EP1722397A1 - Dispositif de manipulation de gaz sous vide ou en milieu à basse pression dans un microscope électronique et pour son observation. - Google Patents

Dispositif de manipulation de gaz sous vide ou en milieu à basse pression dans un microscope électronique et pour son observation. Download PDF

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Publication number
EP1722397A1
EP1722397A1 EP06009356A EP06009356A EP1722397A1 EP 1722397 A1 EP1722397 A1 EP 1722397A1 EP 06009356 A EP06009356 A EP 06009356A EP 06009356 A EP06009356 A EP 06009356A EP 1722397 A1 EP1722397 A1 EP 1722397A1
Authority
EP
European Patent Office
Prior art keywords
gas
chamber
buffer
housing
apertures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06009356A
Other languages
German (de)
English (en)
Inventor
Chih-Yu Chao
Wen-Jiunn Hsien
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Contrel Technology Co Ltd
Original Assignee
Lee Bing-Huan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CNA2005100743274A external-priority patent/CN101074920A/zh
Priority claimed from CN 200610075899 external-priority patent/CN101067992A/zh
Application filed by Lee Bing-Huan filed Critical Lee Bing-Huan
Publication of EP1722397A1 publication Critical patent/EP1722397A1/fr
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H01J2237/2003—Environmental cells

Definitions

  • the present invention relates generally to the technology of operating gasiform substance in the vacuum or low-pressure environment, and more particularly, to a device for operating gas in the vacuum or low-pressure environment and for observation of the operation.
  • an electron microscope 61 includes a vacuum specimen chamber 62 for receiving a specimen, and an upper pole piece 66 and a lower pole piece 66 both located in the specimen chamber 62 for ensuring precise focus of the electron beam.
  • the distance between the two pole pieces 66 is usually not larger than 1cm.
  • any specimen received in the specimen chamber 62 must be a solid, not a fluid such as liquid or gas, to allow observation in such vacuum environment, since a fluid specimen is subject to immediate boiling, volatilization, or the like.
  • the modified electron microscope 71 includes a heightened specimen chamber 72, a water tank 74 mounted inside the specimen chamber 72, and an environment chamber 76.
  • the environment chamber 76 has two spacers 762 partitioning its center off into a vapor layer 764 and two buffer layers 766 located respectively below and above the vapor layer 764.
  • the water tank 74 has a temperature-controllable vent pipe 741 connected with the vapor layer 764 for offering vapor of the same temperature as that of the environment chamber 76 to avoid condensation resulting from the entry of the vapor into the vapor layer 764.
  • the two spacers 762 and top and bottom sidewalls of the environment chamber 76 are parallel to one another, each having an aperture 763.
  • the apertures 763 are coaxial with one another for penetration of the electron beam.
  • the environment chamber 76 further has a specimen tube 767 extending outwards from the vapor layer 764, a specimen holder 768 extending through the specimen tube 767 into the vapor layer 764 from outside, and an O-ring 769 sealing space between the specimen holder 768 and the vapor layer 764 for insulation between the vapor layer 764 and the outside.
  • the vapor inside the water tank 74 keeps flowing into the vapor layer 764.
  • the two buffer layers 766 are evacuated to pump out the vapor leaking from the vapor layer 764, preventing the vapor from flowing out of the two buffer layers 766 through the two apertures 763 of the environment chamber 76.
  • the gas pressure inside the vapor layer 764 of the environment chamber 76 can be maintained at 50 torrs or so.
  • the whole environment chamber is fixed inside the microscope, such that it is very difficult to enable and operate the electron beam to pass through the coaxial apertures of the environment chamber while the environment chamber is installed in the microscope.
  • it also had the similar problem that it is difficult to align the two apertures on the top and bottom pole pieces.
  • the environment chamber of Hui's design is fixed to the lower pole piece, such that the vertical position of the whole environment chamber fails to be adjusted and then it failed to interconnect the focus range for accurate focus.
  • the inventor of the present invention finally overcomes them to easily enable the electron beam of the electron microscope to pass through the device of the present invention and enable the device to be located inside the focus range of the electron microscope for more convenient focus operation.
  • the first objective of the present invention is to provide a device for operating gas in the vacuum or low-pressure environment and for observation of the operation.
  • the device provides the environment for observation of gas without alteration of original structure of the electron microscope.
  • the second objective of the present invention is to provide a device for operating gas in the vacuum or low-pressure environment and for observation of the operation.
  • the device can control parameters of pressure of the gas more easily than the prior art to reach higher pressure.
  • the third objective of the present invention is to provide a device for operating gas in the vacuum or low-pressure environment and for observation of the operation.
  • the device does not affect the resolution of the electron microscope.
  • the fourth objective of the present invention is to provide a device for operating gas in the vacuum or low-pressure environment and for observation of the operation.
  • the device can be more easily operated and more conveniently assembled.
  • the present invention includes a housing.
  • the housing has a thinner part formed at a side thereof, and at least one spacer mounted therein for partitioning off its inside into a gas chamber and at least one buffer chamber outside the gas chamber.
  • the gas chamber has two inner apertures provided on the spacer above and below the gas chamber.
  • the housing has two outer apertures provided respectively on a top side thereof and a bottom side thereof. All of the inner and outer apertures are coaxial with one another and located on the thinner part.
  • the housing has a pumping port for communication with the buffer chamber, and a gas inlet for communication with the gas chamber. Therefore, the device of the present invention can provide the environment for observation of the gas, being conveniently assembled and easily operated, without alteration of the original structure of the electron microscope.
  • a device 10 for operating gas in the vacuum or low-pressure environment and for observation of the operation constructed according to a first preferred embodiment of the present invention, is composed of a housing 11, a temperature-controllable liquid-gas container 21, a specimen holder 31, and a pumping device 41, in cooperation with an electron microscope 91.
  • the electron microscope 91 has a specimen chamber 92 therein, two pole pieces 96 mounted respectively at upper and lower sides of the specimen chamber 92, and an insertion port 94 located at a side of the specimen chamber 92 for inserting the device 10.
  • the housing 11 includes a thinner part 12 formed at a side thereof, and a plurality of spacers 14 mounted in an interior space within the housing 11.
  • the thinner part has a thickness that is substantially smaller than the distance between the two pole pieces 96 of the specimen chamber 92.
  • the distance between the pole pieces 96 is generally not larger than 1cm.
  • the spacers 14 partition the interior space of the housing 11 into a gas chamber 16 and two buffer chambers 18 located respectively above and below the gas chamber 16.
  • Inner apertures 142 are formed in the spacers respectively at top and bottom sides of the gas chamber 16.
  • the housing 11 includes two outer apertures 112 formed respectively at top and bottom sides thereof, the outer apertures 112 being coaxially aligned with the inner apertures 142.
  • All of the inner and outer apertures 142 and 112 are located on the thinner part 12 of the housing 11.
  • An insertion slot 114 is defined in the housing 11 corresponding to the gas chamber 16 for communication between the gas chamber 16 and the outside of the housing 11.
  • the housing 11 has two pumping ports 116 formed therein for communication with the buffer chambers 18, and a gas inlet 166 formed therein for communication with the gas chamber 16.
  • Each of the inner apertures 142 has a diameter of 10-200 ⁇ m, and each of the outer apertures 112 has a diameter of 20-800 ⁇ m.
  • Each inner aperture 142 is smaller in diameter than each outer aperture 112. In the present embodiment, the diameter of the inner apertures 142 is 100 ⁇ m, and the diameter of the outer apertures is 200 ⁇ m.
  • the temperature-controllable liquid-gas container 21 is located inside one of the buffer chambers 18, including a temperature-controllable vent pipe 22 and a temperature-controllable conduit 24.
  • the vent pipe 22 is connected with the gas inlet 166 for transferring a gas inside the liquid-gas container 21 to the gas chamber 16, wherein the temperature of the gas is identical to that of the gas chamber 16.
  • the gas can be, subject to requirement, nitrogen, oxygen, helium, carbon dioxide, other gas, a vapor generated from a liquid inside the liquid-gas container 21, or a combination of the aforementioned gases.
  • the vent pipe 22 extends into the liquid-gas container 21, having a distal end located higher than the level of the liquid inside the liquid-gas container 21, for providing the liquid vapor of this liquid in the liquid-gas container 21.
  • the conduit 24 provides communication between the liquid-gas container 21 and the outside of the housing 11, for offering liquid from outside or directly offering other gas, like helium or nitrogen, etc., which must be heated to the same temperature as the liquid-gas container 21 in advance to prevent the liquid vapor inside the liquid-gas container 21 from condensation caused by the cold gas infused from the conduit 24.
  • the liquid-gas container 21 contains water of the same temperature as that of the gas chamber 16 for providing the gas chamber 16 with the pressure of saturated water vapor in such temperature.
  • the specimen holder 31 includes a target stage 32 for loading a specimen.
  • the target stage 32 has an opening 34 and a seal 36.
  • the specimen holder 31 is inserted through the insertion slot 114 to be received in the gas chamber 16.
  • the opening 34 is coaxial with the inner and outer apertures 142 and 112.
  • the seal 36 seals a gap formed between the specimen holder 31 and the gas chamber 16.
  • the pumping device 41 is connected with the two pumping ports 116 for pumping out, or evacuating, the two buffer chambers 18.
  • the device 10 of the present invention can be cooperatively mounted inside the specimen chamber 92 of the electron microscope 91 by inserting the housing through the port 94 of the electron microscope 91. Because the height of the thinner part 12 is smaller than the distance between the two pole pieces 96, the thinner part 12 can be positioned between the two pole pieces 96, enabling the inner and outer apertures 142 and 112 for alignment with the path of the electron beam of the electron microscope 91.
  • the specimen holder 31, loaded with a specimen 99 is inserted from the insertion slot 114 into the gas chamber 16, enabling the specimen 99 for alignment with the inner and outer apertures 142 and 112.
  • the temperature inside the housing 11, the spacers 14, the liquid-gas container 21, and the specimen holder 31 is controlled to enable the temperature of the gas infused from the vent pipe 22 to be identical to that of the gas chamber 16, the specimen holder 31, and the target stage 32.
  • the gas chamber 16 is supplied with gas of predetermined pressure by the liquid-gas container 21, and the two buffer chambers 18 are evacuated by the pumping device 41, if any gas leaks out of the gas chamber 16 through the inner apertures 142 into the two buffer chambers 18, the leaking gas will be evacuated from the two buffer chambers 18 without exhausting through the outer apertures 112 outside the housing 11.
  • Controlling the pumping rate of the pumping device 41 and the gas infusion rate of the liquid-gas container 21 can keep the gas inside the gas chamber 16 in a predetermined pressure to enable operating the gas inside the gas chamber 16 in the vacuum environment.
  • the electron beam of the electron microscope 91 passing through the inner and outer apertures 142 and 112 can detect the specimen 99 to enable observation for the user.
  • the liquid-gas container 21 can be alternatively mounted outside the housing 11, as shown in FIG. 4, and the vent pipe 22 extended out of the housing 11 for communication between the liquid-gas container 21 and the gas chamber 16.
  • Such structure not only has the same function as that mounted inside the housing 11 but also provides a range of unsaturated vapor pressure. Because the temperature of the liquid-gas container 21 mounted outside of the housing 11 can be controlled to be lower than, instead of the same as, that of the gas chamber 16 and the target stage 32, an environment of vapor pressure lower than the saturated one may be generated around the specimen loaded on the target stage 32.
  • such structure enables the user to conveniently operate the liquid-gas container 21. For example, the user can switch off the infusion of the gas at any time and accurately observe the level of the liquid and the supply amount of the liquid.
  • a device 50 for operating gas in the vacuum or low-pressure environment and for observation of the operation constructed according to a second preferred embodiment of the present invention, is similar to the first embodiment, but has differences as follows.
  • the housing 11' is partitioned off additionally into an upper buffer chamber 181' and a lower buffer chamber 181', which are located respectively above and below the two buffer chambers 18'. Additional pumping ports are formed in the housing 11', there being now the two pumping ports 116' as described in the previous embodiment, and two additional pumping ports 117', wherein the two buffer chambers 18' correspond respectively to the two pumping ports 116', and the upper and lower buffer chambers 181' correspond respectively to the two pumping ports 117'.
  • Two buffer apertures 144' are formed respectively in the two spacers 14' located respectively between the upper buffer chamber 181' and the buffer chamber 18' and the lower buffer chamber 181' and the buffer chamber 18', the buffer apertures 144' being coaxial with the inner and outer apertures 142' and 112'.
  • Each of the two buffer apertures 144' has a diameter of 10-400 ⁇ m, the diameter being greater than the diameter of the inner aperture 142' and less than the diameter of the outer aperture 112'.
  • the device 50 employs the four buffer chambers 18' and 181', rather than two as described in the previous embodiment, to achieve the effect of multilayered depressurization through the differential pumping and also a broader operation range of the pumping rates of the four buffer chambers 18' and 181', and to enable the gas chamber 16' to have a much larger pressure than that achieved by the only two buffer chambers 18 in the previous embodiment. Under such circumstance, the pumping rate of the upper and lower buffer chambers 181'must be greater than that of the two buffer chambers 18'.
  • the second embodiment is similar in operation to the first embodiment. Because the buffer chambers in the second embodiment are twice in number as those of the first embodiment, the controllable range of the differentially pumping rate of the buffer chambers is greater and more flexible.
  • the user can control the pumping rates of the buffer chambers 18' and 181' respectively at 160L/sec and 240L/sec or above, to increase the gas pressure inside the gas chamber 16 up to 760 torrs, in the environment of gas or a gas and vapor mixture, but still preventing the gas from leaking through the outer apertures 112' into the vacuum section outside the housing 11'.
  • a device 60 for operating gas in the vacuum or low-pressure environment and for observation of the operation constructed according to a third preferred embodiment of the present invention, is similar to the aforementioned first embodiment, but has differences as follows.
  • each of the buffer chambers 18" There is an inclined spacer 19 mounted in each of the buffer chambers 18" for partitioning off each buffer chamber 18" into two auxiliary buffer chambers 192.
  • Each of the inclined spacers 19 has a buffer aperture 196 coaxially aligned with the inner and outer apertures 142" and 112".
  • Each of the auxiliary buffer chambers 192 corresponds to one of the pumping ports 116" located in the housing 11" for evacuation of the auxiliary buffer chambers 192.
  • the inclined spacers 19 enable the housing 11" to have more buffer chambers 18" without heightening the housing 11".
  • the device 60 of this third embodiment has two more buffer chambers than the device 10 of the first embodiment.
  • the structure of the auxiliary buffer chambers based on the principle of multilayered differential pumping not only increase the gas pressure inside the gas chamber 16", up to 760 torrs as indicated in the second embodiment, but also enlarge the controllable range of the pumping rates of the buffer chambers thereby making it more flexible.
  • a device 80 for operating gas in the vacuum or low-pressure environment and for observation of the operation constructed according to a fourth preferred embodiment of the present invention includes a housing 81 and a specimen holder 85.
  • the housing 81 has a thinner part 82 formed at one side and two spacers 83 partitioning off its inside into a buffer chamber 821 and two additional buffer chambers 822 formed respectively above and below the buffer chamber 821.
  • Each of the two spacers 83 has a buffer aperture 831 between the buffer chamber 821 and the additional buffer chamber 822, located at a top (bottom) side of the buffer chamber 821.
  • the housing 81 has two outer apertures 811 formed respectively at top and bottom sides thereof for communication with the vacuum section outside the housing 81, an insertion slot 812 in communication with the buffer chamber 821, two pumping ports 813 corresponding to the buffer chamber 821, and two additional pumping ports 814 corresponding to the two additional buffer chambers 822.
  • the specimen holder 85 is mounted into the buffer chamber 821 through the insertion slot 812, having a gas infusion pipe 851 therein.
  • a gas box 86 has an opening 861 at one end (open end), and the open end is partially inserted in a front end of the specimen holder 85, in communication with the gas infusion pipe 851, and fixed by an adhesive 862.
  • a retaining wall 852 is formed around the gas box 86, and a gas inlet 853 is defined in the specimen holder 85 in communication with the gas infusion pipe 851.
  • the opening 861 or the gas box 86 communicates with the gas infusion pipe 851.
  • the gas box 86 has a target stage 87 formed therein for loading a specimen, a gas chamber 863 formed therein and covering the target stage 87, and two inner apertures 864 formed on a top side and a bottom side of the gas box 86 for communication with the buffer chamber 821.
  • the inner, outer, and buffer apertures are coaxially aligned.
  • the operation of the fourth embodiment is similar to that of the second embodiment such that no further recitation is necessary. It is to be noted that the temperature of the infused gas through the gas infusion pipe 851 must be lower than or equal to that of a sidewall of the gas infusion pipe 851 to prevent the infused vapor from condensation inside the gas infusion pipe 851.
  • the gas chamber 863 is formed inside the specimen holder 85 to transform the gas chamber 863 defined in the first embodiment into a buffer chamber to have one more buffer chamber than the first embodiment.
  • Increasing the number of the differentially pumped buffer chambers without heightening the housing 81 can not only enhance the pressure of the gas chamber up to 760 torrs, but also enables a larger and more flexible range of maneuverability of pumping rate for the buffer chambers.
  • a device a10 for operating gas in the vacuum or low-pressure environment and for observation of the operation is constructed according to a fifth preferred embodiment of the present invention, wherein the vacuum or low-pressure environment is the specimen chamber 92 located between the two pole pieces 96 inside the electron microscope 91.
  • a focus range Ra is formed on an imaginary axis G defined by the electron beam passing through between the two pole pieces 96.
  • the device a10 includes a housing a11 and a spacer a21.
  • the housing all has at least one buffer chamber a 12 and an outer aperture a 14 formed at each of a top side thereof and a bottom side thereof.
  • the spacer a21 defines a gas chamber a22 enclosed thereby, having two inner apertures a24 formed thereon and abutting a top side of and a bottom side of the gas chamber a22 respectively.
  • the distance between the two inner apertures a24 is smaller than 0.7mm.
  • the housing a11 and the spacer a21 can be combined together.
  • the gas chamber a22 enclosed by the spacer a21 is located inside the interior space of the housing a11 and the buffer chamber a12 formed between the spacer a21 and the housing a11.
  • the inner apertures a24 and the outer apertures a14 are coaxially aligned with one another.
  • the imaginary axis G runs through the inner and outer apertures a24 and a14.
  • the buffer chamber a12 covers the upper inner aperture a24.
  • the lower inner aperture a24 is applied with a pressure regulation a28 which is an extension of the buffer chamber a12.
  • the buffer chamber a12 covers the two inner apertures a24.
  • the housing a11 has two pumping ports a16 in communication with the buffer chamber a12.
  • the spacer a21 has a gas inlet a26 in communication with the gas chamber a22.
  • the gas chamber a22 overlaps the focus range Ra, and namely, a highest position that the housing all is located in the specimen chamber 92 is that a bottom side of the gas chamber is lower than or equal to a top end of the focus range Ra, and a lowest position that the housing a11 is located in the specimen chamber 92 is that a top side of the gas chamber is higher than or equal to a bottom end of the focus range Ra.
  • the gas chamber a22 is located at a midsection of the focus range Ra.
  • the distance between the two inner apertures a24 is smaller than 0.7mm to enable more clear observation and to avoid unclear image due to electron inelastic scattering resulted from extremely thick gas layer.
  • the operation of the fifth embodiment is similar to the first embodiment, having difference recited as follows.
  • the gas chamber a22 must overlap the focus range Ra to enable the specimen inserted into the gas chamber a22 to be effectively focused for further observation.
  • a device b10 for operating gas in the vacuum or low-pressure environment and for observation of the operation constructed according to a sixth preferred embodiment of the present invention, is similar to the fifth embodiment, having difference recited below.
  • the spacer b21 is separable from the housing b 11, and namely, the gas chamber b22 enclosed by the spacer b21 is separable from the housing b11 and the buffer chamber b12.
  • the spacer b21 is formed on a specimen holder b25 and the gas chamber b22 is formed between the spacer b21 and the specimen holder b25.
  • At least one sealing piece b29 like O-ring, is mounted to seal among the specimen holder b25, the spacer b21, and the housing b11.
  • the spacer b21 is placed into the housing b11 and the sealing piece b29 is located among the specimen holder b25, the spacer b21, and the housing b11 for the sealing potency.
  • the rest of the operation, including gas evacuation and infusion, is the same as the aforementioned embodiment, such that no further description is necessary.
  • a device c10 for operating gas in the vacuum or low-pressure environment and for observation of the operation constructed according to a seventh preferred embodiment of the present invention, is similar to the sixth embodiment, having difference recited below.
  • the housing c11 further includes a plurality of spacers c17 mounted therein for partitioning the interior space thereof additionally into an inner buffer chamber c18 formed inside the buffer chamber c12.
  • Two buffer apertures c19 are formed onto the spacers c17 and located at a top side and a bottom side of the inner buffer chamber c18 respectively.
  • the buffer, inner, and outer apertures c19, c24, and c14 are coaxially aligned with one another.
  • the housing c11 further includes two pumping ports c181 formed at bilateral sides of the inner buffer chamber c18 respectively, two gas passages c182 in communication with the two pumping ports c181, and an insertion hole c111 formed at a front side thereof and in communication with the inner buffer chamber c18.
  • the gas chamber c22 formed by the spacer c21 on the specimen holder c25 is inserted into the housing c 11 through the insertion hole c111.
  • the seventh embodiment has one more inner buffer chamber c18 than the sixth embodiment to have the potency of the increased buffer chambers like that in the second embodiment.
  • the operation of the seventh embodiment is the same as that of the sixth embodiment, and so are the gas evacuation and infusion, such that no further recitation is necessary.
  • a device d10 for operating gas in the vacuum or low-pressure environment and for observation of the operation constructed according to an eighth preferred embodiment of the present invention, is similar to the sixth embodiment, having difference recited below.
  • a spacer d27 is mounted outside the specimen holder d25 to enclose the gas chamber d22, forming an inner buffer chamber d28 between the spacer d27 and the spacer d21.
  • Two buffer apertures d29 are formed on the spacer d27, corresponding to a top side and a bottom side of the inner buffer chamber d28 respectively.
  • the buffer apertures d29 are coaxially aligned with the inner apertures d24.
  • the spacer d27 is separable from the housing d11 and is connected with the housing d11 in operation.
  • the eighth embodiment has one more inner buffer chamber d28 than the sixth embodiment and the inner buffer chamber d28 is formed on the specimen holder d25. Because the operation of the eighth embodiment is the same as those of the sixth and seven embodiments, wherein the pumping ports or the gas inlets can be located, as it depends, at the bilateral sides or, as the same in the seventh embodiment, at the front and rear sides of the inner buffer chamber d28, no more description is necessary.
  • a device e10 for operating gas in the vacuum or low-pressure environment and for observation of the operation constructed according to an ninth preferred embodiment of the present invention, is similar to the eighth embodiment, having difference recited below.
  • the housing e11 encloses the spacers e21, and namely, the housing e11 and the spacers e21 are combined together on a specimen holder e25.
  • the gas chamber e22 and the inner buffer chamber e28 are formed by the enclosure of the spacers e21.
  • the buffer chamber e12 is formed between the housing e11 and the spacer e21 located further outside than the other.
  • the inner, buffer, and outer apertures e24, e29, and e14 are coaxially aligned.
  • the operation of the ninth embodiment is the same as that of the second embodiment, including the gas evacuation and infusion, so no more description is necessary.
  • a device f10 for operating gas in the vacuum or low-pressure environment and for observation of the operation constructed according to an tenth preferred embodiment of the present invention, is similar to the fifth embodiment, having difference recited below.
  • the pressure regulation f28 is defined as a film mounted to and sealing the inner aperture f24 located lower than the other, being different from that (connected with the buffer chamber) of the fifth embodiment.
  • the buffer chamber f12 covers the inner aperture f24 located higher than the other. Accordingly, the pressure regulation f28 can prevent the gas inside the gas chamber f22 from exhausting through the lower inner aperture f24, thus attaining the pressure regulation and buffering potency.
  • the operation of the tenth embodiment is the same as that of the fifth embodiment, including the gas evacuation and infusion, so no further recitation is necessary.
  • a device g10 for operating gas in the vacuum or low-pressure environment and for observation of the operation constructed according to an eleventh preferred embodiment of the present invention, is similar to the fifth embodiment, having difference recited below.
  • the pressure regulation g28 is defined as a film mounted to and sealing the lower outer aperture g14.
  • the buffer chamber g12 covers the two inner apertures g24. Accordingly, the pressure regulation g28 can prevent the gas inside the buffer chamber g12 from exhausting through the lower outer aperture g14, thus attaining the pressure regulation and buffering potency.
  • the operation of the eleventh embodiment is the same as those of the fifth embodiment, including the gas evacuation and infusion, wherein the pumping ports or the gas inlets can be located, as it depends, at the bilateral sides or, as the same in the seventh embodiment, at the front and rear sides of the inner buffer chamber d28, no more description is necessary.
  • the present invention includes advantages as follows.

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
EP06009356A 2005-05-09 2006-05-05 Dispositif de manipulation de gaz sous vide ou en milieu à basse pression dans un microscope électronique et pour son observation. Withdrawn EP1722397A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN200510070168 2005-05-09
CNA2005100743274A CN101074920A (zh) 2005-05-09 2005-06-01 在真空或低压环境中操作气体且可供观测的装置
CN 200610075899 CN101067992A (zh) 2006-04-26 2006-04-26 在真空或低压环境中操作气体且可供观测的装置

Publications (1)

Publication Number Publication Date
EP1722397A1 true EP1722397A1 (fr) 2006-11-15

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EP06009356A Withdrawn EP1722397A1 (fr) 2005-05-09 2006-05-05 Dispositif de manipulation de gaz sous vide ou en milieu à basse pression dans un microscope électronique et pour son observation.

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014026840A (ja) * 2012-07-27 2014-02-06 Hitachi High-Technologies Corp 電子顕微鏡および電子顕微鏡用試料保持装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3585348A (en) * 1961-10-03 1971-06-15 Heraeus Gmbh W C Method and apparatus for welding metallic and nonmetallic materials by an electron beam under normal pressure
US4186305A (en) * 1978-03-01 1980-01-29 Union Kogaku Kabushiki Kaisha High-temperature microscope
US5001350A (en) * 1988-04-28 1991-03-19 Jeol Ltd. Electron microscope
US5326971A (en) * 1993-05-17 1994-07-05 Motorola, Inc. Transmission electron microscope environmental specimen holder
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3585348A (en) * 1961-10-03 1971-06-15 Heraeus Gmbh W C Method and apparatus for welding metallic and nonmetallic materials by an electron beam under normal pressure
US4186305A (en) * 1978-03-01 1980-01-29 Union Kogaku Kabushiki Kaisha High-temperature microscope
US5001350A (en) * 1988-04-28 1991-03-19 Jeol Ltd. Electron microscope
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope
US5326971A (en) * 1993-05-17 1994-07-05 Motorola, Inc. Transmission electron microscope environmental specimen holder

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014026840A (ja) * 2012-07-27 2014-02-06 Hitachi High-Technologies Corp 電子顕微鏡および電子顕微鏡用試料保持装置

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