EP1938364A4 - Procede pour fabriquer un nano-intervalle et capteur de nano-intervalle - Google Patents

Procede pour fabriquer un nano-intervalle et capteur de nano-intervalle

Info

Publication number
EP1938364A4
EP1938364A4 EP06783773A EP06783773A EP1938364A4 EP 1938364 A4 EP1938364 A4 EP 1938364A4 EP 06783773 A EP06783773 A EP 06783773A EP 06783773 A EP06783773 A EP 06783773A EP 1938364 A4 EP1938364 A4 EP 1938364A4
Authority
EP
European Patent Office
Prior art keywords
nanogap
fabricating
sensor
nanogap sensor
fabricating nanogap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06783773A
Other languages
German (de)
English (en)
Other versions
EP1938364A1 (fr
Inventor
Bong Hyun Chung
Sang Kyu Kim
Hye Jung Park
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micobiomed Co Ltd
Original Assignee
Micobiomed Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020060072981A external-priority patent/KR100849384B1/ko
Application filed by Micobiomed Co Ltd filed Critical Micobiomed Co Ltd
Publication of EP1938364A1 publication Critical patent/EP1938364A1/fr
Publication of EP1938364A4 publication Critical patent/EP1938364A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00087—Holes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
EP06783773A 2005-10-21 2006-09-05 Procede pour fabriquer un nano-intervalle et capteur de nano-intervalle Withdrawn EP1938364A4 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR20050099585 2005-10-21
KR1020060072981A KR100849384B1 (ko) 2005-10-21 2006-08-02 나노갭 및 나노갭 센서의 제조방법
PCT/KR2006/003517 WO2007046582A1 (fr) 2005-10-21 2006-09-05 Procede pour fabriquer un nano-intervalle et capteur de nano-intervalle

Publications (2)

Publication Number Publication Date
EP1938364A1 EP1938364A1 (fr) 2008-07-02
EP1938364A4 true EP1938364A4 (fr) 2011-05-18

Family

ID=37962654

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06783773A Withdrawn EP1938364A4 (fr) 2005-10-21 2006-09-05 Procede pour fabriquer un nano-intervalle et capteur de nano-intervalle

Country Status (2)

Country Link
EP (1) EP1938364A4 (fr)
WO (1) WO2007046582A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8159347B2 (en) 2008-09-25 2012-04-17 General Electric Company Sensors having gap based sensing devices and methods of making and using the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030211502A1 (en) * 2000-04-24 2003-11-13 Sauer Jon R. Ultra-fast nucleic acid sequencing device and a method for making and using the same
EP1366860A1 (fr) * 2002-05-28 2003-12-03 Asia Pacific Microsystem, Inc. Méthode de mesure non destructive de l'épaisseur d'une plaquette encollée (bonded wafer)
WO2004077503A2 (fr) * 2003-02-03 2004-09-10 President And Fellows Of Harvard College Fabrication regulee de trous dans des structures conductrices d'electricite
WO2004078640A1 (fr) * 2003-03-05 2004-09-16 Technische Universiteit Delft Procede et dispositif permettant la formation selective d'ouvertures d'echelle nanometrique

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000315785A (ja) * 1999-04-30 2000-11-14 Canon Inc ナノ構造体の製造方法及びナノ構造体デバイス
JP3787630B2 (ja) * 2003-02-14 2006-06-21 独立行政法人情報通信研究機構 ナノギャップ電極の製造方法
EP1691196B1 (fr) * 2003-09-25 2012-12-26 Toyama Prefecture Puce de reseau de micropuits et son procede de fabrication
KR100561908B1 (ko) * 2003-12-26 2006-03-20 한국전자통신연구원 센서 구조체 및 그 제조방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030211502A1 (en) * 2000-04-24 2003-11-13 Sauer Jon R. Ultra-fast nucleic acid sequencing device and a method for making and using the same
EP1366860A1 (fr) * 2002-05-28 2003-12-03 Asia Pacific Microsystem, Inc. Méthode de mesure non destructive de l'épaisseur d'une plaquette encollée (bonded wafer)
WO2004077503A2 (fr) * 2003-02-03 2004-09-10 President And Fellows Of Harvard College Fabrication regulee de trous dans des structures conductrices d'electricite
WO2004078640A1 (fr) * 2003-03-05 2004-09-16 Technische Universiteit Delft Procede et dispositif permettant la formation selective d'ouvertures d'echelle nanometrique

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
HASHIOKA S ET AL: "FABRICATION TECHNIQUE FOR PREPARING NANOGAP ELECTRODES BY CONVENTIONAL SILICON PROCESSES", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, JP, vol. 44, no. 6A, 1 June 2005 (2005-06-01), pages 4213 - 4215, XP001502351, ISSN: 0021-4922, DOI: 10.1143/JJAP.44.4213 *
See also references of WO2007046582A1 *
SHINGI HASHIOKA ET AL: "Fabrication Technique for Preparing Nanogap Electrodes by Conventional Silicon Processes", JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 44, no. 6A, 1 June 2005 (2005-06-01), JP, pages 4213 - 4215, XP055395549, ISSN: 0021-4922, DOI: 10.1143/JJAP.44.4213 *
STORM A J ET AL: "FABRICATION OF SOLID-STATE NANOPORES WITH SINGLE-NANOMETRE PRECISION", NATURE MATERIALS, NATURE PUBLISHING GROUP, LONDON, GB, vol. 2, no. 8, 13 July 2003 (2003-07-13), pages 537 - 540, XP008046585, ISSN: 1476-4660, DOI: 10.1038/NMAT941 *

Also Published As

Publication number Publication date
EP1938364A1 (fr) 2008-07-02
WO2007046582A1 (fr) 2007-04-26

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Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

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Effective date: 20070920

AK Designated contracting states

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Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

RIN1 Information on inventor provided before grant (corrected)

Inventor name: PARK, HYE JUNG,ROOM 303 HO,

Inventor name: KIM, SANG KYU

Inventor name: CHUNG, BONG HYUN

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: MICOBIOMED. CO., LTD.

A4 Supplementary search report drawn up and despatched

Effective date: 20110418

RIC1 Information provided on ipc code assigned before grant

Ipc: B81C 1/00 20060101AFI20110412BHEP

17Q First examination report despatched

Effective date: 20120510

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