EP1938364A4 - A method for fabricating nanogap and nanogap sensor - Google Patents

A method for fabricating nanogap and nanogap sensor

Info

Publication number
EP1938364A4
EP1938364A4 EP06783773A EP06783773A EP1938364A4 EP 1938364 A4 EP1938364 A4 EP 1938364A4 EP 06783773 A EP06783773 A EP 06783773A EP 06783773 A EP06783773 A EP 06783773A EP 1938364 A4 EP1938364 A4 EP 1938364A4
Authority
EP
European Patent Office
Prior art keywords
nanogap
fabricating
sensor
nanogap sensor
fabricating nanogap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06783773A
Other languages
German (de)
French (fr)
Other versions
EP1938364A1 (en
Inventor
Bong Hyun Chung
Sang Kyu Kim
Hye Jung Park
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micobiomed Co Ltd
Original Assignee
Micobiomed Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020060072981A external-priority patent/KR100849384B1/en
Application filed by Micobiomed Co Ltd filed Critical Micobiomed Co Ltd
Publication of EP1938364A1 publication Critical patent/EP1938364A1/en
Publication of EP1938364A4 publication Critical patent/EP1938364A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00087—Holes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
EP06783773A 2005-10-21 2006-09-05 A method for fabricating nanogap and nanogap sensor Withdrawn EP1938364A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR20050099585 2005-10-21
KR1020060072981A KR100849384B1 (en) 2005-10-21 2006-08-02 A method for fabricating nanogap and nanogap sensor
PCT/KR2006/003517 WO2007046582A1 (en) 2005-10-21 2006-09-05 A method for fabricating nanogap and nanogap sensor

Publications (2)

Publication Number Publication Date
EP1938364A1 EP1938364A1 (en) 2008-07-02
EP1938364A4 true EP1938364A4 (en) 2011-05-18

Family

ID=37962654

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06783773A Withdrawn EP1938364A4 (en) 2005-10-21 2006-09-05 A method for fabricating nanogap and nanogap sensor

Country Status (2)

Country Link
EP (1) EP1938364A4 (en)
WO (1) WO2007046582A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8159347B2 (en) 2008-09-25 2012-04-17 General Electric Company Sensors having gap based sensing devices and methods of making and using the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030211502A1 (en) * 2000-04-24 2003-11-13 Sauer Jon R. Ultra-fast nucleic acid sequencing device and a method for making and using the same
EP1366860A1 (en) * 2002-05-28 2003-12-03 Asia Pacific Microsystem, Inc. Non-destructive method for measuring the thickness of a bonded wafer
WO2004077503A2 (en) * 2003-02-03 2004-09-10 President And Fellows Of Harvard College Controlled fabrication of gaps in electrically conducting structures
WO2004078640A1 (en) * 2003-03-05 2004-09-16 Technische Universiteit Delft Method and apparatus for controlled manufacturing of nanometer-scale apertures

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000315785A (en) * 1999-04-30 2000-11-14 Canon Inc Manufacture of nano structural member and nano structural member device
JP3787630B2 (en) * 2003-02-14 2006-06-21 独立行政法人情報通信研究機構 Manufacturing method of nanogap electrode
JP4069171B2 (en) * 2003-09-25 2008-04-02 富山県 Microwell array chip and manufacturing method thereof
KR100561908B1 (en) * 2003-12-26 2006-03-20 한국전자통신연구원 Sensor Structure and Method thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030211502A1 (en) * 2000-04-24 2003-11-13 Sauer Jon R. Ultra-fast nucleic acid sequencing device and a method for making and using the same
EP1366860A1 (en) * 2002-05-28 2003-12-03 Asia Pacific Microsystem, Inc. Non-destructive method for measuring the thickness of a bonded wafer
WO2004077503A2 (en) * 2003-02-03 2004-09-10 President And Fellows Of Harvard College Controlled fabrication of gaps in electrically conducting structures
WO2004078640A1 (en) * 2003-03-05 2004-09-16 Technische Universiteit Delft Method and apparatus for controlled manufacturing of nanometer-scale apertures

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
HASHIOKA S ET AL: "FABRICATION TECHNIQUE FOR PREPARING NANOGAP ELECTRODES BY CONVENTIONAL SILICON PROCESSES", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, JP, vol. 44, no. 6A, 1 June 2005 (2005-06-01), pages 4213 - 4215, XP001502351, ISSN: 0021-4922, DOI: 10.1143/JJAP.44.4213 *
See also references of WO2007046582A1 *
SHINGI HASHIOKA ET AL: "Fabrication Technique for Preparing Nanogap Electrodes by Conventional Silicon Processes", JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 44, no. 6A, 1 June 2005 (2005-06-01), JP, pages 4213 - 4215, XP055395549, ISSN: 0021-4922, DOI: 10.1143/JJAP.44.4213 *
STORM A J ET AL: "FABRICATION OF SOLID-STATE NANOPORES WITH SINGLE-NANOMETRE PRECISION", NATURE MATERIALS, NATURE PUBLISHING GROUP, LONDON, GB, vol. 2, no. 8, 13 July 2003 (2003-07-13), pages 537 - 540, XP008046585, ISSN: 1476-4660, DOI: 10.1038/NMAT941 *

Also Published As

Publication number Publication date
WO2007046582A1 (en) 2007-04-26
EP1938364A1 (en) 2008-07-02

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Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20070920

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

RIN1 Information on inventor provided before grant (corrected)

Inventor name: PARK, HYE JUNG,ROOM 303 HO,

Inventor name: KIM, SANG KYU

Inventor name: CHUNG, BONG HYUN

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: MICOBIOMED. CO., LTD.

A4 Supplementary search report drawn up and despatched

Effective date: 20110418

RIC1 Information provided on ipc code assigned before grant

Ipc: B81C 1/00 20060101AFI20110412BHEP

17Q First examination report despatched

Effective date: 20120510

DAX Request for extension of the european patent (deleted)
STAA Information on the status of an ep patent application or granted ep patent

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Effective date: 20171019