EP1790466A1 - Embossing roll and method for embossing a web or a sheet - Google Patents

Abstract

Embossing pins (3) are arranged on the outer surface (2) of the embossing roller (1), and/or their end surfaces are dimensioned so that the engagement area is substantially constant during a complete rotation of the embossing roller. The engagement area strips are rectangular in shape, corresponding to the sum of the widths of all part rows. Independent claims are included for a method of forming an embossed pattern, and for a paper handkerchief.

Description

I. Field of application

The present invention relates to an embossing roller and a method for producing an embossing pattern in a material web or in a blank. The invention is particularly applicable in the context of multi-ply tissue napkins or tissue handkerchiefs consisting of several plies of tissue paper, the tissue plies being held together by embossing.

II. Technical background

It is known to arrange a stamping station in machines for the production of paper tissues, which provides the material web, which preferably consists of tissue paper, with an embossing pattern. For this purpose, the embossing station comprises a pair of rollers, which on the one hand has an embossing roller and on the other a counter-roller. Between the two rollers is a passage or embossing gap, through which the material web is guided. The embossing roll has a plurality of embossing pins projecting radially from its lateral surface, while the counter-roller is provided with a smooth lateral surface.

In particular, paper handkerchiefs are often produced to achieve high productivity by means of multi-web manufacturing machines having multiple juxtaposed rows of benefits. Incidentally, they have for holding the tissue layers typically arranged at its edge Edge embossing and a substantially unembossed mirror surface surrounded by the edge embossing.

During the operation of the counter-rotating pair of rollers occur mainly in multi-lane manufacturing machines for producing edge-embossed paper tissues due to the embossing forces roll vibrations, which adversely affect the quality of the embossing pattern in the subsequent tissue paper. This phenomenon, called "chattering", could be partially counteracted by an overall stiffer design of the rolls and their bearings. This is undesirable, in particular because of the associated dimensional and weight increase of the rolls.

III. Presentation of the invention a) Technical task

It is therefore the object of the present invention to provide an embossing roller and a method for producing an embossing pattern in a material web or in a blank, in which or in which in a multi-lane manufacturing machine for producing edge-embossed paper handkerchiefs possible no chatter vibrations occur and at the same time the rigidity The roll construction does not have to be increased.

b) Solution of the task

This object is achieved by means of an embossing roll and a method for producing an embossing pattern having the features of claims 1 and 5, respectively.

According to the invention, it is proposed to keep the engagement surface, ie the sum of those end faces of embossing pins, which are at the same time more or less in engagement with the material web to be embossed, substantially constant. For this purpose, a transversely over all benefit rows extending engagement surface band mentally defined by the plane of the embossing roll unwound in the plane and being as long as the sum of the widths of all the benefit rows. According to the invention, the width of the engagement surface band is determined at least as a function of the diameter of the embossing roller, preferably additionally in dependence on the height or the radial projection of the embossing pins over the lateral surface and / or the thickness of the material web or the blank and / or or the width of the Prägespaltes. The presettable width of the engagement surface band should approximately reflect the actual engagement conditions between the embossing pins and the material web. It is therefore based on the order of magnitude of the distance over which the material web or the blank is pressed or compressed during embossing. Preferably, the width of the engagement surface band is smaller than the aforementioned distance.

A substantially constant engagement surface in the sense of the present invention means that an intervention parameter to be calculated may not exceed a certain maximum value. An example of the calculation of this intervention parameter will be described later. The fact that the aforementioned engagement surface remains essentially constant in this sense, hardly occur between embossing roller and counter-roller embossing force fluctuations, which lead to the unwanted chatter vibrations in the prior art. The stamping forces occurring between the two rolls are essentially constant according to the invention, so that chatter vibrations are no longer excited.

A substantially constant engagement surface can be achieved, for example, by a specific arrangement of embossing pins of the same size on the lateral surface of the embossing roller. Additionally or alternatively, it is conceivable to form the embossing pins with different sized end faces for engagement in the material web and thereby to keep the engagement surface constant.

Fig. 1:

eine schematische Schnittdarstellung eines Prägewalzenpaares;

Fig. 2:

eine Teilabwicklung einer Prägewalzenoberfläche mit insgesamt vier Nutzenreihen;

Fig. 3:

ein aus dem Stand der Technik bekanntes Prägemuster für ein Papiertaschentuch;

Fig. 4:

ein mit der erfindungsgemäßen Prägewalze hergestelltes Prägemuster eines Papiertaschentuchs;

Fig. 5:

ein Diagramm, das Eingriffsflächen nach dem Stand der Technik sowie gemäß der vorliegenden Erfindung gegenüber stellt;

Fig. 6:

ein Diagramm zur Gegenüberstellung eines herkömmlichen Prägemusters mit einem Referenzprägemuster;

Fig. 7:

ein Diagramm zur Gegenüberstellung eines erfindungsgemäß hergestellten Prägemusters und des Referenzprägemusters; und

Fig. 8:

eine vergrößerte Darstellung des Details "X" aus Fig. 1 zur Erläuterung der Festlegung der Breite des Eingriffsflächenbandes.

Hereinafter, an embodiment of the invention using the example of a four-lane production of paper tissues will be explained in more detail with reference to drawings. Show it:

Fig. 1:

a schematic sectional view of an embossing roller pair;

Fig. 2:

a partial processing of an embossing roller surface with a total of four benefit rows;

3:

a known from the prior art embossing pattern for a tissue paper;

4:

an embossed pattern of a paper tissue made with the embossing roll of the invention;

Fig. 5:

a diagram that faces the engagement surfaces according to the prior art and according to the present invention;

Fig. 6:

a diagram for comparing a conventional embossing pattern with a reference embossing pattern;

Fig. 7:

a diagram for comparison of an embossed pattern according to the invention and the reference embossing pattern; and

Fig. 8:

an enlarged view of the detail "X" of Fig. 1 for explaining the determination of the width of the engagement surface band.

The embossing roller 1 has on its lateral surface 2 only partially illustrated embossing pins 3 for introducing embossing recesses in a material web 6, which in Fig. 1 from the right to is passed through the gap between the rollers 1 and 4 on the left. The mantle surface 5 of the counter-roller 4 is smooth, ie it has no embossing projections.

Fig. 2 shows the partial development of the lateral surface 2 of a known from the prior art embossing roller in the plane. A total of four utility rows N ₁ , N ₂ , N ₃ , N ₄ lying adjacent to each other in roller axial direction z with the respective widths b _N1 , b _N2 , b _N3 , b _N4 can be seen, which fill the entire width of the material web 6. In each row of use N ₁ , N ₂ , N ₃ , N ₄ , the embossing pattern is embossed on the material web 6. As can be seen, the embossing patterns in each row of use N ₁ , N ₂ , N ₃ , N _{4 are} in the circumferential direction of the embossing roll 1 or rotational angle direction α offset from one another.

Embossing patterns used in tissue paper generally have a rectangular shape. The embossing patterns shown in Fig. 2 are, in contrast, each square or rectangular. In the case of the finished paper handkerchiefs resulting from the end product, the embossing pattern is in the form of an edge embossing at its edge. In the exemplary embodiment shown, the edge embossment completely surrounds or encloses a continuous, unembossed mirror surface S, which is located in the inner field of the edge embossing, as can be seen in FIG. The mirror surface S is preferably greater than or equal to one quarter of the total product area, i. the total area of the paper tissue comprising the mirror surface S and the surface of the edge embossing. Possibly. For example, a narrow, unembossed strip between the edge embossing and the product or tissue border may constitute another component of the total area of the tissue. Any logo or similar impressions in the mirror surface S are also taken into account in this context, so that the associated stamping surfaces, which are comparatively small in relation to the edge embossing, are not attributed to the mirror surface S itself. Incidentally, it is conceivable that the edge embossing the mirror surface S not completely closed circumferentially, but only partially surrounds.

wobei

A_e ^max =

maximale Eingriffsfläche in dem Eingriffsflächenband während einer vollständigen Umdrehung der Prägewalze 1 (über eine vollständige Abwicklung),

A_e ^min =

minimale Eingriffsfläche in dem Eingriffsflächenband während einer vollständigen Umdrehung der Prägewalze 1 (über eine vollständige Abwicklung).

Over the entire width of the material web 6, two intended engagement surface bands EFB ₁ and EFB _{2 are} shown in FIG. 2 for purposes of illustration. This engagement surface bands each have a width .DELTA.l and characterize example those engaging surfaces A _e (α ₁₎ and A _s (α ₂₎ than the sum of the end faces of those impression pins 3, which are at different angular positions α ₁ and α _{2 of} the settlement are simultaneously engaged and thus involved in the stamping process at the times t ₁ and t ₂ .
To avoid chatter vibrations, it is proposed according to the invention to keep the engagement surface essentially constant by changing the embossing pattern, changing the number of embossing points and / or the size of the individual embossing points. For this purpose, the following engagement surface parameter M _{e is} formed: $$M_e=\frac{{A_e}^{\mathrm{Max}}-{A_e}^{\min }}{{A_e}^{\mathrm{Max}}+{A_e}^{\min }}\cdot 100\%$$

in which

A _e ^max =

maximum engagement surface in the engagement surface band during one complete revolution of the embossing roll 1 (over a complete development),

A _e ^min =

minimum engagement surface in the engagement surface band during one complete revolution of the embossing roller 1 (over a complete unwinding).

und bei vier-bahnigen Herstellungsmaschinen mit vier Nutzenreihen N₁, N₂, N₃, N₄ die Ungleichung $${\mathrm{M}}_{\mathrm{e}}\le 20\%$$

gilt. Die Berechnung des Eingriffsflächenparameters M_e erfolgt mit Hilfe der elektronischen Datenverarbeitung.Substantially constant in the sense of the following invention is preferably intended to mean that in the case of two-lane production machines with two use rows N ₁ , N ₂ the inequality $${\mathrm{M}}_{\mathrm{e}}\le 30\%$$

and in four-lane manufacturing machines with four utility rows N ₁ , N ₂ , N ₃ , N ₄ the inequality $${\mathrm{M}}_{\mathrm{e}}\le 20\%$$

applies. The calculation of the engagement surface parameter M _e takes place with the aid of electronic data processing.

It is desirable to have an engagement surface parameter of M _e = 0%, ie the state in which the engagement surface is mathematically exactly constant. As long as the Maximum value of the engagement surface parameter M _e does not exceed the height of 30% or 20%, however, obtained embossing results that have no chatter marks on visual evaluation.

In FIGS. 3 and 4, prior art embossing patterns and according to the present invention are juxtaposed. FIG. 3 shows the part of a conventional embossing pattern, as also shown several times in FIG. 2. The embossing pin diameter for producing the embossing pattern according to FIG. 3 was 0.4 mm. 4 shows the part of an embossing pattern which takes into account the condition according to the invention of a substantially constant engagement surface. As can be seen, the corner of the per se square embossing pattern in the transition region E is rounded. The embossing pin diameters for producing the embossing recesses in the region E were 0.5 mm, while the embossing pin diameters for producing the embossing recesses outside the region E were 0.4 mm as in the embossing pattern according to FIG. 3.

FIG. 5 shows a comparison of the size of the engagement surfaces in the production of the embossing pattern according to FIG. 3 and of the embossing pattern according to FIG. 4 as a function of the angle of rotation α. In addition to the engagement surfaces for a total of four rows of blanks N _1, N _2, N _3, N ₄ is also shown engaging surface ₄ summed over all the rows of blanks N _1, N _2, N _3, N. In the left half of the diagram of FIG. 5, in which the conditions are shown in the embossing pattern known from the prior art, the accumulated engagement surface oscillates between the values of about 80 mm ² and about 190 mm ² . In contrast, it is achieved with the method according to the invention that the size of the engagement surface only oscillates between approximately 80 mm ² and approximately 90 mm ² , as can be seen from the right half of the diagram of FIG. 5. The corresponding engagement surface parameters M _e are shown in FIG. 5 as M _e = 44% (left half of the diagram) and M _e = 11% (right half of the diagram). This clearly shows how, according to the invention, the oscillation of the size of the engagement surface can be minimized and corresponding chatter vibrations can be avoided. In the exemplary embodiment with four use rows N ₁ , N ₂ , N ₃ , N ₄ , the engagement surface parameter M _e remains far below 20%.

In the context of the present invention, chatter vibrations can additionally be counteracted by reducing the accumulated engagement surface as much as possible.

FIG. 8 shows the detail "X" from FIG. 1 for explaining the definition according to the invention of the width Δl of the engagement surface band EFB ₁ or EFB ₂ .

wobei

t =

Dicke der Materialbahn (6) oder des Zuschnitts;

h =

radialer Überstand der Prägestifte (3) über die Mantelfläche (2); und

s =

Weite des Prägespaltes.

For example, for the width Δl the distance 2 x AB can be selected. For approximate modeling of the actual conditions in the embossing gap, the following is assumed for the distance BD shown in FIG. 8: $$\mathit{BD}=\frac{1}{2}\left(t-H-s\right)$$

in which

t =

Thickness of the material web (6) or of the blank;

h =

radial projection of the embossing pins (3) over the lateral surface (2); and

s =

Width of the impression gap.

wobei zusätzlich:

R =

auf die Stirnflächen der Prägestifte 3 bezogener Radius der Prägewalze (1).

Oder vereinfacht für die Praxis mit

D =

auf die Stirnflächen der Prägestifte 3 bezogener Durchmesser der Prägewalze 1 in mm

$$\mathrm{\Delta }l=\cdot \sqrt{2\cdot (t-h-s)D}$$

On the basis of this assumption, the width Δl of the engagement surface band results: $$\mathrm{\Delta }l=2\cdot \sqrt{{\left(R-H\right)}^2-{\left[R-H-\frac{1}{2}\left(t-H-\mathrm{<figure-callout\; id="2"\; label="s"\; filenames="imgf0001.png,imgf0004.png"\; state="\{\{state\}\}">s</figure-callout>}\right)\right]}^2}$$

where additionally:

R =

on the end faces of the embossing pins 3 relative radius of the embossing roller (1).

Or simplified for practice

D =

On the end faces of the embossing pins 3 related diameter of the embossing roller 1 in mm

$$\mathrm{\Delta }l=\cdot \sqrt{2\cdot (t-H-s)D}$$

wobei wiederum

t =

Dicke der Materialbahn (6) oder des Zuschnitts;

h =

radialer Überstand der Prägestifte (3) über die Mantelfläche (2); und

s =

Weite des Prägespaltes.

An alternative way to set the width .DELTA.l of the engagement surface band is to select the distance 2 x BC to be recognized in FIG. For approximate modeling, in this section BE shown in FIG. 8, the following may be assumed: $$\mathit{BE}=\frac{1}{2}\left(t+H-s\right)$$

again

t =

Thickness of the material web (6) or of the blank;

h =

radial projection of the embossing pins (3) over the lateral surface (2); and

s =

Width of the impression gap.

wobei wiederum zusätzlich:

R =

auf die Stirnflächen der Prägestifte 3 bezogener Radius der Prägewalze (1).

Oder vereinfacht für die Praxis mit

D =

auf die Stirnflächen der Prägestifte 3 bezogener Durchmesser der Prägewalze 1 in mm

$$\mathrm{\Delta }l=\sqrt{2\cdot (t+h-s)D}$$

On the basis of this assumption, the width Δl of the engagement surface band results alternatively: $$\mathrm{\Delta }l=2\cdot \sqrt{R^2-{\left[R-\frac{1}{2}\left(t+H-\mathrm{<figure-callout\; id="2"\; label="s"\; filenames="imgf0001.png,imgf0004.png"\; state="\{\{state\}\}">s</figure-callout>}\right)\right]}^2}$$

where again in addition:

R =

on the end faces of the embossing pins 3 relative radius of the embossing roller (1).

Or simplified for practice

D =

On the end faces of the embossing pins 3 related diameter of the embossing roller 1 in mm

$$\mathrm{\Delta }l=\sqrt{2\cdot (t+H-s)D}$$

Beyond the above-mentioned possibilities, further definitions of the width .DELTA.l of the engagement surface band, which in particular can also be determined empirically, are conceivable. However, the width .DELTA.l should always be smaller than the distance .DELTA.M drawn in FIG. 8, over which the material web 6 is pressed during the embossing process differently from its original thickness t. According to the invention, regardless of the choice of the method Determining the width .DELTA.l the above inequalities regarding the engagement surface parameters M _e apply.

$$\mathrm{h}\mathrm{=}\mathrm{0}\mathrm{,}\mathrm{14}\mathrm{mm}$$

$$\mathrm{s}\mathrm{=}\mathrm{0}\mathrm{,}\mathrm{02}\mathrm{mm}$$

$$\mathrm{D}\mathrm{=}\mathrm{271}\mathrm{,}\mathrm{5}\mathrm{mm}$$

$$\mathrm{\Delta l}\mathrm{=}\mathrm{2}\mathrm{\times }\mathrm{AB}=8,5\mathrm{mm}$$

$${\mathrm{L}}_{\mathrm{B}}\mathrm{=}{\mathrm{b}}_{\mathrm{N}\mathrm{1}}\mathrm{+}{\mathrm{b}}_{\mathrm{N}2}\mathrm{+}{\mathrm{b}}_{\mathrm{N}3}\mathrm{+}{\mathrm{b}}_{\mathrm{N}4}\mathrm{=}\mathrm{840}\mathrm{,}\mathrm{0}\mathrm{mm}$$

The exemplary embodiment shown and discussed here in particular in FIGS. 3 to 7 is based on the following geometry parameters: $$\mathrm{t}\mathrm{=}\mathrm{0}\mathrm{.}\mathrm{293}\mathrm{mm}$$

$$\mathrm{H}\mathrm{=}\mathrm{0}\mathrm{.}\mathrm{14}\mathrm{mm}$$

$$\mathrm{s}\mathrm{=}\mathrm{0}\mathrm{.}\mathrm{02}\mathrm{mm}$$

$$\mathrm{D}\mathrm{=}\mathrm{271}\mathrm{.}\mathrm{5}\mathrm{mm}$$

$$\mathrm{.DELTA.l}\mathrm{=}\mathrm{2}\mathrm{\times }\mathrm{FROM}=\mathrm{8th}.5\mathrm{mm}$$

$${\mathrm{L}}_{\mathrm{B}}\mathrm{=}{\mathrm{b}}_{\mathrm{N}\mathrm{1}}\mathrm{+}{\mathrm{b}}_{\mathrm{N}2}\mathrm{+}{\mathrm{b}}_{\mathrm{N}3}\mathrm{+}{\mathrm{b}}_{\mathrm{N}4}\mathrm{=}\mathrm{840}\mathrm{.}\mathrm{0}\mathrm{mm}$$

The embossing quality of an embossing pattern produced according to the invention is determined on the one hand by the formation of the embossing recesses per se (penetration depth of the pins into the material web) and on the other by the uniformity of the arrangement of the embossing depressions relative to one another. The embossing quality can be assessed on the basis of gray levels of the embossing pattern. The intensity of the grayscale of the individual embossing depressions provides a measure of the quality, i. H. for the embossing depth and the geometry of the embossing point, dar.

As shown in Fig. 6, the course of the gray scale or embossing intensity depending on the rotation angle can be represented. For the conventional embossing pattern results in the curve shown in Fig. 6 below. In Fig. 6 above, the course of the corresponding gray scale or embossing intensity of the ideal reference embossing pattern is shown. The ideal intensity average is 9.4%, while the mean intensity value for the conventional embossed pattern is 2.8%. The modulation representing a mean deflection amount is 1.2% for the reference emboss pattern, and is 86.0% for the conventional embossed pattern.

The gray scale or embossing intensity in a selected area is plotted in the diagram according to FIG. 7 in the form of the lower curve there. The upper curve corresponds - as in FIG. 6 - again to the ideal reference embossing pattern. The selected area is characterized by being an area in which a constant course of embossing is expected, i. in which the diameters and the arrangement of the embossing points do not change as a function of the development angle α. As can be seen, the mean value of the embossing intensity of the embossing pattern produced according to the invention is 2.2%, while that of the reference embossing pattern is 5.5%. The modulation of the embossed pattern produced according to the invention is 27.4%, while that of the reference embossing pattern is 0.8%.

The closer that in FIGS. 6 and 7 the lower curve lies at the upper curve in FIGS. 6 and 7, the better the quality of the embossed pattern produced. The smaller the actual modulation value achieved, the better the uniformity of the produced embossing pattern is consistent with the uniformity of the ideal reference embossing pattern.

If one compares the deviations of the embossing pattern according to the invention according to FIG. 7 from the deviations of the conventional embossing pattern according to FIG. 6, it can be seen that with the present invention both the embossing intensity (darkness of the embossing points) and the uniformity of the embossing point distribution are improved could be.

LIST OF REFERENCE NUMBERS

1

embossing roller

2

Lateral surface of the embossing roll

3

embossing pins

4

backing roll

5

Lateral surface of the counter roll

6

web

e

Transition area

R

machine direction

S

mirror surface

EFB ₁ EFB ₂

Engaging surface tape

L _B

Length of the engagement surface band

.DELTA.l

Width of the engagement surface band

N ₁ , N ₂ , N ₃ , N ₄

rows of blanks

b _N1 , b _N2 , b _N3 , b _N4

Widths of benefit rows

Claims (11)

Embossing roller for producing an embossing pattern by embossing a material web (6) or a blank in an embossing gap, wherein the embossing pattern is ultimately on an end product and the end product often in several, juxtaposed benefit rows (N ₁ , N ₂ , N ₃ , N ₄ ) is produced with the aid of a production machine, which is traversed by the material web (6) or the blank in a machine direction (R), and wherein the embossing pattern has an edge embossing arranged at the edge of the end product and a substantially unembossed one at least partially surrounded by the edge embossing Mirror surface (S), wherein the embossing roller (1) comprises a lateral surface (2) with a plurality of embossing pins (3) each having an end facing away from the lateral surface (2) for engagement in the material web (6) or the blank, where the sum of those faces of the faces that are imaginary about the settlement of Mantelfläc he (2) engaged engagement surface band (EFB ₁ , EFB ₂ ) are engaged, forms an engagement surface,
characterized in that
the embossing pins (3) are arranged on the lateral surface (2) and / or the surfaces of their end faces are dimensioned such that the engagement surface is substantially constant during a complete revolution of the embossing roller (1), wherein the engagement surface band (EFB ₁ , EFB ₂ ) has a rectangular shape with a predetermined width (Δl) and a length (L _B ) equal to the sum of the widths (b _N1 , b _N2 , b _N3 , b _N4 ) of all rows of benefits (N ₁ , N ₂ , N ₃ , N ₄ ). Embossing roller according to claim 1,
characterized in that
the width (Δl) of the engagement surface band (EFB ₁ , EFB ₂ ) $$2\cdot \sqrt{{\left(R-H\right)}^2-{\left[R-H-\frac{1}{2}\left(t-H-s\right)\right]}^2}$$

is, where R = radius of the embossing roller (1) relative to the end face of the embossing pins (3); h = radial projection of the embossing pins (3) over the lateral surface (2); t = thickness of the material web (6) or of the blank; and s = width of the embossing gap. Embossing roller according to claim 1,
characterized in that
the width (Δl) of the engagement surface band (EFB ₁ , EFB ₂ ) $$2\cdot \sqrt{R^2-{\left[R-\frac{1}{2}\left(t+H-s\right)\right]}^2}$$

is, where R = radius of the embossing roller (1) relative to the end face of the embossing pins (3); h = radial projection of the embossing pins (3) over the lateral surface (2); t = thickness of the material web (6) or of the blank; and s = width of the embossing gap. Embossing roller according to one of the preceding claims,
characterized in that
it is designed for a two-lane manufacturing machine with two rows of benefits (N ₁ , N ₂ ) and the substantially constant engagement surface means that for an engagement surface parameter M _e with $$M_e=\frac{{A_e}^{\mathrm{Max}}-{A_e}^{\min }}{{A_e}^{\mathrm{Max}}+{A_e}^{\min }}\cdot 100\%;$$

in which A _e ^max = maximum engagement surface in the engagement surface band (EFB ₁ , EFB ₂ ) during one complete revolution of the embossing roll (1); and A _e ^min = minimum engagement surface in the engagement surface band (EFB ₁ , EFB ₂ ) during one complete revolution of the embossing roll (1); $${\mathrm{M}}_{\mathrm{e}}\mathrm{\le }\mathrm{30}\mathrm{\%}$$

applies. Embossing roller according to one of claims 1 to 3,
characterized in that
it is designed for a four-lane manufacturing machine with four rows of benefits (N ₁ , N ₂ , N ₃ , N ₄ ) and the substantially constant engagement surface means that for an engagement surface parameter M _e $$M_e=\frac{{A_e}^{\mathrm{Max}}-{A_e}^{\min }}{{A_e}^{\mathrm{Max}}+{A_e}^{\min }}\cdot 100\%;$$

in which A _e ^max = maximum engagement surface in the engagement surface band (EFB ₁ , EFB ₂ ) during one complete revolution of the embossing roll (1); and A _e ^min = minimum engagement surface in the engagement surface band (EFB ₁ , EFB ₂ ) during one complete revolution of the embossing roll (1); $${\mathrm{M}}_{\mathrm{e}}\mathrm{\le }20\mathrm{\%}$$

applies. A method for producing an embossing pattern by embossing a material web (6) or a blank in an embossing gap, wherein the embossing pattern is ultimately on an end product and the end product often in several, adjacent rows of benefits (N ₁ , N ₂ , N ₃ , N ₄ ) is produced with the aid of a production machine, which is traversed by the material web (6) or the blank in a machine direction (R), and wherein the embossing pattern has an edge embossing arranged at the edge of the end product and a substantially unembossed one at least partially surrounded by the edge embossing Mirror surface (S), and wherein an embossing roller (1) having a lateral surface (2) is used with a plurality of embossing pins (3), each facing away from the lateral surface (2) end face for engagement in the material web (6) or Have a cut, wherein the sum of those surfaces of the end faces, which are in an imaginary, over the settlement of the lateral surface (2) engaged engagement surface band (EFB ₁ , EFB ₂ ) are engaged, forms an engagement surface,
characterized in that
for embossing recesses representing the embossing pattern is engaged in the web or blank so that the engaging surface is substantially constant during one complete revolution of the embossing roller (1), the engaging surface belt (EFB ₁ , EFB ₂ ) being of a rectangular shape having a predetermined width Δl and a length L _B corresponding to the sum of the widths (b _N1 , b _N2 , b _N3 , b _N4 ) measured across the machine direction (R) of all utility rows (N ₁ , N ₂ , N ₃ , N ₄ ) , Method according to claim 6,
characterized in that
the width (Δl) of the engagement surface band (EFB ₁ , EFB ₂ ) to $$2\cdot \sqrt{{\left(R-H\right)}^2-{\left[R-H-\frac{1}{2}\left(t-H-s\right)\right]}^2}$$

is chosen, where R = radius of the embossing roller (1) relative to the end face of the embossing pins (3); h = radial projection of the embossing pins (3) over the lateral surface (2); t = thickness of the material web (6) or of the blank; and s = width of the embossing gap. Method according to claim 6,
characterized in that
the width (Δl) of the engagement surface band (EFB ₁ , EFB ₂ ) to $$2\cdot \sqrt{R^2-{\left[R-\frac{1}{2}\left(t+H-s\right)\right]}^2}$$

is chosen, where R = radius of the embossing roller (1) relative to the end face of the embossing pins (3); h = radial projection of the embossing pins (3) over the lateral surface (2); t = thickness of the material web (6) or of the blank; and s = width of the embossing gap. Method according to one of claims 6 to 8,
characterized in that
the material web (6) or the blank in a two-lane manufacturing machine with two rows of benefits (N ₁ , N ₂ ) is embossed and the substantially constant engagement surface means that for an engagement surface parameter M _e $$M_e=\frac{{A_e}^{\mathrm{Max}}-{A_e}^{\min }}{{A_e}^{\mathrm{Max}}+{A_e}^{\min }}\cdot 100\%;$$

in which A _e ^max = maximum engagement surface in the engagement surface band (EFB ₁ , EFB ₂ ) during one complete revolution of the embossing roll (1); and A _e ^min = minimum engagement surface in the engagement surface band (EFB ₁ , EFB ₂ ) during one complete revolution of the embossing roll (1); $${\mathrm{M}}_{\mathrm{e}}\le 30\%$$

applies. Method according to one of claims 6 to 8,
characterized in that
the material web (6) or the blank in a four-lane manufacturing machine with four rows of benefits (N ₁ , N ₂ , N ₃ , N ₄ ) is stamped and the substantially constant engagement surface means that for an engagement surface parameter M _e with $$M_e=\frac{{A_e}^{\mathrm{Max}}-{A_e}^{\min }}{{A_e}^{\mathrm{Max}}+{A_e}^{\min }}\cdot 100\%;$$

in which A _e ^max = maximum engagement surface in the engagement surface band (EFB ₁ , EFB ₂ ) during one complete revolution of the embossing roll (1); and A _e ^min = minimum engagement surface in the engagement surface band (EFB ₁ , EFB ₂ ) during one complete revolution of the embossing roll (1); $${\mathrm{M}}_{\mathrm{e}}\mathrm{\le }20\mathrm{\%}$$

applies. Tissue,
characterized in that
it is provided with an embossed pattern, which was produced by the method according to one of claims 6 to 10.

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