. The mirror shells thus formed have either flat, elliptical or aspherical surfaces. The ruthenium coated single mirrors reflect 50-84% of EUV radiation when the angle of incidence to the surface normal is 75 to 80 °, i. H. the mirror is operated under grazing incidence.

As an alternative to the collector system of an array with stacks of individual mirrors, as described in US 6,285,737, you can also collectors with closed surfaces, for example, use surfaces of revolution in illumination systems for EUV lithography. Such collectors have become known, for example, from US Pat. No. 7,091,505, US 2003-0043455A1, US Pat. No. 7,015,489 US 2005 / 023645A1, US 2006-0097202 A1 or EP 1225481.

The collectors with closed mirror shells described in the aforementioned documents are preferably designed as systems with a plurality of closed mirror shells arranged one inside the other and are referred to as so-called nested collectors. Closed mirror shells are, for example, annular closed mirror surfaces.

The collector shells, which are formed as closed surfaces, for example as surfaces of revolution, either have the disadvantage of a low reflectivity of the incident light or are unstable and prone to deformation under thermal stress, as they occur in particular in EUV systems.

The invention is therefore based on the object in a first aspect

Specify method that overcomes the disadvantages of the prior art.

According to the invention, this is achieved by a method for producing an optical element, comprising the steps:

Provision of an impression body, with a surface in the

Substantially corresponds to the geometry of the optical element;

Depositing a layer system comprising at least one

Separating layer system on the surface of the impression body; - electroforming a base body on the layer system, in particular by an electrochemical process;

Detachment of the layer system and the body on

Separating layer system from the impression body. In the molding method described above, a distinction can be made between production methods with direct molding of the entire optical element, for example the collector shell of an impression body and the spatially and temporally separate possible impression of the base body with subsequent coating. Both methods offer the advantage that the optical element, for example the collector shell, is already present as a structural unit after the molding process. The optical element, for example, the collector shells are made quasi from the inside to the outside. For this purpose, an impression body is provided for both methods, with a surface which essentially corresponds to the geometry of the optical element, for example the collector shell. On this, a layer system, comprising in the first method, at least one separation layer system and a reflective layer system, in the second method, a separation layer system without reflective layer system, deposited. The main body is formed on the layer system by electroforming, in particular an electrochemical process. Thereafter, the detachment of the optical element, for example, the collector shell on the release layer system from the impression takes place. While an evaporation step for the reflection layer system follows in the second method, in the first method the optical element, for example the collector shell, has already been completed.

The problem of the molding process consists in finding a suitable separating layer system which allows taking into account the existing layer stresses an impression without influencing the optimal optical properties of the reflection layer (in the first method) and maintaining the mechanical stability of the individual layers.

PVD (Physical Vapor Deposition) methods, for example thermal evaporation, evaporation with electron beam evaporators or sputtering, in particular sputtering with magnetron sources, are used as the coating method. During thermal evaporation and evaporation with electron beam evaporator, the evaporation source is positioned below the impression body to be coated. A sufficiently homogeneous layer thickness can be achieved on the one hand by a large distance between source and impression body on the other hand by simultaneous evaporation using a plurality of uniformly arranged sources. When using sputtering techniques, the sources must be evenly spaced near the surface of the molded article to be coated, due to the high sputtering gas pressure required in this process. An optimal layer thickness homogeneous ität can by one of the form of the

Abformkörpers adapted sputtering, in particular magnetron source can be achieved.

The vapor deposition of the evaporation surface facing away from the surface of the molded article to be coated can be done for example by rotation of the Abformkörpers during the coating process.

The subsequent coating of already molded optical elements, for example collector shells with the reflection layer system, is carried out during sputtering, as already explained, with a plurality of sources arranged equidistant or with a source adapted to the shape of the impression body. When using thermal sources or electron beam evaporator, the use of glare techniques allows a uniform coating thickness distribution over the entire surface of the optical element.

For an optimal molding process, it is necessary to keep the layer tension of the entire layer system with base layer as low as possible, so that no layer cracks or delamination can occur. This is achieved both by the use of an ion-assisted vapor deposition process and by optimization of coating parameters such as layer thicknesses or evaporation rates in connection with the rotation of the impression body during coating, since the layer stresses are strongly dependent on it.

An inventive impression-layer system for the production of optical elements, for example collector shells for grazing-incidence collectors, under which the entirety of Abformkörper, release layer system, layer system and the base body forming base layer before the impression, ie separation comprises, is for the first embodiment of an inventive optical element, in particular collector shell characterized by the sequence of Abformkörper and layers of silicon dioxide SiO _2, gold Au and galvanized, for example, at collectors ruthenium Ru ₁ nickel Ni. The second alternative embodiment of the optical element, for example the collector shell, is characterized by a sequence of molded articles and layers of SiO ₂ , Ru, Cr, Ru, Cr, Ni and galvanized Ni in the case of a grazing-incidence collector.

In addition to the production of optical elements in which the light is reflected in grazing incidence, that is, under grazing-incidence, it is also possible to produce optical elements with the method according to the invention, which reflect radiation incident on the optical element under normal incidence, so-called normal incidence optical elements.

Grazing-incidence reflection is preferably understood as meaning a reflection in which the reflection angle is more than 70 degrees to the normal, which is perpendicular to the reflecting surface.

A normal-incidence reflection is preferably understood to be a reflection in which the reflection angle is less than 30 degrees to the normal, which is perpendicular to the reflective surface.

Is the optical element, which is produced by means of the described molding technique, a normal-incidence optical element, for example a normal-incidence mirror, so the mirror surface in a particular embodiment of a multi-layer system, for example, a multi-layer system of Mo / Be alternating layers or Mo / Si alternating layers. Preferably, such layer systems comprise more than 40, preferably more than 60 such alternating layers.

When light strikes a surface coated with such a multi-layered alternating layer system, the incident light is reflected substantially normal-incidence, that is, at angles <30 degrees, to the surface normal.

Optical elements which are operated under normal incidence may be normal-incidence collector mirrors or, in particular, facet mirrors, for example field facet mirrors or pupil facet mirrors, as are known from US Pat. No. 6,658,084 B2 or US 2006/0 132 747 A1. As shown in US Pat. No. 6,658,084, a faceted optical element, for example a field facet mirror, can comprise 72 field facets which are applied to a mirror support or a substrate. Each individual mirror facet acts as a normal-incidence mirror.

In the first case of a molding method, the separating layer system comprises an SiO ₂ layer deposited on the molding body and an Au layer deposited on Si ₂ O ₂ . The detachment of the optical element, for example, the collector shell takes place with an additional Au layer from the Abformkörper between the SiO ₂ - and Au surface in the separation layer system. In a further method step, Au is detached from the reflection layer, preferably chemically.

In the second case of a molding process, the separation takes place directly between the layer system of the collector shell and SiO ₂ To reduce the adhesive forces, in particular between the layer system comprising, for example, a ruthenium layer or a Mo / Si multilayer system and the SiO ₂ layer, a conditioning step is provided. In this, the SiO ₂ layer is exposed to a surface treatment after deposition over a predefined period of time. The layer system is then deposited directly on the SiO ₂ layer. In grazing-incidence systems, layers of ruthenium and an adhesion layer of chromium may preferably be deposited alternately. The separation takes place in such systems between the SiO ₂ and the Ru surface.

In both cases, the optical element is produced quasi from the inside to the outside. The production from the inside to the outside, for example, has the advantage that also collector shells with closed surfaces and small diameters, preferably diameter d <200 mm, can be produced. Another advantage, in particular in the case of normal-incidence facet mirrors, is the ease of manufacture. Thus, in such a method only one Abformkörper that can be used for a variety to be produced facet mirror, manufactured and its surface machined highly accurate and used for multiple impressions, whereas in a method according to the prior art, each individual facet mirror set must be polished consuming ,

According to a further embodiment, the optical element can also be produced by molding the base body and subsequent coating. Again, there is the provision of a Abformkörpers, with a surface that corresponds to the geometry of the optical element. If the optical element is a collector shell, the surface corresponds to the inner wall of the

Body. The main body is molded on the impression body, preferably by an electrochemical process. Subsequently, the main body is detached from the impression body. Time-shifted and with other equipment is then the deposition of a layer system. The system comprises at least one reflective layer which is applied to the surface of the base body. This is also done by thermal evaporation, electron beam evaporation or sputtering. An impression layer system, for example for the production of collector shells by molding the base body and subsequent coating is characterized by the sequence of Abformkörper and layers of silicon dioxide SiO ₂ , gold Au or palladium Pd as a release layer system. Ruthenium Ru can subsequently be applied by vapor deposition.

In the case of faceted optical elements, there may be a sequence of Abformkörper of layers of SiO ₂ , gold (Au) or palladium (Pd) as a release layer system and a Mo / Si or Mo / Be multiple coating system. When using sputtering techniques, the coating of the reflection layer system, consisting of at least one Ru layer or a Mo / Si or Mo / Be multi-layer system, as already stated with several equally spaced sources or with the shape of the Abformkörpers adapted source executed. When using thermal sources or

Electron beam evaporator, the inner surface of the collector shell is subsequently coated with the use of glare techniques with Ru.

A collector dish is preferably used in a grazing-incidence collector. In an advantageous embodiment, a collector comprises not only a single rotationally symmetrical shell or rotary shell, but a plurality of such rotationally symmetrical collector shells, wherein the rotation shells are arranged one inside the other around a common axis of rotation. The collector is designed with at least two collector shells arranged one inside the other, preferably four, six, eight or ten collector shells. This is part of an illumination system for the EUV wavelength range, in which the optical radiation is recorded at an angle greater than 70 ° to the surface normal. In such a case, it is a grazing-incidence collector. Grazing-incidence collectors have the advantage over normal-incidence collectors that they degrade only to a small extent due to the debris of the source, ie they hardly lose their reflectivity. Furthermore grazing incidence collectors are always simpler structure, since they usually have only an optical coating. With these, reflectivities> 80% can be achieved with lower surface roughness requirements.

In addition to the previously described production of a collector shell as a grazing-incidence element, the production of a normal-incidence element, for example a facet mirror or an imaging mirror or a normal-incipient collector mirror, will be described in more detail below. If such an optical element is produced by molding techniques, an impression body made of a suitable material, for example quartz glass or kanigienized aluminum, is first produced and superpolished. The superpolishing reduces the surface roughness of the molded body or sample body, also referred to as a mandrel, to values corresponding to those required by a conventional multilayer system coated normal-incidence optical element in order to achieve high

Reflectivity in the range of 70% at a wavelength of, for example, 13 or 11 nm.

Such roughnesses are preferably in the range of 0.2 nm HSFR. The roughness HSFR denotes the RMS roughness at spatial frequencies between 10 nm and a few μm.

After the superpolishing of the impression body, the impression body is provided with a coating. Such a coating may be, for example, a 50 to 200 nm thick gold layer.

In a first embodiment of the invention, a metal layer, for example a nickel or copper layer, is grown on the 50-200 nm-thick conductive gold layer with the aid of galvanic methods. Here, the gold layer serves as a cathode. Then, with the aid of thermo-separation, the gold layer with the metal layer deposited thereon, for example the nickel layer, is separated and a Mo / Si multilayer layer with a Ru covering layer is grown on this separated layer.

Alternatively, instead of the subsequent growth of the multilayer systems, the production of a facet or of a normal-incidence element with molding techniques can also be carried out by applying a Ru layer to the mandrel and a multilayer system of Mo / Si on the Ru layer.

Only on the grown multiple layer system of Mo / Si and optionally a metal layer, for example of Au, which acts as a cathode, then the substrate layer, for example, nickel Ni or Cu copper is grown galvanically.

Preferably, the last layer of the multilayer system is a conductive Mo layer which can serve as a cathode in such a process. For this purpose, the Mo layer can be designed correspondingly thick. Alternatively, it would also be possible to apply to the stack with the multilayer system a metal layer of, for example, gold Au, nickel Ni or ruthenium Ru, this metal layer then serving as a cathode.

In the method according to the invention for the production of normal-incidence-optical elements can advantageously in the galvanically applied

Substrate layer of the optical element using the molding process during the galvanic deposition of the substrate support cooling channels or cooling lines are introduced. These cooling lines are used for the molding of the high absorbed heat energy, which can be, for example, between 3 and 5 watts per facet for a faceted element. Preferably, the cooling takes place with the aid of a liquid medium, for example water. To galvanize the cooling elements into the substrate surface, first about 0.5 mm thick metal layer, for example of nickel or copper, grown on the metal layer connected to the mandrel. After growing a first part of the metal layer serving as the substrate layer, the cooling elements, in particular the cooling line, are then positioned. After the cooling lines are positioned, metal is further deposited by galvanic means, so that the cooling lines are firmly and materially embedded in the substrate surface. By embedding the cooling line in the substrate layer in particular a low heat transfer resistance is ensured.

With the galvanic process not only cooling lines in the metal substrate can bring, also the introduction of bearing elements would be possible.

As described above, the optical element or a part of the optical element is separated from the mandrel by a temperature shock. For this, the entire unit of mandrel and optical element is subjected to a temperature jump, typically to lower temperatures. Due to the different coefficients of thermal expansion of mandrel and the materials of the grown optical element, a separation between the mandrel and the grown optical element or part of the optical element occurs as soon as the thermally induced stresses exceed the adhesive stresses between the layers of the optical element and the mandrel.

As the separation layer, for example, as described above, a gold layer can serve as the gold remains on the separated metal body constituting the substrate. In addition to gold, Ru can also serve as a separating layer, especially in grazing-incidence components.

In a further aspect of the invention, this is based on the object, a grazing-incidence component, for example a grazing-incidence mirror, preferably a grazing-incidence collector, in particular with closed To provide surfaces with high reflectivity, good optical imaging properties at the same time high stability and low space.

In particular, collectors are to be specified, which are characterized by a high stability.

In order to achieve a high reflectivity is provided, the individual

Collector cups which are preferably designed as annular closed mirror surfaces, for example, as a rotation surfaces, to be provided with ruthenium as a reflection layer.

To ensure high stability, especially when used in EUV

To ensure lighting systems, the geometric dimension of a collector shell are chosen such that it is characterized by a length I of> 120 mm. If the collector shell is not a closed surface but, for example, a partially perforated surface, instead of the diameter, the vertical distance (d / 2) of the end point from a straight line along which the length of the collector shell is defined. The vertical distance d / 2 is ≦ 375 mm, preferably <150 mm, in particular <100 mm, particularly preferably <75 mm, very particularly preferably <50 mm. Most preferably, the distance d / 2 is between 40 mm and 375 mm, in particular between 40 mm and 135 mm, particularly preferably between 40 mm and 75 mm.

Preferably, the collector shells according to the present invention are so-called rotary shells. Rotational trays are trays obtained by rotating plane curves around an axis of rotation, with both the axis of rotation and the plane curve lying in one plane. examples for

Rotary dishes are cylindrical dishes, spherical dishes or bowls. In cylindrical shells, the plane curve is a parallel to the axis of rotation, in spherical shells, the plane curve is a semicircle with the center on the axis of rotation and cone shells a straight line that intersects the axis of rotation. As characteristic sizes for the collector shells is in present application whose length I and the diameter d or half the diameter, ie the radius taken.

For rotation dishes, the length I means the length of the plane curve from a start to an end point. As stated previously, the collector shell, viewed in the longitudinal direction of the axis of rotation, has an initial and an end point. The starting point is the point of the shell closest to the light source, the end point being the point of the shell farthest from the light source. The distance between the light source and the starting point is also referred to as the starting distance. This is smaller than the distance of the end point viewed from the light source in the longitudinal direction of the optical axis.

In the present application, the diameter d is defined as twice the distance of an end point at the end of the shell from the axis of rotation; i.e. d = 2-re with d: diameter of the shell at the end point re: radius of the shell at the end point.

The vertical distance of the starting point from the rotation axis is also referred to as the first radius or ra and the distance of the end point as the second radius re.

In the present application, the diameter d is defined over the radius of the end point re.

If the collector shell is designed as a surface of revolution, then the length (I) along the rotation axis is> 120 mm and the diameter d <750 mm, in particular d <300 mm, in particular <200 mm, in particular <150 mm, particularly preferably <100 mm. Most preferably, the diameters of the mirror shells are in the range 80 mm to 750 mm, preferably in the range 80 mm to 270 mm, particularly preferably in the range 80 mm to 150 mm. The inventors have recognized that particularly good imaging properties can be achieved by the coating comprising Ru on a metal base body. Due to the small diameter d of the individual mirror shells, which preferably have a diameter d <200 mm and are very preferably in the range 80 mm to 270 mm, a high stability is achieved. Further, by using a plurality of such nested cups to a nested collector, a high collection aperture with a small number of trays can be achieved. Furthermore, in a developed embodiment, a high efficiency is achieved by the selected minimum length I ≥ 120 mm.

Due to the possible smaller diameters compared to the collector shells of the prior art in the form of US Pat. No. 7,091,505 or US Pat. No. 7,015,489, a good imaging result can still be achieved even with high thermal load capacity. For a multi-shell collector, if the diameter of the largest shell of the nested collector system is 200 mm, then the diameters of all other shells are smaller, i. They are for example in the range 80 mm to 200 mm, so the deformation of the shells in the radial direction can be kept low even at high thermal stress. Since the deformation is small, the imaging properties are hardly affected. At the same time, the collector shell has a high stability.

While the production of optical elements by means of impression techniques has previously been described using the example of closed mirror surfaces, in particular annular closed surfaces of revolution, the surfaces can also be designed as non-closed surfaces, for example as segments, without deviating from the invention.

Preferably, the collector shells comprise a base body, preferably of a metal and a layer system, which is arranged on the base body is. The layer system comprises at least the reflection layer forming an optical surface. Preferably, the layer system according to a first embodiment comprises only the reflective layer.

The main body is preferably made of a metal, preferably galvanized nickel. As further materials, copper and ruthenium are conceivable for the main body or a sequence of these materials and also mixtures.

The layer thickness of the reflection layer made of ruthenium is preferably between in each case including 10 nm to 150 nm, preferably 10 nm to 120 nm, particularly preferably 15 nm to 100 nm, very particularly preferably between 20 and 80 nm. Thus, in addition to a high reflectivity, a high Stability against molding of the shell achieved at low to moderate layer stresses.

According to a second embodiment, the layer system is designed as a multilayer system comprising in each case the components ruthenium and chromium, which are arranged alternately in layers. In order to keep the layer stresses in the layer system as low as possible, so that they do not cause any delamination or cracks or mechanical degradation or chemical degradation at high thermal stress, the coating parameters, such as layer thicknesses, layer thickness ratios between the individual layers, bedampfger ngsraten and other process parameters at the deposition, in particular the vapor deposition of the individual layers are optimized and adjusted or controlled with respect to the desired result. These

Furthermore, properties can also be influenced by the choice of the suitable method for applying or depositing the individual layers. The multilayer system is formed in detail by a first ruthenium layer forming the optical surface and a second ruthenium layer. An adhesive layer is provided between the first and second ruthenium layers. This is preferably made of chrome. Between the second ruthenium layer and the main body of the collector shell is for the purpose of avoiding Layer deletions and undesirable reactions between the individual layers, in particular the influence of the ruthenium layers provided a metallic intermediate layer, which is preferably made of the same metal as the base layer forming the base layer. When forming the base body made of galvanized nickel, therefore, the intermediate layer will preferably also consist of nickel. The layer thickness of nickel is preferably ≦ 30 nm.

Apart from the adhesion function, the adhesive layers have no further function, so that layer thicknesses in the range between 1 and 5 nm inclusive, preferably 1 to 2 nm, can be considered sufficient here. These are preferably formed from chromium. The layer thickness of the first ruthenium layer is 5 to 20 nm, preferably 8 to 12 nm. The second ruthenium layer is characterized by a layer thickness which is between 20 to 80 nm, preferably between 30 and 60 nm.

The embodiments of the collector shell are characterized by a microroughness in the range of less than 2 nm RMS at a wavelength of 13 nm at the optical surfaces. The collector shells thus have a sufficiently high reflectivity.

The geometric design of the collector shell takes place as a rotation shell, d. H. as a rotationally symmetrical body with respect to a rotational or rotational symmetry axis. The collector shells are therefore closed surfaces. The axis of rotation corresponds to the optical axis OA of the collector shell. The single collector shell is preferred as aspheric segment with

Rotational symmetry executed around the axis of rotation. It is particularly preferred if the mirror shells are a rotation dish of an ellipsoid, a paraboloid or a hyperboloid. For a paraboloid results in a completely parallel beam and thus a lying at infinity light source. Collectors with rotating bowls whose plane curves are sections of hyperboloid lead to a divergent beam and are of particular interest when the collector should be as small as possible.

Particularly preferably, the molding method according to the invention is used in grazing-incidence components to provide cooling devices. For this purpose, a first layer of a metal, for example a nickel or a copper layer is first electrodeposited onto the conductive layer, for example the gold layer having a thickness of 50-200 nm, which has been applied to the impression body, ie the mandrel, the gold layer being deposited as Cathode serves. Then, cooling and / or structural elements such as cooling pipes or bearing elements are positioned on the surface of the grown metal layer. In a further method step, a further second layer of metal, consisting of nickel or copper, is then electrodeposited in such a way that the cooling and structural elements are firmly and materially embedded in the substrate. As a result, required in a simple manner cooling lines for operated in grazing incidence optical elements, eg. B. collectors are introduced into the substrate. Preferably, the first layer is between 0.1 and 1 mm thick and the second layer between 1 and 4 mm.

In addition to grazing-incidence elements, it is also possible to produce normal-incidence elements with a method according to the invention.

A reflective normal-incidence element may be a mirror used, for example, in an imaging system such as a projection objective. Alternatively, such normal-incidence elements may, for example, also be normal-incidence collector mirrors.

Most preferably, the normal-incidence element is single facets of a faceted optical element. Such faceted optical elements having a multiplicity of individual facets, for example field facets or pupil facets, have become known from US Pat. No. 7,006,595. The faceted optical element shown in US Pat. No. 7,006,595 comprises, for example, 216 field facets as well as many pupil facets.

The disclosure of this application is included in the present application in full.

The production of normal-incidence elements can also be done with the aid of a molding technique. This is done on a Abformkörper

Applied separation layer system. The release layer system may be a metal layer deposited on the impression body, for example an Au layer or a Ru layer.

The main body of the reflective normal-incidence element can then be galvanically grown on this layer and serves as the cathode.

The deposition of a metal on the separation layer, for example of nickel or copper by electroplating can be done in two steps. Thus, in a first step, a first layer thickness, for example in the range of 0.1 to 0.8 mm, preferably 0.5 mm of nickel or copper on the gold layer, which is applied to the impression body, are deposited. Then it is possible to position structural elements or cooling elements which are to be introduced into the basic body.

In a second step, a second layer of metal, for example nickel or copper, is electrodeposited. The cooling lines or bearing elements are thus firmly and materially introduced into the electrodeposited body. As a result, in particular a low heat transfer resistance is ensured. The galvanized

The main body can be separated from the impression body by a temperature shock. In a further step can then on the separated body a multilayer system for the reflective normal-incidence element, for example consisting of Mo / Si are applied.

Alternatively, it would also be possible already to the Abformkörper a Ru layer and then a multilayer system, such as a Mo / Si

Apply multilayer system. The uppermost Mo layer would then form the electrode for the electrodeposition. For this purpose, it is possible that the uppermost Mo layer is formed correspondingly thick. Alternatively or additionally, an electrode layer, for example in the form of a metal layer, e.g. a gold Au layer or a nickel Ni layer can be applied to the multilayer system.

When breaking off, the complete normal-incidence element, including the multiple layer system deposited on it, can then be separated from the impression body.

The normal-incidence elements produced by means of molding techniques according to the invention are characterized in particular by a base body consisting of a metal such as nickel or copper, and a separating layer arranged between the multiple-layer system and the base body, for example consisting of Au and one Cover layer arranged above the multilayer system, for example a Ru layer. Furthermore, mechanical components such as joint adapters or even cooling elements such as cooling tubes can be introduced very easily into the molded metal body.

The solution according to the invention is explained below with reference to figures. The following is shown in detail:

FIG. 1 shows, in a highly schematically simplified representation, a first embodiment of a grazing-incidence element according to the invention, in this case a collector shell; FIGS. 2a-b illustrate two further geometric embodiments of collector shells;

FIG. 3 illustrates a second embodiment of a collector shell;

Fig. 4a - b illustrate schematically simplified the structure of a

Aufdampfeinrichtung and a molding layer system for the production of collector shells according to a first embodiment;

FIGS. 4c -4d illustrate the impression on the basis of signal flow images;

FIG. 5 shows, on the basis of a diagram, the influence of the detachment time for the Au layer on the roughness;

Fig. 6a-b illustrate a molding layer system for collector shells according to a second embodiment before and after the separation in

Impression body and shell;

Figure 7 illustrates the Aufdampfeinrichtung for the impression of

Collector cups according to the second embodiment;

Figures 8a-b illustrate a magnetron sputtering apparatus for making the coatings of the first and second embodiments;

Figure 9 illustrates a system for sputtering the reflection layer on the

Inside of the already molded collector shell;

FIG. 10 shows, on the basis of a section of an illumination system, a collector with collector shells designed according to the invention: FIGS. 11a-c illustrate by way of example exemplary possible values for roughness and reflections based on diagrams;

Fig. 12a - g first possibility of the production of normal-incidence elements by means of a molding process;

FIG. 13 a - h second possibility of producing normal-incidence elements with the aid of a molding method: FIG.

Fig. 14a-h third way of producing normal-incidence elements by means of a molding process.

FIG. 1 illustrates, in a schematically simplified representation, the basic structure of a first embodiment of a grazing-incidence element, for example a collector shell 1, produced, for example, by means of molding techniques on the basis of a section in the z-x plane. This is designed as a rotationally symmetric element. The z-axis is defined by the optical axis OA, which corresponds to the rotational symmetry axis RA. The collector shell is produced as a rotation shell by rotation of the curve K, which is planar in section in the z-x plane, about the rotational symmetry axis RA. The z-x plane containing the rotational symmetry axis RA is also referred to as the meridional plane.

For explanation, the following reference symbols are defined in the coordinate system zx with respect to the optical axis OA: a starting point e endpoint z (a) z-coordinate of the starting point of the collector shell z (e) z-coordinate of the end point of the collector shell x (a) x-coordinate of the Start point x (e) x-coordinate of the end point The starting point a defines in the coordinate system the first end region 2 of the collector shell 1, also referred to as the object-side or input-side end region, and the end point b the second end region 3, which is also referred to as the image-side or output-side end region of the individual collector shell 1 with respect to an arrangement in an illumination system That is, the starting point is the point that is closest to the light source when the collector is used in an illumination system in the light path, and the end point is the point farthest from the light source.

The distance between the optical axis OA and the starting point a in the zx coordinate system defines the radius ra of the first end region and the distance between the optical axis OA and the end point e the radius re of the second end region 3. The distance between the first and second end regions in z-direction determines the length I of the collector shell 1. The inventively embodied collector shell 1 has a length I, which describes the distance between the starting point a and the end point e along the optical axis OA, which is preferably greater than 120 mm, preferably in one Range between 80mm and 300mm, in particular in the range between 150 mm and 200 mm. The maximum

Diameter, i. the diameter d (2-re) at the end point e of the collector shell 1 at the second end region 3 is <750 mm, in particular <200 mm, particularly preferably <150 mm, in particular <100 mm. Preferably, the diameter d is in the range of 80 mm to 200 mm. re denotes the radius at the end of the shell, d. H. the distance of the end point on the shell surface from the rotation axis.

The collector shell 1 comprises a base body 4 which is designed to be rotationally symmetrical with respect to the axis OA and which may also be referred to as a rotation shell, which has an optical surface 6 on the inner circumference 5. In this case, it is the surface of the collector shell 1, which receives a bundle of rays incident from a light source and reflects in the direction of the image. For this purpose, the base body 4 on the inner circumference 6 a layer system 7, comprising at least one optically active layer in the form of a reflection layer 8. The reflection layer 8 is preferably made of ruthenium.

The collector shell 1 consists at least of the reflection layer 8 as a functional layer and at least one further layer, which is also referred to as a top or bottom layer and forms the base body 4. If the base body is produced by molding techniques, the base body comprises a metal layer, for example a Ni or Cu layer, to which a thin layer has been applied. The layer system 7 is thus characterized in this case only by a thin layer. The layer thickness D8 of the reflection layer 8 is preferably up to 150 nm, preferably between 10 and 120 nm, more preferably between 15 and 100 nm, very particularly preferably between 20 and 80 nm, for example 50 nm. According to the first embodiment, the reflection layer 8 is applied directly as a layer on the inner periphery of the base body 4.

The main body 4 is characterized by a layer thickness D4 which is 0.2 mm to 5 mm, preferably between 0.8 mm and 2 mm.

The collector shell 1 is designed in the illustrated case as Ellipsoidsegment. Other embodiments are shown by way of example in FIGS. 2a and 2b.

According to FIG. 2a, a collector shell 1 is designed as a paraboloid segment with respect to the optical axis OA and thus the rotational symmetry axis RA. The basic structure otherwise corresponds to that described in Figure 1, which is why the same reference numerals are used for the same elements.

In contrast, Figure 2b illustrates an embodiment of the collector shell 1 in the form of a combination of a hyperboloid and an ellipsoid. The geometry of the collector shell 1 is defined by a first annular segment 9 with a first optical surface 10 and a second annular segment 11 with a second optical surface 12 described. The total area of 10 and 12 corresponds to the optical surface 6.

The collector shell 1 is in each case an inner marginal ray 13, which is defined by the end point in the meridional plane of the first optical surface 10 of the first segment 9 of the collector shell 1, and an outer marginal ray 14, which passes through the starting point of the first optical surface 10 of the first segment 9 of the collector shell 1 is defined assigned. The inner and outer marginal ray determine the bundle of rays picked up and passed on by the shell.

Meridional plane is understood to mean the plane containing the optical axis or axis of rotation RA.

Figure 3 illustrates in a schematic simplified representation as in Figure 1, a further second inventive embodiment of a collector shell 1 with ruthenium as a reflection layer 8 with the dimensions according to the invention in terms of diameter and length I. Since it is a rotationally symmetrical body with respect to the z-axis, this was in the

Axial section shown on one side only. In this embodiment, the optical surface 6 is formed on the inner circumference 5 of the base body 4 by a layer system 7 in the form of a multilayer system. This consists of two ruthenium layers, a first ruthenium layer 16 and a second ruthenium layer 17, which are connected to one another via a first adhesive layer 18 and a second adhesive layer 19 to the base body 4. The first ruthenium layer 16 is thereby with a smaller layer thickness D16 than the second Ruthenium layer 17 executed. The layer thickness D16 is 5 nm to 20 nm, preferably 8 nm to 12 nm. The second layer thickness D17 is 20 nm to 80 nm, preferably between 30 nm and 60 nm. The thickness of the individual

Adhesive layers 18 and 19 are each 1 nm to 5 nm, preferably 1 nm to 3 nm.

In order to achieve an optimal layer growth of the base layer, which forms the base body, is between the base layer and the optical Layer system an intermediate layer 20, preferably made of the material of the base layer, here nickel provided.

With regard to the possible embodiments with regard to the geometry and shaping of the optical surface 6, the possibilities described in FIGS. 2a and 2b for the first embodiment also exist.

The production of the collector shells 1 according to the first or also second embodiment is preferably carried out by molding via a separating layer system 15. The molding method is described in detail in FIGS. 4a-4b for a grazing-incidence

Element described. The impression takes place on the outer circumference 22 of the impression body 21, wherein the impression body 21 is either a direct component of the separation layer system 15 or is coated with the release layer system, and wherein the reflective layer 8 for the grazing-incidence element is applied to the release layer system 15. Abformkörper 21, separating layer system 15 and layer system 7 of the collector shell 1 form the so-called impression layer system 23 before the impression. The impression body is also referred to as a mandrel. The Abformkörper itself can for example consist of quartz glass, Ni-P or galvanized aluminum.

The separation takes place according to the invention at the interface of two materials, of which a material is preferably formed of SiÜ ₂ and either directly from the Abformkörper 21 or a molded on the Abformkörper 21, not shown here layer system can be formed, wherein the layer system 24 offset in time for the actual impression can be applied to the Abformkörper 21 and remains on this after separation or else in a time sequence with the other components of the release layer system 15 or the layer system 7 for the collector shell 1 is applied. The separation is essentially due to a thermal shock, which leads to partially reduced voltages, which in turn cause the adhesion between the impression body and the separation layer system to be overcome.

For the preparation of the first embodiment of the collector shell 1 of base body 4 and directly on this arranged reflective layer 8 according to Figure 1, the separation takes place indirectly after impression taking, ie not directly between the reflective layer 8 and the layer system 7 and the Abformkörper 21 but via a release layer system 15, comprising, in addition to the SiO ₂ layer, an Au layer, wherein the separation between the SiO ₂ layer and the Au layer takes place and the Au layer can later be detached.

The separating layer system 15 consists of at least two layers - an SiO ₂ and an Au layer, on which the reflection layer 8 in the form of the ruthenium layer is then deposited. The Abformkörper 21 consists of a possible embodiment, for example, Ni-P. Then in a first

Process step according to Figure 4c on the outer periphery 22 of the Abformkörpers 21 SiO ₂ evaporated. This layer can be preserved for multiple impressions.

FIG. 4 a shows, in a schematically simplified representation, the basic structure of the arrangement for the impression of the individual layers. This includes the

Abformkörper 21 and associated with this evaporation device 26. A storage of such a coated Abformkörpers 21 in air or under ambient conditions can lead to a change in adhesive forces and thus influence the overall molding process. In a further second method step, an Au layer is deposited on the SiO ₂ layer, for example vapor-deposited, and then the ruthenium layer acting as reflection layer 8 according to the invention. Subsequently, the impression body 21 with the already applied layers of the release layer system 15 and the later layer system 7 and the layer for the main body 4 of the collector shell 1 is deposited or nickel-plated by electroforming, preferably by an electrochemical process, preferably a galvanic process directly on the ruthenium layer. The In accordance with Figure 4b, the impression layer system 23 prior to the separation therefore consists of "Abformkörper 21 Ni-P // SiO 2 / Au / Ru / electroplated Ni." This is followed by separation into Abformkörper 21 and a shell 25 for a grazing-incidence collector. In the case of the Au / SiO ₂ system, the separation takes place between SiO ₂ and Au. The impression thus takes place indirectly via an intermediate layer in the form of Au. The Au layer is then removed from the reflection layer in the subsequent method step The stripping process for the Au layer is dependent on the solvent used and the process parameters for detachment, ie time duration or contact time and temperature, which are for ruthenium-coated collector shells 1 in of the size mentioned, for example, 4 to 10 minutes at room temperature In addition to the removal of the Au residues, the micro roughness on the surface 6.

FIG. 5 illustrates the dependence of the microroughness on the process parameters of temperature and immersion time on the surface using the example of a diagram. It can be seen that significant deviations can occur here. Additional spectral reflectance measurements between a wavelength of 200nm and 1000nm clearly differentiate between the presence of an Au and a Ru surface.

FIG. 4d illustrates, with reference to a flowchart, the impression when the impression body 21 made of quartz is formed. In this case, can be dispensed with the SiO ₂ coating, in which case the surface of the Abformkörpers must be polished with a sufficiently low micro-roughness.

With the reproduced in Figures 4c and 4d process steps molding processes with reflective layer thicknesses D8 readily up to 1020 nm ruthenium can be performed. The devoted ones

Film stress values are still low enough to permit molding without layer cracking and delamination. Opposite impression mechanically more stable layers are obtained by ion-assisted coating processes.

For the separating layer system 15, the following layer thickness sizes are selected for the individual layers:

- SiO ₂ in the range of 50 to 200 nm, preferably 100 nm

Au in the range between 100 to 300 nm, preferably 200 nm.

Ruthenium in the range between 10 and 150 nm, preferably 10 nm to 120 nm.

The adhesive forces between the individual layers, in particular between SiO 2 and Au, can be varied within limits by storage or aging of the molded article 21, by a plasma surface treatment in the vapor deposition system and by vapor deposition without prior venting.

FIG. 6a illustrates the impression body coating with the separation layer system 15 and the layer system 7 of the collector shell 1. According to the invention, here an impression layer system 23 is made up of layers mentioned below formed: Abformkörper Ni-P // SiO ₂ / Ru / Cr / Ru / Cr / Ni / galvanic Ni.

FIG. 6b illustrates the layer structure after the separation.

To achieve moderate adhesive forces suitable for the impression, a layer of SiO _{2 is} applied to the impression body comprising Ni-P. After SiO ₂ vapor deposition, an interruption takes place in which the surface 22 of the impression body 21 is exposed to a treatment for a certain period of time. As a result, the layer system is conditioned and a reduction or optimization of the adhesive forces between the SiO ₂ and Ru layer is carried out. Subsequently, the other layers are as before mentioned evaporated. First, a first Ru layer 16 is vapor-deposited without ion support in order to avoid excessive forces. A bombardment with Ar ions from the ion source would change the conditioning of the SiO ₂ layer again and greatly increase the adhesive forces. The better connection to the second Ru layer 17 is achieved by a Cr seed layer. To prepare for the subsequent Ni electroplating, a Ni layer with a Cr seed layer is finally vapor-deposited. Subsequently, the coated Abformkörper is removed from the vapor deposition and subjected to an electroforming process by an electrochemical process. Thereafter, the separation takes place in the Abformkörper and collector shell. 1

FIG. 7 illustrates a simplified schematized representation of the structure of the vapor deposition device 26. Evident is an evaporation device in the form of a so-called electron beam evaporator 27 and the ion source 28.

In the process illustrated in FIGS. 4 to 7, the individual layers are applied by vapor deposition. This is done by known PVD methods, such as thermal evaporation, evaporation with electron beam evaporators or sputtering, in particular magnetron sputtering. The arrangement for sputtering is shown schematically in simplified form in FIG. The rotatably mounted and drivable impression body 21 is assigned a sputtering device 29. This comprises at least one source 30 according to FIG. 8b, preferably several sources 30.1 to 30.5 according to FIG. 8a. These are installed parallel to the surface 22 in order to ensure the most homogeneous layer thickness distribution possible in the vapor deposition.

The embodiment according to FIG. 8b shows the use of a source 30 which has a correspondingly shaped effective region 31 which covers the impression body 21 in the axial direction over part of its extension. In contrast, Figure 9 illustrates an arrangement for the production of the collector shells 1 according to an alternative method, which is characterized by the molding of the base body 4 and the time offset and taking place independently coating with the layer system according to the first and second embodiments. The coating is carried out by sputtering the reflection layer on the inner surface 5 of the base body 4 of the collector shell 1 by means of a sputtering device 29. In this case, preferably, the sputtering device is designed such that the entire inner surface is sputtered simultaneously in one step.

FIG. 10 illustrates a section of an illumination system 32. This comprises a light source 33, the light of which is picked up by a collector 34. The schematically illustrated collector 34 comprises in the illustrated embodiment a total of three mutually arranged mirror shells 1.1, 1.2 and 1.3, which receive the light from the light source 33 under grazing incidence and image in an image of the light source. The mirror shells 1.1, 1.2, 1.3 of the collector can be produced by the molding method according to the invention.

The inventive coated collector shell 1 is also characterized by the roughness. FIG. 11a illustrates the calculated reflection 900 for Ru for a roughness of 1.4 nm and the measured reflection (so-called band reflectivity (%)) for Ru deposited on an SiO ₂ substrate with a Ni intermediate layer as a function of the angle of incidence (grazing incidence angle ) to the surface tangent at a wavelength of 13nm.

FIG. 11b illustrates the calculated reflection for Ru for a roughness of 1.4 nm and measured reflection for Ru deposited on an SiO ₂ substrate with a Cr adhesion layer as a function of the angle of incidence with respect to the surface tangent at a wavelength of 13 nm. From the angles of incidence indicated in FIGS. 11a and 11b, the following are obtained from the normal angles of incidence as follows:

Angle of incidence with respect to the normal = 90 ° - angle of incidence with respect to the surface tangent

As can be seen in FIGS. 11a and 11b, the angle of incidence of the angle of incidence of 10 ° -15 ° with respect to the surface tangent results in a reflection between 60% and 75% for the substrate // Ni / Ru layer system and 75% and 80% for the substrate substrate layer system // Cr / Ru. For the layer system (SiO ₂ -

Substrate // Cr / Ru) in Figure 11b, a roughness of approximately 0.6-0.8 nm RMS is measured at the AFM, which agrees well with the calculated roughness of 1.4 nm. However, the roughness of the substrate still has to be considered. The molded cups have AFM roughness in the range of 1-2nm RMS. Figure 11c illustrates the calculated reflection as a function of roughness at an angle of incidence tangential to the surface, i. opposite the surface tangent of 10 ° (reference 910) and 15 ° (reference 920).

It can be clearly seen that the reflectivity or reflection decreases in% the greater the roughness of the surface is. For example, with a roughness of 5 nm and an incident angle of 15 ° tangential to the surface, the reflectivity is only 60%.

Furthermore, it can be seen in FIG. 11c that as the angle of incidence increases, so too does the reflectivity.

FIGS. 12 a to g, 13 a to h and 14 a to h show three methods for producing normal-incidence elements, in particular reflective normal-incidence mirrors or facets for a faceted optical element, with the aid of impression techniques. In the method according to FIGS. 12a to g and FIGS. 13a to h, a principle is referred to Abformkörper 1000, which may be formed as Siθ ₂ -Abformkörper, a metal layer, for example applied an Au layer.

The Abformkörper 1000 may consist of quartz glass (SiO ₂ ) or kanigienisiertem aluminum. The surface roughness of the impression body is adjusted or reduced to values, for example, with the aid of superpolishing, which correspond to those which a multilayer-system coated normal-incidence mirror in the EUV wavelength range requires in order to achieve a high reflectivity, for example in the range of 70% of the to provide incident radiation. The superpolishing of the impression body is preferably carried out such that 0.1-1 nm of HSFR is achieved at spatial frequencies between 10 nm and a few micrometers.

As shown in FIGS. 12b and 13b, the impression body 1000 is then coated with a release layer 1010, for example an Au layer, which may preferably be in the range of 50-200 nm. In step 12c or 13c, a metal layer 1020, for example a Ni layer, is galvanically deposited on the gold layer. The Au layer serves as a cathode.

Preferably, as shown in Figures 12c to e and 13c to e, the deposition of the metal by electroplating in at least two steps. This makes it possible on the path of the electrodeposition to provide a base body 1030 for a normal-incidence mirror, in the mechanical components such as joint adapter 1040 or else

Cooling components 1050 as coolant tubes are introduced. For this purpose, a first layer 1020.1 is first applied to the Au layer 1010, as shown in step 12c or 13c. Then, the coolant elements 1050, for example the cooling tubes or the joint elements 1040, are placed on the electrodeposited Ni layer 1020.1. This is shown in FIGS. 12d and 13d. After the mechanical components and the coolant components have been placed on the first layer, a metal, for example Ni, is further galvanized. The first layer 1020.1 has a layer thickness of 0.2 to 0.8 mm, preferably 0.5 mm, and the second layer 1020.2, which is deposited according to FIGS. 12e and 13e, has a Thickness from 1 to 4 mm. As can be seen from FIGS. 12e and 13e, the cooling element or the mechanical element is in the

Metal layer of the body, here in the Ni layer, embedded and indeed solid and material fit, whereby a particularly low heat transfer resistance can be ensured.

Instead of Ni, Cu can also be used for electrodeposition. Of course, the method may also include more than two steps.

As shown in Figs. 12f and 13f, the system consisting of the base body 1030 made of a metallic material, namely galvanized nickel, together with the separation layer 1010, which in the present case is Au, is separated from the mold body 1000 by thermal separation. The thermal separation is based on a temperature shock or a temperature jump towards lower temperatures. Due to the different coefficients of thermal expansion of the metal applied to the impression body 1000, a separation of metal and impression body occurs as soon as the thermally induced stresses exceed the adhesion stresses between the metal and the mandrel. In particular, gold Au is a very good separation system, since the gold Au remains on the separated metal layer, for example the Ni or Cu layer. Furthermore, the roughness of the Abformkörpers 1000 is also transferred to the molded base 1030 by the impression technique. In that regard, it is of crucial importance that already have the surface of the Abformkörpers the property of the later normal-incidence mirror. Instead of Au, Ruthenium Ru could also act as a separation layer system.

After the base body 1030 of a normal-incidence optical element of FIG. 12 provided with cooling element and joint adapters Abformkörper was removed by thermal separation, for example, using a laser 1100 of the metal body into individual body 1030.1, 1030.2 are separated.

The individual basic bodies can then be the basis for the coating of different normal-incidence elements, for example individual facets for a faceted optical element.

In contrast to FIG. 12g, a separation of the metal base body in the method according to FIG. 13g does not take place before the coating with a

Multilayer system, but only afterwards. The difference between the method in FIGS. 12a to g is therefore that in the method according to FIGS. 12a to g, after separation of the metal body from the impression body, it is separated into individual bodies and the individual bodies are then combined with a Mo / Si multilayer system, as is normal. incidence optical elements is common and guarantees high reflectivities, is deposited. The Mo / Si multilayer system 1110 is then provided with a Ru cover layer 1120 to avoid degradations, in particular of the multilayer system during operation, for example in an EUV projection exposure system. Mo / Si multilayer systems find in normal-incidence optical elements, preferably in systems, for example, microlithography projection exposure machines operating at a useful wavelength of about 13 nm. For systems with a useful wavelength of about 11 nm, Mo / Be systems are preferably used.

The reflectivity of an optical element coated with an exemplary Mo / Si multilayer system is approximately 70% at a useful wavelength of approximately 13 nm. In this regard, reference is made, for example, to US Pat. No. 6,600,552, the disclosure of which is incorporated in the present application. In the method according to FIGS. 13g to h, after separating the metal body in FIG. 13f from the impression body, the metal body is coated in a multilayer system 1110. After coating, the separation is then carried out in different components. The advantage of the method according to FIG. 13g is that the coating is in a single

Coating space can be made. The same components as in FIGS. 12a-f are indicated by the same reference numerals in FIGS. 13a-f.

FIGS. 14a to h show an alternative method with which a normal-incidence mirror can be produced as minimally as possible by means of molding techniques. The same components as in FIGS. 12a-f and 13a-f are marked with reference numerals increased by 1000. As described in the method according to FIGS. 12a to g and 13a to h, a separating layer 2000, in this case an Ru layer, is applied by means of vapor deposition technology to a shaped body 2000, as shown in FIG. 14b. On the Ru metal layer, which is used as a release layer 2010, then the complete multilayer system 2110 consisting of Mo / Si multilayers or Mo / Be multiple layers is deposited.

On a conductive layer, such as a molybdenum layer of the Mo / Si multi-layer system or Mo / Be multilayer system 2110, which acts as a cathode, then a metal, for example Ni, is applied by means of a galvanic deposition method. Instead of or in addition to the molybdenum layer, a metal layer deposited on the multilayer system, for example an Au layer or an Ni layer, can also act as a cathode. Steps 14d to 14f correspond to steps 12d to 12f and 13d to 13f, respectively.

After the base body 2030 of galvanized nickel grown on the multiple system 2110, wherein the cooling channels 2050 and any joints 2040 were introduced into the metal layer, is using a thermal separation as previously described, the complete normal-incidence optical element with multilayer system 2110 and Ru cover layer is separated from the impression body 2000. In a further step, then the normal-incidence element, for. For example, a facet of a faceted optical element can be separated into different individual elements, for example with a laser.

With the impression technique according to the invention, a normal-incidence-optical element, for example a mirror is specified, in which the base body is formed from a metal. This has the advantage that the electrostatic charge can be reduced, for example, in a vacuum chamber of a microlithography system, since electrons can be dissipated via the metallic base bodies.

Furthermore, in a preferred embodiment, the optical element according to the invention is characterized in that cooling lines can be introduced in a simple manner into the main body, which serves as a carrier for the reflective layers of the mirror system. In particular, these cooling lines are integrally incorporated in the base body and not, as in the case of the grazing-incidence element as described in WO 02/065482, additionally applied. In the system according to WO 02/065482 separate cooling plates, which may be traversed by cooling lines, connected to the mirror shell of a collector.

In contrast, in the case of the optical element according to the invention, in particular the normal-incidence optical elements, the cooling line is introduced directly into the main body and forms an integral part of it.

The invention thus provides a method with which it is possible to produce optical elements for microlithography applications by means of molding techniques. Furthermore, optical

Elements for microlithography indicated with metal base bodies both normal-incidence elements and grazing-incidence elements. It is possible to use normal-incidence optical elements produced by the method according to the invention, for example normal-incidence facets in facetted optical elements of an illumination system for a microlithography projection exposure apparatus. In this regard, reference is made, for example, to US Pat. No. 6,198,793 B1, US Pat. No. 6,658,084 or WO02005 / 015314 A2, the disclosure content of which is incorporated in full in this application.

Thus, FIG. 6a in US Pat. No. 6,658,084 shows a faceted optical element, a so-called field facet mirror or a field raster element plate with a multiplicity of individual field facets or field raster elements. The individual field facets or field raster elements of the field facet mirror shown in US Pat. No. 6,658,084 can be produced as normal-incidence optical elements according to the method described in this application. In particular, with the method according to the invention, each individual field facet or each individual field raster element of the field raster element plate can be provided with cooling channels or mechanical elements such as joints, for example actuators. Of course, the individual pupil facets or pupil raster elements of the pupil grid plate shown in FIGS. 6b1 to 6b2 in US Pat. No. 6,658,084 could also be produced as normal-incidence optical elements in accordance with the method according to the invention and thus provided with cooling channels or mechanical elements.

Furthermore, it is possible all optical elements in the light path of a

Microlithography projection exposure apparatus, as shown for example in Figure 10 of US 6,658,084 or Figure 12 of WO2005 / 015314, produce according to the inventive method. In particular, it is also possible to produce the normal-incidence collector mirror shown in FIG. 10 of US Pat. No. 6,658,084 or the grained incidence collector shown in FIG. 12 of WO2005 / 015314 consisting of a plurality of collector shells with a molding method according to the invention. LIST OF REFERENCE NUMBERS

1 collector shell

2 first end area

3 second end region

4 main body

5 inner circumference

6 optical surface

7 shift system

8 reflection layer

9 first annular segment

10 first optical surface

11 second annular segment

12 second optical surface

13 inner edge ray

14 outer edge beam

15 separating layer system

16 first ruthenium layer

17 second ruthenium layer

18 adhesive layer

19 adhesive layer

20 intermediate layer

21 Abformkörper, Mandrel

22 outer circumference

23 impression layer system

25 bowl

26 evaporating device

27 electron beam evaporator

28 ion source

29 sputtering device

30 source 32 lighting system

33 light source

34 collector

900 calculated reflection 910 calculated reflection as a function of the roughness at a

Angle of incidence tangential to the surface of 10 °

920 calculated reflection as a function of the roughness at a

Angle of incidence tangential to the surface of 15 °

1000.2000 Abformkörper 1010,2010 separating layer, in particular Au layer or Ru layer

1020 metal layer, in particular Ni layer

1020.1 first metal layer

1020.2 second metal layer 1030,2030 basic body 1030.1 individual basic body

1030.2 single body

1040,2040 joint elements

1050,2050 cooling devices

1100 laser 1110.2110 Mo / Si multilayer system

1120 topcoat, especially Ru topcoat

K plane curve of the rotation shell re radial distance of the end point on the rotation shell of the rotation axis, d. H. Radius of the shell at the shell end

Claims

claims

1. A method for producing an optical element or part of an optical element having a base body comprising the following steps:

Providing an impression body (21, 1000, 2000) having a surface corresponding to the geometry of the optical element; Depositing a layer system (7) comprising at least one separation layer system (15, 1010, 2010) on the surface of the

Abformkörper (21, 1000, 2000); Electroforming a base body (4, 1030, 2030) on the layer system

(7);

Detachment of at least the base body on the separating layer system (15, 1010, 2010) from the impression body (21, 1000, 2000).

2. The method according to claim 1, characterized in that the layer system furthermore comprises at least one reflection layer (8) and the at least one reflection layer is deposited on the separation layer system (15, 1010) and the electroforming of the base body takes place on the at least one reflection layer.

3. The method according to claim 2, characterized in that the at least one reflection layer is part of a multilayer system (2110).

4. The method according to claim 3, characterized in that the multilayer system (2110) is a sequence of Mo / Si layers or Mo / Be layers.

5. The method according to claim 3 or 4, characterized in that the separating layer system comprises Au or Ru.

6. The method according to claim 2, characterized in that the at least one reflection layer comprises Ru.

7. The method according to claim 6, characterized in that the separating layer system (15) is designed as a multilayer system and comprises a deposited on the Abformkörper Siθ ₂ layer and on the SiO ₂ deposited Au layer.

8. The method according to claim 7, characterized in that the detachment from the Abformkörper (21) between Siθ ₂ and Au in the separation system (15).

9. The method according to claim 1, characterized in that the base body as part of the optical element on

Separating layer system (15) is separated from the impression body.

10. The method according to claim 9, characterized in that after detachment of the base body as part of the optical element on the base body or the base body with a separation layer system at least in a further process step, a reflective layer is deposited.

11. The method according to claim 10, characterized in that the at least one reflection layer is part of a

Multi-layer system (1110).

12. The method according to claim 11, characterized in that the multilayer system (1110) is a sequence of Mo / Si layers or Mo / Be layers.

13. The method according to claim 11 or 12, characterized the separation layer system comprises Au or Ru.

14. The method according to claim 10, characterized in that the reflection layer system comprises Ru.

15. The method according to any one of claims 1 to 14, characterized in that the electroforming of the base body takes place in at least a first step and a second step, wherein after the first step on a first layer (1020.1, 2020.1) of the base body (1030 ) Cooling devices (1050, 2050) and / or articulation devices (1040,

2040) are arranged.

16. The method according to claim 14, characterized in that a second layer (1020.2, 2020.2) is deposited on the first layer of the base body, so that the cooling and / or

Joint devices are introduced into the body.

17. The method according to any one of claims 1 to 15, characterized in that the base body is a metal selected from the following metals:

Ni, Cu, Ni alloys.

18. The method according to any one of claims 1 to 17, characterized in that an impression body (21) is used which consists of quartz glass (SiO ₂ ) or kanigenisiertem aluminum.

19. The method according to any one of claims 1 to 17, characterized in that on the surface of the Abformkörpers (21) SiO _{2 is} deposited.

20. The method according to claim 19, characterized a surface treatment is carried out on the impression body (21) with the SiO ₂ layer after deposition thereon in a conditioning step over a predefined period of time.

21. The method according to any one of claims 18 to 20, characterized in that on the SiO ₂ layer or the quartz glass alternately layers of ruthenium (16, 17) and adhesive layers (18, 19) are deposited from Cr.

22. The method according to any one of claims 2 to 21, characterized in that the deposition of the reflective layer (8) is preferably carried out in a vacuum or in an electrochemical environment.

23. A method for producing a grazing-incidence optical element, in particular a collector shell for a grazing-incidence collector for use in EUV radiation, in particular with a closed surface, characterized by the following steps: providing an impression body (21), with a surface corresponding to the geometry of the grazing incidience optical element (1); - electroforming a base body (4) on the impression body (21); Detaching the main body (4) from the impression body (21); Depositing a layer system (7), comprising at least one reflection layer (8) on the surface of the base body (4).

24. The method according to claim 23, characterized in that a separating layer system is provided and at least one deposited on the Abformkörper SiO ₂ layer and a deposited on SiO ₂ Pd layer or Au layer comprises.

25. The method according to claim 23, characterized in that the detachment of the collector shell (1) takes place between the SiO ₂ and Pd or Au in the separating layer system (15) to form a shell (25) from the impression body (21).

26. The method according to claim 23, characterized in that the deposition of the layers of the layer system (7) by vapor deposition, in particular electron beam evaporation or sputtering takes place.

27. The method according to any one of claims 23 to 26, characterized in that the base body (4) of Ni or Ni alloy materials by electroforming, in particular an electrochemical process is formed.

28. The method according to any one of claims 23 to 27, characterized in that the electroforming of the base body takes place in at least a first step and a second step, wherein after the first step on a first layer cooling means and / or hinge devices are arranged and on the first Layer, a second layer is deposited.

29. A method for producing a normal-incidence-optical element, in particular a facet for a faceted optical element for the

For use in EUV radiation, characterized by the following steps: - Provision of an impression body (1000.2000) with a surface similar to that used

Geometry of the normal-incidence optical element corresponds;

Electroforming a base body (1030, 2030) on the impression body

(1000, 2000);

Detachment of the body from the impression body; - depositing a layer system comprising at least one

Reflection layer on the surface of the body.

30. The method according to claim 29, characterized in that a separating layer system is provided and the separating layer system is at least one deposited on the Abformkörper metal layer, in particular an Au layer and / or Ru layer.

31. The method according to any one of claims 29 to 30, characterized in that the deposition of the layers of the layer system by vapor deposition, in particular electron beam evaporation or sputtering takes place.

32. Method according to claim 29, characterized in that the at least one reflection layer is part of a multilayer system and the multilayer system (1010) is a sequence of Mo / Si layers or Mo / Be layers.

33. The method according to any one of claims 29 to 32, characterized in that the reflection layer comprises at least one Ru layer.

34. The method according to any one of claims 29 to 33, characterized in that the electroforming of the base body takes place in at least a first step and a second step, wherein after the first step on a first layer (1030.1) cooling means (1050) and / or hinge devices (1040) are arranged.

35. The method according to claim 34, characterized in that a second layer (1030.2) is deposited on the first layer of the base body, so that the cooling and / or hinge devices are introduced into the base body.

36. The method of claim 29 to 35, characterized in that the base body selected from the metal below

Metals: Ni, Cu, Ni alloys.

37. Normal-incidence optical element, in particular mirror for a faceted optical element, in particular for use in EUV radiation comprising a base body (1030, 2030) and at least one deposited on the base body reflection layer, characterized in that the base body of a Metal exists.

38. Normal-incidence optical element according to claim 37, characterized in that the at least one reflection layer is part of a multilayer system.

39. Normal-incidence-optical element according to claim 38, characterized in that the multilayer system (1010, 2010) comprises Mo / Si layers or Mo / Be layers.

40. Normal-incidence-optical element according to one of claims 37 to 39, characterized in that the at least one reflection layer comprises a Ru layer.

41. Normal-incidence optical element according to one of claims 37 to 40, characterized in that the metal of the base body selected from among the following

Metals is: Cu, Ni, Ni alloy composition.

42. Normal-incidence-optical element, characterized in that the base body (1030, 2030) introduced into the body

Cooling devices (1050, 2050) and / or hinge devices 1040, 2040).

43. Normal-incidence optical element according to one of claims 37 to 42, characterized in that the base body (1030, 2030) is composed of at least two layers, a first layer (1020.1) and a second layer

(1020.2).

44. Normal-incidence optical element according to claim 43, characterized in that the cooling device (1050) and / or the hinge device (1040) between the first and second layer are embedded.

45. collector shell (1), in particular for a grazing-incidence collector, in particular for use in EUV radiation, with a ring-shaped closed mirror surface, characterized in that the annularly closed mirror surface has a reflection layer (8), wherein the reflection layer comprises at least ruthenium ,

46. Collector shell, in particular for a grazing-incidence collector, in particular for use in EUV radiation with a mirror surface, wherein the mirror surface with respect to a straight line has a start and an end point and a length (I) in the direction of the straight line , wherein the length (I) from the beginning to the end point along the straight line is greater than or equal to 120 mm.

47. Collector shell according to claim 46, characterized in that the mirror surface has a vertical distance (d / 2) at the end point to the straight line and the distance (d / 2) is less than or equal to 375 mm.

48. Collector dish according to claim 47, characterized that the vertical distance (d / 2) is less than or equal to 100 mm.

49. The collector shell according to claim 47, characterized in that the vertical distance (d / 2) is less than or equal to 40 mm.

50. Collector shell (1) according to claim 45, characterized in that the annularly closed mirror surface is a surface of revolution about an axis of rotation (RA) with a start and an end point and the collector shell has a length (I) in the direction of the axis of rotation, wherein the Length (I) from the beginning to the end point is greater than or equal to 120 mm.

51. Collector shell (1) according to claim 50, characterized in that the surface of revolution has a diameter (d) at the end point and the diameter (d) is less than or equal to 750 mm.

52. Collector shell (1) according to claim 51, characterized in that the diameter (d) is less than or equal to 200 mm.

53. Collector shell (1) according to one of claims 50 to 53, characterized in that the diameter (d) is greater than or equal to 80 mm.

54. Collector shell (1) according to one of claims 45 to 53, characterized in that the collector shell (1) has a base body (4) and a layer system

(7) on the base body (4), comprising at least the one

Mirror surface (6) forming reflective layer (8).

55. Collector shell (1) according to claim 54, characterized in that the base body (4) consists of galvanized nickel.

56. Collector dish (1) according to one of claims 45 to 55, characterized in that the layer thickness (D8) of the reflection layer (8) of ruthenium in the range between 10 nm to 150 nm, preferably 10 nm to 120 nm, particularly preferably 15 nm to 100 nm, very particularly preferably between 20 and 80 nm.

57. Collector shell (1) according to one of claims 54 to 56, characterized in that the layer system (7) comprises at least one between the reflective layer (8) and the base body (4) arranged metallic intermediate layer (20).

58. Collector shell (1) according to claim 57, characterized in that the intermediate layer (20) is formed by nickel.

59. Collector shell (1) according to claim 58, characterized in that the layer thickness of nickel is less than or equal to 30 nm.

60. Collector shell (1) according to one of claims 50 to 59, characterized in that the layer system (7) is designed as a multilayer system, comprising in each case the components ruthenium and chromium, which are arranged alternately in layers.

61. Collector shell (1) according to claim 60, characterized by the following features: with a first, the mirror surface (6) forming ruthenium layer (16) and a second ruthenium layer (17); with a first adhesive layer (18) between first and second ruthenium layers (17); with a second adhesive layer (19) between the second ruthenium layer (17) and base body (4) or intermediate layer (20).

62. Collector shell (1) according to claim 60, characterized in that the adhesive layers (18, 19) have a layer thickness in the range between 1 and 5 nm inclusive, preferably 1 to 3 nm.

63. Collector shell (1) according to any one of claims 61 or 62, characterized in that the layer thickness (D16) of the first ruthenium layer (16) in the range between 5 to 20 nm, preferably 8 to 12 nm.

64. Collector dish (1) according to one of claims 61 to 62, characterized in that the second ruthenium layer (17) is characterized by a layer thickness (D17) which is between 20 to 80 nm, preferably between 30 and 60 nm.

65. Collector shell (1) according to one of claims 57 to 64, characterized in that between the two ruthenium layers (16, 17) formed adhesive layers (18, 19) are of chromium.

66. Collector shell (1) according to one of claims 45 to 65, characterized in that the optical surface (6) has a micro-roughness in the range of <2 nm RMS at a wavelength A = 13 nm.

67. Collector shell (1) according to one of claims 50 to 66, characterized in that the surface of revolution is an annular aspherical segment.

68. Collector shell (1) according to claim 67, characterized in that the annular aspheric segment is an annular segment of a paraboloid or an ellipsoid or a hyperboloid.

69. Collector shell (1) according to one of claims 50 to 66, characterized in that the rotation surface comprises a first annular segment (9) with a first optical surface (10) and a second segment (11) with a second optical surface (12). includes.

70. A collector comprising at least one collector shell according to one of claims 45 to 69.

71. Microlithography projection exposure apparatus, in particular for use wavelengths in the EUV range from 7 to 30 nm comprising at least one normal-incidence optical element according to one of claims 37 to 44.

72. Microlithography projection exposure apparatus, in particular for use wavelengths in the EUV range from 7 to 30 nm comprising at least one optical element produced by a method 1 to 36.