EP2002301A1 - Element optique reflechissant avec passage optique excentre - Google Patents

Element optique reflechissant avec passage optique excentre

Info

Publication number
EP2002301A1
EP2002301A1 EP07723892A EP07723892A EP2002301A1 EP 2002301 A1 EP2002301 A1 EP 2002301A1 EP 07723892 A EP07723892 A EP 07723892A EP 07723892 A EP07723892 A EP 07723892A EP 2002301 A1 EP2002301 A1 EP 2002301A1
Authority
EP
European Patent Office
Prior art keywords
optical element
optical
passageway
element body
reflecting area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP07723892A
Other languages
German (de)
English (en)
Inventor
Hans-Jürgen SCHERLE
Yim-Bun Patrick Kwan
Stefan Xalter
Johannes Lippert
Ulrich Weber
Bernhard Geuppert
Bernhard Gellrich
Jens Kugler
Franz Sorg
Willi Heintel
Harald Kirchner
Wolfgang Keller
Andreas Frommeyer
Fraser G. Morrison
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/395,719 external-priority patent/US7760327B2/en
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of EP2002301A1 publication Critical patent/EP2002301A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Definitions

  • the invention relates to optical elements and optical element units used in exposure processes, in particular to optical elements and optical element units used in microlithography systems. It further relates to methods of manufacturing and of supporting an optical element of such an optical element arrangement. It also relates to optical imaging methods for transferring an image of a pattern onto a substrate.
  • the invention may be used in the context of photolithography processes for fabricating microelectronic devices, in particular semiconductor devices, or in the context of fabricating devices, such as masks or reticles, used during such photolithography processes.
  • the optical systems used in the context of fabricating microelectronic devices such as semiconductor devices comprise a plurality of optical element units comprising optical elements, such as lenses, mirrors, gratings etc., in the light path of the optical system.
  • Those optical elements usually cooperate in an exposure process to illuminate a pattern formed on a mask, reticle or the like and to transfer an image of this pattern onto a substrate such as a wafer.
  • the optical elements are usually combined in one or more functionally distinct optical element groups that may be held within distinct optical element units.
  • optical element units are often built from a stack of optical element modules holding one or more rotationally symmetric optical elements.
  • These optical element modules usually comprise an external generally ring shaped support device supporting one or more optical element holders each, in turn, holding one or more optical elements.
  • EUV extreme UV
  • catadioptric systems as they are known for example from US 6,757,051 B1 (Takahashi et al.), the disclosure of which is included herein by reference, it is often necessary to provide optical elements with reflective areas or reflective surfaces used in the exposure process that deviate from rotational symmetry.
  • the mirror only has a design, in particular a size, that is sufficient to provide the reflective area of the mirror that is needed and used in the exposure process.
  • a minimum size design is also due to the fact that the exposure light has to pass on the outside of the mirror first to reach a second mirror reflecting the exposure light back onto the mirror surface.
  • the minimum size design is intended to avoid obstruction of the path of the exposure light towards the second mirror.
  • a problem that arises especially with the above optical elements having reflective areas or reflective surfaces deviating from rotational symmetry is to provide support to the optical element without introducing excessive stresses and, thus, deformations into the optical element which otherwise would deteriorate the imaging accuracy.
  • Such optical ele- ments having reflective areas or reflective surfaces deviating from rotational symmetry have a non-rotationally-symmetric optical element body that requires additional effort when being supported in order to avoid the introduction of deformations throughout the entire exposure process and over the lifetime of the system.
  • an optical element with an optical element body that is, in itself, rotationally symmetric with respect to an axis of rotational symmetry and to provide this optical element body with an optical passageway that allows light to pass the optical element body and is arranged eccentrically with respect to the axis of rotational symmetry of the optical element body.
  • a very compact arrangement with an optical element may be achieved that allows passage of the exposure light via the optical passageway but - eventually apart from the optical passageway - still has a substantially rotationally symmetric optical element body that allows simple stress and deformation minimized support.
  • rotational symmetry of the optical element body relates at least to the part of the optical element body including the area defining the reflective area optically used in an exposure process. At least this part defines the axis of rotational symmetry. Preferably, it also relates to the overall basic shape of the optical element body. However, it will be appreciated that in the region of auxiliary parts of the optical element body, such as connecting parts providing connection to a support structure, a deviation from the rotational symmetry may be provided. Here, preferably, an even distribu- tion of auxiliary parts is provided to reduce the disturbance of the rotational symmetry to the least possible extent. It will be appreciated that, in the sense of the invention, the term rotational symmetry (and related terms) is to be understood as including any geometry that may be transformed substantially into itself by a rotation of less than 360° about the first housing axis.
  • an optical element comprising an optical element body, a reflecting area and an optical passageway.
  • the optical element body defines an axis of rotational symmetry.
  • the reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process.
  • the optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.
  • an optical element unit comprising at least one optical element and a support structure supporting the at least one optical element.
  • the at least one optical element comprises an optical element body, a reflecting area and an optical passageway, the optical element body defining an axis of rotational symmetry, the reflecting area being disposed on the optical element body and adapted to be optically used in an exposure process, the optical passageway being arranged within the optical element body and allowing light to pass the optical element body and being arranged eccentrically with respect to the axis of rotational symmetry.
  • an optical imaging arrangement comprising a mask unit adapted to receive a pattern, a substrate unit adapted to receive a substrate and an optical projection unit adapted to transfer an image of the pattern onto the substrate.
  • the optical projection unit comprising at least one optical element and a support structure supporting the at least one optical element; the at least one optical element com- prising an optical element body, a reflecting area and an optical passageway, the optical element body defining an axis of rotational symmetry, the reflecting area being disposed on the optical element body and adapted to be optically used in an exposure process, the optical passageway being arranged within the optical element body and allowing light to pass the optical element body and being arranged eccentrically with respect to the axis of rotational symmetry.
  • a method of manufacturing an optical element comprising providing an optical element body, the optical element body defining an axis of rotational symmetry and forming a reflecting area of the optical element body, tho ⁇ try on ⁇ vn ⁇ ei an optical passageway, the optical passageway being arranged within the optical element body and allowing light to pass the optical element body, the optical passageway being formed eccentrically with respect to the axis of rotational symmetry.
  • a method of supporting an optical element comprising providing an optical element having an optical element body, a re- fleeting area, an optical passageway and at least one connecting member, the optical element body defining an axis of rotational symmetry, the reflecting area being adapted to be optically used in an exposure process, the optical passageway being arranged within the optical element body and allowing light to pass the optical element body, and the optical passageway being formed eccentrically with respect to the axis of rotational symmetry, and sup- porting the optical element via the at least one connecting member on a support structure.
  • an optical imaging method comprising providing a pattern, a substrate and an optical projection unit adapted to transfer an image of the pattern onto the substrate, the optical projection unit comprising at least one optical element, the at least one optical element having an optical element body, a reflecting area, an optical passageway and at least one connecting member, the optical element body defining an axis of rotational symmetry, the reflecting area being adapted to be optically used when transferring the image of the pattern onto the substrate, the optical passageway being arranged within the optical element body and allowing light to pass the optical element body, and the optical passageway being formed eccentrically with respect to the axis of rotational symmetry, and using the optical projection unit to transfer the image of the pattern onto the substrate.
  • an optical imaging method comprising providing a pattern, a substrate and an optical projection unit adapted to transfer an image of the pattern onto the substrate, and using a light beam to transfer the image of the pattern onto the substrate.
  • the using the light beam comprises directing the light beam onto an eccentric first reflecting area of a first optical element of the optical projection unit, the first reflecting area reflecting the light beam onto an eccentric second reflecting area of a second optical element of the optical projection unit.
  • an optical element unit comprising a first optical element, a second optical element and a support structure supporting the first optical element adjacent to the second optical element.
  • the first optical element comprises a first optica! element body, a first reflecting area and a first optica! passageway.
  • the second optical element comprises a second optical element body, a second reflecting area and a second optical passageway.
  • the first optical element body defines a first axis of rotational symmetry while the second optical element body defines a second axis of rotational symmetry.
  • the first reflecting area is disposed on the first optical element body and adapted to be optically used in an exposure process while the second reflecting area is dis- posed on the second optical element body and adapted to be optically used in the exposure process.
  • the first optical passageway is arranged within the first optical element body and allows light to pass the first optical element body while the second optical passageway is arranged within the second optical element body and allows light to pass the second optical element body.
  • the first optical passageway is arranged eccentrically with respect to the first axis of rotational symmetry while the second optical passageway is arranged eccentrically with respect to the second axis of rotational symmetry.
  • an optical element unit comprising a first optical element, a second optical element and a support structure.
  • the first optical element comprises a first reflecting area and an eccentric first optical passageway while the second optical element comprises a second reflecting area and an eccentric second optical passageway.
  • the support structure supports the first optical element adjacent to the second optical element such that the first reflecting area faces the second reflecting area with an intermediate space being formed between the first optical element and the second optical element.
  • the support structure supports the first optical element via first connectors and the second optical element via second connectors such that the first connectors and the second connectors define mutually penetrating first and second installation spaces.
  • the first optical passageway allows light to enter the intermediate space and the second optical passageway allows light to leave the intermediate space.
  • Figure 1 is a schematic representation of a preferred embodiment of an optical imaging arrangement according to the invention which comprises an optica! element unit with an optical element according to the invention and with which preferred em- bodiments of methods according to the invention may be executed;
  • Figure 2 is a schematic sectional representation of an optical element unit of the optical imaging arrangement of Figure 1 ;
  • Figure 3 is a schematic top view of a the optical element unit of Figure 2;
  • Figure 4 is a block diagram of a preferred embodiment of a method of manufacturing an optical element according to the invention for use in the optical imaging arrangement of Figure 1 ;
  • Figure 5 is a block diagram of a preferred embodiment of an optical imaging method according to the invention comprising a method of supporting an optical element which may be executed with the optical imaging arrangement of Figure 1.
  • Figure 1 is a schematic and not-to-scale representation of the optical imaging arrangement in the form of an optical exposure apparatus 101.
  • the optical exposure apparatus 101 com- prises an illumination unit 102 and an optical projection unit 103 adapted to transfer, in an exposure process, an image of a pattern formed on a mask 104.1 of a mask unit 104 onto a substrate 105.1 of a substrate unit 105.
  • the illumination unit 102 illuminates the mask 104.1.
  • the optical projection unit 103 receives the light coming from the mask 104.1 and projects the image of the pattern formed on the mask 104.1 onto the substrate 105.1 , e.g. a wafer or the like.
  • the optical projection unit 103 comprises a catadioptric optical element system including a plurality of refractive elements, such as lenses or the like, and a plurality of reflective ele- ments, such as mirrors or the like.
  • the optical element system is held by a stack of optical element units including an optical element unit 106 according to the invention with a first optical element 107 and a second optical element 108 according to the invention.
  • Figure 2 and 3 show a schematic and not-to-scale sectional view and a top view, respec- tively, of the optical element unit 106.
  • the first optical element 107 has a substantially rotationally symmetric first optical element body 107.1 with a spherical first surface 107.2 that defines a first axis 107.3 of rotational symmetry.
  • the first optical element body 107.1 defines a radial direction R and a plane of main extension that are both substantially perpendicular to the first axis 107.3 of rotational symmetry.
  • the spherical first surface 107.2 is a coherent reflecting surface forming a reflecting section of the first optical element body 107.1.
  • the reflecting first surface 107.2 has a first reflecting area 107.4 optically used in the exposure process transferring the image of the pattern formed on the mask 104.1 onto the substrate 105.1.
  • the first reflecting area 107.4 defines a first reflecting area center 107.5 that is arranged eccentrically with respect to the first axis 107.3 of rotational symmetry of the first optical element 107.
  • the first reflecting area center 107.5 is radially offset (i.e. offset in the radial direction R) with respect to the first axis 107.3 of rotational symmetry of the first optical element 107.
  • the first reflecting area center 107.5 may for example be defined by the center of area of the first reflecting area 107.4.
  • the first reflecting area 107.4 is part of the reflecting first surface 107.2.
  • only the first reflecting area may show an appropriate degree of reflection while the rest of the first surface of the optical element body may be less reflecting or even non-reflecting.
  • the optical element body may show a correspondingly reflecting surface layer or the like only within the first reflecting area.
  • the reflecting area may be formed by any suitable means, e.g. a corresponding design of the optical element body in itself or a coating of the optical element body with one or more layers providing the reflecting properties appropriate for the wavelength of the exposure light used in the exposure process.
  • the first optical element further comprises a first optical passageway 107.6 arranged within the first optical element body 107.1.
  • the first optical passageway 107.6 allows the exposure light - represented in Figure 2 by the light beam 109 - used in the exposure process to pass or traverse, respectively, the first optical element 107.
  • the first optical passage- way 107.6 is formed by a first recess in the form of a first hole in the first optical element body.
  • the first optical passageway may also reach radially (i.e. in the radial direction R) through the outer circumference of the optical element body such that, e.g. a slot like, opening is also formed within the outer circumference of the optical element body as it is indicated in Figure 3 by the dashed contour 110.
  • the first optical passageway may have any other cross-section suitable for the respective application.
  • the first optical passageway 107.6 has a first central passageway axis 107.8 that is arranged radially offset (i.e. offset in the radial direction R) and inclined with respect to the first axis 107.3 of rotational symmetry of the first optical element 107.
  • the first optical passageway formed by the first hole 107.6 is also arranged eccentrically with respect to the first axis 107.3 of rotational symmetry of the first optical element 107.
  • the first optical passageway 107.6 does not intersect with the first axis 107.3 of rotational symmetry of the first optical element 107.
  • the first optical passageway may also intersect with the first axis of rotational symmetry of the first optical element.
  • the eccentrically arranged first optical passageway may also reach into the area of the center of the first optical element.
  • the first optical passageway 107.6 is formed by a recess within the first optical element body 107.1. This has the advantage that the light beam 109 is not influenced by the optical element body 107.1 when traversing it.
  • the first optical passageway may also be formed by a section of the first optical element body that is transparent to the exposure light used.
  • the first optical element body may be made from a lens material that is transparent to the exposure light used.
  • the reflecting first surface with the first reflecting area may be formed by a reflecting coating of the first optical element body that is missing in the area of the first optical passageway to allow the exposure light to traverse the first optical passageway.
  • first reflecting area 107.4 used in the exposure process despite of being part of the basically rotationally symmetric first surface 107.2, in itself is not rotationally symmetric and, thus, in other words deviates from rotational symmetry.
  • a first optical element 107 is achieved that, on the one hand, due to the sub- stantialh' rotational! s w mmetric first o n tic3l element body 107.1, may bs supported in a sim- pie and conventional manner of a rotationally symmetric optical element.
  • the eccentric first optical passageway 107.6 while not deteriorating the structural rigidity of the first optical element 107, allows for a very compact design of the optical element unit 106. This is due to the fact that no sumptuous beam guiding system or the like is necessary for guiding the beam 109 reflected by the first optical element 107 again past the first optical element 107.
  • the beam 109 may simply be reflected a second time by an adjacent optical element, here the adjacent second optical element 108, and traverse the first optical element 107 via the first optical passageway 107.6.
  • the radial protrusions 107.9 are monolithically connected to the first optical element body 107.1 at the outer circumference 107.10 of the first optical element body 107.1.
  • any other suitable angle of rotation may be chosen between the radial protrusions.
  • Each radial protrusion 107.9 is connected to a connector in the form of a bipod 111 by which the first optical element 107 is supported via a console 112 on a support structure in the form a support ring 113 of the optical element unit 106.
  • bipods 111 - that are illustrated in a highly simplified manner in Figure 2 and 3 - may be used for actively and/or passively positioning the first optical element 107 in up to six degrees of freedom.
  • any other suitable connector structures may be provided to support the first optical element.
  • the eccentric first optical passageway 107.6 in an advantageous manner, does not interrupt the outer circumference 107.10 of the first optical element body 107.1. As a consequence, the first optical passageway 107.6 does not deteriorate the structural rigidity of the first optical element 107.
  • the second optical element 108 of the optical element unit 106 is arranged adjacent to the first optical element 107 and of identical design with the first optical element 107 such that it is here mainly referred to the explanations given above in the context of the first optical element 107.
  • the first optical element 107 and the second optical element 108 form immediately consecutive optical elements along the light beam path of the light beam 109.
  • the second optical element 108 is arranged such that the first axis 107.3 of rotational symmetry of the first optical element body 107.1 and the second axis 108.3 of rotational symmetry of the second optical element body 108.1 are substantially collinear forming part of an optical axis of the optical element unit.
  • the second optical element 108 is arranged such that the light beam 109 coming from the mask 104.1 first traverses the second optical passageway 108.6 that is arranged eccentrically with respect to the second axis 108.3 of rotational symmetry of the second optical element body 108.1 and formed as a hole within the second optical element body 108.1.
  • the light beam 109 After traversing the second optical passageway 108.6, the light beam 109 hits the first reflecting area 107.4 of the first optical element 107 and is reflected by the latter towards the second optical element 108. The light beam 109 then hits the eccentric second reflecting area 108.4 of the second optical element 108 and is reflected by the latter towards the first optical element 107. Finally, the light beam 109 traverses the first optical passageway 107.6 of the first optical element before it further propagates through the optical projection unit towards the substrate 105.1.
  • each radial protrusion 108.9 is connected to a connector in the form of a bipod 115 by which the second optical element 108 is supported via a console 115 on the support ring 113 of the optical element unit 106.
  • the bipods 1 14 - that are illustrated in. a highly simplified manner in Figure 2 and 3 - may be used for actively and/or passively positioning the second optical element 108 in up to six degrees of freedom.
  • any other suitable connector structures may be provided to support the second optical element 108.
  • the bipods 111 and the bipods 114 support the first optical element 107 and the second optical element 108 in a manner as described in the International Patent Application Serial No. PCT/EP2005/005600 published as WO 2005/116773 A1 (Kugler et al.), the entire contents of which is incorporated herein by reference.
  • the bipods 111 and the bipods 114 hereby define mutually penetrating first and second installation spaces, respectively, which allow a very compact design of the optical element unit 106 along its optical axis (107.3, 108.3).
  • first optical passageway 107.6 and the second optical passageway 108.6 allow a very compact design of the optical element unit 106 transverse to its optical axis (107.3, 108.3), since - despite the structural rigidity of the respective optical element 107, 108 - it is not necessary to guide the light on the outside of the first optical element 107 and the second optical element 108.
  • optical element unit 106 As described above a very compact reflecting optical arrangement may be achieved that, when used for example in a catadioptric system, may easily be integrated into a stack of optical element modules to achieve a flush configuration simi- lar to the ones known from conventional refractive optical systems.
  • a substantially rotationally symmetric first body is provided including the first optical element body 107.
  • the rotationally symmetric first body in its shape largely corre- sponds to the shape of the first optical element body 107.1 described above but has a circumferential ring shaped protrusion at its outer circumference.
  • the first body may be manufactured in any suitable manner to provide the above shape.
  • the connecting members 107.9 are formed by machining them from the circumferential ring shaped protrusion from the first body.
  • the reflecting first surface 107.2 is provided by applying a corresponding reflecting coating to the first optical element body 107.1.
  • the reflecting first surface 107.2 includes the
  • the hole forming the first optical passageway 107.6 is formed within the first optical element body 107.1 by suitable means depending on the material of the first optical element body 107.1.
  • this method of manufacturing has the advantage that for most of the time a substantially rotationally symmetric body has to be handled which is greatly alleviating the handling and manufacturing procedures.
  • any other order of the steps 116.2 to 116.4 may be provided when manufacturing the first optical element 107.
  • optical exposure apparatus 101 of Figure 1 a preferred embodiment of an optical imaging method according to the invention comprising a method of supporting an optical element according to the invention may be executed as it will be described in the following with reference to Figure 1 to 5.
  • a step 117.1 the components of the optical exposure apparatus 101 including the mask 104.1 with a pattern, the substrate 105.1 , the optical projection unit 103 adapted to transfer an image of the pattern of the mask 104.1 onto the substrate 105.1 and comprising the optical element unit 106 as well as the illumination unit 102 adapted to illuminate the pattern of the mask 104.1 are provided.
  • a step 117.2 the components of the optical exposure apparatus 101 are put into a spatial relation to provide the configuration as it has been described in the context of Figures 1 to 3.
  • the first optical element 107 - that had been previously manufactured according to the steps 116.1 to 116.4 described above - is supported on the support ring 113 of the optical element unit in a statically determinate way via the bipods 11 1 as it has been described above.
  • the illumination system 102 is then used to illuminate the pattern of the mask 104.1 , such that the optical projection unit 103 transfers an image of the pattern of the mask 104.1 onto the substrate 105.1 as it has been described above.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne un élément optique comprenant un corps d'élément optique (107.1, 108.1), une zone réfléchissante (107.4, 108.4) et un passage optique (107.6, 108.6). Le corps de l'élément optique définit un axe de symétrie de révolution (107.3, 108.3). La zone réfléchissante est disposée dans le corps de l'élément optique et est conçue pour servir optiquement dans un processus d'exposition. Le passage optique est disposé dans le corps de l'élément optique et permet à la lumière de traverser le corps de l'élément optique, le passage optique étant disposé de manière excentrée par rapport à l'axe de symétrie de révolution.
EP07723892A 2006-03-31 2007-04-02 Element optique reflechissant avec passage optique excentre Withdrawn EP2002301A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/395,719 US7760327B2 (en) 2003-10-02 2006-03-31 Reflecting optical element with eccentric optical passageway
PCT/EP2007/002951 WO2007112997A1 (fr) 2006-03-31 2007-04-02 Element optique reflechissant avec passage optique excentre

Publications (1)

Publication Number Publication Date
EP2002301A1 true EP2002301A1 (fr) 2008-12-17

Family

ID=38268960

Family Applications (1)

Application Number Title Priority Date Filing Date
EP07723892A Withdrawn EP2002301A1 (fr) 2006-03-31 2007-04-02 Element optique reflechissant avec passage optique excentre

Country Status (2)

Country Link
EP (1) EP2002301A1 (fr)
WO (1) WO2007112997A1 (fr)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004025832A1 (de) * 2004-05-24 2005-12-22 Carl Zeiss Smt Ag Optikmodul für ein Objektiv

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2007112997A1 *

Also Published As

Publication number Publication date
WO2007112997A1 (fr) 2007-10-11

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