EP1875212A1 - Verfahren und vorrichtung zur charakterisierung einer oberfläche eines werkstückes - Google Patents
Verfahren und vorrichtung zur charakterisierung einer oberfläche eines werkstückesInfo
- Publication number
- EP1875212A1 EP1875212A1 EP06792456A EP06792456A EP1875212A1 EP 1875212 A1 EP1875212 A1 EP 1875212A1 EP 06792456 A EP06792456 A EP 06792456A EP 06792456 A EP06792456 A EP 06792456A EP 1875212 A1 EP1875212 A1 EP 1875212A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- plasma
- light
- plasma jet
- light intensity
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
Definitions
- the invention relates to a method and a device for characterizing a surface of a workpiece, which is acted upon by an atmospheric plasma jet.
- an atmospheric plasma jet is generated and directed onto a surface.
- An interaction of the plasma jet with the surface causes the plasma treatment.
- Plasma treatments with an atmospheric plasma jet are of great importance in industrial production due to the large number of possible applications. Because in addition to a surface cleaning with cleaning and activation of the surface also plasma coatings and surface conversions for a subsequent cohesive joining of components by means of this technology can be performed.
- the energy supply for the plasma treatment is preferably generated with a plasma source or plasma nozzle in which a plasma jet is generated by applying a high-frequency high voltage in a nozzle tube between two electrodes by means of a non-thermal discharge from a working gas.
- the working gas is preferably under atmospheric pressure, which is why it is also referred to as an atmospheric plasma.
- the plasma jet emerges from the nozzle opening, wherein one of the two electrodes is arranged in the region of the nozzle opening.
- the non-thermal plasma jet preferably has no electrical streamer outside the plasma nozzle at a suitably set flow rate, ie discharge channels of the electrical discharge, so that only the high-energy but low-tempered plasma jet is directed onto the surface.
- Such an atmospheric plasma jet is also called a potential-free plasma jet.
- the voltage difference between the nozzle opening and the workpiece is preferably below 100 V.
- the high electron temperature causes a high reactivity of the plasma gas or plasma gas mixture.
- the low ion temperature causes a low heat energy, which is transferred to the surface upon impact of the plasma jet on the surface.
- Such plasma sources are known per se from the prior art of EP 0 761 415 A1 and EP 1 335 641 A1.
- the rotary nozzles known from WO 99/52333 and WO 01/43512 are suitable.
- the plasma jet is generated by means of an atmospheric discharge in an oxygen-containing working gas.
- an oxygen-containing working gas This increases the reactivity of the plasma jet.
- air is used as the working gas.
- a working gas can be used from a mixture of hydrogen and nitrogen, a so-called forming gas. As working gas, only nitrogen comes into question.
- the non-thermal plasma discharge takes place in particular by using a high-frequency high voltage, wherein a series of discharges between two electrodes of the plasma nozzle is generated and the working gas is excited to a plasma emerging from the plasma nozzle.
- a high-frequency sequence of the discharges ensures that no thermal equilibrium arises in the discharge space.
- the imbalance between electron temperature and ion temperature can be maintained even in continuous operation.
- the effectiveness of the plasma treatment depends on the choice of process gas, performance, duration of treatment and plant design, and adjustments can be made as required.
- the voltage values frequency and amplitude represent suitable means for influencing the effectiveness of the plasma treatment.
- the device consists of a ceramic tube which is surrounded on the outer wall with an outer electrode. With a few millimeters from the inner wall of the ceramic tube, an inner electrode is arranged as a rod. Through the gap between the inner wall of the ceramic tube and the inner electrode, an ionizable gas such as air or oxygen is passed. A high-frequency high-voltage field is applied to the two electrodes, as used in corona pretreatment of films.
- the gas is ionized and exits at the end of the pipe.
- the plasma treatment of surfaces is also used in very sensitive areas.
- this technology is used in aircraft construction to clean surfaces of composites.
- adhesive residues of adhesive bonds can adhere to the surface, which are disadvantageous for subsequent processing, for example.
- the subsequent bonding of the components can be cleaned very carefully by means of an atmospheric plasma jet.
- Another application of the plasma treatment is the plasma coating, as it is known from WO 01/32949. Again, there is the problem that can not be determined properly when a plasma coating is completed, so when, for example, a complete layer thickness has been achieved.
- a surface layer of hydrated alumina may be converted prior to sticking by dehydrating and thus solidifying the alumina layer by a plasma impingement. Also in this process can not be determined exactly in the treatment process, when the plasma treatment can be stopped.
- the invention is therefore based on the technical problem of providing a method and a device which enable a characterization of a surface of a workpiece and, moreover, a monitoring of a plasma treatment.
- the above-mentioned technical problem is solved according to the invention by a method for characterizing a surface of a workpiece according to claim 1, wherein an atmospheric plasma jet is generated and directed to the surface, wherein the light generated in the plasma jet in the area of the applied surface is analyzed and wherein the light intensity in at least one spectral range as a measure of the concentration of at least one of the surface of the workpiece by exposure to the atmospheric plasma jet detached substance is determined.
- the concentration of the substance in the plasma can be determined by means of a wavelength-selective analysis of the light emitted by the plasma.
- the method described above may also be referred to as plasma emission spectroscopy. Because the plasma serves not only to detach the substance from the surface, but also as an excitation source for the emission generated by this substance.
- the composition of the surface of the workpiece can be at least partially characterized by measuring the concentrations of the substances of interest in the plasma. So it depends on a state determination and not on a plasma treatment.
- the light intensity in the at least one wavelength range is compared with the light intensity of another wavelength range, in particular by determining the difference or performing a normalization. If the light intensity in the other wavelength range is independent of the emission of the substance to be analyzed, then the light intensity in the at least one Wavelength range is set by the light intensity of the other wavelength range in relation and normalized. Variations in plasma intensity that are not caused by a variation in the concentration of the analyte can thus be eliminated.
- the light intensity changes and, for example, decreases
- a decreasing concentration of the substance can be deduced.
- the decrease in light intensity may give an indication of the degree of completeness of a plasma treatment. Because during the plasma treatment, there may be a certain substance in the plasma due to the respective surface process, whose decreasing concentration represents a measure of the quality and completeness of the plasma treatment.
- the measured light intensity increases, preferably increases asymptotically, if the detected substance can escape from the surface only after the treatment.
- the concentration of the substance will asymptotically approach a threshold.
- a criterion for the quality of the plasma treatment can be assumed. This method is particularly well suited because the light intensity is superimposed by radiation in the same wavelength range by other, independent of the concentration of the substance to be analyzed processes.
- the light intensity in the spectral regions of interest is continuously or temporally measured during the plasma treatment and the temporal behavior of the measured values is compared with a predetermined reference or threshold value, then a condition can be established from which it can be established that the treatment in the current surface area is completed or can be completed.
- the surface is cleaned by the plasma jet and the light intensity in the at least one wavelength range is determined as a measure of the degree of cleaning. If, for example, a surface of residues of a silicone adhesive is to be cleaned, then characteristic emission lines of silicon in the spectrum of the emitted light can be analyzed. The degree of cleaning of an oil spill or the degree of degreasing can be analyzed and determined, for example, by an analysis of characteristic bands in the spectrum of the oil concerned.
- a particularly preferred embodiment of the method consists in enriching the substance which adheres to the surface and contaminating the surface with a messenger substance and in which the light intensity generated by the messenger substance is analyzed. This measure can lead to an improved analysis.
- the addition of a messenger substance is possible just when the contamination of the surface caused by an upstream process using the substance.
- the messenger substance can then be added to the substance before the upstream process so that it can be detected when it is removed from the surface.
- a striking feature here is that the emission lines or emission bands differ significantly from the remaining spectrum of the light emitted from the plasma and that thus the detection of the messenger substance is simplified.
- a plasma treatment of the surface usually also leads to a surface activation, which is aimed for a better wettability with liquids. This plays an important role especially for painting or for an adhesive application. Above all, the degree of activation is important, since only from a certain degree of activation wetting with a particular liquid is possible. The improvement in wettability is of particular interest in plastics, since they often have poor wettability.
- the surface can be plasma-coated by the plasma jet and the light intensity in the at least one wavelength range can be determined as a measure of the degree of coating.
- a plasma coating such as a
- Plasma polymerization can be used as a measure of the completeness of the coating, the emission intensity of a substance that emerges from the uncoated surface. Because the intensity of the atmospheric plasma can be adjusted so that substances are dissolved out of the surface of the workpiece. This takes place only as long as the surface has not been completely coated. When the coating is complete, the substance of interest no longer emerges from the surface and the characteristic lines or bands are no longer present in the spectrum of the analyzed light.
- the surface can be modified by the plasma jet, wherein the light intensity in the at least one wavelength range is determined as a measure of the degree of modification.
- the light intensity in the at least one wavelength range is determined as a measure of the degree of modification.
- a plasma jet treatment for surface modification for example in the above-mentioned dehydration of an aluminum oxide layer, occurs in the conversion of a substance, such as water molecules whose spectral characteristics in the spectrum can be used as a measure of the completeness of the modification.
- the plasma is preferably analyzed by means of emission spectroscopy. These are spontaneous emission processes of the atoms and / or molecules contained in the plasma and excited by this plasma. Due to the high level of excitation, these emissions occur in great intensity.
- the analysis of the emitted light is then carried out by means of a spectrograph, which spectrally dissolves and wavelength-selectively absorbs the incident light by means of diffraction or refraction.
- the spectra thus obtained can then be monitored in individual wavelength sections in order to identify and measure the lines or bands in the wavelength spectrum characteristic of the substance to be analyzed.
- the intensity of the spectrum in the spectral region of interest can be determined beforehand without the presence of the substance. In the presence of the substance, an increased intensity is then detected in the spectral region of interest, which is compared with the reference value or with the reference intensity. To determine the intensity, the integral is usually carried out over a plurality of measuring points or spectral ranges in order to keep the measuring error low. However, with a low wavelength resolution, only the measured value of a measuring channel can be evaluated.
- the spectra are preferably determined using optical emission spectroscopy (OES), which is a widely used technology.
- OES optical emission spectroscopy
- This spectroscopy is to spectrally dissect a light beam by means of a diffraction grating and then record by means of a line scan camera or CCD camera.
- the spectra thus obtained show an intensity distribution as a function of the wavelength. so that a wavelength-selective analysis of the light obtained from the plasma is made possible.
- OES optical emission spectroscopy
- Emission spectra are analyzed.
- the plasma itself serves as an excitation source.
- a targeted excitation of the substance to be detected is carried out by means of a separate excitation source, preferably by means of a laser beam, which leads to an emission of light with a specific spectral distribution.
- This technology is also known laser-induced fluorescence (LIF).
- LIF laser-induced fluorescence
- a control signal may be generated which indicates to a user of the plasma nozzle that the previously treated area has been finished. The user can then proceed to another portion of the surface, thus systematically treating the surface to be processed with the plasma.
- control an automatic plasma treatment as a function of the control signal.
- the control means generates a control and control signal in response to an output signal of the analysis means, which is fed to the control of the plasma treatment plant.
- FIG. 1 shows a first embodiment of a device according to the invention, which is attached to a first embodiment of a plasma nozzle
- FIG. 2 shows a second embodiment of a device according to the invention, which is attached to a second embodiment of a plasma nozzle
- Fig. 3 shows a third embodiment of a device according to the invention, which is fixed in a third embodiment of a plasma nozzle
- Fig. 4 shows the second embodiment of a device according to the invention, which is attached to a fourth embodiment of a plasma nozzle
- Fig. 5-8 diagrams for explaining the method according to the invention.
- the plasma nozzle 10 shown in Fig. 1 has a nozzle tube 12 made of metal, which tapers conically to an outlet opening 14. At the end opposite the outlet opening 14, the nozzle tube 12 has an inlet 16 for a working gas, for example for compressed air.
- An intermediate wall 18 of the nozzle tube 12 has a ring of obliquely set in the circumferential direction holes 20 and thus forms a swirl device for the working gas.
- the downstream, conically tapered part of the nozzle tube is therefore traversed by the working gas in the form of a vortex 22, whose core extends on the longitudinal axis of the nozzle tube.
- an electrode 24 is arranged centrally, which protrudes coaxially into the tapered portion of the nozzle tube 12.
- the electrode 24 is formed by a rotationally symmetrical, rounded at the tip pin, for example made of copper, by an insulator 26 electrically opposite to Between wall 18 and the remaining parts of the nozzle tube 12 is isolated. Via an insulated shaft 28, a high-frequency AC voltage is applied to the electrode 24, which is generated by a high-frequency transformer 30.
- the voltage is variably adjustable and is for example 500 V or more, preferably 2-5 kV, in particular more than 5 kV.
- the frequency is for example in the order of 0.5 kHz to 50 kHz, preferably in the range of 15 to 30 kHz, and is preferably also adjustable. By a specific variation of the frequency and / or the amplitude of the voltage, the properties of the plasma can be influenced.
- the shaft 28 is connected to the high frequency transformer 30 via a flexible high voltage cable 32.
- the inlet 16 is connected via a hose, not shown, to a variable flow compressed air source, which is preferably combined with the high frequency generator 30 to form a supply unit.
- the plasma nozzle 10 can be easily moved by hand or with the help of a robot arm.
- the nozzle tube 12 and the intermediate wall 18 are grounded. By a targeted variation of the flow, the properties of the plasma can also be influenced.
- the applied voltage becomes a
- FIG. 2 shows, in contrast to FIG. 1, a plasma nozzle which is suitable for carrying out a plasma polymerization.
- the same reference numerals designate the same components and features as previously described with reference to FIG. 1.
- a lance 40 is provided in the area of the nozzle opening through which a precursor is introduced during operation of the plasma nozzle 10.
- the precursor material is excited in the plasma jet 36 by supplying energy and brought to reaction. At least one of the reaction products is then deposited on the surface as a plasma coating.
- Fig. 3 shows a plasma nozzle which is very similar to the plasma nozzle shown in Fig. 1, the difference between the two figures is essentially in the nature of the arrangement and attachment of a light guide.
- FIG. 4 shows an exemplary embodiment of a plasma nozzle 10, which generates a rotating plasma jet 36.
- the nozzle tube 12 is rotatably supported by a bearing 80 and can be driven by a gear 82.
- the mouthpiece 84 is connected by a thread 86 to the nozzle tube 12 and has a channel 88 directed away from the axis. The channel thus generates an obliquely to the axis extending plasma jet 36, the 12 upon rotation of the nozzle tube performs a circular motion and thus detects an enlarged area of the surface 54.
- the rotatability of the mouthpiece 84 can also be achieved in that the mouthpiece 84 is rotatably mounted relative to the nozzle tube 12 and carries out the rotational movement independently of the nozzle tube 12. By a slight tangential tilting of the outlet of the mouthpiece 84 beyond the emerging plasma jet 36 can also be used for driving the rotational movement.
- a spectrometer 50 which serves the spectral analysis.
- the spectrometer 50 has an element which diffracts or refracts the incident light, for example a diffraction grating, so that the light is decomposed into its spectral components.
- the spectrometer 50 has a plurality of photosensitive measuring cells which detect the different wavelength ranges. Examples of such measuring cell arrangements are line scan cameras or CCD cameras.
- the device has as an optical means an optical fiber in the form of a fiber or a fiber bundle 52 for guiding a portion of the light which is emitted from the plasma 36 coming into contact with the surface 54 of the treated workpiece 56.
- the light guide 52 directs the received light to the spectrometer 50, where it is then spectrally analyzed.
- a fiber or a fiber bundle can also be a Lens optics may be provided.
- the use of a fiber or a fiber bundle is preferred.
- the spectrometer 54 is connected to evaluation means 58 for analyzing the measured intensity distribution of the light and to control means for controlling the plasma treatment.
- the light guide 52 is directed on the input side to the surface area, which is acted upon by the plasma 36. This ensures that exactly the area is observed whose degree of plasma treatment is to be determined.
- the light guide 52 may be provided on the input side with a collecting optics 60 in order to increase the detection range.
- the collection optics 60 has two lenses, but the number of lenses of the collection optics 60 is not predetermined.
- FIG. 1 shows that the light guide 52 is connected to the plasma jet 10 generating the plasma jet via a holder 62 and thus attached laterally to the plasma nozzle 10. This ensures that the observation of the plasma treatment is always directed to the same solid angle below the nozzle opening 14.
- the holder 62 holds the collecting optics 60.
- the light guide 52 is arranged in a guide 64 arranged inside the plasma nozzle 10.
- the guide 64 extends through the entire nozzle assembly and is preferably made of a non-conductive material, such as ceramic.
- the guide 64 can also be shorter be formed and end, for example, within the nozzle tube 12. The plasma is thus generated around the holder 64 without substantially limiting the intensity of the plasma.
- the particular advantage of this arrangement of the light guide 52 is that the light guide 52 axially on the
- Beauftschungs Kunststoff of the plasma 36 is directed to the surface 56, regardless of the distance from which the surface of the plasma nozzle is arranged.
- the arranged inside the plasma nozzle 10 holder 64 does not necessarily have to be aligned axially. If required by the application, the bracket 64 may be disposed in a different orientation within the nozzle tube 12.
- the light guide 52 is designed with collection optics 60 as in the embodiment of FIG. 2, but I connected to the rotating nozzle tube 12.
- the illustration in Fig. 4 is intended to illustrate that the measurement of the light is not only carried out continuously, but also can be done at intervals. Because the rotational movement of the rotating nozzle tube 12 and the rotating mouthpiece 84 is so fast that it is preferable not to carry the optics. Therefore, the light guide 52 with the collection optics 60 observes a portion of the surface which is traversed once every rotation.
- the measuring signal is thus a periodic signal.
- the measurement of the light intensity then preferably takes place only in the time interval of the rotation in which the plasma jet 36 passes through the observed area of the surface.
- a meaningful spectrum can be obtained.
- the arrangement of a light guide 52 has been described with reference to four embodiments.
- the invention is not limited to the use of only one light guide 52, because it can also be used a plurality of optical fibers or optical fiber bundles to collect the light to be analyzed.
- FIG. 3 also shows that a laser 66 is provided to excite a portion of the plasma.
- the laser 66 generates a laser beam 67 with a defined wavelength in order to achieve a targeted excitation of one of the substances in the plasma jet, in addition to the excitation already present in the plasma jet.
- the laser beam 67 is slightly widened in FIG. 3 in order to indicate that the laser beam 67 radiates through a sufficiently large volume within the plasma to be examined.
- the laser-induced fluorescence caused by the laser light in the atoms or molecules of the substance to be investigated can then be utilized in a targeted manner in the analysis of the measured spectrum.
- a laser other means of excitation can be used. For example, microwave excitations or UV light excitations can be used.
- the spectrometer 50 has been described as having a light-diffracting or refractive element, such as a diffraction grating.
- This structure can alternatively be replaced by two different color filters, behind each of which a photosensitive element, for example a photodiode, is arranged.
- a filter has an optionally narrow-band transmission characteristic, which transmits the light of the radiation to be observed, while the other filter preferably the light of a reference line or Passing reference band. Because it is usually not necessary to record the entire spectrum, but it is sufficient to observe the only interesting wavelength ranges.
- the required structure is more compact than when using a diffraction grating.
- the asymptotic behavior of the intensity can also be determined only by determining and evaluating the intensity of the light transmitted through the one color filter in the wavelength range of interest.
- bandpass filters which allow light to pass only at wavelengths which lie between two cut-off wavelengths. Different colored light is not transmitted above and below the cutoff wavelengths.
- a spectroscope in the context of this description thus means any device which enables a spectral analysis of the observed light in at least two different wavelength ranges.
- a diffraction grating, which is a widely used component of a spectroscope, is not required.
- FIG. 1 further shows that display means 68 are provided for displaying a control signal, which are provided with light-emitting diodes 69 arranged on the plasma nozzle 10. Thereby, it is possible to generate an optical signal indicating whether the plasma treatment of the surface should be finished or not. For example, the activation of a red LED may indicate that the surface treatment has not yet completed. and a green LED may indicate that the treatment of the surface section being treated has been completed.
- FIGS. 2 and 4 show that the control means 58 are connected to control means 70 which controls automatic movement of the plasma nozzle 10 relative to the workpiece 56.
- control means 70 which controls automatic movement of the plasma nozzle 10 relative to the workpiece 56.
- the movement drive (not shown) of the plasma nozzle 10 can thus be controlled.
- the drive means can be influenced in their adjustment speed.
- FIG. 3 shows that the control means 58 is connected to a control device 72 having a display 74.
- a control device 72 having a display 74.
- more detailed information can be displayed via binary information by means of the two light-emitting diodes 69.
- the development of the plasma treatment in the currently treated area of the surface could be displayed with the help of a bar graph.
- the plasma treatment can be carried out in such a way that flashovers of the discharges generated in the plasma nozzle on the workpiece surface are avoided in order to avoid damaging a sensitive surface.
- This is a so-called potential-free plasma.
- an electrically conductive workpiece can be grounded so that targeted electrical discharges are pulled over to the workpiece. If this does not lead to an unwanted influence on the surface 54, higher processing speeds and at the same time significantly greater light intensities can be achieved.
- FIGS. 5 to 8 show test results which relate to the detection of silicon emissions which result from contamination of the surface by silicones and their removal by the plasma treatment. Depending on the cleaning success, the different emission intensities were investigated.
- the silicon atoms have an emission spectrum which, inter alia, has spectral lines at wavelengths of 251 nm and 288 nm.
- the spectral lines are thus in the ultraviolet range of the spectrum.
- FIGS. 4 and 5 show the optical emission spectra (emission as a function of the wavelength in nm) in different intensity scaling.
- the spectra were recorded during a plasma treatment of a plastic panel with silicon-containing residues on the surface.
- the lines labeled a and b indicate the emission wavelengths of the silicon at 251 and 288 nm.
- threshold values for difference formation or for the asymptotic intensities for the emissions at 251 nm and 288 nm a Quality assurance with regard to the cleaning of silicon-containing residues on the surface.
- the method according to the invention has been explained with reference to an example of a silicon-containing surface contamination. If other impurities such as oils, greases or other organic substances are to be cleaned from the surface, then the measured spectra must be evaluated on the basis of the spectral lines or spectral bands characteristic of these substances.
- a substance which is dissolved out of the material of the workpiece to be coated by the plasma can be used for analysis.
- a substance emerging from the surface during the modification can be used for the analysis.
- the plasma can be used to detach a substance or several substances from the material of the workpiece which are determined in their concentration by means of the method described.
- the relevant emission lines to be observed are preferably related to at least one other reference line or reference band which does not change due to changes in the surface, so that the influence of variations in the total optical intensity can be eliminated.
- Which reference line or reference band is suitable for this purpose must be determined as a function of the overall system to be examined so as to ensure that fluctuations in the intensity of this reference line or reference band really only come about through process fluctuations and not changes in the surface.
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Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE200510018926 DE102005018926B4 (de) | 2005-04-22 | 2005-04-22 | Verfahren und Plasmadüse zum Erzeugen eines mittels hochfrequenter Hochspannung erzeugten atmosphärischen Plasmastrahls umfassend eine Vorrichtung jeweils zur Charakterisierung einer Oberfläche eines Werkstückes |
PCT/EP2006/061749 WO2006136467A1 (de) | 2005-04-22 | 2006-04-21 | Verfahren und vorrichtung zur charakterisierung einer oberfläche eines werkstückes |
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EP1875212A1 true EP1875212A1 (de) | 2008-01-09 |
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EP06792456A Withdrawn EP1875212A1 (de) | 2005-04-22 | 2006-04-21 | Verfahren und vorrichtung zur charakterisierung einer oberfläche eines werkstückes |
Country Status (3)
Country | Link |
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EP (1) | EP1875212A1 (de) |
DE (1) | DE102005018926B4 (de) |
WO (1) | WO2006136467A1 (de) |
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US20090241905A1 (en) | 2006-03-29 | 2009-10-01 | Denso Corporation | Mount structure of fuel injection valve and fuel injection system |
DE102007041329B4 (de) * | 2007-08-31 | 2016-06-30 | Thermico Gmbh & Co. Kg | Plasmabrenner mit axialer Pulvereindüsung |
DE102008052102B4 (de) * | 2008-10-20 | 2012-03-22 | INPRO Innovationsgesellschaft für fortgeschrittene Produktionssysteme in der Fahrzeugindustrie mbH | Vorrichtung zum Vor- und/oder Nachbehandeln einer Bauteiloberfläche mittels eines Plasmastrahls |
DE102009006016A1 (de) | 2009-01-23 | 2010-07-29 | Plasma Treat Gmbh | Verfahren und Vorrichtung zur Detektion von ionisierbaren Gasen, insbesondere organischen Molekülen, vorzugsweise Kohlenwasserstoffen |
CN102103291B (zh) * | 2010-12-17 | 2013-09-18 | 深圳市华星光电技术有限公司 | 配向膜修补设备及其修补方法 |
CN105830540B (zh) * | 2013-12-11 | 2018-10-26 | 应用等离子体株式会社 | 等离子体发生装置 |
KR101742483B1 (ko) * | 2015-10-23 | 2017-06-01 | (주)세신기전시스템 | 가우징 장치 |
DE102015121253A1 (de) * | 2015-12-07 | 2017-06-08 | Plasmatreat Gmbh | Vorrichtung zum Erzeugen eines atmosphärischen Plasmastrahls zur Behandlung der Oberfläche eines Werkstücks |
DE102015121252A1 (de) * | 2015-12-07 | 2017-06-08 | Plasmatreat Gmbh | Vorrichtung zur Erzeugung eines atmosphärischen Plasmastrahls und Verfahren zur Behandlung der Oberfläche eines Werkstücks |
WO2018020434A1 (en) | 2016-07-26 | 2018-02-01 | BORISSOVA, Anastasiia Olegovna | Tissue tolerable plasma generator and method for the creation of protective film from the wound substrate |
DE102017120017A1 (de) * | 2017-08-31 | 2019-02-28 | Plasmatreat Gmbh | Düsenanordnung für eine Vorrichtung zur Erzeugung eines atmosphärischen Plasmastrahls, System und Verfahren zur Überwachung und/oder Steuerung des Systems |
KR101924429B1 (ko) | 2017-10-12 | 2018-12-03 | 이창훈 | 플라스마를 이용한 탄소섬유 강화 플라스틱의 제조장치 및 제조방법 |
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2005
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2006
- 2006-04-21 EP EP06792456A patent/EP1875212A1/de not_active Withdrawn
- 2006-04-21 WO PCT/EP2006/061749 patent/WO2006136467A1/de active Application Filing
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Also Published As
Publication number | Publication date |
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DE102005018926A1 (de) | 2006-11-02 |
WO2006136467A1 (de) | 2006-12-28 |
DE102005018926B4 (de) | 2007-08-16 |
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